JP2002294368A - Copper alloy for terminal and connector and production method therefor - Google Patents
Copper alloy for terminal and connector and production method thereforInfo
- Publication number
- JP2002294368A JP2002294368A JP2001098300A JP2001098300A JP2002294368A JP 2002294368 A JP2002294368 A JP 2002294368A JP 2001098300 A JP2001098300 A JP 2001098300A JP 2001098300 A JP2001098300 A JP 2001098300A JP 2002294368 A JP2002294368 A JP 2002294368A
- Authority
- JP
- Japan
- Prior art keywords
- copper alloy
- mass
- annealing
- less
- stress relaxation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000881 Cu alloy Inorganic materials 0.000 title claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 238000000137 annealing Methods 0.000 claims abstract description 30
- 239000002244 precipitate Substances 0.000 claims abstract description 30
- 238000005097 cold rolling Methods 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 14
- 238000001816 cooling Methods 0.000 claims abstract description 8
- 239000010949 copper Substances 0.000 claims abstract description 7
- 239000012535 impurity Substances 0.000 claims abstract description 3
- 229910052698 phosphorus Inorganic materials 0.000 claims abstract description 3
- 229910052718 tin Inorganic materials 0.000 claims abstract description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 229910052790 beryllium Inorganic materials 0.000 claims description 3
- 229910052791 calcium Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- 229910052748 manganese Inorganic materials 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- 229910052735 hafnium Inorganic materials 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 18
- 230000008569 process Effects 0.000 abstract description 6
- 229910009038 Sn—P Inorganic materials 0.000 abstract description 5
- 238000005266 casting Methods 0.000 abstract description 5
- 239000000203 mixture Substances 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 abstract description 2
- 229910052759 nickel Inorganic materials 0.000 abstract description 2
- 230000006641 stabilisation Effects 0.000 abstract 1
- 238000011105 stabilization Methods 0.000 abstract 1
- 229910052725 zinc Inorganic materials 0.000 abstract 1
- 238000012360 testing method Methods 0.000 description 25
- 238000005452 bending Methods 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 13
- 229910000679 solder Inorganic materials 0.000 description 13
- 239000000463 material Substances 0.000 description 12
- 229910018104 Ni-P Inorganic materials 0.000 description 10
- 229910018536 Ni—P Inorganic materials 0.000 description 10
- 229910045601 alloy Inorganic materials 0.000 description 10
- 239000000956 alloy Substances 0.000 description 10
- 230000000694 effects Effects 0.000 description 10
- 230000007797 corrosion Effects 0.000 description 9
- 238000005260 corrosion Methods 0.000 description 9
- 238000005336 cracking Methods 0.000 description 9
- 238000013508 migration Methods 0.000 description 8
- 230000005012 migration Effects 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000013078 crystal Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 238000005098 hot rolling Methods 0.000 description 5
- 229910000765 intermetallic Inorganic materials 0.000 description 5
- 238000007747 plating Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 102220253765 rs141230910 Human genes 0.000 description 4
- 229910001369 Brass Inorganic materials 0.000 description 3
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000010951 brass Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 238000005096 rolling process Methods 0.000 description 3
- 239000006104 solid solution Substances 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- 229910000906 Bronze Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 239000010974 bronze Substances 0.000 description 2
- 239000003610 charcoal Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 229910017876 Cu—Ni—Si Inorganic materials 0.000 description 1
- 229910018098 Ni-Si Inorganic materials 0.000 description 1
- 229910018529 Ni—Si Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009749 continuous casting Methods 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- UREBDLICKHMUKA-CXSFZGCWSA-N dexamethasone Chemical compound C1CC2=CC(=O)C=C[C@]2(C)[C@]2(F)[C@@H]1[C@@H]1C[C@@H](C)[C@@](C(=O)CO)(O)[C@@]1(C)C[C@@H]2O UREBDLICKHMUKA-CXSFZGCWSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000008034 disappearance Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- MYWUZJCMWCOHBA-VIFPVBQESA-N methamphetamine Chemical compound CN[C@@H](C)CC1=CC=CC=C1 MYWUZJCMWCOHBA-VIFPVBQESA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- -1 phosphorus compound Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000008399 tap water Substances 0.000 description 1
- 235000020679 tap water Nutrition 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Conductive Materials (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は端子、コネクタ、ワ
イヤハーネス及びターミナル等に用いられる銅合金に関
し、さらに詳しくは耐応力緩和特性及びはんだ耐候性に
優れた、自動車等、民生及び産業用の端子・コネクタ用
銅合金に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a copper alloy used for terminals, connectors, wire harnesses, terminals and the like, and more particularly to a terminal for automobiles and other consumer and industrial use which has excellent stress relaxation resistance and solder weather resistance.・ Related to copper alloy for connectors.
【0002】[0002]
【従来の技術】上記の用途には従来、強度−導電率バラ
ンスや廉価であることなどの点から、いわゆる黄銅が多
用されてきた。しかしながら、例えば近年の自動車エン
ジン電子制御の進展によって、自動車車載用ジャンクシ
ョンブロック通電材料及びその中継部品、端子・コネク
タなどの接続部品にもエンジンルームのような高温環境
下で信頼性を確保できる性能が求められるようになって
きた。2. Description of the Related Art Conventionally, so-called brass has been frequently used in the above applications in view of strength-conductivity balance and low cost. However, for example, due to the recent development of electronic control of automobile engines, the current-carrying materials for junction blocks for automobiles and their connection parts, such as relay parts, terminals and connectors, have performances that can ensure reliability under high-temperature environments such as engine rooms. It has become required.
【0003】この高温環境下での信頼性において最も重
要な特性のひとつは、接点嵌合力の維持特性、いわゆる
耐応力緩和特性である。すなわち銅及び銅合金のばね形
状部品に定常の変位を与えた場合、例えばオス端子のタ
ブをメス端子のばね形状をした接点で嵌合しているよう
な場合、これらの接続部品がエンジンルームのような高
温環境下に保持されていると、経時とともにその接点嵌
合力を失っていくが、それに対する抵抗特性である。黄
銅ではこの耐応力緩和特性が低いという問題があった。
また、黄銅より高強度の要求される端子用としてりん青
銅が多用されているが、りん青銅においても耐応力緩和
特性が低く、導電率及び耐マイグレーション性と共に問
題となっている。One of the most important characteristics in the reliability under the high temperature environment is a characteristic of maintaining the contact fitting force, that is, a so-called stress relaxation characteristic. That is, when a constant displacement is given to the copper and copper alloy spring-shaped parts, for example, when the tabs of the male terminals are fitted with the spring-shaped contacts of the female terminals, these connecting parts are in the engine room. When held in such a high temperature environment, the contact fitting force is lost over time, but it is a resistance characteristic to the loss. Brass has a problem that its stress relaxation resistance is low.
Phosphor bronze is often used for terminals requiring higher strength than brass. However, phosphor bronze also has low stress relaxation resistance, and has a problem with conductivity and migration resistance.
【0004】これに対して特開平4−154942号公
報には耐応力緩和特性に優れるCu−Ni−Sn−P合
金が開示されている。この合金はNi−P金属間化合物
を均一微細に分散させて、強度、導電率、ばね限界値、
耐応力緩和特性などを向上させる析出型銅合金である。
コルソン銅合金で知られるCu−Ni−Si合金の析出
物であるNi−Si金属間化合物の析出活性化エネルギ
ーが約80kJ/molと比較的高い値であるのに比べ
ると、Ni−P金属間化合物はその析出活性化エネルギ
ーが約25kJ/molと低い。これはNi−P金属間
化合物が容易に析出し、さらには凝集粗大化しやすいこ
とを示しており、前記公報にも、Ni−P化合物の凝集
粗大化を防止して、ばね限界値、耐応力緩和特性及び曲
げ加工性等の特性を得るためには、熱間圧延の冷却開
始、終了温度、その冷却速度、さらにはその後の冷間圧
延工程途中で施す5〜720分の熱処理の温度と時間と
を厳密に制御する必要性が述べられている。On the other hand, Japanese Patent Application Laid-Open No. 4-154942 discloses a Cu-Ni-Sn-P alloy having excellent stress relaxation resistance. This alloy disperses the Ni-P intermetallic compound uniformly and finely, and provides strength, conductivity, spring limit,
This is a precipitation-type copper alloy that improves stress relaxation resistance and the like.
The precipitation activation energy of the Ni-Si intermetallic compound, which is a precipitate of the Cu-Ni-Si alloy known as Corson copper alloy, is relatively high at about 80 kJ / mol. The compound has a low deposition activation energy of about 25 kJ / mol. This indicates that the Ni-P intermetallic compound easily precipitates and further easily agglomerates and coarsens, and the above publication also discloses that the Ni-P compound is prevented from agglomerating and coarsening, and has a spring limit value and a stress resistance. In order to obtain properties such as relaxation properties and bending workability, the cooling start and end temperatures of hot rolling, the cooling rate, and the temperature and time of the heat treatment for 5 to 720 minutes applied during the subsequent cold rolling process The necessity of strictly controlling is described.
【0005】しかしながら、例えば焼鈍の場合では製品
の焼鈍炉への挿入に要する時間と昇温に要する時間、さ
らには5〜720分の保持時間と、製品が不必要な酸化
をきたさない温度まで冷却する時間などを要するため
に、このような厳密な熱処理工程の制御は生産の非効率
性につながり、さらにはそれが製品価格にまで反映され
てしまうという問題があった。一方、特開平5−311
288号公報には、P添加量を0.005〜0.5重量
%とし、さらに0.005〜0.5重量%のFe、N
i、Coなどを共添してPと金属間化合物を形成せし
め、固溶Pを低減させる方法が開示されている。しかし
ながら、このような方法では加工・熱処理条件によって
は、曲げ加工性やめっき性を劣化させる粗大な金属のり
ん化合物を形成してしまう可能性が常に残る。However, in the case of annealing, for example, the time required for inserting the product into the annealing furnace, the time required for raising the temperature, and the holding time for 5 to 720 minutes, and cooling the product to a temperature that does not cause unnecessary oxidation Such a strict control of the heat treatment process leads to inefficiency in production, and furthermore, this is reflected in the product price. On the other hand, JP-A-5-311
No. 288 discloses that the P content is 0.005 to 0.5% by weight, and further, 0.005 to 0.5% by weight of Fe, N
A method of co-adding i, Co, or the like to form an intermetallic compound with P to reduce solid solution P is disclosed. However, in such a method, depending on the processing and heat treatment conditions, there is always a possibility that a coarse metal phosphorus compound that deteriorates bending workability and plating property is formed.
【0006】[0006]
【発明が解決しようとする課題】いずれにしても、Cu
−Ni−Sn−P系合金の耐応力緩和特性を高めるた
め、従来はNi−P化合物を積極的に析出させている。
そして、Ni−P化合物を均一微細に析出させるために
厳密な熱処理を要求され、製品が高価となっていた。従
って、本発明は、Cu−Ni−Sn−P系合金につい
て、高度な鋳造あるいは熱処理技術を必要とせず、きわ
めて短時間の焼鈍熱処理で製造可能な、廉価で耐応力緩
和特性に優れた銅合金を得ることを目的とする。In any case, Cu
Conventionally, Ni-P compounds have been positively precipitated in order to enhance the stress relaxation resistance of -Ni-Sn-P-based alloys.
Strict heat treatment was required to uniformly and finely precipitate the Ni-P compound, and the product was expensive. Therefore, the present invention relates to a Cu-Ni-Sn-P-based alloy which is inexpensive and has excellent stress relaxation resistance, which does not require advanced casting or heat treatment technology and can be produced by an extremely short annealing heat treatment. The purpose is to obtain.
【0007】[0007]
【課題を解決するための手段】本発明者は、従来析出型
銅合金として積極的にNi−P化合物を析出させていた
Cu−Ni−Sn−P系合金について、Ni−P化合物
の析出をできるだけ抑え、いわば固溶型銅合金として取
り扱うことで、上記目的を達成することができた。すな
わち、本発明に係る端子・コネクタ用銅合金は、Ni:
0.8〜1.5質量%、Sn:0.5〜2.0質量%、
Zn:0.015%〜5.0質量%以下、P:0.00
5%〜0.1質量%を含有し、残部がCu及び不可避的
不純物からなるとともに、析出物の面積率が5%以下で
あることを特徴とする。Means for Solving the Problems The present inventor has studied the precipitation of a Ni-P compound in a Cu-Ni-Sn-P-based alloy in which a Ni-P compound was conventionally positively precipitated as a precipitation-type copper alloy. The above object was achieved by suppressing as much as possible and treating it as a solid solution type copper alloy. That is, the copper alloy for a terminal / connector according to the present invention is Ni:
0.8 to 1.5% by mass, Sn: 0.5 to 2.0% by mass,
Zn: 0.015% to 5.0% by mass or less, P: 0.00
5% to 0.1% by mass, the balance being Cu and inevitable impurities, and the area ratio of precipitates is 5% or less.
【0008】上記銅合金は、さらに、Mg;0.001
〜0.2質量%とFe:0.001〜0.1質量%のい
ずれか一方又は双方を含有することことができる。ま
た、O含有量:50ppm以下、H含有量:2ppm以
下とするのが望ましい。そして、上記銅合金は、必要に
応じて、Ag、Ti、Si、Ca、Mn、Be、Al、
V、Cr、Co、Zr、Nb、Mo、In、Pb、H
f、Ta、Bの1種又は2種以上を、各々0.0005
〜0.03%、かつ総量で0.0005〜0.3%含む
ことができる。[0008] The above-mentioned copper alloy further contains Mg;
To 0.2% by mass and Fe: 0.001 to 0.1% by mass, or both. Further, it is desirable that the O content be 50 ppm or less and the H content be 2 ppm or less. And the said copper alloy may be Ag, Ti, Si, Ca, Mn, Be, Al,
V, Cr, Co, Zr, Nb, Mo, In, Pb, H
f, Ta, B, one or more of
0.00.03%, and 0.0005 to 0.3% in total.
【0009】上記端子・コネクタ用銅合金は、必要に応
じて熱間圧延した後、冷間圧延し、その冷間圧延途中で
少なくとも1度焼鈍して再結晶させ、最終冷間圧延後さ
らに安定化焼鈍して製造されるが、優れた耐応力緩和特
性を得るためには、安定化焼鈍後において、析出物等の
未固溶物の面積率が5%以下となっている必要がある。
あるいは、当該合金を焼鈍して得られる導電率の最大値
に対して90%以下の導電率となっている必要がある。
そのため、冷間圧延工程の途中での焼鈍を連続炉におい
て450〜850℃の温度範囲で5秒以上1分以下の条
件で実施し、最終冷間圧延後の安定化焼鈍を連続炉にお
いて250〜850℃の温度範囲で5秒以上1分以下の
条件で実施し、かついずれもそのときの昇温及び冷却速
度を10℃/秒以上とする。The above-mentioned copper alloy for terminals and connectors is hot-rolled, if necessary, then cold-rolled, annealed at least once during the cold-rolling and recrystallized, and more stable after the final cold-rolling. Although it is manufactured by annealing, in order to obtain excellent stress relaxation resistance, it is necessary that the area ratio of undissolved matters such as precipitates is 5% or less after stabilized annealing.
Alternatively, the conductivity needs to be 90% or less of the maximum value of the conductivity obtained by annealing the alloy.
Therefore, annealing in the middle of the cold rolling step is performed in a continuous furnace at a temperature range of 450 to 850 ° C. for 5 seconds to 1 minute, and stabilized annealing after final cold rolling is performed in a continuous furnace at 250 to 850 ° C. It is carried out in a temperature range of 850 ° C. for 5 seconds or more and 1 minute or less, and in each case, the rate of temperature rise and cooling is 10 ° C./second or more.
【0010】[0010]
【発明の実施の形態】以下に本発明に係る端子・コネク
タ用銅合金について詳細に説明する。先ず、各添加元素
の添加理由及び組成限定理由について説明する。 (Ni)母相に固溶したNiは応力負荷時の転位の移動
速度を減少させる作用を有する。この作用により耐応力
緩和特性及び強度を向上させる。しかしながら、焼鈍に
より本発明の銅合金に含まれるPとの化合物を形成した
場合は、固溶量が減少するため耐応力緩和特性が著しく
低下する。従って、本発明の銅合金においてはNiを固
溶させる必要がある。その含有量が0.8質量%未満で
は目標とする耐応力緩和特性及び強度が得られず、ま
た、1.5質量%を超えて含有されるとPとの化合物が
形成されやすくなるとともに、電気伝導度及びはんだ耐
候性の低下を招き、コスト的にも不利である。従って、
Niの添加量は0.8〜1.5質量%とした。DESCRIPTION OF THE PREFERRED EMBODIMENTS The copper alloy for terminals and connectors according to the present invention will be described in detail below. First, the reason for adding each additive element and the reason for limiting the composition will be described. (Ni) Ni dissolved in the mother phase has an effect of reducing the moving speed of dislocations under stress. This action improves stress relaxation resistance and strength. However, when the compound with P contained in the copper alloy of the present invention is formed by annealing, the amount of solid solution is reduced, so that the stress relaxation resistance is significantly reduced. Therefore, it is necessary to dissolve Ni in the copper alloy of the present invention. If the content is less than 0.8% by mass, the desired stress relaxation resistance and strength cannot be obtained. If the content exceeds 1.5% by mass, a compound with P is easily formed, and Electric conductivity and solder weather resistance are reduced, which is disadvantageous in cost. Therefore,
The addition amount of Ni was set to 0.8 to 1.5% by mass.
【0011】(Sn)Snは、機械的性質の向上、特に
耐力と伸びのバランスひいては成形加工性及びばね限界
値並びに耐応力緩和特性の向上に効果をもたらすが、
0.5質量%未満では効果が得られず、また、2.0質
量%を超えて含有されると電気伝導度の低下を招き、経
済的でない。従って、Snの添加量は0.5〜2.0質
量%とした。 (Zn)Znは、電圧が印加された電気・電子部品の極
間に水の侵入又は結露等が生じた場合のCuのマイグレ
−ション形成を抑制し、漏洩電流を抑制するための必須
元素である。さらに、強度向上、はんだの密着性向上及
びSnめっき後のウイスカー発生を抑制する元素であ
る。Zn含有量が0.015質量%未満では耐マイグレ
ーション性やはんだの密着性向上、ウイスカー発生の抑
制効果が小さく、Zn含有量が5.0質量%を超えた場
合は導電率が低くなり、また、応腐食割れを起こし易く
なる。従って、Zn含有量は0.015〜5.0質量%
以下とする。(Sn) Sn is effective in improving mechanical properties, in particular, in improving the balance between proof stress and elongation, and further in improving the formability, spring limit value and stress relaxation resistance.
If the content is less than 0.5% by mass, no effect is obtained, and if the content is more than 2.0% by mass, the electric conductivity is reduced, which is not economical. Therefore, the addition amount of Sn is set to 0.5 to 2.0% by mass. (Zn) Zn is an essential element for suppressing the migration of Cu and preventing the leakage current when water intrusion or dew condensation occurs between the poles of the electric or electronic component to which the voltage is applied. is there. Further, it is an element that improves strength, improves solder adhesion, and suppresses the generation of whiskers after Sn plating. If the Zn content is less than 0.015% by mass, the migration resistance, the improvement in solder adhesion, and the effect of suppressing whisker generation are small. , It is easy to cause corrosion cracking. Therefore, the Zn content is 0.015 to 5.0% by mass.
The following is assumed.
【0012】(P)Pは主として鋳塊の健全性向上(脱
酸、湯流れ等)に寄与する元素である。Pは含有量が、
0.005質量%未満では、溶湯中の脱酸効果が得られ
ない。一方、0.1質量%を超えて添加されると容易に
Ni−P金属間化合物を析出し、これが凝集粗大化して
製品の機械的性質や曲げ加工性あるいはめっき性を阻害
する。また、Ni−P化合物を析出させない範囲での熱
処理が行われたとしても、0.1質量%を超えて添加さ
れるとはんだ及びSnめっきの剥離現象を引き起こす。
従って、P添加量は0.005〜0.1質量%とする。
前記範囲においてPの含有量は0.03質量%未満であ
ることが望ましく、0.02質量%未満であることが更
に望ましい。(P) P is an element mainly contributing to the improvement of the soundness of the ingot (deoxidation, molten metal flow, etc.). P is content,
If it is less than 0.005% by mass, the deoxidizing effect in the molten metal cannot be obtained. On the other hand, if it is added in excess of 0.1% by mass, the Ni-P intermetallic compound is easily precipitated, which is agglomerated and coarsened, impairing the mechanical properties, bending workability or plating properties of the product. Further, even if heat treatment is performed within a range in which the Ni-P compound is not precipitated, the addition of more than 0.1% by mass causes a peeling phenomenon of solder and Sn plating.
Therefore, the added amount of P is set to 0.005 to 0.1% by mass.
In the above range, the content of P is preferably less than 0.03% by mass, and more preferably less than 0.02% by mass.
【0013】(Mg、Fe)これらの元素は微量添加に
より、さらに耐応力緩和特性を向上させる効果を有する
が、いずれも0.001質量%未満では効果がなく、M
gが0.2質量%、Feが0.1質量%を超えて含有さ
れると導電率、はんだ耐候性及び曲げ加工性の低下を招
く。従って、Mg添加量は0.001〜0.2質量%、
Fe添加量は0.001〜0.1質量%とする。(Mg, Fe) These elements have the effect of further improving the stress relaxation resistance when added in a small amount. However, any of these elements has no effect at less than 0.001% by mass.
When the content of g exceeds 0.2% by mass and the content of Fe exceeds 0.1% by mass, the conductivity, the weather resistance of the solder, and the bending workability are reduced. Therefore, the added amount of Mg is 0.001 to 0.2% by mass,
The amount of Fe added is 0.001 to 0.1% by mass.
【0014】(O、H)本発明合金も溶湯の段階では気
体元素であるH及びOを吸収している。これらは凝固時
に溶湯中から追い出されてくるため、O含有量を50p
pm以下でかつH含有量を2ppm以下に規制しておか
なければ鋳造時の湯流れ性や鋳塊肌が劣化する。また、
特にHの残留は、板材加工まで至ったとしても、途中工
程の圧延や焼鈍で表面に膨れを生じる原因となり、これ
は製品としての価値を損なう。従って、O含有量を50
ppm以下でかつH含有量を2ppm以下に規制する。
なお、O含有量を30ppm以下でかつH含有量を1p
pm以下とすることがより望ましい。(O, H) The alloy of the present invention also absorbs gas elements H and O at the stage of melting. Since these are expelled from the molten metal during solidification, the O content is reduced to 50 p.
If the H content is not regulated to not more than pm and the H content is not more than 2 ppm, the flowability of the molten metal during casting and the surface of the ingot are deteriorated. Also,
In particular, the residual H causes swelling of the surface due to rolling or annealing in the middle of the process, even if it reaches the plate material processing, which impairs the value as a product. Therefore, the O content is 50
The H content is regulated to 2 ppm or less.
The O content is 30 ppm or less and the H content is 1 p.
pm or less.
【0015】(その他の選択元素)Ag、Ti、Si、
Ca、Mn、Be、Al、V、Cr、Co、Zr、N
b、Mo、In、Pb、Hf、Ta、Bは、各元素の含
有量が0.0005〜0.03%、かつその1種又は2
種以上の含有量が0.0005〜0.3%の範囲であれ
ば、本発明の銅合金の耐応力緩和特性を損なわず耐熱性
を向上させる効果があるため、前記の範囲内で含有させ
ても問題ない。1種又は2種以上の含有量が0.3%を
越えると、溶解鋳造時、熱間圧延時あるいは加工熱処理
中に酸化物が形成されやすく、また粗大な晶出物が発生
しやすいため、熱間加工性、めっき性、曲げ加工性等を
低下させやすい。(Other selected elements) Ag, Ti, Si,
Ca, Mn, Be, Al, V, Cr, Co, Zr, N
b, Mo, In, Pb, Hf, Ta, and B have a content of each element of 0.0005 to 0.03%, and one or two of them.
When the content of at least one kind is in the range of 0.0005 to 0.3%, there is an effect of improving the heat resistance without impairing the stress relaxation resistance of the copper alloy of the present invention. No problem. When the content of one or more kinds exceeds 0.3%, an oxide is easily formed at the time of melting casting, hot rolling, or working heat treatment, and coarse crystals are easily generated. Hot workability, plating property, bending workability, etc. are easily reduced.
【0016】(析出物の面積率)前記銅合金において耐
応力緩和特性を向上させるためには、透過型電子顕微鏡
で観察可能な結晶粒内部の微視的構造の制御が必要であ
る。前記銅合金は最終板厚まで冷間圧延する途中少なく
とも1回の中間焼鈍が必要であるが、その焼鈍時にNi
−P化合物を主体とする析出物が形成されない条件を選
定することが、耐応力緩和特性を飛躍的に向上させるた
めに重要である。すなわち、焼鈍時の析出物形成を0と
することは原理的に難しいが、析出物の面積率を5%以
下(添加元素の殆どを固溶させた状態)とすることによ
り、母相自体の応力緩和に対する抵抗力(すべり線の移
動や転位消滅をブロックする作用)を維持することがで
きるため、応力緩和特性が向上する。前記面積率が5%
を超えると、母相中の転位は消滅するようになり、結
果、材料特性が低下し、十分な耐応力緩和特性が得られ
なくなる。従って、析出物の面積率を5%以下とする。
なお、安定化焼鈍後の製品の析出物の面積率を5%以下
にするには、中間焼鈍後(安定化焼鈍前)の析出物の面
積率が5%以下である必要がある。(Area Ratio of Precipitate) In order to improve the stress relaxation resistance of the copper alloy, it is necessary to control the microscopic structure inside the crystal grains that can be observed with a transmission electron microscope. The copper alloy requires at least one intermediate annealing during cold rolling to the final sheet thickness.
It is important to select conditions under which precipitates mainly composed of -P compounds are not formed in order to dramatically improve stress relaxation resistance. In other words, it is difficult in principle to reduce the formation of precipitates during annealing to 0, but by setting the area ratio of precipitates to 5% or less (in a state where most of the added elements are dissolved), the mother phase itself can be formed. Since the resistance to stress relaxation (the action of blocking the movement of a slip line and the disappearance of dislocations) can be maintained, the stress relaxation characteristics are improved. The area ratio is 5%
If the temperature exceeds the dislocation, dislocations in the parent phase will disappear, and as a result, the material properties will be reduced, and sufficient stress relaxation resistance cannot be obtained. Therefore, the area ratio of the precipitate is set to 5% or less.
In order to reduce the area ratio of the precipitates of the product after the stabilizing annealing to 5% or less, it is necessary that the area ratio of the precipitates after the intermediate annealing (before the stabilizing annealing) is 5% or less.
【0017】(導電率の規定)前記銅合金の導電率は、
冷間圧延工程の途中あるいは最終冷間圧延後の焼鈍を行
うと、450〜500℃・4Hrの焼鈍条件でほぼ最大
となる。これは、焼鈍により析出物が最大量生成するた
めである。本発明の合金においては前述のように、Ni
−P化合物を主体とする析出物の生成により耐応力緩和
特性が劣化するため、導電率は最大値の90%以下とす
ることが必要である。導電率90%以下は析出物の面積
率5%以下とほぼ一致する。 (応力緩和率)端子等の場合、耐応力緩和特性の劣化に
伴って、端子間の嵌合力が低下するなどの支障を来た
し、信頼性を損なうものとなる。しかしながら、Ni−
P化合物を主体とする析出物の生成を上記のように抑制
することにより、170℃・1000Hr後にて30%
以下の良好な耐応力緩和特性を達成できる。(Specification of conductivity) The conductivity of the copper alloy is as follows:
When annealing is performed during the cold rolling step or after the final cold rolling, the temperature becomes almost maximum under the annealing conditions of 450 to 500 ° C. and 4 hours. This is because the maximum amount of precipitates is generated by annealing. In the alloy of the present invention, as described above, Ni
Since the stress relaxation resistance deteriorates due to the formation of a precipitate mainly composed of a -P compound, the conductivity needs to be 90% or less of the maximum value. The conductivity of 90% or less substantially coincides with the precipitate area ratio of 5% or less. (Stress relaxation rate) In the case of a terminal or the like, the deterioration of the stress relaxation resistance causes troubles such as a decrease in the fitting force between the terminals, and impairs the reliability. However, Ni-
By suppressing the formation of the precipitate mainly composed of the P compound as described above, 30%
The following good stress relaxation resistance can be achieved.
【0018】(加工熱処理工程)本発明の銅合金は、最
終冷間圧延前に再結晶させておく必要があるが、焼鈍後
の析出物の面積率を5%以下とすることが必要である。
そのための熱処理条件として、450〜850℃、より
好ましくは550〜650℃の範囲内の温度に10℃/
秒以上の速度で昇温し、前記範囲内の温度に5秒以上1
分未満の加熱保持後、10℃/秒以上の速度で冷却する
必要がある。この範囲よりも低温あるいは短時間では完
全再結晶組織は得られず、この範囲よりも高温又は長時
間、あるいは温度及び保持時間が上記範囲であっても昇
温又は冷却速度が10℃/秒未満では析出物の面積率が
大きくなり、耐応力緩和特性は低下する。また、結晶粒
径が大きくなるため、機械的性質等の劣化を生じる。(Working heat treatment step) The copper alloy of the present invention needs to be recrystallized before final cold rolling, but the area ratio of precipitates after annealing needs to be 5% or less. .
As heat treatment conditions therefor, 450 ° C./850° C., more preferably 550 ° C./650° C.
The temperature rises at a speed of at least 2 seconds and reaches a temperature within the above range for 5 seconds or more.
After heating and holding for less than a minute, it is necessary to cool at a rate of 10 ° C./sec or more. If the temperature is lower or shorter than this range, a completely recrystallized structure cannot be obtained. If the temperature is higher or longer than this range, or even if the temperature and the holding time are within the above ranges, the heating or cooling rate is less than 10 ° C./sec. In this case, the area ratio of the precipitate increases, and the stress relaxation resistance decreases. In addition, since the crystal grain size becomes large, deterioration of mechanical properties and the like occurs.
【0019】耐応力緩和特性及びばね限界値を更に向上
させるためには、最終圧延後に安定化焼鈍を行うことが
望ましいが、そのためには250〜850℃より好まし
くは300〜450℃の温度範囲内の温度で5秒以上1
分未満の加熱保持時間で行うことが望ましい。この範囲
よりも低温あるいは短時間では冷間圧延で導入された転
位が適切に解放されるに至らず、耐応力緩和特性や材料
特性を向上させることができない。また、この範囲より
も高温又は長時間、あるいは温度及び保持時間が上記範
囲であっても昇温又は冷却速度が10℃/秒未満では析
出物の面積率が大きくなり、耐応力緩和特性が低下し、
さらに経済的にも不利である。In order to further improve the stress relaxation resistance and the spring limit value, it is desirable to perform stabilizing annealing after the final rolling, but for that purpose, the temperature range is preferably from 250 to 850 ° C, more preferably from 300 to 450 ° C. 5 seconds or more at a temperature of 1
It is desirable to perform the heating and holding for less than a minute. If the temperature is lower or shorter than this range, the dislocations introduced by cold rolling are not properly released, and the stress relaxation resistance and the material properties cannot be improved. Further, even if the temperature is higher or longer than this range, or even if the temperature and the holding time are within the above ranges, if the temperature rise or cooling rate is less than 10 ° C./sec, the area ratio of the precipitates becomes large, and the stress relaxation resistance decreases. And
It is also economically disadvantageous.
【0020】[0020]
【実施例】以下に本合金の実施例について比較例として
比較してその特性を説明する。実施例1にて板材の製造
可否、添加元素の効果について実証する。実施例2にて
析出物の面積率の効果及び熱処理条件の効果について検
証する。 (実施例1)表1に示す組成の銅合金を電気炉により大
気中で木炭被覆下で溶解した。その鋳塊を熱間圧延し、
厚さ15mmに仕上げた。これらの板材について冷間圧
延と本発明の熱処理を組み合わせて厚さ0.25mmの
板材を得た。これらについて下記要領で材料特性を評価
した。なお、本発明に係る銅合金は熱間圧延を必要とし
ない横型連続鋳造によっても製造可能である。EXAMPLES The characteristics of the alloys of the present invention will be described below as comparative examples. Example 1 demonstrates the feasibility of producing a plate material and the effect of the added element. In Example 2, the effect of the area ratio of the precipitate and the effect of the heat treatment conditions will be verified. (Example 1) A copper alloy having a composition shown in Table 1 was melted in an air atmosphere under a charcoal coating in an electric furnace. Hot rolling the ingot,
Finished to a thickness of 15 mm. These sheets were subjected to a combination of cold rolling and the heat treatment of the present invention to obtain a sheet having a thickness of 0.25 mm. These were evaluated for material properties in the following manner. The copper alloy according to the present invention can also be manufactured by horizontal continuous casting that does not require hot rolling.
【0021】[0021]
【表1】 [Table 1]
【0022】(機械的強度)耐力、引張強さは試験片の
長手方向を圧延方向に平行としたJIS5号試験片(n
=2)にて測定した。 (応力緩和特性)EMAS−3003に記載の片持ち梁
式にて、初期応力として室温耐力の8割を負荷し、17
0℃又は200℃で1000Hr保持した後応力を除去
し、たわみ量を測定、応力緩和率を算出した(各温度に
てn=5)。 (電気伝導性)電気伝導性は導電率を測定することによ
り評価した。導電率はJISH0505に基づいて測定
した。 (はんだ耐候性)MIL−STD−202F METH
OD 208Dに基づいて、はんだ付けを行なった後、
大気中150℃・1000Hr経過後1mmφで180
°曲げ戻しを行い、はんだの剥離の有無を目視で確認し
た(n=3)。(Mechanical strength) The proof stress and the tensile strength were measured in accordance with JIS No. 5 test piece (n) with the longitudinal direction of the test piece being parallel to the rolling direction.
= 2). (Stress relaxation property) According to the cantilever method described in EMAS-3003, 80% of the room temperature proof stress was applied as the initial stress, and 17
After holding for 1000 hours at 0 ° C. or 200 ° C., the stress was removed, the amount of deflection was measured, and the stress relaxation rate was calculated (n = 5 at each temperature). (Electrical conductivity) The electrical conductivity was evaluated by measuring the electrical conductivity. The conductivity was measured based on JIS H505. (Solder weather resistance) MIL-STD-202F METH
After soldering based on OD 208D,
180 ° C at 1mmφ after 150 ℃ ・ 1000Hr in air
Debending was performed, and the presence or absence of peeling of the solder was visually confirmed (n = 3).
【0023】(耐マイグレーション性)上記板材から、
幅3.0mm、長さ80mmの試験片を採取し、2枚1
組として試験を行った(n=4)。図1及び図2は、上
記試験片を使用した漏洩電流を測定する試験方法の説明
図である。図1及び図2において2a、2bは試験片、
3は厚さ1mmのABS樹脂、3aはこのABS樹脂に
形成された穴、4はこのABS樹脂3の押え板である。
5は押え板4を押圧固定するため表面に絶縁塗料を塗布
したクリップ、6はバッテリ−、7は電線である。試験
片2a、2bは端部に電線6が接続されている。図1及
び図2に示す2枚の試験片2a、2bにバッテリ−6か
ら直流電流14Vを印加して、水道水中に5分間浸漬し
た後、続いて10分間乾燥する乾燥試験を50回行い、
その間の最大漏電流を高感度レコ−ダ−(図示せず)で
測定した。(Migration resistance)
A test piece having a width of 3.0 mm and a length of 80 mm was collected.
The test was performed as a set (n = 4). 1 and 2 are explanatory diagrams of a test method for measuring a leakage current using the test piece. In FIGS. 1 and 2, 2a and 2b are test pieces,
Reference numeral 3 denotes an ABS resin having a thickness of 1 mm, 3a denotes a hole formed in the ABS resin, and 4 denotes a holding plate for the ABS resin 3.
Reference numeral 5 denotes a clip having an insulating coating applied to the surface to press and fix the holding plate 4, reference numeral 6 denotes a battery, and reference numeral 7 denotes an electric wire. The test piece 2a, 2b has an electric wire 6 connected to an end. A dry test of applying a DC current of 14 V from the battery 6 to the two test pieces 2a and 2b shown in FIGS. 1 and 2 and immersing the test pieces in tap water for 5 minutes, followed by drying for 10 minutes, was performed 50 times.
The maximum leakage current during that time was measured with a high-sensitivity recorder (not shown).
【0024】(曲げ加工性)CESM0002金属材料
W曲げ試験に規定されているB型曲げ治具で、幅10m
m、長さ35mmに加工した供試材をはさみ、島津製作
所製万能試験機RH−30を使用して1tの荷重でR/
t=0にて先ずW曲げ加工を行った後、さらに1tの荷
重で90°曲げ部を密着曲げして、曲げ部の割れの有無
を判別した(n=2)。 (耐応力腐食割れ性)上記板材から0.25mmt×1
2.7mmw×150mmlの試験片を切り出し、応力
腐食割れ試験をトンプソンの方法(Materials
Research & Standards(196
1)1081) に準じて行った(n=4)。すなわ
ち、試験片を図3に示すループ状にした後、14wt%
のアンモニア水を入れ、40℃の温度で飽和蒸気を充満
させたデシケータ中に暴露し、試験片が破断するまでの
時間を測定した。(Bending workability) A B-type bending jig specified in the CESM0002 metal material W bending test, having a width of 10 m.
m, a test material processed to a length of 35 mm is sandwiched, and R / R is applied at a load of 1 t using a universal testing machine RH-30 manufactured by Shimadzu Corporation.
After performing a W bending process at t = 0, the 90 ° bent portion was further bent tightly with a load of 1 t, and the presence or absence of a crack in the bent portion was determined (n = 2). (Stress corrosion cracking resistance) 0.25 mmt x 1 from the above plate material
A 2.7 mm × 150 mm test piece was cut out and subjected to a stress corrosion cracking test by the method of Thompson (Materials
Research & Standards (196
1) Performed according to 1081) (n = 4). That is, the test piece was formed into a loop shape as shown in FIG.
, And exposed to a desiccator filled with saturated steam at a temperature of 40 ° C., and the time until the test piece fractured was measured.
【0025】以上の測定結果を表2に示す。Table 2 shows the above measurement results.
【0026】[0026]
【表2】 [Table 2]
【0027】表2に示すNo.1〜5では、耐力、導電
率、密着曲げ加工性は良好で、耐マイグレーション性に
おる最大漏洩電流値は低く抑制されており、さらにはん
だ耐候性、耐応力腐食割れ性も良好であり、応力緩和特
性にも優れている。一方、No.6はNiが不足してい
るため耐力が低く、応力緩和特性にも劣る。No.7は
Ni及びSnが過剰に添加されているため導電率が低
く、さらに曲げ加工性が劣り、はんだ耐候性試験で剥離
が生じている。No.8はZnが不足するため、はんだ
耐候性試験にて剥離が生じ、さらに耐マイグレーション
性における最大漏洩電流値が高く、自動車端子用には致
命的である。No.9はZnが過剰に添加されているた
め、導電率が低く、さらに耐応力腐食割れ性試験におい
て短時間で破損が認められる。No.10はPが不足す
るため、脱酸不足により健全な鋳塊が得られなかった。
No.11はPが過剰に添加されているため、はんだ耐
候性試験で剥離が生じ、耐応力腐食割れ性にも劣ってい
る。No.12はOが請求範囲上限を上回っており、湯
流れ性が極端に低下したため、鋳造を断念した。No.
13は、Hが請求範囲上限を上回っており、鋳塊は得ら
れたが、熱間圧延時に割れが生じたため断念した。No. 2 shown in Table 2 In Nos. 1 to 5, the proof stress, the electrical conductivity, and the contact bending workability were good, the maximum leakage current value in the migration resistance was suppressed to a low value, and the solder weather resistance and the stress corrosion cracking resistance were also good. Excellent relaxation properties. On the other hand, No. Sample No. 6 lacks Ni and thus has a low proof stress and poor stress relaxation characteristics. No. Sample No. 7 has a low conductivity due to excessive addition of Ni and Sn, has poor bending workability, and has peeled off in a solder weather resistance test. No. In No. 8, because of insufficient Zn, peeling occurred in a solder weather resistance test, and the maximum leakage current value in migration resistance was high, which was fatal for automobile terminals. No. In No. 9, since Zn is excessively added, the conductivity is low, and breakage is recognized in a short time in a stress corrosion cracking resistance test. No. In No. 10, since P was insufficient, a sound ingot could not be obtained due to insufficient deoxidation.
No. In No. 11, since P was excessively added, peeling occurred in the solder weather resistance test, and the resistance to stress corrosion cracking was poor. No. In No. 12, the casting was abandoned because O exceeded the upper limit of the claimed range and the flowability of the molten metal was extremely reduced. No.
In No. 13, H exceeded the upper limit of the claimed range, and an ingot was obtained, but was abandoned because a crack occurred during hot rolling.
【0028】(実施例2)表3に示す化学成分の銅合金
をクリプトル炉において大気中の木炭被覆下で溶解し
た。表3では添加元素は全て本発明の規定範囲内に位置
しているため容易に良好な熱間圧延材が得られ、冷間圧
延性も良好であった。これらの板材に表4に示す種々の
加工熱処理を行って0.25mmの板材を得た。これら
の板材に対して材料特性、さらには析出物の面積率及び
結晶粒径を下記要領で測定した。その結果を表5に示
す。 (析出物の面積率)TEMを用いて90000倍(析出
物を確認するのに最も適当な倍率であった)の倍率で3
視野観察し単位面積あたりに占める析出物の割合を測定
し、平均値を面積率とした。 (結晶粒径)JISH0501の伸銅品結晶粒度試験方
法に準拠し、切断法にて求めた。(Example 2) Copper alloys having the chemical components shown in Table 3 were melted under a charcoal coating in the air in a crypt furnace. In Table 3, since all the added elements are within the range specified by the present invention, a good hot-rolled material was easily obtained, and the cold-rollability was also good. Various plate heat treatments shown in Table 4 were performed on these plate members to obtain 0.25 mm plate members. The material properties, the area ratio of the precipitate, and the crystal grain size of these sheet materials were measured in the following manner. Table 5 shows the results. (Area ratio of precipitates) Using a TEM at a magnification of 90000 times (the most suitable magnification for confirming the precipitates) was 3
Visual observation was performed to measure the ratio of the precipitate per unit area, and the average value was defined as the area ratio. (Crystal Grain Size) Determined by a cutting method in accordance with the method for testing the grain size of copper-brought copper products according to JIS H0501.
【0029】[0029]
【表3】 [Table 3]
【0030】[0030]
【表4】 [Table 4]
【0031】[0031]
【表5】 [Table 5]
【0032】表5に示すように、No.14−1〜14
−3は本発明に規定する加工熱処理条件の範囲内であ
り、析出物の面積率が5%以下であり、耐応力緩和特性
が優れ、耐力、密着曲げ加工性、耐マイグレーション
性、耐応力腐食割れ性にも優れている。また、導電率は
導電率が最大となる条件で焼鈍を行ったNo.14−8
に比較して90%以下となっている。一方、No.14
−4〜14−8は冷間圧延途中の焼鈍によってNi−P
化合物を主体とする析出が発生するため、いずれも析出
物の面積率が5%を越え、かつ導電率も最大値に対して
90%以上となり、耐応力緩和特性が低下している。な
お、No.14−4は焼鈍温度が低く再結晶組織となら
なかったため、またNo.14−5〜14−8は結晶粒
が粗大化したため、いずれも曲げ加工性にも劣る。As shown in Table 5, as shown in FIG. 14-1 to 14
-3 is within the range of the thermo-mechanical treatment conditions defined in the present invention, the area ratio of the precipitate is 5% or less, the stress relaxation resistance is excellent, the proof stress, the contact bending workability, the migration resistance, the stress corrosion resistance. Also has excellent cracking properties. In the case of No. 2 which was annealed under the condition that the conductivity was maximum, 14-8
90% or less as compared with. On the other hand, No. 14
-4 to 14-8 are Ni-P by annealing during cold rolling.
Since precipitation mainly composed of a compound occurs, the area ratio of the precipitates exceeds 5% and the conductivity also becomes 90% or more of the maximum value, and the stress relaxation resistance decreases. In addition, No. No. 14-4 had a low annealing temperature and did not have a recrystallized structure. 14-5 to 14-8 are inferior in bending workability because the crystal grains are coarse.
【0033】No.14−9は、冷間圧延途中の焼鈍の
温度が低く時間が短いため、析出物の面積率は5%以下
であったが、再結晶してないため曲げ加工性が劣る。耐
応力緩和特性もNo.14−1〜14−3に比べてよい
とはいえない。No.14−10は、冷間圧延途中の焼
鈍の温度が高いため、析出物の面積率は5%以下であっ
たが、結晶粒が粗大化して曲げ加工性が劣る。耐応力緩
和特性もNo.14−1〜14−3に比べてよいとはい
えない。No. In No. 14-9, the annealing temperature during the cold rolling was low and the time was short, so that the area ratio of the precipitate was 5% or less, but the bendability was poor because it was not recrystallized. The stress relaxation resistance is no. It cannot be said that it is better than 14-1 to 14-3. No. In No. 14-10, since the annealing temperature during the cold rolling was high, the area ratio of the precipitate was 5% or less, but the crystal grains became coarse and the bending workability was poor. The stress relaxation resistance is no. It cannot be said that it is better than 14-1 to 14-3.
【0034】[0034]
【発明の効果】本発明によれば、特に耐応力緩和特性に
優れ、強度、密着曲げ加工性、耐マイグレ−ション性、
耐応力腐食割れ性、はんだ耐候性等にも優れた端子・コ
ネクタ用銅合金を、低コストで生産性良く製造すること
ができる。According to the present invention, in particular, excellent stress relaxation resistance, strength, close bending workability, migration resistance,
A copper alloy for terminals and connectors that is excellent in stress corrosion cracking resistance, solder weather resistance, etc. can be manufactured at low cost and with high productivity.
【図1】 最大漏洩電流の測定方法を説明するための平
面図である。FIG. 1 is a plan view for explaining a method of measuring a maximum leakage current.
【図2】 その側面図である。FIG. 2 is a side view thereof.
【図3】 耐応力腐食割れ試験に用いたループ状試験片
を示す図である。FIG. 3 is a view showing a loop-shaped test piece used for a stress corrosion cracking resistance test.
【符号の説明】 2a、2b 試験片[Explanation of Signs] 2a, 2b Test pieces
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C22F 1/08 C22F 1/08 K H01R 13/03 H01R 13/03 A // C22F 1/00 630 C22F 1/00 630A 630K 640 640A 661 661A 685 685Z 691 691B 691C 691A 692 692A 692B ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C22F 1/08 C22F 1/08 K H01R 13/03 H01R 13/03 A // C22F 1/00 630 C22F 1 / 00A 630A 630K 640 640A 661 661A 685 685Z 691 691B 691C 691A 692 692A 692B
Claims (6)
0.5〜2.0質量%、Zn:0.015%〜5.0質
量%以下、P:0.005%〜0.1質量%を含有し、
残部がCu及び不可避的不純物からなるとともに、析出
物の面積率が5%以下であることを特徴とする端子・コ
ネクタ用銅合金。1. Ni: 0.8 to 1.5 mass%, Sn:
0.5 to 2.0% by mass, Zn: 0.015% to 5.0% by mass or less, P: 0.005% to 0.1% by mass,
A copper alloy for terminals and connectors, characterized in that the balance consists of Cu and unavoidable impurities and the area ratio of precipitates is 5% or less.
%とFe:0.001〜0.1質量%のいずれか一方又
は双方を含有することを特徴とする請求項1に記載され
た端子・コネクタ用銅合金。2. The method according to claim 1, further comprising one or both of 0.001 to 0.2% by mass of Mg and 0.001 to 0.1% by mass of Fe. Copper alloy for terminals and connectors.
2ppm以下としたことを特徴とする請求項1又は2に
記載された端子・コネクタ用銅合金。3. O content: 50 ppm or less, H content:
The copper alloy for terminals and connectors according to claim 1, wherein the content is 2 ppm or less.
Al、V、Cr、Co、Zr、Nb、Mo、In、P
b、Hf、Ta、Bの1種又は2種以上を、各々0.0
005〜0.03%、かつ総量で0.0005〜0.3
%含むことを特徴とする請求項1〜3のいずれかに記載
された端子・コネクタ用銅合金。4. Ag, Ti, Si, Ca, Mn, Be,
Al, V, Cr, Co, Zr, Nb, Mo, In, P
b, Hf, Ta, or one or more of B
005-0.03%, and 0.0005-0.3 in total amount
The copper alloy for terminals and connectors according to any one of claims 1 to 3, wherein
て90%以下の導電率を有することを特徴とする請求項
1〜4のいずれかに記載された端子・コネクタ用銅合
金。5. The copper alloy for terminals and connectors according to claim 1, wherein the copper alloy has a conductivity of 90% or less with respect to the maximum value of the conductivity obtained by annealing.
合金に対し、冷間圧延工程の途中での焼鈍を連続炉にお
いて450〜850℃の温度範囲で5秒以上1分以下実
施し、最終冷間圧延後の安定化焼鈍を連続炉において2
50〜850℃の温度範囲で5秒以上1分以下実施し、
かついずれもそのときの昇温及び冷却速度を10℃/秒
以上とすることを特徴とする端子・コネクタ用銅合金の
製造方法。6. The copper alloy according to claim 1, wherein annealing in the middle of the cold rolling step is performed in a continuous furnace at a temperature of 450 to 850 ° C. for 5 seconds to 1 minute. Then, the stabilized annealing after the final cold rolling is performed in a continuous furnace for 2 hours.
Performed in a temperature range of 50 to 850 ° C. for 5 seconds to 1 minute,
A method for producing a copper alloy for terminals and connectors, wherein the rate of temperature rise and cooling at that time is 10 ° C./sec or more.
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|---|---|---|---|
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| Publication Number | Publication Date |
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| JP3744810B2 JP3744810B2 (en) | 2006-02-15 |
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ID=18951961
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