JP2002368364A - Printed wiring board and manufacturing method thereof - Google Patents
Printed wiring board and manufacturing method thereofInfo
- Publication number
- JP2002368364A JP2002368364A JP2001177572A JP2001177572A JP2002368364A JP 2002368364 A JP2002368364 A JP 2002368364A JP 2001177572 A JP2001177572 A JP 2001177572A JP 2001177572 A JP2001177572 A JP 2001177572A JP 2002368364 A JP2002368364 A JP 2002368364A
- Authority
- JP
- Japan
- Prior art keywords
- wiring board
- printed wiring
- electrically insulating
- base material
- insulating base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
Abstract
(57)【要約】
【課題】プリント配線基板全体の耐湿性を向上させるこ
とができ、接続信頼性、耐リペア性に優れ、電気絶縁性
基材の曲げ剛性等の機械的強度を向上したプリント配線
基板およびその製造方法を提供する。
【解決手段】電気絶縁性基材201の厚さ方向に開けられ
た貫通孔に導電性体フィラーを含む導電体205が充填さ
れ、前記電気絶縁性基材の両面に所定のパターンに形成
された配線層204,206,208が前記導電体205によって電気
的に接続されているプリント配線基板において、前記電
気絶縁性基材201がガラスクロスまたはガラス不織布に
微粒子を混入させた熱硬化性エポキシ樹脂を含浸させた
基材で形成されており、かつ前記導電体に含まれる導電
性フィラーの平均粒径が前記微粒子の平均粒径よりも大
きい。
[PROBLEMS] A print that can improve the moisture resistance of the entire printed wiring board, has excellent connection reliability and repair resistance, and has improved mechanical strength such as bending rigidity of an electrically insulating base material. Provided is a wiring board and a method for manufacturing the same. A through hole formed in a thickness direction of an electrically insulating base material is filled with a conductive material containing a conductive filler, and a predetermined pattern is formed on both surfaces of the electrically insulating base material. In a printed wiring board in which wiring layers 204, 206, and 208 are electrically connected by the conductor 205, the electrically insulating base material 201 is made of glass cloth or glass nonwoven fabric impregnated with a thermosetting epoxy resin mixed with fine particles. The conductive filler contained in the conductor has an average particle diameter larger than the average particle diameter of the fine particles.
Description
【0001】[0001]
【発明が属する技術分野】本発明は高機能を有する各種
電子機器の高密度実装に適し、かつ曲げ剛性あるいは吸
湿特性に優れ耐リペア性に適したプリント配線基板とそ
の製造方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printed wiring board which is suitable for high-density mounting of various electronic devices having a high function, and has excellent bending rigidity or moisture absorption properties and is suitable for repair resistance, and a method of manufacturing the same.
【0002】[0002]
【従来の技術】近年、電子機器の小型化、薄型化、軽量
化、高機能化が進展する中で電子機器を構成する各種電
子部品の小型化や薄型化等とともに、これら電子部品が
実装されるプリント配線基板も高密度実装を可能とする
様々な技術開発が盛んである。2. Description of the Related Art In recent years, as electronic equipment has become smaller, thinner, lighter, and more sophisticated, various electronic parts constituting the electronic equipment have become smaller and thinner, and these electronic parts have been mounted. Various technical developments that enable high-density mounting of printed wiring boards are also actively pursued.
【0003】特に最近は急速な実装技術の進展ととも
に、LSI等の半導体装置のベアチップをプリント配線
基板上に直接、かつ高密度に実装でき、かつ高速信号処
理回路にも対応できる多層配線構造の回路基板が安価に
供給されることが強く要望されてきている。このような
多層配線回路基板では微細な配線ピッチで形成された複
数層の配線パターン間の高い電気的接続信頼性や優れた
高周波特性を備えていることが重要であり、また半導体
ベアチップとの高い接続信頼性が要求される。In particular, with the recent rapid development of mounting technology, a circuit having a multilayer wiring structure capable of directly mounting a bare chip of a semiconductor device such as an LSI on a printed wiring board at a high density and corresponding to a high-speed signal processing circuit. There is a strong demand that substrates be supplied at low cost. In such a multilayer wiring circuit board, it is important to have high electrical connection reliability and excellent high-frequency characteristics between wiring patterns of a plurality of layers formed at a fine wiring pitch, and a high level with a semiconductor bare chip. Connection reliability is required.
【0004】この課題に対して、従来の多層配線基板に
おいて層間接続の主流となっていたスルーホール内壁の
銅めっき導体に代えて、インタースティシャルビアホー
ル(IVHともいう)に導電体を充填して接続信頼性の
向上を図るとともに部品ランド直下や任意の層間にIV
Hを形成でき、基板サイズの小型化や高密度実装が実現
できる全層IVH構造の樹脂多層配線基板がある(特開
平6−268345号公報)。図12A〜図12Gに前
記プリント配線基板の製造方法を示す。まず、図12A
に示すように、アラミド不織布に熱硬化性エポキシ樹脂
を含浸させたアラミドエポキシプリプレグである多孔質
基材402の両面にポリエステル等の離形フィルム40
1をラミネートする。次に図12Bに示すように、多孔
質基材402の所定の箇所にレーザー加工法により貫通
孔403を形成する。次に図12Cに示すように、貫通
孔403に導電ペースト404を充填する。充填する方
法としては、貫通孔403を有する多孔質基材402を
スクリーン印刷機のテーブル上に設置し、直接導電ペー
スト404を離形フィルム401の上から印刷する。こ
の際、印刷面の離形フィルム401は印刷マスクの役割
と多孔質基材402表面の汚染防止の役割を果たしてい
る。次に多孔質基材402の両面から離形フィルム40
1を剥離する。次に、多孔質基材402の両面に銅箔等
の金属箔405を貼り付ける。この状態で加熱加圧する
ことにより、図12Dに示すように、多孔質基材402
は圧縮され、その厚さは薄くなる。その際、貫通孔40
3内の導電ペースト404も圧縮されるが、その時に導
電ペースト内のバインダ成分が押し出され、導電成分同
士および導電成分と金属箔405間の結合が強固にな
り、導電ペースト404中の導電物質が緻密化され、層
間の電気的接続が得られる。その後、多孔質基材402
の構成成分である熱硬化性樹脂および導電ペースト40
4が硬化する。そして図12Eに示すように、金属箔4
05を所定のパターンに選択エッチングして両面配線基
板が完成する。さらに、図12Fに示すように、前記両
面配線基板の両側に導電性ペースト408が印刷された
多孔質基材406と金属箔407を貼り付けて、加熱加
圧した後、図12Gに示すように、金属箔407を所定
のパターンに選択エッチングすることによって多層配線
基板が完成する。To solve this problem, an interstitial via hole (also referred to as IVH) is filled with a conductor instead of the copper-plated conductor on the inner wall of the through hole, which has been the mainstream of interlayer connection in a conventional multilayer wiring board. In addition to improving connection reliability, IV
There is a resin multilayer wiring board having an all-layer IVH structure capable of forming H and realizing miniaturization of the board size and high-density mounting (JP-A-6-268345). 12A to 12G show a method for manufacturing the printed wiring board. First, FIG. 12A
As shown in FIG. 5, a release film 40 made of polyester or the like is provided on both sides of a porous substrate 402 which is an aramid epoxy prepreg obtained by impregnating a thermosetting epoxy resin into an aramid nonwoven fabric.
Laminate 1 Next, as shown in FIG. 12B, through holes 403 are formed at predetermined locations on the porous base material 402 by a laser processing method. Next, as shown in FIG. 12C, the conductive paste 404 is filled in the through holes 403. As a filling method, a porous substrate 402 having through holes 403 is placed on a table of a screen printing machine, and a conductive paste 404 is directly printed on the release film 401. At this time, the release film 401 on the printing surface plays a role of a print mask and a role of preventing contamination of the surface of the porous substrate 402. Next, the release film 40 is removed from both sides of the porous substrate 402.
1 is peeled off. Next, a metal foil 405 such as a copper foil is attached to both surfaces of the porous substrate 402. By heating and pressing in this state, as shown in FIG.
Is compressed and its thickness is reduced. At this time, the through hole 40
3, the binder component in the conductive paste is extruded at that time, and the bonding between the conductive components and between the conductive component and the metal foil 405 is strengthened. Densified and electrical connection between layers is obtained. Then, the porous substrate 402
Thermosetting resin and conductive paste 40 as constituents of
4 cures. Then, as shown in FIG.
05 is selectively etched into a predetermined pattern to complete a double-sided wiring board. Further, as shown in FIG. 12F, a porous base material 406 on which a conductive paste 408 is printed and a metal foil 407 are attached to both sides of the double-sided wiring board, and after heating and pressing, as shown in FIG. 12G. By selectively etching the metal foil 407 into a predetermined pattern, a multilayer wiring board is completed.
【0005】これらの回路形成用基板を用いて形成され
た樹脂多層基板は、低膨張率、低誘電率、軽量であると
いう長所を生かして多くの電子機器に利用されてきてい
る。[0005] A resin multilayer substrate formed by using these circuit-forming substrates has been used in many electronic devices, taking advantage of its low expansion coefficient, low dielectric constant, and light weight.
【0006】[0006]
【発明が解決しようとする課題】しかしながら、上記の
全層IVH構造を有する樹脂多層配線基板では、現在そ
の主たる構成材料が上記したようにアラミド不織布を芯
材とするものであり、電気絶縁性基材の構成はエポキシ
樹脂とアラミド不織布繊維が均質に混在した状態となっ
ている。アラミド不織布を芯材とする電気絶縁性基材は
厚さ方向の熱膨張係数(CTEともいう)が100pp
m/℃前後であり、全層IVH構造を形成するインナー
ビア導電体のCTE(約17ppm/℃)と大きく相違
している。However, in the above-mentioned resin multilayer wiring board having the all-layer IVH structure, at present, the main constituent material is an aramid nonwoven fabric as a core material as described above, The composition of the material is such that the epoxy resin and the aramid nonwoven fabric fibers are homogeneously mixed. The electrically insulating substrate having an aramid nonwoven fabric as a core has a thermal expansion coefficient (also referred to as CTE) in the thickness direction of 100 pp.
m / ° C., which is significantly different from the CTE (about 17 ppm / ° C.) of the inner via conductor forming the all-layer IVH structure.
【0007】したがって、急激な温度変化を生じる電子
機器の過酷な使用環境下においては若干の特性劣化が見
られるために、さらなる信頼性の高いプリント配線基板
が望まれていた。[0007] Therefore, under the severe use environment of electronic equipment which causes a rapid temperature change, a slight deterioration of the characteristics is observed, so that a more reliable printed wiring board has been desired.
【0008】本発明は上記課題を解決するものであり、
プリント配線基板全体の耐湿性を向上させることによっ
て接続信頼性、耐リペア性に優れ、また電気絶縁性基材
の曲げ剛性等の機械的強度を向上したプリント配線基板
およびその製造方法を提供することを第1番目の目的と
する。[0008] The present invention is to solve the above problems,
Provided is a printed wiring board having excellent connection reliability and repair resistance by improving the moisture resistance of the entire printed wiring board, and also having improved mechanical strength such as bending rigidity of an electrically insulating base material, and a method of manufacturing the same. Is the first purpose.
【0009】本発明の第2番目の目的は、前記第1番目
の目的に加えて、絶縁基板全体の熱膨張係数(CTE)
を小さくすることにより、配線パターンと絶縁基板との
接着性およびインナービア導体との接続信頼性を改善し
たプリント配線基板を提供することである。A second object of the present invention is to provide, in addition to the first object, a thermal expansion coefficient (CTE) of the entire insulating substrate.
It is an object of the present invention to provide a printed wiring board having improved adhesiveness between the wiring pattern and the insulating substrate and improved connection reliability with the inner via conductor by reducing the size of the printed wiring board.
【0010】[0010]
【課題を解決するための手段】前記目的を達成するた
め、本発明の第1番目のプリント配線基板は、電気絶縁
性基材の厚さ方向に開けられた貫通孔に導電性フィラー
を含む導電体が充填され、前記電気絶縁性基材の両面に
所定のパターンに形成された配線層が前記導電体によっ
て電気的に接続されているプリント配線基板において、
前記電気絶縁性基材がガラスクロスまたはガラス不織布
に微粒子を混入させた熱硬化性エポキシ樹脂を含浸させ
た基材で形成されており、かつ前記導電体に含まれる導
電性フィラーの平均粒径が前記微粒子の平均粒径よりも
大きいことを特徴とする。According to a first aspect of the present invention, there is provided a printed wiring board comprising a conductive filler containing a conductive filler in a through hole formed in a thickness direction of an electrically insulating substrate. Body is filled, a printed wiring board in which a wiring layer formed in a predetermined pattern on both surfaces of the electrically insulating substrate is electrically connected by the conductor,
The electrically insulating substrate is formed of a substrate impregnated with a thermosetting epoxy resin obtained by mixing fine particles into glass cloth or glass nonwoven fabric, and the average particle size of the conductive filler included in the conductor is The fine particles are larger than the average particle size.
【0011】次に本発明の第2番目のプリント配線基板
は、第1のインナービア導体により接続された少なくと
も2層の第1の配線パターンを有する内層配線基板と、
前記内層配線基板の両面にガラスエポキシ樹脂を絶縁基
材としてその内部に圧縮することにより導電性を付与し
た第2のインナービア導体および前記絶縁基材の最外表
面に配された第2の配線パターンを備えた外層配線基板
とからなり、前記第2のインナービア導体により前記内
層配線基板の表面の前記第1の配線パターンと前記外層
配線基板の前記第2の配線パターンとは電気的に接続さ
れていることを特徴とする。Next, a second printed wiring board according to the present invention includes an inner wiring board having at least two first wiring patterns connected by a first inner via conductor;
A second inner via conductor provided with conductivity by compressing glass epoxy resin as an insulating base material on both sides of the inner wiring board and a second wiring disposed on the outermost surface of the insulating base material An outer wiring board provided with a pattern, wherein the first inner wiring pattern on the surface of the inner wiring board and the second wiring pattern of the outer wiring board are electrically connected by the second inner via conductor. It is characterized by having been done.
【0012】次に本発明の第1番目の製造方法は、ガラ
スクロスまたはガラス不織布に、微粒子を混入させた熱
硬化性エポキシ樹脂を含浸させたプリプレグからなる電
気絶縁性基材の両面に離型質フィルムを覆った後に貫通
孔を設け、前記貫通孔に前記微粒子の平均粒径よりも大
きい平均粒径の導電性フィラーを含む導電体を充填し、
前記離型質フィルムを剥離した後に前記電気絶縁性基材
の両側に金属箔を重ね、前記金属箔を重ねた前記電気絶
縁性基材を加熱加圧して圧縮することにより、前記電気
絶縁性基材と前記金属箔を接着し、前記金属箔間を電気
的に接続し、前記金属箔を所定のパターンに形成するこ
とを特徴とする。Next, the first production method of the present invention is to release molds on both surfaces of an electrically insulating substrate made of a prepreg in which a glass cloth or a non-woven glass fabric is impregnated with a thermosetting epoxy resin mixed with fine particles. A through-hole is provided after covering the porous film, and the through-hole is filled with a conductor containing a conductive filler having an average particle diameter larger than the average particle diameter of the fine particles,
After peeling off the release film, a metal foil is laminated on both sides of the electrically insulating substrate, and the electrically insulating substrate on which the metal foil is laminated is heated and pressed to compress the electrically insulating substrate. A material and the metal foil are adhered, the metal foils are electrically connected to each other, and the metal foil is formed in a predetermined pattern.
【0013】次に本発明の第2番目の製造方法は、第1
のインナービア導体により接続された少なくとも2層の
第1の配線パターンを有する内層配線基板の両面に、任
意の箇所の貫通孔内に第2のインナービア導体を形成す
るための導電性ペーストを充填したプリプレグ状態のガ
ラスエポキシ樹脂絶縁基板を配置し、さらに前記2枚の
ガラスエポキシ樹脂絶縁基板のそれぞれ外側に銅箔を配
置して前記2枚の銅箔の外側から前記内層配線基板およ
びプリプレグ状態のガラスエポキシ樹脂絶縁基板を加
圧、加熱することにより、前記内層配線基板の両面に突
出して設けられている配線パターンを前記プリプレグ状
態のガラスエポキシ樹脂絶縁基板の内部に圧入すると同
時に前記ガラスエポキシ樹脂絶縁基板に設けられている
前記導電性ペーストを圧縮して前記最外層の銅箔と前記
内層配線基板の第1の配線パターンとを電気的に接続し
た後、前記銅箔を選択的にエッチングして第2の配線パ
ターンを形成して外層配線基板とすることを特徴とす
る。Next, the second manufacturing method of the present invention is the first manufacturing method.
A conductive paste for forming a second inner via conductor in a through hole at an arbitrary location is filled on both surfaces of an inner wiring substrate having at least two layers of first wiring patterns connected by inner via conductors The glass epoxy resin insulating substrate in the prepreg state is disposed, and further, copper foil is disposed outside each of the two glass epoxy resin insulating substrates, and the inner layer wiring board and the prepreg state are disposed from outside the two copper foils. By pressing and heating the glass epoxy resin insulating substrate, a wiring pattern protruding from both sides of the inner layer wiring substrate is pressed into the inside of the glass epoxy resin insulating substrate in the prepreg state, and at the same time, the glass epoxy resin insulating substrate is pressed. The conductive paste provided on the substrate is compressed to form the outermost copper foil and the first layer of the inner layer wiring substrate. After the wiring patterns are electrically connected, characterized in that the copper foil is selectively etched to form a by the second wiring pattern and the outer layer wiring substrate.
【0014】[0014]
【発明の実施の形態】本発明の第1番目のプリント配線
基板によれば、プリント配線基板全体の耐湿性を向上さ
せることによって接続信頼性、耐リペア性に優れ、また
電気絶縁性基材の曲げ剛性等の機械的強度を向上したプ
リント配線基板を提供することができる。また、電気絶
縁性基材を構成するエポキシ樹脂に無機質フィラーを混
在させると、エポキシ樹脂の溶融粘度が上昇し、加熱加
圧時に電気絶縁性基材と金属箔の界面で生じる樹脂流れ
を抑制し、エポキシ樹脂が金属箔と導電体の界面に浸入
することを防ぐことによって導電体に充分な圧縮がかか
り、安定した接続信頼性が得られる。According to the first printed wiring board of the present invention, the moisture resistance of the entire printed wiring board is improved, whereby the connection reliability and the repair resistance are excellent, and the electric insulating base material is used. A printed wiring board having improved mechanical strength such as bending rigidity can be provided. Also, when an inorganic filler is mixed with the epoxy resin constituting the electrically insulating base material, the melt viscosity of the epoxy resin increases, and the resin flow generated at the interface between the electrically insulating base material and the metal foil during heating and pressing is suppressed. By preventing the epoxy resin from entering the interface between the metal foil and the conductor, the conductor is sufficiently compressed, and stable connection reliability is obtained.
【0015】また、無機質フィラーの平均粒径が、導電
性フィラーの平均粒径よりも小さいと、加熱加圧時に導
電性フィラーが拡散していくのを抑制し、導電体に充分
な圧縮がかかり、安定した接続信頼性が得られる。な
お、無機質フィラーの平均粒径は導電性フィラーの平均
粒径の10〜50%であることが好ましい。If the average particle size of the inorganic filler is smaller than the average particle size of the conductive filler, the conductive filler is prevented from diffusing during heating and pressurization, and the conductor is sufficiently compressed. , And stable connection reliability can be obtained. The average particle size of the inorganic filler is preferably 10 to 50% of the average particle size of the conductive filler.
【0016】前記導電性フィラーは、金、銀、銅、アル
ミニウムなどの金属粉を用いることができる。ビア孔径
が約50μm程度のときは、導電性フィラーの平均粒子
径は約5μm程度が好ましく、ビア孔径が約30μm程
度のときは、導電性フィラーの平均粒子径は約1〜3μ
m程度が好ましい。As the conductive filler, metal powder such as gold, silver, copper, and aluminum can be used. When the via hole diameter is about 50 μm, the average particle diameter of the conductive filler is preferably about 5 μm. When the via hole diameter is about 30 μm, the average particle diameter of the conductive filler is about 1 to 3 μm.
m is preferable.
【0017】また、無機質フィラーがSiO2、Ti
O2、Al2O3、MgO、SiCおよびAlN粉末から
選ばれる少なくとも1つであると、曲げ強度などの機械
的強度をさらに向上させたプリント配線基板を得ること
ができる。The inorganic filler is SiO 2 , Ti
When at least one selected from the group consisting of O 2 , Al 2 O 3 , MgO, SiC, and AlN powder, a printed wiring board with further improved mechanical strength such as bending strength can be obtained.
【0018】また、無機質フィラーの添加量が25〜4
5vol.%であると、溶融粘度を保ち、かつ導電体に充分
な圧縮をかけることができる。無機質フィラーの添加量
が25vol.%未満だと充分な溶融粘度を得ることができ
なくなって過剰な樹脂流れを起こし、45vol.%を越え
るとエポキシ樹脂の流動性が悪くなって導電体に充分な
圧縮をかけられなくなり、かつ密着性も低下する。な
お、無機質フィラーの添加量は35〜40vol.%であ
ることが好ましい。The amount of the inorganic filler added is 25 to 4
When it is 5 vol.%, The melt viscosity can be maintained and the conductor can be sufficiently compressed. If the amount of the inorganic filler is less than 25 vol.%, Sufficient melt viscosity cannot be obtained, causing excessive resin flow. If it exceeds 45 vol.%, The fluidity of the epoxy resin deteriorates, and the epoxy resin becomes insufficient. Compression cannot be applied, and the adhesion decreases. The amount of the inorganic filler added is 35 to 40 vol. %.
【0019】また、電気絶縁性基材の厚さが電気絶縁性
基材の厚さ方向に開けられた貫通孔の径よりも小さい
と、レーザー加工機等を使用して貫通孔を形成した時の
テーパーを抑制することができ、剛性を保ちつつ薄型で
軽量なプリント配線基板を提供することができる。な
お、電気絶縁性基材の厚さが薄いほど、導電体は圧縮さ
れやすいので(離形フィルムの厚さ分だけ、導電体は厚
くなっているので圧縮率が高くなる。)、貫通孔の径が
100〜200μmに対して、電気絶縁性基材の厚さは
50〜100μmであることが好ましい。If the thickness of the electrically insulating base material is smaller than the diameter of the through hole formed in the thickness direction of the electrically insulating base material, when the through hole is formed by using a laser processing machine or the like. Can be suppressed, and a thin and lightweight printed wiring board can be provided while maintaining rigidity. Note that the conductor is more likely to be compressed as the thickness of the electrically insulating substrate is smaller (the conductor is thicker by the thickness of the release film, so the compression ratio is higher). The thickness of the electrically insulating substrate is preferably 50 to 100 μm with respect to the diameter of 100 to 200 μm.
【0020】また、プリプレグ状態の電気絶縁性基材に
ボイドが含まれていると、加熱加圧時にボイドの分だけ
電気絶縁性基材が圧縮され、導電体に充分な圧縮がかか
り、安定した接続抵抗が得られる。When voids are contained in the electrically insulating base material in the prepreg state, the electrically insulating base material is compressed by the amount of the voids during heating and pressurization, and the conductor is sufficiently compressed, so that the conductor is stabilized. The connection resistance is obtained.
【0021】また、電気絶縁性基材の厚さ方向に開けら
れた貫通孔に充填された導電体の厚さ方向の熱膨張係数
(CTE)が電気絶縁性基材厚さ方向の熱膨張係数に対
してほぼ等しいと、急激な温度変化を生じる環境下にお
いても、CTEのギャップによって生じる歪を抑制し、
安定した接続信頼性が得られる。なお、導電体の厚さ方
向のCTEは電気絶縁性基材厚さ方向のCTEと等しい
ことが好ましい。Further, the coefficient of thermal expansion (CTE) in the thickness direction of the conductor filled in the through hole formed in the thickness direction of the electrically insulating substrate is determined by the coefficient of thermal expansion in the thickness direction of the electrically insulating substrate. , The strain caused by the CTE gap is suppressed even in an environment where a rapid temperature change occurs,
Stable connection reliability is obtained. The CTE in the thickness direction of the conductor is preferably equal to the CTE in the thickness direction of the electrically insulating base material.
【0022】また、本発明のプリント配線基板を複数枚
積層した多層プリント配線基板とすることもできる。こ
れにより、高信頼性なビアホール接続を有する多層プリ
ント配線基板を提供することができる。Further, a multilayer printed wiring board obtained by laminating a plurality of printed wiring boards of the present invention can be provided. Thereby, a multilayer printed wiring board having highly reliable via hole connection can be provided.
【0023】また、本発明の多層プリント配線基板にお
いて、電気絶縁性基材の厚さ方向に開けられた貫通孔に
充填された導電体の厚さがほぼ等しいと、優れたインピ
ーダンス特性が得られ、高周波回路に適応したプリント
配線基板を提供することができる。In the multilayer printed wiring board of the present invention, if the thickness of the conductor filled in the through hole formed in the thickness direction of the electrically insulating substrate is substantially equal, excellent impedance characteristics can be obtained. Thus, it is possible to provide a printed wiring board suitable for a high-frequency circuit.
【0024】また、導電体が導電性ペーストであると、
貫通孔内の導電性ペーストに圧縮がかかった際、導電性
ペースト中の樹脂成分が貫通孔内より排出され、導電性
ペースト中の導体成分が緻密化され、高信頼性を有する
ビアホール接続が可能になる。Further, when the conductor is a conductive paste,
When the conductive paste in the through hole is compressed, the resin component in the conductive paste is discharged from the through hole, and the conductive component in the conductive paste is densified, enabling highly reliable via hole connection become.
【0025】また、貫通孔がレーザー加工機によって形
成されると、配線パターンの微細化に応じた微細な直径
を有する貫通孔の形成が容易、かつ高速で行う事ができ
る。When the through holes are formed by a laser beam machine, the formation of the through holes having a fine diameter corresponding to the miniaturization of the wiring pattern can be performed easily and at a high speed.
【0026】次に本発明の第1番目の製造方法によれ
ば、耐湿性、接続信頼性、あるいは耐リペア性に優れ、
また電気絶縁性基材の曲げ剛性等の機械的強度を向上し
た両面プリント配線基板を提供することができる。Next, according to the first manufacturing method of the present invention, excellent in moisture resistance, connection reliability, or repair resistance,
Further, it is possible to provide a double-sided printed wiring board having improved mechanical strength such as bending rigidity of the electrically insulating substrate.
【0027】また、電気絶縁性基材の厚さが、加熱加圧
前後で薄くなると、導電体に充分な圧縮をかけることが
できる。なお、樹脂流れを抑制するために、電気絶縁性
基材の厚さは加熱加圧前後で10〜15%薄くなること
が好ましい。Further, when the thickness of the electrically insulating base material is reduced before and after heating and pressing, the conductor can be sufficiently compressed. In order to suppress the resin flow, it is preferable that the thickness of the electrically insulating base material is reduced by 10 to 15% before and after heating and pressing.
【0028】また、電気絶縁性基材の厚さ方向に開けら
れた貫通孔に充填された導電体の厚さが、加熱加圧前後
で薄くなると、充分な圧縮によって導電体中の導体成分
が緻密化され、高信頼性を有するビアホール接続が可能
となる。なお、導電体の厚さは加熱加圧によって30〜
40%薄くなることが好ましい。When the thickness of the conductor filled in the through hole formed in the thickness direction of the electrically insulating base material is reduced before and after heating and pressing, the conductor component in the conductor is reduced by sufficient compression. Dense and highly reliable via hole connection becomes possible. In addition, the thickness of the conductor is 30 to
Preferably, it is 40% thinner.
【0029】また、加熱加圧後の電気絶縁性基材の中央
と周辺の厚みがほぼ等しいと、加熱加圧時に電気絶縁性
基材全体に均等に圧縮がかかり、接続抵抗のバラツキを
抑制することができる。When the thickness of the center of the electrically insulating substrate after heating and pressing is substantially equal to that of the periphery, the entire electrically insulating substrate is uniformly compressed at the time of heating and pressing, thereby suppressing variation in connection resistance. be able to.
【0030】また、前記両面プリント配線基板の両側
に、導電体が充填されたガラスクロスあるいはガラス不
織布に熱硬化性エポキシ樹脂を含浸させたプリプレグか
ら成る電気絶縁性基材と金属箔を貼り付けて加熱加圧し
て圧縮することにより、前記電気絶縁性基材の表面の樹
脂層に前記両面プリント配線基板の配線層を埋設して全
ての導電体の厚さをほぼ等しくする工程と、前記金属箔
を所定のパターンに形成する工程を有することにより、
優れた信頼性を備え、超小型化された電子部品等を高密
度実装することが可能な緻密配線パターンを形成でき
る、剛性の高い薄型で小型な多層プリント配線基板を得
ることができる。An electric insulating base material made of a prepreg obtained by impregnating a thermosetting epoxy resin into a glass cloth or a non-woven glass fabric filled with a conductor and a metal foil are attached to both sides of the double-sided printed wiring board. A step of burying the wiring layer of the double-sided printed wiring board in a resin layer on the surface of the electrically insulating base material by heating and compressing to make the thickness of all conductors substantially equal; Having a step of forming a predetermined pattern,
A thin, high-rigidity, small-sized multilayer printed wiring board having excellent reliability and capable of forming a dense wiring pattern on which ultra-miniaturized electronic components and the like can be mounted at a high density can be obtained.
【0031】また、前記複数枚の両面プリント配線基板
の間に、導電体が充填されたガラスクロスあるいはガラ
ス不織布に熱硬化性エポキシ樹脂を含浸させたプリプレ
グから成る電気絶縁性基材を一括して貼り付けて加熱加
圧して圧縮することにより、前記電気絶縁性基材の表面
の樹脂層に前記両面プリント配線基板の配線層を埋設し
て全ての導電体の厚さをほぼ等しくする工程を有するこ
とにより、優れた信頼性を備え、超小型化された電子部
品等を高密度実装することが可能な緻密配線パターンを
形成できる多層プリント配線基板をより少ない工程で安
価に得ることができる。Further, an electrically insulating base material made of a prepreg obtained by impregnating a thermosetting epoxy resin into a glass cloth or a non-woven glass fabric filled with a conductor is collectively provided between the plurality of double-sided printed wiring boards. A step of burying the wiring layer of the double-sided printed wiring board in a resin layer on the surface of the electrically insulating base material by applying, compressing by heating and pressing, and making the thickness of all conductors substantially equal. This makes it possible to obtain a multilayer printed wiring board having excellent reliability and capable of forming a dense wiring pattern on which ultra-miniaturized electronic components and the like can be mounted at a high density with a reduced number of steps and at low cost.
【0032】次に本発明の第2番目のプリント配線基板
によれば、外層配線基板として高い機械的強度および耐
湿性を有するガラスエポキシ樹脂基板を配置することに
より、高い曲げ強度と耐湿性に優れた複合型のプリント
配線基板を得ることができる。According to the second printed wiring board of the present invention, a glass epoxy resin board having high mechanical strength and moisture resistance is arranged as an outer wiring board, so that it is excellent in high bending strength and moisture resistance. Thus, a composite printed wiring board can be obtained.
【0033】また、内層配線基板としてアラミド不織布
に熱硬化性エポキシ樹脂を含浸させたものを絶縁基材と
して用いることが好ましく、このことにより絶縁基材の
任意の箇所に微細径の第1のインナービア導体を設ける
ことができ、全層IVH構造とすることができるので高
密度配線を形成したプリント配線基板を得ることができ
る。It is preferable to use an aramid nonwoven fabric impregnated with a thermosetting epoxy resin as the insulating substrate as the inner layer wiring substrate, so that the first inner layer having a fine diameter can be formed at an arbitrary position on the insulating substrate. Since a via conductor can be provided and an all-layer IVH structure can be obtained, a printed wiring board on which high-density wiring is formed can be obtained.
【0034】また外層配線基板として、ガラス繊維に含
浸させるエポキシ樹脂にはSiO2、TiO2、Al
2O3、MgO、SiCまたはAlN粉末等の無機質フィ
ラーから選ばれる少なくとも1つを30重量%〜70重
量%の範囲で混在させることが好ましく、曲げ強度をさ
らに向上することができ、圧縮性に優れたプリント配線
基板を得ることができる。Epoxy resin impregnated into glass fiber as the outer wiring board is made of SiO 2 , TiO 2 , Al.
It is preferable that at least one selected from inorganic fillers such as 2 O 3 , MgO, SiC or AlN powder is mixed in a range of 30% by weight to 70% by weight, so that the bending strength can be further improved and the compressibility can be improved. An excellent printed wiring board can be obtained.
【0035】次に本発明の第2番目の製造方法によれ
ば、高い曲げ強度と耐湿性に優れた複合プリント配線基
板を提供することができる。Next, according to the second manufacturing method of the present invention, it is possible to provide a composite printed wiring board having high bending strength and excellent moisture resistance.
【0036】[0036]
【実施例】つぎに本発明の実施例について図面を参照し
ながらさらに具体的に説明する。Next, embodiments of the present invention will be described more specifically with reference to the drawings.
【0037】(実施例1)図1A〜図1Fは、本発明の
第1の実施例における両面配線基板の製造方法を示す工
程断面図である。(Embodiment 1) FIGS. 1A to 1F are process sectional views showing a method for manufacturing a double-sided wiring board according to a first embodiment of the present invention.
【0038】まず図1Aに示すように、ガラスクロスに
平均粒子径が2μmのSiCの微粒子を40vol.%混入
させた熱硬化性エポキシ樹脂を含浸させたガラスエポキ
シのプリプレグである電気絶縁性基材102の両面にポ
リエステル等の離形フィルム101をラミネートした。
ラミネートは120℃程度の温度で行った。これによ
り、電気絶縁性基材102の表面の樹脂層がわずかに溶
融して離形フィルム101を貼りつけることができた。
本実施例では電気絶縁性基材として、ガラスクロスの厚
さ100μm、表面の樹脂層の厚さ15μm、基材の厚
さ130μmのガラスエポキシプリプレグを用いた。図
5は、プリント配線基板の基材の樹脂層の厚みと初期抵
抗値の依存性を示す関係図である。基材の樹脂層の厚さ
が薄くなるにつれて、初期抵抗値が低くなっていること
から、本実施例では樹脂層の厚さ130μmの基材を用
いた。さらに、離形フィルムに19μm厚のポリエチレ
ンテレフタレート(PET)を用いた。なお、ガラスク
ロスのかわりにガラス不織布を用い、表面に樹脂層を形
成した電気絶縁性基材を使用する事も可能である。First, as shown in FIG. 1A, an electrically insulating substrate which is a glass epoxy prepreg impregnated with a thermosetting epoxy resin in which glass cloth is mixed with 40 vol.% Of SiC fine particles having an average particle diameter of 2 μm. A release film 101 made of polyester or the like was laminated on both sides of the substrate 102.
Lamination was performed at a temperature of about 120 ° C. As a result, the resin layer on the surface of the electrically insulating substrate 102 was slightly melted, and the release film 101 could be attached.
In this example, a glass epoxy prepreg having a thickness of 100 μm of glass cloth, a thickness of 15 μm of a resin layer on the surface, and a thickness of 130 μm of the substrate was used as the electrically insulating substrate. FIG. 5 is a relationship diagram showing the dependency between the thickness of the resin layer of the base material of the printed wiring board and the initial resistance value. Since the initial resistance value decreases as the thickness of the resin layer of the base material decreases, a base material having a resin layer thickness of 130 μm was used in this example. Further, polyethylene terephthalate (PET) having a thickness of 19 μm was used for the release film. In addition, it is also possible to use a glass nonwoven fabric instead of a glass cloth and use an electrically insulating substrate having a resin layer formed on the surface.
【0039】また、微粒子として、無機質フィラーで
は、SiCの他にSiO2、TiO2、Al2O3、MgO
およびAlNがあり、有機質フィラーでは、ベンゾグア
ナミン、ポリアミド、ポリイミド、メラミン樹脂、エポ
キシ樹脂等を含ませることができ、無機質フィラーと有
機質フィラーを混合させても良い。As fine particles, inorganic fillers such as SiO 2 , TiO 2 , Al 2 O 3 , MgO
And AlN. The organic filler can include benzoguanamine, polyamide, polyimide, melamine resin, epoxy resin, and the like, and may be mixed with an inorganic filler and an organic filler.
【0040】次に図1Bに示すように、電気絶縁性基材
102の所定の箇所にレーザー加工法により貫通孔10
3を形成した。上記レーザー加工機により形成された貫
通孔は孔径約100μmとなった。また、ガラスエポキ
シのプリプレグには空孔が10vol.%含まれており、
空孔の径は3μmであった。Next, as shown in FIG. 1B, through holes 10 are formed in predetermined portions of the electrically insulating base material 102 by a laser processing method.
3 was formed. The through hole formed by the laser processing machine had a hole diameter of about 100 μm. The glass epoxy prepreg has 10 vol. % Included
The pore diameter was 3 μm.
【0041】次に図1Cに示すように、貫通孔103に
導電ペースト104を充填した。充填方法としては、ス
クリーン印刷機により、直接導電ペースト104を離形
フィルム101上から印刷することで充填した。この
際、印刷面と反対側より和紙等の多孔質シートを介して
真空吸着することにより、貫通孔103内の導電ペース
ト104中の樹脂成分を吸い取り、導体成分の割合を増
加させることで導体成分を更に緻密に充填することがで
きた。また、離形フィルム101は印刷マスクの役割と
電気絶縁性基材102表面の汚染防止の役割を果たして
いた。なお、導電ペースト中の導電フィラーの平均粒径
は5μmで空孔の径よりも大きく、また微粒子の粒径よ
りも大きかった。Next, as shown in FIG. 1C, the conductive paste 104 was filled in the through holes 103. As a filling method, the conductive paste 104 was directly printed on the release film 101 by a screen printing machine to be filled. At this time, the resin component in the conductive paste 104 in the through-hole 103 is sucked by vacuum suction from a side opposite to the printing surface through a porous sheet such as Japanese paper, and the ratio of the conductor component is increased by increasing the ratio of the conductor component. Could be more densely packed. Further, the release film 101 plays a role of a print mask and a role of preventing contamination of the surface of the electrically insulating base material 102. The average particle size of the conductive filler in the conductive paste was 5 μm, larger than the diameter of the pores, and larger than the particle size of the fine particles.
【0042】次に図1Dに示すように、電気絶縁性基材
102の両面から離形フィルム101を剥離し、電気絶
縁性基材102の両面に銅箔等の金属箔105を重ね合
わせ、加熱加圧した。加熱加圧は真空プレスにより行っ
た。条件は、温度:200℃、圧力:4.9MPa、真
空度:5.33×103Pa(40Torr)、処理時間:1時間であっ
た。Next, as shown in FIG. 1D, the release film 101 is peeled off from both sides of the electrically insulating substrate 102, and a metal foil 105 such as a copper foil is laminated on both sides of the electrically insulating substrate 102, and heated. Pressurized. The heating and pressurization was performed by a vacuum press. The conditions were as follows: temperature: 200 ° C., pressure: 4.9 MPa, degree of vacuum: 5.33 × 10 3 Pa (40 Torr), processing time: 1 hour.
【0043】この条件で加熱加圧することにより、図1
Eに示すように、電気絶縁性基材102は圧縮され、そ
の厚さは中央で118μm、周辺で116μmに薄くな
り、中央と周辺の厚みの差は約2%となった。全体の圧
縮率は約10%であった。その際、貫通孔103内の導
電ペースト104も圧縮されるが、その時に導電ペース
ト内のバインダ成分が押し出され、導電成分同士および
導電成分と金属箔105間の結合が強固になり、導電ペ
ースト104中の導電物質が緻密化された。この時の導
電体の圧縮率は(168−117)×100/168=30.4%であっ
た。その後、電気絶縁性基材102の構成成分である熱
硬化性樹脂および導電ペースト104を、温度:200
℃、圧力:4.9MPa、真空度:5.33×103Pa(40Tor
r)で1時間処理することにより、硬化させた。By heating and pressurizing under these conditions, FIG.
As shown in E, the electrically insulating substrate 102 was compressed, and its thickness was reduced to 118 μm at the center and 116 μm at the periphery, and the difference between the thickness at the center and the periphery was about 2%. The overall compression was about 10%. At that time, the conductive paste 104 in the through-hole 103 is also compressed, but at that time, the binder component in the conductive paste is extruded, and the bonding between the conductive components and between the conductive component and the metal foil 105 is strengthened. The conductive material inside was densified. The compression ratio of the conductor at this time was (168−117) × 100/168 = 30.4%. Then, the thermosetting resin and the conductive paste 104, which are the components of the electrically insulating base material 102, are heated at a temperature of 200.
° C, pressure: 4.9MPa, degree of vacuum: 5.33 × 10 3 Pa (40Tor
The composition was cured by treating for 1 hour in r).
【0044】最後に図1Fに示すように、金属箔105
を所定のパターンに選択エッチングすることによって、
電気絶縁性基材102表裏の配線層106間の電気的接
続が得られ、両面配線基板が完成した。Finally, as shown in FIG. 1F, the metal foil 105
Is selectively etched into a predetermined pattern,
Electrical connection between the wiring layers 106 on the front and back of the electrically insulating base material 102 was obtained, and the double-sided wiring board was completed.
【0045】本実施例では、導電性ペーストに含まれる
導電紛の平均粒径は5μmであり、無機質フィラーの平
均粒径は導電紛の平均粒径の40%であった。また、導
電体厚さ方向のCTEは約30ppm/℃、電気絶縁性
基材の厚さ方向のCTEは約20ppm/℃であり、導
電体のCTEは電気絶縁性基材のCTEよりも大きかっ
た。In this example, the average particle size of the conductive powder contained in the conductive paste was 5 μm, and the average particle size of the inorganic filler was 40% of the average particle size of the conductive powder. The CTE in the thickness direction of the conductor was about 30 ppm / ° C., the CTE in the thickness direction of the electrically insulating substrate was about 20 ppm / ° C., and the CTE of the conductor was larger than that of the electrically insulating substrate. .
【0046】このように微粒子の平均粒径より大きいフ
ィラーを用いることで、加熱加圧の際に、電気絶縁性基
材の表面の樹脂層において、微粒子が盾となって導電性
フィラーの拡散を抑制することができ、導電体に充分な
圧縮がかかり、安定した接続信頼性が得られ、かつ優れ
た吸湿特性も得られる。よって、はんだディップ、ある
いはリペアの際にも急激な温度変化によって導電体と配
線層が剥離するのを抑制することができる。By using a filler larger than the average particle size of the fine particles, the fine particles act as a shield in the resin layer on the surface of the electrically insulating base material during heating and pressurization, thereby preventing diffusion of the conductive filler. The conductor can be sufficiently compressed, stable connection reliability can be obtained, and excellent moisture absorption characteristics can be obtained. Therefore, it is possible to prevent the conductor and the wiring layer from peeling off due to a rapid temperature change even during solder dip or repair.
【0047】さらに、電気絶縁性基材を構成するエポキ
シ樹脂に無機質フィラーであるSiCを40vol.%混在
させており、平均粒径は2μmであった。図4A−C
は、プリント配線基板の抵抗値のバラツキを示す分布図
である。図4Aに示すように、フィラー充填量が20vo
l.%の場合は抵抗値がばらついていた。これに対し、図
4Bに示すように、フィラー量が30vol.%の場合は分
布がまとまっているが若干のバラツキが見られた。そし
て、図4Cに示すように、フィラー量が40vol.%の場
合はさらにまとまった分布が見られた。Further, 40 vol.% Of SiC as an inorganic filler was mixed in the epoxy resin constituting the electrically insulating base material, and the average particle size was 2 μm. 4A-C
FIG. 4 is a distribution diagram showing variation in resistance value of a printed wiring board. As shown in FIG.
In the case of l.%, the resistance values varied. On the other hand, as shown in FIG. 4B, when the amount of the filler was 30 vol.%, The distribution was large, but a slight variation was observed. And, as shown in FIG. 4C, when the filler amount was 40 vol.%, A more uniform distribution was observed.
【0048】また、微粒子の添加量が25〜45vol.%
であると、溶融粘度を保ち、かつ導電体に充分な圧縮を
かけることができるので、安定した接続信頼性が得られ
る。微粒子の添加量が25vol.%未満だと、充分な溶融
粘度を得ることができなくなり、電気絶縁性基材の表面
の樹脂層で過剰な樹脂流れを起こし、導電体に含まれる
導電性フィラーが拡散するため、導電体にかかる圧力も
拡散してしまう。さらに、拡散した導電性フィラー自体
がマイグレーションを起こして絶縁不良になる可能性も
ある。また、微粒子の添加量が45vol.%を越えると、
充分な密着性が得られるだけのエポキシ樹脂の量が不足
し、かつエポキシ樹脂の流動性が悪くなって導電体に充
分な圧縮をかけられなくなる。なお、微粒子の添加量は
30〜35vol.%であることがより望ましい。The amount of the fine particles added is 25 to 45 vol.
In this case, since the melt viscosity can be maintained and the conductor can be sufficiently compressed, stable connection reliability can be obtained. If the addition amount of the fine particles is less than 25 vol.%, A sufficient melt viscosity cannot be obtained, and an excessive resin flow occurs in the resin layer on the surface of the electrically insulating base material, and the conductive filler contained in the conductor is Because of the diffusion, the pressure applied to the conductor also diffuses. Furthermore, the diffused conductive filler itself may cause migration and cause insulation failure. When the amount of the fine particles exceeds 45 vol.%,
The amount of epoxy resin that is sufficient to obtain sufficient adhesion is insufficient, and the fluidity of the epoxy resin is deteriorated, so that the conductor cannot be sufficiently compressed. The addition amount of the fine particles is 30 to 35 vol. % Is more desirable.
【0049】本実施の形態のプリント配線基板は、電気
絶縁性基材の曲げ剛性等の機械的強度を向上し、かつ接
続信頼性、吸湿特性に優れたプリント配線基板を提供す
ることができる。The printed wiring board of the present embodiment can provide a printed wiring board having improved mechanical strength such as bending stiffness of an electrically insulating base material, and excellent in connection reliability and moisture absorption properties.
【0050】(実施例2)図2A−Dは、本発明の第2
の実施例における両面配線基板の製造方法を示す工程断
面図である。Embodiment 2 FIGS. 2A to 2D show a second embodiment of the present invention.
FIG. 10 is a process cross-sectional view illustrating the method for manufacturing the double-sided wiring board in the Example of FIG.
【0051】まず図2Aに示すように、第1の実施の形
態の図1Fと同様にして作製されたコア基板201を準
備した。First, as shown in FIG. 2A, a core substrate 201 manufactured in the same manner as in FIG. 1F of the first embodiment was prepared.
【0052】次に、図2Bに示すように、コア基板20
1の両側に第1の実施の形態の図1C工程にある電気絶
縁性基材202を重ね合わせ、更にその両側に金属箔2
03を重ね合わせ、加熱加圧した。加熱加圧は真空熱プ
レスにより行った。条件は、温度:200℃、圧力:
4.9MPa、真空度:5.33×103Pa(40Torr)、処理時
間:1時間であった。Next, as shown in FIG.
1 is superimposed on both sides of the electrically insulating substrate 202 in the step of FIG. 1C of the first embodiment.
03 were overlaid and heated and pressed. Heating and pressurization was performed by a vacuum hot press. Conditions are temperature: 200 ° C, pressure:
4.9 MPa, degree of vacuum: 5.33 × 10 3 Pa (40 Torr), processing time: 1 hour.
【0053】この加熱加圧により、電気絶縁性基材20
2は圧縮されて薄くなり、さらに配線層204は電気絶
縁性基材202内に埋め込まれた。その際、導電性ペー
スト205も圧縮されるが、その時に導電性ペースト内
のバインダ成分が押し出され、導電成分同士および導電
成分と金属箔203間の結合が強固になり、導電性ペー
スト205中の導電物質が緻密化された。その後、電気
絶縁性基材202の構成成分である熱硬化性樹脂および
導電性ペースト205が硬化した。The heating and pressurization causes the electrically insulating substrate 20
2 was compressed and thinned, and the wiring layer 204 was embedded in the electrically insulating substrate 202. At that time, the conductive paste 205 is also compressed, but at that time, the binder component in the conductive paste is extruded, and the bonding between the conductive components and between the conductive component and the metal foil 203 is strengthened. The conductive material was densified. Thereafter, the thermosetting resin and the conductive paste 205, which are the components of the electrically insulating base 202, were cured.
【0054】次に、図2Cに示すように、金属箔203
を所定のパターンに選択エッチングすることによって、
配線層204と配線層206の間の電気的接続が得ら
れ、4層配線基板が完成した。Next, as shown in FIG.
Is selectively etched into a predetermined pattern,
Electrical connection between the wiring layer 204 and the wiring layer 206 was obtained, and a four-layer wiring board was completed.
【0055】最後に、図2Dに示すように、4層配線基
板の両側に電気絶縁性基材207を重ね合わせ、図2
B、図2Cと同様の工程を経て、配線層206と配線層
208の間の電気的接続が得られ、6層配線基板が完成
した。Finally, as shown in FIG. 2D, an electrically insulating base material 207 is superposed on both sides of the four-layer wiring board.
B, through the same steps as in FIG. 2C, electrical connection between the wiring layer 206 and the wiring layer 208 was obtained, and a six-layer wiring board was completed.
【0056】本実施例の6層配線基板は、全層をガラス
エポキシで構成することによって、超小型化された電子
部品等を高密度実装することが可能な緻密配線パターン
を形成できる、剛性、吸湿性、あるいはリペア性に優れ
た多層プリント配線基板を提供することができる。In the six-layer wiring board of this embodiment, since all layers are made of glass epoxy, it is possible to form a dense wiring pattern on which ultra-miniaturized electronic parts and the like can be mounted at a high density. A multilayer printed wiring board having excellent hygroscopicity or repairability can be provided.
【0057】(実施例3)図3A、図3Bは、本発明の
第3の実施例における両面配線基板の製造方法を示す工
程断面図である。(Embodiment 3) FIGS. 3A and 3B are process sectional views showing a method for manufacturing a double-sided wiring board according to a third embodiment of the present invention.
【0058】まず図3Aに示すように、第1の実施例の
図1Fと同様にして作製されたコア基板301を3枚、
第1の実施例の図1C工程にある電気絶縁性基材302
を2枚準備し、コア基板301の間に電気絶縁性基材3
02をそれぞれ重ね合わせ、加熱加圧した。加熱加圧は
真空熱プレスにより行った。条件は、温度:200℃、
圧力:4.9MPa、真空度:5.33×103Pa(40Torr)、
処理時間:1時間であった。First, as shown in FIG. 3A, three core substrates 301 manufactured in the same manner as in FIG.
The electrically insulating substrate 302 in the step of FIG. 1C of the first embodiment.
Are prepared, and the electrically insulating base material 3 is placed between the core substrates 301.
02 were superimposed and heated and pressed. Heating and pressurization was performed by a vacuum hot press. Conditions are temperature: 200 ° C,
Pressure: 4.9 MPa, degree of vacuum: 5.33 × 10 3 Pa (40 Torr),
Processing time: 1 hour.
【0059】この加熱加圧により、図3Bに示すよう
に、電気絶縁性基材302は圧縮されて薄くなり、さら
に配線層303は電気絶縁性基材302内に埋め込まれ
た。その際、導電性ペースト304も圧縮されるが、そ
の時に導電性ペースト内のバインダ成分が押し出され、
導電成分同士および導電成分と配線層303間の結合が
強固になり、導電性ペースト304中の導電物質が緻密
化された。その後、電気絶縁性基材302の構成成分で
ある熱硬化性樹脂および導電性ペースト304は、前記
加熱加圧により硬化し、配線層303間の電気的に接続
され、6層配線基板が完成した。By this heating and pressing, as shown in FIG. 3B, the electrically insulating substrate 302 was compressed and thinned, and the wiring layer 303 was embedded in the electrically insulating substrate 302. At that time, the conductive paste 304 is also compressed, but at that time, the binder component in the conductive paste is extruded,
Bonding between the conductive components and between the conductive component and the wiring layer 303 was strengthened, and the conductive material in the conductive paste 304 was densified. Thereafter, the thermosetting resin and the conductive paste 304, which are the components of the electrically insulating base material 302, are cured by the heating and pressurization, and are electrically connected between the wiring layers 303, thereby completing the six-layer wiring board. .
【0060】本実施例の6層配線基板は、全層をガラス
エポキシで構成し、一括して積層することによって、超
小型化された電子部品等を高密度実装することが可能な
緻密配線パターンを形成できる、剛性、吸湿性、あるい
はリペア性に優れた多層プリント配線基板をより少ない
工程で安価に提供することができる。The six-layer wiring board of the present embodiment has a dense wiring pattern in which all layers are made of glass epoxy and laminated at a time so that ultra-miniaturized electronic parts can be mounted at a high density. And a multilayer printed wiring board excellent in rigidity, hygroscopicity or repairability can be provided inexpensively with fewer steps.
【0061】(実施例4)図6は本発明の実施例4にお
けるプリント配線基板を示す。ガラスエポキシ樹脂を絶
縁基材5とする外層配線基板6は、実施例1と同様に作
製した。そして、第1のインナービア導体1aと、第1
の配線パターン2aが形成されたアラミドエポキシ樹脂
を絶縁基材3とする3層構造の全層IVH構造の内層配
線基板4の両面に、第2のインナービア導体1bによっ
て内層配線基板4の第1の配線パターン2aと接続され
ている最外層の第2の配線パターン2bを有するガラス
エポキシ樹脂を絶縁基材5とする外層配線基板6を配置
した。第2のインナービア導体1bは、内層配線基板4
と外層配線基板6を積層し一体成形する際に、貫通孔内
に充填された導電性ペーストが圧縮されて形成された。
このようにして形成された第2のインナービア導体1b
は、十分な導電性を有していた。(Embodiment 4) FIG. 6 shows a printed wiring board according to Embodiment 4 of the present invention. The outer wiring board 6 using the glass epoxy resin as the insulating base material 5 was produced in the same manner as in Example 1. Then, the first inner via conductor 1a and the first
The first inner layer wiring board 4 is formed on both surfaces of an inner layer wiring board 4 having an all-layer IVH structure having a three-layer structure using an aramid epoxy resin having the wiring pattern 2a formed thereon as an insulating base material 3 by a second inner via conductor 1b. An outer wiring board 6 having an insulating base material 5 made of glass epoxy resin having an outermost second wiring pattern 2b connected to the wiring pattern 2a is disposed. The second inner via conductor 1b is
The conductive paste filled in the through-hole was formed by compression when the and the outer wiring board 6 were laminated and integrally formed.
The second inner via conductor 1b thus formed
Had sufficient conductivity.
【0062】(実施例5)つぎに図7は本発明の実施例
5を示すものであり、実施例4と異なる点は図7に示す
ように内層配線基板4がアラミドエポキシ樹脂を絶縁基
材3とする両面配線基板となっている点であり、その他
の構成は第1の実施の形態と同様である。(Embodiment 5) Next, FIG. 7 shows Embodiment 5 of the present invention. The difference from Embodiment 4 is that, as shown in FIG. 3 is a double-sided wiring board, and the other configuration is the same as that of the first embodiment.
【0063】(実施例6)つぎに本発明の実施例6にお
けるプリント配線基板の製造方法について図8A〜図8
Cを用いて、図6と同一部分には同一番号を付して説明
する。Embodiment 6 Next, a method for manufacturing a printed wiring board according to Embodiment 6 of the present invention will be described with reference to FIGS.
Using C, the same parts as those in FIG.
【0064】図8Aに示すように、各層の第1の配線パ
ターン2aが第1のインナービア導体1aで接続された
全層IVH構造を有する内層配線基板4の両面に第2の
インナービア導体1bを形成するための銀または銅等の
導電性粉末を主成分とする導電性ペースト7が印刷等に
より充填されたプリプレグ状態のガラスエポキシ樹脂よ
りなる絶縁基材5を配置し、さらにその両外側に銅箔8
を配置する。As shown in FIG. 8A, second inner via conductors 1b are formed on both surfaces of an inner wiring board 4 having an all-layer IVH structure in which first wiring patterns 2a of each layer are connected by first inner via conductors 1a. An insulating base material 5 made of a glass epoxy resin in a prepreg state filled with a conductive paste 7 containing a conductive powder such as silver or copper as a main component by printing or the like is formed on both sides thereof. Copper foil 8
Place.
【0065】その後、図8Bに示すように、その両側面
から金型等のプレス機を用いて加圧、加熱することによ
り全体を圧縮、積層する。このようにすることにより内
層配線基板4の最外層に形成されている第1の配線パタ
ーン2aは圧縮前にプリプレグ状態にあったガラスエポ
キシ樹脂基板5の表面層の内部に圧入されると同時にガ
ラスエポキシ樹脂絶縁基材5に設けられている導電性ペ
ースト7が圧縮されて導電性を生じ、第2のインナービ
ア導体1bとなって第1の配線パターン2aと銅箔8と
を電気的に接続する。このとき銅箔8は絶縁基材5の表
面に流動しているエポキシ樹脂層によって強固に接着さ
れる。Thereafter, as shown in FIG. 8B, the whole is compressed and laminated by pressing and heating from both sides using a press machine such as a mold. By doing so, the first wiring pattern 2a formed on the outermost layer of the inner wiring board 4 is pressed into the surface layer of the glass epoxy resin substrate 5 which was in a prepreg state before compression, and The conductive paste 7 provided on the epoxy resin insulating base material 5 is compressed to generate conductivity, and becomes the second inner via conductor 1b to electrically connect the first wiring pattern 2a and the copper foil 8. I do. At this time, the copper foil 8 is firmly bonded by the epoxy resin layer flowing on the surface of the insulating base material 5.
【0066】つぎに図8Cに示すように、両面に接着さ
れた最外層の銅箔8を通常のフォトリソ法によって選択
的にパターンニングして第2の配線パターン2bを形成
することにより第1の配線パターン2aおよび第2の配
線パターン2bが第1のインナービア導体1aおよび第
2のインナービア導体1bで相互に接続された多層構造
の複合プリント配線基板を得ることができる。Next, as shown in FIG. 8C, the outermost copper foil 8 adhered to both sides is selectively patterned by a normal photolithography method to form a second wiring pattern 2b, thereby forming a first wiring pattern 2b. A composite printed wiring board having a multilayer structure in which the wiring pattern 2a and the second wiring pattern 2b are connected to each other by the first inner via conductor 1a and the second inner via conductor 1b can be obtained.
【0067】図9Aは、図8Aに示す製造方法において
内層配線基板4に絶縁基材5と銅箔8を積層するときの
状態を一部拡大して示すものであり、図9Aに示すよう
にプリプレグ状態のガラスエポキシ樹脂よりなる絶縁基
材5は、ガラス繊維5aが絶縁基材の内層に凝集しエポ
キシ樹脂5bが絶縁基材5の表面に滞留した状態となっ
ている。FIG. 9A is a partially enlarged view showing a state where the insulating base material 5 and the copper foil 8 are laminated on the inner wiring board 4 in the manufacturing method shown in FIG. 8A. The insulating base material 5 made of a glass epoxy resin in a prepreg state is in a state where the glass fibers 5a are aggregated on the inner layer of the insulating base material and the epoxy resin 5b stays on the surface of the insulating base material 5.
【0068】したがってこの絶縁基材5と内層配線基板
4および銅箔8を図のように配置した後、両側面から加
熱、加圧することにより、図9Bに示すように内層配線
基板4の配線パターン2aは絶縁基材5の表面に滞留し
ているエポキシ樹脂5bの内部に圧入されて埋め込まれ
た状態となる。Therefore, after arranging the insulating base material 5, the inner wiring board 4 and the copper foil 8 as shown in the figure, by applying heat and pressure from both sides, the wiring pattern of the inner wiring board 4 as shown in FIG. 2a is pressed into and embedded in the epoxy resin 5b staying on the surface of the insulating base material 5.
【0069】またそのとき同時に絶縁基材5の貫通孔に
充填されている導電性ペースト7はその厚さが始めt1
であったものがt2の厚さへと圧縮されて、低抵抗の第
2のインナービア導体1bを形成し内層配線基板4の第
1の配線パターン2aと銅箔8とを電気的に接続するこ
とが可能となる。At the same time, the thickness of the conductive paste 7 filling the through holes of the insulating base material 5 starts at t 1.
Is compressed to a thickness of t 2 to form a low-resistance second inner via conductor 1 b and electrically connect the first wiring pattern 2 a of the inner wiring board 4 to the copper foil 8. It is possible to do.
【0070】つぎに図10は、図9A〜図9Bに示す絶
縁基材としてガラスエポキシ樹脂の中にSiO2、Ti
O2、Al2O3、MgO、SiCおよびAlN粉末等よ
りなる無機質フィラー9の少なくとも1つを混在させた
ものを30重量%から70重量%の範囲で添加して用い
た場合の外層配線基板10を示すものである。無機質フ
ィラー9を添加することにより、エポキシ樹脂の粘性が
上昇して電気絶縁性のエポキシ樹脂が第1の配線パター
ン2aまたは銅箔8と導電性ペーストとの界面に浸入す
ることを防ぐため、電気的接続信頼性を向上できる。さ
らにプリント配線基板の機械的強度の向上も図ることが
できる。前記において、導電性ペーストが加熱加圧され
て、第2の配線パターン1bになる。Next, FIG. 10 shows SiO 2 , Ti in glass epoxy resin as the insulating base material shown in FIGS. 9A and 9B.
Outer layer wiring board in the case where a mixture of at least one of inorganic fillers 9 composed of O 2 , Al 2 O 3 , MgO, SiC, AlN powder and the like is added in the range of 30% by weight to 70% by weight. 10 is shown. The addition of the inorganic filler 9 increases the viscosity of the epoxy resin and prevents the electrically insulating epoxy resin from entering the interface between the first wiring pattern 2a or the copper foil 8 and the conductive paste. Connection reliability can be improved. Further, the mechanical strength of the printed wiring board can be improved. In the above, the conductive paste is heated and pressurized to form the second wiring pattern 1b.
【0071】また、無機質フィラ―を混在させること
で、絶縁基材の厚さ方向のCTEを20ppm〜30p
pmと小さくすることができるので、インナービア導体
のCTE(約17ppm)に近くなり、配線パターンと
インナービア導体との接続信頼性を向上できるととも
に、プリント配線基板の面方向の熱膨張係数も小さくす
ることができるため半導体チップを搭載する際にその接
続信頼性を向上することができる。Further, by mixing the inorganic filler, the CTE in the thickness direction of the insulating base material can be reduced to 20 ppm to 30 ppm.
pm, it is close to the CTE (about 17 ppm) of the inner via conductor, the connection reliability between the wiring pattern and the inner via conductor can be improved, and the thermal expansion coefficient in the surface direction of the printed wiring board is also small. Therefore, when a semiconductor chip is mounted, the connection reliability can be improved.
【0072】図11は、本発明に関わるプリント配線基
板を構成する内層配線基板4、外層配線基板6および無
機質フィラーを添加した外層配線基板10のそれぞれ曲
げ剛性を測定したものであり、図より明らかなようにガ
ラスエポキシ樹脂よりなる外層配線基板6はアラミドエ
ポキシ樹脂よりなる内層配線基板4より高い曲げ強度を
備えており、無機質フィラーを添加した外層配線基板1
0はさらに優れた曲げ強度を有していることが判る。FIG. 11 shows the results of measuring the bending stiffness of the inner wiring board 4, the outer wiring board 6, and the outer wiring board 10 to which the inorganic filler is added, which constitute the printed wiring board according to the present invention. As described above, the outer wiring board 6 made of glass epoxy resin has a higher bending strength than the inner wiring board 4 made of aramid epoxy resin, and the outer wiring board 1 added with an inorganic filler.
It can be seen that 0 has more excellent bending strength.
【0073】したがってアラミドエポキシ樹脂よりなる
内層配線基板4の両側面にガラスエポキシ樹脂よりなる
外層配線基板6または10を配置した本発明に関わるプ
リント配線基板は各種電子部品の実装信頼性、部品のリ
ペア性および耐湿性等に優れた特性を備えることが可能
となる。Therefore, the printed wiring board according to the present invention, in which the outer wiring board 6 or 10 made of glass epoxy resin is disposed on both side surfaces of the inner wiring board 4 made of aramid epoxy resin, has the mounting reliability of various electronic components and the repair of components. It is possible to provide excellent properties such as heat resistance and moisture resistance.
【0074】なお、無機質フィラー9の添加量が30重
量%未満であると機械的強度のさらなる向上を期待でき
ず、70重量%を越えるとエポキシ樹脂の流動性が悪く
なりガラス繊維に対する含浸性が低下して均質なガラス
エポキシ樹脂絶縁基板を得ることが困難となる。If the amount of the inorganic filler 9 is less than 30% by weight, further improvement in mechanical strength cannot be expected. If the amount exceeds 70% by weight, the flowability of the epoxy resin deteriorates, and the impregnation property with respect to the glass fiber becomes poor. This makes it difficult to obtain a homogeneous glass epoxy resin insulating substrate.
【0075】[0075]
【発明の効果】以上の説明から明らかなように、本発明
はプリント配線基板における電気絶縁性基材をガラスエ
ポキシ樹脂基板で形成したものであり、プリント配線基
板全体の耐湿性を向上させることによって接続信頼性、
耐リペア性に優れ、また電気絶縁性基材の曲げ剛性等の
機械的強度を向上したプリント配線基板を提供すること
ができる。As is apparent from the above description, the present invention provides a printed wiring board in which the electrically insulating substrate is formed of a glass epoxy resin board, and by improving the moisture resistance of the entire printed wiring board. Connection reliability,
It is possible to provide a printed wiring board excellent in repair resistance and improved in mechanical strength such as bending rigidity of the electrically insulating base material.
【0076】さらに本発明は、絶縁基板全体の熱膨張係
数(CTE)を小さくすることにより、配線パターンと
絶縁基板との接着性およびインナービア導体との接続信
頼性を改善したプリント配線基板を提供できる。Further, the present invention provides a printed wiring board in which the thermal expansion coefficient (CTE) of the entire insulating board is reduced, thereby improving the adhesiveness between the wiring pattern and the insulating board and the connection reliability with the inner via conductor. it can.
【図1】A〜Fは、本発明の第1の実施例におけるプリ
ント配線基板の製造方法を示す工程断面図。FIGS. 1A to 1F are process cross-sectional views illustrating a method for manufacturing a printed wiring board according to a first embodiment of the present invention.
【図2】A〜Dは、本発明の第2の実施例におけるプリ
ント配線基板の製造方法を示す工程断面図。FIGS. 2A to 2D are process cross-sectional views illustrating a method for manufacturing a printed wiring board according to a second embodiment of the present invention.
【図3】A〜Bは、本発明の第3の実施例におけるプリ
ント配線基板の製造方法を示す工程断面図。FIGS. 3A and 3B are process cross-sectional views illustrating a method of manufacturing a printed wiring board according to a third embodiment of the present invention.
【図4】A〜Cは、本発明の第1の実施例におけるプリ
ント配線基板の抵抗値のバラツキを示す分布図。FIGS. 4A to 4C are distribution diagrams showing variations in the resistance value of the printed wiring board in the first embodiment of the present invention.
【図5】本発明の第1の実施例におけるプリント配線基
板の樹脂層の厚みと初期抵抗値の関係を示すグラフ。FIG. 5 is a graph showing the relationship between the thickness of the resin layer of the printed wiring board and the initial resistance value according to the first embodiment of the present invention.
【図6】本発明の第4の実施例におけるプリント配線基
板の構造を示す断面図。FIG. 6 is a sectional view showing the structure of a printed wiring board according to a fourth embodiment of the present invention.
【図7】本発明の第5の実施例におけるプリント配線基
板の構造を示す断面図。FIG. 7 is a sectional view showing the structure of a printed wiring board according to a fifth embodiment of the present invention.
【図8】A〜Cは、本発明の第6の実施例におけるプリ
ント配線基板の製造方法を示す工程断面図。FIGS. 8A to 8C are cross-sectional views illustrating a method of manufacturing a printed wiring board according to a sixth embodiment of the present invention.
【図9】A〜Bは図8A〜図8Bに示す工程断面図の一
部を拡大した図。9A and 9B are enlarged views of a part of the process cross-sectional views shown in FIGS. 8A and 8B.
【図10】図9Bに示す絶縁基材中に無機質フィラーを
混合した場合を説明する一部拡大断面図。10 is a partially enlarged cross-sectional view illustrating a case where an inorganic filler is mixed into the insulating base material illustrated in FIG. 9B.
【図11】本発明の第6の実施例におけるプリント配線
基板を構成する内層配線基板および外層配線基板の機械
強度特性図でFIG. 11 is a mechanical strength characteristic diagram of an inner wiring board and an outer wiring board constituting a printed wiring board according to a sixth embodiment of the present invention.
【図12】A〜Gは、従来の多層配線基板の製造方法を
示す工程断面図である。12A to 12G are process cross-sectional views illustrating a conventional method for manufacturing a multilayer wiring board.
1a 第1のインナービア導体 1b 第2のインナービア導体 2a 第1の配線パターン 2b 第2の配線パターン 4 内層配線基板 5 ガラスエポキシ樹脂基板(絶縁基材) 6,10 外層配線基板 101 離形フィルム 102 電気絶縁性基材 103 貫通孔 104 導電ペースト 105 金属箔 106 配線層 1a First inner via conductor 1b Second inner via conductor 2a First wiring pattern 2b Second wiring pattern 4 Inner layer wiring board 5 Glass epoxy resin board (insulating base material) 6,10 Outer layer wiring board 101 Release film Reference Signs List 102 electric insulating base material 103 through hole 104 conductive paste 105 metal foil 106 wiring layer
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/46 H05K 3/46 G N T (72)発明者 中村 禎志 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 仲谷 安広 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 上田 洋二 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 西山 東作 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 越智 正三 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Fターム(参考) 5E317 AA24 CC25 CD25 CD27 CD32 GG03 GG05 GG12 GG20 5E339 AB02 AD05 BD03 BD06 BE13 5E346 AA06 AA12 AA15 AA22 AA32 AA43 AA51 CC04 CC08 DD32 EE06 EE07 EE09 EE13 FF18 GG15 GG19 GG22 GG28 HH08 HH13 HH18 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05K 3/46 H05K 3/46 GNT (72) Inventor Satoshi Nakamura 1006 Kazuma Kadoma, Kadoma City, Osaka Matsushita Inside Electric Industrial Co., Ltd. (72) Inventor Yasuhiro Nakaya 1006 Kadoma, Kazuma, Osaka Prefecture Inside Matsushita Electric Industrial Co., Ltd. Inventor Nishiyama Tosaku 1006 Kadoma, Kazuma, Osaka Pref. Matsushita Electric Industrial Co., Ltd. CD32 GG03 GG05 GG12 GG20 5E339 AB02 AD05 BD03 BD06 BE13 5E346 AA06 AA12 AA15 AA22 AA32 AA43 AA51 CC04 CC08 DD32 EE06 EE07 EE09 EE13 FF18 GG15 GG19 GG22 GG28 HH08 HH13 HH18
Claims (22)
貫通孔に導電性フィラーを含む導電体が充填され、前記
電気絶縁性基材の両面に所定のパターンに形成された配
線層が前記導電体によって電気的に接続されているプリ
ント配線基板において、 前記電気絶縁性基材がガラスクロスまたはガラス不織布
に微粒子を混入させた熱硬化性エポキシ樹脂を含浸させ
た基材を含む材料で形成されており、かつ前記導電体に
含まれる導電性フィラーの平均粒径が前記微粒子の平均
粒径よりも大きいことを特徴とするプリント配線基板。1. A wiring layer formed by filling a conductor including a conductive filler into a through hole formed in a thickness direction of an electrically insulating substrate, and forming a predetermined pattern on both surfaces of the electrically insulating substrate. Wherein the electrically insulating substrate is a material including a substrate impregnated with a thermosetting epoxy resin in which fine particles are mixed into glass cloth or glass nonwoven fabric. A printed wiring board formed, wherein the average particle diameter of the conductive filler contained in the conductor is larger than the average particle diameter of the fine particles.
O3、MgO、SiCおよびAlN粉末から選ばれる少
なくとも1つの無機質フィラーである請求項1に記載の
プリント配線基板。2. The method according to claim 1, wherein the fine particles are SiO 2 , TiO 2 , Al 2
O 3, MgO, printed wiring board according to claim 1 is at least one inorganic filler selected from SiC and AlN powder.
れた貫通孔に充填された導電体の厚さ方向の熱膨張係数
が電気絶縁性基材厚さ方向の熱膨張係数より大きい請求
項1または2に記載のプリント配線基板。3. A thermal expansion coefficient in a thickness direction of a conductor filled in a through hole formed in a thickness direction of the electrically insulating substrate is larger than a thermal expansion coefficient in a thickness direction of the electrically insulating substrate. The printed wiring board according to claim 1.
である請求項1〜3のいずれかに記載のプリント配線基
板。4. The amount of the fine particles added is 25 to 50 vol.%.
The printed wiring board according to claim 1, wherein
基材の厚さ方向に開けられた貫通孔の直径よりも小さい
請求項1〜4のいずれかに記載のプリント配線基板。5. The printed wiring board according to claim 1, wherein the thickness of the electrically insulating substrate is smaller than the diameter of a through hole formed in the thickness direction of the electrically insulating substrate.
ボイドが含まれている請求項1〜5のいずれかに記載の
プリント配線基板。6. The printed wiring board according to claim 1, wherein the electrically insulating base material in the prepreg state contains voids.
項1〜6のいずれかに記載のプリント配線基板。7. The printed wiring board according to claim 1, wherein the number of the printed wiring board is one.
た多層プリント配線基板である請求項1〜7のいずれか
に記載のプリント配線基板。8. The printed wiring board according to claim 1, wherein the printed wiring board is a multilayer printed wiring board in which a plurality of printed wiring boards are stacked.
基材の厚さ方向に開けられた貫通孔に充填された導電体
の厚さがほぼ等しい請求項8に記載のプリント配線基
板。9. The printed wiring board according to claim 8, wherein the thickness of the conductor filled in the through hole formed in the thickness direction of the electrically insulating base material of the multilayer printed wiring board is substantially equal.
またはガラス不織布に微粒子を混入させた熱硬化性エポ
キシ樹脂を含浸させた基材を外層配線基板とし、 圧縮により導電性が付与されたインナービア導体により
電気的に接続された少なくとも2層の配線パターンを有
する配線基板を内層配線基板とし、 前記外層配線基板の配線パターンと前記内層配線基板の
配線パターンとは電気的に接続されている請求項1〜9
のいずれかに記載のプリント配線基板。10. An inner layer provided with conductivity by compression, wherein the electrically insulating base material is a base material impregnated with a thermosetting epoxy resin in which fine particles are mixed in glass cloth or glass nonwoven fabric, and is used as an outer wiring board. A wiring board having at least two layers of wiring patterns electrically connected by via conductors is used as an inner wiring board, and the wiring pattern of the outer wiring board and the wiring pattern of the inner wiring board are electrically connected. Items 1 to 9
The printed wiring board according to any one of the above.
に熱硬化性エポキシ樹脂を含浸させた絶縁基材である請
求項10に記載のプリント配線基板。11. The printed wiring board according to claim 10, wherein the inner wiring board is an insulating base material in which an aramid nonwoven fabric is impregnated with a thermosetting epoxy resin.
おいて複数層形成されている請求項10に記載のプリン
ト配線基板。12. The printed wiring board according to claim 10, wherein a plurality of outer wiring boards are formed on at least one surface.
ント配線基板を製造する方法であって、 ガラスクロスまたはガラス不織布に、微粒子を混入させ
た熱硬化性エポキシ樹脂を含浸させたプリプレグからな
る電気絶縁性基材の両面に離型質フィルムを覆った後に
貫通孔を設け、 前記貫通孔に前記微粒子の平均粒径よりも大きい平均粒
径の導電性フィラーを含む導電体を充填し、 前記離型質フィルムを剥離した後に前記電気絶縁性基材
の両側に金属箔を重ね、 前記金属箔を重ねた前記電気絶縁性基材を加熱加圧して
圧縮することにより、前記電気絶縁性基材と前記金属箔
を接着し、前記金属箔間を電気的に接続し、 前記金属箔を所定のパターンに形成することを特徴とす
るプリント配線基板の製造方法。13. A method for manufacturing a printed wiring board according to claim 1, wherein a prepreg obtained by impregnating a glass cloth or a glass nonwoven fabric with a thermosetting epoxy resin mixed with fine particles. A through hole is provided after covering the release film on both sides of the electrically insulating base material, and the through hole is filled with a conductor containing a conductive filler having an average particle diameter larger than the average particle diameter of the fine particles, After peeling off the release film, a metal foil is laminated on both sides of the electrically insulating substrate, and the electrically insulating substrate on which the metal foil is laminated is heated and pressurized and compressed to thereby form the electrically insulating substrate. A method for manufacturing a printed wiring board, comprising: bonding a material to the metal foil; electrically connecting the metal foils; and forming the metal foil in a predetermined pattern.
μm以上25μm以下である請求項13に記載のプリン
ト配線基板の製造方法。14. The resin layer on the surface of the prepreg having a thickness of 5
The method for manufacturing a printed wiring board according to claim 13, wherein the thickness is not less than 25 µm and not more than 25 µm.
孔が含まれている請求項12または13に記載のプリン
ト配線基板の製造方法。15. The method for producing a printed wiring board according to claim 12, wherein the electrically insulating base material in a prepreg state contains holes.
フィラーの直径よりも小さい請求項13〜15のいずれ
かに記載のプリント配線基板の製造方法。16. The method according to claim 13, wherein the diameter of the hole is smaller than the diameter of the conductive filler contained in the conductor.
さを薄くする請求項13〜16のいずれかに記載のプリ
ント配線基板の製造方法。17. The method for manufacturing a printed wiring board according to claim 13, wherein the thickness of the electrically insulating base material is reduced by heating and pressing.
た貫通孔に充填された導電体の厚さを、加熱加圧により
薄くする請求項13〜16のいずれかに記載のプリント
配線基板の製造方法。18. The printed wiring according to claim 13, wherein the thickness of the conductor filled in the through hole formed in the thickness direction of the electrically insulating base material is reduced by heating and pressing. Substrate manufacturing method.
周辺の厚みがほぼ等しい請求項13〜18のいずれかに
記載のプリント配線基板の製造方法。19. The method for manufacturing a printed wiring board according to claim 13, wherein the thickness of the central portion and the peripheral portion of the electrically insulating substrate after heating and pressing are substantially equal.
製造方法によって形成されたプリント配線基板の両側
に、導電体が充填されたガラスクロスまたはガラス不織
布に微粒子を混入させた熱硬化性エポキシ樹脂を含浸さ
せたプリプレグから成る電気絶縁性基材と金属箔を貼り
付けて加熱加圧して圧縮することにより、前記電気絶縁
性基材の表面の樹脂層に前記プリント配線基板の配線層
を埋設し、前記金属箔を所定のパターンに形成するプリ
ント配線基板の製造方法。20. A thermosetting epoxy in which fine particles are mixed into a glass cloth or a glass nonwoven fabric filled with an electric conductor on both sides of a printed wiring board formed by the manufacturing method according to claim 13. The wiring layer of the printed wiring board is buried in the resin layer on the surface of the electric insulating base material by applying an electric insulating base material made of a prepreg impregnated with a resin and a metal foil and applying heat and pressure to compress. And a method for manufacturing a printed wiring board, wherein the metal foil is formed in a predetermined pattern.
製造方法によって形成された複数枚の両面プリント配線
基板の間に、導電体が充填されたガラスクロスまたはガ
ラス不織布に微粒子を混入させた熱硬化性エポキシ樹脂
を含浸させたプリプレグから成る電気絶縁性基材を一括
して貼り付けて加熱加圧して圧縮することにより、前記
電気絶縁性基材の表面の樹脂層に前記プリント配線基板
の配線層を埋設して全ての導電体の厚さをほぼ等しくす
るプリント配線基板の製造方法。21. Fine particles are mixed in a glass cloth or a glass nonwoven fabric filled with a conductor between a plurality of double-sided printed wiring boards formed by the manufacturing method according to claim 13. An electric insulating base material made of a prepreg impregnated with a thermosetting epoxy resin is collectively adhered, heated and pressed and compressed, so that a resin layer on the surface of the electric insulating base material is applied to the printed wiring board. A method of manufacturing a printed wiring board in which a wiring layer is embedded to make all conductors substantially equal in thickness.
プリント配線基板の製造方法であって、 第1のインナービア導体により接続された少なくとも2
層の第1の配線パターンを有する圧縮可能な内層配線基
板の両面に、任意の箇所の貫通孔内に第2のインナービ
ア導体を形成するための導電性ペーストを充填したプリ
プレグ状態のガラスエポキシ樹脂絶縁基板を配置し、さ
らに前記2枚のガラスエポキシ樹脂絶縁基板のそれぞれ
外側に銅箔を配置して前記2枚の銅箔の外側から前記内
層配線基板およびプリプレグ状態のガラスエポキシ樹脂
絶縁基板を加圧、加熱することにより、前記内層配線基
板の両面に突出して設けられている配線パターンを前記
プリプレグ状態のガラスエポキシ樹脂絶縁基板の内部に
圧入すると同時に前記ガラスエポキシ樹脂絶縁基板に設
けられている前記導電性ペーストを圧縮して前記最外層
の銅箔と前記内層配線基板の第1の配線パターンとを電
気的に接続した後、前記銅箔を選択的にエッチングして
第2の配線パターンを形成して外層配線基板を構成する
プリント配線基板の製造方法。22. The method for manufacturing a printed wiring board according to claim 10, wherein at least two of the printed wiring boards connected by the first inner via conductor are connected to each other.
Glass epoxy resin in a prepreg state in which a conductive paste for forming a second inner via conductor in a through hole at an arbitrary position is filled on both sides of a compressible inner wiring substrate having a first wiring pattern of layers An insulating substrate is disposed, and a copper foil is further disposed outside each of the two glass epoxy resin insulating substrates. The inner layer wiring substrate and the glass epoxy resin insulating substrate in a prepreg state are added from outside the two copper foils. By pressurizing and heating, the wiring pattern protrudingly provided on both surfaces of the inner layer wiring board is press-fitted into the glass epoxy resin insulating substrate in the prepreg state and at the same time the wiring pattern provided on the glass epoxy resin insulating substrate is provided. After compressing the conductive paste to electrically connect the outermost copper foil and the first wiring pattern of the inner wiring board Method for manufacturing a printed wiring board with the copper foil selectively etched to form a a second wiring pattern constituting the outer layer wiring substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001177572A JP2002368364A (en) | 2000-06-14 | 2001-06-12 | Printed wiring board and manufacturing method thereof |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000177936 | 2000-06-14 | ||
| JP2000-177936 | 2000-06-14 | ||
| JP2001-105446 | 2001-04-04 | ||
| JP2001105446 | 2001-04-04 | ||
| JP2001177572A JP2002368364A (en) | 2000-06-14 | 2001-06-12 | Printed wiring board and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002368364A true JP2002368364A (en) | 2002-12-20 |
| JP2002368364A5 JP2002368364A5 (en) | 2004-10-28 |
Family
ID=27343718
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001177572A Pending JP2002368364A (en) | 2000-06-14 | 2001-06-12 | Printed wiring board and manufacturing method thereof |
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| Country | Link |
|---|---|
| JP (1) | JP2002368364A (en) |
Cited By (9)
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| JP2007165436A (en) * | 2005-12-12 | 2007-06-28 | Matsushita Electric Ind Co Ltd | Circuit board manufacturing method |
| JP2007266163A (en) * | 2006-03-28 | 2007-10-11 | Matsushita Electric Ind Co Ltd | Multilayer wiring board and manufacturing method thereof |
| JP2007266162A (en) * | 2006-03-28 | 2007-10-11 | Matsushita Electric Ind Co Ltd | Multilayer wiring board and manufacturing method thereof |
| JP2008211152A (en) * | 2007-02-28 | 2008-09-11 | Meiko:Kk | Printed wiring board and electronic component mounting board |
| JP2012079765A (en) * | 2010-09-30 | 2012-04-19 | Fdk Corp | Electronic component mounting substrate |
| JPWO2011155162A1 (en) * | 2010-06-08 | 2013-08-01 | パナソニック株式会社 | Multilayer wiring board and method for manufacturing multilayer wiring board |
| JP2014128971A (en) * | 2012-11-29 | 2014-07-10 | Panasonic Corp | Method for manufacturing metal-clad laminate, and printed wiring board |
| JP2017098338A (en) * | 2015-11-19 | 2017-06-01 | 株式会社デンソー | Electronic device |
| JP2021044348A (en) * | 2019-09-10 | 2021-03-18 | 日亜化学工業株式会社 | Method for manufacturing light-emitting device |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007165436A (en) * | 2005-12-12 | 2007-06-28 | Matsushita Electric Ind Co Ltd | Circuit board manufacturing method |
| JP2007266163A (en) * | 2006-03-28 | 2007-10-11 | Matsushita Electric Ind Co Ltd | Multilayer wiring board and manufacturing method thereof |
| JP2007266162A (en) * | 2006-03-28 | 2007-10-11 | Matsushita Electric Ind Co Ltd | Multilayer wiring board and manufacturing method thereof |
| JP2008211152A (en) * | 2007-02-28 | 2008-09-11 | Meiko:Kk | Printed wiring board and electronic component mounting board |
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| JP2014128971A (en) * | 2012-11-29 | 2014-07-10 | Panasonic Corp | Method for manufacturing metal-clad laminate, and printed wiring board |
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| JP2017098338A (en) * | 2015-11-19 | 2017-06-01 | 株式会社デンソー | Electronic device |
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