JP2001159701A - Electrically conductive antireflection film and glass panel for cathode-ray tube coated with the same - Google Patents
Electrically conductive antireflection film and glass panel for cathode-ray tube coated with the sameInfo
- Publication number
- JP2001159701A JP2001159701A JP2000285833A JP2000285833A JP2001159701A JP 2001159701 A JP2001159701 A JP 2001159701A JP 2000285833 A JP2000285833 A JP 2000285833A JP 2000285833 A JP2000285833 A JP 2000285833A JP 2001159701 A JP2001159701 A JP 2001159701A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- film
- ray tube
- glass panel
- antireflection film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 title claims abstract description 37
- 238000002834 transmittance Methods 0.000 claims abstract description 19
- 229910017052 cobalt Inorganic materials 0.000 claims abstract description 12
- 239000010941 cobalt Substances 0.000 claims abstract description 12
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000758 substrate Substances 0.000 claims abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 7
- 239000001023 inorganic pigment Substances 0.000 claims abstract description 7
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims abstract description 7
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052737 gold Inorganic materials 0.000 claims abstract description 5
- 239000010931 gold Substances 0.000 claims abstract description 5
- 229910052709 silver Inorganic materials 0.000 claims abstract description 5
- 239000004332 silver Substances 0.000 claims abstract description 5
- 238000004040 coloring Methods 0.000 claims description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 2
- 238000010438 heat treatment Methods 0.000 abstract description 19
- 238000007789 sealing Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 60
- 230000004907 flux Effects 0.000 description 10
- 239000010409 thin film Substances 0.000 description 10
- 230000031700 light absorption Effects 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 229910004298 SiO 2 Inorganic materials 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000010419 fine particle Substances 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 5
- 238000004528 spin coating Methods 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 239000005357 flat glass Substances 0.000 description 4
- 229910052749 magnesium Inorganic materials 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052718 tin Inorganic materials 0.000 description 4
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 229910052719 titanium Inorganic materials 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 229910052707 ruthenium Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- KLZUFWVZNOTSEM-UHFFFAOYSA-K Aluminium flouride Chemical compound F[Al](F)F KLZUFWVZNOTSEM-UHFFFAOYSA-K 0.000 description 1
- 229910004261 CaF 2 Inorganic materials 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- 108091005944 Cerulean Proteins 0.000 description 1
- 229910001111 Fine metal Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- QCCDYNYSHILRDG-UHFFFAOYSA-K cerium(3+);trifluoride Chemical compound [F-].[F-].[F-].[Ce+3] QCCDYNYSHILRDG-UHFFFAOYSA-K 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 229910052735 hafnium Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052762 osmium Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000001846 repelling effect Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、導電性反射防止膜と、
それがフェース部の外表面に被覆形成された陰極線管用
ガラスパネルに関するものである。BACKGROUND OF THE INVENTION The present invention relates to a conductive anti-reflection film,
This relates to a glass panel for a cathode ray tube having a coating formed on the outer surface of the face portion.
【0002】[0002]
【従来の技術】従来より、陰極線管には、反射光の低減
やコントラストの向上が要求されており、最近では、帯
電防止や人体に影響を及ぼす電磁波を遮蔽することも求
められるようになってきている。2. Description of the Related Art Conventionally, a cathode ray tube has been required to reduce reflected light and improve contrast, and recently, it has been required to prevent static electricity and shield electromagnetic waves which affect a human body. ing.
【0003】そのため、陰極線管の表示面であるガラス
パネルのフェース部の外表面に導電性反射防止膜を形成
することによって、反射光を低減し、コントラストを向
上し、さらに帯電防止や電磁波遮蔽の機能を付与するこ
とが試みられている。[0003] Therefore, by forming a conductive anti-reflection film on the outer surface of the face portion of the glass panel which is the display surface of the cathode ray tube, the reflected light is reduced, the contrast is improved, and the anti-static and electromagnetic wave shielding are further reduced. Attempts have been made to add functionality.
【0004】例えば、特表平6−510382号には、
基体側から順に、NbNを含む層、TiO2を含む層、
SiO2を含む層からなる導電性反射防止膜が提案さ
れ、また特開平9−156964号には、基体側から順
に、Ti、Zr及びHfから選ばれた金属の酸化物を主
成分とする層、Si又はSiの窒化物を主成分とする
層、SiO2層からなる導電性反射防止膜が提案されて
いる。For example, Japanese Patent Publication No. Hei 6-510382 discloses that
A layer containing NbN, a layer containing TiO 2 ,
A conductive anti-reflection film comprising a layer containing SiO 2 has been proposed. Japanese Patent Application Laid-Open No. 9-156964 discloses a layer mainly composed of a metal oxide selected from Ti, Zr and Hf in order from the substrate side. There has been proposed a conductive anti-reflection film comprising a layer mainly composed of Si, Si or a nitride of Si, and a SiO 2 layer.
【0005】[0005]
【発明が解決しようとする課題】ところで陰極線管用ガ
ラスパネルの光透過率は、陰極線管に映像を映し出した
際の輝度とコントラストに影響する。すなわち、陰極線
管用ガラスパネルの光透過率が高くなるほど、輝度は高
くなるが、コントラストが低下し、逆にガラスパネルの
光透過率が低くなるほど、コントラストは向上するが、
輝度が低下する。The light transmittance of the glass panel for a cathode ray tube affects the brightness and contrast when an image is projected on the cathode ray tube. That is, the higher the light transmittance of the glass panel for a cathode ray tube, the higher the luminance, but the lower the contrast. Conversely, the lower the light transmittance of the glass panel, the higher the contrast,
Brightness decreases.
【0006】近年、フェース部の外表面が平坦な陰極線
管用ガラスパネルが普及しつつあるが、このようなフラ
ットガラスパネルは、所望の機械的強度を得る目的で、
フェース部の内表面の曲率半径が小さくなるように設計
されており、フェース部の中央領域の肉厚に比べて、周
辺領域の肉厚が非常に大きくなっている。In recent years, a glass panel for a cathode ray tube having a flat outer surface of a face portion is becoming widespread. However, such a flat glass panel is intended to obtain a desired mechanical strength.
The radius of curvature of the inner surface of the face portion is designed to be small, and the thickness of the peripheral region is much larger than the thickness of the central region of the face portion.
【0007】従って、このようなフラットガラスパネル
を、光透過率の低いガラスから作製すると、フェース部
の中央部と周辺部の肉厚差による光の透過量の違いが大
きくなり、中央部と周辺部の映像に輝度差が生じること
になる。そのため、ガラスパネルを光透過率の高い(例
えば70%以上)ガラスから作製することによって、そ
の中央領域と周辺領域の透過率差を低減し、さらにフェ
ース部の外表面に着色膜を被覆形成することによって光
透過率を下げ(例えば40〜60%)、コントラストを
向上することが試みられている。Therefore, when such a flat glass panel is made of glass having a low light transmittance, the difference in the amount of light transmission due to the difference in thickness between the central portion and the peripheral portion of the face portion becomes large, and the central portion and the peripheral portion become large. This causes a luminance difference in the video of the part. Therefore, by manufacturing the glass panel from a glass having a high light transmittance (for example, 70% or more), the difference in transmittance between the central region and the peripheral region is reduced, and the outer surface of the face portion is coated with a colored film. Thus, attempts have been made to lower the light transmittance (for example, 40 to 60%) and improve the contrast.
【0008】上記した特表平6−510382号や特開
平9−156964号に開示された導電性反射防止膜
は、導電層としてNbNやTiN等の着色膜が使用さ
れ、このような着色膜を用いて、陰極線管のコントラス
トを向上させるために透過率が50%程度の膜を成膜す
る場合、それぞれ25nm、8nm程度の幾何学的厚み
が必要となるが、抵抗値は十分低くなる。さらにこのよ
うな着色膜に加えてSiO 2を主成分とする層等を積層
し多層膜にすると、各層の干渉作用により表面反射率は
十分に低くなる。[0008] Japanese Patent Application Laid-Open No. Hei 6-510382 and JP-A
Conductive anti-reflection film disclosed in JP-A-9-156964
Used a colored film such as NbN or TiN as the conductive layer.
Using such a colored film, the contrast of the cathode ray tube
A film with a transmittance of about 50% to improve
The geometric thickness of about 25nm and 8nm respectively
Is required, but the resistance value is sufficiently low. This is even more
In addition to colored film TwoLaminated layers etc.
When a multilayer film is used, the surface reflectance is
It will be low enough.
【0009】しかしながらNbN、TiNの着色膜は、
可視光の屈折率が、それぞれ1.3〜1.8、2.5〜
3.7であり、また可視光の吸収係数がそれぞれ1.4
〜2.4、2.1〜3.1であり、強い光吸収性を有し
ているため、これを使用した導電性反射防止膜は、裏面
反射率が高くなるという問題がある。However, the colored films of NbN and TiN are
The refractive index of visible light is 1.3-1.8, 2.5-, respectively.
3.7, and the visible light absorption coefficient was 1.4, respectively.
To 2.4 to 2.1 to 3.1 and have a strong light absorption property, so that the conductive anti-reflection film using this has a problem that the back surface reflectance is high.
【0010】このような裏面反射率の高い導電性反射防
止膜を、光透過率の高いガラスから作製されたフラット
ガラスパネルのフェース部外表面に被覆形成すると、陰
極線管内面の蛍光体の光が導電性反射防止膜の裏面で反
射され、再び陰極線管内面で反射されるので、陰極線管
の表面には蛍光体からの直接光による映像と、反射光に
よる位置がずれた映像とが同時に映し出され、映像が二
重に見えるという欠点を有している。When such a conductive anti-reflection film having a high back reflectance is coated on the outer surface of the face portion of a flat glass panel made of glass having a high light transmittance, the light of the phosphor on the inner surface of the cathode ray tube is formed. Since the light is reflected on the back surface of the conductive anti-reflection film and is again reflected on the inner surface of the cathode ray tube, an image due to the direct light from the phosphor and an image whose position is shifted due to the reflected light are simultaneously projected on the surface of the cathode ray tube. However, there is a disadvantage that the image looks double.
【0011】さらに陰極線管を生産する場合、ガラスパ
ネル上に各種の機能膜を形成した後で、ファンネルとフ
リットシールされ、さらに内部が排気されるが、このよ
うなシール工程や排気工程では400℃以上の熱処理が
施される。ところが上記した従来の導電性反射防止膜
は、この熱処理の前後で反射率や抵抗値が変動しやすい
ため、所期の反射率や電磁波遮蔽能力が得られなくなる
可能性がある。Further, when producing a cathode ray tube, after forming various kinds of functional films on a glass panel, it is frit sealed with a funnel and the inside is evacuated. The above heat treatment is performed. However, in the above-described conventional conductive anti-reflection film, the reflectance and the resistance value tend to fluctuate before and after the heat treatment, so that the desired reflectance and electromagnetic wave shielding ability may not be obtained.
【0012】また特開平11−230863号には、T
iとCuの金属微粒子からなる第1の層と、SiO2か
らなる第2の層から構成される導電性反射防止膜が開示
され、この導電性反射防止膜は、反射低減、コントラス
ト向上、帯電防止性と電磁波遮蔽性について優れた能力
を有しており、裏面反射率も低いが、やはり熱処理によ
って反射率や抵抗値が変動しやすいという問題がある。Japanese Patent Application Laid-Open No. Hei 11-230863 discloses that T
A conductive anti-reflection film composed of a first layer made of metal fine particles of i and Cu and a second layer made of SiO 2 is disclosed. This conductive anti-reflection film reduces reflection, improves contrast, and charges. Although it has excellent ability in prevention and electromagnetic wave shielding, and has low backside reflectance, there is still a problem that the reflectance and the resistance value are easily changed by heat treatment.
【0013】本発明は、上記事情に鑑みなされたもので
あり、反射光の低減とコントラストの向上が図れ、優れ
た帯電防止性と電磁波遮蔽性を付与し、シール工程や排
気工程における熱処理の前後で反射率や抵抗値が変動し
難く、しかも光透過率の高いガラス基体に被覆形成して
も、映像が二重に見えることがない導電性反射防止膜
と、それがフェース部の外表面に被覆形成された陰極線
管用ガラスパネルを提供することを目的とする。[0013] The present invention has been made in view of the above circumstances, and can reduce reflected light and improve contrast, impart excellent antistatic properties and electromagnetic wave shielding properties, and before and after heat treatment in a sealing step and an exhausting step. The reflective anti-reflection film, which does not fluctuate in reflectance and resistance value and has a high light transmittance even when coated on a glass substrate, prevents the image from being seen as a double image. It is an object of the present invention to provide a coated glass panel for a cathode ray tube.
【0014】[0014]
【課題を解決するための手段】本発明の導電性反射防止
膜は、基体上に形成される2つの層を含み、基体側から
順に第1の層、第2の層と呼ぶとき、第1の層は、金、
銀、白金族の元素およびそれらの化合物から選ばれる少
なくとも1種と、コバルト含有無機顔料を含む着色層で
あり、第2の層は、可視光の屈折率が1.3〜1.7の
透明層であることを特徴とする。The conductive antireflection film of the present invention includes two layers formed on a substrate, and when referred to as a first layer and a second layer in this order from the substrate, Layers of gold,
A coloring layer containing at least one selected from silver and platinum group elements and their compounds, and a cobalt-containing inorganic pigment, wherein the second layer is a transparent layer having a visible light refractive index of 1.3 to 1.7. Characterized in that it is a layer.
【0015】また本発明の陰極線管用ガラスパネルは、
導電性反射防止膜がフェース部の外表面に被覆形成さ
れ、フェース部の外表面の平均曲率半径がフェース部中
央を通全放射方向において10000mm以上であり、
肉厚を10.16mmに換算した場合の波長550nm
における光透過率が70%以上のガラスからなり、前記
導電性反射防止膜は、フェース側から順に第1の層、第
2の層と呼ぶとき、第1の層は、金、銀、白金族の元素
およびそれらの化合物から選ばれる少なくとも1種と、
コバルト含有無機顔料を含む着色層であり、第2の層
は、可視光の屈折率が1.3〜1.7の透明層であるこ
とを特徴とする。Further, the glass panel for a cathode ray tube of the present invention comprises:
A conductive anti-reflection film is formed to cover the outer surface of the face portion, and the average radius of curvature of the outer surface of the face portion is 10,000 mm or more in all radial directions through the center of the face portion,
Wavelength 550 nm when the thickness is converted to 10.16 mm
Is made of glass having a light transmittance of 70% or more, and the conductive anti-reflection film is referred to as a first layer and a second layer in this order from the face side. At least one element selected from the group consisting of
It is a colored layer containing a cobalt-containing inorganic pigment, and the second layer is a transparent layer having a visible light refractive index of 1.3 to 1.7.
【0016】[0016]
【作用】本発明における第1の層、すなわち金、銀、白
金族の元素およびそれらの化合物から選ばれる少なくと
も1種と、コバルト含有無機顔料を含む着色層は、屈折
率が1.2〜2.5、可視光の吸収係数が0.05〜
1.0の導電性を備えた光吸収性の低い着色層であり、
膜と基体との密着強度を向上させると共に、第2の層と
の干渉作用により表面反射光を低減したり、裏面反射光
を低減する作用を有している。因みに白金族元素とは、
Ru、Rh、Pd、Os、Ir、Ptの6元素であり、
コバルト含有無機顔料としては、例えばコバルトブルー
(Co,Mg)O・Al2O3、コバルトグリーンCoO
−ZnO,セルリアンブルー2(Co,Mg)O・Sn
O2等が適している。特に第1層として、Ruとコバル
トブルーを含む層を使用することが最も望ましい。その
理由は、Ruは、可視光領域における短波長側の光吸収
が強く、長波長側の光吸収が弱いという特徴を有し、逆
にコバルトブルーは、短波長側の光吸収が弱く、長波長
側の光吸収が強いという特徴を有しており、Ruとコバ
ルトブルーを含む層は、光吸収のバランスが非常に良い
からである。According to the present invention, the first layer, that is, the colored layer containing at least one element selected from the group consisting of gold, silver, and platinum group elements and their compounds, and the cobalt-containing inorganic pigment has a refractive index of 1.2 to 2 times. .5, the absorption coefficient of visible light is 0.05 to
A light-absorbing colored layer having a conductivity of 1.0,
It has the effect of improving the adhesion strength between the film and the base and reducing the surface reflected light and the back surface reflected light by the interference effect with the second layer. By the way, the platinum group element is
Ru, Rh, Pd, Os, Ir, Pt
Examples of the cobalt-containing inorganic pigment include cobalt blue (Co, Mg) O.Al 2 O 3 and cobalt green CoO.
-ZnO, Cerulean Blue 2 (Co, Mg) O.Sn
O 2 and the like are suitable. In particular, it is most desirable to use a layer containing Ru and cobalt blue as the first layer. The reason is that Ru has a feature that light absorption on the short wavelength side in the visible light region is strong and light absorption on the long wavelength side is weak. Conversely, cobalt blue has a weak light absorption on the short wavelength side and a long light absorption. This is because light absorption on the wavelength side is strong, and the layer containing Ru and cobalt blue has a very good light absorption balance.
【0017】この第1の層は、幾何学的厚みを70〜2
50nmにすることが好ましい。すなわち、第1の層の
幾何学的厚みが小さくなりすぎると、表面反射率や裏面
反射率を低減する効果が十分に発揮され難い。特に陰極
線管用ガラスパネルの場合、膜の裏面反射率がガラスの
反射率(4.5%)を超えると、映像が二重に見えやす
くなるが、第1の層の幾何学的厚みが70nm未満で
は、裏面反射率を4.5%以下に抑えることが非常に困
難となる。また、第1層をスピンコート法等のように液
体を利用する方法で成膜する場合、厚みをあまり大きく
することは技術的に困難であり、さらにスパッタリング
法等のように気相を利用する方法で成膜する場合、厚み
を大きくするほど時間がかかり、作業面、コスト面で実
用的でないため、250nmまでに抑えるべきである。
第1層のより好ましい幾何学的厚みは、80〜220n
m、さらに好ましい幾何学的厚みは、85〜200nm
である。This first layer has a geometric thickness of 70 to 2
Preferably, it is 50 nm. That is, if the geometric thickness of the first layer is too small, it is difficult to sufficiently exert the effect of reducing the front surface reflectance and the back surface reflectance. In particular, in the case of a glass panel for a cathode ray tube, if the backside reflectance of the film exceeds the reflectance (4.5%) of the glass, the image is more likely to appear double, but the geometric thickness of the first layer is less than 70 nm. Then, it is very difficult to suppress the back surface reflectance to 4.5% or less. Further, when the first layer is formed by a method using a liquid such as a spin coating method, it is technically difficult to make the thickness too large, and further, a gas phase is used such as a sputtering method. In the case of forming a film by the method, the thicker the film, the longer it takes, and it is not practical in terms of workability and cost.
A more preferred geometric thickness of the first layer is between 80 and 220 n
m, more preferred geometric thickness is 85-200 nm
It is.
【0018】また第2の層は、可視光の屈折率が1.3
〜1.6の透明層であり、第1の層との干渉効果により
表面反射光と裏面反射光を低減する作用を有している。
第2の層の幾何学的厚みとしては、60〜150nmが
適しており、また使用する材料としては、二酸化珪素
(SiO2)、酸化マグネシウム(MgO)、フッ化マ
グネシウム(MgF2)、フッ化カルシウム(Ca
F2)、フッ化セリウム(CaF2)、フッ化アルミニウ
ム(AlF3)、酸化アルミニウム(Al2O3)が適し
ている。特にSiO2を主成分とする層は、可視光の屈
折率が1.4〜1.6の透明層であり、第1の層との干
渉効果により表面反射光と裏面反射光を低減する作用に
優れ、しかも低コストで、成膜の作業性にも優れている
ため好適である。The second layer has a refractive index of visible light of 1.3.
To 1.6, which have an effect of reducing front surface reflected light and back surface reflected light by an interference effect with the first layer.
The geometric thickness of the second layer is preferably 60 to 150 nm, and the materials to be used are silicon dioxide (SiO 2 ), magnesium oxide (MgO), magnesium fluoride (MgF 2 ), and fluoride. Calcium (Ca
F 2 ), cerium fluoride (CaF 2 ), aluminum fluoride (AlF 3 ), and aluminum oxide (Al 2 O 3 ) are suitable. Particularly, the layer mainly composed of SiO 2 is a transparent layer having a visible light refractive index of 1.4 to 1.6, and has an effect of reducing front surface reflected light and back surface reflected light by an interference effect with the first layer. This is preferable because it is excellent in cost, low in cost, and excellent in workability of film formation.
【0019】SiO2を主成分とする層を形成する場
合、(R1)nM(OR2)4-nで示される化合物を主成分
として含有する塗布液を使用すると、実用上高い膜強度
が得られるため好ましい。尚、この式において、R1:
アルキル基、アルケニル基、アリール基、M:Si、R
2:アルキル基であり、n=0又は1である。また必要
に応じて、Ti、Sn、Sb、Al、Ce、Zn等の金
属を含有する酸化物の混合物又は複合酸化物の微粒子、
或いはこれらの金属をMとして用いた前記式に記載の化
合物を添加しても良い。When a layer containing SiO 2 as a main component is formed, using a coating solution containing a compound represented by (R 1 ) n M (OR 2 ) 4-n as a main component, practically high film strength is obtained. Is preferred because In this equation, R 1 :
Alkyl group, alkenyl group, aryl group, M: Si, R
2 : an alkyl group, wherein n = 0 or 1. If necessary, fine particles of a mixture or composite oxide of an oxide containing a metal such as Ti, Sn, Sb, Al, Ce, and Zn;
Alternatively, a compound described in the above formula using these metals as M may be added.
【0020】尚、上記した可視光の吸収係数とは、物体
を透過する前後の光強度の対数比を意味している。記号
を用いて説明すると、物体に吸収される吸収光の放射束
をa、物体に入射する入射光の放射束をi、物体表面で
反射される反射光の放射束をr、物体を透過する透過光
の放射束をtとするとき、a=i−r−tという式が成
り立つ。Lambert−Bouguerの法則によ
り、入射光の放射束iに対する透過光の放射束tの比の
対数は、物体を透過する光の透過距離xに比例するの
で、ln(t/i)=−kxの関係が成り立つ。このと
きの比例係数kを吸収係数という。基板上に薄膜を形成
した場合、薄膜の表面の反射と、基板と薄膜との界面で
の反射とが生じ、これら二つの反射光が干渉するため、
吸収係数kは薄膜の反射率にも影響する。この吸収係数
kが0.05未満であると、薄膜の厚さxが同じ場合、
入射光の放射束iに対して透過光の放射束tが大きくな
り着色性が弱く、コントラストが悪くなる。一方、1.
0を越えると入射光の放射束iに対して透過光の放射束
tが小さくなり着色性が強すぎて薄膜の裏面反射率が大
きくなり、光透過率の高いガラスからなる陰極線管用ガ
ラスパネル上に薄膜を形成すると、陰極線管に映し出さ
れた映像が二重に見えることになる。Note that the above-mentioned visible light absorption coefficient means the logarithmic ratio of the light intensity before and after passing through an object. To explain using symbols, a is the radiant flux of the absorbed light absorbed by the object, i is the radiant flux of the incident light incident on the object, r is the radiant flux of the reflected light reflected on the object surface, and passes through the object. Assuming that the radiant flux of the transmitted light is t, the expression a = i−rt holds. According to Lambert-Bouguer's law, the logarithm of the ratio of the radiant flux t of the transmitted light to the radiant flux i of the incident light is proportional to the transmission distance x of the light passing through the object, so that ln (t / i) = − kx The relationship holds. The proportional coefficient k at this time is called an absorption coefficient. When a thin film is formed on a substrate, reflection at the surface of the thin film and reflection at the interface between the substrate and the thin film occur, and these two reflected lights interfere with each other.
The absorption coefficient k also affects the reflectivity of the thin film. When the absorption coefficient k is less than 0.05, when the thickness x of the thin film is the same,
The radiant flux t of the transmitted light is larger than the radiant flux i of the incident light, the coloring property is weak, and the contrast is poor. On the other hand, 1.
If it exceeds 0, the radiant flux t of the transmitted light becomes smaller than the radiant flux i of the incident light, the coloring property is too strong, the backside reflectance of the thin film increases, and the glass panel for a cathode ray tube made of glass having a high light transmittance. If a thin film is formed on the CRT, the image projected on the cathode ray tube will appear double.
【0021】また幾何学的厚みとは、λ/4等の光学的
厚みと区別するもので、波長に依存しない厚みを意味す
るものである。The geometric thickness is to be distinguished from an optical thickness such as λ / 4 and means a thickness independent of wavelength.
【0022】さらに本発明においては、基体と第1の層
との間に、可視光の屈折率が1.7以下の下地層を介在
させることが好ましい。つまり基体上に第1の層を直接
形成すると、基体上に残存する微小な異物や有機物等の
付着物に起因して、第1の層を構成する金属微粒子や顔
料微粒子が凝集したり、はじきやすくなり、膜ムラや黒
色シミ等の欠点を誘発することがあるが、両者間に下地
層を介在させると、第1の層の金属微粒子や顔料微粒子
の凝集やはじきが著しく減少する。Further, in the present invention, it is preferable that an underlayer having a refractive index of visible light of 1.7 or less is interposed between the base and the first layer. In other words, when the first layer is directly formed on the base, fine metal particles and pigment fine particles constituting the first layer are aggregated or repelled due to minute foreign matters or attached substances such as organic substances remaining on the base. However, when a base layer is interposed between the two, aggregation and repelling of metal fine particles and pigment fine particles in the first layer are significantly reduced.
【0023】この下地層は、第1、2の層による導電性
反射防止膜の各特性を低下させないように、可視光の屈
折率を1.7以下としてあり、その材料としては、透明
性に優れ、高強度で、安価であるという理由から、Si
O2や、Siと、Ti、Sn、Sb、Al、Zr、C
e、Zn等の金属酸化物との混合物又は複合酸化物から
なる透明層が適しており、均一な膜を形成するために
は、前記した(R1)nM(OR2)4-nの式で示される化
合物を主成分として含有する塗布液を使用することが望
ましい。This underlayer has a refractive index of visible light of 1.7 or less so as not to degrade each property of the conductive anti-reflection film formed by the first and second layers. Excellent, high strength and low cost, Si
O 2 , Si, Ti, Sn, Sb, Al, Zr, C
A transparent layer made of a mixture or a composite oxide with a metal oxide such as e or Zn is suitable. In order to form a uniform film, the above-mentioned (R 1 ) n M (OR 2 ) 4-n It is desirable to use a coating solution containing the compound represented by the formula as a main component.
【0024】また、この下地層の膜厚は、あまり大きす
ぎると、表面反射率や裏面反射率が高くなり、また熱処
理後に膜剥がれを起こす虞れがあるため、1〜200n
mの幾何学的厚みとすることが好ましい。On the other hand, if the thickness of the underlayer is too large, the surface reflectance and the back surface reflectance increase, and the film may be peeled off after the heat treatment.
Preferably, the geometric thickness is m.
【0025】尚、本発明においては、上記した2つ又は
3つの層に加えて、必要に応じて膜の密着性を向上させ
たり、色調を調整する目的で、付加的な薄膜層を適宜設
けることも可能である。In the present invention, in addition to the above two or three layers, if necessary, an additional thin film layer is appropriately provided for the purpose of improving the adhesion of the film or adjusting the color tone. It is also possible.
【0026】本発明の導電性反射防止膜の成膜方法とし
ては、一般的な薄膜形成手段が使用できる。例えばスピ
ンコート法、スプレーコート法、スパッタリング法、真
空蒸着法、CVD法、ゾルゲル法等が適用可能である
が、厚みの大きい薄膜(例えば幾何学的厚みが100n
m程度)を比較的安価に作製できるという理由からスピ
ンコート法が最も適している。As a method for forming the conductive antireflection film of the present invention, a general thin film forming means can be used. For example, a spin coating method, a spray coating method, a sputtering method, a vacuum evaporation method, a CVD method, a sol-gel method and the like can be applied, but a thin film having a large thickness (for example, a
m) is most suitable for the spin coating method because it can be manufactured relatively inexpensively.
【0027】また本発明の導電性反射防止膜を成膜する
場合、各層毎に塗布、乾燥、熱処理工程を繰り返しても
良いし、各層を順次塗布、乾燥した後、一括して熱処理
しても良い。さらに3層膜の場合は、下地層と第1の層
を順次塗布、乾燥させた後、熱処理し、さらに第2の層
を塗布、乾燥、熱処理しても良いし、下地層を塗布、乾
燥、熱処理した後、第1と第2の層を塗布、乾燥した
後、一括して熱処理しても良い。この熱処理の温度は、
塗布液中の溶媒の除去や陰極線管用パネルガラスへの形
成を考慮すると、200〜500℃が好適である。When the conductive anti-reflection film of the present invention is formed, the coating, drying and heat treatment steps may be repeated for each layer, or the layers may be sequentially coated and dried and then heat-treated collectively. good. In the case of a three-layer film, the base layer and the first layer may be sequentially applied and dried, and then heat-treated, and then the second layer may be applied, dried and heat-treated, or the base layer may be applied and dried. After the heat treatment, the first and second layers may be applied and dried, and then the heat treatment may be performed at once. The temperature of this heat treatment is
Considering the removal of the solvent from the coating solution and the formation on the panel glass for a cathode ray tube, the temperature is preferably 200 to 500 ° C.
【0028】[0028]
【実施例】以下、本発明を実施例及び比較例に基づいて
詳細に説明する。The present invention will be described below in detail based on examples and comparative examples.
【0029】表1〜5は、実施例と比較例の導電性反射
防止膜を構成する各層の材料と、幾何学的厚みを示すも
のである。Tables 1 to 5 show the material of each layer constituting the conductive antireflection films of the examples and comparative examples, and the geometric thickness.
【0030】[0030]
【表1】 [Table 1]
【0031】[0031]
【表2】 [Table 2]
【0032】[0032]
【表3】 [Table 3]
【0033】[0033]
【表4】 [Table 4]
【0034】[0034]
【表5】 [Table 5]
【0035】表中の実施例1〜8と比較例2の導電性反
射防止膜の作製方法は次のとおりである。まずフェース
部の外表面の平均曲率半径の最小値(フェース部中央を
通る全放射方向において)が50000mmで、肉厚を
10.16mmに換算した場合の波長550nmにおけ
る光透過率が80%のガラスからなる陰極線管用ガラス
パネル(21インチサイズ)を準備した。次いで各層の
所定の分量の膜材料を含む溶液を準備し、ガラスパネル
のフェース部の外表面に対し、周知のスピンコート法を
用いて順次各層の膜材料を塗布、乾燥してから、450
℃、30分間で熱処理した。The methods for producing the conductive antireflection films of Examples 1 to 8 and Comparative Example 2 in the table are as follows. First, glass having a minimum value of the average radius of curvature of the outer surface of the face portion (in all radiation directions passing through the center of the face portion) of 50,000 mm and a light transmittance of 80% at a wavelength of 550 nm when the thickness is converted to 10.16 mm. (A 21-inch size) was prepared. Next, a solution containing a predetermined amount of the film material of each layer is prepared, and the film material of each layer is sequentially applied to the outer surface of the face portion of the glass panel using a well-known spin coating method and dried, and then 450
Heat treatment was performed at 30 ° C. for 30 minutes.
【0036】また比較例1の導電性反射防止膜は、上記
と同じ陰極線管用ガラスパネルのフェース部の外表面に
マグネトロンスパッタ装置を用いて各層を順番に成膜し
た。The conductive antireflection film of Comparative Example 1 was formed on the outer surface of the face portion of the same glass panel for a cathode ray tube by using a magnetron sputtering apparatus in order to form each layer.
【0037】因みに、上記の膜は、波長550nmにお
ける総合透過率(膜とガラスの透過率の和)が50%と
なるように調整したものであり、Ru+(Co,Mg)
O・Al2O3の層は、Ruと(Co,Mg)O・Al2
O3の比率を変えることによって、その厚みを調整し
た。Incidentally, the above film was adjusted so that the total transmittance (sum of the transmittance of the film and glass) at a wavelength of 550 nm was 50%, and Ru + (Co, Mg) was used.
The layer of O.Al 2 O 3 is made of Ru and (Co, Mg) O.Al 2
The thickness was adjusted by changing the ratio of O 3 .
【0038】こうして得られた実施例と比較例の膜付き
陰極線管用ガラスパネルを箱型電気炉に入れ、450
℃、60分間の熱処理を行い、熱処理前後の波長550
nmにおける表面反射率と抵抗値、熱処理後の裏面反射
率を測定すると共に膜ムラ発生率と黒シミ総個数を調
べ、その結果を表6、7に示した。The thus obtained glass panels for a cathode ray tube with a film of the example and the comparative example were placed in a box-type electric furnace, and 450
C., heat treatment for 60 minutes, wavelength 550 before and after heat treatment
The surface reflectance and resistance value in nm and the rear surface reflectance after heat treatment were measured, and the film unevenness occurrence rate and the total number of black spots were examined. The results are shown in Tables 6 and 7.
【0039】[0039]
【表6】 [Table 6]
【0040】[0040]
【表7】 [Table 7]
【0041】表6、7から明らかなように、実施例1〜
8の膜は、熱処理前と熱処理後の表面反射率の変動が小
さく、抵抗値の変動も小さかった。また裏面反射率が、
ガラスの反射率(4.5%)より低いため、陰極線管の
映像が二重に見えることがないと推察される。尚、下地
層を有する実施例5〜8の膜は、下地層を有さない実施
例1〜4の膜に比べて、膜ムラ発生率が少なく、黒シミ
数も少なかった。As is clear from Tables 6 and 7, Examples 1 to
In the film No. 8, the change in the surface reflectance before and after the heat treatment was small, and the change in the resistance value was also small. Also, the backside reflectance is
Since the reflectance is lower than that of glass (4.5%), it is assumed that the image of the cathode ray tube does not appear double. Incidentally, the films of Examples 5 to 8 having the underlayer had a lower film unevenness occurrence rate and a smaller number of black spots than the films of Examples 1 to 4 having no underlayer.
【0042】それに対し、比較例1の膜は、熱処理前後
の表面反射率と抵抗値の変動が大きく、しかも裏面反射
率が高かった。また比較例2の膜は、熱処理前後の表面
反射率と抵抗値の変動が大きかった。On the other hand, the film of Comparative Example 1 had large fluctuations in the surface reflectance and resistance before and after the heat treatment, and had a high back surface reflectance. In the film of Comparative Example 2, the surface reflectance and the resistance value before and after the heat treatment varied greatly.
【0043】尚、表中の表面反射率は、瞬間マルチ反射
率測定器を用いて15°正反射を測定したものである。
また抵抗値は、ガラスパネルのフェース部の短辺両側の
中央部に超音波ハンダで電極を取り付け、電極間の抵抗
をテスターで測定したものである。さらに裏面反射率
は、瞬間マルチ反射率測定器を用い、ガラスの反射率と
吸収率を考慮して求めたものである。また膜ムラ発生率
と黒シミ総個数は、各試料を10ケ毎作製し、透過光検
査により第1層の膜ムラが発生した試料数と、黒シミの
総個数を目視で確認して求めた。The surface reflectivity in the table is obtained by measuring 15 ° regular reflection using an instantaneous multi-reflectometer.
The resistance value is obtained by measuring the resistance between the electrodes with a tester by attaching electrodes to the center of both sides of the short side of the face portion of the glass panel with an ultrasonic solder. Further, the back surface reflectance is obtained by using an instantaneous multi-reflectance measuring device in consideration of the reflectance and absorptance of glass. Further, the film unevenness occurrence rate and the total number of black spots were determined by visually confirming the number of samples in which film unevenness of the first layer occurred and the total number of black spots by a transmitted light inspection by preparing 10 samples. Was.
【0044】[0044]
【発明の効果】以上のように本発明の導電性反射防止膜
は、反射光の低減、コントラストの向上、帯電防止及び
電磁波遮蔽について優れた能力を有し、400℃以上の
熱処理を施す前後の反射率や抵抗値の変動が小さく、し
かも光透過率の高い陰極線管用ガラスパネルのフェース
部外表面に被覆形成しても、裏面反射率が低いため、映
像が二重に見えることがなく、特にフェース部外表面が
平坦な陰極線管用フラットガラスパネルに成膜される導
電性反射防止膜として好適である。As described above, the conductive anti-reflection film of the present invention has excellent ability to reduce reflected light, improve contrast, prevent static charge and shield electromagnetic waves, and before and after heat treatment at 400 ° C. or more. Even if the reflectance or resistance value fluctuates little and the outer surface of the face part of the glass panel for a cathode ray tube with high light transmittance is coated, the backside reflectance is low, so that the image does not look double, especially It is suitable as a conductive antireflection film formed on a flat glass panel for a cathode ray tube having a flat outer surface of a face portion.
【0045】また本発明の導電性反射防止膜は、スピン
コート法によって成膜でき、しかも膜総数が基本的に2
層でありながら所期の特性が得られるため、安価に作製
することができ、陰極線管以外にも、成膜後に高温の熱
処理が施される液晶ディスプレイ基板やプラズマディス
プレイ基板等の各種ディスプレイに適用できる。The conductive antireflection film of the present invention can be formed by a spin coating method, and the total number of films is basically two.
The desired characteristics can be obtained even though it is a layer, so it can be manufactured at a low cost and can be applied to various displays such as liquid crystal display substrates and plasma display substrates, which are subjected to high-temperature heat treatment after film formation, in addition to cathode ray tubes. it can.
【0046】さらに基体と第1の層との間に、可視光の
屈折率が1.7以下の下地層を介在させることによっ
て、導電性反射防止特性を低下させることなく、第1の
着色層の膜ムラや黒シミ等の発生を抑えることが可能で
ある。Further, by interposing an underlayer having a visible light refractive index of 1.7 or less between the substrate and the first layer, the first colored layer can be formed without deteriorating the conductive antireflection characteristics. It is possible to suppress the occurrence of film unevenness and black spots.
【0047】また本発明の陰極線管用ガラスパネルは、
フェース部の外表面の平均曲率半径がフェース部中央を
通る全放射方向において10000mm以上のフラット
パネルであるが、肉厚を10.16mmに換算した場合
の波長550nmにおける光透過率が70%以上のガラ
スからなるため、フェース部の中央部と周辺部の輝度差
が小さく、またフェース部の外表面に上記した導電性反
射防止膜が被覆形成されてなるため、表面反射率が低
く、コントラストが高く、優れた帯電防止性と電磁波遮
蔽性を有し、しかも裏面反射率が低いため、映像が二重
に見えることのない陰極線管を得ることが可能となる。Further, the glass panel for a cathode ray tube of the present invention comprises:
The flat panel has an average radius of curvature of the outer surface of the face portion of 10,000 mm or more in all radial directions passing through the center of the face portion, but has a light transmittance of 70% or more at a wavelength of 550 nm when the thickness is converted to 10.16 mm. Since it is made of glass, the difference in luminance between the central part and the peripheral part of the face part is small, and since the above-mentioned conductive antireflection film is formed by coating the outer surface of the face part, the surface reflectance is low and the contrast is high. Since it has excellent antistatic properties and electromagnetic wave shielding properties and has a low back surface reflectance, it is possible to obtain a cathode ray tube in which an image does not appear double.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C03C 17/36 G09F 9/00 309A G09F 9/00 309 313 313 H01J 29/88 H01J 29/88 G02B 1/10 A (72)発明者 江田 道治 滋賀県大津市晴嵐2丁目7番1号 日本電 気硝子株式会社内 (72)発明者 伊藤 茂嘉 滋賀県大津市晴嵐2丁目7番1号 日本電 気硝子株式会社内 (72)発明者 木戸 政信 滋賀県大津市晴嵐2丁目7番1号 日本電 気硝子株式会社内──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C03C 17/36 G09F 9/00 309A G09F 9/00 309 313 313 H01J 29/88 H01J 29/88 G02B 1 / 10 A (72) Inventor Michiharu Eda 2-7-1, Hararashi, Otsu-shi, Shiga Prefecture Inside Nippon Electric Glass Co., Ltd. (72) Inventor Shigeyoshi Ito 2-7-1, Hararashi, Otsu-shi, Shiga Prefecture Nippon Electric Glass (72) Inventor Masanobu Kido 2-7-1 Hararashi, Otsu City, Shiga Prefecture Nippon Electric Glass Co., Ltd.
Claims (4)
体側から順に第1の層、第2の層と呼ぶとき、第1の層
は、金、銀、白金族の元素およびそれらの化合物から選
ばれる少なくとも1種と、コバルト含有無機顔料を含む
着色層であり、第2の層は、可視光の屈折率が1.3〜
1.6の透明層であることを特徴とする導電性反射防止
膜。The present invention includes two layers formed on a substrate, and when referred to as a first layer and a second layer in this order from the substrate side, the first layer is composed of gold, silver, platinum group elements and their elements. And a coloring layer containing a cobalt-containing inorganic pigment, and the second layer has a refractive index of visible light of 1.3 to 1.3.
1.6. A conductive antireflection film, which is a transparent layer.
率が1.7以下の下地層が介在してなることを特徴とす
る請求項1記載の導電性反射防止膜。2. The conductive anti-reflection film according to claim 1, wherein a base layer having a refractive index of visible light of 1.7 or less is interposed between the base and the first layer.
に被覆形成され、フェース部の外表面の平均曲率半径が
フェース部中央を通る全放射方向において10000m
m以上であり、肉厚を10.16mmに換算した場合の
波長550nmにおける光透過率が70%以上のガラス
からなり、前記導電性反射防止膜は、フェース側から順
に第1の層、第2の層と呼ぶとき、第1の層は、金、
銀、白金族の元素およびそれらの化合物から選ばれる少
なくとも1種と、コバルト含有無機顔料を含む着色層で
あり、第2の層は、可視光の屈折率が1.3〜1.6の
透明層であることを特徴とする陰極線管用ガラスパネ
ル。3. A conductive anti-reflection film is formed on the outer surface of the face portion so that the average radius of curvature of the outer surface of the face portion is 10,000 m in all radial directions passing through the center of the face portion.
m, and the glass has a light transmittance of 70% or more at a wavelength of 550 nm when the thickness is converted to 10.16 mm. The conductive antireflection film includes a first layer, a second layer, The first layer is gold,
A colored layer containing at least one element selected from silver, platinum group elements and their compounds, and a cobalt-containing inorganic pigment, and the second layer is a transparent layer having a refractive index of visible light of 1.3 to 1.6. A glass panel for a cathode ray tube, which is a layer.
率が1.7以下の下地層が介在してなることを特徴とす
る請求項3記載の陰極線管用ガラスパネル。4. The glass panel for a cathode ray tube according to claim 3, wherein a base layer having a refractive index of visible light of 1.7 or less is interposed between the base and the first layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000285833A JP2001159701A (en) | 1999-09-22 | 2000-09-20 | Electrically conductive antireflection film and glass panel for cathode-ray tube coated with the same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26839099 | 1999-09-22 | ||
| JP11-268390 | 1999-09-22 | ||
| JP2000285833A JP2001159701A (en) | 1999-09-22 | 2000-09-20 | Electrically conductive antireflection film and glass panel for cathode-ray tube coated with the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2001159701A true JP2001159701A (en) | 2001-06-12 |
Family
ID=26548290
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000285833A Pending JP2001159701A (en) | 1999-09-22 | 2000-09-20 | Electrically conductive antireflection film and glass panel for cathode-ray tube coated with the same |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001159701A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016504260A (en) * | 2012-11-30 | 2016-02-12 | コーニング インコーポレイテッド | Anti-reflection glass article and method for producing and using the same |
-
2000
- 2000-09-20 JP JP2000285833A patent/JP2001159701A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2016504260A (en) * | 2012-11-30 | 2016-02-12 | コーニング インコーポレイテッド | Anti-reflection glass article and method for producing and using the same |
| JP2018165245A (en) * | 2012-11-30 | 2018-10-25 | コーニング インコーポレイテッド | Reduced reflection glass articles and methods for making and using the same |
| US10961147B2 (en) | 2012-11-30 | 2021-03-30 | Corning Incorporated | Reduced reflection glass articles and methods for making and using same |
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