JP2002036173A - Film cutting work method - Google Patents
Film cutting work methodInfo
- Publication number
- JP2002036173A JP2002036173A JP2000221441A JP2000221441A JP2002036173A JP 2002036173 A JP2002036173 A JP 2002036173A JP 2000221441 A JP2000221441 A JP 2000221441A JP 2000221441 A JP2000221441 A JP 2000221441A JP 2002036173 A JP2002036173 A JP 2002036173A
- Authority
- JP
- Japan
- Prior art keywords
- cutting
- film
- silver
- blade
- measurement
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 64
- 238000005520 cutting process Methods 0.000 title claims abstract description 57
- 239000010410 layer Substances 0.000 claims abstract description 44
- 238000005259 measurement Methods 0.000 claims abstract description 26
- 230000003746 surface roughness Effects 0.000 claims abstract description 20
- 239000011241 protective layer Substances 0.000 claims abstract description 19
- 230000007613 environmental effect Effects 0.000 claims abstract description 7
- -1 silver halide Chemical class 0.000 claims description 71
- 229910052709 silver Inorganic materials 0.000 claims description 67
- 239000004332 silver Substances 0.000 claims description 67
- GGCZERPQGJTIQP-UHFFFAOYSA-N sodium;9,10-dioxoanthracene-2-sulfonic acid Chemical compound [Na+].C1=CC=C2C(=O)C3=CC(S(=O)(=O)O)=CC=C3C(=O)C2=C1 GGCZERPQGJTIQP-UHFFFAOYSA-N 0.000 claims description 42
- 239000000463 material Substances 0.000 claims description 32
- 239000003638 chemical reducing agent Substances 0.000 claims description 16
- 238000000691 measurement method Methods 0.000 claims description 9
- 239000011230 binding agent Substances 0.000 claims description 8
- 238000000576 coating method Methods 0.000 claims description 8
- 239000011248 coating agent Substances 0.000 claims description 7
- 238000000926 separation method Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 description 26
- 239000000975 dye Substances 0.000 description 21
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 18
- 239000006224 matting agent Substances 0.000 description 16
- 150000001875 compounds Chemical class 0.000 description 15
- 150000003378 silver Chemical class 0.000 description 14
- 239000000126 substance Substances 0.000 description 14
- 238000002156 mixing Methods 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 9
- 229920001577 copolymer Polymers 0.000 description 8
- 206010070834 Sensitisation Diseases 0.000 description 7
- 239000007864 aqueous solution Substances 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000000839 emulsion Substances 0.000 description 7
- 239000010948 rhodium Substances 0.000 description 7
- 230000008313 sensitization Effects 0.000 description 7
- 230000001235 sensitizing effect Effects 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 6
- 239000000470 constituent Substances 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 239000003446 ligand Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 150000002736 metal compounds Chemical class 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 238000011161 development Methods 0.000 description 5
- 230000018109 developmental process Effects 0.000 description 5
- 150000004820 halides Chemical class 0.000 description 5
- 150000002367 halogens Chemical class 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
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- 150000007524 organic acids Chemical class 0.000 description 5
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 4
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 description 4
- NVXLIZQNSVLKPO-UHFFFAOYSA-N Glucosereductone Chemical compound O=CC(O)C=O NVXLIZQNSVLKPO-UHFFFAOYSA-N 0.000 description 4
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- 229910021612 Silver iodide Inorganic materials 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
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- DZVCFNFOPIZQKX-LTHRDKTGSA-M merocyanine Chemical compound [Na+].O=C1N(CCCC)C(=O)N(CCCC)C(=O)C1=C\C=C\C=C/1N(CCCS([O-])(=O)=O)C2=CC=CC=C2O\1 DZVCFNFOPIZQKX-LTHRDKTGSA-M 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 4
- 230000006911 nucleation Effects 0.000 description 4
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- IJAPPYDYQCXOEF-UHFFFAOYSA-N phthalazin-1(2H)-one Chemical compound C1=CC=C2C(=O)NN=CC2=C1 IJAPPYDYQCXOEF-UHFFFAOYSA-N 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 4
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- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 3
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- 125000000217 alkyl group Chemical group 0.000 description 3
- XSCHRSMBECNVNS-UHFFFAOYSA-N benzopyrazine Natural products N1=CC=NC2=CC=CC=C21 XSCHRSMBECNVNS-UHFFFAOYSA-N 0.000 description 3
- IOJUPLGTWVMSFF-UHFFFAOYSA-N benzothiazole Chemical class C1=CC=C2SC=NC2=C1 IOJUPLGTWVMSFF-UHFFFAOYSA-N 0.000 description 3
- 239000012964 benzotriazole Substances 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 238000011033 desalting Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- JJIKCECWEYPAGR-UHFFFAOYSA-N icosanoic acid;silver Chemical compound [Ag].CCCCCCCCCCCCCCCCCCCC(O)=O JJIKCECWEYPAGR-UHFFFAOYSA-N 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
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- 229910052757 nitrogen Inorganic materials 0.000 description 3
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- 229910052762 osmium Inorganic materials 0.000 description 3
- LFSXCDWNBUNEEM-UHFFFAOYSA-N phthalazine Chemical compound C1=NN=CC2=CC=CC=C21 LFSXCDWNBUNEEM-UHFFFAOYSA-N 0.000 description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 description 3
- 239000005020 polyethylene terephthalate Substances 0.000 description 3
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- 239000000843 powder Substances 0.000 description 3
- 229910052703 rhodium Inorganic materials 0.000 description 3
- 230000005070 ripening Effects 0.000 description 3
- 229910052707 ruthenium Inorganic materials 0.000 description 3
- AQRYNYUOKMNDDV-UHFFFAOYSA-M silver behenate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCCCCCC([O-])=O AQRYNYUOKMNDDV-UHFFFAOYSA-M 0.000 description 3
- ORYURPRSXLUCSS-UHFFFAOYSA-M silver;octadecanoate Chemical compound [Ag+].CCCCCCCCCCCCCCCCCC([O-])=O ORYURPRSXLUCSS-UHFFFAOYSA-M 0.000 description 3
- ANRHNWWPFJCPAZ-UHFFFAOYSA-M thionine Chemical compound [Cl-].C1=CC(N)=CC2=[S+]C3=CC(N)=CC=C3N=C21 ANRHNWWPFJCPAZ-UHFFFAOYSA-M 0.000 description 3
- 150000003624 transition metals Chemical class 0.000 description 3
- XBYRMPXUBGMOJC-UHFFFAOYSA-N 1,2-dihydropyrazol-3-one Chemical compound OC=1C=CNN=1 XBYRMPXUBGMOJC-UHFFFAOYSA-N 0.000 description 2
- SULYEHHGGXARJS-UHFFFAOYSA-N 2',4'-dihydroxyacetophenone Chemical compound CC(=O)C1=CC=C(O)C=C1O SULYEHHGGXARJS-UHFFFAOYSA-N 0.000 description 2
- UIERETOOQGIECD-UHFFFAOYSA-N 2-methylbut-2-enoic acid Chemical compound CC=C(C)C(O)=O UIERETOOQGIECD-UHFFFAOYSA-N 0.000 description 2
- JWAZRIHNYRIHIV-UHFFFAOYSA-N 2-naphthol Chemical compound C1=CC=CC2=CC(O)=CC=C21 JWAZRIHNYRIHIV-UHFFFAOYSA-N 0.000 description 2
- 244000215068 Acacia senegal Species 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 108010010803 Gelatin Proteins 0.000 description 2
- 229920000084 Gum arabic Polymers 0.000 description 2
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
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- 239000004354 Hydroxyethyl cellulose Substances 0.000 description 2
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 2
- MWUXSHHQAYIFBG-UHFFFAOYSA-N Nitric oxide Chemical group O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 2
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 2
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- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
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- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
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- 241001061127 Thione Species 0.000 description 2
- 239000000205 acacia gum Substances 0.000 description 2
- 235000010489 acacia gum Nutrition 0.000 description 2
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- 150000001408 amides Chemical class 0.000 description 2
- 229960005070 ascorbic acid Drugs 0.000 description 2
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- 235000021240 caseins Nutrition 0.000 description 2
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- 125000005843 halogen group Chemical group 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
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- ZKEGGSPWBGCPNF-UHFFFAOYSA-N 2,5-dihydroxy-5-methyl-3-(piperidin-1-ylamino)cyclopent-2-en-1-one Chemical compound O=C1C(C)(O)CC(NN2CCCCC2)=C1O ZKEGGSPWBGCPNF-UHFFFAOYSA-N 0.000 description 1
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- 229920000728 polyester Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920005553 polystyrene-acrylate Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- JEXVQSWXXUJEMA-UHFFFAOYSA-N pyrazol-3-one Chemical class O=C1C=CN=N1 JEXVQSWXXUJEMA-UHFFFAOYSA-N 0.000 description 1
- 150000003217 pyrazoles Chemical class 0.000 description 1
- NDGRWYRVNANFNB-UHFFFAOYSA-N pyrazolidin-3-one Chemical compound O=C1CCNN1 NDGRWYRVNANFNB-UHFFFAOYSA-N 0.000 description 1
- 150000003222 pyridines Chemical class 0.000 description 1
- 150000003230 pyrimidines Chemical class 0.000 description 1
- 150000003233 pyrroles Chemical class 0.000 description 1
- 150000003236 pyrrolines Chemical class 0.000 description 1
- QEIQICVPDMCDHG-UHFFFAOYSA-N pyrrolo[2,3-d]triazole Chemical class N1=NC2=CC=NC2=N1 QEIQICVPDMCDHG-UHFFFAOYSA-N 0.000 description 1
- JWVCLYRUEFBMGU-UHFFFAOYSA-N quinazoline Chemical compound N1=CN=CC2=CC=CC=C21 JWVCLYRUEFBMGU-UHFFFAOYSA-N 0.000 description 1
- 150000003248 quinolines Chemical class 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- KIWUVOGUEXMXSV-UHFFFAOYSA-N rhodanine Chemical compound O=C1CSC(=S)N1 KIWUVOGUEXMXSV-UHFFFAOYSA-N 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- MMRXYMKDBFSWJR-UHFFFAOYSA-K rhodium(3+);tribromide Chemical compound [Br-].[Br-].[Br-].[Rh+3] MMRXYMKDBFSWJR-UHFFFAOYSA-K 0.000 description 1
- VXNYVYJABGOSBX-UHFFFAOYSA-N rhodium(3+);trinitrate Chemical compound [Rh+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VXNYVYJABGOSBX-UHFFFAOYSA-N 0.000 description 1
- 229910052711 selenium Inorganic materials 0.000 description 1
- 239000011669 selenium Substances 0.000 description 1
- CRDYSYOERSZTHZ-UHFFFAOYSA-M selenocyanate Chemical compound [Se-]C#N CRDYSYOERSZTHZ-UHFFFAOYSA-M 0.000 description 1
- 125000001824 selenocyanato group Chemical group *[Se]C#N 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229940100890 silver compound Drugs 0.000 description 1
- 150000003379 silver compounds Chemical class 0.000 description 1
- YRSQDSCQMOUOKO-KVVVOXFISA-M silver;(z)-octadec-9-enoate Chemical compound [Ag+].CCCCCCCC\C=C/CCCCCCCC([O-])=O YRSQDSCQMOUOKO-KVVVOXFISA-M 0.000 description 1
- JKOCEVIXVMBKJA-UHFFFAOYSA-M silver;butanoate Chemical compound [Ag+].CCCC([O-])=O JKOCEVIXVMBKJA-UHFFFAOYSA-M 0.000 description 1
- MNMYRUHURLPFQW-UHFFFAOYSA-M silver;dodecanoate Chemical compound [Ag+].CCCCCCCCCCCC([O-])=O MNMYRUHURLPFQW-UHFFFAOYSA-M 0.000 description 1
- LTYHQUJGIQUHMS-UHFFFAOYSA-M silver;hexadecanoate Chemical compound [Ag+].CCCCCCCCCCCCCCCC([O-])=O LTYHQUJGIQUHMS-UHFFFAOYSA-M 0.000 description 1
- OHGHHPYRRURLHR-UHFFFAOYSA-M silver;tetradecanoate Chemical compound [Ag+].CCCCCCCCCCCCCC([O-])=O OHGHHPYRRURLHR-UHFFFAOYSA-M 0.000 description 1
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- 238000001179 sorption measurement Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
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- 125000005504 styryl group Chemical group 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- PXQLVRUNWNTZOS-UHFFFAOYSA-N sulfanyl Chemical class [SH] PXQLVRUNWNTZOS-UHFFFAOYSA-N 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 150000003536 tetrazoles Chemical class 0.000 description 1
- 150000003557 thiazoles Chemical class 0.000 description 1
- 150000003549 thiazolines Chemical class 0.000 description 1
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical class NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 1
- UIERETOOQGIECD-ONEGZZNKSA-N tiglic acid Chemical compound C\C=C(/C)C(O)=O UIERETOOQGIECD-ONEGZZNKSA-N 0.000 description 1
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- ILJSQTXMGCGYMG-UHFFFAOYSA-N triacetic acid Chemical compound CC(=O)CC(=O)CC(O)=O ILJSQTXMGCGYMG-UHFFFAOYSA-N 0.000 description 1
- OTOHACXAQUCHJO-UHFFFAOYSA-H tripotassium;hexachlororhodium(3-) Chemical compound [Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[Cl-].[K+].[K+].[K+].[Rh+3] OTOHACXAQUCHJO-UHFFFAOYSA-H 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明はフィルムの切断加工
方法に関し、詳しくは切断時に保護層の膜剥がれが発生
せず、画像カブリが生じないフィルムの切断加工方法に
関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for cutting a film, and more particularly, to a method for cutting a film in which a protective layer does not peel off during cutting and image fogging does not occur.
【0002】[0002]
【従来の技術】医療分野・印刷製版分野では、画像形成
材料の湿式処理に伴う廃液が、作業性の上で問題となっ
ており、近年では環境保全、省スペースの観点からも処
理廃液の減量が強く望まれている。そこで、レーザー・
イメージャー、レーザー・イメージセッターにより効率
的な露光が可能で、高解像度で鮮明な黒色画像を形成す
ることができる写真技術用途の光熱写真材料に関する技
術が必要とされている。この技術として、例えば、米国
特許第3,152,904号、同3,487,075号
及びD.モーガン(Morgan)による「ドライシル
バー写真材料(Dry Silver Photogr
aphic Materials)」(Handboo
k of Imaging Materials, M
arcelDekker,Inc.第48頁,199
1)等に記載の方法が良く知られている。これらの感光
材料は80℃以上の高温で現像が行われるので、熱現像
感光材料と呼ばれている。これら熱現像感光材料では溶
液系処理薬品を一切使用しないため、より簡便で環境を
損なわないシステムをユーザーに提供することができ
る。2. Description of the Related Art In the medical field and the printing plate-making field, waste liquids caused by wet processing of image forming materials have become a problem in terms of workability. In recent years, the amount of processing waste liquids has been reduced from the viewpoint of environmental protection and space saving. Is strongly desired. Therefore, laser
There is a need for a technique relating to photothermographic materials for photographic technology, which enables efficient exposure with an imager and a laser imagesetter, and can form a high-resolution and clear black image. This technique includes, for example, U.S. Patent Nos. 3,152,904 and 3,487,075 and D.C. Morgan (Dry Silver Photogr)
aphic Materials) "(Handbook
k of Imaging Materials, M
arcelDekker, Inc. 48, 199
The methods described in 1) and the like are well known. Since these photosensitive materials are developed at a high temperature of 80 ° C. or higher, they are called photothermographic materials. Since these photothermographic materials do not use any solution-based processing chemicals, it is possible to provide users with a system that is simpler and does not damage the environment.
【0003】しかるに、かかる熱現像感光材料(必要に
よりフィルムと言う場合がある)においては、感光層を
保護するために数μm、例えば2〜3μmの極めて薄い
保護層を形成している。However, in such a photothermographic material (sometimes referred to as a film if necessary), an extremely thin protective layer of several μm, for example, 2 to 3 μm is formed to protect the photosensitive layer.
【0004】かかる感光材料は、製造段階ではロール状
に巻かれているが、これを製品化する過程で刃物によっ
てシート状に切断加工したり、更に大きなシートから複
数の小さなシートに切断加工して適当なサイズのシート
を得ている。かかる切断の際に、刃物により保護層が引
っ張られて剥がされ、切断面の画像形成層が露出して、
熱現像時に熱源ドラムの汚れを発生させたり、画像カブ
リが発生したりする問題がある。[0004] Such a photosensitive material is wound in a roll shape at a manufacturing stage, but is cut into a sheet shape by a blade in a process of producing the photosensitive material, or cut from a larger sheet into a plurality of smaller sheets. I have a suitable size sheet. At the time of such cutting, the protective layer is pulled and peeled off by the blade, and the image forming layer on the cut surface is exposed,
There is a problem that the heat source drum is stained at the time of thermal development and that image fogging occurs.
【0005】従来、保護層の膜剥がれを防止する手段と
して、刃物の刃先角を70度以上に大きくしたり、逆に
刃先角を50度以下に小さくする手段が採られていた。
しかし、刃物の刃先角を70度以上に大きくすると刃の
干渉が起こり切断が自由に出来ない問題があり、また刃
先角を50度以下に鋭利にすると刃の耐久性が悪くなる
問題がある。Heretofore, as means for preventing film peeling of the protective layer, means for increasing the cutting edge angle of the blade to 70 degrees or more and conversely reducing the cutting edge angle to 50 degrees or less have been adopted.
However, if the included angle of the blade is increased to 70 degrees or more, there is a problem that interference of the blades occurs and cutting cannot be performed freely, and if the included angle is sharpened to 50 degrees or less, durability of the blade is deteriorated.
【0006】[0006]
【発明が解決しようとする課題】そこで、本発明の課題
は、切断刃の干渉や耐久性の問題を解消し、しかも切断
時に保護層の膜剥がれが発生せず、画像カブリの問題の
生じないフィルムの切断加工方法を提供することにあ
る。SUMMARY OF THE INVENTION Therefore, an object of the present invention is to solve the problems of interference and durability of the cutting blade, and furthermore, the protective layer does not peel off at the time of cutting, and the problem of image fogging does not occur. An object of the present invention is to provide a method for cutting a film.
【0007】[0007]
【課題を解決するための手段】本発明の課題は、以下の
発明によって解決される。The object of the present invention is solved by the following invention.
【0008】(請求項1)支持体上に少なくとも画像形
成層と保護層を有するフィルムを刃先角が50〜70度
の刃物で切断加工する切断加工方法において、切断用の
刃物の動摩擦係数(下記測定法による)が0.2以下で
あることを特徴とするフィルムの切断加工方法。(Claim 1) In a cutting method for cutting a film having at least an image forming layer and a protective layer on a support with a blade having a cutting edge angle of 50 to 70 degrees, a coefficient of kinetic friction of the cutting blade (hereinafter referred to as a cutting coefficient). (By a measuring method) is 0.2 or less.
【0009】(動摩擦係数の測定法)動摩擦係数は以下
の条件で測定し、測定回数は1回毎に別の所を3回測定
した平均値として表す。 1.荷重:100gf 2.走査速度:300mm/分 3.走査板1 SUS製10mm角板(面粗度0.1S) 4.走査板2 SUS製10mm角板(面粗度0.5S) 5.測定環境:23℃、48%RH 6.被測定物は測定前2時間の間上記(4)の環境条件下
で保存してから測定する。(Measurement Method of Dynamic Friction Coefficient) The dynamic friction coefficient is measured under the following conditions, and the number of times of measurement is represented as an average value obtained by measuring three times at different points each time. 1. Load: 100 gf 2. Scanning speed: 300 mm / min 3. Scanning plate 1 SUS 10 mm square plate (surface roughness 0.1 S) 4. Scanning plate 2 SUS 10 mm square plate (surface roughness 0.5 S) 5 .Measurement environment: 23 ° C., 48% RH 6. The object to be measured is stored for 2 hours before the measurement under the environmental conditions described in (4) above before measurement.
【0010】(請求項2)前記刃物の面粗度(JIS
B 0601−1976の測定法による)が0.05S
〜0.1Sであることを特徴とする請求項1記載のフィ
ルムの切断加工方法。(Claim 2) The surface roughness of the blade (JIS)
B 0601-1976) is 0.05 S.
The method for cutting a film according to claim 1, wherein the thickness is 0.1 to 0.1 S.
【0011】(請求項3)前記刃物の表面に潤滑性を付
与するコーティングを施すことを特徴とする請求項1又
は2記載のフィルムの切断加工方法。(Claim 3) The method for cutting a film according to claim 1 or 2, wherein a coating for imparting lubricity is applied to a surface of the blade.
【0012】(請求項4)支持体上に少なくとも画像形
成層と保護層を有するフィルムを刃先角が50〜70度
の刃物で切断加工する切断加工方法において、切断用の
刃物の動摩擦係数(下記測定法による)が0.2を越え
る範囲で、該刃物の摩擦力が変動率30%以内であるこ
とを特徴とするフィルムの切断加工方法。(Claim 4) In a cutting method for cutting a film having at least an image forming layer and a protective layer on a support with a blade having a cutting edge angle of 50 to 70 degrees, a dynamic friction coefficient of the cutting blade (hereinafter, referred to as the following). The method of cutting a film, wherein the frictional force of the blade is within a variation rate of 30% within a range of (measurement method) exceeds 0.2.
【0013】(動摩擦係数の測定法)動摩擦係数は以下
の条件で測定し、測定回数は1回毎に別の所を3回測定
した平均値として表す。 1.荷重:100gf 2.走査速度:300mm/分 3.走査板1 SUS製10mm角板(面粗度0.1S) 4.走査板2 SUS製10mm角板(面粗度0.5S) 5.測定環境:23℃、48%RH 6.被測定物は測定前2時間の間上記(4)の環境条件下
で保存してから測定する。(Measurement Method of Dynamic Friction Coefficient) The dynamic friction coefficient is measured under the following conditions, and the number of measurements is expressed as an average value of three measurements at different points each time. 1. Load: 100 gf 2. Scanning speed: 300 mm / min 3. Scanning plate 1 SUS 10 mm square plate (surface roughness 0.1 S) 4. Scanning plate 2 SUS 10 mm square plate (surface roughness 0.5 S) 5 .Measurement environment: 23 ° C., 48% RH 6. The object to be measured is stored for 2 hours before the measurement under the environmental conditions described in (4) above before measurement.
【0014】(請求項5)フィルムが、支持体上に有機
銀塩、感光性ハロゲン化銀、銀イオンの還元剤、及びバ
インダーを含有する熱現像感光材料であることを特徴と
する請求項1、2、3又は4記載のフィルムの切断加工
方法。(Claim 5) The film is a photothermographic material comprising a support containing an organic silver salt, a photosensitive silver halide, a reducing agent for silver ions, and a binder. 5. The method for cutting a film according to 2, 3, or 4.
【0015】[0015]
【発明の実施の形態】以下、本発明の実施の形態につい
て説明する。Embodiments of the present invention will be described below.
【0016】本発明は、以下の発明を含み、いずれの発
明であっても、本発明の効果を発揮する。 1.刃物とフィルムの動摩擦係数(前述した測定法によ
る)が0.2以下であること(以下、第1の発明とい
う) 2.切断用の刃物の動摩擦係数(前述した測定法によ
る)が0.2を越える範囲で、該刃物の摩擦力が変動率
30%以内であること(以下、第2の発明という)The present invention includes the following inventions, and any of the inventions exhibit the effects of the present invention. 1. 1. The coefficient of kinetic friction between the blade and the film (based on the above-described measuring method) is 0.2 or less (hereinafter, referred to as a first invention). Within a range where the kinetic friction coefficient of the cutting blade (according to the above-described measurement method) exceeds 0.2, the frictional force of the blade is within a variation rate of 30% (hereinafter, referred to as a second invention).
【0017】第1の発明を実現する手段としては、刃物
の面粗度(前述した測定法による)を0.05S〜0.
1Sの範囲に規定することが好ましい。かかる面粗度の
範囲に規定できる手段は、刃物の材質の選定、刃物の表
面研磨、刃物の表面処理等のいずれでもよい。As means for realizing the first invention, the surface roughness of the blade (measured by the measuring method described above) is set to 0.05S to 0.S.
It is preferable to define it in the range of 1S. Means that can be defined in the range of the surface roughness may be any of selection of the material of the blade, surface polishing of the blade, surface treatment of the blade, and the like.
【0018】また第1の発明を実現する手段として、前
記刃物の表面に潤滑性を付与するコーティングを施すこ
とも好ましい。かかるコーティングとしては、セラミッ
クコーティングが挙げられ、例えばDLC(PVD)、T
iN(PVD)、TiCN(PVD)等が挙げられる。As means for realizing the first invention, it is preferable to apply a coating for imparting lubricity to the surface of the blade. Such coatings include ceramic coatings such as DLC (PVD), T
iN (PVD), TiCN (PVD) and the like.
【0019】次に、第2の発明は、切断用の刃物の動摩
擦係数(上述の測定法による)が0.2を越える範囲
で、該刃物の摩擦力が変動率30%以内であることを特
徴とする。Next, a second aspect of the present invention is that the frictional force of the cutting blade is within a variation rate of 30% within a range where the kinetic friction coefficient (based on the above-mentioned measuring method) of the cutting blade exceeds 0.2. Features.
【0020】摩擦力の変動を30%以内に抑制する手段
としては、回転する上刃と下刃によって切断するロー
タリカッタにおいて、下刃をしっかり固定し、上刃をク
リアランス調整可能な構造にし、下刃側で保護層を切断
することにより、切断時の摩擦力を安定させる、刃の
ついた土台をしっかり安定させる、等の手段が挙げられ
る。また刃物の精度を高めて、刃物を溝に精度良くはめ
て刃物をしっかり固定する手段でもよい。As a means for suppressing the fluctuation of the frictional force within 30%, a rotary cutter for cutting by a rotating upper blade and a lower blade has a structure in which the lower blade is firmly fixed and the upper blade has a structure in which the clearance can be adjusted. Means of cutting the protective layer on the blade side to stabilize the frictional force at the time of cutting, and stably stabilize the base with the blade, and the like can be given. Alternatively, a means for increasing the accuracy of the blade, accurately fitting the blade into the groove, and firmly fixing the blade may be used.
【0021】以下、摩擦力の変動を30%以内に抑制す
る手段を図面に基づいて説明する。Hereinafter, means for suppressing the fluctuation of the frictional force within 30% will be described with reference to the drawings.
【0022】始めに、上記の手段を図1に基づいて説
明する。図1は、ロータリカッタの構造を示す図であ
り、同図において、1は上刃であり、該上刃1は上カッ
タロータ100に取り付けられている。取り付け構造は
図示のように、上カッタロータ100に設けられたテー
パブロック101と取り付けボルト102によって一方
の側が固定され、他方の側(図面上右側)は押しボルト
103によってクリアランス調整が可能なように構成さ
れている。また、2は下刃であり、該下刃2は下カッタ
ロータ200に取り付けられている。取り付け構造は図
示のように、下カッタロータ200に設けられたテーパ
ブロック201と取り付けボルト202によって固定さ
れている。下刃2は安定した取り付け構造で、クリアラ
ンス調整はない。この手段では、下刃2をしっかり固定
し、上刃1をクリアランス調整可能な構造にし、下刃2
側でフィルム300の保護層301を切断することによ
り、切断時の摩擦力を安定させる。First, the above means will be described with reference to FIG. FIG. 1 is a view showing the structure of a rotary cutter. In the figure, reference numeral 1 denotes an upper blade, and the upper blade 1 is attached to an upper cutter rotor 100. As shown, the mounting structure is configured such that one side is fixed by a taper block 101 and a mounting bolt 102 provided on the upper cutter rotor 100, and the other side (the right side in the drawing) can be adjusted by a push bolt 103 for clearance adjustment. Have been. Reference numeral 2 denotes a lower blade, and the lower blade 2 is attached to the lower cutter rotor 200. As shown, the mounting structure is fixed by a taper block 201 provided on the lower cutter rotor 200 and mounting bolts 202. The lower blade 2 has a stable mounting structure and has no clearance adjustment. In this means, the lower blade 2 is firmly fixed, the upper blade 1 has a structure capable of adjusting the clearance, and the lower blade 2
By cutting the protective layer 301 of the film 300 on the side, the frictional force at the time of cutting is stabilized.
【0023】次に上記の手段を図2に基づいて説明す
る。図2において、3は駆動モータであり、駆動モータ
3の動力は駆動伝達シャフト4に架けられた駆動伝達ベ
ルト5を介してカッタのドラム軸6に伝達され、該ドラ
ム軸6を回転させる。ドラム軸6は下刃が固定された下
カッタロータ200と上刃が固定された上カッタロータ
100を回動可能に連結されている。Next, the above means will be described with reference to FIG. In FIG. 2, reference numeral 3 denotes a drive motor, and the power of the drive motor 3 is transmitted to a drum shaft 6 of a cutter via a drive transmission belt 5 stretched around a drive transmission shaft 4 to rotate the drum shaft 6. The drum shaft 6 is rotatably connected to a lower cutter rotor 200 having a fixed lower blade and an upper cutter rotor 100 having a fixed upper blade.
【0024】かかる構造において、ベルト伸びや、シャ
フトの撓みにより、回転ムラが生じ、結果としてそれが
刃先の動きに伝わり、切断時の刃先の微小な動きになる
ことがある。かかる対策として、シャフト径を太くする
ことや、ベルトを太く厚くすること、直接ドラム軸6に
モータを直結させることなどが効果的である。In such a structure, unevenness in rotation occurs due to belt elongation or bending of the shaft, and as a result, the unevenness is transmitted to the movement of the cutting edge, which may result in minute movement of the cutting edge during cutting. As such countermeasures, it is effective to increase the diameter of the shaft, increase the thickness of the belt, and directly connect the motor to the drum shaft 6.
【0025】本発明が適用されるフィルムは、支持体上
に少なくとも画像形成層と数μm、例えば2〜3μmの
厚さの保護層を有するものであればよいが、本発明にお
いては、支持体上に、有機銀塩、感光性ハロゲン化銀、
銀イオンの還元剤を含有する写真構成層が溶剤塗布して
形成され、該写真構成層の上部に、少なくとも一層の保
護層を有する熱現像感光材料が好ましい。また支持体の
他方の側にバッキング層を有する、いわゆる片面感光材
料が好ましい。The film to which the present invention is applied is not limited as long as it has at least an image forming layer and a protective layer having a thickness of several μm, for example, 2 to 3 μm on the support. On top, organic silver salt, photosensitive silver halide,
A photothermographic material which is formed by applying a photographic constituent layer containing a silver ion reducing agent by solvent coating and has at least one protective layer on the photographic constituent layer is preferred. A so-called single-sided photosensitive material having a backing layer on the other side of the support is preferred.
【0026】また本発明の熱現像感光材料の写真構成層
は、感光性層と非感光性層からなり、感光性層に有機銀
塩及び感光性ハロゲン化銀粒子を含有し、非感光性層に
還元剤を含有する態様が好ましい。The photographic constituent layer of the photothermographic material of the present invention comprises a photosensitive layer and a non-photosensitive layer. The photosensitive layer contains an organic silver salt and a photosensitive silver halide particle. An embodiment containing a reducing agent is preferred.
【0027】(感光性ハロゲン化銀)ハロゲン化銀粒子
は光センサーとして機能するものである。本発明におい
ては、画像形成後の白濁を低く抑えるため、及び良好な
画質を得るために平均粒径は小さい方が好ましく0.2
0μm以下、より好ましくは0.02μm以上0.15
μm以下、更に好ましくは0.03μm以上0.11μ
m以下がよい。(Photosensitive Silver Halide) The silver halide grains function as an optical sensor. In the present invention, the average particle size is preferably smaller in order to suppress white turbidity after image formation and to obtain good image quality.
0 μm or less, more preferably 0.02 μm or more and 0.15
μm or less, more preferably 0.03 μm or more and 0.11 μm
m or less is good.
【0028】ここでいう平均粒径とは、ハロゲン化銀粒
子が立方体或いは八面体のいわゆる正常晶である場合に
は、ハロゲン化銀粒子の稜の長さをいう。又、正常晶で
ない場合、例えば球状、棒状、或いは平板状の粒子の場
合には、ハロゲン化銀粒子の体積と同等な球を考えたと
きの直径をいう。When the silver halide grains are cubic or octahedral, so-called normal crystals, the average grain size means the length of the edge of the silver halide grains. In the case of non-normal crystals, for example, in the case of spherical, rod-shaped or tabular grains, it refers to the diameter of a sphere equivalent to the volume of silver halide grains.
【0029】またハロゲン化銀粒子は単分散粒子である
ことが好ましい。ここでいう単分散粒子とは、下記式で
求められる単分散度が40%以下の粒子をいい、より好
ましくは30%以下、特に好ましくは20%以下となる
粒子である。The silver halide grains are preferably monodisperse grains. The term “monodisperse particles” as used herein means particles having a degree of monodispersity of 40% or less, more preferably 30% or less, particularly preferably 20% or less.
【0030】単分散度=(粒径の標準偏差)/(粒径の
平均値)×100 ハロゲン化銀粒子の形状については、特に制限はない
が、ミラー指数〔100〕面の占める割合が高いことが
好ましく、この割合が50%以上、更には70%以上、
特に80%以上であることが好ましい。ミラー指数〔1
00〕面の比率は増感色素の吸着における〔111〕面
と〔100〕面との吸着依存性を利用したT.Tani,J.Ima
ging Sci.,29,165(1985)により求めることができる。Monodispersity = (standard deviation of particle size) / (average value of particle size) × 100 The shape of silver halide grains is not particularly limited, but the proportion occupied by the Miller index [100] plane is high. It is preferable that this ratio is 50% or more, further 70% or more,
In particular, it is preferably at least 80%. Miller index [1
The ratio of the [00] plane is determined by T. Tani, J. Ima using the dependence of the adsorption of the sensitizing dye on the [111] plane and the [100] plane.
ging Sci., 29, 165 (1985).
【0031】前述の単分散粒子の平均粒径は0.1μm
以下が好ましく、より好ましくは0.01μm〜0.1
μm、特に0.02μm〜0.08μmが好ましい。The above-mentioned monodisperse particles have an average particle size of 0.1 μm.
The following is preferable, and more preferably 0.01 μm to 0.1
μm, particularly preferably 0.02 μm to 0.08 μm.
【0032】またもう一つの好ましいハロゲン化銀粒子
の形状は、平板粒子である。ここでいう平板粒子とは、
粒子の投影面積の平方根を粒径rμmとし、垂直方向の
厚みをhμmとした場合のアスペクト比(=r/h)が
3以上のものをいう。その中でも好ましいのはアスペク
ト比が3以上50以下のものである。Another preferred form of silver halide grains is tabular grains. Here, the tabular grains are:
The aspect ratio (= r / h) is 3 or more when the square root of the projected area of the particle is r μm and the thickness in the vertical direction is h μm. Among them, those having an aspect ratio of 3 or more and 50 or less are preferable.
【0033】平板粒子の粒径は平均粒径0.1μm以下
であることが好ましく、さらに0.01μm〜0.08
μmがより好ましい。これらは米国特許第5,264,
337号、第5,314,798号、第5,320,9
58号等に記載されており、容易に目的の平板状粒子を
得ることができる。The average particle diameter of the tabular grains is preferably 0.1 μm or less, more preferably 0.01 μm to 0.08 μm.
μm is more preferred. These are disclosed in U.S. Pat.
No. 337, 5,314,798, 5,320,9
No. 58 and the like, and the desired tabular grains can be easily obtained.
【0034】ハロゲン組成としては特に制限はなく、塩
化銀、塩臭化銀、塩沃臭化銀、臭化銀、沃臭化銀、沃化
銀のいずれであってもよいが、好ましくは臭化銀あるい
は沃化銀あるいは沃臭化銀であって、更に好ましくは臭
化銀あるいは沃臭化銀である。特に好ましくは沃臭化銀
であり、沃化銀含有率は0.1モル%以上40モル%以
下が好ましく、更に好ましくは0.1モル%以上10モ
ル%以下である。粒子内におけるハロゲン組成の分布は
均一であってもよく、ハロゲン組成がステップ状に変化
したものでもよく、或いは連続的に変化した粒子であっ
てもよい。好ましくは、粒子内部の沃化銀含有率の高い
コア/シェル構造を有するハロゲン化銀粒子を用いる態
様が好ましい。The halogen composition is not particularly limited, and may be any of silver chloride, silver chlorobromide, silver chloroiodobromide, silver bromide, silver iodobromide, and silver iodide. Silver halide, silver iodide or silver iodobromide, more preferably silver bromide or silver iodobromide. Particularly preferred is silver iodobromide, and the silver iodide content is preferably from 0.1 mol% to 40 mol%, more preferably from 0.1 mol% to 10 mol%. The distribution of the halogen composition in the grains may be uniform, the halogen composition may change stepwise, or the grains may change continuously. Preferably, an embodiment using silver halide grains having a core / shell structure having a high silver iodide content inside the grains is preferred.
【0035】本発明に用いられる写真乳剤は、P.Glafki
des著Chimie et Physique Photographique(Paul Montel
社刊、1967年)、G.F.Duffin著 Photographic Emulsion Ch
emistry(The Focal Press刊、1966年)、V.L.Zelikman et
al著Making and Coating Photographic Emulsion(The F
ocal Press刊、1964年)等に記載された方法を用いて調製
することができる。即ち、酸性法、中性法、アンモニア
法等のいずれでもよく、また可溶性銀塩と可溶性ハロゲ
ン塩を反応させて形成するには、片側混合法、同時混合
法、それらの組合せ等のいずれを用いてもよい。The photographic emulsion used in the present invention is P. Glafki
Chimie et Physique Photographique by des (Paul Montel
Published by GFDuffin, Photographic Emulsion Ch
emistry (The Focal Press, 1966), VLZelikman et
Making and Coating Photographic Emulsion (The F
ocal Press, 1964) and the like. That is, any of an acidic method, a neutral method, an ammonia method and the like may be used, and in order to form a solution by reacting a soluble silver salt and a soluble halide, any one of a one-sided mixing method, a double-sided mixing method, a combination thereof and the like is used. You may.
【0036】このハロゲン化銀はいかなる方法で画像形
成層に添加されてもよく、このときハロゲン化銀は還元
可能な銀源に近接するように配置する。The silver halide may be added to the image forming layer by any method, and the silver halide is arranged so as to be close to the reducible silver source.
【0037】又、ハロゲン化銀は有機酸銀とハロゲンイ
オンとの反応による有機酸銀中の銀の一部又は全部をハ
ロゲン化銀に変換することによって調製してもよいし、
ハロゲン化銀を予め調製しておき、これを有機銀塩を調
製するための溶液に添加してもよく、又はこれらの方法
の組み合わせも可能であるが、後者が好ましい。The silver halide may be prepared by converting a part or all of the silver in the organic acid silver to the silver halide by the reaction of the organic acid silver with the halogen ions,
Silver halide may be prepared in advance and added to a solution for preparing an organic silver salt, or a combination of these methods is possible, but the latter is preferred.
【0038】一般にハロゲン化銀は有機銀塩に対して
0.75〜30重量%の量で含有することが好ましい。In general, the silver halide is preferably contained in an amount of 0.75 to 30% by weight based on the organic silver salt.
【0039】本発明に用いられるハロゲン化銀は、元素
周期律表の遷移金属に属するVIB、VIIB、VIII、IB族に属す
る金属のイオン又は錯体イオンを含有することが好まし
い。上記の金属としては、Cr、W(以上VIB族):
Re(VIIB族):Fe、 Co、Ni、Ru、Rh、P
d、Os、Ir、Pt(以上VIII族):Cu、Au(以
上IB族)が好ましく、中でも印刷製版用感光材料に使
用される場合はRh、Re、Ru、Ir、Osから選ば
れることが好ましい。The silver halide used in the present invention preferably contains an ion or a complex ion of a metal belonging to VIB, VIIB, VIII or IB belonging to a transition metal of the periodic table. Examples of the above-mentioned metals include Cr and W (the above-mentioned VIB group):
Re (VIIB group): Fe, Co, Ni, Ru, Rh, P
d, Os, Ir, Pt (more than VIII group): Cu and Au (more than IB group) are preferable. Among them, when used for a photosensitive material for printing plate making, it is selected from Rh, Re, Ru, Ir, and Os. preferable.
【0040】これらの金属は錯体の形でハロゲン化銀に
導入できる。本発明においては、遷移金属錯体は、下記
一般式で表される6配位錯体が好ましい。These metals can be introduced into the silver halide in the form of a complex. In the present invention, the transition metal complex is preferably a six-coordinate complex represented by the following general formula.
【0041】一般式 [ML6]m The general formula [ML 6 ] m
【0042】式中、Mは元素周期表VIB族、VIIB族、VIII
族、IB族の元素から選ばれる遷移金属、Lは架橋配位
子、mは0、−1、−2又は−3を表す。In the formula, M is a periodic table of elements VIB, VIIB, VIII
A transition metal selected from Group I and Group IB elements, L represents a bridging ligand, and m represents 0, -1, -2 or -3.
【0043】Lで表される配位子の具体例としては、ハ
ロゲン化物(弗化物、塩化物、臭化物及び沃化物)、シ
アン化物、シアナート、チオシアナート、セレノシアナ
ート、テルロシアナート、アジド及びアコの各配位子、
ニトロシル、チオニトロシル等が挙げられ、好ましくは
アコ、ニトロシル及びチオニトロシル等である。アコ配
位子が存在する場合には、配位子の一つ又は二つを占め
ることが好ましい。Lは同一でもよく、また異なってい
てもよい。Specific examples of the ligand represented by L include halides (fluoride, chloride, bromide and iodide), cyanide, cyanate, thiocyanate, selenocyanate, tellurocyanate, azide and alcohol. Each ligand of
Nitrosyl, thionitrosyl and the like can be mentioned, and preferred are aquo, nitrosyl and thionitrosyl. If an aquo ligand is present, it preferably occupies one or two of the ligands. L may be the same or different.
【0044】Mとして特に好ましい具体例は、ロジウム
(Rh)、ルテニウム(Ru)、レニウム(Re)又は
オスミウム(Os)である。Particularly preferred examples of M are rhodium (Rh), ruthenium (Ru), rhenium (Re) or osmium (Os).
【0045】以下に遷移金属配位錯体の具体例を示す。Specific examples of the transition metal coordination complex are shown below.
【0046】1:[RhCl6]3- 2:[RuCl6]3- 3:[ReCl6]3- 4:[RuBr6]3- 5:[OsCl6]3- 6:[CrCl6]4- 7:[Ru(NO)Cl5]2- 8:[RuBr4(H2O)]2- 9:[Ru(NO)(H2O)Cl4]- 10:[RhCl5(H2O)]2- 11:[Re(NO)Cl5]2- 12:[Re(NO)CN5]2- 13:[Re(NO)ClCN4]2- 14:[Rh(NO)2Cl4]- 15:[Rh(NO)(H2O)Cl4]- 16:[Ru(NO)CN5]2- 17:[Fe(CN)6]3- 18:[Rh(NS)Cl5]2- 19:[Os(NO)Cl5]2- 20:[Cr(NO)Cl5]2- 21:[Re(NO)Cl5]- 22:[Os(NS)Cl4(TeCN)]2- 23:[Ru(NS)Cl5]2- 24:[Re(NS)Cl4(SeCN)]2- 25:[Os(NS)Cl(SCN)4]2- 26:[Ir(NO)Cl5]2- [0046] 1: [RhCl 6] 3- 2 : [RuCl 6] 3- 3: [ReCl 6] 3- 4: [RuBr 6] 3- 5: [OsCl 6] 3- 6: [CrCl 6] 4 - 7: [Ru (NO) Cl 5] 2- 8: [RuBr 4 (H 2 O)] 2- 9: [Ru (NO) (H 2 O) Cl 4] - 10: [RhCl 5 (H 2 O)] 2- 11: [Re (NO) Cl 5] 2- 12: [Re (NO) CN 5] 2- 13: [Re (NO) ClCN 4] 2- 14: [Rh (NO) 2 Cl 4] - 15: [Rh ( NO) (H 2 O) Cl 4] - 16: [Ru (NO) CN 5] 2- 17: [Fe (CN) 6] 3- 18: [Rh (NS) Cl 5] 2- 19: [Os ( NO) Cl 5] 2- 20: [Cr (NO) Cl 5] 2- 21: [Re (NO) Cl 5] - 22: [Os (NS) Cl 4 (TeCN )] 2- 23: [Ru ( NS) Cl 5] 2- 24: [Re (NS) Cl 4 (SeCN)] 2- 25: [Os (NS) Cl (SCN) 4] 2- 26: [Ir (NO) Cl 5 ] 2-
【0047】これらの金属のイオン又は錯体イオンは一
種類で用いてもよいし、同種の金属及び異種の金属を二
種以上併用してもよい。One of these metal ions or complex ions may be used, or two or more of the same or different metals may be used in combination.
【0048】これらの金属のイオン又は錯体イオンの含
有量としては、一般的にはハロゲン化銀1モル当たり1
×10-9〜1×10-2モルが適当であり、好ましくは1
×10-8〜1×10-4モルである。The content of these metal ions or complex ions is generally in the range of 1 to 1 mol per mol of silver halide.
The amount is suitably from 10-9 to 1-10-2 mol, preferably 1 mol.
X 10 -8 to 1 X 10 -4 mol.
【0049】これらの金属のイオン又は錯体イオンを提
供する化合物は、ハロゲン化銀粒子形成時に添加し、ハ
ロゲン化銀粒子中に組み込まれることが好ましく、ハロ
ゲン化銀粒子の調製、つまり核形成、成長、物理熟成、
化学増感の前後のどの段階で添加してもよいが、特に核
形成、成長、物理熟成の段階で添加するのが好ましく、
更には核形成、成長の段階で添加するのが好ましく、最
も好ましくは核形成の段階で添加する。It is preferred that the compound providing these metal ions or complex ions is added during silver halide grain formation and incorporated into silver halide grains. Preparation of silver halide grains, that is, nucleation and growth , Physical aging,
Although it may be added at any stage before and after chemical sensitization, it is particularly preferable to add at the stage of nucleation, growth, and physical ripening,
Further, it is preferably added at the stage of nucleation and growth, most preferably at the stage of nucleation.
【0050】添加に際しては、数回に渡って分割して添
加してもよく、ハロゲン化銀粒子中に均一に含有させる
こともできるし、特開昭63−29603号、特開平2
−306236号、同3−167545号、同4−76
534号、同6−110146号、同5−273683
号等に記載されている様に粒子内に分布を持たせて含有
させることもできる。好ましくは粒子内部に分布を持た
せることができる。In the addition, the compound may be added in several divided portions, may be added uniformly in the silver halide grains, or may be added uniformly in the silver halide grains.
-306236, 3-167545, 4-76
No. 534, No. 6-110146, No. 5-273683
As described in Japanese Patent Application Laid-Open No. H10-284, etc., the particles can be contained in the particles with a distribution. Preferably, a distribution can be provided inside the particles.
【0051】これらの金属化合物は、水或いは適当な有
機溶媒(例えば、アルコール類、エーテル類、グリコー
ル類、ケトン類、エステル類、アミド類)に溶解して添
加することができるが、例えば金属化合物の粉末の水溶
液もしくは金属化合物とNaCl、KClとを一緒に溶
解した水溶液を、粒子形成中の水溶性銀塩溶液又は水溶
性ハライド溶液中に添加して置く方法、或いは銀塩溶液
とハライド溶液が同時に混合されるとき第三の水溶液と
して添加し、三液同時混合の方法でハロゲン化銀粒子を
調製する方法、粒子形成中に必要量の金属化合物の水溶
液を反応容器に投入する方法、或いはハロゲン化銀調製
時に予め金属のイオン又は錯体イオンをドープしてある
別のハロゲン化銀粒子を添加して溶解させる方法等があ
る。特に、金属化合物の粉末の水溶液もしくは金属化合
物とNaCl、KClとを一緒に溶解した水溶液を水溶
性ハライド溶液に添加する方法が好ましい。粒子表面に
添加する時には、粒子形成直後又は物理熟成時途中もし
くは終了時又は化学熟成時に必要量の金属化合物の水溶
液を反応容器に投入することもできる。These metal compounds can be added by dissolving them in water or a suitable organic solvent (eg, alcohols, ethers, glycols, ketones, esters, amides). A method in which an aqueous solution of a powder or an aqueous solution in which a metal compound and NaCl and KCl are dissolved together is added to a water-soluble silver salt solution or a water-soluble halide solution during particle formation and placed, or a silver salt solution and a halide solution are used. When mixed simultaneously, a third aqueous solution is added to prepare silver halide grains by a three-liquid simultaneous mixing method, a method in which a required amount of an aqueous solution of a metal compound is charged into a reaction vessel during grain formation, or halogen is added. There is a method in which another silver halide grain doped with a metal ion or a complex ion in advance at the time of preparing silver halide is added and dissolved. In particular, a method of adding an aqueous solution of a powder of a metal compound or an aqueous solution in which a metal compound and NaCl and KCl are dissolved together is added to a water-soluble halide solution. When adding to the particle surface, a required amount of an aqueous solution of a metal compound can be charged into the reaction vessel immediately after the formation of the particles, during or at the end of physical ripening, or at the time of chemical ripening.
【0052】本発明の感光性ハロゲン化銀粒子は水洗し
て可溶性塩を除去することが好ましい。The photosensitive silver halide grains of the present invention are preferably washed with water to remove soluble salts.
【0053】本発明で用いる感光性ハロゲン化銀粒子は
公知の各種の方法を用いて化学増感を行なうことができ
る。特にカルコゲン化合物による化学増感を行うことが
できる。カルコゲン化合物による化学増感としては硫黄
増感法、セレン増感法、テルル増感法がある。The photosensitive silver halide grains used in the present invention can be subjected to chemical sensitization using various known methods. In particular, chemical sensitization with a chalcogen compound can be performed. Chemical sensitization by a chalcogen compound includes a sulfur sensitization method, a selenium sensitization method, and a tellurium sensitization method.
【0054】本発明で用いられる増感剤の添加は、ハロ
ゲン化銀粒子形成中、粒子形成後脱塩前、脱塩後のいず
れのタイミングでもよいが、好ましくは粒子形成中、あ
るいは脱塩後がよい。The sensitizer used in the present invention may be added at any timing during the formation of the silver halide grains, before the desalting after the formation of the grains, or after the desalting, but preferably during the formation of the grains or after the desalting. Is good.
【0055】本発明で用いる感光性ハロゲン化銀粒子
は、増感色素により所望の波長に分光増感できる。用い
ることができる増感色素には、シアニン色素、メロシア
ニン色素、複合シアニン色素、複合メロシアニン色素、
ホロボーラーシアニン色素、ヘミシアニン色素、スチリ
ル色素及びヘミオキソノール色素が包含される。The photosensitive silver halide grains used in the present invention can be spectrally sensitized to a desired wavelength by a sensitizing dye. Sensitizing dyes that can be used include cyanine dyes, merocyanine dyes, composite cyanine dyes, composite merocyanine dyes,
Holobola cyanine dyes, hemicyanine dyes, styryl dyes and hemioxonol dyes are included.
【0056】これらの色素類は通常利用されている核の
いずれをも適用できる。即ち、ピロリン核、オキサゾリ
ン核、チアゾリン核、ピロール核、オキサゾール核、チ
アゾール核、セレナゾール核、イミダゾール核、テトラ
ゾール核、ピリジン核などで、これらの核に脂肪式炭化
水素環が融合した核、即ちインドレニン核、ベンズイン
ドレニン核、インドール核、ベンズオキサゾール核、ナ
フトオキサゾール核、ベンゾチアゾール核、ナフトチア
ゾール核、ベンゾセレナゾール核、ベンズイミダゾール
核、キノリン核などが適用できる。これらの核は炭素原
子上に置換されてもよい。As these dyes, any of the nuclei usually used can be applied. That is, a pyrroline nucleus, an oxazoline nucleus, a thiazoline nucleus, a pyrrole nucleus, an oxazole nucleus, a thiazole nucleus, a selenazole nucleus, an imidazole nucleus, a tetrazole nucleus, a pyridine nucleus, etc. A renin nucleus, a benzindolenine nucleus, an indole nucleus, a naphthoxazole nucleus, a benzothiazole nucleus, a naphthothiazole nucleus, a benzoselenazole nucleus, a benzimidazole nucleus, a quinoline nucleus and the like can be applied. These nuclei may be substituted on carbon atoms.
【0057】メロシアニン色素又は複合メロシアニン色
素にはケトメチン構造を有する核として、ピラゾリン−
5−オン核、チオビタントイン核、2−チオオキサゾリ
ジン−2,4−ジオン核、チアゾリン−2,4−ジオン
核、ローダニン核、チオパルビツール酸核などの5〜6
員異節環核を適用することができる。具体的にはリサー
チデスクロージャー第176巻RD17643(197
8年12月発行)第2・3頁、米国特許4425425
号、同4425426号に記載されているものを用いる
ことができる。また増感色素は米国特許3485634
号に記載されている超音波振動を用いて溶解してもよ
い。その他に増感色素を溶解、あるいは分散して乳剤中
に添加する方法としては、米国特許3482981号、
同3585195号、同3469987号、同3425
835号、同3342605号、英国特許127132
9号、同1038029号、同1121174号、米国
特許3660101号、同3658546号に記載の方
法を用いることができる。これらの増感色素は単独で用
いてもよく、それらを組み合わせて用いてもよい。増感
色素の組み合わせは特に強色増感の目的でしばしば用い
られる。有用な強色増感を示す色素の組み合せ及び強色
増感を示す物質はRD17643(1978年12月発
行)第23頁のJ項に記載されている。The merocyanine dye or the complex merocyanine dye has pyrazoline- as a nucleus having a ketomethine structure.
5-6 nuclei, thiobitantoin nuclei, 2-thiooxazolidine-2,4-dione nuclei, thiazoline-2,4-dione nuclei, rhodanine nuclei, thioparbituric acid nuclei, etc.
Member heterocyclic nuclei can be applied. Specifically, Research Disclosure Vol. 176, RD17643 (197
(Issued in December 2008) page 2, page 3, US Patent 4,425,425
And No. 4425426 can be used. The sensitizing dye is disclosed in U.S. Pat. No. 3,485,634.
The dissolution may be carried out using ultrasonic vibration described in the above item. Other methods of dissolving or dispersing a sensitizing dye and adding it to an emulsion include, for example, US Pat. No. 3,482,981;
No. 3585195, No. 3469987, No. 3425
Nos. 835 and 3342605, British Patent 127132
Nos. 9, 1038029, 1121174, U.S. Pat. Nos. 3,660,101 and 3,658,546 can be used. These sensitizing dyes may be used alone or in combination. Combinations of sensitizing dyes are often used, particularly for supersensitization. Useful combinations of dyes exhibiting supersensitization and substances exhibiting supersensitization are described in RD17643 (published December 1978), page 23, section J.
【0058】(有機銀塩)本発明に用いることができる
有機銀塩は、光に対して比較的安定であるが、露光され
た光触媒(写真用銀塩など)および還元剤の存在下で、
80℃またはそれ以上に加熱された場合に銀画像を形成
する銀塩である。(Organic Silver Salt) The organic silver salt that can be used in the present invention is relatively stable to light, but can be used in the presence of an exposed photocatalyst (such as a photographic silver salt) and a reducing agent.
A silver salt that forms a silver image when heated to 80 ° C. or higher.
【0059】有機銀塩は、銀イオンを還元できる源を含
む任意の有機物質であってよい。有機酸の銀塩、特に
(炭素数が10〜30が好ましく、より好ましくは炭素
数15〜28の)長鎖脂肪カルボン酸が好ましい。The organic silver salt may be any organic substance containing a source capable of reducing silver ions. Silver salts of organic acids, especially long-chain fatty carboxylic acids (preferably having 10 to 30 carbon atoms, more preferably having 15 to 28 carbon atoms) are preferred.
【0060】配位子が4.0〜10.0の範囲の全安定
定数を有する有機または無機銀塩の錯体も望ましい。銀
源物質は、好ましくは感光性層の約5〜30重量%を構
成すべきである。好ましい有機銀塩は、カルボキシル基
を有する有機化合物の銀塩を含む。これらの例は、脂肪
族カルボン酸の銀塩および芳香族カルボン酸の銀塩を含
むが、これらに限定されない。脂肪族カルボン酸の銀塩
の好ましい例は、ベヘン酸銀、ステアリン酸銀、アラキ
ジン酸銀、オレイン酸銀、ラウリン酸銀、カプロン酸
銀、ミリスチン酸銀、パルミチン酸銀、マレイン酸銀、
フマル酸銀、酒石酸銀、リノール酸銀、酪酸銀および樟
脳酸銀、これらの混合物などを含む。メルカプトまたは
チオン基を含む化合物の銀塩およびこれらの誘導体を使
用することもできる。これらの化合物の好ましい例は、
3−メルカプト−4−フェニル−1,2,4−トリアゾ
ールの銀塩、2−メルカプトベンズイミダゾールの銀
塩、2−メルカプト−5−アミノチアジアゾールの銀
塩、2−(エチルグリコールアミド)ベンゾチアゾール
の銀塩、S−アルキルチオグリコール酸(ここで、アル
キル基の炭素数は12〜22である)の銀塩などのチオ
グリコール酸の銀塩、ジチオ酢酸の銀塩などのジチオカ
ルボン酸の銀塩、チオアミドの銀塩、5−カルボキシル
−1−メチル−2−フェニル−4−チオピリジンの銀
塩、メルカプトトリアジンの銀塩、2−メルカプトベン
ズオキサゾールの銀塩、米国特許第4,123,274
号に記載の銀塩、例えば、3−アミノ−5−ベンジルチ
オ−1,2,4−チアゾールの銀塩などの1,2,4−
メルカプトチアゾール誘導体の銀塩、米国特許第3,3
01,678号に記載の3−(3−カルボキシエチル)
−4−メチル−4−チアゾリン−2−チオンの銀塩など
のチオン化合物の銀塩を含む。さらに、イミノ基を含む
化合物の銀塩を使用することができる。これらの化合物
の好ましい例は、ベンゾトリアゾールの銀塩およびそれ
らの誘導体、例えばメチルベンゾトリアゾール銀などの
ベンゾトリアゾールの銀塩、5−クロロベンゾトリアゾ
ール銀などのハロゲン置換ベンゾトリアゾールの銀塩、
米国特許第4,220,709号に記載のような1,
2,4−トリアゾールまたは1−H−テトラゾールの銀
塩、イミダゾールおよびイミダゾール誘導体の銀塩など
を含む。例えば、米国特許第4,761,361号およ
び同第4,775,613号に記載のような種々の銀ア
セチリド化合物を使用することもできる。Complexes of organic or inorganic silver salts wherein the ligand has a total stability constant in the range of 4.0 to 10.0 are also desirable. The silver source material should preferably make up about 5 to 30% by weight of the photosensitive layer. Preferred organic silver salts include silver salts of organic compounds having a carboxyl group. Examples of these include, but are not limited to, silver salts of aliphatic carboxylic acids and silver salts of aromatic carboxylic acids. Preferred examples of the silver salt of an aliphatic carboxylic acid include silver behenate, silver stearate, silver arachidate, silver oleate, silver laurate, silver caproate, silver myristate, silver palmitate, silver maleate, and silver maleate.
Includes silver fumarate, silver tartrate, silver linoleate, silver butyrate and silver camphorate, mixtures thereof and the like. Silver salts of compounds containing a mercapto or thione group and derivatives thereof can also be used. Preferred examples of these compounds are
Silver salt of 3-mercapto-4-phenyl-1,2,4-triazole, silver salt of 2-mercaptobenzimidazole, silver salt of 2-mercapto-5-aminothiadiazole, 2- (ethylglycolamide) benzothiazole A silver salt of a thioglycolic acid such as a silver salt, a silver salt of an S-alkylthioglycolic acid (where the alkyl group has 12 to 22 carbon atoms), a silver salt of a dithiocarboxylic acid such as a silver salt of dithioacetic acid, Silver salt of thioamide, silver salt of 5-carboxyl-1-methyl-2-phenyl-4-thiopyridine, silver salt of mercaptotriazine, silver salt of 2-mercaptobenzoxazole, U.S. Pat. No. 4,123,274
No. 1,2,4- such as silver salt of 3-amino-5-benzylthio-1,2,4-thiazole.
Silver salts of mercaptothiazole derivatives, US Pat. No. 3,3
3- (3-carboxyethyl) described in 01,678
And a silver salt of a thione compound such as a silver salt of -4-methyl-4-thiazoline-2-thione. Further, a silver salt of a compound containing an imino group can be used. Preferred examples of these compounds include silver salts of benzotriazole and derivatives thereof, for example, silver salts of benzotriazole such as silver methylbenzotriazole, silver salts of halogen-substituted benzotriazole such as silver 5-chlorobenzotriazole,
As described in U.S. Pat. No. 4,220,709,
Includes silver salts of 2,4-triazole or 1-H-tetrazole, silver salts of imidazole and imidazole derivatives, and the like. For example, various silver acetylide compounds as described in U.S. Pat. Nos. 4,761,361 and 4,775,613 can be used.
【0061】本発明において、中でも好ましい銀源はベ
ヘン酸銀である。さらに好ましくはステアリン酸銀、ア
ラキジン酸銀との混合物である。ステアリン酸銀の含有
率としては、ベヘン酸銀に対して0〜70モル%で、好
ましくは10〜30モル%であり、アラキジン酸銀はベ
ヘン酸銀に対して0〜70モル%、好ましくは30〜6
0モル%である。In the present invention, a particularly preferred silver source is silver behenate. More preferred is a mixture with silver stearate and silver arachidate. The content of silver stearate is 0 to 70 mol%, preferably 10 to 30 mol%, based on silver behenate, and silver arachidate is 0 to 70 mol%, preferably, silver silver behenate. 30-6
0 mol%.
【0062】有機銀塩化合物は、水溶性銀化合物と銀と
錯形成する化合物を混合することにより得られるが、正
混合法、逆混合法、同時混合法、特開平9−12764
3号に記載されている様なコントロールドダブルジェッ
ト法等が好ましく用いられる。The organic silver salt compound can be obtained by mixing a water-soluble silver compound and a compound which forms a complex with silver.
A controlled double jet method as described in No. 3 is preferably used.
【0063】本発明においては、有機銀塩は平均粒径が
1μm以下でありかつ単分散であることが好ましい。有
機銀塩の平均粒径とは、有機銀塩の粒子が例えば球状、
棒状、或いは平板状の粒子の場合には、有機銀塩粒子の
体積と同等な球を考えたときの直径をいう。平均粒径は
好ましくは0.01μm〜0.8μm、特に0.05μ
m〜0.5μmが好ましい。また単分散とは、ハロゲン
化銀粒子の場合と同義であり、好ましい単分散度は1%
〜30%である。In the present invention, the organic silver salt preferably has an average particle size of 1 μm or less and is monodispersed. The average particle size of the organic silver salt means that the particles of the organic silver salt are, for example, spherical,
In the case of rod-shaped or tabular grains, it refers to the diameter of a sphere equivalent to the volume of the organic silver salt grains. The average particle size is preferably 0.01 μm to 0.8 μm, particularly 0.05 μm.
m to 0.5 μm is preferred. The term “monodisperse” has the same meaning as in the case of silver halide grains, and the preferred monodispersity is 1%
3030%.
【0064】本発明において、感光性ハロゲン化銀と有
機銀塩の混合方法及び混合条件については、本発明の効
果が十分に表われる限りにおいて特に制限はないが、好
ましい混合方法としては、別々に調製終了した感光性ハ
ロゲン化銀と有機銀塩とを混合する方法、あるいは、有
機銀塩の調製中のいずれかのタイミングで調製終了した
感光性ハロゲン化銀を混合する方法、及び調製終了した
有機銀塩とハロゲン化剤を混合してハロゲン化銀を調製
する方法があり、より好ましい混合方法としては、調製
終了した感光性ハロゲン化銀を有機酸と混合し、その後
有機酸を銀塩化する方法がある。In the present invention, the method of mixing the photosensitive silver halide and the organic silver salt and the mixing conditions are not particularly limited as long as the effects of the present invention are sufficiently exhibited. A method of mixing the prepared photosensitive silver halide and the organic silver salt, or a method of mixing the prepared photosensitive silver halide at any timing during the preparation of the organic silver salt, and There is a method of preparing a silver halide by mixing a silver salt and a halogenating agent, and a more preferable mixing method is to mix the prepared photosensitive silver halide with an organic acid, and then to silver chloride the organic acid. There is.
【0065】本発明において、所定の光学濃度にするた
めには、ハロゲン化銀及び有機銀塩の総量は、銀量に換
算して1m2当たり0.3g以上1.5g以下であるこ
とが好ましい。また銀総量に対するハロゲン化銀の量
は、重量比で50%以下、好ましくは25%以下、更に
好ましくは0.1%〜15%の範囲である。In the present invention, in order to obtain a predetermined optical density, the total amount of silver halide and organic silver salt is preferably from 0.3 g to 1.5 g per m 2 in terms of silver amount. . The amount of silver halide relative to the total amount of silver is 50% or less by weight, preferably 25% or less, more preferably 0.1% to 15%.
【0066】(銀イオンの還元剤)銀イオンの還元剤
は、有機銀塩のための還元剤であり、本発明に使用でき
る還元剤としては、銀イオンを金属銀に還元する任意の
物質、好ましくは有機物質であってよい。フェニドン、
ヒドロキノンおよびカテコールなどの従来の写真現像剤
は有用であるが、ヒンダードフェノール還元剤が好まし
い。ヒンダードフェノール類としては、下記一般式
(A)で示される化合物が挙げられる。(Reducing Agent for Silver Ion) The reducing agent for silver ion is a reducing agent for organic silver salts. As the reducing agent that can be used in the present invention, any substance that reduces silver ions to metallic silver, Preferably, it may be an organic substance. Phenidone,
Conventional photographic developers such as hydroquinone and catechol are useful, but hindered phenol reducing agents are preferred. Examples of hindered phenols include compounds represented by the following general formula (A).
【0067】[0067]
【化1】 Embedded image
【0068】式中、Rは水素原子、又は炭素原子数1〜
10のアルキル基(例えば、−C4H9 、2,4,4−
トリメチルペンチル)を表し、R′及びR″は炭素原子
数1〜5のアルキル基(例えば、メチル、エチル、t−
ブチル)を表す。In the formula, R is a hydrogen atom or a group having 1 to 1 carbon atoms.
10 alkyl group (e.g., -C 4 H 9, 2,4,4-
R ′ and R ″ represent an alkyl group having 1 to 5 carbon atoms (eg, methyl, ethyl, t-
Butyl).
【0069】一般式(A)で示される化合物の具体例は
を以下に示す。ただし、本発明は、以下の化合物に限定
されるものではない。Specific examples of the compound represented by formula (A) are shown below. However, the present invention is not limited to the following compounds.
【0070】[0070]
【化2】 Embedded image
【0071】[0071]
【化3】 Embedded image
【0072】前記一般式(A)で示される化合物を始め
とする還元剤の使用量は好ましくは銀1モル当り1×1
0-2〜10モル、特に好ましくは1×10-2〜1.5モ
ルである。The amount of the reducing agent including the compound represented by formula (A) is preferably 1 × 1 per mol of silver.
It is 0 -2 to 10 mol, particularly preferably 1 × 10 -2 to 1.5 mol.
【0073】還元剤は、写真構成層(画像形成層)の1
〜10重量%に範囲で存在することが好ましい。感光材
料が多層構成の場合、還元剤をエマルジョン層以外の層
に加える場合は、わずかに高い割合である約2〜15重
量%がより望ましい傾向がある。The reducing agent is used in one of the photographic constituent layers (image forming layers).
It is preferably present in the range from 10 to 10% by weight. When the light-sensitive material has a multilayer structure, when a reducing agent is added to a layer other than the emulsion layer, a slightly higher ratio of about 2 to 15% by weight tends to be more desirable.
【0074】熱現像感光材料においては広範囲の還元剤
を用いることができ、例えばフェニルアミドオキシム、
2−チエニルアミドオキシムおよびp−フェノキシフェ
ニルアミドオキシムなどのアミドオキシム;例えば4−
ヒドロキシ−3,5−ジメトキシベンズアルデヒドアジ
ンなどのアジン;2,2′−ビス(ヒドロキシメチル)
プロピオニル−β−フェニルヒドラジンとアスコルビン
酸との組合せのような脂肪族カルボン酸アリールヒドラ
ジドとアスコルビン酸との組合せ;ポリヒドロキシベン
ゼンと、ヒドロキシルアミン、レダクトンおよび/また
はヒドラジンの組合せ(例えばヒドロキノンと、ビス
(エトキシエチル)ヒドロキシルアミン、ピペリジノヘ
キソースレダクトンまたはホルミル−4−メチルフェニ
ルヒドラジンの組合せなど);フェニルヒドロキサム
酸、p−ヒドロキシフェニルヒドロキサム酸およびβ−
アリニンヒドロキサム酸などのヒドロキサム酸;アジン
とスルホンアミドフェノールとの組合せ(例えば、フェ
ノチアジンと2,6−ジクロロ−4−ベンゼンスルホン
アミドフェノールなど);エチル−α−シアノ−2−メ
チルフェニルアセテート、エチル−α−シアノフェニル
アセテートなどのα−シアノフェニル酢酸誘導体;2,
2′−ジヒドロキシ−1,1′−ビナフチル、6,6′
−ジブロモ−2,2′−ジヒドロキシ−1,1′−ビナ
フチルおよびビス(2−ヒドロキシ−1−ナフチル)メ
タンに例示されるようなビス−β−ナフトール;ビス−
β−ナフト−ルと1,3−ジヒドロキシベンゼン誘導体
(例えば、2,4−ジヒドロキシベンゾフェノンまたは
2′,4′−ジヒドロキシアセトフェノンなど)の組合
せ;3−メチル−1−フェニル−5−ピラゾロンなどの
5−ピラゾロン;ジメチルアミノヘキソースレダクト
ン、アンヒドロジヒドロアミノヘキソースレダクトンお
よびアンヒドロジヒドロピペリドンヘキソースレダクト
ンに例示されるようなレダクトン;2,6−ジクロロ−
4−ベンゼンスルホンアミドフェノールおよびp−ベン
ゼンスルホンアミドフェノールなどのスルホンアミドフ
ェノール還元剤;2−フェニルインダン−1,3−ジオ
ンなど;2,2−ジメチル−7−t−ブチル−6−ヒド
ロキシクロマンなどのクロマン;2,6−ジメトキシ−
3,5−ジカルボエトキシ−1,4−ジヒドロピリジン
などの1,4−ジヒドロピリジン;ビスフェノール(例
えば、ビス(2−ヒドロキシ−3−t−ブチル−5−メ
チルフェニル)メタン、2,2−ビス(4−ヒドロキシ
−3−メチルフェニル)プロパン、4,4−エチリデン
−ビス(2−t−ブチル−6−メチルフェノール)およ
ビ2,2−ビス(3,5−ジメチル−4−ヒドロキシフ
ェニル)プロパンなど);アスコルビン酸誘導体(例え
ば、パルミチン酸1−アスコルビル、ステアリン酸アス
コルビルなど);ならびにベンジルおよびビアセチルな
どのアルデヒドおよびケトン;3−ピラゾリドンおよび
ある種のインダン−1,3−ジオンを含む。In the photothermographic material, a wide range of reducing agents can be used, for example, phenylamide oxime,
Amide oximes such as 2-thienylamide oxime and p-phenoxyphenylamide oxime;
Azines such as hydroxy-3,5-dimethoxybenzaldehyde azine; 2,2'-bis (hydroxymethyl)
A combination of an aliphatic carboxylic acid arylhydrazide and ascorbic acid such as a combination of propionyl-β-phenylhydrazine and ascorbic acid; a combination of polyhydroxybenzene and hydroxylamine, reductone and / or hydrazine (eg, hydroquinone and bis ( Ethoxyethyl) hydroxylamine, piperidinohexose reductone or a combination of formyl-4-methylphenylhydrazine, etc.); phenylhydroxamic acid, p-hydroxyphenylhydroxamic acid and β-
Hydroxamic acids such as alinine hydroxamic acid; combinations of azine and sulfonamidophenol (eg, phenothiazine and 2,6-dichloro-4-benzenesulfonamidophenol); ethyl-α-cyano-2-methylphenylacetate, ethyl Α-cyanophenylacetic acid derivatives such as -α-cyanophenylacetate;
2'-dihydroxy-1,1'-binaphthyl, 6,6 '
Bis-β-naphthol such as exemplified by dibromo-2,2′-dihydroxy-1,1′-binaphthyl and bis (2-hydroxy-1-naphthyl) methane;
a combination of β-naphthol and a 1,3-dihydroxybenzene derivative (eg, 2,4-dihydroxybenzophenone or 2 ′, 4′-dihydroxyacetophenone); 5 such as 3-methyl-1-phenyl-5-pyrazolone; Pyrazolones; reductones as exemplified by dimethylaminohexose reductone, anhydrodihydroaminohexose reductone and anhydrodihydropiperidone hexose reductone; 2,6-dichloro-
Sulfonamidophenol reducing agents such as 4-benzenesulfonamidophenol and p-benzenesulfonamidophenol; 2-phenylindane-1,3-dione and the like; 2,2-dimethyl-7-t-butyl-6-hydroxychroman and the like 2,6-dimethoxy-
1,4-dihydropyridines such as 3,5-dicarbethoxy-1,4-dihydropyridine; bisphenols (for example, bis (2-hydroxy-3-t-butyl-5-methylphenyl) methane, 2,2-bis ( 4-hydroxy-3-methylphenyl) propane, 4,4-ethylidene-bis (2-t-butyl-6-methylphenol) and bi-2,2-bis (3,5-dimethyl-4-hydroxyphenyl) Ascorbic acid derivatives (e.g., 1-ascorbyl palmitate, ascorbyl stearate, etc.); and aldehydes and ketones such as benzyl and biacetyl; 3-pyrazolidone and certain indane-1,3-diones.
【0075】(バインダー)本発明の熱現像感光材料に
好適なバインダーは透明又は半透明で、一般に無色であ
り、天然ポリマー合成樹脂やポリマー及びコポリマー、
その他フィルムを形成する媒体、例えば:ゼラチン、ア
ラビアゴム、ポリ(ビニルアルコール)、ヒドロキシエ
チルセルロース、セルロースアセテート、セルロースア
セテートブチレート、ポリ(ビニルピロリドン)、カゼ
イン、デンプン、ポリ(アクリル酸)、ポリ(メチルメ
タクリル酸)、ポリ(塩化ビニル)、ポリ(メタクリル
酸)、コポリ(スチレン−無水マレイン酸)、コポリ
(スチレン−アクリロニトリル)、コポリ(スチレン−
ブタジエン)、ポリ(ビニルアセタール)類(例えば、
ポリ(ビニルホルマール)及びポリ(ビニルブチラー
ル))、ポリ(エステル)類、ポリ(ウレタン)類、フ
ェノキシ樹脂、ポリ(塩化ビニリデン)、ポリ(エポキ
シド)類、ポリ(カーボネート)類、ポリ(ビニルアセ
テート)、セルロースエステル類、ポリ(アミド)類が
ある。親水性でも非親水性でもよい。(Binder) Binders suitable for the photothermographic material of the present invention are transparent or translucent, generally colorless, and include natural polymer synthetic resins, polymers and copolymers,
Other film forming media, for example: gelatin, gum arabic, poly (vinyl alcohol), hydroxyethyl cellulose, cellulose acetate, cellulose acetate butyrate, poly (vinyl pyrrolidone), casein, starch, poly (acrylic acid), poly (methyl) (Methacrylic acid), poly (vinyl chloride), poly (methacrylic acid), copoly (styrene-maleic anhydride), copoly (styrene-acrylonitrile), copoly (styrene-
Butadiene), poly (vinyl acetal) s (for example,
Poly (vinyl formal) and poly (vinyl butyral)), poly (ester) s, poly (urethane) s, phenoxy resins, poly (vinylidene chloride), poly (epoxides), poly (carbonates), poly (vinyl acetate) ), Cellulose esters and poly (amides). It may be hydrophilic or non-hydrophilic.
【0076】本発明においては、熱現像後の寸法変動を
防ぐ目的として感光性層のバインダー量が1.5〜10
g/m2であることが好ましい。In the present invention, the amount of the binder in the photosensitive layer is 1.5 to 10 for the purpose of preventing dimensional fluctuation after thermal development.
g / m 2 .
【0077】(その他の添加剤)本発明においては、感
光性層側にマット剤を含有することが好ましく、熱現像
後の画像の傷つき防止のためには、感光材料の表面にマ
ット剤を配することが好ましく、そのマット剤を乳剤層
側の全バインダーに対し、重量比で0.5〜10%含有
することが好ましい。(Other Additives) In the present invention, a matting agent is preferably contained on the photosensitive layer side, and a matting agent is provided on the surface of the photosensitive material in order to prevent the image after thermal development from being damaged. Preferably, the matting agent is contained in a weight ratio of 0.5 to 10% based on all binders on the emulsion layer side.
【0078】本発明において用いられるマット剤の材質
は、有機物及び無機物のいずれでもよい。例えば、無機
物としては、スイス特許第330,158号等に記載の
シリカ、仏国特許第1,296,995号等に記載のガ
ラス粉、英国特許第1,173,181号等に記載のア
ルカリ土類金属又はカドミウム、亜鉛等の炭酸塩、等を
マット剤として用いることができる。The material of the matting agent used in the present invention may be either an organic substance or an inorganic substance. For example, as inorganic substances, silica described in Swiss Patent No. 330,158, glass powder described in French Patent No. 1,296,995, etc., and alkali described in British Patent No. 1,173,181 etc. An earth metal or a carbonate such as cadmium or zinc can be used as a matting agent.
【0079】有機物としては、米国特許第2,322,
037号等に記載の澱粉、ベルギー特許第625,45
1号や英国特許第981,198号等に記載された澱粉
誘導体、特公昭44−3643号等に記載のポリビニル
アルコール、スイス特許第330,158号等に記載の
ポリスチレン或いはポリメタアクリレート、米国特許第
3,079,257号等に記載のポリアクリロニトリ
ル、米国特許第3,022,169号等に記載されたポ
リカーボネートの様な有機マット剤を用いることができ
る。As the organic substance, US Pat. No. 2,322,
037 etc., Belgian Patent No. 625, 45
No. 1 and British Patent Nos. 981, 198, etc., polyvinyl alcohol described in JP-B-44-3643, etc., polystyrene or polymethacrylate described in Swiss Patent No. 330,158, U.S. Pat. Organic matting agents such as polyacrylonitrile described in 3,079,257 and the like and polycarbonate described in U.S. Pat. No. 3,022,169 can be used.
【0080】マット剤の形状は、定形、不定形どちらで
も良いが、好ましくは定形で、球形が好ましく用いられ
る。The shape of the matting agent may be either regular or irregular, but is preferably regular and spherical.
【0081】マット剤の大きさはマット剤の体積を球形
に換算したときの直径で表される。本発明においてマッ
ト剤の粒径とはこの球形換算した直径のことを示すもの
とする。本発明に用いられるマット剤は、平均粒径が
0.5μm〜10μmであることが好ましく、更に好ま
しくは1.0μm〜8.0μmである。又、粒子サイズ
分布の変動係数としては、50%以下であることが好ま
しく、更に好ましくは40%以下であり、特に好ましく
は30%以下である。The size of the matting agent is represented by a diameter when the volume of the matting agent is converted into a spherical shape. In the present invention, the particle diameter of the matting agent indicates the diameter converted into a sphere. The matting agent used in the present invention preferably has an average particle size of 0.5 μm to 10 μm, more preferably 1.0 μm to 8.0 μm. The variation coefficient of the particle size distribution is preferably 50% or less, more preferably 40% or less, and particularly preferably 30% or less.
【0082】ここで、粒子サイズ分布の変動係数は、下
記の式で表される値である。 (粒径の標準偏差)/(粒径の平均値)×100Here, the variation coefficient of the particle size distribution is a value represented by the following equation. (Standard deviation of particle size) / (Average value of particle size) × 100
【0083】本発明に係るマット剤は任意の構成層中に
含むことができるが、本発明の目的を達成するためには
好ましくは感光性層以外の構成層であり、更に好ましく
は支持体から見て最も外側の層である。The matting agent according to the present invention can be contained in any constituent layer, but in order to achieve the object of the present invention, it is preferably a constituent layer other than the photosensitive layer, and more preferably from the support. The outermost layer to look at.
【0084】本発明に係るマット剤の添加方法は、予め
塗布液中に分散させて塗布する方法であってもよいし、
塗布液を塗布した後、乾燥が終了する以前にマット剤を
噴霧する方法を用いてもよい。また複数の種類のマット
剤を添加する場合は、両方の方法を併用してもよい。The method for adding the matting agent according to the present invention may be a method in which the matting agent is dispersed in a coating solution in advance and applied.
A method of spraying a matting agent after the application liquid is applied and before the drying is completed may be used. When a plurality of types of matting agents are added, both methods may be used in combination.
【0085】本発明の熱現像感光材料は常温で安定であ
るが、露光後高温(例えば、80℃〜220℃)に加熱
することにより現像される。加熱することにより有機銀
塩(酸化剤として機能する)と還元剤との間の酸化還元
反応を通じて銀を生成する。この酸化還元反応は露光で
ハロゲン化銀に発生した潜像の触媒作用によって促進さ
れる。露光領域中の有機銀塩の反応によって生成した銀
は黒色画像を提供し、これは非露光領域と対照をなし、
画像の形成がなされる。この反応過程は、外部から水等
の処理液を供給することなしで進行する。The photothermographic material of the present invention is stable at room temperature, but is developed by heating to a high temperature (for example, 80 ° C. to 220 ° C.) after exposure. Heating produces silver through an oxidation-reduction reaction between an organic silver salt (functioning as an oxidizing agent) and a reducing agent. This oxidation-reduction reaction is accelerated by the catalytic action of the latent image generated on the silver halide upon exposure. Silver produced by the reaction of the organic silver salt in the exposed areas provides a black image, which contrasts with the unexposed areas,
An image is formed. This reaction process proceeds without supplying a processing liquid such as water from the outside.
【0086】感光性層に通過する光の量又は波長分布を
制御するために感光性層と同じ側又は反対側にフィルタ
ー層を形成しても良いし、感光性層に染料又は顔料を含
ませても良い。染料としては特願平7−11184号に
記載の化合物が好ましい。In order to control the amount or wavelength distribution of light passing through the photosensitive layer, a filter layer may be formed on the same side as or opposite to the photosensitive layer, or a dye or pigment may be contained in the photosensitive layer. May be. As the dye, the compounds described in Japanese Patent Application No. 7-11184 are preferred.
【0087】前述の成分に加えて、画像を向上させる
「色調剤」として知られる添加剤を含むと有利になるこ
とがある。例えば、色調剤材料は全銀保持成分の0.1
〜10重量%の量で存在してよい。色調剤は、米国特許
第3,080,254号、同第3,847,612号お
よび同第4,123,282号に示されるように、写真
技術において周知の材料である。In some cases, it may be advantageous to include, in addition to the above components, additives known as "toning agents" that enhance the image. For example, the toning material is 0.1% of the total silver holding component.
It may be present in an amount of from 10 to 10% by weight. Toning agents are materials well known in the photographic art, as shown in U.S. Pat. Nos. 3,080,254, 3,847,612 and 4,123,282.
【0088】色調剤の例は、フタルイミドおよびN−ヒ
ドロキシフタルイミド;スクシンイミド、ピラゾリン−
5−オン、ならびにキナゾリノン、3−フェニル−2−
ピラゾリン−5−オン、1−フェニルウラゾール、キナ
ゾリンおよび2,4−チアゾリジンジオンのような環状
イミド;ナフタルイミド(例えば、N−ヒドロキシ−
1,8−ナフタルイミド);コバルト錯体(例えば、コ
バルトヘキサミントリフルオロアセテート);3−メル
カプト−1,2,4−トリアゾール、2,4−ジメルカ
プトピリミジン、3−メルカプト−4,5−ジフェニル
−1,2,4−トリアゾールおよび2,5−ジメルカプ
ト−1,3,4−チアジアゾールに例示されるメルカプ
タン;N−(アミノメチル)アリールジカルボキシイミ
ド、(例えば、(N,N−ジメチルアミノメチル)フタ
ルイミドおよびN,N−(ジメチルアミノメチル)−ナ
フタレン−2,3−ジカルボキシイミド);ならびにブ
ロック化ピラゾール、イソチウロニウム誘導体およびあ
る種の光退色剤(例えば、N,N′−ヘキサメチレンビ
ス(1−カルバモイル−3,5−ジメチルピラゾー
ル)、1,8−(3,6−ジアザオクタン)ビス(イソ
チウロニウムトリフルオロアセテート)および2−トリ
ブロモメチルスルホニル)−(ベンゾチアゾール));
ならびに3−エチル−5〔(3−エチル−2−ベンゾチ
アゾリニリデン)−1−メチルエチリデン〕−2−チオ
−2,4−オキサゾリジンジオン;フタラジン;フタラ
ジノン、フタラジノン誘導体もしくは金属塩、または4
−(1−ナフチル)フタラジノン、6−クロロフタラジ
ノン、5,7−ジメトキシフタラジノンおよび2,3−
ジヒドロ−1,4−フタラジンジオンなどの誘導体;フ
タラジノンとフタル酸誘導体(例えば、フタル酸、4−
メチルフタル酸、4−ニトロフタル酸およびテトラクロ
ロ無水フタル酸など)との組合せ;キナゾリンジオン、
ベンズオキサジンまたはナフトオキサジン誘導体;トー
ン調節剤としてだけでなくその場でハロゲン化銀生成の
ためのハライドイオンの源としても機能するロジウム錯
体、例えばヘキサクロロロジウム(III)酸アンモニウ
ム、臭化ロジウム、硝酸ロジウムおよびヘキサクロロロ
ジウム(III)酸カリウムなど;無機過酸化物および過
硫酸塩、例えば、過酸化二硫化アンモニウムおよび過酸
化水素;1,3 −ベンズオキサジン−2,4−ジオ
ン、8−メチル−1,3−ベンズオキサジン−2,4−
ジオンおよび6−ニトロ−1,3−ベンズオキサジン−
2,4−ジオンなどのベンズオキサジン−2,4−ジオ
ン;ピリミジンおよび不斉−トリアジン(例えば、2,
4−ジヒドロキシピリミジン、2−ヒドロキシ−4−ア
ミノピリミジンなど)、アザウラシル、およびテトラア
ザペンタレン誘導体(例えば、3,6−ジメルカプト−
1,4−ジフェニル−1H,4H−2,3a,5,6a
−テトラアザペンタレン、および1,4−ジ(o−クロ
ロフェニル)−3,6−ジメルカプト−1H,4H−
2,3a,5,6a−テトラアザペンタレンなど)を含
む。Examples of toning agents include phthalimide and N-hydroxyphthalimide; succinimide, pyrazoline-
5-one, and quinazolinone, 3-phenyl-2-
Cyclic imides such as pyrazolin-5-one, 1-phenylurazole, quinazoline and 2,4-thiazolidinedione; naphthalimides (e.g. N-hydroxy-
1,8-naphthalimide); cobalt complex (eg, cobalt hexamine trifluoroacetate); 3-mercapto-1,2,4-triazole, 2,4-dimercaptopyrimidine, 3-mercapto-4,5-diphenyl- Mercaptans exemplified by 1,2,4-triazole and 2,5-dimercapto-1,3,4-thiadiazole; N- (aminomethyl) aryldicarboximides (for example, (N, N-dimethylaminomethyl) Phthalimide and N, N- (dimethylaminomethyl) -naphthalene-2,3-dicarboximide); and blocked pyrazoles, isothiuronium derivatives and certain photobleaching agents such as N, N'-hexamethylenebis (1 -Carbamoyl-3,5-dimethylpyrazole), 1,8- (3, - Jiazaokutan) bis (isothiuronium trifluoroacetate) and 2-tribromomethylsulfonyl) - (benzothiazole));
And 3-ethyl-5 [(3-ethyl-2-benzothiazolinylidene) -1-methylethylidene] -2-thio-2,4-oxazolidinedione; phthalazine; phthalazinone, a phthalazinone derivative or a metal salt, or 4
-(1-naphthyl) phthalazinone, 6-chlorophthalazinone, 5,7-dimethoxyphthalazinone and 2,3-
Derivatives such as dihydro-1,4-phthalazinedione; phthalazinone and phthalic acid derivatives (for example, phthalic acid, 4-
Quinazolinedione, such as methylphthalic acid, 4-nitrophthalic acid and tetrachlorophthalic anhydride;
Benzoxazine or naphthoxazine derivatives; rhodium complexes which function not only as tone modifiers but also in situ as sources of halide ions for silver halide formation, such as ammonium hexachlororhodate (III), rhodium bromide, rhodium nitrate And potassium hexachlororhodate (III); inorganic peroxides and persulfates, such as ammonium disulfide and hydrogen peroxide; 1,3-benzoxazine-2,4-dione, 8-methyl-1, 3-benzoxazine-2,4-
Dione and 6-nitro-1,3-benzoxazine-
Benzoxazine-2,4-diones such as 2,4-dione; pyrimidines and asymmetric-triazines (e.g. 2,2
4-dihydroxypyrimidine, 2-hydroxy-4-aminopyrimidine, etc.), azauracil, and tetraazapentalene derivatives (eg, 3,6-dimercapto-
1,4-diphenyl-1H, 4H-2,3a, 5,6a
-Tetraazapentalene, and 1,4-di (o-chlorophenyl) -3,6-dimercapto-1H, 4H-
2,3a, 5,6a-tetraazapentalene).
【0089】本発明において好ましい色調剤はフタラジ
ノン又はフタラジンであリ、さらにはフタル酸誘導体と
の組み合わせが好ましい。中でもフタラジンと4メチル
フタル酸、テトラクロロフタル酸、テトラクロロフタル
酸無水物の組み合わせが好ましい。In the present invention, a preferable color tone agent is phthalazinone or phthalazine, and a combination with a phthalic acid derivative is more preferable. Among them, a combination of phthalazine and 4-methylphthalic acid, tetrachlorophthalic acid, or tetrachlorophthalic anhydride is preferable.
【0090】本発明の熱現像感光材料中には、かぶり防
止剤が含まれて良い。最も有効なかぶり防止剤として知
られているものは水銀イオンである。感光材料中にかぶ
り防止剤として水銀化合物を使用することについては、
例えば米国特許第3,589,903号に開示されてい
る。The photothermographic material of the present invention may contain an antifoggant. What is known as the most effective antifoggant is mercury ion. Regarding the use of mercury compounds as antifoggants in photosensitive materials,
For example, it is disclosed in U.S. Pat. No. 3,589,903.
【0091】しかし、水銀化合物は環境的に好ましくな
い。非水銀かぶり防止剤としては例えば米国特許第4,
546,075号及び同第4,452,885号及び特
開昭59−57234号に開示されている様なかぶり防
止剤が好ましい。However, mercury compounds are environmentally undesirable. Non-mercury antifoggants include, for example, U.S. Pat.
Preferred are antifoggants such as those disclosed in 546,075 and 4,452,885 and JP-A-59-57234.
【0092】特に好ましい非水銀かぶり防止剤は、米国
特許第3,874,946号及び同第4,756,99
9号に開示されているような化合物、-C(X1)(X2)(X3)
(ここでX1及びX2はハロゲン原子であり、X3は水素又は
ハロゲン原子である)で表される1以上の置換基を備え
たヘテロ環状化合物である。好適なかぶり防止剤の例と
しては、特開平9−90550号段落番号〔0062〕
〜〔0063〕に記載されている化合物等が好ましく用
いられる。Particularly preferred non-mercury antifoggants are US Pat. Nos. 3,874,946 and 4,756,993.
Compound as disclosed in No. 9, -C (X1) (X2) (X3)
(Where X1 and X2 are halogen atoms, and X3 is hydrogen or a halogen atom) and is a heterocyclic compound having one or more substituents. Examples of suitable antifoggants include JP-A-9-90550, paragraph number [0062].
To [0063] are preferably used.
【0093】更に、より好適なかぶり防止剤は米国特許
第5,028,523号及び英国特許出願第92221
383.4号、同第9300147.7号、同第931
1790.1号に開示されている。Further, more suitable antifoggants are disclosed in US Pat. No. 5,028,523 and British Patent Application No. 92221.
No. 383.4, No. 9300147.7, No. 931
No. 1790.1.
【0094】感光性層は複数層にしても良く、また階調
の調節のため感度を高感層/低感層又は低感層/高感層
にしても良い。The photosensitive layer may be composed of a plurality of layers, and the sensitivity may be changed to a high-sensitivity layer / low-sensitivity layer or a low-sensitivity layer / high-sensitivity layer in order to adjust the gradation.
【0095】本発明で用いられる支持体は、現像処理後
に所定の光学濃度を得るため、及び現像処理後の画像の
変形を防ぐために、プラスチックフイルム(例えば、ポ
リエチレンテレフタレート、ポリカーボネート、ポリイ
ミド、ナイロン、セルローストリアセテート、ポリエチ
レンナフタレート)であることが好ましい。The support used in the present invention may be formed of a plastic film (for example, polyethylene terephthalate, polycarbonate, polyimide, nylon, cellulose, etc.) in order to obtain a predetermined optical density after development and to prevent deformation of the image after development. Triacetate, polyethylene naphthalate).
【0096】その中でも好ましい支持体としては、ポリ
エチレンテレフタレート(以下、PETと略す)及びシ
ンジオタクチック構造を有するスチレン系重合体を含む
プラスチック(以下、SPSと略す)の支持体が挙げら
れる。Among them, preferred supports include a support made of polyethylene terephthalate (hereinafter abbreviated as PET) and a plastic (hereinafter abbreviated as SPS) containing a styrene polymer having a syndiotactic structure.
【0097】支持体の厚みとしては50〜300μm程
度が好ましく、より好ましくは70〜180μmであ
る。The thickness of the support is preferably about 50 to 300 μm, more preferably 70 to 180 μm.
【0098】また熱処理したプラスチック支持体を用い
ることもできる。支持体の熱処理とはこれらの支持体を
製膜後、感光性層が塗布されるまでの間に、支持体のガ
ラス転移点より30℃以上高い温度で、好ましくは35
℃以上高い温度で、更に好ましくは40℃以上高い温度
で加熱することである。但し、支持体の融点を超えた温
度で加熱しては本発明の効果は得られない。A plastic support which has been heat-treated can also be used. The heat treatment of the support means that after forming the support and before the photosensitive layer is applied, the temperature is 30 ° C. or more higher than the glass transition point of the support, preferably 35 ° C.
The heating is carried out at a temperature higher by at least 40 ° C, more preferably at a temperature higher by at least 40 ° C. However, the effect of the present invention cannot be obtained by heating at a temperature exceeding the melting point of the support.
【0099】本発明に係る支持体の製膜方法及び下引製
造方法は公知の方法を用いることができるが、好ましく
は、特開平9−50094号の段落〔0030〕〜〔0
070〕に記載された方法を用いることである。As the method for forming a film and the method for producing an undercoat according to the present invention, known methods can be used. Preferably, paragraphs [0030] to [0] of JP-A No. 9-50094 are used.
070].
【0100】本発明においては物性あるいは写真性能の
改良のために感光材料にバッキング層を設けることが好
ましい。本発明のバッキング層の好適なバインダーは透
明又は半透明で、一般に無色であり、天然ポリマー合成
樹脂やポリマー及びコポリマー、その他フィルムを形成
する媒体、例えば:ゼラチン、アラビアゴム、ポリ(ビ
ニルアルコール)、ヒドロキシエチルセルロース、セル
ロースアセテート、セルロースアセテートブチレート、
ポリ(ビニルピロリドン)、カゼイン、デンプン、ポリ
(アクリル酸)、ポリ(メチルメタクリル酸)、ポリ
(塩化ビニル)、ポリ(メタクリル酸)、コポリ(スチ
レン−無水マレイン酸)、コポリ(スチレン−アクリロ
ニトリル)、コポリ(スチレン−ブタジエン)、ポリ
(ビニルアセタール)類(例えば、ポリ(ビニルホルマ
ール)及びポリ(ビニルブチラール))、ポリ(エステ
ル)類、ポリ(ウレタン)類、フェノキシ樹脂、ポリ
(塩化ビニリデン)、ポリ(エポキシド)類、ポリ(カ
ーボネート)類、ポリ(ビニルアセテート)、セルロー
スエステル類、ポリ(アミド)類がある。バインダーは
水又は有機溶媒またはエマルジョンから被覆形成しても
よい。In the present invention, a backing layer is preferably provided on the photosensitive material in order to improve physical properties or photographic performance. Suitable binders for the backing layer of the present invention are transparent or translucent, generally colorless, natural polymer synthetic resins and polymers and copolymers, and other film forming media such as: gelatin, gum arabic, poly (vinyl alcohol), Hydroxyethyl cellulose, cellulose acetate, cellulose acetate butyrate,
Poly (vinylpyrrolidone), casein, starch, poly (acrylic acid), poly (methyl methacrylic acid), poly (vinyl chloride), poly (methacrylic acid), copoly (styrene-maleic anhydride), copoly (styrene-acrylonitrile) , Copoly (styrene-butadiene), poly (vinyl acetal) s (eg, poly (vinyl formal) and poly (vinyl butyral)), poly (esters), poly (urethane) s, phenoxy resins, poly (vinylidene chloride) , Poly (epoxides), poly (carbonates), poly (vinyl acetate), cellulose esters, and poly (amide) s. The binder may be coated from water or an organic solvent or emulsion.
【0101】本発明の熱現像感光材料には種々の助剤が
添加されうる。たとえば、促進剤、アーキュタンス染
料、安定剤、界面活性剤、潤滑剤、被覆助剤、ハロゲン
供給剤、ポリハロゲン化合物やメルカプト化合物等、ロ
イコ染料、キレート剤、可塑剤、紫外線吸収剤及び種々
の他の添加剤が有用に添加されうる。Various auxiliaries can be added to the photothermographic material of the present invention. For example, accelerators, acutance dyes, stabilizers, surfactants, lubricants, coating aids, halogen supply agents, polyhalogen compounds and mercapto compounds, leuco dyes, chelating agents, plasticizers, ultraviolet absorbers and various other Can be usefully added.
【0102】また、その処理方法及び製造方法において
も、公知の各種技術、処理、処方、添加剤とその添加方
法を好ましく適用することができ、各種の添加剤は感光
性層、非感光性層、又はその他の形成層のいずれに添加
しても良い。Also, in the processing method and the production method, various known techniques, treatments, prescriptions, additives and their addition methods can be preferably applied, and the various additives include a photosensitive layer and a non-photosensitive layer. Or any of the other forming layers.
【0103】[0103]
【実施例】以下に実施例を挙げて本発明をさらに詳細に
説明するが、本発明はこれらに限定されるものではな
い。EXAMPLES The present invention will be described in more detail with reference to the following Examples, but it should not be construed that the present invention is limited thereto.
【0104】実施例1 フィルムとして熱現像感光材料フィルムを3種類用意し
た。 摩擦係数が低いフィルム 摩擦係数が高いフィルム 摩擦係数が普通のフィルムExample 1 Three types of photothermographic materials were prepared as films. Film with low coefficient of friction Film with high coefficient of friction Film with normal coefficient of friction
【0105】各フィルムは、ロール状に巻かれた状態に
あり、これを切断し、シート状の熱現像感光材料を得
た。切断する際に、面粗度の異なる刃物で切断した。Each of the films was wound into a roll and cut to obtain a sheet-form photothermographic material. At the time of cutting, cutting was performed with blades having different surface roughness.
【0106】(評価)切断の際に、保護層の膜剥がれに
ついて以下のように測定し、その結果を図3に示す。面
粗度の測定は以下の方法に従った。(Evaluation) At the time of cutting, film peeling of the protective layer was measured as follows, and the result is shown in FIG. The surface roughness was measured according to the following method.
【0107】JIS B 0601−1976の測定法
により測定した。具体的には、断面曲線から基準長さ
0.25mmを抜き取り、その部分の最大高さを、接触
式の表面粗さ計で10μm以下の先端半径のダイヤモン
ドの触針が、被測定面の凹凸を一定速度でたどる時に生
ずる上下動の変位を測定することにより行った。The measurement was carried out according to the measuring method of JIS B 0601-1976. Specifically, a reference length of 0.25 mm is extracted from the cross-sectional curve, and the maximum height of the portion is measured by a contact type surface roughness meter with a diamond stylus having a tip radius of 10 μm or less. Was measured by measuring the displacement of the vertical movement that occurred when following a constant speed.
【0108】また動摩擦係数についても測定し、その結
果を図3に示した。動摩擦係数の測定法は以下の方法に
従った。The dynamic friction coefficient was also measured, and the results are shown in FIG. The dynamic friction coefficient was measured according to the following method.
【0109】(動摩擦係数の測定法)動摩擦係数は以下
の条件で測定し、測定回数は1回毎に別の所を3回測定
した平均値として表す。 荷重:100gf 走査速度:300mm/分 走査板1 SUS製10mm角板(面粗度0.1S) 走査板2 SUS製10mm角板(面粗度0.5S) 測定環境:23℃、48%RH 被測定物は測定前2時間の間上記(4)の環境条件下
で保存してから測定する。(Measurement Method of Dynamic Friction Coefficient) The dynamic friction coefficient was measured under the following conditions, and the number of measurements was expressed as an average value obtained by measuring three times at different points each time. Load: 100 gf Scanning speed: 300 mm / min Scanning plate 1 10 mm square plate made of SUS (surface roughness 0.1 S) Scanning plate 2 10 mm square plate made of SUS (surface roughness 0.5 S) Measurement environment: 23 ° C., 48% RH The object to be measured is stored for 2 hours before the measurement under the environmental condition (4) before measurement.
【0110】(測定結果)図3より、動摩擦係数が0.
2以下の場合に保護層の膜剥がれが生じないことが判っ
た。また面粗度が0.1S以下の場合に、保護層の膜剥
がれが生じないことが判った。(Measurement Results) As shown in FIG.
It was found that when the ratio was 2 or less, film peeling of the protective layer did not occur. It was also found that when the surface roughness was 0.1 S or less, the protective layer did not peel off.
【0111】[0111]
【発明の効果】本発明によれば、切断刃の干渉や耐久性
の問題を解消し、しかも切断時に保護層の膜剥がれが発
生せず、画像カブリの問題の生じないフィルムの切断加
工方法を提供することができる。According to the present invention, there is provided a method for cutting a film which eliminates the problem of interference and durability of the cutting blade, does not cause peeling of the protective layer at the time of cutting, and does not cause the problem of image fogging. Can be provided.
【図1】本発明の一実施の形態を示す要部断面図FIG. 1 is a sectional view of a main part showing an embodiment of the present invention.
【図2】本発明の他の実施の形態を示す斜視図FIG. 2 is a perspective view showing another embodiment of the present invention.
【図3】測定結果を示すグラフFIG. 3 is a graph showing measurement results.
1:上刃 100:上カッタロータ 101:テーパブロック 102:取り付けボルト 103:押しボルト 2:下刃 200:下カッタロータ 201:テーパブロック 202:取り付けボルト 3:駆動モータ 4:駆動伝達シャフト 5:駆動伝達ベルト 6:ドラム軸 1: Upper blade 100: Upper cutter rotor 101: Tapered block 102: Mounting bolt 103: Push bolt 2: Lower blade 200: Lower cutter rotor 201: Tapered block 202: Mounting bolt 3: Drive motor 4: Drive transmission shaft 5: Drive transmission belt 6: Drum shaft
Claims (5)
を有するフィルムを刃先角が50〜70度の刃物で切断
加工するフィルムの切断加工方法において、切断用の刃
物とフィルムの動摩擦係数(下記測定法による)が0.
2以下であることを特徴とするフィルムの切断加工方
法。 (動摩擦係数の測定法)動摩擦係数は以下の条件で測定
し、測定回数は1回毎に別の所を3回測定した平均値と
して表す。 1.荷重:100gf 2.走査速度:300mm/分 3.走査板1 SUS製10mm角板(面粗度0.1S) 走査板2 SUS製10mm角板(面粗度0.5S) 4.測定環境:23℃、48%RH 5.被測定物は測定前2時間の間上記(4)の環境条件下
で保存してから測定する。In a method for cutting a film having at least an image forming layer and a protective layer on a support with a blade having a cutting edge angle of 50 to 70 degrees, a coefficient of dynamic friction between the cutting blade and the film ( According to the following measurement method).
2. A method for cutting a film, wherein the number is 2 or less. (Measurement method of kinetic friction coefficient) The kinetic friction coefficient was measured under the following conditions, and the number of measurements was expressed as an average value obtained by measuring three times in different places each time. 1. Load: 100gf 2. Scanning speed: 300mm / min 3. Scanning plate 1 SUS 10mm square plate (surface roughness 0.1S) Scanning plate 2 SUS 10mm square plate (surface roughness 0.5S) 4. Measurement Environment: 23 ° C., 48% RH 5. The object to be measured is stored under the environmental conditions of the above (4) for 2 hours before measurement and then measured.
−1976の測定法による)が0.05S〜0.1Sで
あることを特徴とする請求項1記載のフィルムの切断加
工方法。2. The surface roughness of the blade (JIS B 0601)
The method for cutting a film according to claim 1, wherein the value of (-1976) is 0.05S to 0.1S.
ィングを施すことを特徴とする請求項1又は2記載のフ
ィルムの切断加工方法。3. The method for cutting a film according to claim 1, wherein a coating for imparting lubricity is applied to the surface of the blade.
を有するフィルムを刃先角が50〜70度の刃物で切断
加工するフィルムの切断加工方法において、切断用の刃
物とフィルムの動摩擦係数(下記測定法による)が0.
2を越える範囲で、該刃物の摩擦力が変動率30%以内
であることを特徴とするフィルムの切断加工方法。 (動摩擦係数の測定法)動摩擦係数は以下の条件で測定
し、測定回数は1回毎に別の所を3回測定した平均値と
して表す。 1.荷重:100gf 2.走査速度:300mm/分 3.走査板1 SUS製10mm角板(面粗度0.1S) 走査板2 SUS製10mm角板(面粗度0.5S) 4.測定環境:23℃、48%RH 5.被測定物は測定前2時間の間上記(4)の環境条件下
で保存してから測定する。4. A method of cutting a film having at least an image forming layer and a protective layer on a support with a blade having a cutting edge angle of 50 to 70 degrees, wherein a coefficient of dynamic friction between the cutting blade and the film ( According to the following measurement method).
2. A method for cutting a film, wherein the frictional force of the blade is within a variation rate of 30% within a range exceeding 2. (Measurement Method of Dynamic Friction Coefficient) The dynamic friction coefficient was measured under the following conditions, and the number of measurements was expressed as an average value obtained by measuring three times at different places each time. 1. Load: 100gf 2. Scanning speed: 300mm / min 3. Scanning plate 1 SUS 10mm square plate (surface roughness 0.1S) Scanning plate 2 SUS 10mm square plate (surface roughness 0.5S) 4. Measurement Environment: 23 ° C., 48% RH 5. The object to be measured is stored under the environmental conditions of (4) above for 2 hours before measurement, and then measured.
ハロゲン化銀、銀イオンの還元剤、及びバインダーを含
有する熱現像感光材料であることを特徴とする請求項
1、2、3又は4記載のフィルムの切断加工方法。5. The photothermographic material according to claim 1, wherein the film contains an organic silver salt, a photosensitive silver halide, a reducing agent for silver ions, and a binder on a support. 5. The method for cutting a film according to 3 or 4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000221441A JP2002036173A (en) | 2000-07-21 | 2000-07-21 | Film cutting work method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000221441A JP2002036173A (en) | 2000-07-21 | 2000-07-21 | Film cutting work method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2002036173A true JP2002036173A (en) | 2002-02-05 |
Family
ID=18715836
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000221441A Pending JP2002036173A (en) | 2000-07-21 | 2000-07-21 | Film cutting work method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002036173A (en) |
-
2000
- 2000-07-21 JP JP2000221441A patent/JP2002036173A/en active Pending
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