JP2002508012A - Matte paste for cationic paint system - Google Patents
Matte paste for cationic paint systemInfo
- Publication number
- JP2002508012A JP2002508012A JP50392999A JP50392999A JP2002508012A JP 2002508012 A JP2002508012 A JP 2002508012A JP 50392999 A JP50392999 A JP 50392999A JP 50392999 A JP50392999 A JP 50392999A JP 2002508012 A JP2002508012 A JP 2002508012A
- Authority
- JP
- Japan
- Prior art keywords
- matting
- epoxy resin
- silica
- matte
- paste
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 125000002091 cationic group Chemical group 0.000 title claims abstract description 16
- 239000003973 paint Substances 0.000 title claims description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 53
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 24
- 238000000576 coating method Methods 0.000 claims abstract description 18
- 239000011248 coating agent Substances 0.000 claims abstract description 13
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 claims abstract description 8
- FIHBHSQYSYVZQE-UHFFFAOYSA-N 6-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound C=CC(=O)OCCCCCCOC(=O)C=C FIHBHSQYSYVZQE-UHFFFAOYSA-N 0.000 claims abstract description 6
- DQNSRQYYCSXZDF-UHFFFAOYSA-N 1,4-bis(ethenoxymethyl)cyclohexane Chemical compound C=COCC1CCC(COC=C)CC1 DQNSRQYYCSXZDF-UHFFFAOYSA-N 0.000 claims abstract description 5
- ZDHCZVWCTKTBRY-UHFFFAOYSA-N omega-Hydroxydodecanoic acid Natural products OCCCCCCCCCCCC(O)=O ZDHCZVWCTKTBRY-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000203 mixture Substances 0.000 claims description 16
- 239000011148 porous material Substances 0.000 claims description 14
- 239000003822 epoxy resin Substances 0.000 claims description 13
- 229920000647 polyepoxide Polymers 0.000 claims description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 11
- 239000000178 monomer Substances 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 10
- 229960000834 vinyl ether Drugs 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 claims description 5
- GPHWXFINOWXMDN-UHFFFAOYSA-N 1,1-bis(ethenoxy)hexane Chemical compound CCCCCC(OC=C)OC=C GPHWXFINOWXMDN-UHFFFAOYSA-N 0.000 claims description 4
- OYKPJMYWPYIXGG-UHFFFAOYSA-N 2,2-dimethylbutane;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CCC(C)(C)C OYKPJMYWPYIXGG-UHFFFAOYSA-N 0.000 claims description 4
- 125000002723 alicyclic group Chemical group 0.000 claims description 4
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 claims description 4
- 125000000524 functional group Chemical group 0.000 claims description 4
- JNFPXISXWCEVPL-UHFFFAOYSA-N OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CC(O)COC(C)COC(C)CO Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.CC(O)COC(C)COC(C)CO JNFPXISXWCEVPL-UHFFFAOYSA-N 0.000 claims description 3
- 239000004841 bisphenol A epoxy resin Substances 0.000 claims description 3
- 239000006224 matting agent Substances 0.000 claims description 3
- 238000002459 porosimetry Methods 0.000 claims description 3
- CYIGRWUIQAVBFG-UHFFFAOYSA-N 1,2-bis(2-ethenoxyethoxy)ethane Chemical compound C=COCCOCCOCCOC=C CYIGRWUIQAVBFG-UHFFFAOYSA-N 0.000 claims description 2
- OZCMOJQQLBXBKI-UHFFFAOYSA-N 1-ethenoxy-2-methylpropane Chemical compound CC(C)COC=C OZCMOJQQLBXBKI-UHFFFAOYSA-N 0.000 claims description 2
- OVGRCEFMXPHEBL-UHFFFAOYSA-N 1-ethenoxypropane Chemical compound CCCOC=C OVGRCEFMXPHEBL-UHFFFAOYSA-N 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 2
- INQDDHNZXOAFFD-UHFFFAOYSA-N 2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOC(=O)C=C INQDDHNZXOAFFD-UHFFFAOYSA-N 0.000 claims 2
- PUGOMSLRUSTQGV-UHFFFAOYSA-N 2,3-di(prop-2-enoyloxy)propyl prop-2-enoate Chemical compound C=CC(=O)OCC(OC(=O)C=C)COC(=O)C=C PUGOMSLRUSTQGV-UHFFFAOYSA-N 0.000 claims 1
- WVXLLHWEQSZBLW-UHFFFAOYSA-N 2-(4-acetyl-2-methoxyphenoxy)acetic acid Chemical compound COC1=CC(C(C)=O)=CC=C1OCC(O)=O WVXLLHWEQSZBLW-UHFFFAOYSA-N 0.000 claims 1
- 239000011247 coating layer Substances 0.000 claims 1
- -1 CHVE Chemical class 0.000 abstract description 7
- 239000003085 diluting agent Substances 0.000 abstract description 6
- 150000003254 radicals Chemical class 0.000 abstract description 4
- 150000001252 acrylic acid derivatives Chemical class 0.000 abstract description 3
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 abstract description 2
- 230000002411 adverse Effects 0.000 abstract 1
- 239000000654 additive Substances 0.000 description 4
- 239000003999 initiator Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000001993 wax Substances 0.000 description 4
- 239000008199 coating composition Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004927 fusion Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 229920005862 polyol Polymers 0.000 description 3
- 150000003077 polyols Chemical class 0.000 description 3
- QNODIIQQMGDSEF-UHFFFAOYSA-N (1-hydroxycyclohexyl)-phenylmethanone Chemical compound C=1C=CC=CC=1C(=O)C1(O)CCCCC1 QNODIIQQMGDSEF-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 238000012663 cationic photopolymerization Methods 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000004200 microcrystalline wax Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229920006305 unsaturated polyester Polymers 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BXGYYDRIMBPOMN-UHFFFAOYSA-N 2-(hydroxymethoxy)ethoxymethanol Chemical compound OCOCCOCO BXGYYDRIMBPOMN-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- XLXOGJYARRBRPZ-UHFFFAOYSA-N [2,3-di(prop-2-enoyloxy)-3-propoxypropyl] prop-2-enoate Chemical compound CCCOC(OC(=O)C=C)C(OC(=O)C=C)COC(=O)C=C XLXOGJYARRBRPZ-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 229940052303 ethers for general anesthesia Drugs 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000012682 free radical photopolymerization Methods 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 235000019808 microcrystalline wax Nutrition 0.000 description 1
- 239000000546 pharmaceutical excipient Substances 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000000527 sonication Methods 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D163/00—Coating compositions based on epoxy resins; Coating compositions based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/28—Compounds of silicon
- C09C1/30—Silicic acid
- C09C1/3072—Treatment with macro-molecular organic compounds
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/42—Gloss-reducing agents
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2002/00—Crystal-structural characteristics
- C01P2002/02—Amorphous compounds
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/51—Particles with a specific particle size distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/61—Micrometer sized, i.e. from 1-100 micrometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
- C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
- C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/14—Pore volume
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/16—Pore diameter
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/16—Pore diameter
- C01P2006/17—Pore diameter distribution
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
Abstract
(57)【要約】 脂環式エポキシ樹脂と共にビニルエーテル(例えばCHVE,DVE3)及びアクリレート(HDDA,TPGDA,DPGDA)の如き希釈剤の10〜40重量%を用いると多孔質シリカの作用を大幅に促進させしかも他の所望の塗膜特性に不利を及ぼすことなくカチオン性硬化又は混成硬化(カチオン性/フリーラジカル硬化)に基づいた艶消被覆層及び半光沢被覆層を製造することができる。 (57) [Summary] The use of 10-40% by weight of diluents such as vinyl ethers (e.g., CHVE, DVE3) and acrylates (HDDA, TPGDA, DPGDA) with the cycloaliphatic epoxy resin greatly enhances the action of the porous silica and provides other desirable properties. It is possible to produce matte and semi-gloss coatings based on cationic or hybrid curing (cationic / free radical curing) without adversely affecting the coating properties.
Description
【発明の詳細な説明】 カチオン塗料系用の艶消ペースト 発明の技術分野 本発明はカチオン塗料系用の艶消ペーストに関する。 発明の背景技術 塗料、ワニス及びラッカーで艶消仕上を得るのに合成多孔質シリカを用いるこ とは知られている。溶液型塗料及び水性塗料でシリカを用いることは特に知られ ている。シリカによる光沢減少の作用は、塗料の乾燥中に生起する溶剤の蒸発と 塗膜容量の減少とを普通伴なう。 紫外線の下で架橋する100%固形分の塗料(coatings formulations)を製造で きる。該塗料はオリゴマー、光反応性の開始剤及び種々の添加剤を含有する。 種々の用途において輻射線で硬化される塗料の人気が増大するにつれて、光沢 を調節し且つ減少させる能力は、より重要となりつゝある。100%固形分のUV 硬化性の塗料(coatings)では、多量(15重量%まで)の多孔質シリカ又は大きな 粒度のシリカが艶消仕上又は半光沢仕上を達成するのに必要とされる。何故なら ば、UV硬化性の塗料の硬化では塗膜の最小収縮と溶剤の蒸発なしとを伴なうか らである。これらの実施法は高濃度シリカを用いた時にはワニスの粘度増大によ って制限されあるいは多量のAPSを用いた時には硬化した塗膜の荒さによって 制限される。 主要な3種類の光硬化性樹脂をUV硬化性塗料で用い ることができ、即ちi)アクリル化した(acrylated)オリゴマー、ii)不飽和ポ リエステル及びiii)脂環式エポキシド及びビスフェノールAエポキシドを用い 得る。アクリル化したオリゴマー及び不飽和ポリエステルは、これらを、紫外線 に露光した時にフリーラジカルを生ずる薬剤と混合した時に重合且つ架橋できる 。脂環式エポキシド及びビスフェノールAエポキシドは、これらを、紫外線下で 分解し反応を開始する酸触媒を生ずるスルホニウム塩と混合した時に重合且つ架 橋できる。この硬化のメカニズムは「カチオン性の硬化」(“Cationic Curing” )と定義される。 アクリル化したオリゴマー及び不飽和ポリエステルを含有する塗料の光沢は前 記の実施法を用いて成功裡に低減できる。 カチオン性のメカニズムに従って硬化する、エポキシ樹脂基剤の塗料において は、大きな粒度のしかもきわめて高濃度でさえのシリカでも乾燥塗膜の光沢を減 少させない。これらの塗料は、その耐磨耗性、硬度及び耐熱性の故に多数の用途 に好ましいけれども、艶消仕上又は半光沢仕上を有しては容易には製造できない 。 それ故、カチオン硬化性塗料系で用い得る艶消剤系に対する必要性がある。 今般見出された所によれば驚くべきことには、脂環式エポキシ樹脂と共にビニ ルエーテル(例えばCHVE,DVE3)及びアクリレート(HDDA,TPGDA,DPGDA)の如き希 釈剤 10〜40重量%を用いると、多孔質シリカの作用を大幅に促進させしかも他の所望 の塗膜特性に不利を及ぼすことなくカチオン性硬化又は混成硬化(カチオン性/ フリーラジカル硬化)に基づく艶消塗料及び半光沢塗料を製造することができる 。 試験方法及び定義 i 窒素での表面積−細孔容積 窒素での表面積は米国マイクロメリチック社により供給されるASAP2400装置で の多点法を用いてブルナウア.エメット.テラー(BET)の標準の窒素吸着法によ り測定する。試料は測定前に少なくとも1時間270℃で真空下にガス抜きする。 表面積はP/P0 0.98で吸着した窒素ガスの容量から算出する。この装置はまた 細孔寸法分布を与えこれから細孔寸法(D10)(細孔の10%がこの細孔寸法以下 である)を得ることができる。同じ要領で細孔寸法(D50)及び(D90)(細孔の 50%及び90%がこの細孔寸法以下である)を得ることができる。更に所与範囲の 細孔寸法に対する細孔容積(cm3/g)も脱着曲線から得られる。 ii 重量平均粒度 重量平均粒度は100mmの径路長さ(path length)のレンズを用いてマルベルンマ スターサイザー(Malvern Mastersizer)の使用により測定する。英国ウスターシ ャー州のマルベルンインストルメント社により製造されるこの装置は、低出力の He/Neレザーを利用するフラウン ホッファー(Fraunhoffer)回折の原理を用いる。測定前に試料を7分間水中に超 音波処理で分散させて水性懸濁液を形成する。マルベルンマスターサイザーはシ リカの重量粒度分布を測定する。重量平均粒度(d50)、10分位数(d10)及び90 分位数(d90)は該装置で生じたデータから容易に得られる。 iii 艶消効率 艶消効率を試験するために次の手法により次の塗料組成物を調製した。 組成物: UVR6110* 81.5−X% ビニルエーテル X UVR6990* 3.0% フルオラド(Fluorad)FC340♯ 0.5% シリカ 15% * ユニオンカーバイト社から入手 # 3M社から入手 樹脂、希釈剤、添加剤及び光重合開始剤を黄褐色のジャーに秤量し、カウルス (Coweles)ヘッドを備えたハイドルフ(Heidolph)攪拌機を用いて500rpmで30秒間 攪拌した。次いでシリカを添加し、全ての成分を3000rpmで10分間攪拌した。得 られた塗料系を脱気させ、次いで25ミクロンのK−バー・アプリケーターを用い て黒色のレネタ(Leneta)7Cカード上に展延した。300W/インチのフュージョ ン(Fusion)Hランプ1個を用いて該カードを 3m/分で硬化させた。60°での光沢をBYK社のマルチグロスメーターを用い て硬化した塗膜上で測定した。 Xが20%である時、光沢単位で測定した60°の光沢を、以下の記載では艶消効 率として参照した。 発明の開示 本発明の第1の目的は、2〜4:1の重量/重量比で艶消用単量体と非晶質シ リカとを含有してなるカチオン性塗料系で艶消剤として用いる艶消ペーストを提 供するものである。 本発明で用いた非晶質シリカは、窒素ポロシメトリーにより測定すると1.0〜2 .0ml/g、好ましくは少なくとも1.8ml/gの細孔容積と、200〜500m2/gの表面積と 、マルベルンにより測定すると4.0〜12.0ミクロンの平均粒度とを有するのが好 ましい。 本発明の別の好ましい具体例では、非晶質シリカはワックスで被覆したシリカ であり、該シリカは被覆前に窒素ポロシメトリーにより測定すると、1.0〜2.0ml /g、好ましくは少なくとも1.8ml/gの細孔容積と、200〜500m2/gの表面積と、マ ルベルンにより測定すると4.0〜12.0ミクロンの平均粒度とを有する。この具体 例では、ワックス被覆層は朱被覆シリカの重量の6〜15重量%を表わすのが好ま しい。ワックスは微晶質のワックス(マイクロワックス)又はポリエチレンワッ クスよりなるのも好ましい。 艶消用単量体は、1個又はそれ以上の官能基を含有す るビニルエーテル単量体及び1個又はそれ以上の官能基を含有するアクリレート 単量体又はこれらの混合物よりなる群から選ばれるのがまた好ましい。艶消用単 量体は、トリエチレングリコールジビニルエーテル(DVE-3)、1,4−シクロヘキサ ンジメタノールジビニルエーテル(CHVE)、ヘキサンジオールジビニルエーテル、 エチルビニルエーテル、プロピルビニルエーテル、イソブチルビニルエーテル、 ヘキサンジオールジビニルエーテル、トリプロピレングリコールトリアクリレー ト(TPGDA)、ジプロピレングリコールジアクリレート(DPGDA)、1,6−ヘキサンジ オールジアクリレート(HDDA)、トリメチルプロパントリアクリレート(TMPTA)、 エトキシル化したトリメチルプロパントリアクリレート(EO-TMPTA)、プロポキシ ル化したグリセロールトリアクリレート(GPTA)、トリエチレングリコールジアク リレート、及びこれらの混合物よりなる群から選ぶのがより好ましい。 本発明の第2の目的は、40〜80重量/重量%のエポキシ樹脂と20〜60重量/重 量%の艶消ペーストとを含有する光硬化性のカチオン性の塗料系を提供するもの である。エポキシ樹脂は脂環式エポキシ樹脂又はビスフェノールAエポキシ樹脂 又はこれらの混合物よりなる群から選ばれるのが好ましい。 本発明の第3の目的は、40光沢単位以下、好ましくは30光沢単位以下、より好 ましくは20光沢単位以下の艶消効率を有し且つ40〜80重量/重量%のエポキシ樹 脂を含 有する光硬化性でカチオン性の塗料系を提供するものである。エポキシ樹脂は脂 環式エポキシ樹脂又はビスフェノールAエポキシ樹脂又はこれらの混合物よりな る群から選ばれるのが好ましい。 発明の開示 本発明を次の実施例で更に説明する。実施例1(比較例) 種々の成分の連続的な添加によりあるいは目的の光沢塗料に添加するのに用い 得るシリカ及び艶消用稀釈剤と共に艶消ペーストを生成することにより塗料組成 物を製造できる。 対照の組成物は次の通りである; UVR6110* 71.5% 脂環式エポキシ樹脂 トーン(Tone)ポリオール* 10% ポリオール UVR6990* 3.0% カチオン性光重合開始剤 フルオラドFC430# 0.5% 流れ添加剤 シリカ 15% * ユニオンカーバイト社から入手 # 3M社から入手 この組成物から表1のシリカと共にレネタ7Cカード上に25ミクロンの塗膜を 生成し、300W/インチのフュージョンHランプ1個を用いて3m/分で硬化さ せ、光沢度を示した。 ED30(WRグレース社からのシロイドED30)及びOK412(デガッサ社からのアセ マットOK412)以外のシリカは全て商標名ガシルとしてクロスフィールド社から 得られる市販のシリカである。実施例2(比較例) 実施例1と比較した時はトーンポリオールを除外した別の対照塗料組成物を用 いた。 UVR6110 86.5% 脂環式エポキシ樹脂 UVR6990 3.0% カチオン性光重合開始剤 フルオラドFC430 0.5% 流れ添加剤 シリカ 10% 2種のシリカを試験し、60°の光沢度は次の通りである。 実施例3(本発明) 実施例2の組成物においてUVR6110の一部の代りにX部のCHVE又はDVEを用いた 時には、次の塗料組成物について表2の光沢度が得られた。 UVR6110 81.5−X% ビニルエーテル X UVR6990 3.0% フルオラドFC430 0.5% シリカ 15% 実施例4(本発明) 別種の希釈剤即ちアクリレートを用いて同様の結果が得られた。これは、カチ オン性硬化用の光重合開始剤とフリーラジカル硬化用の光重合開始剤との両方を 含有する言わゆる「混成」(“hybrid”)塗料組成物の場合であり、これは次の組 成を有する。 UVR6110 86−X% UVR6990 3.0% フルオラドFC430 0.5% アクリル化した希釈剤 X% イルガキュア(Irgacure)184(a) 0.5% シリカ 10% (a) チバガイギー社から入手 該組成物において、アクリル化した希釈剤は次の群〔1,6−ヘキサンジオール ジアクリレート(HDDA)及びトリプロピレングリコールトリアクリレート(TPGDA) 〕の何れかであり、イルガキュア184はフリーラジカル光重合開始剤である。組 成物3から得られた結果を表3に示す。 DETAILED DESCRIPTION OF THE INVENTION Matte paste for cationic paint system TECHNICAL FIELD OF THE INVENTION The present invention relates to matte pastes for cationic paint systems. BACKGROUND OF THE INVENTION Use synthetic porous silica to achieve a matte finish with paints, varnishes and lacquers. It is known. The use of silica in solution-based and water-based paints is particularly known. ing. The effect of silica on gloss reduction is due to the evaporation of solvents that occur during the drying of paints. This is usually accompanied by a decrease in coating volume. Manufactures 100% solids coatings formulations that crosslink under UV light Wear. The coating contains oligomers, photoreactive initiators and various additives. As the popularity of radiation-cured paints in various applications increases, gloss The ability to modulate and reduce the temperature is becoming more important. 100% solids UV In curable coatings, large amounts (up to 15% by weight) of porous silica or large Particle size silica is required to achieve a matte or semi-gloss finish. Because For example, does curing of UV-curable paints involve minimal shrinkage of the coating and no evaporation of solvent? It is. These practices rely on increasing the viscosity of the varnish when using high silica concentrations. Is limited or when a large amount of APS is used, Limited. Uses three main types of photo-curable resins in UV-curable paint I) acrylated oligomers, ii) unsaturated Using ester and iii) alicyclic epoxide and bisphenol A epoxide obtain. Acrylated oligomers and unsaturated polyesters are Polymerizes and crosslinks when mixed with agents that produce free radicals when exposed to light . Alicyclic epoxides and bisphenol A epoxides can be used under ultraviolet light. Polymerized and crosslinked when mixed with a sulfonium salt which decomposes to form an acid catalyst to initiate the reaction Can bridge. The mechanism of this curing is “Cationic Curing” ) Is defined. The gloss of paints containing acrylated oligomers and unsaturated polyesters is Successful reductions can be achieved using the above-described method. In epoxy resin based coatings that cure according to a cationic mechanism Reduces the gloss of dry coatings even with silica of large particle size, even at very high concentrations. I will not reduce it. These paints have numerous applications due to their abrasion, hardness and heat resistance But not easily manufactured with matte or semi-gloss finish . Therefore, there is a need for matting agent systems that can be used in cationically curable coating systems. What has now been discovered is that, surprisingly, vinyl acetate is used with cycloaliphatic epoxy resins. Rare ethers (eg CHVE, DVE3) and acrylates (HDDA, TPGDA, DPGDA) Excipient The use of 10 to 40% by weight greatly enhances the action of the porous silica and has other desired effects. Cationic curing or hybrid curing (cationic / Can produce matte and semi-gloss paints based on free radical curing) . Test method and definition i Surface area with nitrogen-pore volume Surface area with nitrogen is measured using ASAP2400 equipment supplied by Micromeritics, USA Using the multipoint method of Brunauer. Emmet. According to the standard nitrogen adsorption method of Teller (BET) Measurement. The sample is degassed under vacuum at 270 ° C. for at least 1 hour before measurement. Surface area is P / P0 It is calculated from the capacity of the adsorbed nitrogen gas at 0.98. This device also Given the pore size distribution, the pore size (DTen) (10% of the pores are smaller than this pore size) ) Can be obtained. The pore size (D50) And (D90) (Pore 50% and 90% are below this pore size). Further given range Pore volume to pore size (cmThree/ g) is also obtained from the desorption curve. ii Weight average particle size The weight average particle size was measured using a 100 mm path length lens. Measured using a Starsizer (Malvern Mastersizer). UK Worcestershire Manufactured by Malvern Instruments, Inc. Fraun using He / Ne leather The principle of Fraunhoffer diffraction is used. Put the sample in water for 7 minutes before measurement Disperse by sonication to form an aqueous suspension. Malvern Mastersizer The weight particle size distribution of Rica is measured. Weight average particle size (d50), Decile (dTen) And 90 Quantile (d90) Are easily obtained from the data generated by the device. iii Matting efficiency The following coating compositions were prepared by the following procedure to test the matting efficiency. Composition: UVR6110* 81.5-X% Vinyl ether X UVR6990* 3.0% Fluorad FC340♯ 0.5% Silica 15% * Obtained from Union Carbide # Obtained from 3M Weigh the resin, diluent, additives and photoinitiator in a tan jar and mix (Coweles) 30 seconds at 500 rpm using a Heidolph stirrer with a head Stirred. Then silica was added and all components were stirred at 3000 rpm for 10 minutes. Profit Degas the applied paint system and then use a 25 micron K-bar applicator Spread over a black Leneta 7C card. 300W / inch fusion Use the Fusion H lamp to Cured at 3 m / min. Gloss at 60 ° is measured using a BYK multi-gloss meter And measured on the cured coating. When X is 20%, the gloss of 60 ° measured in gloss unit is described as matte effect in the following description. Referenced as rate. Disclosure of the invention A first object of the present invention is to provide a matting monomer and an amorphous silicone at a weight / weight ratio of 2 to 4: 1. Providing matte paste for use as matting agent in cationic paint system containing Rica To offer. Amorphous silica used in the present invention is 1.0 to 2 as measured by nitrogen porosimetry. 2.0 ml / g, preferably at least 1.8 ml / g pore volume, 200-500 mTwo/ g surface area and Preferably have an average particle size of 4.0 to 12.0 microns as measured by Malvern. Good. In another preferred embodiment of the present invention, the amorphous silica is silica coated with wax. The silica is 1.0-2.0 ml as measured by nitrogen porosimetry before coating. / g, preferably at least 1.8 ml / g pore volume, 200-500 mTwo/ g surface area and It has an average particle size of 4.0 to 12.0 microns as measured by Lubern. This concrete In the example, the wax coating preferably represents 6 to 15% by weight of the weight of the vermilion coated silica. New Wax should be microcrystalline wax (microwax) or polyethylene wax. It is also preferred that it is made of grease. Matting monomers contain one or more functional groups Vinyl ether monomers and acrylates containing one or more functional groups It is also preferred that it is selected from the group consisting of monomers or mixtures thereof. Single for matting The monomer is triethylene glycol divinyl ether (DVE-3), 1,4-cyclohexa Dimethanol divinyl ether (CHVE), hexanediol divinyl ether, Ethyl vinyl ether, propyl vinyl ether, isobutyl vinyl ether, Hexanediol divinyl ether, tripropylene glycol triacrylate (TPGDA), dipropylene glycol diacrylate (DPGDA), 1,6-hexanedi All diacrylate (HDDA), trimethylpropane triacrylate (TMPTA), Ethoxylated trimethylpropane triacrylate (EO-TMPTA), propoxy Glycerol triacrylate (GPTA), triethylene glycol dia More preferably, it is selected from the group consisting of relates and mixtures thereof. A second object of the present invention is to provide an epoxy resin of 40 to 80% by weight and a weight of 20 to 60% by weight. Providing a photocurable cationic coating system containing an amount of matte paste It is. Epoxy resin is alicyclic epoxy resin or bisphenol A epoxy resin Alternatively, it is preferably selected from the group consisting of these mixtures. The third object of the present invention is to provide a gloss unit of 40 gloss units or less, preferably 30 gloss units or less. More preferably, an epoxy resin having a matting efficiency of 20 gloss units or less and a weight ratio of 40 to 80% by weight. Contains fat The present invention provides a photocurable and cationic coating system having the same. Epoxy resin is fat Cyclic epoxy resin or bisphenol A epoxy resin or a mixture thereof. It is preferable to be selected from the group consisting of Disclosure of the invention The present invention is further described in the following examples.Example 1 (comparative example) Used by continuous addition of various components or to add to the desired gloss paint Paint composition by forming a matte paste with the resulting silica and matting diluent Can manufacture things. The control composition is as follows: UVR6110* 71.5% Alicyclic epoxy resin Tone polyol* 10% polyol UVR6990* 3.0% cationic photopolymerization initiator Fluorad FC430# 0.5% flow additive Silica 15% * Obtained from Union Carbide # Obtained from 3M From this composition, a 25 micron film was coated on a Reneta 7C card with the silica of Table 1. Produced and cured at 3 m / min using one 300 W / inch Fusion H lamp And showed the glossiness. ED30 (Syloid ED30 from WR Grace) and OK412 (Ace from Degassa) All silicas except Matt OK 412) are trade names of Gasil from Crossfield. It is a commercially available silica obtained.Example 2 (comparative example) When compared to Example 1, another control coating composition without the tone polyol was used. Was. UVR6110 86.5% Alicyclic epoxy resin UVR6990 3.0% cationic photopolymerization initiator Fluorad FC430 0.5% Flow additive Silica 10% Two silicas were tested and the gloss at 60 ° is as follows: Example 3 (the present invention) Part X of CHVE or DVE was used in place of UVR6110 in the composition of Example 2. Occasionally, the gloss values in Table 2 were obtained for the following coating compositions. UVR6110 81.5-X% Vinyl ether X UVR6990 3.0% Fluorad FC430 0.5% Silica 15% Example 4 (the present invention) Similar results were obtained with another diluent, namely acrylate. This is Both a photoinitiator for on-curing and a photoinitiator for free radical curing This is the case for so-called “hybrid” paint compositions containing Have UVR6110 86-X% UVR6990 3.0% Fluorad FC430 0.5% Acrylic diluent X% Irgacure 184(a) 0.5% Silica 10% (a) Obtained from Ciba Geigy In the composition, the acrylated diluents belong to the following group [1,6-hexanediol] Diacrylate (HDDA) and tripropylene glycol triacrylate (TPGDA) Irgacure 184 is a free radical photopolymerization initiator. set Table 3 shows the results obtained from the product 3.
───────────────────────────────────────────────────── フロントページの続き (81)指定国 EP(AT,BE,CH,CY, DE,DK,ES,FI,FR,GB,GR,IE,I T,LU,MC,NL,PT,SE),OA(BF,BJ ,CF,CG,CI,CM,GA,GN,ML,MR, NE,SN,TD,TG),AP(GH,GM,KE,L S,MW,SD,SZ,UG,ZW),EA(AM,AZ ,BY,KG,KZ,MD,RU,TJ,TM),AL ,AM,AT,AU,AZ,BA,BB,BG,BR, BY,CA,CH,CN,CU,CZ,DE,DK,E E,ES,FI,GB,GE,GH,GM,GW,HU ,ID,IL,IS,JP,KE,KG,KP,KR, KZ,LC,LK,LR,LS,LT,LU,LV,M D,MG,MK,MN,MW,MX,NO,NZ,PL ,PT,RO,RU,SD,SE,SG,SI,SK, SL,TJ,TM,TR,TT,UA,UG,US,U Z,VN,YU,ZW────────────────────────────────────────────────── ─── Continuation of front page (81) Designated country EP (AT, BE, CH, CY, DE, DK, ES, FI, FR, GB, GR, IE, I T, LU, MC, NL, PT, SE), OA (BF, BJ , CF, CG, CI, CM, GA, GN, ML, MR, NE, SN, TD, TG), AP (GH, GM, KE, L S, MW, SD, SZ, UG, ZW), EA (AM, AZ , BY, KG, KZ, MD, RU, TJ, TM), AL , AM, AT, AU, AZ, BA, BB, BG, BR, BY, CA, CH, CN, CU, CZ, DE, DK, E E, ES, FI, GB, GE, GH, GM, GW, HU , ID, IL, IS, JP, KE, KG, KP, KR, KZ, LC, LK, LR, LS, LT, LU, LV, M D, MG, MK, MN, MW, MX, NO, NZ, PL , PT, RO, RU, SD, SE, SG, SI, SK, SL, TJ, TM, TR, TT, UA, UG, US, U Z, VN, YU, ZW
Claims (1)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB9712591.8 | 1997-06-16 | ||
| GBGB9712591.8A GB9712591D0 (en) | 1997-06-16 | 1997-06-16 | Matting paste for cationic systems |
| PCT/GB1998/001588 WO1998058030A1 (en) | 1997-06-16 | 1998-06-01 | Matting paste for cationic systems |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002508012A true JP2002508012A (en) | 2002-03-12 |
Family
ID=10814312
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50392999A Pending JP2002508012A (en) | 1997-06-16 | 1998-06-01 | Matte paste for cationic paint system |
Country Status (9)
| Country | Link |
|---|---|
| EP (1) | EP0991728A1 (en) |
| JP (1) | JP2002508012A (en) |
| KR (1) | KR20010013796A (en) |
| CN (1) | CN1260817A (en) |
| AU (1) | AU7668298A (en) |
| BR (1) | BR9810042A (en) |
| CA (1) | CA2293290A1 (en) |
| GB (1) | GB9712591D0 (en) |
| WO (1) | WO1998058030A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011073379A (en) * | 2009-09-30 | 2011-04-14 | Dainippon Printing Co Ltd | Decorative sheet |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU1408101A (en) * | 1999-04-13 | 2001-01-30 | Grace Gmbh & Co. Kg | A matting agent for radiation curing coatings |
| US6770128B1 (en) | 1999-04-13 | 2004-08-03 | Grace Gmbh & Co. Kg | Matting agent radiation for curing coatings |
| US8197654B2 (en) | 2009-01-22 | 2012-06-12 | Ppg Industries Ohio, Inc. | Methods for preparing an electrodepositable coating composition |
| US20150210885A1 (en) | 2012-07-24 | 2015-07-30 | Akzo Nobel Coatings International B.V. | Matting Paste Composition |
| CN110951298B (en) * | 2019-11-29 | 2021-09-07 | 湖南柯盛新材料有限公司 | A two-component epoxy matte beautifying agent |
| CN111748234A (en) * | 2020-07-07 | 2020-10-09 | 威远达威木业有限公司 | Cationic extinction filler and preparation method thereof |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5221337A (en) * | 1990-02-14 | 1993-06-22 | W. R. Grace & Co.-Conn. | SiO2 flatting agent, process for its production and its use |
| DE4118731A1 (en) * | 1991-06-07 | 1992-12-10 | Basf Lacke & Farben | METHOD FOR PRODUCING MATTER LACQUER SURFACES |
| GB9409388D0 (en) * | 1994-05-11 | 1994-06-29 | Unilever Plc | Silica products |
-
1997
- 1997-06-16 GB GBGB9712591.8A patent/GB9712591D0/en not_active Ceased
-
1998
- 1998-06-01 CN CN98806225A patent/CN1260817A/en active Pending
- 1998-06-01 JP JP50392999A patent/JP2002508012A/en active Pending
- 1998-06-01 AU AU76682/98A patent/AU7668298A/en not_active Abandoned
- 1998-06-01 BR BR9810042-4A patent/BR9810042A/en not_active Application Discontinuation
- 1998-06-01 WO PCT/GB1998/001588 patent/WO1998058030A1/en not_active Ceased
- 1998-06-01 CA CA002293290A patent/CA2293290A1/en not_active Abandoned
- 1998-06-01 EP EP98924489A patent/EP0991728A1/en not_active Withdrawn
- 1998-06-01 KR KR1019997011814A patent/KR20010013796A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011073379A (en) * | 2009-09-30 | 2011-04-14 | Dainippon Printing Co Ltd | Decorative sheet |
Also Published As
| Publication number | Publication date |
|---|---|
| CA2293290A1 (en) | 1998-12-23 |
| KR20010013796A (en) | 2001-02-26 |
| BR9810042A (en) | 2000-08-29 |
| EP0991728A1 (en) | 2000-04-12 |
| AU7668298A (en) | 1999-01-04 |
| WO1998058030A1 (en) | 1998-12-23 |
| GB9712591D0 (en) | 1997-08-20 |
| CN1260817A (en) | 2000-07-19 |
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