JP2003034591A - Molecular beam source cell for depositing thin film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To make it possible to produce evaporating molecules by reducing the temperature gradient in crucibles 10, 20 to efficiently evaporate evaporation materials. SOLUTION: A molecular beam source cell for depositing a thin film has cylindrical evaporation-material containing parts 11, 21, which contain evaporation materials a, b in crucibles 10, 20, on the side closer to a bottom, and has bottleneck parts 12, 22 in the tip side part closer to discharging ports 14, 24. The portions from the bottleneck parts to the discharging ports 14, 24 are formed as taper guide parts 13, 23 with inner diameters gradually being larger. Furthermore, heaters 15, 16, 25, 26 are divided into first heaters 15, 25, which heat the evaporation-material containing parts 11, 21, and second heaters 16, 26, which heat the portions ranging from the bottleneck parts 12, 22 to the taper guide parts 13, 23.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a molecular beam source cell for thin film deposition, in which a vaporized material is heated to melt and vaporize the vaporized material to generate vaporized molecules for growing a thin film on a solid surface. In particular, the present invention relates to a molecular beam source cell suitable for vaporizing an organic electroluminescent material having a low thermal conductivity.

[0002]

2. Description of the Related Art A thin film deposition apparatus called a molecular beam epitaxy apparatus places a substrate such as a semiconductor wafer in a vacuum chamber capable of reducing the pressure to a high vacuum, heats it to a required temperature, and grows it on the thin film growth surface of this substrate. A molecular beam source cell such as a Knudsen cell is installed for this purpose. The evaporation material housed in the crucible of this molecular beam source cell is heated by a heater to melt and evaporate, and the evaporated molecules generated by this are incident on the thin film growth surface of the substrate, and the thin film is epitaxially grown on that surface and evaporated. Form a film of material.

FIG. 8 shows a conventional example of a molecular beam source cell used in such a thin film deposition apparatus. In this molecular beam source cell, an evaporation material c is housed in a crucible 3 made of, for example, PBN (pyrolytic boron nitride) having high thermal and chemical stability, and the evaporation material c is placed in the crucible. Three
Is heated by an electric heater 5 provided on the outer side of the substrate to melt and vaporize the vaporized material to generate vaporized molecules, which are emitted from the emission port 4 and deposited on the substrate.

As is apparent from FIG. 8, the conventional crucible 3 of the molecular beam source cell is a bottomed cylindrical shape having a substantially uniform inner diameter as a whole, and the heater 5 for heating this from the surroundings is as follows. A sheathed heater wound in a coil is used. The heating temperature of the heater 5 is controlled while the temperature of the crucible 3 is measured by the thermocouple 7 having a temperature measuring contact in contact with the bottom center of the crucible 3, and the evaporation material c is evaporated.

In recent years, in fields such as displays and optical communication,
Research and development of organic electroluminescence elements (organic EL elements) are under way. This organic EL device is
It is an element in which a light emitting layer is formed of an organic low molecule or an organic polymer material having an L light emitting ability, and its characteristics are drawing attention as a self light emitting element. For example, its basic structure is
A film of a hole transport material such as triphenyldiamine (TPD) is formed on the hole injecting electrode, and a fluorescent substance such as aluminum quinolinol complex (Alq ₃ ) is laminated as a light emitting layer on the film, and further Mg, Li, Cs, etc. Is a metal electrode having a small work function as an electron injection electrode.

[0006]

[Problems to be Solved by the Invention] Such an organic E
Each layer forming the L element is formed using the thin film deposition apparatus as described above. In particular, the organic EL material for forming the organic EL film has a low melting point and a low thermal conductivity.
Also, since it is a polymer material, if it is exposed to high temperature for a long time, the chemical bonds that form the chains of the polymer will be broken, etc.
It is easily damaged by heat. When subjected to such heat damage, the film formed by the deposition of molecules may not have the required properties.

However, in the molecular beam source cell as described above, since the sheath heater is used as the heater 5, the heat generated in the heating wire of the heater 5 passes through the inorganic insulating powder such as magnesia and the sheath such as stainless steel. Since the heat is transferred to the crucible 3, the heat response is poor and the evaporation material is exposed to a high temperature for a long time before being evaporated.

Further, as shown by a chain double-dashed line in FIG. 8, the temperature of the evaporation material c near the peripheral wall of the crucible 3 near the heater 5 is high, and the temperature of the evaporation material c at the central portion far from the peripheral wall of the crucible 3 is high. A temperature distribution that lowers the temperature will occur. Therefore, in the peripheral portion near the peripheral wall of the crucible 3 heated by the heater, the temperature becomes extremely low on the central side of the crucible 3 even if the required temperature for evaporation is obtained, and the evaporation material c evaporates. The temperature is below the temperature. As a result, of the evaporation material c stored in the crucible 3, only the peripheral portion close to the peripheral wall of the crucible 3 is evaporated, and the evaporation material c in the central portion of the crucible 3 remains without being evaporated. Therefore, not only the yield of the evaporation material c is poor, but also defects in the film due to the non-uniformity of the temperature are likely to occur.

Further, the non-uniformity of this temperature distribution is shown in FIG.
Also occurs along the direction of the central axis of the crucible 3 indicated by the alternate long and short dash line. FIG. 9 schematically shows the temperature distribution in the central axis direction of the crucible 3 and the temperature distribution in the radial direction of the discharge port 4.
Further, in the cylindrical crucible 3 as described above, since the molecules of the evaporation material c emitted from the emission port 4 are radiated along the inner surface of the peripheral wall of the crucible 3, the crucible 3 shown by a dashed line in FIG. The flux density of molecules near the extension line in the central axis direction becomes extremely large. As a result, the film formed by depositing the molecules of the evaporation material c on the substrate has an extremely large film thickness at the portion where the central axis of the crucible 3 shown by the alternate long and short dash line in FIG. The non-uniformity of the film thickness occurs such that the film thickness becomes thicker and the film thickness becomes sharply thinner with increasing distance.

In view of the above problems in the conventional molecular beam source cell, the present invention reduces the temperature gradient in the crucible and is a polymer such as an organic EL material, which is a high evaporation material having a low thermal conductivity. However, it is an object of the present invention to efficiently vaporize and generate vaporized molecules without causing thermal damage. Further, in addition to the main component forming the film, a minor component such as a dopant such as a minor component is simultaneously released toward the substrate to enable reactive vapor deposition. In addition, it is intended to enable film formation with a uniform film thickness.

[0011]

According to the present invention, in order to achieve the above-mentioned object, a bottomed cylinder having evaporation material storage portions 11 and 21 on the side close to the bottom of the crucibles 10 and 20 for storing the evaporation materials a and b. And the constricted portions 12 and 22 are provided at the tip side portions near the ejection ports 14 and 24, and the constricted portions 12 and 22 to the ejection ports 14 and 24 are tapered guide portions 13 and 23.
And Then, the former part and the latter part of the crucibles 10 and 20 were heated by different heaters 15, 25, 16 and 26, respectively, so that optimum temperature distributions could be formed respectively.

The molecular beam source cell for thin film deposition according to the present invention, which will be described in more detail, comprises a vaporization material a for the crucibles 10 and 20,
evaporative material storage portions 11 and 2 on the side close to the bottom for storing b
1 has a cylindrical shape, and has constricted portions 12 and 22 at a tip side portion near the discharge ports 14 and 24, and a portion from the constricted portions 12 and 22 to the discharge ports 14 and 24 has a taper whose inner diameter gradually increases. The taper guide portions 13 and 23 are provided.
Further, the heaters 15, 16, 25, and 26 include the first heaters 15 and 25 that heat the evaporation material storage units 11 and 21, and
It is divided into second heaters 16 and 26 for heating a portion extending from the constricted portions 12 and 22 to the taper guide portions 13 and 23.

In such a molecular beam source cell for thin film deposition according to the present invention, the evaporation material storage portions 11 and 21 of the crucibles 10 and 20 near the bottom for storing the evaporation materials a and b have a cylindrical shape. On the other hand, the taper guide portion has constricted portions 12 and 22 at the tip side portion near the ejection ports 14 and 24, and the constricted portions 12 and 22 to the ejection ports 14 and 24 are tapered so that the inner diameter gradually increases. 13 and 23, the molecular flux generated by the evaporation of the evaporation materials a and b stored in the evaporation material storage sections 11 and 21 spreads due to the taper formed in the taper guide sections 13 and 23. Is released. Therefore, the density of the molecular flux is not concentrated on the extension of the central axis of the crucibles 10 and 20. Thereby, a thin film having a uniform film thickness can be formed on the film formation surface of the substrate 33.

Further, heaters 15, 16, 25, 26
However, the first heaters 15 and 25 for heating the evaporation material storage portions 11 and 21, and the constricted portions 12 and 22 to the taper guide portion 1
Second heaters 16 and 2 for heating a portion extending over 3, 23
Since it is divided into 6, each part can be heated to an optimum temperature. In particular, since the portions extending from the constricted portions 12 and 22 to the taper guide portions 13 and 23 are heated by the second heaters 16 and 26, recondensation of molecules in the constricted portions 12 and 22 does not occur.

Such a molecular beam source cell can be constructed by combining a plurality of cells. Specifically, the first molecular beam source cell 1 including the crucible 10 that contains the evaporation material a that is the main component to be deposited on the film formation surface of the substrate 33, and the subcomponents that are deposited on the film formation surface of the substrate 33. The second molecular beam source cell 2 provided with the crucible 20 for containing the evaporation material b As a result, the main component of the thin film can be deposited on the film formation surface of the substrate 33, and at the same time, the dopant material can be injected as a subcomponent.

In such a compound molecular beam source cell, a throttle hole 32 for limiting the emission of molecules of the evaporation material b from the emission port 24 of the crucible 20 of the second molecular beam source cell 2 is provided. Thereby, the molar ratio of the molecule of the main component radiated from the first molecular beam source cell 1 to the molecule of the subcomponent radiated from the second molecular beam source cell can be set to a predetermined molar ratio.

The crucible 2 of the second molecular beam source cell 2 as described above
The throttle hole 32 of 0 may be formed by a wall integral with the crucible 20, but a cup-shaped closing member 31 having the same taper as the inner peripheral side taper of the taper guide portion 23 of the crucible 20 is formed in the taper guide portion 23. The cup-shaped closing member 31 is fitted with a throttle hole 32 in the bottom wall. If the cup-shaped closing member 31 is coated with the heat-absorbing endothermic coating 28 or if the cup-shaped closing member 31 is made of a heat-absorbing endothermic material, the closing member 31 will absorb the heat of the second heater 26. It is possible to absorb, prevent the above-mentioned recondensation of molecules, and reliably prevent clogging of the throttle hole 32.

In the other crucible 10 of the first molecular beam source cell 1, the evaporation material storage portion 11 is constricted from the upper end portion to the constricted portion 12.
Further, a heat-absorptive endothermic coating 18 is applied to a portion reaching the discharge port 14 via the taper guide portion 13. In this case as well, the heat of the second heater 16 is similarly absorbed by the endothermic coating 18, so that recondensation of molecules in the constricted portion 12 of the crucible 10 can be reliably prevented.

In these molecular beam source cells 1 and 2, the crucible 1
The temperatures 0 and 20 are measured by strip-shaped temperature measuring elements 17 and 27 wound around the bottom side of the evaporation material storage portions 11 and 21. The exact temperature of the crucibles 10, 20 is more likely to be reproduced on the peripheral wall than on its bottom wall, which allows the crucible 10,
By measuring the correct temperature of 20, accurate temperature control becomes possible.

[0020]

BEST MODE FOR CARRYING OUT THE INVENTION Next, embodiments of the present invention will be described specifically and in detail with reference to the drawings.
In FIG. 1, as a thin film to be formed on the substrate 33, the evaporation material a, which is the main component, is evaporated, the first molecular beam source cell 1 that emits its molecules, and the evaporation material b, which is a subcomponent such as a dopant, are evaporated. It is an example of the composite molecular beam source cell which combined with the 2nd molecular beam source cell 2 which discharges the molecule.

2 and 3 are a sectional view and a side view showing a first molecular beam source cell 1 which evaporates the evaporation material a as a main component and emits its molecules. The crucible 10 is in the form of a container made of PBN (pyrolytic boron nitride) or the like, and the evaporation material storage unit 1 for storing the evaporation material a described above.
1, a constricted part 12 on the discharge port 14 side of the evaporation material storage part 11 and having a partially narrowed inner diameter and outer shape, and a tapered guide part 13 extending from the constricted part 12 to the discharge port 14.

Evaporation material storage section 11 for storing evaporation material a
Has a bottomed cylindrical shape, and a taper that tapers off is formed on the upper side of the discharge port 14 side, and has a constricted portion 12 with the smallest inner diameter at the tip. A portion from the constricted portion 12 to the discharge port 14 is a tapered guide portion 13 having a taper whose inner diameter and outer diameter are gradually increased. The discharge port 14 is provided at the tip of the taper guide portion 13.
Is open.

This crucible 10 has two heaters 15, 16
It is surrounded by. The first heater 15 is arranged around the evaporation material storage portion 11 of the crucible 10 and heats the evaporation material storage portion 11. The first heater 15 has a linear heater meandering in the longitudinal direction of the crucible 10 and is bent so as to surround the outer peripheral surface of the crucible 10. Second heater 1
6 is disposed around the portion from the upper portion of the evaporation material storage portion 11 of the crucible 10 to the discharge port 14 via the constriction portion 12 and the taper guide portion 13, and heats that portion.
The second heater 16 also has a linear heater meandering in the longitudinal direction of the crucible 10 and is bent so as to surround the outer peripheral surface of the crucible 10.

The outer peripheral surface of the portion of the crucible 10 heated by the second heater 16, that is, the portion from the upper portion of the evaporation material storage portion 11 of the crucible 10 to the discharge port 14 through the constriction portion 12 and the taper guide portion 13. At least one of the inner peripheral surface and the inner peripheral surface is coated with a heat-absorptive coating 18, which has good heat absorption and is chemically and thermally stable, for example, graphite coating. In the example shown in FIG. 3, an endothermic coating 18 is applied to the outer peripheral surface of the crucible 10. A strip-shaped temperature measuring element 17 is wound near the bottom of the evaporation material storage portion 11 of the crucible 10. The temperature measurement element 17 measures the temperature near the bottom of the evaporation material storage portion 11 of the crucible 10.

On the other hand, FIG. 4 and FIG. 5 show the evaporation material b as a subcomponent.
FIG. 6 is a cross-sectional view and a side view showing a second molecular beam source cell 2 that evaporates and releases the molecules thereof, and FIG. 6 is an exploded vertical side view of the vicinity of the upper end portion thereof. This crucible 20 is also basically the same as the above-mentioned crucible 10. That is, the crucible 20 is P
The container is made of BN (pyrolytic boron nitride) or the like, and has an evaporation material storage portion 21 for storing the above-described evaporation material b and a discharge port 24 side from the evaporation material storage portion 21. A constricted portion 22 having a narrow inner diameter and an outer shape, and a taper guide portion 23 extending from the constricted portion 22 to the discharge port 24 are provided.

Evaporation material storage section 21 for storing evaporation material b
Has a bottomed, substantially cylindrical shape, and a taper that tapers off is formed on the upper side of the discharge port 24 side, and has a constricted portion 22 with the smallest inner diameter at the tip. This constricted part 22
The portion from the tip to the outlet 24 has a taper guide portion 2 in which a taper is formed so that the inner diameter and the outer diameter gradually increase.
It is 3. A discharge port 24 opens at the tip of the taper guide portion 23.

However, in the crucible 20 for evaporating the evaporation material b which is the accessory component, a cup-shaped closing member 31 is fitted in the portion of the taper guide portion 23. The closing member 31 has the same taper on the outer circumference as the inner circumference side taper of the taper guide portion 23 of the crucible 20.
It is tightly fitted in 3. Furthermore, several throttle holes 32 are opened in the bottom wall of the cup-shaped closing member 31. The inside of the evaporation material storage portion 21 of the crucible 20 communicates with the discharge port 24 side through a throttle hole 32 provided in the bottom wall of the closing member 31. Without using such a closing member 31, a wall for partitioning the inside of the evaporation material storage part 21 and the discharge port 24 side may be provided in the constricted part 22 of the crucible 20, and a throttle hole may be provided in this wall. Good.

At least one of the inner surface and the outer surface of the closing member 31 is coated with good heat absorption and is chemically and thermally stable, for example, endothermic coating such as graphite coating 2
8 has been given. In the example of the closing member 31 shown on the left side in FIGS. 4 and 6, the endothermic coating 28 is applied to the inner surface of the closing member 31. Further, the closing member 31 shown on the right side in FIG.
Instead of applying the endothermic coating 28, as in the above example, the closing member 31 itself may be formed of an endothermic material such as graphite having a good heat absorbing property and being chemically and thermally stable.

This crucible 20 has two heaters 25, 26.
It is surrounded by. The first heater 25 is arranged around the evaporation material storage part 21 of the crucible 20 and heats the evaporation material storage part 21. The first heater 25 has a linear heater meandering in the longitudinal direction of the crucible 20 and is bent so as to surround the outer peripheral surface of the crucible 20. Second heater 2
6 is arranged around a portion from the upper portion of the evaporation material storage portion 21 of the crucible 20 to the discharge port 24 through the constriction portion 22 and the taper guide portion 23, and heats the portion and the taper guide portion 23 of the crucible 20. The closing member 31 is heated via. The second heater 26 also has a linear heater meandering in the longitudinal direction of the crucible 20 and is bent along the outer peripheral surface of the crucible 20.

A strip-shaped temperature measuring element 27 is wound near the bottom of the evaporation material storage portion 21 of the crucible 20.
Thus, the temperature near the bottom of the evaporation material storage portion 21 of the crucible 20 is measured. In the crucible 10 of the first molecular beam source cell 1 and the crucible 20 of the second molecular beam source cell 2, the evaporation material is stored in the evaporation material storage portions 11 and 21, respectively. in this case,
In the case of evaporating a material having poor thermal conductivity such as an organic electroluminescent material, as proposed in the previous patent application by the present applicants (Japanese Patent Application No. 2001-192261), the evaporation materials a and b, A heat transfer medium that is thermally and chemically stable and has a higher thermal conductivity than the evaporation materials a and b is stored in a dispersed manner. Alternatively, a granular heat transfer medium is used as a core so that its surface is covered with evaporation materials a and b, and this is provided in the evaporation material storage unit 1 of the crucibles 10 and 20.
Store in 1, 21. The heat transfer medium used is
Pyrolytic Boron Nitride (PBN),
Examples thereof include those made of a high thermal conductive material such as silicon carbide and aluminum nitride.

FIG. 7 shows the evaporation material storage portion 11 of the crucible 10 of the crucible 10 of the first molecular beam source cell 1 described above.
2 schematically shows the temperature distribution in the central axis direction and the temperature distribution in the radial direction of the discharge port 14 when the evaporation material a is stored together with the heat transfer medium and heated. Of course, this is a case where the crucible 10 is heated by the heaters 15 and 16 in a vacuum.

Regarding the temperature distribution in the central axis direction of the crucible 10, the temperature of the portion where the endothermic coating 18 is applied is heated by the second heater 16, and the temperature is maximum at the discharge port 14. The temperature distribution in the central axis direction of the evaporation material storage unit 11 that stores the evaporation material a together with the heat transfer medium is substantially uniform.
The temperature distribution in the radial direction of the discharge port 14 of the crucible 10 is slightly low in the center, but is almost constant.

For example, as shown in FIG. 1, in the first and second molecular beam source cells 1 and 2, the central axes of the crucibles 10 and 20 are relative to a line perpendicular to the film formation surface of the substrate 33. 1 each
It is arranged so as to be inclined by 5 ° and their central axes intersect at the center of the substrate 33. As described above, in the molecular beam source cells 1 and 2 as described above, the emission ports 14 of the crucibles 10 and 20,
A tapered guide portion 1 having constricted portions 12 and 22 at a tip end side portion close to 24, and a portion from the constricted portions 12 and 22 to the discharge ports 14 and 24 having a taper whose inner diameter gradually increases.
3 and 23, the evaporation material storage units 11 and 21
The flux of molecules generated by the evaporation of the evaporation materials a and b stored in is discharged while being spread by the taper formed in the taper guide portions 13 and 23. Thereby, a thin film having a uniform film thickness can be formed on the film formation surface of the substrate 33.

Further, the heaters 15, 16, 25, 26
However, the first heaters 15 and 25 for heating the evaporation material storage portions 11 and 21, and the constricted portions 12 and 22 to the taper guide portion 1
Second heaters 16 and 2 for heating a portion extending over 3, 23
Since it is divided into 6, each part can be heated to an optimum temperature. In particular, since the portions extending from the constricted portions 12 and 22 to the taper guide portions 13 and 23 are heated by the second heaters 16 and 26, recondensation of molecules in the constricted portions 12 and 22 does not occur.

Further, as shown in FIG. 1, in the composite molecular beam source cell in which the first and second molecular beam source cells 1 and 2 are combined, the outlet of the crucible 20 of the second molecular beam source cell 2 is formed. Two
Restrictor 32 for limiting the release of molecules of the vaporized material b from
By providing, the molecular weight of the accessory component radiated from the second molecular beam source cell is smaller than the molecular weight of the main component molecule radiated from the first molecular beam source cell 1. Therefore, the molar ratio of the molecule of the main component radiated from the first molecular beam source cell 1 to the molecule of the subcomponent radiated from the second molecular beam source cell can be set to a required molar ratio.

[0036]

As described above, in the molecular beam source cell for thin film deposition according to the present invention, even a polymer such as an organic EL material having a low thermal conductivity can be evaporated without causing thermal damage to the crucible. It is possible to efficiently transfer heat within the crucible, thereby reducing the temperature gradient in the crucible, and efficiently evaporating the evaporation material to generate evaporation molecules. Further, in addition to the main component forming the film, a minor component such as a dopant, which is a minor component, is simultaneously released toward the substrate, and reactive vapor deposition becomes possible. In addition, it is possible to form a film having a uniform film thickness.

[Brief description of drawings]

FIG. 1 is a schematic vertical sectional side view showing an example of arrangement of a composite molecular beam source cell for thin film deposition according to an embodiment of the present invention.

FIG. 2 is a vertical cross-sectional side view showing an example of a molecular beam source cell for main component evaporation of a thin film deposition molecular beam source cell according to the same embodiment in a state in which an evaporation material is not housed.

FIG. 3 is a side view showing an example of a molecular beam source cell for vaporizing the main component.

FIG. 4 is a vertical cross-sectional side view showing an example of a molecular beam source cell for sub-component evaporation of a thin film deposition molecular beam source cell according to the same embodiment in a state in which an evaporation material is not housed.

FIG. 5 is a side view showing an example of a molecular beam source cell for vaporizing the accessory component.

FIG. 6 is an enlarged exploded vertical cross-sectional side view of an essential part showing an example of a molecular beam source cell for vaporizing the accessory component.

FIG. 7 is a schematic diagram showing a temperature distribution in a crucible of an example of a molecular beam source cell for evaporating a main component of a thin film deposition molecular beam source cell according to the same embodiment.

FIG. 8 is a vertical sectional side view showing a conventional example of a molecular beam source cell for thin film deposition.

FIG. 9 is a schematic diagram showing a temperature distribution in a crucible of a conventional example of a molecular beam source cell for thin film deposition.

[Explanation of symbols]

1 First molecular beam source cell 2 Second molecular beam source cell 10 Crucible of the first molecular beam source cell 11 Evaporation material storage section of crucible of first molecular beam source cell 12 Constriction part of the crucible of the first molecular beam source cell 13 Tapered guide part of crucible of first molecular beam source cell 14 First molecular beam source cell crucible outlet 15 First heater of first molecular beam source cell 16 Second heater of first molecular beam source cell 17 Temperature measuring element of crucible of first molecular beam source cell 18 Endothermic coating of the crucible of the first molecular beam source cell 20 Crucible of the second molecular beam source cell 21 Evaporation material storage section of crucible of second molecular beam source cell 22 Constriction of crucible of second molecular beam source cell 23 Tapered guide of crucible of second molecular beam source cell 24 Crucible outlet of the second molecular beam source cell 25 First heater of second molecular beam source cell 26 Second Heater of Second Molecular Beam Source Cell 27 Temperature measuring element of crucible of second molecular beam source cell 28 Endothermic coating of the closing member of the crucible of the second molecular beam source cell 31 Closing member for crucible of second molecular beam source cell 32 Constriction hole in crucible of second molecular beam source cell a Evaporation material for the first molecular beam source cell b Evaporation material for the second molecular beam source cell

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[Procedure amendment]

[Submission date] September 20, 2001 (2001.9.2)
0)

[Procedure Amendment 1]

[Document name to be amended] Statement

[Name of item to be corrected] Claim 3

[Correction method] Change

[Correction content]

Claims (7)

[Claims] 1. Heaters (15), (16), (16) in which evaporation materials (a), (b) housed in crucibles (10), (20) are arranged around the crucibles (10), (20). 25), (2
6) is heated and evaporated to release the molecule from the emission port (14),
In the molecular beam source cell for thin film deposition, which emits from (24) and is deposited on the film formation surface of the substrate (33) to form a thin film,
Evaporation material storage parts (11), (2) near the bottom for storing the evaporation materials (a), (b) of the crucibles (10), (20).
1) has a cylindrical shape, and has constricted portions (12) and (22) on the tip side portion near the ejection openings (14) and (24). 14), (24)
The parts up to are taper guide parts (13) and (23) having a taper whose inner diameter gradually increases, and the heaters (15), (16), (25) and (26) are the evaporation material storage parts ( 11), the first heater (1) for heating (21)
5) and (25) and second heaters (16) and (26) for heating the portions extending from the constricted portions (12) and (22) to the taper guide portions (13) and (23). A molecular beam source cell for thin film deposition, characterized by: 2. A first molecular beam source cell (1) comprising a crucible (10) containing an evaporation material (a) as a main component to be deposited on a film forming surface of a substrate (33), and a substrate (33). The second molecular beam source cell (2) provided with a crucible (20) containing an evaporation material (b) which is an accessory component to be deposited on the film-forming surface of (1), in combination with the second molecular beam source cell (2) according to claim 1. Molecular beam source cell for thin-film deposition. 3. A crucible (1) of a first molecular beam source cell (1)
0) is a discharge port (1) from the upper end of the evaporation material storage section (11) through the constriction section (12) and the taper guide section (13).
The molecular beam source cell for thin film deposition according to claim 1 or 3, wherein a heat absorbing coating (18) is applied to a portion up to 4). 4. The second molecular beam source cell (2) has a restriction hole (32) for restricting the emission of molecules of the evaporation material (b) from the emission port (24) of the crucible (20). The molecular beam source cell for thin film deposition according to any one of claims 1 to 3. 5. The crucible (2) of the second molecular beam source cell (2).
The throttle hole (32) of (0) has the same taper as the inner peripheral side taper of the taper guide part (23) of the crucible (20), and is a cup-shaped closure fitted in the taper guide part (23). The molecular beam source cell for thin film deposition according to claim 4, which is provided on a bottom wall of the member (31). 6. The crucible (2) of the second molecular beam source cell (2).
0) has a cup-shaped closing member (31) fitted inside the taper guide portion (23) coated with a heat-absorbing endothermic coating (28) or has a cup-shaped closing member (31). 6. The molecular beam source cell for thin film deposition according to claim 5, characterized in that is made of a heat absorbing material. 7. The temperature of the crucibles (10), (20) is measured by temperature measuring elements (17), (27) wound around the bottoms of the evaporation material storage sections (11), (21). The molecular beam source cell for thin film deposition according to any one of claims 1 to 6.