JP2003101074A - Light emitting device - Google Patents
Light emitting deviceInfo
- Publication number
- JP2003101074A JP2003101074A JP2001293673A JP2001293673A JP2003101074A JP 2003101074 A JP2003101074 A JP 2003101074A JP 2001293673 A JP2001293673 A JP 2001293673A JP 2001293673 A JP2001293673 A JP 2001293673A JP 2003101074 A JP2003101074 A JP 2003101074A
- Authority
- JP
- Japan
- Prior art keywords
- light emitting
- light
- type electrode
- emitting device
- bonding pad
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
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- H10W90/756—
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- Led Device Packages (AREA)
- Led Devices (AREA)
Abstract
(57)【要約】 (修正有)
【課題】 耐久性が良く、色むらのない白色発光の発光
装置およびその製造方法を提供する。
【解決手段】 透光性の基板11上に半導体発光層
13,14を形成する工程と、半導体発光層の上に反射
性材料によりp型電極14およびn型電極16を形成す
る工程とを有して形成されるLEDチップ1と、無機系
バインダーに高濃度で蛍光体を分散させた蛍光体層22
を有する保持板21とを接着させ、これを接続配線5、
6の形成された基体4にフリップチップボンディング
し、その後透光性樹脂による樹脂封止をする。
(57) [Summary] (with correction) [PROBLEMS] To provide a light-emitting device that emits white light with good durability and has no color unevenness, and a method of manufacturing the same. A semiconductor light emitting layer includes a step of forming semiconductor light emitting layers on a light transmitting substrate, and a step of forming a p-type electrode and an n-type electrode on the semiconductor light emitting layer using a reflective material. LED chip 1 formed by the above method and a phosphor layer 22 in which a phosphor is dispersed at a high concentration in an inorganic binder.
Is bonded to the holding plate 21 having
Flip chip bonding is performed on the base 4 on which the substrate 6 is formed, and then resin sealing with a light-transmitting resin is performed.
Description
【0001】[0001]
【発明の属する技術分野】本発明は発光装置に関し、特
に半導体発光素子を組み込んだ発光装置に関する。詳し
くは発光ダイオード(以下、LEDという。)などの半
導体発光素子と蛍光材料とを組合わせて、蛍光材料によ
る放出光を利用して白色発光などを行う発光装置に関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light emitting device, and more particularly to a light emitting device incorporating a semiconductor light emitting element. More specifically, the present invention relates to a light emitting device that combines a semiconductor light emitting element such as a light emitting diode (hereinafter, referred to as an LED) and a fluorescent material, and that emits white light using emitted light from the fluorescent material.
【0002】[0002]
【従来の技術】LEDなどの半導体発光素子と蛍光体を
組合わせた発光装置は、長寿命な発光装置として広く用
いられはじめており、例えば液晶のバックライト光源と
して白色発光LEDが使われるなど、様々な用途が期待
されている。2. Description of the Related Art A light emitting device in which a semiconductor light emitting element such as an LED and a phosphor are combined is beginning to be widely used as a light emitting device having a long life. For example, a white light emitting LED is used as a liquid crystal backlight light source. It is expected to have various uses.
【0003】 図7は、従来の白色発光のLED発光装
置の一例を示す断面図であり、プリント基板等の上にL
ED発光装置を載置する所謂、面実装型のLED発光装
置の例を示す。LED発光装置90は図7(A)に示す
ように、GaN系化合物半導体等からなる青色発光LE
Dチップ91と、LEDチップ91を搭載する凹部92
を中央に備えた基部93と、凹部92内に充填された透
光性樹脂94とからなる。また、透光性樹脂94には、
LEDチップ91から放射された光の一部を吸収して黄
色系の光を放出する蛍光体95が分散混入されている。
また、基部93の外周面および凹部92内面には一対の
外部接続電極96、96が設けられ、凹部92内におい
てLEDチップ91と金属ワイヤーで電気的に接続され
ている。このLED発光装置90においては、LEDチ
ップ91から放射された光の一部が透光性樹脂94内に
分散している蛍光体95に吸収され、蛍光体95は黄色
系の光を放出する。これによりLEDチップ91の青色
光と蛍光体95の黄色系の光が同時に発光装置90から
照射され、白色系の発光色を得ることが可能になる。な
お、LEDチップとしては一般に、紫外域から青色領域
の光を発光する窒化ガリウム系化合物半導体等が使用さ
れ、透光性樹脂としてはエポキシ樹脂が用いられる。FIG. 7 is a cross-sectional view showing an example of a conventional white light emitting LED light emitting device.
An example of a so-called surface-mount type LED light emitting device on which the ED light emitting device is mounted is shown. As shown in FIG. 7A, the LED light emitting device 90 is a blue light emitting LE made of a GaN compound semiconductor or the like.
D chip 91 and recess 92 for mounting LED chip 91
A base portion 93 having a central portion and a translucent resin 94 filled in the concave portion 92. In addition, the translucent resin 94 includes
A phosphor 95 that absorbs part of the light emitted from the LED chip 91 and emits yellowish light is dispersed and mixed.
Further, a pair of external connection electrodes 96, 96 are provided on the outer peripheral surface of the base 93 and the inner surface of the recess 92, and are electrically connected to the LED chip 91 in the recess 92 by a metal wire. In the LED light emitting device 90, a part of the light emitted from the LED chip 91 is absorbed by the phosphor 95 dispersed in the translucent resin 94, and the phosphor 95 emits yellowish light. Accordingly, the blue light of the LED chip 91 and the yellow light of the phosphor 95 are simultaneously emitted from the light emitting device 90, and it is possible to obtain a white light emission color. A gallium nitride-based compound semiconductor that emits light in the ultraviolet region to the blue region is generally used as the LED chip, and an epoxy resin is used as the translucent resin.
【0004】 また、透光性樹脂94内に蛍光体を分散
させた場合には、蛍光体の分布むらが生じやすいため色
むらが発生することがある。そこで、図7(B)に示し
たように、蛍光体95を含まない透光性樹脂94’にて
LEDチップ91を封止し、その上に蛍光体95を含有
する樹脂層97を均一な厚みとなるように形成すること
により、色むらを生じにくくしたものも提案されてい
る。このような青色発光LEDと蛍光物質とにより青色
LEDからの発光を色変換させて白色発光を可能とした
発光装置としては、例えば特開平5−152609号、
特開平7−99345号、特開平11−31845号、
特開2000−156528号公報などがある。When the phosphors are dispersed in the translucent resin 94, uneven distribution of the phosphors is likely to occur, which may cause color unevenness. Therefore, as shown in FIG. 7B, the LED chip 91 is sealed with a translucent resin 94 ′ that does not contain the phosphor 95, and a resin layer 97 containing the phosphor 95 is evenly formed thereon. It is also proposed that the color filter is formed to have a thickness so that color unevenness is less likely to occur. As a light emitting device capable of white light emission by color-converting the light emitted from the blue LED by the blue light emitting LED and the fluorescent substance, for example, Japanese Patent Laid-Open No. 5-152609,
JP-A-7-99345, JP-A-11-31845,
There is Japanese Patent Laid-Open No. 2000-156528.
【0005】[0005]
【発明が解決しようとする課題】上記した従来の技術で
は、LEDチップ91からの放射光が蛍光体95に到達
するまでの間には透光性樹脂94内を通過しなければな
らない。しかしながら、透光性樹脂94として一般的に
エポキシ樹脂が使用されているため、LEDチップから
放射された紫外線光等によって透光性樹脂94が劣化
し、透過率が経時的に低下する黄変現象などを生じる。
そのため、特にLEDチップ91として紫外線領域の光
を発光する材料を用い、且つ、かかる光路内にエポキシ
樹脂を用いた発光装置においては、白色発光出力が低下
し、耐久性に優れた発光装置を得ることが難しいという
問題点があった。In the above-mentioned conventional technique, the light emitted from the LED chip 91 must pass through the transparent resin 94 before reaching the phosphor 95. However, since an epoxy resin is generally used as the translucent resin 94, the yellowing phenomenon that the translucent resin 94 is deteriorated by the ultraviolet light emitted from the LED chip and the transmittance is lowered with time. And so on.
Therefore, particularly in a light emitting device using a material that emits light in the ultraviolet region as the LED chip 91 and using an epoxy resin in the optical path, the white light emission output is reduced, and a light emitting device having excellent durability is obtained. There was a problem that it was difficult.
【0006】 また、LEDチップ91を載置している
凹部92内に、透光性樹脂を用いることなく蛍光体を塗
付等によりに配設し、それらを透光性樹脂にて封止した
発光装置も提案されている。しかし、かかる場合におい
ては蛍光体にてLEDチップを埋め込むような構成とな
るため、蛍光体の厚み調整が困難で色調・明るさの調整
が難しく、また、演色性に優れた発光装置を再現性よく
得ることが難しいという問題点がある。In addition, a fluorescent substance is provided by coating or the like in the recess 92 in which the LED chip 91 is mounted without using a transparent resin, and they are sealed with a transparent resin. Light emitting devices have also been proposed. However, in such a case, since the LED chip is embedded with the phosphor, it is difficult to adjust the thickness of the phosphor, which makes it difficult to adjust the color tone and brightness, and the reproducibility of the light emitting device with excellent color rendering properties is improved. There is a problem that it is difficult to get well.
【0007】 本発明は以上の点に鑑み、明るさ・色の
均一性に優れ、且つ、耐久性に優れた発光装置を得るこ
とができる発光装置およびその製造方法を提供すること
を主たる目的とする。In view of the above points, it is a main object of the present invention to provide a light emitting device that can obtain a light emitting device having excellent brightness and color uniformity and excellent durability, and a manufacturing method thereof. To do.
【0008】[0008]
【課題を解決するための手段】上記目的は、本発明の一
の観点によれば、透光性の基板上に半導体発光層を設け
た発光素子と、該発光素子の放射光を吸収して異なる波
長の光を放出する波長変換部材と、これらを一体化して
封止する透光性材料とを備えた発光装置において、上記
発光素子は、発光層表面側にp型電極およびn型電極が
反射性材料により形成されると共に、その各表面にはp
型電極マウント用ボンディングパッドおよびn型電極マ
ウント用ボンディングパッドが、発光層を形成した基板
表面からp型電極マウント用ボンディングパッド最表面
までの距離とn型電極マウント用ボンディングパッド最
表面までの距離が略同一となるように形成され、該マウ
ント用ボンディングパッドを介して外部接続用電極にワ
イヤーを用いることなく電気的に接続されており、上記
波長変換材部材は、上記基板の発光層と反対側の表面に
密接して設けられ、かつ、上記発光素子と同等以上の大
きさとされている、ことを特徴とする発光装置、により
達成される。According to one aspect of the present invention, the above object is to provide a light emitting element having a semiconductor light emitting layer provided on a transparent substrate, and to absorb the emitted light of the light emitting element. In a light emitting device including a wavelength conversion member that emits light of different wavelengths and a translucent material that integrally seals these, in the light emitting element, a p-type electrode and an n-type electrode are provided on the light emitting layer surface side. It is made of a reflective material and has p on each surface.
The distance between the bonding pad for the n-type electrode mounting and the bonding pad for the n-type electrode mounting is the distance from the substrate surface on which the light emitting layer is formed to the outermost surface of the bonding pad for the p-type electrode mounting and the outermost surface of the bonding pad for the n-type electrode mounting. They are formed to be substantially the same, and are electrically connected to the electrodes for external connection via the bonding pads for mounting without using wires, and the wavelength conversion material member is on the opposite side of the light emitting layer of the substrate. And a size equal to or larger than that of the above-mentioned light-emitting element.
【0009】 この発明では、発光層から放射された光
の殆どが透光性樹脂に入射することなく波長変換部材に
到達し、波長変換された光を外部に照射する。よって、
透光性樹脂が発光層からの光により劣化されることがな
くなり、長期間の使用によっても発光出力の低下を抑え
た発光装置を得ることができ、これにより上記した目的
は達成される。In this invention, most of the light emitted from the light emitting layer reaches the wavelength conversion member without entering the translucent resin, and the wavelength converted light is emitted to the outside. Therefore,
The translucent resin is not deteriorated by the light from the light emitting layer, and it is possible to obtain a light emitting device in which a decrease in light emission output is suppressed even after long-term use, and thus the above-described object is achieved.
【0010】 また、本発明の他の観点の発明によれ
ば、透光性の基板上に半導体発光層を設けた発光素子
と、該発光素子の放射光を吸収して異なる波長の光を放
出する波長変換部材と、これらを一体化して封止する透
光性材料とを備えた発光装置の製造方法であって、上記
基板上に半導体発光層を形成する工程と、半導体発光層
の上に反射性材料によりp型電極およびn型電極を形成
する工程と、それらの各表面にp型電極マウント用ボン
ディングパッドおよびn型電極マウント用ボンディング
パッドを、発光層を形成した基板表面からp型電極マウ
ント用ボンディングパッド最表面までの距離とn型電極
マウント用ボンディングパッド最表面までの距離が略同
一になるように形成する工程と、を順に行う発光素子チ
ップ作製工程と、透光性の保持板の少なくとも一方の表
面上に無機系バインダー中に蛍光材料を分散させた塗付
液を用いて蛍光体膜を形成する工程と、伸縮シート上に
蛍光体膜を設けた保持板を載置した後に切断し、その後
に該伸縮シートを伸ばして波長変換部材を分割する工程
とを有する波長変換部材作製工程と、発光装置の外部接
続用の一対の電極に発光素子チップ作製工程を終えた上
記p型電極マウント用ボンディングパッドおよびn型電
極マウント用ボンディングパッドを夫々電気的に接続す
る工程と、発光素子の基板の発光層と反対側表面に波長
変換部材作製工程を終えた波長変換部材を載置する工程
と、を有する発光素子配設工程と、発光素子配設工程の
後に、発光素子、波長変換部材および外部接続用電極を
透光性材料にて封止する工程とを、備えていることを特
徴とする発光装置の製造方法、により上記した目的は達
成される。According to another aspect of the present invention, a light emitting element having a semiconductor light emitting layer provided on a transparent substrate and a light emitting element that absorbs the emitted light and emits light of different wavelengths. A method of manufacturing a light-emitting device comprising a wavelength conversion member and a light-transmissive material that integrally seals these, wherein the step of forming a semiconductor light-emitting layer on the substrate, and the step of forming a semiconductor light-emitting layer on the substrate. A step of forming a p-type electrode and an n-type electrode by using a reflective material, and a bonding pad for mounting a p-type electrode and a bonding pad for mounting an n-type electrode on each surface of the p-type electrode and the bonding pad for mounting an n-type electrode from the substrate surface on which the light emitting layer is formed. A step of forming a light emitting element chip that sequentially performs a step of forming the distance to the outermost surface of the bonding pad for mounting and a distance to the outermost surface of the bonding pad for mounting the n-type electrode, and a light-transmitting property. A step of forming a phosphor film on at least one surface of the holding plate using a coating liquid in which a fluorescent material is dispersed in an inorganic binder, and a holding plate provided with the phosphor film on the stretchable sheet. After cutting, the wavelength conversion member manufacturing process including a step of dividing the wavelength conversion member by stretching the stretchable sheet after that, and the light emitting element chip manufacturing process for the pair of electrodes for external connection of the light emitting device are completed. A wavelength conversion member that has been subjected to the step of electrically connecting the bonding pad for mounting the p-type electrode and the bonding pad for mounting the n-type electrode, and the step of forming the wavelength conversion member on the surface of the substrate of the light emitting element opposite to the light emitting layer. And a step of mounting the light emitting element having a step of mounting, and a step of sealing the light emitting element, the wavelength conversion member and the electrode for external connection with a transparent material after the step of disposing the light emitting element. Method of manufacturing a light emitting device according to claim Rukoto, above object by is achieved.
【0011】 この発明によれば、均一な厚みに制御さ
れた波長変換部材を容易に得ることができ、色むらの生
じにくい発光装置を再現性よく製造することができ、上
記した目的を達成することができ得る。According to the present invention, it is possible to easily obtain the wavelength conversion member controlled to have a uniform thickness, and it is possible to manufacture the light emitting device in which color unevenness is less likely to occur with good reproducibility, and to achieve the above-mentioned object. Can be able to.
【0012】[0012]
【発明の実施の形態】以下、この発明の好適な実施形態
を図1乃至図6を参照しながら、詳細に説明する。図1
及び図2は本発明による発光装置の第1の実施形態を示
す。なお、この実施形態は所謂面実装型もしくはチップ
部品タイプと称されるLED発光装置に適用したもので
ある。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, preferred embodiments of the present invention will be described in detail with reference to FIGS. Figure 1
2 shows a first embodiment of a light emitting device according to the present invention. It should be noted that this embodiment is applied to a so-called surface mounting type or a chip component type LED light emitting device.
【0013】 面実装型LED発光装置10は、略直方
体形状をなしており、図示しないプリント配線基板上に
実装してプリント配線基板の法線方向に向かって光線L
を照射するものである。絶縁性の基体4の表面側中央部
には凹部2が形成され、凹部2の中央部にはLEDチッ
プ1が取り付けられており、周辺には反射枠3が形成さ
れている。また、凹部2内には透光性封止材料8が充填
されている。基体4の裏面側には第一接続用電極および
第二接続用電極が配設され、各々の他方の端部は凹部2
内部にまで回り込むように形成され、LEDチップ1の
電極と電気的に接続している。The surface-mounted LED light-emitting device 10 has a substantially rectangular parallelepiped shape, is mounted on a printed wiring board (not shown), and has a light ray L directed in a direction normal to the printed wiring board.
To irradiate. A concave portion 2 is formed in the central portion on the front surface side of the insulating substrate 4, an LED chip 1 is attached to the central portion of the concave portion 2, and a reflection frame 3 is formed in the periphery. In addition, the translucent sealing material 8 is filled in the recess 2. A first connection electrode and a second connection electrode are arranged on the back surface side of the base body 4, and the other end portion of each of them is provided with the recess 2
It is formed so as to wrap around inside and is electrically connected to the electrode of the LED chip 1.
【0014】 LEDチップ1は、蛍光材料を励起可能
な半導体発光素子であり、青色および/または紫外光を
放射するものが好ましい。このような半導体発光素子と
しては、例えばGaN,InGaN,InGaAlN,
AlGaN等の窒化ガリウム系化合物、ダイヤモンド等
を発光層として形成させたものを用いることができる。
例えば図2に示したLEDチップ1は、紫外線光を透過
するサファイアなどの基板11の面上にMOCVD法
(有機金属化学気相法)によりn型半導体層12(n−
GaN)を形成した後、その上にp型半導体層13(p
−GaN)を形成してpn接合を形成している。また、
n型半導体層12の上には、n型オーミック電極16お
よびn電極マウント用ボンディングパッド18が形成さ
れ、p型半導体層13の上には、p型オーミック電極1
4およびp電極マウント用ボンディングパッド17が形
成されている。なお、符号15は絶縁膜である。The LED chip 1 is a semiconductor light emitting element capable of exciting a fluorescent material, and preferably emits blue and / or ultraviolet light. Examples of such a semiconductor light emitting device include GaN, InGaN, InGaAlN,
A gallium nitride-based compound such as AlGaN, or a material in which diamond or the like is formed as a light emitting layer can be used.
For example, the LED chip 1 shown in FIG. 2 has an n-type semiconductor layer 12 (n-n) formed by MOCVD (metal organic chemical vapor deposition) on the surface of a substrate 11 such as sapphire that transmits ultraviolet light.
After forming GaN, the p-type semiconductor layer 13 (p
-GaN) to form a pn junction. Also,
An n-type ohmic electrode 16 and an n-electrode mounting bonding pad 18 are formed on the n-type semiconductor layer 12, and a p-type ohmic electrode 1 is formed on the p-type semiconductor layer 13.
4 and p electrode mounting bonding pads 17 are formed. Reference numeral 15 is an insulating film.
【0015】 波長変換部材7は、LEDチップ1から
放射された光により励起されて発光する蛍光体等の蛍光
材料を含有する部材からなり、LEDチップ1の発光面
の大きさと同等以上、好適にはLEDチップ1の基板1
1より大きな大きさにて蛍光材料がLEDチップ1側に
位置するようにして上記基板11に密接して設けられて
いる。波長変換部材7は、発光装置10が照射する照射
光を透過可能なガラスなどの保持板21上に蛍光体層2
2を塗付形成したものであり、蛍光体層22は光劣化す
る樹脂成分を含まないよう無機系バインダーを用いて塗
布されている。蛍光体層22に含まれる蛍光材料は、励
起光源であるLEDチップから放射される光や、LED
発光装置の用途等に応じた所望の発光色に応じて種々の
公知の蛍光材料から適宜選択することができる。具体的
な蛍光材料としては、セリウムで付活されたイットリウ
ム・アルミニウム・ガーネット系蛍光体、セリウムで付
活されたイットリウム・アルミニウム・ガーネット系蛍
光体にプラセオジウムをドープした蛍光体、赤色に変換
するLa2O2蛍光体、緑色に変換する3Ba0・8A
l2O3蛍光体および青色に変換するSr10(P
O4)6C12蛍光体およびこれらを混合した混合蛍光
体などがある。The wavelength conversion member 7 is made of a member containing a fluorescent material such as a phosphor that is excited by light emitted from the LED chip 1 to emit light, and is preferably equal to or larger than the size of the light emitting surface of the LED chip 1. Is the substrate 1 of the LED chip 1
A fluorescent material having a size larger than 1 is provided in close contact with the substrate 11 so as to be located on the LED chip 1 side. The wavelength conversion member 7 includes a phosphor layer 2 on a holding plate 21 such as glass that can transmit the irradiation light emitted from the light emitting device 10.
2 is formed by coating, and the phosphor layer 22 is coated by using an inorganic binder so as not to contain a resin component which is deteriorated by light. The fluorescent material contained in the phosphor layer 22 is the light emitted from the LED chip, which is an excitation light source, or the LED.
It is possible to appropriately select from various known fluorescent materials according to a desired emission color according to the use of the light emitting device. Specific fluorescent materials include yttrium-aluminum-garnet-based phosphors activated with cerium, yttrium-aluminum-garnet-based phosphors activated with cerium, and praseodymium-doped phosphors, and La for red conversion. 2 O 2 phosphor, 3Ba0.8A that converts to green
l 2 O 3 phosphor and blue-converting Sr 10 (P
There are O 4 ) 6 C 12 phosphors and mixed phosphors obtained by mixing these.
【0016】 透光性封止材料8は、凹部2内に充填さ
れ、LEDチップ1および波長変換部材7を封止する。
また、凹部2上に図示しない半球状等のレンズを形成し
てもよい。透光性封止材料8としては、LEDチップ1
などを一体化するパッケージを成形しやすく、LEDチ
ップと外部とを電気的に絶縁でき、透過率が高い材料が
好ましい。更に好ましくはLEDチップ1等との密着性
に優れると共に耐熱性などの信頼性に優れる材料が良
い。具体的な材料例としては、エポキシ樹脂、ポリカー
ボネート樹脂、アクリル樹脂、シリコーン樹脂などが挙
げられるが、用途に応じて種々の材料の中から適宜選択
でき、複数の材料層の積層構造としても良い。The translucent sealing material 8 is filled in the recess 2 and seals the LED chip 1 and the wavelength conversion member 7.
Further, a hemispherical lens or the like (not shown) may be formed on the concave portion 2. The LED chip 1 is used as the translucent sealing material 8.
It is preferable to use a material having a high transmissivity because it is easy to form a package that integrates the above and can electrically insulate the LED chip from the outside. It is more preferable to use a material that has excellent adhesion to the LED chip 1 and the like and also has excellent reliability such as heat resistance. Specific examples of the material include an epoxy resin, a polycarbonate resin, an acrylic resin, a silicone resin, and the like, which can be appropriately selected from various materials according to the application, and may have a laminated structure of a plurality of material layers.
【0017】 ここで、本実施形態のLED発光装置1
0の製造方法について図2および図3を用いて簡単に説
明する。Here, the LED light emitting device 1 of the present embodiment
A method of manufacturing 0 will be briefly described with reference to FIGS.
【0018】 まず、LEDチップ1の作製工程につい
て説明する。紫外線光を透過するサファイアなどの基板
11を洗浄した後、MOCVD法(有機金属化学気相
法)により図示しないバッファー層およびn型半導体層
12(n−GaN)を成長し、その上にp型半導体層1
3(p−GaN)をエピタキシャル成長して半導体発光
層を形成する。First, a manufacturing process of the LED chip 1 will be described. After cleaning the substrate 11 such as sapphire that transmits ultraviolet light, a buffer layer and an n-type semiconductor layer 12 (n-GaN) (not shown) are grown by MOCVD (metalorganic chemical vapor deposition), and p-type is formed thereon. Semiconductor layer 1
3 (p-GaN) is epitaxially grown to form a semiconductor light emitting layer.
【0019】 このようにして発光層を設けた図示しな
いデバイスウエハを液相エッチングまたは気相エッチン
グによってn型半導体層12の一部を露出させ、その
後、p型半導体層13上にNi,Au,Pt,Phなど
の金属で形成したp型オーミック電極14を設ける。こ
のp型オーミック電極14は紫外線光などの発光層から
放射された光に対する反射率が高い材料を使い、p型半
導体層13の全表面を覆うように形成することが好まし
い。p型オーミック電極14としては、例えば、p型半
導体層13側から順に白金(Pt)10オングストロー
ム、銀(Ag)3000オングストローム、チタン(T
i)1000オングストローム、白金(Pt)1000
オングストローム、金(Au)1000オングストロー
ムを順に蒸着して形成した積層電極を用いている。白金
および銀は半導体層とのオーミックコンタクトを取ると
ともに発光光に対する反射率を高めるために形成し、最
表面の金層は酸化しない表面層とし、また後に積層する
ボンディングパッドとの接触性を良好にするために積層
している。なお、最表面の金層と接触する白金層は金層
の拡散を予防するために形成し、それと接するチタン層
はその白金層の拡散を予防するために用いている。A part of the n-type semiconductor layer 12 is exposed by liquid phase etching or vapor phase etching of a device wafer (not shown) provided with the light emitting layer in this way, and then Ni, Au, A p-type ohmic electrode 14 made of a metal such as Pt or Ph is provided. The p-type ohmic electrode 14 is preferably made of a material having a high reflectance for light emitted from a light emitting layer such as ultraviolet light, and is preferably formed so as to cover the entire surface of the p-type semiconductor layer 13. Examples of the p-type ohmic electrode 14 include platinum (Pt) 10 Å, silver (Ag) 3000 Å, and titanium (T) in order from the p-type semiconductor layer 13 side.
i) 1000 angstrom, platinum (Pt) 1000
A laminated electrode formed by sequentially depositing angstrom and gold (Au) 1000 angstrom is used. Platinum and silver are formed to make ohmic contact with the semiconductor layer and to increase the reflectance for emitted light, and the outermost gold layer is a surface layer that does not oxidize, and also has good contact with the bonding pad to be laminated later. It is stacked in order to do. The platinum layer in contact with the outermost gold layer is formed to prevent the diffusion of the gold layer, and the titanium layer in contact therewith is used to prevent the diffusion of the platinum layer.
【0020】 p型オーミック電極14を形成した後に
SiNx、SiO 2、Al2O3などの紫外線領域で透
明な絶縁膜15をp型半導体層13の端面およびp型電
極用マウント用ボンディングパッド17を除くp型オー
ミック電極14表面を覆うようにして形成する。このよ
うな絶縁膜15は、デバイスウエハ全体の上に電子線蒸
着法やスパッタ法、化学的気相成膜法などを用いて形成
し、その一部を除去することにより得ることができる。
絶縁膜を形成することでp−nのショートを予防するこ
とができるが、適宜の距離を隔ててp型オーミック電極
14およびn型オーミック電極16を設けた場合には、
絶縁膜15を省略することもでき得る。After forming the p-type ohmic electrode 14,
SiNx, SiO Two, AlTwoOThreeTransparent in the ultraviolet range
The clear insulating film 15 is formed on the end face of the p-type semiconductor layer 13 and the p-type electrode.
P type oh except bonding pad 17 for pole mount
It is formed so as to cover the surface of the Mick electrode 14. This
The insulating film 15 is formed on the entire device wafer by electron beam evaporation.
Formed using deposition method, sputtering method, chemical vapor deposition method, etc.
However, it can be obtained by removing a part thereof.
Preventing pn short circuit by forming an insulating film
Can be used, but p-type ohmic electrodes are separated by an appropriate distance.
14 and the n-type ohmic electrode 16 are provided,
The insulating film 15 may be omitted.
【0021】 絶縁膜15を形成した後に、紫外線波長
において高い反射率のAg,Alなどで形成したn型オ
ーミック電極16を露出させたn型半導体層12上に形
成する。このn型オーミック電極16は紫外線光などの
LEDチップ発光光の反射率が高い材料を使うことが好
ましい。n型オーミック電極16としては、例えば、n
型半導体層12側から順にチタン(Ti)20オングス
トロームおよびアルミニウム(Al)3000オングス
トロームを順に蒸着して形成した積層電極を用いてい
る。このような金属材料はn型オーミック電極16との
オーミックコンタクトを取るとともに発光光に対する反
射率を高めるために形成している。After the insulating film 15 is formed, the n-type ohmic electrode 16 formed of Ag, Al, or the like having a high reflectance at the ultraviolet wavelength is formed on the exposed n-type semiconductor layer 12. The n-type ohmic electrode 16 is preferably made of a material having a high reflectance for light emitted from the LED chip such as ultraviolet light. As the n-type ohmic electrode 16, for example, n
A laminated electrode is formed by sequentially depositing titanium (Ti) 20 Å and aluminum (Al) 3000 Å from the type semiconductor layer 12 side. Such a metal material is formed to make ohmic contact with the n-type ohmic electrode 16 and to increase the reflectance with respect to the emitted light.
【0022】 続いてp型電極マウント用ボンディング
パッド17およびn型電極用マウントボンディングパッ
ド18をTi,Ni,Auなどの金属材料で形成する。
なお、n型電極マウント用ボンディングパッド18の厚
みをp型電極マウント用ボンディングパッド17よりも
厚くして、基板11の表面からの距離が等しくなるよう
に調整している。p型電極マウント用ボンディングパッ
ド17は、例えば、p型半導体層13側から順に金(A
u)1000オングストローム、白金(Pt)1000
オングストローム、金(Au)2000オングストロー
ムを順に蒸着して形成した積層電極を用いている。最初
に形成する金層はp型オーミック電極14との接続性を
良好に保つために用い、最表面の金層はLEDチップ1
と第一接続用電極5とのAu−Sn共晶電極19を用い
た接続性が良好になるために積層している。なお、最表
面の金層と接触する白金層は最表面の金層が共晶化され
た場合の、その拡散を予防するために形成している。Subsequently, the p-type electrode mount bonding pad 17 and the n-type electrode mount bonding pad 18 are formed of a metal material such as Ti, Ni, or Au.
The n-type electrode mounting bonding pad 18 is made thicker than the p-type electrode mounting bonding pad 17 so that the distance from the surface of the substrate 11 is equal. The bonding pad 17 for mounting the p-type electrode is, for example, gold (A
u) 1000 angstrom, platinum (Pt) 1000
A laminated electrode formed by sequentially depositing angstrom and gold (Au) 2000 angstrom is used. The gold layer formed first is used for maintaining good connectivity with the p-type ohmic electrode 14, and the gold layer on the outermost surface is the LED chip 1.
And the first connection electrode 5 are stacked in order to improve the connectivity using the Au-Sn eutectic electrode 19. The platinum layer in contact with the outermost gold layer is formed to prevent its diffusion when the outermost gold layer is eutecticized.
【0023】 n型電極マウント用ボンディングパッド
18は、例えば、n型半導体層12側から順にチタン
(Ti)1000オングストローム。金(Au)100
0オングストローム、白金(Pt)1000オングスト
ローム、金(Au)2000オングストロームを順に蒸
着して形成した積層電極を用いている。チタン層はn型
オーミック電極16との接続性を良好にするために形成
している。最初に形成する金層は、基板11表面からp
型電極マウント用ボンディングパッド17表面までの距
離と、基板11表面からn型電極マウント用ボンディン
グパッド18表面までの距離をほぼ等しくするための厚
み調整層として形成している。また、最表面の金層はL
EDチップ1と第二接続用電極6とのAu−Sn共晶電
極19を用いた接続性が良好になるために積層し、最表
面の金層と接触する白金層は最表面の金層が共晶化され
た場合の、その拡散を予防するために形成している点は
p型電極マウント用ボンディングパッド17と同一であ
る。よって、この白金層および金層については、n型電
極マウント用ボンディングパッド18およびp型電極マ
ウント用ボンディングパッド17の双方を同時に形成す
ることができる。なお、これらの電極材料として反射率
の高い材料を用いるのは、基体側に向かって放射された
光を反射させて基板11側から取出す光の量を増大させ
るためである。また、本明細書において高反射率材料と
は、発光層から放射された光の主ピーク波長に対し、5
0%よりも高い反射率を示す材料をいい、狭義には70
%以上の反射率を示すものをいう。例えば約400nm
の波長に対し、上記したp型電極およびn型電極はいず
れも70〜80%程度の反射率を示すが、金電極の場合
には50%未満の反射率である。The n-type electrode mounting bonding pad 18 is, for example, titanium (Ti) 1000 Å in order from the n-type semiconductor layer 12 side. Gold (Au) 100
A laminated electrode formed by sequentially depositing 0 angstrom, platinum (Pt) 1000 angstrom, and gold (Au) 2000 angstrom is used. The titanium layer is formed to improve the connectivity with the n-type ohmic electrode 16. The gold layer formed first is p from the surface of the substrate 11.
It is formed as a thickness adjusting layer for making the distance to the surface of the bonding pad 17 for die electrode mounting and the distance from the surface of the substrate 11 to the surface of the bonding pad 18 for n type electrode mounting substantially equal. The outermost gold layer is L
The platinum layer in contact with the gold layer on the outermost surface is the gold layer on the outermost surface because the connectivity between the ED chip 1 and the second connecting electrode 6 using the Au-Sn eutectic electrode 19 is good. It is the same as the p-type electrode mount bonding pad 17 in that it is formed to prevent its diffusion when it is eutectic. Therefore, both the n-type electrode mount bonding pad 18 and the p-type electrode mount bonding pad 17 can be simultaneously formed on the platinum layer and the gold layer. It should be noted that the reason why the materials having high reflectance are used as these electrode materials is to increase the amount of light extracted from the substrate 11 side by reflecting the light emitted toward the substrate side. Further, in the present specification, the high reflectance material is 5 with respect to the main peak wavelength of the light emitted from the light emitting layer.
A material that has a reflectance higher than 0%.
It means that the reflectance is at least%. For example, about 400 nm
The above-mentioned p-type electrode and n-type electrode both show a reflectance of about 70 to 80% with respect to the above wavelength, but a gold electrode has a reflectance of less than 50%.
【0024】 一方、凹部2内の第一接続用電極5およ
び第二接続用電極6のp型電極マウント用ボンディング
パッド17およびn型電極マウント用ボンディングパッ
ド18に対向する位置には、Au−Snなどからなる共
晶電極19を形成しておく。On the other hand, Au—Sn is provided at a position in the recess 2 facing the p-type electrode mounting bonding pad 17 and the n-type electrode mounting bonding pad 18 of the first connection electrode 5 and the second connection electrode 6. A eutectic electrode 19 made of, for example, is formed in advance.
【0025】 次に、LEDチップ1を基板11側が上
面となるようにして、第一接続用電極5とp型電極マウ
ント用ボンディングパッド17を、第二接続用電極6と
n型電極マウント用ボンディングパッド18を、夫々共
晶電極19を介して接続し、電気的、機械的接触特性を
改善するために約300℃にて加熱処理して、LEDチ
ップ1を凹部2内に所謂、フリップチップ方式にて設置
する。Next, the LED chip 1 is arranged so that the substrate 11 side is the upper surface, the first connection electrode 5 and the p-type electrode mounting bonding pad 17 are connected, and the second connection electrode 6 and the n-type electrode mounting bonding are performed. The pads 18 are connected via eutectic electrodes 19, respectively, and heat-treated at about 300 ° C. to improve electrical and mechanical contact characteristics, so that the LED chip 1 is placed in the recess 2 in a so-called flip chip system. Install at.
【0026】 続いて波長変換部材作製工程について説
明する。図3は波長変換部材の作製工程を工程順に概略
を示すものである。21は保持板、22は蛍光体層、2
3は熱伸縮シートである。まず、保持板21を用意し洗
浄する(図3(A))。保持板21としてはガラス等の
発光装置10の照射光を透過可能な材料を用い、その厚
みは50〜100μm程度とする。これより厚いと発光
装置が大型化し、これより薄いと以後の作業においてハ
ンドリング作業が困難になるからである。また、保持板
21は紫外線光の透過率の低い材料を用いることが好ま
しい。LEDチップ1から放射された光は、蛍光体層2
2を通過した後に保持板21を通過して、透光性封止材
料8に到達する。したがって、透光性封止材料8を劣化
させるおそれのある蛍光体層22を通り抜けた紫外線を
できる限り遮断する特性を備えることが好ましいからで
ある。また、保持板21に着色を施したものを用いるこ
ともでき得る。着色した保持板21を用いることで、発
光装置の色バランスを調整可能だからである。例えば励
起光源であるLEDチップ1の発光が紫外線光で、蛍光
体層22が所謂三波長蛍光体の場合において、赤色発光
用の蛍光体による発光ピークが青色発光用および緑色発
光用蛍光体による発光ピークに比べて弱い場合には、青
色および緑色の領域における光を吸収する着色を施した
ものを用いて、白色の色調を調整することができ得る。Next, the wavelength conversion member manufacturing process will be described. FIG. 3 schematically shows the steps of manufacturing the wavelength conversion member in the order of steps. 21 is a holding plate, 22 is a phosphor layer, 2
Reference numeral 3 is a heat stretchable sheet. First, the holding plate 21 is prepared and washed (FIG. 3A). The holding plate 21 is made of a material such as glass that can transmit the irradiation light of the light emitting device 10, and has a thickness of about 50 to 100 μm. This is because if it is thicker than this, the light emitting device becomes large, and if it is thinner than this, handling work becomes difficult in the subsequent work. Further, it is preferable that the holding plate 21 is made of a material having a low transmittance of ultraviolet light. The light emitted from the LED chip 1 is the phosphor layer 2
After passing through 2, it passes through the holding plate 21 and reaches the translucent sealing material 8. Therefore, it is preferable to have the property of blocking as much as possible the ultraviolet rays that have passed through the phosphor layer 22 that may deteriorate the translucent sealing material 8. It is also possible to use a colored holding plate 21. This is because the color balance of the light emitting device can be adjusted by using the colored holding plate 21. For example, when the LED chip 1 which is an excitation light source emits ultraviolet light and the phosphor layer 22 is a so-called three-wavelength phosphor, the emission peaks of the phosphors for red emission are emitted by the phosphors for blue emission and green emission. If it is weaker than the peak, it is possible to adjust the white color tone by using a coloring material that absorbs light in the blue and green regions.
【0027】 次に蛍光体層22を形成する(図3
(B))。蛍光体層22は、蛍光体をシラノールや水ガ
ラスを主成分とする無機系バインダー中に高濃度に分散
させた混合液をスピンコート法やブレードコート法もし
くはスクリーン印刷法などの方法で塗膜を作製すること
により形成可能である。このとき、蛍光体の充填密度を
高めるため無機系バインダー1に対して重量比で蛍光体
を3〜5の割合で混合する。単に混合したのみでは粘度
が高過ぎて均一に塗付することが難しいので、酢酸nブ
チル等の粘度調整剤を混合液に加えて粘度を低くして適
宜調整すると好適である。塗付後150℃にて熱処理を
行って硬化させる。このとき、粘度調整材は熱処理によ
って揮発する材料を用いると良い。蛍光体は平均粒径が
3〜20μmのものを用い、蛍光体層22の厚みは、3
0〜100μm、好適には平均粒径8〜15μmの蛍光
体を用いて40〜50μmの蛍光体層とすると明るさと
効率のバランスに優れた発光装置が得られる。蛍光体粒
子が小さいと充填密度を高めることができるが、変換効
率が好ましくなく、大き過ぎると均一性が悪くなり易い
からである。また、厚みが薄いとやはり変換効率が悪く
なり、厚くなると明るさが低下してくる傾向があるから
である。Next, the phosphor layer 22 is formed (FIG. 3).
(B)). The phosphor layer 22 is formed by coating a mixture of a phosphor in a high concentration in an inorganic binder mainly composed of silanol or water glass by a method such as a spin coating method, a blade coating method or a screen printing method. It can be formed by manufacturing. At this time, in order to increase the packing density of the phosphor, the phosphor is mixed with the inorganic binder 1 in a weight ratio of 3 to 5. Since viscosity is too high and it is difficult to apply it uniformly by simply mixing, it is preferable to appropriately adjust the viscosity by adding a viscosity modifier such as n-butyl acetate to the mixed solution to lower the viscosity. After application, heat treatment is performed at 150 ° C. to cure. At this time, it is preferable to use a material that volatilizes by heat treatment as the viscosity adjusting material. The phosphor having an average particle diameter of 3 to 20 μm is used, and the phosphor layer 22 has a thickness of 3
When a phosphor layer having a particle size of 0 to 100 μm, preferably a particle size of 8 to 15 μm and a thickness of 40 to 50 μm is used, a light emitting device having an excellent balance of brightness and efficiency can be obtained. This is because if the phosphor particles are small, the packing density can be increased, but the conversion efficiency is not preferable, and if they are too large, the uniformity tends to deteriorate. Also, if the thickness is thin, the conversion efficiency also deteriorates, and if it is thick, the brightness tends to decrease.
【0028】 次に蛍光体層22側を熱伸縮シート23
上に張り付け、保持板21をスクライブ法やダイシング
法にて所定の大きさに切断し(図3(C))、熱伸縮シ
ート23を引張って複数の波長変換部材7を作製する
(図3(D))。各波長変換部材7の大きさは、LED
チップ1の辺の長さと同一もしくはそれ以上の長さを備
え、LEDチップ1から放射された光の全量が入射する
ようにするのが好ましい。好適にはLEDチップ1の辺
の長さの1.2〜3倍、より好ましくは2倍の大きさと
する。Next, the phosphor layer 22 side is provided with a heat expansion / contraction sheet 23.
It is attached to the top, the holding plate 21 is cut into a predetermined size by a scribing method or a dicing method (FIG. 3 (C)), and the thermal expansion / contraction sheet 23 is pulled to produce a plurality of wavelength conversion members 7 (FIG. 3 ( D)). The size of each wavelength conversion member 7 is LED
It is preferable that the length of the side of the chip 1 is equal to or longer than that of the side of the chip 1 so that the entire amount of light emitted from the LED chip 1 is incident. The size is preferably 1.2 to 3 times, and more preferably twice the side length of the LED chip 1.
【0029】 続いて図2に示したように蛍光体層22
がLEDチップ1の基板11上に位置するようにして波
長変換部材7をLEDチップ1上に配設する。両者の接
続には無機接着剤を用いて接合する。その後、凹部2内
にエポキシ樹脂などの透光性封止材料8を充填して硬化
させる。Subsequently, as shown in FIG. 2, the phosphor layer 22 is formed.
The wavelength conversion member 7 is disposed on the LED chip 1 such that the LED is located on the substrate 11 of the LED chip 1. An inorganic adhesive is used to connect the two. Then, a translucent sealing material 8 such as an epoxy resin is filled in the recess 2 and cured.
【0030】 面実装型LED発光装置10は、以上の
ように構成されており、LEDチップ1から放射された
光はLED発光層を成長したサファイア基板11を通過
した後、直接に波長変換部材に入射する。本実施形態に
よれば、LEDチップ1から放射された光の大部分は主
光放射方向Lに向かって進行し、その光はエポキシ樹脂
等の光劣化を生じ易い材料を通過することなく蛍光体に
到達する。よって、従来例にて説明したLED発光装置
90に比べて、光劣化発生の問題が生じにくくなる。ま
た、均一な波長変換機能を有する波長変換部材7を比較
的容易に得ることができる。更に、波長変換部材を有機
材料層を介することなくLEDチップ上に密接して載置
可能であるから、従来の蛍光材料含有層を通過して光を
取出す場合に比べて、厚みによる色むらの影響を受け難
くなり色むらが生じにくくなる。The surface-mounted LED light-emitting device 10 is configured as described above, and the light emitted from the LED chip 1 passes through the sapphire substrate 11 on which the LED light-emitting layer is grown and then directly becomes a wavelength conversion member. Incident. According to the present embodiment, most of the light emitted from the LED chip 1 travels in the main light emission direction L, and the light does not pass through a material such as an epoxy resin that easily causes photodegradation, and the fluorescent substance. To reach. Therefore, compared to the LED light emitting device 90 described in the conventional example, the problem of occurrence of photodegradation is less likely to occur. Further, the wavelength conversion member 7 having a uniform wavelength conversion function can be obtained relatively easily. Further, since the wavelength conversion member can be placed in close contact with the LED chip without the organic material layer interposed therebetween, color unevenness due to thickness can be reduced as compared with the case where light is taken out through the conventional fluorescent material-containing layer. Less affected and less likely to cause color unevenness.
【0031】 第2の実施形態について、図4および要
部断面図である図5を用いて説明する。A second embodiment will be described with reference to FIG. 4 and FIG. 5 which is a cross-sectional view of a main part.
【0032】 第2の実施形態の発光装置30は、砲弾
型のレンズを備えたLEDランプ形状の発光装置として
いる。発光装置30は、一対のリードフレーム31と、
一方のリードフレーム32の一端に設けた凹部33内に
載置したLEDチップ1および波長変換部材7と、リー
ドフレーム31,32とLEDチップとを電気的に接続
している金属ワイヤー34と、これらを覆う砲弾型のレ
ンズ35とから構成され、LEDチップ1から放射され
た発光が波長変換部材7を通過する間に波長変換され、
この光が主照射方向Lに向かって照射するものとされて
いる。The light emitting device 30 of the second embodiment is an LED lamp-shaped light emitting device provided with a cannonball type lens. The light emitting device 30 includes a pair of lead frames 31,
The LED chip 1 and the wavelength conversion member 7 placed in the recess 33 provided at one end of one lead frame 32, the metal wire 34 electrically connecting the lead frames 31, 32 and the LED chip, and these. And a cannonball-shaped lens 35 that covers the lens, and the wavelength of the light emitted from the LED chip 1 is converted while passing through the wavelength conversion member 7.
This light is supposed to be emitted in the main irradiation direction L.
【0033】 リードフレーム31,32は、導電性お
よび熱伝導性に優れた金属材料により形成され、一方の
リードフレーム32の一端には凹部33が形成されてい
る。凹部33は略すり鉢形状をなしており、平坦部33
aと平坦部33a周囲の反射枠部33bを備え、主照射
方向Lに向かって光を反射するようにしている。The lead frames 31 and 32 are made of a metal material having excellent electrical conductivity and thermal conductivity, and a recess 33 is formed at one end of one lead frame 32. The recess 33 has a substantially mortar shape, and the flat portion 33
a and a reflection frame portion 33b around the flat portion 33a are provided to reflect light in the main irradiation direction L.
【0034】 レンズ35は、透光性の材料により形成
され、LEDチップ1および波長変換部材7等を封止す
ると共に、砲弾型に形成されレンズ作用を奏するように
なされている。レンズ35に用いられる透光性材料とし
ては、例えばエポキシ樹脂、ポリカーボネート樹脂、ア
クリル樹脂、シリコーン樹脂などが挙げられるが、用途
に応じて種々の材料の中から適宜選択でき、複数の材料
層の積層構造としても良い。The lens 35 is formed of a translucent material, seals the LED chip 1 and the wavelength conversion member 7 and the like, and is formed into a bullet shape to have a lens function. The translucent material used for the lens 35 includes, for example, epoxy resin, polycarbonate resin, acrylic resin, silicone resin, etc., which can be appropriately selected from various materials depending on the application, and a plurality of material layers are laminated. Good structure.
【0035】 LEDチップ1および波長変換部材7
は、先の実施形態と同様な点は同一の符号を付し詳細な
説明を省略するが、LEDチップ1の基板と波長変換部
材7の蛍光体層22とを密接して積層させている。LED chip 1 and wavelength conversion member 7
Although the same points as those in the previous embodiment are designated by the same reference numerals and detailed description thereof is omitted, the substrate of the LED chip 1 and the phosphor layer 22 of the wavelength conversion member 7 are laminated in close contact with each other.
【0036】 さらに、本実施形態においては、図5に
示したようにLEDチップ1をサブマウント36に搭載
した後に、これらをリードフレーム32の凹部33内に
載置する構成としている。サブマウント36は、例えば
熱伝導性に優れると共にLEDチップ1の半導体材料と
熱膨張係数の近似した材料を用い、その表面にLEDチ
ップ1のp型電極マウント用ボンディングパッド17お
よびn型電極マウント用ボンディングパッド18と夫々
が接続する第一接続用電極37および第二接続用電極3
8を有している。本実施形態ではシリコン(Si)から
なるサブマウントとし、その表面に絶縁層39を介して
第一接続用電極37を設けたものとし、第二接続用電極
38はシリコン材料と導通するように形成している。Further, in the present embodiment, as shown in FIG. 5, after the LED chip 1 is mounted on the submount 36, these are mounted in the recess 33 of the lead frame 32. The submount 36 is made of, for example, a material having a high thermal conductivity and a thermal expansion coefficient similar to that of the semiconductor material of the LED chip 1, and the surface thereof has a bonding pad 17 for the p-type electrode mount and an n-type electrode mount for the LED chip 1. First connection electrode 37 and second connection electrode 3 which are respectively connected to the bonding pad 18
Have eight. In this embodiment, the submount is made of silicon (Si), and the first connection electrode 37 is provided on the surface of the submount through the insulating layer 39, and the second connection electrode 38 is formed so as to be electrically connected to the silicon material. is doing.
【0037】 ここで、本実施形態のLED発光装置3
0の製造方法について簡単に説明する。まず、p型電極
用マウント用ボンディングパッド17およびn型電極用
マウント用ボンディングパッド18を作製するまでのL
EDチップ1の作製工程および波長変換部材作製工程
を、先の実施形態と同一の工程にて実施する。ただし、
発光層を形成した基板11表面からp型電極マウント用
ボンディングパッド17最表面までの距離とn型電極マ
ウント用ボンディングパッド18最表面までの距離が略
同一であるが、p型電極マウント用ボンディングパッド
17までの距離の方が絶縁層39の厚み分、短くなるよ
うに形成されている。次に、作製したLEDチップ1と
波長変換部材7とを、蛍光体層22がLEDチップ1の
基板11上に位置するようにして波長変換部材7をLE
Dチップ1上に接合して一体化する。また、シリコンウ
エハ表面には、開口部を有する所定形状とした絶縁層3
9を形成する。その後、絶縁層39上および開口してい
るシリコン上に金蒸着等の適宜手段により、第一接続用
電極37および第二接続用電極38をそれぞれ形成し、
パターニングする。その後、第一接続用電極37および
第二接続用電極38上にAu−Snなどからなる共晶電
極19を形成し、波長変換部材とほぼ同一の大きさに切
断してサブマウント36を用意する。Here, the LED light emitting device 3 of the present embodiment
The manufacturing method of 0 will be briefly described. First, L until the bonding pad 17 for mounting the p-type electrode and the bonding pad 18 for mounting the n-type electrode are manufactured.
The manufacturing process of the ED chip 1 and the wavelength conversion member manufacturing process are performed in the same process as the previous embodiment. However,
The distance from the surface of the substrate 11 on which the light emitting layer is formed to the outermost surface of the bonding pad 17 for p-type electrode mounting and the outermost surface of the bonding pad 18 for n-type electrode mounting are substantially the same, but the bonding pad for p-type electrode mounting is used. The distance to 17 is formed to be shorter by the thickness of the insulating layer 39. Next, the manufactured LED chip 1 and the wavelength conversion member 7 are arranged so that the phosphor layer 22 is located on the substrate 11 of the LED chip 1 and the wavelength conversion member 7 is LE.
It is bonded and integrated on the D chip 1. Further, the insulating layer 3 having a predetermined shape having an opening is formed on the surface of the silicon wafer.
9 is formed. After that, the first connection electrode 37 and the second connection electrode 38 are formed on the insulating layer 39 and on the open silicon by appropriate means such as gold vapor deposition,
Pattern. After that, the eutectic electrode 19 made of Au—Sn or the like is formed on the first connection electrode 37 and the second connection electrode 38, and cut into substantially the same size as the wavelength conversion member to prepare the submount 36. .
【0038】 続いて、一体化したLEDチップ1のp
型電極マウント用ボンディングパッド17,n型電極マ
ウント用ボンディングパッド18とサブマウント36の
第一接続用電極37,第二接続用電極38をそれぞれ共
晶電極19を介して接続し、電気的、機械的接触特性を
改善するために約300℃にて加熱処理して、一体化し
たLEDチップ1をサブマウント36上に所謂、フリッ
プチップ方式にて搭載する。Then, p of the integrated LED chip 1 is
The type electrode mounting bonding pad 17, the n type electrode mounting bonding pad 18, the first connecting electrode 37 and the second connecting electrode 38 of the submount 36 are connected via the eutectic electrode 19, respectively, and electrical and mechanical In order to improve the dynamic contact characteristics, heat treatment is performed at about 300 ° C., and the integrated LED chip 1 is mounted on the submount 36 by a so-called flip chip method.
【0039】 その後、LEDチップ1および波長変換
部材7が搭載されているサブマウント36を凹部33の
平坦部33aに導電性接着剤等を用いて固定し、サブマ
ウント36に作製されている第二接続用電極38とリー
ドフレーム31とを、ワイヤーボンディングにて接続す
る。最後にトランスファーモールド法によってエポキシ
樹脂からなるレンズ35にてこれらを被覆する。After that, the submount 36 on which the LED chip 1 and the wavelength conversion member 7 are mounted is fixed to the flat portion 33 a of the recess 33 using a conductive adhesive or the like, and the second submount 36 is manufactured. The connection electrode 38 and the lead frame 31 are connected by wire bonding. Finally, these are covered with a lens 35 made of epoxy resin by a transfer molding method.
【0040】 LED発光装置30は、以上のように構
成されており、LEDチップ1から放射された光はLE
D発光層を成長したサファイア基板11を通過した後、
直接に波長変換部材に入射する。LEDチップとしてピ
ーク波長380nmの紫外線を発光する半導体発光素子
を用いて、この実施形態の発光装置30を作製して寿命
特性を調べたところ、従来の発光装置においては透光性
樹脂の黄変により500時間未満で黄変が観測され発光
出力が低下していたが、連続通電試験において1150
時間後においても初期の発光出力に比べて約98%とい
う高い出力を維持していた。The LED light emitting device 30 is configured as described above, and the light emitted from the LED chip 1 is LE
After passing through the sapphire substrate 11 on which the D light emitting layer is grown,
It directly enters the wavelength conversion member. Using a semiconductor light emitting element that emits ultraviolet light having a peak wavelength of 380 nm as an LED chip, the light emitting device 30 of this embodiment was manufactured and the life characteristics were examined. Yellowing was observed in less than 500 hours and the emission output was reduced, but it was 1150 in the continuous current test.
Even after the lapse of time, a high output of about 98% was maintained compared to the initial light emission output.
【0041】 本実施形態によれば、LEDチップ1か
ら放射された光の大部分は主光放射方向に対して進行
し、その光はエポキシ樹脂等の光劣化を生じ易い材料を
通過することなく蛍光体に到達する。よって、従来例に
て説明したLED発光装置90に比べて、光劣化発生の
問題が生じにくくなる。また、均一な波長変換機能を有
する波長変換部材7を比較的容易に得ることができる。
更に、有機材料層を介することなくLEDチップ上に密
接して載置可能であるから、従来の蛍光材料含有層を通
過して光を取出す場合に比べて、厚みによる色むらの影
響を受け難くなり色むらが生じにくくなる。また、平坦
なサブマウント36上にLEDチップ1等を搭載した後
に、凹部33内に載置するものとしているので、取付作
業が容易になる。According to the present embodiment, most of the light emitted from the LED chip 1 travels in the main light emission direction, and the light does not pass through a material such as an epoxy resin that easily causes photodegradation. Reach the phosphor. Therefore, compared to the LED light emitting device 90 described in the conventional example, the problem of occurrence of photodegradation is less likely to occur. Further, the wavelength conversion member 7 having a uniform wavelength conversion function can be obtained relatively easily.
Furthermore, since it can be placed in close contact on the LED chip without the interposition of an organic material layer, it is less susceptible to color unevenness due to thickness, as compared with the case of extracting light through a conventional fluorescent material-containing layer. The uneven color is less likely to occur. Further, since the LED chip 1 and the like are mounted on the flat submount 36 and then mounted in the recess 33, the mounting work becomes easy.
【0042】 尚、上記した実施形態は、本発明の好適
な具体例であるから、技術的に好ましい種々の限定が付
されているが、本発明の範囲はこれらの態様に限られる
ものではない。例えば図6に示すように、LEDチップ
1の端面から漏れる光も確実に波長変換されるようにL
EDチップ1の端面に蛍光体41を無機系バインダーに
高配合させた塗付液を塗付する等の手段により蛍光体層
42を設けるようにしても良い。この場合には、LED
チップ1端面から放射された光も波長変換されるものと
なり、その光の分、明るい発光装置を得ることができ得
る。Since the above-described embodiment is a preferred specific example of the present invention, various technically preferable limitations are attached, but the scope of the present invention is not limited to these aspects. . For example, as shown in FIG. 6, the light leaking from the end surface of the LED chip 1 is L converted so that the wavelength is surely converted.
The phosphor layer 42 may be provided on the end surface of the ED chip 1 by a method such as applying a coating liquid in which the phosphor 41 is highly mixed with an inorganic binder. In this case, the LED
The light emitted from the end surface of the chip 1 is also wavelength-converted, and a bright light emitting device can be obtained by the amount of the light.
【0043】 更に、砲弾型のレンズ形状としたが他の
形状のレンズとした場合、面実装型LED発光装置の凹
部内にサブマウント上に搭載したLEDチップを配設し
た場合等の、種々の変更も当然に本発明に包含される。Further, in the case where the lens has a bullet-shaped lens shape, but the lens has another shape, there are various cases such as the case where the LED chip mounted on the submount is arranged in the concave portion of the surface mount LED light emitting device. Modifications are naturally included in the present invention.
【0044】[0044]
【発明の効果】以上述べたように、本発明によれば波長
変換部材がLEDチップの基板と密接状態にて接合され
ているので、LEDチップが発光する光の殆ど大部分が
透光性樹脂に入射することなく波長変換部材に到達す
る。したがって、透光性樹脂の経時的な光劣化が抑制さ
れるから、発光寿命特性の優れた波長変換発光装置を得
ることができる。また、均一な厚みの波長変換部材を作
製し、それをLEDチップの基板面と接合するようにし
て作製しているので、LEDチップと波長変換部材を密
接して設けることができ、金属ワイヤーや透光性樹脂が
両者の間に介在することなく取り付けることができる。
したがって、透光性樹脂の経時的な光劣化を抑制して、
発光寿命特性の優れた波長変換発光装置を製造すること
ができる。特に蛍光体として特性の異なる赤色蛍光体、
緑色蛍光体、青色蛍光体をブレンドしてなる混合蛍光体
を用いる場合には、蛍光体層の短時間乾燥化によって蛍
光体分布を均一にすることもでき、色むらの生じにくい
発光装置を再現性よく製造することができ得る、といっ
た顕著な効果を奏する。As described above, according to the present invention, since the wavelength conversion member is bonded in close contact with the substrate of the LED chip, most of the light emitted by the LED chip is a transparent resin. Arrives at the wavelength conversion member without being incident on. Therefore, the light deterioration of the translucent resin with time is suppressed, so that the wavelength conversion light emitting device having excellent emission life characteristics can be obtained. In addition, since the wavelength conversion member having a uniform thickness is manufactured and is manufactured so as to be bonded to the substrate surface of the LED chip, the LED chip and the wavelength conversion member can be provided in close contact with each other. The translucent resin can be attached without interposing between them.
Therefore, suppressing the light deterioration of the translucent resin over time,
A wavelength conversion light emitting device having excellent emission life characteristics can be manufactured. Especially red phosphors with different characteristics as phosphors,
When using a mixed phosphor made by blending a green phosphor and a blue phosphor, it is possible to make the phosphor distribution uniform by drying the phosphor layer for a short time, and reproduce a light emitting device that does not cause color unevenness. It has a remarkable effect that it can be manufactured with good properties.
【図1】本発明による第一の実施形態の面実装型LED
発光装置の概略断面図である。FIG. 1 is a surface-mounted LED according to a first embodiment of the present invention.
It is a schematic sectional drawing of a light-emitting device.
【図2】図1の面実装型LED発光装置の要部を拡大し
て示す断面図である。FIG. 2 is an enlarged cross-sectional view showing a main part of the surface-mounted LED light emitting device of FIG.
【図3】本発明による波長変換部材の製造工程を順に説
明する概略断面図である。FIG. 3 is a schematic cross-sectional view for sequentially explaining a manufacturing process of the wavelength conversion member according to the present invention.
【図4】本発明による第二の実施形態のLED発光装置
を示す説明図である。FIG. 4 is an explanatory diagram showing an LED light emitting device of a second embodiment according to the present invention.
【図5】図4の面実装型LED発光装置の要部を拡大し
て示す断面図である。5 is an enlarged cross-sectional view showing a main part of the surface-mounted LED light emitting device of FIG.
【図6】本発明による他の実施形態の発光装置の要部を
拡大して示す断面図である。FIG. 6 is an enlarged cross-sectional view showing a main part of a light emitting device according to another embodiment of the present invention.
【図7】従来の面実装型LED発光装置を示す概略断面
図である。FIG. 7 is a schematic cross-sectional view showing a conventional surface mount LED light emitting device.
1 LEDチップ 2 凹部 3 反射枠 4 基体 5 第一接続用電極 6 第二接続用電極 7 波長変換部材 8 透光性封止材料 10,30 発光装置 11 基板 12 n型半導体層 13 p型半導体層 14 p型オーミック電極 15 絶縁膜 16 n型オーミック電極 17 p電極マウント用ボンディングパッド 18 n電極マウント用ボンディングパッド 19 共晶電極 21 保持板 22 蛍光体層 23 熱伸縮シート 31,32 リードフレーム 33 凹部 34 金属ワイヤー 35 レンズ 36 サブマウント 37 第一接続用電極 38 第二接続用電極 39 絶縁層 41 蛍光体 90 面実装型LED発光装置 91 LEDチップ 92 凹部 93 基部 94 透光性樹脂 95 蛍光体 96 電極 97 蛍光体含有樹脂層 1 LED chip 2 recess 3 reflection frame 4 base 5 First connection electrode 6 Second connection electrode 7 Wavelength conversion member 8 Translucent sealing material 10,30 Light emitting device 11 board 12 n-type semiconductor layer 13 p-type semiconductor layer 14 p-type ohmic electrode 15 Insulating film 16 n-type ohmic electrode Bonding pad for 17 p electrode mount Bonding pad for 18 n-electrode mount 19 Eutectic electrode 21 holding plate 22 Phosphor layer 23 Thermal expansion sheet 31,32 Lead frame 33 recess 34 metal wire 35 lens 36 submount 37 First connection electrode 38 Second connection electrode 39 Insulation layer 41 Phosphor 90 Surface mount LED light emitting device 91 LED chip 92 recess 93 base 94 Translucent resin 95 phosphor 96 electrodes 97 Phosphor-containing resin layer
───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5F041 AA05 AA11 AA44 CA40 CA46 CA77 CA92 CA93 CB11 CB15 DA09 DA18 DA20 DA44 DA57 DB01 DB03 EE25 ─────────────────────────────────────────────────── ─── Continued front page F-term (reference) 5F041 AA05 AA11 AA44 CA40 CA46 CA77 CA92 CA93 CB11 CB15 DA09 DA18 DA20 DA44 DA57 DB01 DB03 EE25
Claims (4)
た発光素子と、該発光素子の放射光を吸収して異なる波
長の光を放出する波長変換部材と、これらを一体化して
封止する透光性材料とを備えた発光装置において、上記
発光素子は、発光層表面側にp型電極およびn型電極が
反射性材料により形成されると共に、その各表面にはp
型電極マウント用ボンディングパッドおよびn型電極マ
ウント用ボンディングパッドが、発光層を形成した基板
表面からp型電極マウント用ボンディングパッド最表面
までの距離とn型電極マウント用ボンディングパッド最
表面までの距離が略同一となるように形成され、該マウ
ント用ボンディングパッドを介して外部接続用電極にワ
イヤーを用いることなく電気的に接続されており、上記
波長変換材部材は、上記基板の発光層と反対側の表面に
密接して設けられ、かつ、上記発光素子と同等以上の大
きさとされている、ことを特徴とする発光装置。1. A light emitting element having a semiconductor light emitting layer provided on a transparent substrate, a wavelength conversion member that absorbs emitted light of the light emitting element and emits light of different wavelengths, and these are integrally sealed. In the light-emitting device including a light-transmitting material that stops light emission, the light-emitting element includes a p-type electrode and an n-type electrode formed of a reflective material on the surface of the light emitting layer, and a p-type electrode and an n-type electrode on each surface of the light emitting layer.
The distance between the bonding pad for the n-type electrode mounting and the bonding pad for the n-type electrode mounting is the distance from the substrate surface on which the light emitting layer is formed to the outermost surface of the bonding pad for the p-type electrode mounting and the outermost surface of the bonding pad for the n-type electrode mounting. They are formed to be substantially the same, and are electrically connected to the electrodes for external connection via the bonding pads for mounting without using wires, and the wavelength conversion material member is on the opposite side of the light emitting layer of the substrate. A light emitting device, wherein the light emitting device is provided in close contact with the surface of the light emitting device and has a size equal to or larger than that of the light emitting element.
ト用ボンディングパッドとサブマウント上に設けられた
電極が接続するように、発光層側がサブマウントと対向
するようにしてサブマウント表面に搭載されており、該
サブマウントを介して発光素子に給電するための電極が
接続されている、ことを特徴とする請求項1に記載の発
光装置。2. The light emitting device is mounted on the surface of the submount with the light emitting layer side facing the submount so that the mounting bonding pad of the device and the electrode provided on the submount are connected. The light emitting device according to claim 1, wherein an electrode for supplying power to the light emitting element is connected through the submount.
体層が設けられている、ことを特徴とする請求項1また
は請求項2に記載の発光装置。3. The light emitting device according to claim 1, wherein a phosphor layer is provided on an end surface of the light emitting layer of the light emitting element.
た発光素子と、該発光素子の放射光を吸収して異なる波
長の光を放出する波長変換部材と、これらを一体化して
封止する透光性材料とを備えた発光装置の製造方法であ
って、上記基板上に半導体発光層を形成する工程と、半
導体発光層の上に反射性材料によりp型電極およびn型
電極を形成する工程と、それらの各表面にp型電極マウ
ント用ボンディングパッドおよびn型電極マウント用ボ
ンディングパッドを、発光層を形成した基板表面からp
型電極マウント用ボンディングパッド最表面までの距離
とn型電極マウント用ボンディングパッド最表面までの
距離が略同一になるように形成する工程と、を順に行う
発光素子チップ作製工程と、透光性の保持板の少なくと
も一方の表面上に無機系バインダー中に蛍光材料を分散
させた塗付液を用いて蛍光体膜を形成する工程と、伸縮
シート上に蛍光体膜を設けた保持板を載置した後に切断
し、その後に該伸縮シートを伸ばして波長変換部材を分
割する工程とを有する波長変換部材作製工程と、発光装
置の外部接続用の一対の電極に発光素子チップ作製工程
を終えた上記p型電極マウント用ボンディングパッドお
よびn型電極マウント用ボンディングパッドを夫々電気
的に接続する工程と、発光素子の基板の発光層と反対側
表面に波長変換部材作製工程を終えた波長変換部材を載
置する工程と、を有する発光素子配設工程と、発光素子
配設工程の後に、発光素子、波長変換部材および外部接
続用電極を透光性材料にて封止する工程とを、備えてい
ることを特徴とする発光装置の製造方法。4. A light emitting element having a semiconductor light emitting layer provided on a transparent substrate, a wavelength conversion member that absorbs the emitted light of the light emitting element and emits light of different wavelengths, and these are integrally sealed. A method for manufacturing a light emitting device comprising a translucent material for stopping, comprising: forming a semiconductor light emitting layer on the substrate; and forming a p-type electrode and an n-type electrode on the semiconductor light emitting layer with a reflective material. The step of forming and the bonding pad for p-type electrode mounting and the bonding pad for n-type electrode mounting on each surface are formed from the substrate surface on which the light emitting layer is formed by p
A light emitting element chip manufacturing step of sequentially performing a step of forming the distance to the outermost surface of the bonding pad for die electrode mounting and a distance to the outermost surface of the bonding pad for n type electrode mounting, A step of forming a phosphor film on at least one surface of the holding plate using a coating liquid in which a fluorescent material is dispersed in an inorganic binder, and a holding plate provided with the phosphor film on an elastic sheet are placed. After that, the wavelength conversion member manufacturing step having a step of dividing the wavelength conversion member by stretching the elastic sheet after cutting, and the light emitting element chip manufacturing step for a pair of electrodes for external connection of the light emitting device are finished. A step of electrically connecting the bonding pad for mounting the p-type electrode and the bonding pad for mounting the n-type electrode, and the wavelength conversion unit on the surface of the substrate of the light-emitting element opposite to the light-emitting layer. After the manufacturing step, the step of placing the wavelength conversion member is placed, and after the step of providing the light emitting element, the light emitting element, the wavelength conversion member, and the external connection electrode are made of a translucent material. And a step of encapsulating. A method for manufacturing a light emitting device, comprising:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001293673A JP4447806B2 (en) | 2001-09-26 | 2001-09-26 | Light emitting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001293673A JP4447806B2 (en) | 2001-09-26 | 2001-09-26 | Light emitting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003101074A true JP2003101074A (en) | 2003-04-04 |
| JP4447806B2 JP4447806B2 (en) | 2010-04-07 |
Family
ID=19115418
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001293673A Expired - Fee Related JP4447806B2 (en) | 2001-09-26 | 2001-09-26 | Light emitting device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4447806B2 (en) |
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