JP2003096558A - Evaporation boat - Google Patents
Evaporation boatInfo
- Publication number
- JP2003096558A JP2003096558A JP2001288151A JP2001288151A JP2003096558A JP 2003096558 A JP2003096558 A JP 2003096558A JP 2001288151 A JP2001288151 A JP 2001288151A JP 2001288151 A JP2001288151 A JP 2001288151A JP 2003096558 A JP2003096558 A JP 2003096558A
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- boat
- deposition boat
- evaporation
- vaporized
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 title claims abstract description 15
- 230000008020 evaporation Effects 0.000 title claims abstract description 14
- 239000000463 material Substances 0.000 claims abstract description 20
- 238000007740 vapor deposition Methods 0.000 claims description 46
- 239000000126 substance Substances 0.000 claims description 11
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 5
- 229910052721 tungsten Inorganic materials 0.000 claims description 5
- 239000010937 tungsten Substances 0.000 claims description 5
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 4
- JVPLOXQKFGYFMN-UHFFFAOYSA-N gold tin Chemical compound [Sn].[Au] JVPLOXQKFGYFMN-UHFFFAOYSA-N 0.000 claims description 4
- 239000011364 vaporized material Substances 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 4
- 230000004308 accommodation Effects 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- CPLXHLVBOLITMK-UHFFFAOYSA-N Magnesium oxide Chemical compound [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、蒸着ボートに関
し、特に膜厚精度の高い蒸着膜を得ることができる蒸着
ボートに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vapor deposition boat, and more particularly to a vapor deposition boat capable of obtaining a vapor deposition film with high film thickness accuracy.
【０００２】[0002]
【従来の技術】金属や合金を真空中で加熱蒸発させる際
には、図３、図４に示すような蒸着ボートに蒸発物を収
容し、蒸着ボートの電極間に電流を流して抵抗加熱によ
り蒸発物を蒸発させる。しかし、蒸発物が蒸着ボートに
対して濡れ性がよい場合には、抵抗加熱により溶融した
蒸発物が蒸着ボートの蒸発物収容部の傾斜壁を越えて外
側に到達し、さらに電極にまで到達するという現象が起
こる。外側部分では抵抗加熱による温度上昇が不充分で
あるため、蒸発物が完全には蒸発しないため、その分蒸
着膜の膜厚が薄くなり、結果として膜厚精度が低くなる
という問題がある。また、電極に到達した蒸発物は蒸発
することなくそこで硬化するため、蒸着ボートの取り外
しが困難になるという問題もある。このような現象を防
止するために、蒸着ボートの収容部の深さを大きくする
ことも考えられるが、その場合には高電力が必要とな
る。2. Description of the Related Art When a metal or an alloy is heated and evaporated in a vacuum, the evaporated material is contained in a vapor deposition boat as shown in FIGS. 3 and 4, and an electric current is passed between electrodes of the vapor deposition boat to perform resistance heating. The evaporate is evaporated. However, when the vaporized material has good wettability with respect to the vapor deposition boat, the vaporized material melted by resistance heating reaches the outside through the inclined wall of the vaporized material storage part of the vapor deposition boat and further reaches the electrode. That phenomenon occurs. Since the temperature rise due to resistance heating is insufficient in the outer portion, the evaporated material does not completely evaporate, so that the film thickness of the vapor deposition film becomes thin accordingly, resulting in a problem that the film thickness accuracy becomes low. In addition, since the evaporation material that has reached the electrode is hardened there without evaporating, it is difficult to remove the evaporation boat. In order to prevent such a phenomenon, it is possible to increase the depth of the accommodating portion of the vapor deposition boat, but in that case, high power is required.
【発明が解決しようとする課題】従って本発明の目的
は、蒸発物が収容部の傾斜壁を越えて外側に到達し、さ
らに電極にまで到達するという現象を防止し、従来と同
じ電力で蒸発物を十分に蒸発させることができ、蒸着ボ
ートの取り外しが容易であり、電極のメンテナンス性が
向上した蒸着ボートを提供することである。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to prevent the phenomenon in which the vaporized substance reaches the outer side beyond the inclined wall of the accommodating portion and further reaches the electrode, and vaporizes with the same electric power as the conventional one. An object of the present invention is to provide a vapor deposition boat in which an object can be sufficiently vaporized, the vapor deposition boat can be easily removed, and the maintainability of electrodes is improved.
【課題を解決するための手段】本発明は、蒸着ボートの
蒸発物収容部の外側に、蒸発物に対して濡れ性の低い材
料で形成された土手を設けたことを特徴とする蒸着ボー
トを提供するものである。According to the present invention, there is provided a vapor deposition boat, characterized in that a bank formed of a material having low wettability with respect to the vapor is provided on the outside of the vapor deposit container of the vapor boat. It is provided.
【０００３】[0003]
【発明の実施の形態】本発明の蒸着ボートは、真空蒸着
に普通に使用されるものであり、例えば、図１、図２に
示すものが挙げられる。図１、図２に示す蒸着ボート１
は、四方が傾斜した壁２で構成された蒸発物３の収容部
４を有する。蒸着ボート１の両端には電極５が設けら
れ、収容部４に蒸発物３を収容して、電極間に電流を流
すと抵抗加熱により、蒸発物３が溶融し、蒸発する。図
３、図４に示すように、従来の蒸着ボート１では、溶融
した蒸発物３が、収容部４の傾斜壁２を越えて電極５の
方向に向かって流れだし、電極５に到達することもあ
る。傾斜壁２の外側部分７は十分に加熱されないため、
流れだした蒸発物３はそこで十分に蒸発しない。このた
め、予定した膜厚の蒸着膜を得ることができない。ま
た、流れだした蒸発物３は電極５に付着し硬化するた
め、蒸着ボート１の取り外しが困難になる。BEST MODE FOR CARRYING OUT THE INVENTION The vapor deposition boat of the present invention is commonly used for vacuum vapor deposition, and examples thereof include those shown in FIGS. 1 and 2. The vapor deposition boat 1 shown in FIGS. 1 and 2.
Has an accommodating portion 4 for an evaporate 3 formed of a wall 2 inclined on all sides. Electrodes 5 are provided at both ends of the vapor deposition boat 1, and when the vaporized material 3 is accommodated in the accommodation portion 4 and a current is passed between the electrodes, the vaporized material 3 is melted and evaporated by resistance heating. As shown in FIG. 3 and FIG. 4, in the conventional vapor deposition boat 1, the melted vaporized material 3 flows over the inclined wall 2 of the housing portion 4 toward the electrode 5 and reaches the electrode 5. There is also. Since the outer part 7 of the inclined wall 2 is not sufficiently heated,
The evaporate 3 that has flowed out does not evaporate sufficiently there. Therefore, it is not possible to obtain a vapor deposition film having a predetermined film thickness. Further, the vaporized material 3 that has flowed out adheres to the electrode 5 and hardens, so that it becomes difficult to remove the vapor deposition boat 1.
【０００４】そこで本発明では、図１、図２に示すよう
に、収容部４の外側に、蒸発物３に対して濡れ性の低い
材料で形成された土手６を設け、溶融した蒸発物３が電
極５の方向に流れださないように構成されている。蒸着
ボート１を構成する材料は、蒸着条件下で蒸発物と反応
することがなく、電流を流すと抵抗により温度が上昇す
る性質を有するものであればよく、代表的なものとして
はタングステン、モリブデン、タンタル等が挙げられ
る。蒸発物は、目的に合わせて選択されるが、代表的な
ものとしては金−錫合金、金、アルミニウム等が挙げら
れる。Therefore, in the present invention, as shown in FIGS. 1 and 2, a bank 6 made of a material having a low wettability with respect to the vaporized substance 3 is provided outside the accommodating portion 4 to melt the vaporized substance 3. Are configured so as not to flow toward the electrode 5. The material forming the vapor deposition boat 1 may be any material as long as it does not react with vaporized substances under vapor deposition conditions and has a property that the temperature rises due to resistance when an electric current is applied. Typical examples are tungsten and molybdenum. , Tantalum and the like. The evaporate is selected according to the purpose, but typical examples include gold-tin alloy, gold, aluminum and the like.
【０００５】また、土手６の構成材料としては、蒸発物
に対して濡れ性が低く、蒸着条件下で蒸発物と反応する
ことがなく、また蒸発もしない材料であればよい。例え
ば、蒸着ボート１がタングステン製の場合、土手６の材
料として好ましいものは、セラミックであり、特にアル
ミナ、ジルコニア、マグネシア等が挙げられる。土手６
の形状は、溶融した蒸発物の流れを遮断できるものであ
れば特に限定されない。例えば、蒸着ボート１の長手方
向の幅は３〜５mm、高さは１．５〜２．５mmが適当であ
る。なお、溶融した蒸発物は、蒸着ボート１の長手方向
（電流の方向）にのみ傾斜壁２を越えて流れだし、これ
と垂直の方向に流れだすことはないので、溶融物が傾斜
壁２´を越えて流れだすことはない。土手６の形成方法
も特に限定されない。例えば、セラミック成分等の土手
形成成分をペースト状又は液状にしたものを所定の部位
に塗布し、乾燥し、必要によりバインダー等を燃焼その
他の方法により除去すればよい。Further, as the constituent material of the bank 6, any material may be used as long as it has low wettability with respect to the vaporized material, does not react with the vaporized material under vapor deposition conditions, and does not vaporize. For example, when the vapor deposition boat 1 is made of tungsten, a preferable material for the bank 6 is ceramics, and particularly alumina, zirconia, magnesia and the like can be mentioned. Bank 6
The shape of is not particularly limited as long as it can block the flow of the melted vaporized material. For example, it is suitable that the vapor deposition boat 1 has a longitudinal width of 3 to 5 mm and a height of 1.5 to 2.5 mm. In addition, since the melted vaporized material starts to flow beyond the inclined wall 2 only in the longitudinal direction (current direction) of the vapor deposition boat 1 and does not flow in the direction perpendicular to this, the molten material is inclined wall 2 ′. It doesn't flow over. The method for forming the bank 6 is not particularly limited. For example, a paste-like or liquid-like embankment-forming component such as a ceramic component may be applied to a predetermined portion, dried, and if necessary, the binder or the like may be removed by burning or another method.
【０００６】[0006]
【比較例】真空蒸着室に、被蒸着物（シリコン基板）及
び、図３、図４に示す蒸着ボート１（タングステン製、
収容部４の寸法は５０mm×１５mm）を設置した。蒸着ボ
ート１に、金−錫合金（錫濃度２８質量％）１８．５ｇ
を収容し、電極５、５間に５ボルトの電圧を４０分かけ
た（電流６００アンペア）。蒸発物３は約２８０℃で溶
融し、蒸発したが、溶融物の一部が収容部４の傾斜壁２
を越えて流れだし、電極５に到達した。得られた蒸着膜
の膜厚は、０．９３μmであった。蒸着ボートを交換
し、同様の実験を５回繰り返したところ、得られた蒸着
膜の膜厚は１．２５±０．３μmとばらつきが大きかっ
た。[Comparative Example] In the vacuum vapor deposition chamber, an object to be vapor-deposited (silicon substrate) and the vapor deposition boat 1 shown in FIGS. 3 and 4 (made of tungsten,
The size of the accommodating portion 4 was set to 50 mm × 15 mm). 18.5 g of gold-tin alloy (tin concentration: 28% by mass) in the vapor deposition boat 1.
And a voltage of 5 volts was applied between the electrodes 5 and 5 for 40 minutes (current 600 amperes). The evaporate 3 was melted and evaporated at about 280 ° C., but a part of the melt was formed on the sloped wall 2 of the housing section 4.
It started flowing over and reached the electrode 5. The thickness of the obtained vapor deposition film was 0.93 μm. When the vapor deposition boat was exchanged and the same experiment was repeated 5 times, the obtained vapor deposition film had a large variation of 1.25 ± 0.3 μm.
【０００７】[0007]
【実施例】比較例と同様に、真空蒸着室に被蒸着物と蒸
着ボートを設置したが、蒸着ボートとして、図１、図２
に示すように、蒸着ボート１（タングステン製、収容部
４の寸法は５０mm×１５mm）に、耐火物用接着剤として
市販されているアルミナペースト（主成分アルミナ、粘
度：５０，０００ｃｐ）を塗布し、１０００℃で５分間
乾燥し、蒸着ボートの長手方向の幅が４mm、高さ２mmの
土手６を収容部４の両側に形成した。この蒸着ボート１
を用いて比較例と同様に金−錫合金（錫濃度２８質量
％）１８．５ｇを収容し、電極５、５間に５ボルトの電
圧を４０分かけた（電流６００アンペア）。蒸発物３は
約２８０℃で溶融し、蒸発したが、溶融物の一部が収容
部４の傾斜壁２を越えて流れだすことはなかった。蒸発
物はほぼ完全に蒸発し、得られた蒸着膜の膜厚は、１．
１８μmであった。蒸着ボートを交換し、同様の実験を
５回繰り返したところ、得られた蒸着膜の膜厚は１．２
５±０．１５μmであり、ばらつきが極めて少なく、膜
厚精度が著しく向上した。EXAMPLE As in the comparative example, the object to be vapor-deposited and the vapor deposition boat were installed in the vacuum vapor deposition chamber.
As shown in FIG. 3, a vapor deposition boat 1 (made of tungsten, the size of the housing 4 is 50 mm × 15 mm) is coated with an alumina paste (main component alumina, viscosity: 50,000 cp) that is commercially available as a refractory adhesive. After being dried at 1000 ° C. for 5 minutes, banks 6 having a longitudinal width of 4 mm and a height of 2 mm of the vapor deposition boat were formed on both sides of the accommodating portion 4. This evaporation boat 1
In the same manner as in the comparative example, 18.5 g of a gold-tin alloy (tin concentration: 28% by mass) was accommodated, and a voltage of 5 V was applied between the electrodes 5 and 40 for 40 minutes (current: 600 amperes). The evaporate 3 was melted at about 280 ° C. and evaporated, but a part of the melt did not flow over the inclined wall 2 of the accommodating portion 4. The evaporate was almost completely evaporated, and the thickness of the obtained vapor deposition film was 1.
It was 18 μm. When the vapor deposition boat was replaced and the same experiment was repeated 5 times, the thickness of the vapor deposition film obtained was 1.2.
The thickness was 5 ± 0.15 μm, and the variation was extremely small, and the film thickness accuracy was significantly improved.
【０００８】[0008]
【発明の効果】本発明によれば、蒸発物収容部の外側
に、蒸発物に対して濡れ性の低い材料で形成された土手
を設けているため、蒸発物が収容部の傾斜壁を越えて外
側に到達し、さらに電極にまで到達するという現象が効
果的に防止され、従来と同じ電力で蒸発物を十分に蒸発
させることができ、蒸着ボートの取り外しが容易であ
り、電極のメンテナンス性も著しく向上する。According to the present invention, since the bank formed of a material having low wettability with respect to the evaporative substance is provided outside the evaporative substance accommodating portion, the evaporative substance exceeds the inclined wall of the accommodating portion. It effectively prevents the phenomenon that it reaches the outside and further reaches the electrode, the evaporation can be sufficiently evaporated with the same electric power as before, the evaporation boat can be easily removed, and the maintainability of the electrode is improved. Is also significantly improved.
【図１】図１（ａ）は、本発明の蒸着ボートの平面図で
あり、図１（ｂ）はその断面図である。FIG. 1 (a) is a plan view of a vapor deposition boat of the present invention, and FIG. 1 (b) is a sectional view thereof.
【図２】図２（ａ）は、図１に示した本発明の蒸着ボー
トの使用状態を示す平面図であり、図２（ｂ）はその断
面図である。2 (a) is a plan view showing a use state of the vapor deposition boat of the present invention shown in FIG. 1, and FIG. 2 (b) is a sectional view thereof.
【図３】図３（ａ）は、従来の蒸着ボートの平面図であ
り、図３（ｂ）はその断面図である。FIG. 3 (a) is a plan view of a conventional vapor deposition boat, and FIG. 3 (b) is a sectional view thereof.
【図４】図４（ａ）は、図３に示した従来の蒸着ボート
の使用状態を示す平面図であり、図４（ｂ）はその断面
図である。4 (a) is a plan view showing a usage state of the conventional vapor deposition boat shown in FIG. 3, and FIG. 4 (b) is a sectional view thereof.
１：蒸着ボート、２、２´：収容部の傾斜壁、３：溶融
した蒸発物、４：蒸発物の収容部、５：電極、６：土手1: vapor deposition boat, 2 ': inclined wall of accommodation part, 3: melted evaporated material, 4: evaporated material accommodation part, 5: electrode, 6: bank
フロントページの続き (72)発明者 山口 正利 茨城県つくば市和台48 日立化成工業株式 会社総合研究所内 Ｆターム(参考） 4K029 BA22 DB12 DB13 DB18 Continued front page (72) Inventor Masatoshi Yamaguchi 48 Wadai, Tsukuba, Ibaraki Prefecture Hitachi Chemical Co., Ltd. Company Research Institute F-term (reference) 4K029 BA22 DB12 DB13 DB18
Claims (3)
発物に対して濡れ性の低い材料で形成された土手を設け
たことを特徴とする蒸着ボート。1. A vapor deposition boat, characterized in that a bank formed of a material having low wettability with respect to the vaporized substance is provided outside the vaporized substance storage portion of the vaporized boat.
発物が金−錫合金であり、蒸発物により濡れにくい材料
がセラミックである請求項１記載の蒸着ボート。2. The vapor deposition boat according to claim 1, wherein the vapor deposition boat is made of tungsten, the vaporized substance is a gold-tin alloy, and the material which is hard to be wetted by the vaporized substance is ceramic.
載の蒸着ボート。3. The evaporation boat according to claim 2, wherein the ceramic is alumina.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001288151A JP2003096558A (en) | 2001-09-21 | 2001-09-21 | Evaporation boat |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001288151A JP2003096558A (en) | 2001-09-21 | 2001-09-21 | Evaporation boat |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2003096558A true JP2003096558A (en) | 2003-04-03 |
Family
ID=19110847
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001288151A Pending JP2003096558A (en) | 2001-09-21 | 2001-09-21 | Evaporation boat |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2003096558A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013076120A (en) * | 2011-09-30 | 2013-04-25 | Hitachi High-Technologies Corp | Evaporation source and film forming apparatus |
| CN108203314A (en) * | 2017-12-29 | 2018-06-26 | 安徽金美新材料科技有限公司 | The high-temperature nano protective coating and preparation process of evaporation boat and corresponding evaporation boat |
| CN110760799A (en) * | 2019-11-27 | 2020-02-07 | 北京泰科诺科技有限公司 | Linear evaporation boat |
| CN110872689A (en) * | 2018-08-30 | 2020-03-10 | 北京铂阳顶荣光伏科技有限公司 | Evaporation boat disassembly tools and evaporation equipment |
-
2001
- 2001-09-21 JP JP2001288151A patent/JP2003096558A/en active Pending
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013076120A (en) * | 2011-09-30 | 2013-04-25 | Hitachi High-Technologies Corp | Evaporation source and film forming apparatus |
| CN108203314A (en) * | 2017-12-29 | 2018-06-26 | 安徽金美新材料科技有限公司 | The high-temperature nano protective coating and preparation process of evaporation boat and corresponding evaporation boat |
| CN110872689A (en) * | 2018-08-30 | 2020-03-10 | 北京铂阳顶荣光伏科技有限公司 | Evaporation boat disassembly tools and evaporation equipment |
| CN110872689B (en) * | 2018-08-30 | 2024-05-28 | 上海祖强能源有限公司 | Evaporation boat disassembly and assembly tools and evaporation equipment |
| CN110760799A (en) * | 2019-11-27 | 2020-02-07 | 北京泰科诺科技有限公司 | Linear evaporation boat |
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