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JP2001024001A - Method of manufacturing resin-encapsulated semiconductor device and lead frame - Google Patents

Method of manufacturing resin-encapsulated semiconductor device and lead frame

Info

Publication number
JP2001024001A
JP2001024001A JP11197561A JP19756199A JP2001024001A JP 2001024001 A JP2001024001 A JP 2001024001A JP 11197561 A JP11197561 A JP 11197561A JP 19756199 A JP19756199 A JP 19756199A JP 2001024001 A JP2001024001 A JP 2001024001A
Authority
JP
Japan
Prior art keywords
resin
lead frame
molded product
sealing
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11197561A
Other languages
Japanese (ja)
Other versions
JP4205260B2 (en
Inventor
Katsuki Uchiumi
勝喜 内海
Yukio Yamaguchi
幸雄 山口
Takahiro Matsuo
隆広 松尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electronics Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electronics Corp, Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electronics Corp
Priority to JP19756199A priority Critical patent/JP4205260B2/en
Publication of JP2001024001A publication Critical patent/JP2001024001A/en
Application granted granted Critical
Publication of JP4205260B2 publication Critical patent/JP4205260B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H10W72/0198
    • H10W72/884
    • H10W74/00
    • H10W90/736
    • H10W90/756

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

(57)【要約】 【課題】切断工程での成形品反り矯正時の成形品内部応
力を小さくでき生産性が高く安価で品質の良い樹脂封止
型半導体装置の製造方法とリードフレームを提供する。 【解決手段】複数のチップ搭載領域Rcpの外周部に開
口部10を備えたリードフレーム4を準備し、半導体チ
ップ2の電極パッドと信号接続用端子1を電気的に接続
し、封止用金型15のキャビティ凹部に対向する金型面
とリードフレーム4の裏面との間に封止シート6を介在
させ、キャビティ凹部14に被成形品20をセットして
樹脂7を充填し、リードフレーム4の開口部10まで封
止し、封止シート6を剥し、成形品を加圧しながら樹脂
を加熱硬化させ、成形品を切断する。
(57) [Problem] To provide a manufacturing method and a lead frame of a resin-encapsulated semiconductor device with high productivity, low cost, and high quality which can reduce the internal stress of a molded product at the time of correcting the warpage of the molded product in a cutting process, and have high productivity. . A lead frame (4) having an opening (10) on the outer periphery of a plurality of chip mounting regions (Rcp) is prepared, and electrode pads of a semiconductor chip (2) and signal connection terminals (1) are electrically connected to each other. The sealing sheet 6 is interposed between the mold surface facing the cavity recess of the mold 15 and the back surface of the lead frame 4, the molded product 20 is set in the cavity recess 14, and the resin 7 is filled therein. , The sealing sheet 6 is peeled off, the resin is heated and cured while pressing the molded product, and the molded product is cut.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体素子を搭載
したリードフレームの外囲い、特に半導体素子が搭載さ
れた面を封止樹脂で封止し、底面に外部電極を露出させ
た樹脂封止型半導体装置の製造方法とその製造方法に適
したリードフレームに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resin encapsulation in which an outer periphery of a lead frame on which a semiconductor element is mounted, in particular, a surface on which the semiconductor element is mounted is sealed with a sealing resin and an external electrode is exposed on a bottom surface. The present invention relates to a method for manufacturing a semiconductor device and a lead frame suitable for the method.

【0002】[0002]

【従来の技術】近年、電子機器の小型化に対応するため
に、半導体部品の高密度実装がますます要求されてきて
おり、これに伴なって半導体装置の小型化及び薄型化が
進展している。さらに、生産コスト、生産性向上のため
に種々の工夫がなされている。
2. Description of the Related Art In recent years, there has been an increasing demand for high-density mounting of semiconductor components in order to cope with miniaturization of electronic equipment. As a result, semiconductor devices have become smaller and thinner. I have. Further, various measures have been taken to improve production cost and productivity.

【0003】以下、従来の樹脂封止型半導体装置の製造
方法について説明する。図5は従来の樹脂封止型半導体
装置の製造工程を示す断面図である。
Hereinafter, a method for manufacturing a conventional resin-encapsulated semiconductor device will be described. FIG. 5 is a sectional view showing a manufacturing process of a conventional resin-encapsulated semiconductor device.

【0004】まず、図5(a)に示す工程で、信号接続
用端子101(101a、101b)、ダイパッド10
3を複数有するリードフレーム104を用意する。な
お、図中、ダイパッド103は吊りリードによって支持
されているものであるが、吊りリードの図示は省略して
いる。また、吊りリードにはディプレス部が形成され、
ダイパッド103はアップセットされている。なお、こ
のリードフレーム104には、樹脂封止の際、封止樹脂
の流出を止めるタイバーが設けられていない。
First, in the step shown in FIG. 5A, the signal connection terminals 101 (101a, 101b) and the die pad 10
3 to prepare a lead frame 104 having a plurality of. Although the die pad 103 is supported by suspension leads in the drawing, illustration of the suspension leads is omitted. Also, a depressed part is formed on the suspension lead,
The die pad 103 is upset. It should be noted that the lead frame 104 is not provided with a tie bar for stopping the outflow of the sealing resin during resin sealing.

【0005】次に、図5(b)に示す工程で、用意した
リードフレーム104のダイパッド103の上に半導体
チップ102を接着剤により接合する。この工程は、い
わゆるダイボンド工程である。
Next, in a step shown in FIG. 5B, the semiconductor chip 102 is bonded onto the die pad 103 of the prepared lead frame 104 with an adhesive. This step is a so-called die bonding step.

【0006】そして、図5(c)に示す工程で、ダイパ
ッド103上に接合された半導体チップ102と信号接
続用端子101とを金属細線105により電気的に接続
する。この工程は、いわゆるワイヤーボンド工程であ
る。金属細線105には、アルミニウム細線または金
(Au)線などが適宜用いられる。
Then, in a step shown in FIG. 5C, the semiconductor chip 102 bonded on the die pad 103 and the signal connection terminal 101 are electrically connected by the thin metal wire 105. This step is a so-called wire bonding step. As the thin metal wire 105, an aluminum thin wire, a gold (Au) wire, or the like is appropriately used.

【0007】次に、図5(d)に示す工程で、ダイパッ
ド103、半導体チップ102、信号接続用端子10
1、吊りリード及び金属細線105を封止樹脂107に
より封止する。この場合、半導体チップ102が接合さ
れたリードフレーム104が封止金型内に収納されて、
トランスファモールドされるが、特に信号接続用端子1
01の裏面が封止金型の上金型または下金型に接触した
状態で、樹脂封止が行われる。
Next, in a step shown in FIG. 5D, the die pad 103, the semiconductor chip 102, the signal connection terminal 10
1. The suspension leads and the thin metal wires 105 are sealed with the sealing resin 107. In this case, the lead frame 104 to which the semiconductor chip 102 is bonded is housed in a sealing mold,
Transfer molded, especially signal connection terminal 1
Resin sealing is performed in a state where the back surface of the seal No. 01 is in contact with the upper mold or the lower mold of the sealing mold.

【0008】そして、樹脂封止した成形品106を封止
金型から取出し、図5(e)に示す工程で硬化炉108
に入れ、所定の加熱処理を行い、樹脂を完全に硬化させ
る。この工程はいわゆるポストキュア工程である。最後
に、図5(f)に示す工程で信号接続用端子101、ま
た封止樹脂107を切断し、個々の樹脂封止型半導体装
置を得る。
[0008] Then, the molded article 106 sealed with the resin is taken out of the sealing mold, and is cured in a curing furnace 108 in a step shown in FIG.
And a predetermined heat treatment is performed to completely cure the resin. This step is a so-called post cure step. Finally, in the step shown in FIG. 5F, the signal connection terminals 101 and the sealing resin 107 are cut to obtain individual resin-sealed semiconductor devices.

【0009】そして、従来の樹脂封止型半導体装置の製
造方法では、封止工程で封止金型より取出した成形品1
06は金型温度から常温に温度低下し、封止樹脂107
とリードフレーム104との熱収縮差により図5(d)
に示すようにA1だけ反る。さらに、ポストキュア工程
では、常温からポストキュア温度まで温度上昇し、封止
樹脂107とリードフレーム104との熱膨張差で図5
(e)に示すようにA2だけ反り、最終的に、図5
(f)に示す切断工程では通常常温で行うため、成形品
はA量反る(図示せず)。従って切断工程ではA量反って
いる成形品を矯正しながら、個々の樹脂封止型半導体装
置に分断している。また、封止工程で、封止樹脂107
が信号接続用端子101の裏面側に回り込んで、樹脂バ
リ(樹脂はみ出し分)を形成する場合があることから、
通常では、樹脂封止工程の後、信号接続用端子101の
切断工程の前に樹脂バリを吹き飛ばすためのウォータジ
ェット工程または、ブラスト工程を導入している。
In the conventional method of manufacturing a resin-encapsulated semiconductor device, the molded article 1 taken out of the encapsulation mold in the encapsulation step
Reference numeral 06 denotes a temperature decrease from the mold temperature to the normal temperature,
FIG. 5D shows the difference in thermal contraction between the lead frame 104 and the lead frame 104.
As shown in FIG. Further, in the post-curing step, the temperature rises from room temperature to the post-curing temperature, and the difference in thermal expansion between the sealing resin 107 and the lead frame 104 causes
As shown in FIG. 5 (e), warpage is caused by A2, and finally, FIG.
In the cutting step shown in (f), the molding is usually performed at room temperature, so that the molded product is warped by A (not shown). Therefore, in the cutting step, the molded product warped by the amount A is divided into individual resin-encapsulated semiconductor devices while correcting it. In the sealing step, the sealing resin 107 is used.
May wrap around to the back side of the signal connection terminal 101 and form resin burrs (resin protrusion).
Usually, after the resin sealing step, before the step of cutting the signal connection terminal 101, a water jet step or a blast step for blowing off resin burrs is introduced.

【0010】[0010]

【発明が解決しようとする課題】しかしながら、従来の
樹脂封止型半導体装置の製造方法では、封止工程及びポ
ストキュア工程での昇降温によるリードフレームと封止
樹脂との熱膨張差及び熱収縮差で生じる成形品の反り量
を切断工程で矯正しながら個々の樹脂封止型半導体装置
に分断している為、樹脂封止型半導体装置に反り矯正時
に外力が加わり外力で発生する成形品内部応力で図5
(f)に示すような、樹脂クラック109aや信号端子
剥離109b、または金属細線の切断109c、また最
悪の場合、半導体チップのクラック109dといった品
質上の大きな問題が発生する恐れがあった。
However, in the conventional method for manufacturing a resin-encapsulated semiconductor device, the difference in thermal expansion and thermal shrinkage between the lead frame and the encapsulating resin due to the temperature rise and fall in the encapsulating and post-curing steps. Since the amount of warpage of the molded product caused by the difference is divided into individual resin-encapsulated semiconductor devices while correcting it in the cutting process, an external force is applied to the resin-encapsulated semiconductor device when warpage is corrected and the inside of the molded product is generated by external force Figure 5 with stress
As shown in (f), there is a possibility that a large quality problem such as a resin crack 109a, a signal terminal peeling 109b, or a thin metal wire cutting 109c, or in the worst case, a crack 109d of a semiconductor chip may occur.

【0011】また、従来の樹脂封止型半導体装置の製造
方法の樹脂封止工程においては、半導体チップを封止金
型のキャビティの凹部に入り込ませ、リードフレームの
インナーリードを金型面に密着させた状態で樹脂封止し
ているが、それでも封止樹脂がインナーリードの裏面側
に回り込んで、外部電極の表面に樹脂バリ(樹脂のはみ
出し分)が発生する。そこで、従来は、外部電極上の樹
脂バリを吹き飛ばすためにウォータージェット工程を導
入していたが、このようなウォータージェット工程には
多大の手間を要し、樹脂封止型半導体装置の量産工程に
おける工程削減等の工程の簡略化の要請に反する。つま
り、樹脂バリの発生は、そのような工程の簡略化のため
の大きな阻害要因となっていた。また、ウォータージェ
ット工程によって、樹脂バリだけでなく柔らかい金属メ
ッキも剥がれるという品質上の大きな問題が発生するお
それもあった。
In the resin sealing step of the conventional method of manufacturing a resin-encapsulated semiconductor device, a semiconductor chip is inserted into a concave portion of a cavity of a sealing die, and an inner lead of a lead frame is closely attached to the die surface. Although the resin is sealed in this state, the sealing resin still wraps around the back surface of the inner lead, and resin burrs (residual protrusion) are generated on the surface of the external electrode. Therefore, conventionally, a water jet process has been introduced to blow off resin burrs on the external electrodes. However, such a water jet process requires a great deal of time and is required in a mass production process of a resin-encapsulated semiconductor device. Contrary to the demand for simplification of processes such as process reduction. In other words, the occurrence of resin burrs has been a major obstacle to simplifying such a process. In addition, the water jet process may cause a serious quality problem that not only resin burrs but also soft metal plating is peeled off.

【0012】本発明は上記課題に鑑みなされたものであ
って、その目的は切断工程前に予め成形品の反りを低減
し切断工程での成形品反り矯正時の外力で発生する成形
品内部応力を小さくする事で品質の良い樹脂封止型半導
体装置を提供し、更に封止シートを用いながら複数の半
導体チップを共通のキャビティ凹部に収納して樹脂封止
を行う事により、生産性が高く安価で品質の良い樹脂封
止型半導体装置の製造方法と、この製造方法の実施に適
したリードフレームとを提供する事にある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above problems, and has as its object to reduce the warpage of a molded product in advance before a cutting process and to reduce the internal stress generated by an external force when correcting the warpage of the molded product in the cutting process. By providing a high-quality resin-encapsulated semiconductor device by reducing the size of the semiconductor chip, and by using a sealing sheet to house a plurality of semiconductor chips in a common cavity recess and performing resin encapsulation, high productivity is achieved. An object of the present invention is to provide an inexpensive and high-quality method of manufacturing a resin-encapsulated semiconductor device and a lead frame suitable for implementing the method.

【0013】[0013]

【課題を解決するための手段】請求項1記載の樹脂封止
型半導体装置の製造方法は、半導体チップを搭載するた
めのダイパッドおよび信号接続用端子を有する複数のチ
ップ搭載領域と、この複数のチップ搭載領域同士の間に
設けられた連結部と、複数のチップ搭載領域の外周部か
ら所定のモールドライン近傍まで設けられた開口部とを
備えたリードフレームを準備する第1の工程と、複数の
チップ搭載領域に半導体チップを搭載し、半導体チップ
の電極パッドと信号接続用端子とを電気的に接続して被
成形品を形成する第2の工程と、封止用金型のキャビテ
ィ凹部に対向する金型面とリードフレームの裏面との間
に封止シートを介在させた状態で、キャビティ凹部に各
半導体チップが入り込むように被成形品を封止用金型に
セットした後に、キャビティ凹部内に樹脂を充填し、リ
ードフレームの開口部まで封止する第3の工程と、封止
用金型から成形品を取出し封止シートを成形品の裏面か
ら剥す第4の工程と、成形品の表面および裏面側から加
圧しながら、樹脂を加熱硬化させる第5の工程と、樹脂
の硬化が完了した成形品を切断する第6の工程とを含む
ものである。
According to a first aspect of the present invention, there is provided a method for manufacturing a resin-encapsulated semiconductor device, comprising: a plurality of chip mounting regions having a die pad for mounting a semiconductor chip and signal connection terminals; A first step of preparing a lead frame having a connection portion provided between the chip mounting regions and an opening provided from the outer periphery of the plurality of chip mounting regions to the vicinity of a predetermined mold line; A second step of mounting a semiconductor chip in the chip mounting area, electrically connecting an electrode pad of the semiconductor chip to a signal connection terminal to form a molded product, In a state where the sealing sheet is interposed between the opposing mold surface and the back surface of the lead frame, after setting the molded article in the sealing mold so that each semiconductor chip enters the cavity recess, A third step of filling the cavity recess with a resin and sealing up to the opening of the lead frame, a fourth step of taking out the molded product from the sealing mold and peeling off the sealing sheet from the back surface of the molded product, The method includes a fifth step of heating and curing the resin while applying pressure from the front and back surfaces of the molded article, and a sixth step of cutting the molded article after the resin has been cured.

【0014】請求項1記載の樹脂封止型半導体装置の製
造方法によれば、モールドライン近傍まで設けられた開
口部まで封止樹脂が充填されるため、リードフレームと
封止樹脂との熱収縮差による成形品の反り量が緩和され
る。さらにポストキュア工程で封止金型内での成形品加
圧保持状態(封止樹脂充填後のキュア保圧)と同様に成
形品の表面側及び裏面側から加圧しながら樹脂の加熱硬
化を行う為、成形品の反りが更に低減される。また封止
金型に設けられた共通のキャビティ凹部内に多数の樹脂
封止型半導体装置が形成されるが、第3の工程で封止シ
ートを使用する事によって、信号接続用端子の裏面への
樹脂バリの形成は阻止される。更に封止シートが信号接
続用端子の下部より封止樹脂側に食い込む形となるので
信号接続用端子の下部を外部電極として使用する際のス
タンドオフも確保される。よって成形品の反りに起因す
る樹脂封止型半導体装置のクラックなどの品質不良が阻
止され、切断工程を容易、迅速にでき、更に製造工程の
簡素化を図りつつ、裏面側に突出した樹脂バリのない電
極を有しながら、生産性の高く品質の良い樹脂封止型半
導体装置の製造方法を提供する事ができる。
According to the first aspect of the present invention, since the sealing resin is filled up to the opening provided up to the vicinity of the mold line, the heat shrinkage between the lead frame and the sealing resin is achieved. The warpage of the molded product due to the difference is reduced. Further, in the post-cure step, the resin is heat-cured while being pressed from the front side and the back side of the molded product in the same manner as in the pressurized state of the molded product in the sealing mold (cure pressure after filling the sealing resin). Therefore, the warpage of the molded product is further reduced. A large number of resin-encapsulated semiconductor devices are formed in a common cavity recess provided in the encapsulation mold. However, by using an encapsulation sheet in the third step, the back surface of the signal connection terminal can be formed. Is prevented from forming. Further, since the sealing sheet is formed to bite into the sealing resin side from the lower part of the signal connection terminal, a stand-off when the lower part of the signal connection terminal is used as an external electrode is also ensured. Therefore, quality defects such as cracks of the resin-encapsulated semiconductor device due to warpage of the molded product are prevented, and the cutting process can be performed easily and quickly. Further, the resin burr protruding to the rear surface side can be simplified while simplifying the manufacturing process. It is possible to provide a method of manufacturing a resin-encapsulated semiconductor device with high productivity and high quality, while having electrodes without defects.

【0015】請求項2記載の樹脂封止型半導体装置の製
造方法は、請求項1において、第3の工程における封止
シートは、ポリイミド、ポリエチレンテレフタレート、
ポリカーボネート等を主成分とする樹脂、または銅、ア
ルミニウム、ステンレスもしくは鉄を含む導電性金属と
したものである。
According to a second aspect of the present invention, in the method for manufacturing a resin-encapsulated semiconductor device according to the first aspect, the encapsulating sheet in the third step is made of polyimide, polyethylene terephthalate,
It is made of a resin mainly containing polycarbonate or the like, or a conductive metal containing copper, aluminum, stainless steel or iron.

【0016】請求項2記載の樹脂封止型半導体装置の製
造方法によれば、請求項1と同様な効果のほか、多数の
半導体チップを共通のキャビティ凹部内で封止しなが
ら、各信号接続用端子のスタンドオフの確保と信号接続
用端子の裏面の樹脂バリ防止ができる。またこれらスタ
ンドオフの確保と樹脂バリ防止の役目を持つ封止シート
基材及び接着剤の材質を目的、機能およびコストの観点
から任意に組み合わせて選択することができる。例えば
導電性金属基材は第4の工程で成形品の裏面から封止シ
ートを剥す際、封止シートの基材は導電性金属のため、
貼付したフレームが樹脂基板であっても電解剥離法が使
用でき、確実に成形品から封止シートを剥す事ができ
る。更に剥がした後の封止シートの基材は金属なので廃
材としてリサイクル可能であり、環境に優しくまた樹脂
封止型半導体装置の製造コストも低減できる。また樹脂
系基材は導電性金属基材に対して弾性率が大きいため少
ない圧着力で信号接続用端子に食い込みさせやすくスタ
ンドオフ確保が容易である。
According to the method of manufacturing a resin-encapsulated semiconductor device of the second aspect, in addition to the same effects as those of the first aspect, each signal connection is performed while many semiconductor chips are sealed in a common cavity recess. It is possible to secure the stand-off of the terminal for signal and prevent resin burr on the back surface of the terminal for signal connection. Further, the materials of the sealing sheet base material and the adhesive having the role of securing the stand-off and preventing the resin burr can be arbitrarily combined and selected from the viewpoints of the purpose, function and cost. For example, when the conductive metal substrate peels the sealing sheet from the back surface of the molded article in the fourth step, the base material of the sealing sheet is a conductive metal,
Even if the attached frame is a resin substrate, the electrolytic peeling method can be used, and the sealing sheet can be reliably peeled off from the molded product. Furthermore, since the base material of the sealing sheet after peeling is metal, it can be recycled as waste material, is environmentally friendly and can reduce the manufacturing cost of the resin-sealed semiconductor device. Further, since the resin base material has a large elastic modulus with respect to the conductive metal base material, the resin base material can easily bite into the signal connection terminal with a small pressing force, and it is easy to secure the stand-off.

【0017】請求項3記載の樹脂封止型半導体装置の製
造方法は、請求項1または請求項2において、第3の工
程における封止シートの接着剤が、シリコーン系、フェ
ノール系またはエポキシ系の接着剤であり、加熱圧着さ
れリードフレームまたは基板に貼り付けられるものであ
る。
According to a third aspect of the present invention, in the method for manufacturing a resin-encapsulated semiconductor device according to the first or second aspect, the adhesive of the sealing sheet in the third step is a silicone-based, phenol-based or epoxy-based adhesive. It is an adhesive that is heat-pressed and attached to a lead frame or a substrate.

【0018】請求項3記載の樹脂封止型半導体装置の製
造方法によれば、請求項1または請求項2と同様な効果
がある。
According to the method of manufacturing a resin-sealed semiconductor device according to the third aspect, the same effects as those of the first or second aspect can be obtained.

【0019】請求項4記載の樹脂封止型半導体装置の製
造方法は、請求項1において、第3の工程後に封止金型
から成形品を取出し成形品の表面および裏面側から加圧
しながら樹脂を加熱硬化させる第5の工程を行い、その
後に、封止シートを成形品の裏面から剥す第4の工程を
行うものである。
According to a fourth aspect of the present invention, there is provided a method of manufacturing a resin-sealed semiconductor device according to the first aspect, wherein the molded product is taken out of the sealing mold after the third step, and the resin is pressed from the front and back sides of the molded product. Is performed, followed by a fourth step of peeling off the sealing sheet from the back surface of the molded article.

【0020】請求項4記載の樹脂封止型半導体装置の製
造方法によれば、請求項1と同様な効果のほか、加熱硬
化で樹脂が架橋した安定した状態になっているので、剥
がし時に成形品を溶剤などに浸漬し封止シートを膨潤、
または溶解させる方法が採用しやすくなり、より確実に
容易に成形品から封止シートを剥がすことができる。ま
た、製造工程順序の自由度が増し、製造方法を設備状況
などに応じて任意に選択する事ができる。
According to the method of manufacturing a resin-encapsulated semiconductor device according to the fourth aspect, in addition to the same effects as those of the first aspect, the resin is in a stable state in which the resin is crosslinked by heat curing, so that it can be molded at the time of peeling. Swell the sealing sheet by immersing the product in a solvent, etc.
Alternatively, a method of dissolving is easily adopted, and the sealing sheet can be more reliably and easily peeled off from the molded product. In addition, the degree of freedom in the order of the manufacturing steps is increased, and the manufacturing method can be arbitrarily selected according to the equipment status.

【0021】請求項5記載の樹脂封止型半導体装置の製
造方法は、請求項1において、第5の工程において複数
の成形品をタワー内に積層し、積層した最端の成形品を
加圧蓋で押さえ、積層した成形品の全てを加圧するもの
である。
According to a fifth aspect of the present invention, in the method for manufacturing a resin-encapsulated semiconductor device according to the first aspect, a plurality of molded products are laminated in the tower in the fifth step, and the laminated endmost molded product is pressed. The lid is pressed with a lid to press all of the laminated molded products.

【0022】請求項5記載の樹脂封止型半導体装置の製
造方法によれば、請求項1と同様な効果のほか、構造が
いたって単純な加圧方式のタワーを製作でき、さらに加
圧方式のタワーを準備するだけで、既存の封止設備やポ
ストキュア設備を改造せずに済み、反りの少ない成形品
を大量に量産でき、高品質で安価な樹脂封止型半導体装
置を製造できる。
According to the method of manufacturing a resin-encapsulated semiconductor device according to the fifth aspect, in addition to the same effects as those of the first aspect, a tower having a simple structure and a simple pressurizing method can be manufactured. By simply preparing a tower, existing sealing equipment and post-cure equipment do not need to be modified, mass production of molded products with less warpage can be achieved, and high-quality and inexpensive resin-encapsulated semiconductor devices can be manufactured.

【0023】請求項6記載の樹脂封止型半導体装置の製
造方法は、請求項1または請求項5において、第5の工
程において複数の成形品を立てた状態で加圧するもので
ある。
According to a sixth aspect of the present invention, in the method of manufacturing a resin-encapsulated semiconductor device according to the first or fifth aspect, in the fifth step, a plurality of molded products are pressed in a standing state.

【0024】請求項6記載の樹脂封止型半導体装置の製
造方法によれば、請求項1または請求項5と同様な効果
のほか、成形品自体の重量による加圧量の変動を無視す
ることができ、タワーに積層した成形品の表面側と底面
側との加圧量の違いが無く、反り量の少ない安定した成
形品を生産でき、高品質な樹脂封止型半導体装置を製造
できる。
According to the method of manufacturing a resin-encapsulated semiconductor device of the sixth aspect, in addition to the same effects as those of the first or fifth aspect, the fluctuation of the pressurization amount due to the weight of the molded product itself is ignored. Thus, there is no difference in the amount of pressure between the front side and the bottom side of the molded product laminated on the tower, a stable molded product with a small amount of warpage can be produced, and a high-quality resin-encapsulated semiconductor device can be produced.

【0025】請求項7記載の樹脂封止型半導体装置のリ
ードフレームは、半導体チップを搭載するためのダイパ
ッドおよび信号接続用端子を有する複数のチップ搭載領
域と、この複数のチップ搭載領域同士の間に設けられた
連結部と、複数のチップ搭載領域の外周部から所定のモ
ールドライン近傍まで設けられた開口部とを備えたリー
ドフレームであって、連結部の延長線上のリードフレー
ムの外枠に設けられた熱応力緩和用のスリットを有し、
開口部は複数のチップ搭載領域の外周部からモールドラ
インよりも外に大きく開口することを特徴とするもので
ある。
According to a seventh aspect of the present invention, there is provided a lead frame for a resin-encapsulated semiconductor device, wherein a plurality of chip mounting areas having a die pad and a signal connection terminal for mounting a semiconductor chip are provided between the plurality of chip mounting areas. And a lead frame provided with an opening provided from the outer periphery of the plurality of chip mounting areas to the vicinity of a predetermined mold line, the outer frame of the lead frame being an extension of the connection part. It has a slit for thermal stress relaxation provided,
The opening is characterized in that the opening is larger than the mold line from the outer periphery of the plurality of chip mounting areas.

【0026】請求項7記載の樹脂封止型半導体装置のリ
ードフレームによれば、モールドライン近傍まで設けら
れた開口部まで封止樹脂が充填されるため、リードフレ
ームと封止樹脂との熱収縮差による成形品の反り量が緩
和される。更にリードフレーム連結部の延長線上にスリ
ットが設けられているので、特にワイヤーボンド工程等
の高温時の連結部の熱膨張によるリードフレーム自体の
熱変形がこのスリットで吸収される。また開口部をモー
ルドラインよりも外に大きく開口したため、確実にリー
ドフレームと封止樹脂の接触部が減少でき、かつリード
フレームの板厚分のみの封止樹脂量のみで済み、高品質
かつ経済的に成形品の反り量が緩和できる。
According to the lead frame of the resin-encapsulated semiconductor device, since the sealing resin is filled up to the opening provided up to the vicinity of the mold line, the heat shrinkage of the lead frame and the sealing resin occurs. The warpage of the molded product due to the difference is reduced. Further, since the slit is provided on the extension of the lead frame connecting portion, thermal deformation of the lead frame itself due to thermal expansion of the connecting portion at a high temperature such as a wire bonding step is absorbed by the slit. In addition, since the opening is larger than the mold line, the contact area between the lead frame and the sealing resin can be reliably reduced, and only the amount of the sealing resin corresponding to the thickness of the lead frame is required, resulting in high quality and economy. The amount of warpage of the molded product can be alleviated.

【0027】[0027]

【発明の実施の形態】本発明の実施の形態について図面
を参照しながら説明する。
Embodiments of the present invention will be described with reference to the drawings.

【0028】図1は本発明の一実施の形態に係る樹脂封
止型半導体装置の製造工程であり、図2は本実施の形態
に係る樹脂封止型半導体装置に用いられるリードフレー
ムである。まず図1(a)は、本実施の形態に係る樹脂
封止型半導体装置に用いられるリードフレーム4の断面
図であり、図2(a)はそのリードフレーム4の全体構
造を示す平面図である。なお、図中は破断線により示す
右方の領域では、記載を簡略化している。また、図2
(b)、(c)は、図2(a)の一部を拡大して示す部
分平面図である。リードフレーム4には、半導体チップ
2を実装するための領域である多数のチップ搭載領域R
cpが設けられており、各チップ搭載領域Rcpには、
半導体チップ2を搭載する為のダイパッド3とダイパッ
ド3を支持す為の吊りリード8と、チップ搭載領域Rc
pの各4つの辺部から内方に延びる信号接続用端子1と
が設けられている。なお、吊りリード8には、ダイパッ
ド3を信号接続用端子1の位置よりも上方にアップセッ
トする為のディプレス部が形成されている。各チップ搭
載領域Rcp間には、信号接続用端子1の付け根ともな
る連結部A11が設けられている。なお、信号接続用端
子1は後工程で樹脂封止型半導体装置の外部電極となる
ように切断されるために切断加工代を考慮した長さの延
長分を含んでいる。
FIG. 1 shows a manufacturing process of a resin-sealed semiconductor device according to one embodiment of the present invention, and FIG. 2 shows a lead frame used for the resin-sealed semiconductor device according to this embodiment. First, FIG. 1A is a cross-sectional view of a lead frame 4 used in the resin-sealed semiconductor device according to the present embodiment, and FIG. 2A is a plan view showing the entire structure of the lead frame 4. is there. In the figure, the description is simplified in a right region indicated by a broken line. FIG.
2B and 2C are partial plan views showing a part of FIG. 2A in an enlarged manner. The lead frame 4 has a large number of chip mounting areas R for mounting the semiconductor chip 2.
cp is provided, and in each chip mounting region Rcp,
A die pad 3 for mounting the semiconductor chip 2, a suspension lead 8 for supporting the die pad 3, and a chip mounting region Rc;
and a signal connection terminal 1 extending inward from each of four sides of p. The suspension lead 8 is provided with a depressed portion for upsetting the die pad 3 above the position of the signal connection terminal 1. Between the chip mounting regions Rcp, there is provided a connection portion A11 which also serves as a root of the signal connection terminal 1. Note that the signal connection terminal 1 includes an extension of a length in consideration of a cutting allowance because the signal connection terminal 1 is cut in a later step so as to be an external electrode of the resin-encapsulated semiconductor device.

【0029】ここで、リードフレーム4の外枠9には、
モールドライン近傍まで、またチップ搭載領域Rcpの
1辺の長さに相当する開口部10が設けられていて、封
止樹脂7はこの開口部10まで充填される。よって封止
樹脂7に対するリードフレーム4の接触面積が低減され
る。従って、成形品21の反りに大きく起因するリード
フレーム4と封止樹脂7の熱収縮量の差は阻止できる。
つまり、リードフレーム4の開口部10は封止樹脂7の
みとなるのでリードフレーム4の熱収縮量は無視でき
る。特に封止樹脂7に対するリードフレーム4の接触面
積は外枠9に集中している為、開口部10を有する本実
施の形態に係るリードフレーム4は成形品21の反りの
低減に大きな効果を得られる。なお、本実施の形態では
封止シート6を用いているためキャビティ凹部14に充
填される溶融した封止樹脂7の圧力によって連結部B1
2は変形しない。封止シート6を用いず、チップ搭載領
域Rcpの1辺の長さが長く封止樹脂7の圧力によって
連結部B12が変形する恐れがある場合は、図2(c)
に示すように、図2(b)開口部10の中央に相当する
箇所にサポート13を設置してもよい。この実施の形態
ではチップ搭載領域Rcpの1辺の長さが、10mm以
上の場合、サポート13を設置した。なお、封止樹脂工
程において溶融した封止樹脂の注入経路であるランナ
(図2(a)の○で示す部分)は、リードフレーム4の
外枠9のみに設けられており、チップ搭載領域Rcp間
の領域には設けられていない。
Here, the outer frame 9 of the lead frame 4 has
An opening 10 corresponding to the length of one side of the chip mounting region Rcp is provided up to the vicinity of the mold line, and the sealing resin 7 is filled up to the opening 10. Therefore, the contact area of the lead frame 4 with the sealing resin 7 is reduced. Therefore, it is possible to prevent a difference in the amount of heat shrinkage between the lead frame 4 and the sealing resin 7 largely caused by the warpage of the molded product 21.
That is, since the opening 10 of the lead frame 4 is only the sealing resin 7, the amount of heat shrinkage of the lead frame 4 can be ignored. In particular, since the contact area of the lead frame 4 with the sealing resin 7 is concentrated on the outer frame 9, the lead frame 4 having the opening 10 according to the present embodiment has a great effect in reducing the warpage of the molded product 21. Can be In this embodiment, since the sealing sheet 6 is used, the pressure of the molten sealing resin 7 filled in the cavity concave portion 14 causes the connection portion B1
2 does not deform. In the case where the sealing sheet 6 is not used and the length of one side of the chip mounting region Rcp is long and the connection portion B12 may be deformed by the pressure of the sealing resin 7, FIG.
2B, the support 13 may be installed at a position corresponding to the center of the opening 10 in FIG. In this embodiment, when the length of one side of the chip mounting region Rcp is 10 mm or more, the support 13 is provided. The runners (portions indicated by circles in FIG. 2A), which are injection paths of the sealing resin melted in the sealing resin process, are provided only in the outer frame 9 of the lead frame 4, and are provided in the chip mounting region Rcp. It is not provided in the area between them.

【0030】次に図1(b)に示す工程で、用意したリ
ードフレーム4のダイパッド3の上に半導体チップ2を
接着剤により接合する。この工程はいわゆるダイボンド
工程である。そして、ダイパッド3上に接合された半導
体チップ2と、信号接続用端子1とを金属細線5によ
り、電気的に接合する。この工程は、いわゆるワイヤボ
ンド工程である。この被成形品20は、このリードフレ
ーム4とリードフレーム4上に搭載された半導体チップ
2と、金属細線5とからなっている。
Next, in the step shown in FIG. 1B, the semiconductor chip 2 is bonded onto the die pad 3 of the prepared lead frame 4 with an adhesive. This step is a so-called die bonding step. Then, the semiconductor chip 2 bonded on the die pad 3 and the signal connection terminal 1 are electrically bonded by the thin metal wire 5. This step is a so-called wire bonding step. The molded article 20 includes the lead frame 4, the semiconductor chip 2 mounted on the lead frame 4, and the thin metal wires 5.

【0031】次に図1(c)に示す工程で、多数の半導
体チップ2が接合されたリードフレーム4の裏面側に封
止シート6を貼り付ける。この封止シート6はリードフ
レーム4の半導体チップ2が接合されている面に対向す
る面、つまりリードフレーム4の裏面全体に密着してい
るが、吊りリード8のディプレス部によってアップセッ
トされた吊りリード8の一部やダイパッド3には密着し
ていない。この封止シート6の役割は、第一に信号接続
用端子1の裏面側に樹脂封止時に封止樹脂7が回り込ま
ないようにストッパー的な役割であり、信号接続用端子
1の裏面に樹脂バリが形成されるのを防止する機能を果
たす。第2に図1(c)の部分拡大図に示すように、封
止シート6が信号接続用端子1の裏面よりも上方に入り
込み、その状態で樹脂封止されるため、スタンドオフが
確保できる。上記封止シート6の接着剤6aはシリコー
ン系接着剤で基材6bはポリイミド系のフィルムかある
いは、銅またはアルミニウムなどの導電性金属である。
接着剤6a、基材6bともに封止工程またはポストキュ
ア工程の際の高温時の耐熱性があり、さらに接着剤6a
は封止工程での樹脂封止圧力に耐える接着力を備える。
さらに樹脂封止後は、成形品から容易に剥すことができ
る。本実施の形態における封止シート6の厚みは例えば
接着剤6aが25μm、基材6bが50μmである。封
止シート6が信号接続用端子1の裏面よりも上方に入り
込む量は封止シート6の厚さ、貼付圧力、時間、および
温度で定まるが信号接続用端子1の裏面と封止樹脂7の
裏面との間の段差の大きさは特に封止シート6の厚みと
貼付圧力で定まる。本発明では、総厚75μmの封止シ
ート6を用いているので、段差の大きさつまり、外部電
極の突出量は、その半分程度であり、最大限封止シート
6の厚みである。なお、本実施の形態ではワイヤボンド
工程後にリードフレーム4の裏面側に封止シート6を貼
り付けたが、ダイボンド工程前のリードフレーム4の裏
面側に封止シート6を貼付しておいても構わない。半導
体チップ2や金属細線5がないリードフレーム状態なの
で、より容易に封止シートが貼り付けられる。
Next, in a step shown in FIG. 1C, a sealing sheet 6 is attached to the back surface of the lead frame 4 to which a number of semiconductor chips 2 are joined. The sealing sheet 6 is in close contact with the surface of the lead frame 4 facing the surface to which the semiconductor chip 2 is bonded, that is, the entire back surface of the lead frame 4, but is set up by the depressed portion of the suspension lead 8. It does not adhere to a part of the suspension lead 8 or the die pad 3. The sealing sheet 6 plays a role of a stopper so that the sealing resin 7 does not flow around the back surface of the signal connection terminal 1 when the resin is sealed. It serves to prevent burrs from being formed. Second, as shown in a partially enlarged view of FIG. 1C, the sealing sheet 6 enters above the back surface of the signal connection terminal 1 and is sealed with resin in that state, so that a stand-off can be secured. . The adhesive 6a of the sealing sheet 6 is a silicone-based adhesive, and the substrate 6b is a polyimide-based film or a conductive metal such as copper or aluminum.
Both the adhesive 6a and the base material 6b have heat resistance at a high temperature during the sealing step or the post-curing step.
Has an adhesive strength to withstand the resin sealing pressure in the sealing step.
Furthermore, after resin sealing, it can be easily peeled off from the molded product. The thickness of the sealing sheet 6 in the present embodiment is, for example, 25 μm for the adhesive 6a and 50 μm for the base material 6b. The amount of the sealing sheet 6 entering above the back surface of the signal connection terminal 1 is determined by the thickness of the sealing sheet 6, the sticking pressure, the time, and the temperature. The size of the step between the rear surface and the back surface is determined by the thickness of the sealing sheet 6 and the application pressure. In the present invention, since the sealing sheet 6 having a total thickness of 75 μm is used, the size of the step, that is, the protruding amount of the external electrode is about half that, which is the maximum thickness of the sealing sheet 6. In the present embodiment, the sealing sheet 6 is attached to the back surface of the lead frame 4 after the wire bonding step. However, the sealing sheet 6 may be attached to the back surface of the lead frame 4 before the die bonding step. I do not care. Since the semiconductor chip 2 and the thin metal wires 5 are not in the lead frame state, the sealing sheet can be more easily attached.

【0032】次に図1(d)に示す工程でキャビティ凹
部14を有する下金型15aと、ほぼフラットな金型面
を有する上金型15bとからなる封止金型15を用意す
る。そして、リードフレーム4上の多数の半導体チップ
2が搭載されている側を下方に向けて、各半導体チップ
2が下金型15aの共通のキャビティ凹部14に入り込
むように、リードフレーム4を下金型15aに位置合わ
せする。そして、この状態で、リードフレーム4及び封
止シート6をキャビティ凹部14の周囲のパーティング
面16で狭圧し、複数個の半導体チップ2を搭載した被
成形物20を封止樹脂7により樹脂封止を行う。この
時、半導体チップ2の上面側、つまり金属細線5が接続
されている面側とダイパッド3の下方とに封止樹脂7が
充填されるとともに、半導体チップ2上方の封止樹脂7
の上端面が金属細線5のループ高さ以上の高さ位置にあ
るように封止される。そして、ダイパッド3の下方の封
止樹脂7の下端面と半導体チップ2の上方の封止樹脂7
の上端面との間の寸法が封止樹脂7の厚みである。
Next, in the step shown in FIG. 1D, a sealing mold 15 comprising a lower mold 15a having a cavity concave portion 14 and an upper mold 15b having a substantially flat mold surface is prepared. Then, the lead frame 4 is mounted on the lower frame so that each semiconductor chip 2 enters the common cavity recess 14 of the lower mold 15a with the side on which the plurality of semiconductor chips 2 are mounted on the lead frame 4 facing downward. Align with the mold 15a. Then, in this state, the lead frame 4 and the sealing sheet 6 are squeezed by the parting surface 16 around the cavity recess 14, and the molded object 20 on which the plurality of semiconductor chips 2 are mounted is sealed with the sealing resin 7. Stop. At this time, the sealing resin 7 fills the upper surface side of the semiconductor chip 2, that is, the surface to which the thin metal wires 5 are connected, and the lower part of the die pad 3, and the sealing resin 7 above the semiconductor chip 2.
Are sealed so that the upper end surface of the metal wire 5 is at a height position equal to or higher than the loop height of the thin metal wire 5. Then, the lower end surface of the sealing resin 7 below the die pad 3 and the sealing resin 7 above the semiconductor chip 2
Is the thickness of the sealing resin 7.

【0033】ここで、リードフレーム4に形成した開口
部10にも封止樹脂7がキャビティ凹部14を伝わり、
樹脂封止される。上記までの封止樹脂7がキャビティ凹
部14と開口部10のようなリードフレームのすきま
(例えば信号接続用端子1どうしの間、ダイパッド3の
下面部など)に充填される。その後、被成形品20と封
止樹脂7は一定時間圧力と熱を封止金型15から与えら
れ封止樹脂7はある程度硬化し、被成形品20と封止樹
脂7は一体化し、成形品21となる。
Here, the sealing resin 7 is transmitted to the opening 10 formed in the lead frame 4 through the cavity concave portion 14.
It is sealed with resin. The above-described sealing resin 7 is filled in the gaps of the lead frame such as the cavity recesses 14 and the openings 10 (for example, between the signal connection terminals 1 and the lower surface of the die pad 3). Thereafter, the molded article 20 and the sealing resin 7 are given pressure and heat from the sealing mold 15 for a certain period of time, and the sealing resin 7 is cured to some extent, and the molded article 20 and the sealing resin 7 are integrated into a molded article. It becomes 21.

【0034】次に図1(e)に示すように、上記の成形
品21を封止金型15から取出す。この時、成形品21
は常温に戻され、封止樹脂7とリードフレーム4は熱収
縮する。しかしながら封止樹脂7とリードフレーム4と
の間には熱収縮量の差があり、それが成形品21の反り
となって不具合を生じる。ところが本実施の形態のリー
ドフレーム4には開口部10が設けられ、封止樹脂7が
樹脂封止されている。従って成形品21は殆どが封止樹
脂7であり、特に熱収縮時、封止樹脂7がリードフレー
ム4に引っ張られやすいリードフレーム4の外枠9の部
分が開口部10によって樹脂封止されていることから、
封止樹脂7とリードフレーム4との熱収縮差が緩和さ
れ、成形品21の反り量が殆ど無くなる。
Next, as shown in FIG. 1 (e), the molded article 21 is taken out of the sealing mold 15. At this time, the molded product 21
Is returned to normal temperature, and the sealing resin 7 and the lead frame 4 thermally shrink. However, there is a difference in the amount of heat shrinkage between the sealing resin 7 and the lead frame 4, which causes the molded product 21 to warp and cause a problem. However, an opening 10 is provided in the lead frame 4 of the present embodiment, and the sealing resin 7 is resin-sealed. Therefore, most of the molded product 21 is the sealing resin 7, and particularly, at the time of heat shrinkage, the portion of the outer frame 9 of the lead frame 4 where the sealing resin 7 is easily pulled by the lead frame 4 is resin-sealed by the opening 10. From that
The difference in heat shrinkage between the sealing resin 7 and the lead frame 4 is reduced, and the warpage of the molded product 21 is almost eliminated.

【0035】次に図1(f)に示す工程でリードフレー
ム4の裏面に貼付された封止シート6をピールオフによ
り除去すると、信号接続用端子1の下部が封止樹脂7の
裏面よりも突出した構造を有する成形品21が得られ
る。ここで、封止シート6のピールオフは、接着剤6a
のガラス転移温度Tg以上に加熱すると、接着剤6aが
軟化し剥しやすくなる。別の方法として、成形品21を
アルカリ電解液に浸漬させリードフレーム4を導通させ
ることで、接着剤6aが膨潤剥離し、封止シート6をピ
ールオフすることもある。
Next, in a step shown in FIG. 1F, when the sealing sheet 6 attached to the back surface of the lead frame 4 is removed by peeling off, the lower part of the signal connection terminal 1 protrudes from the back surface of the sealing resin 7. A molded article 21 having the above-mentioned structure is obtained. Here, the peel-off of the sealing sheet 6 is caused by the adhesive 6a.
When heated above the glass transition temperature Tg, the adhesive 6a is softened and easily peeled off. As another method, the adhesive 6a may be swelled and peeled off by peeling off the sealing sheet 6 by immersing the molded article 21 in an alkaline electrolyte to make the lead frame 4 conductive.

【0036】次に図1(g)に示す工程で、封止シート
6をピールオフした成形品21を裏面側押え治具18a
の上にセットし、セットした成形品21の表面側に表面
側押え治具18bを載せ、成形品21の表面及び裏面側
から加圧する状態をつくる。なお、裏面側押え治具18
aの上は成形品21の表面側がきても、成形品21の表
面及び裏面側から押さえ治具18で加圧できればよい。
Next, in the step shown in FIG. 1 (g), the molded product 21 from which the sealing sheet 6 has been peeled off is held on the back side holding jig 18a.
And the front side holding jig 18b is placed on the front side of the set molded article 21 to create a state where pressure is applied from the front and back sides of the molded article 21. The back side holding jig 18
Even if the front side of the molded article 21 comes above a, it is only necessary that the pressing jig 18 can be pressed from the front and back sides of the molded article 21.

【0037】そして、この押え治具18で加圧した成形
品21を硬化炉17にセットし、一定時間、所定温度で
加熱する。この工程は、いわゆるポストキュア工程であ
る。成形品21は上述した通り本実施の形態でリードフ
レーム4の開口部10まで樹脂封止され反りの殆どない
状態であるため、押え治具18で加圧しても、クラック
などの不具合が生じることはない。さらに、押え治具1
8で加圧された成形品21の封止樹脂7は硬化炉17か
らの加熱により、完全に硬化される。そして、完全に封
止樹脂7が硬化した成形品21は硬化炉から取出され、
次工程に流されるが加熱時加圧していた為に封止樹脂7
は異方的に熱膨張・収縮せずに、結果的に成形品21は
反りの殆ど無い状態となる。
Then, the molded product 21 pressurized by the holding jig 18 is set in the curing furnace 17 and heated at a predetermined temperature for a predetermined time. This step is a so-called post cure step. As described above, in the present embodiment, since the molded product 21 is resin-sealed to the opening 10 of the lead frame 4 and has almost no warpage, even if the pressing jig 18 is pressed, defects such as cracks may occur. There is no. Further, the holding jig 1
The sealing resin 7 of the molded article 21 pressurized at 8 is completely cured by heating from the curing furnace 17. Then, the molded product 21 in which the sealing resin 7 is completely cured is taken out of the curing furnace,
It is flowed to the next step, but the sealing resin 7
Does not undergo anisotropic thermal expansion and contraction, and as a result, the molded article 21 is in a state with almost no warpage.

【0038】次に、図1(h)に示す工程で成形品21
をリードフレーム4の連結部A11や連結部B12に沿
ってダイシングソーや切断金型を用いてカットし、個々
の樹脂封止型半導体装置を得る。ここで、成形品21は
反りの殆ど無い状態である為、カット時に成形品21の
反りを矯正する必要も無く、成形品21に余分な応力を
与えず、成形品の切断が容易にかつ迅速に対応でき、品
質の良い樹脂封止型半導体装置を得ることができる。
Next, in the step shown in FIG.
Is cut along the connecting portions A11 and B12 of the lead frame 4 using a dicing saw or a cutting die to obtain individual resin-sealed semiconductor devices. Here, since the molded article 21 has almost no warpage, there is no need to correct the warpage of the molded article 21 at the time of cutting, no extra stress is applied to the molded article 21, and the molded article can be cut easily and quickly. And a high-quality resin-encapsulated semiconductor device can be obtained.

【0039】なお、図1では成形品21の裏面から封止
シート6を剥がした(図1(f))後に、ポストキュア
(図1(g))したがポストキュアした後に、成形品2
1の裏面から封止シート6を剥がしても良く、樹脂封止
型半導体装置の品質に何ら支障はない。ポストキュア時
の加熱硬化で樹脂が架橋した安定した状態になっている
ので、剥がし時に成形品を溶剤などに浸漬し封止シート
を膨潤、または溶解させる方法が採用しやすくなり、よ
り確実に容易に成形品から封止シートを剥がすことがで
きる。
In FIG. 1, the sealing sheet 6 was peeled off from the back surface of the molded article 21 (FIG. 1 (f)), and then post-cured (FIG. 1 (g)).
The sealing sheet 6 may be peeled off from the back surface of the semiconductor device 1, and there is no problem in the quality of the resin-sealed semiconductor device. Since the resin is crosslinked by heat curing during post cure, it is in a stable state, so it is easier to adopt a method of swelling or dissolving the sealing sheet by immersing the molded product in a solvent etc. The sealing sheet can be peeled off from the molded article.

【0040】また、本実施の形態で成形品21の反り量
をなくす構造をリードフレーム4に開口部10を設置し
たことと、ポストキュア時に加圧する方法を採用したこ
とで例えば、チップ搭載領域Rcpの大きさが変更とな
っても、つまり、樹脂封止型半導体装置の外形寸法が変
わりリードフレーム4のレイアウトが変更となっても、
封止金型15のキャビティ凹部14の平面サイズを変更
しなくても成形品21の反り量をなくすことができる。
換言すれば1機種の封止金型15でリードフレーム4の
品種交換をするだけで、反りの無い成形品21を製造で
き新たに封止金型を製作せずに、封止金型投資を抑制し
短納期で多品種の樹脂封止型半導体装置を生産できる。
In the present embodiment, the structure for eliminating the amount of warpage of the molded product 21 is provided by providing the opening 10 in the lead frame 4 and employing a method of applying pressure at the time of post-curing. Is changed, that is, even if the external dimensions of the resin-encapsulated semiconductor device are changed and the layout of the lead frame 4 is changed,
The warpage of the molded product 21 can be eliminated without changing the planar size of the cavity concave portion 14 of the sealing mold 15.
In other words, by simply changing the type of the lead frame 4 with one type of sealing die 15, a molded product 21 without warpage can be manufactured, and the investment in the sealing die can be made without producing a new sealing die. It is possible to produce a wide variety of resin-encapsulated semiconductor devices with a short delivery time.

【0041】図3に本実施の形態に係る樹脂封止型半導
体装置に用いられるリードフレーム変形形態を示す。図
2と同様にリードフレーム4の外枠9には、モールドラ
イン近傍まで、またチップ搭載領域Rcpの1辺の長さ
に相当する開口部10が設けられていて、封止樹脂7は
この開口部10まで充填される。よって封止樹脂7に対
するリードフレーム4の接触面積が低減される。従っ
て、成形品21の反りに大きく起因するリードフレーム
4と封止樹脂7の熱収縮量の差は阻止できる。更にリー
ドフレーム4の連結部A11の延長線上にスリット19
が設けられているので、特にワイヤーボンド工程等の高
温時の連結部A11の熱膨張によるリードフレーム自体
の熱変形がこのスリット19で吸収される。
FIG. 3 shows a modified lead frame used for the resin-sealed semiconductor device according to the present embodiment. As in FIG. 2, an opening 10 corresponding to the length of one side of the chip mounting region Rcp is provided in the outer frame 9 of the lead frame 4 up to the vicinity of the mold line. Filled up to part 10. Therefore, the contact area of the lead frame 4 with the sealing resin 7 is reduced. Therefore, it is possible to prevent a difference in the amount of heat shrinkage between the lead frame 4 and the sealing resin 7 largely caused by the warpage of the molded product 21. Further, a slit 19 is formed on the extension of the connecting portion A11 of the lead frame 4.
The slit 19 absorbs the thermal deformation of the lead frame itself due to the thermal expansion of the connecting portion A11 particularly at a high temperature such as a wire bonding step.

【0042】図4に、本実施の形態に係る成形品の加圧
例を示す。図4(a)に示すように封止工程で樹脂封止
された成形品21はタワー31に積層される。その後、
タワー31に一定量の成形品21をストックすると図4
(b)に示すように加圧蓋35にて積層した最端の成形
品21を押しタワー31に加圧蓋35を固定する。加圧
蓋35は積層した最端の成形品21の裏面側(表面側で
も構わない)に加圧プレート32が面接触し、加圧プレ
ート32と蓋34との間に設置されたばね33により発
生した所定の圧力で加圧プレート32とタワー31間の
積層された成形品21の全体を所定の圧力で加圧するこ
とができる。さらに、図4(c)に示すように図4
(b)で加圧した複数の成形品21をタワー31ごと硬
化炉17に入れ、所定時間加熱される。ここで、硬化炉
17のタワー31は横に向けた状態で置かれる。つま
り、加圧した成形品21を立てた状態で硬化炉17内に
入れられる。これは、成形品21自体に重量がありタワ
ー31の底面にある成形品21は積層した成形品21の
重量が積み重なり、タワー31の底面部と表面部の成形
品21に加わる圧力が異なってくるためである。
FIG. 4 shows an example of pressurizing a molded article according to the present embodiment. As shown in FIG. 4A, the molded article 21 sealed with resin in the sealing step is stacked on the tower 31. afterwards,
When a certain amount of molded product 21 is stocked in the tower 31, FIG.
As shown in (b), the endmost molded products 21 stacked by the pressure lid 35 are pushed, and the pressure lid 35 is fixed to the tower 31. The pressure lid 35 is generated by a spring 33 provided between the pressure plate 32 and the lid 34, with the pressure plate 32 being in surface contact with the back side (or the front side) of the laminated endmost molded product 21. The entire molded article 21 between the pressure plate 32 and the tower 31 can be pressed at a predetermined pressure with the predetermined pressure. Further, as shown in FIG.
The plurality of molded articles 21 pressurized in (b) are put into the curing furnace 17 together with the tower 31 and heated for a predetermined time. Here, the tower 31 of the curing furnace 17 is placed sideways. That is, the pressurized molded product 21 is put into the curing furnace 17 in a state of standing. This is because the molded product 21 itself has a weight and the molded product 21 on the bottom surface of the tower 31 is stacked with the weight of the laminated molded product 21, and the pressure applied to the molded product 21 on the bottom surface portion and the surface portion of the tower 31 is different. That's why.

【0043】これらの構成により、複数の成形品21を
一定の圧力にて加熱でき、生産性を向上させ反りのない
品質の良い樹脂封止型半導体装置を製造することができ
る。
With these configurations, a plurality of molded products 21 can be heated at a constant pressure, and a high-quality resin-encapsulated semiconductor device with no warpage can be manufactured with improved productivity.

【0044】上記実施の形態による本発明の樹脂封止型
半導体装置の製造方法によると、半導体チップが接合さ
れたリードフレームに対して封止金型内で封止シートを
介在させ、多数の半導体チップを封止金型の共通のキャ
ビティ凹部内で樹脂封止する際に、リードフレームに設
置された開口部に封止樹脂を充填させて成形品の反りを
低減させ、さらにポストキュア時に成形品を加圧し、そ
の成形品の反りをなくすことで裏面側に突出した外部電
極を有しながら品質の良いかつ、生産性の高い樹脂封止
型半導体装置の製造方法を提供することができる。ま
た、本発明のリードフレームによると、上記樹脂封止型
半導体装置の製造方法の実施に適したリードフレームを
提供することができるなお、前記実施の形態の封止シー
ト6は、基材としてポリイミド系のフィルムあるいは銅
またはアルミニウム等の導電性金属を用いたが、ポリエ
チレンテレフタレート、ポリカーボネート等を主成分と
する樹脂、またはステンレスもしくは鉄を含む導電性金
属でもよい。封止シート6の接着剤は、シリコン系接着
剤を用いたが、フェノール系またはエポキシ系の接着剤
でもよく、加熱圧着されてリードフレーム4または基板
に貼り付けられる。そして、少なくとも封止後にリード
フレームまたは基板から封止シート6を取り除く。な
お、基板についても樹脂バリの発生する形状、例えば穴
などが存在しても封止シート6を用いて、樹脂バリを防
止できる。
According to the method of manufacturing a resin-encapsulated semiconductor device of the present invention according to the above embodiment, a large number of semiconductors are interposed in a sealing die with respect to a lead frame to which a semiconductor chip is joined. When the chip is sealed with resin in the common cavity recess of the sealing mold, the opening provided in the lead frame is filled with sealing resin to reduce the warpage of the molded product, and the molded product during post cure By pressurizing the molded product to eliminate the warpage of the molded product, it is possible to provide a method of manufacturing a resin-encapsulated semiconductor device having high quality and high productivity while having external electrodes protruding to the rear surface side. Further, according to the lead frame of the present invention, it is possible to provide a lead frame suitable for carrying out the above-mentioned method of manufacturing a resin-sealed semiconductor device. Although a system film or a conductive metal such as copper or aluminum was used, a resin containing polyethylene terephthalate or polycarbonate as a main component, or a conductive metal containing stainless steel or iron may be used. As the adhesive for the sealing sheet 6, a silicon-based adhesive is used, but a phenol-based or epoxy-based adhesive may be used, and the sealing sheet 6 is heated and pressed to be attached to the lead frame 4 or the substrate. Then, the sealing sheet 6 is removed from the lead frame or the substrate at least after the sealing. The sealing sheet 6 can be used to prevent resin burrs even if the substrate has a shape in which resin burrs occur, for example, holes.

【0045】[0045]

【発明の効果】請求項1記載の樹脂封止型半導体装置の
製造方法によれば、モールドライン近傍まで設けられた
開口部まで封止樹脂が充填されるため、リードフレーム
と封止樹脂との熱収縮差による成形品の反り量が緩和さ
れる。さらにポストキュア工程で封止金型内での成形品
加圧保持状態(封止樹脂充填後のキュア保圧)と同様に
成形品の表面側及び裏面側から加圧しながら樹脂の加熱
硬化を行う為、成形品の反りが更に低減される。また封
止金型に設けられた共通のキャビティ凹部内に多数の樹
脂封止型半導体装置が形成されるが、第3の工程で封止
シートを使用する事によって、信号接続用端子の裏面へ
の樹脂バリの形成は阻止される。更に封止シートが信号
接続用端子の下部より封止樹脂側に食い込む形となるの
で信号接続用端子の下部を外部電極として使用する際の
スタンドオフも確保される。よって成形品の反りに起因
する樹脂封止型半導体装置のクラックなどの品質不良が
阻止され、切断工程を容易、迅速にでき、更に製造工程
の簡素化を図りつつ、裏面側に突出した樹脂バリのない
電極を有しながら、生産性の高く品質の良い樹脂封止型
半導体装置の製造方法を提供する事ができる。
According to the method for manufacturing a resin-encapsulated semiconductor device according to the first aspect of the present invention, the sealing resin is filled up to the opening provided near the mold line. The warpage of the molded article due to the difference in heat shrinkage is reduced. Further, in the post-cure step, the resin is heat-cured while being pressed from the front side and the back side of the molded product in the same manner as in the pressurized state of the molded product in the sealing mold (cure pressure after filling the sealing resin). Therefore, the warpage of the molded product is further reduced. A large number of resin-encapsulated semiconductor devices are formed in a common cavity recess provided in the encapsulation mold. However, by using an encapsulation sheet in the third step, the back surface of the signal connection terminal can be formed. Is prevented from forming. Further, since the sealing sheet is formed to bite into the sealing resin side from the lower part of the signal connection terminal, a stand-off when the lower part of the signal connection terminal is used as an external electrode is also ensured. Therefore, quality defects such as cracks of the resin-encapsulated semiconductor device due to warpage of the molded product are prevented, and the cutting process can be performed easily and quickly. Further, the resin burr protruding to the rear surface side can be simplified while simplifying the manufacturing process. It is possible to provide a method of manufacturing a resin-encapsulated semiconductor device with high productivity and high quality, while having electrodes without defects.

【0046】請求項2記載の樹脂封止型半導体装置の製
造方法によれば、請求項1と同様な効果のほか、多数の
半導体チップを共通のキャビティ凹部内で封止しなが
ら、各信号接続用端子のスタンドオフの確保と信号接続
用端子の裏面の樹脂バリ防止ができる。またこれらスタ
ンドオフの確保と樹脂バリ防止の役目を持つ封止シート
基材及び接着剤の材質を目的、機能およびコストの観点
から任意に組み合わせて選択することができる。例えば
導電性金属基材は第4の工程で成形品の裏面から封止シ
ートを剥す際、封止シートの基材は導電性金属のため、
貼付したフレームが樹脂基板であっても電解剥離法が使
用でき、確実に成形品から封止シートを剥す事ができ
る。更に剥がした後の封止シートの基材は金属なので
としてリサイクル可能であり、環境に優しくまた樹脂
封止型半導体装置の製造コストも低減できる。また樹脂
系基材は導電性金属基材に対して弾性率が大きいため少
ない圧着力で信号接続用端子に食い込みさせやすくスタ
ンドオフ確保が容易である。
According to the method of manufacturing a resin-encapsulated semiconductor device of the second aspect, in addition to the same effects as those of the first aspect, each signal connection is performed while many semiconductor chips are sealed in a common cavity recess. It is possible to secure the stand-off of the terminal for signal and prevent resin burr on the back surface of the terminal for signal connection. Further, the materials of the sealing sheet base material and the adhesive having the role of securing the stand-off and preventing the resin burr can be arbitrarily combined and selected from the viewpoints of the purpose, function and cost. For example, when the conductive metal substrate peels the sealing sheet from the back surface of the molded article in the fourth step, the base material of the sealing sheet is a conductive metal,
Even if the attached frame is a resin substrate, the electrolytic peeling method can be used, and the sealing sheet can be reliably peeled off from the molded product. Waste Since substrate of the sealing sheet metal after peeling off further
It is recyclable as a material , is environmentally friendly, and can reduce the manufacturing cost of the resin-encapsulated semiconductor device. Further, since the resin base material has a large elastic modulus with respect to the conductive metal base material, the resin base material can easily bite into the signal connection terminal with a small pressing force, and it is easy to secure the stand-off.

【0047】請求項3記載の樹脂封止型半導体装置の製
造方法によれば、請求項1または請求項2と同様な効果
がある。
According to the method of manufacturing a resin-sealed semiconductor device according to the third aspect, the same effects as those of the first or second aspect can be obtained.

【0048】請求項4記載の樹脂封止型半導体装置の製
造方法によれば、請求項1と同様な効果のほか、加熱硬
化で樹脂が架橋した安定した状態になっているので、剥
がし時に成形品を溶剤などに浸漬し封止シートを膨潤、
または溶解させる方法が採用しやすくなり、より確実に
容易に成形品から封止シートを剥がすことができる。ま
た、製造工程順序の自由度が増し、製造方法を設備状況
などに応じて任意に選択する事ができる。
According to the method for manufacturing a resin-encapsulated semiconductor device of the fourth aspect, in addition to the same effects as those of the first aspect, since the resin is in a stable state in which the resin is cross-linked by heat curing, it is formed at the time of peeling. Swell the sealing sheet by immersing the product in a solvent, etc.
Alternatively, a method of dissolving is easily adopted, and the sealing sheet can be more reliably and easily peeled off from the molded product. In addition, the degree of freedom in the order of the manufacturing steps is increased, and the manufacturing method can be arbitrarily selected according to the equipment status.

【0049】請求項5記載の樹脂封止型半導体装置の製
造方法によれば、請求項1と同様な効果のほか、構造が
いたって単純な加圧方式のタワーを製作でき、さらに加
圧方式のタワーを準備するだけで、既存の封止設備やポ
ストキュア設備を改造せずに済み、反りの少ない成形品
を大量に量産でき、高品質で安価な樹脂封止型半導体装
置を製造できる。
According to the method of manufacturing a resin-encapsulated semiconductor device of the fifth aspect, in addition to the same effects as those of the first aspect, a tower having a simple structure and a simple pressurizing method can be manufactured. By simply preparing a tower, existing sealing equipment and post-cure equipment do not need to be modified, mass production of molded products with less warpage can be achieved, and high-quality and inexpensive resin-encapsulated semiconductor devices can be manufactured.

【0050】請求項6記載の樹脂封止型半導体装置の製
造方法によれば、請求項1または請求項5と同様な効果
のほか、成形品自体の重量による加圧量の変動を無視す
ることができ、タワーに積層した成形品の表面側と底面
側との加圧量の違いが無く、反り量の少ない安定した成
形品を生産でき、高品質な樹脂封止型半導体装置を製造
できる。
According to the method of manufacturing a resin-encapsulated semiconductor device of the sixth aspect, in addition to the same effects as those of the first or fifth aspect, the variation in the amount of pressurization due to the weight of the molded product itself is ignored. Thus, there is no difference in the amount of pressure between the front side and the bottom side of the molded product laminated on the tower, a stable molded product with a small amount of warpage can be produced, and a high-quality resin-encapsulated semiconductor device can be produced.

【0051】請求項7記載の樹脂封止型半導体装置のリ
ードフレームによれば、モールドライン近傍まで設けら
れた開口部まで封止樹脂が充填されるため、リードフレ
ームと封止樹脂との熱収縮差による成形品の反り量が緩
和される。更にリードフレーム連結部の延長線上にスリ
ットが設けられているので、特にワイヤーボンド工程等
の高温時の連結部の熱膨張によるリードフレーム自体の
熱変形がこのスリットで吸収される。また開口部をモー
ルドラインよりも外に大きく開口したため、確実にリー
ドフレームと封止樹脂の接触部が減少でき、かつリード
フレームの板厚分のみの封止樹脂量のみで済み、高品質
かつ経済的に成形品の反り量が緩和できる。
According to the lead frame of the resin-encapsulated semiconductor device of the present invention, since the sealing resin is filled up to the opening provided near the mold line, the heat shrinkage of the lead frame and the sealing resin is caused. The warpage of the molded product due to the difference is reduced. Further, since the slit is provided on the extension of the lead frame connecting portion, thermal deformation of the lead frame itself due to thermal expansion of the connecting portion at a high temperature such as a wire bonding step is absorbed by the slit. In addition, since the opening is larger than the mold line, the contact area between the lead frame and the sealing resin can be reliably reduced, and only the amount of the sealing resin corresponding to the thickness of the lead frame is required, resulting in high quality and economy. The amount of warpage of the molded product can be alleviated.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施の形態に係る樹脂封止型半導体
装置の製造工程を順に示す説明図である。
FIGS. 1A to 1C are explanatory diagrams sequentially showing manufacturing steps of a resin-sealed semiconductor device according to an embodiment of the present invention.

【図2】本発明の一実施の形態に係る樹脂封止型半導体
装置に用いられるリードフレームを示し、(a)は一部
を簡略して全体を示す平面図、(b)はその一部を拡大
した図、(c)は(b)と同様な図であるが別の形態を
示す図である。
FIGS. 2A and 2B show a lead frame used in a resin-sealed semiconductor device according to an embodiment of the present invention, wherein FIG. FIG. 3 (c) is a view similar to FIG. 3 (b), but showing another embodiment.

【図3】本発明の他の実施の形態に係る樹脂封止型半導
体装置に用いられるリードフレームの部分拡大平面図で
ある。
FIG. 3 is a partially enlarged plan view of a lead frame used in a resin-sealed semiconductor device according to another embodiment of the present invention.

【図4】本発明の他の実施の形態に係る成形品の加圧例
を示し、(a)はタワーに成形品を挿入する状態の断面
図、(b)は加圧状態の断面図、(c)は加圧加熱状態
の断面図である。
4A and 4B show an example of pressurizing a molded product according to another embodiment of the present invention, wherein FIG. 4A is a cross-sectional view of a state where the molded product is inserted into a tower, FIG. (C) is a cross-sectional view of the pressurized and heated state.

【図5】従来の樹脂封止型半導体装置の製造方法を順に
示す説明図である。
FIG. 5 is an explanatory view sequentially showing a method of manufacturing a conventional resin-encapsulated semiconductor device.

【符号の説明】[Explanation of symbols]

1 信号接続用端子 2 半導体チップ 3 ダイパッド 4 リードフレーム 5 金属細線 6 封止シート 7 封止樹脂 8 吊りリード 9 外枠 10 開口部 11 連結部A 12 連結部B 13 サポート 14 キャビティ凹部 15 封止金型 16 パーティング面 17 硬化炉 18 押え治具 19 スリット 20 被成形品 21 成形品 31 タワー 32 加圧プレート 33 ばね 34 蓋 35 加圧蓋 DESCRIPTION OF SYMBOLS 1 Signal connection terminal 2 Semiconductor chip 3 Die pad 4 Lead frame 5 Fine metal wire 6 Sealing sheet 7 Sealing resin 8 Suspension lead 9 Outer frame 10 Opening 11 Connecting part A 12 Connecting part B 13 Support 14 Cavity recess 15 Sealing metal Mold 16 Parting surface 17 Curing furnace 18 Holding jig 19 Slit 20 Molded product 21 Molded product 31 Tower 32 Press plate 33 Spring 34 Cover 35 Press cover

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H01L 23/50 H01L 23/50 B 25/10 25/14 Z 25/11 25/18 (72)発明者 松尾 隆広 大阪府高槻市幸町1番1号 松下電子工業 株式会社内 Fターム(参考) 4M109 AA01 BA01 CA21 DA02 5F061 AA01 BA01 CA21 CA24 EA01 5F067 AA06 AA07 AA09 AB03 BA02 BD05 BD10 DB01 DE01 DF17──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H01L 23/50 H01L 23/50 B 25/10 25/14 Z 25/11 25/18 (72) Inventor Takahiro Matsuo 1-1, Yukicho, Takatsuki-shi, Osaka Matsushita Electronics Corporation F term (reference) 4M109 AA01 BA01 CA21 DA02 5F061 AA01 BA01 CA21 CA24 EA01 5F067 AA06 AA07 AA09 AB03 BA02 BD05 BD10 DB01 DE01 DF17

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】 半導体チップを搭載するためのダイパッ
ドおよび信号接続用端子を有する複数のチップ搭載領域
と、この複数のチップ搭載領域同士の間に設けられた連
結部と、前記複数のチップ搭載領域の外周部から所定の
モールドライン近傍まで設けられた開口部とを備えたリ
ードフレームを準備する第1の工程と、 前記複数のチップ搭載領域に前記半導体チップを搭載
し、前記半導体チップの電極パッドと前記信号接続用端
子とを電気的に接続して被成形品を形成する第2の工程
と、 封止用金型のキャビティ凹部に対向する金型面と前記リ
ードフレームの裏面との間に封止シートを介在させた状
態で、前記キャビティ凹部に前記各半導体チップが入り
込むように前記被成形品を前記封止用金型にセットした
後に、前記キャビティ凹部内に樹脂を充填し、前記リー
ドフレームの前記開口部まで封止する第3の工程と、 前記封止用金型から成形品を取出し前記封止シートを前
記成形品の裏面から剥す第4の工程と、 前記成形品の表面および裏面側から加圧しながら、樹脂
を加熱硬化させる第5の工程と、 前記樹脂の硬化が完了した成形品を切断する第6の工程
とを含む樹脂封止型半導体装置の製造方法。
A plurality of chip mounting regions each having a die pad for mounting a semiconductor chip and a signal connection terminal; a connecting portion provided between the plurality of chip mounting regions; and a plurality of chip mounting regions. A first step of preparing a lead frame having an opening provided from an outer peripheral portion to a vicinity of a predetermined mold line, and mounting the semiconductor chip on the plurality of chip mounting areas, and providing electrode pads of the semiconductor chip. A second step of electrically connecting the signal connection terminal and the signal connection terminal to form a molded product; and between a mold surface facing the cavity recess of the sealing mold and the back surface of the lead frame. In a state where the sealing sheet is interposed, the molded article is set in the sealing mold so that the respective semiconductor chips enter the cavity recesses, and then set in the cavity recesses. A third step of filling with grease and sealing up to the opening of the lead frame; a fourth step of taking out a molded product from the sealing mold and peeling the sealing sheet from the back surface of the molded product; A resin-sealed semiconductor device comprising: a fifth step of heating and curing a resin while applying pressure from the front and back surfaces of the molded article; and a sixth step of cutting the molded article after the resin has been cured. Manufacturing method.
【請求項2】 第3の工程における封止シートは、ポリ
イミド、ポリエチレンテレフタレート、ポリカーボネー
ト等を主成分とする樹脂、または銅、アルミニウム、ス
テンレスもしくは鉄を含む導電性金属である請求項1記
載の樹脂封止型半導体装置の製造方法。
2. The resin according to claim 1, wherein the sealing sheet in the third step is a resin containing polyimide, polyethylene terephthalate, polycarbonate or the like as a main component, or a conductive metal containing copper, aluminum, stainless steel or iron. A method for manufacturing a sealed semiconductor device.
【請求項3】 第3の工程における封止シートの接着剤
は、シリコーン系、フェノール系またはエポキシ系の接
着剤であり、加熱圧着されリードフレームまたは基板に
貼り付けられる請求項1または請求項2記載の樹脂封止
型半導体装置の製造方法。
3. The adhesive of the sealing sheet in the third step is a silicone-based, phenol-based or epoxy-based adhesive, and is heat-pressed and attached to a lead frame or a substrate. The manufacturing method of the resin-sealed semiconductor device according to the above.
【請求項4】 請求項1記載の樹脂封止型半導体装置の
製造方法において、第3の工程後に封止金型から成形品
を取出し成形品の表面および裏面側から加圧しながら樹
脂を加熱硬化させる第5の工程を行い、その後に、封止
シートを成形品の裏面から剥す第4の工程を行う樹脂封
止型半導体装置の製造方法。
4. The method for manufacturing a resin-encapsulated semiconductor device according to claim 1, wherein after the third step, a molded product is taken out from the sealing mold and the resin is heat-cured while being pressed from the front and back surfaces of the molded product. A method of manufacturing a resin-encapsulated semiconductor device, comprising: performing a fifth step of performing a fifth step of removing the sealing sheet from the back surface of the molded product.
【請求項5】 第5の工程において複数の成形品をタワ
ー内に積層し、積層した最端の成形品を加圧蓋で押さ
え、積層した成形品の全てを加圧する請求項1記載の樹
脂封止型半導体装置の製造方法。
5. The resin according to claim 1, wherein in the fifth step, a plurality of molded products are laminated in the tower, the laminated endmost molded product is pressed with a pressure lid, and all of the laminated molded products are pressurized. A method for manufacturing a sealed semiconductor device.
【請求項6】 第5の工程において複数の成形品を立て
た状態で加圧する請求項1または請求項5記載の樹脂封
止型半導体装置の製造方法。
6. The method of manufacturing a resin-encapsulated semiconductor device according to claim 1, wherein in the fifth step, a plurality of molded products are pressurized in an upright state.
【請求項7】 半導体チップを搭載するためのダイパッ
ドおよび信号接続用端子を有する複数のチップ搭載領域
と、この複数のチップ搭載領域同士の間に設けられた連
結部と、前記複数のチップ搭載領域の外周部から所定の
モールドライン近傍まで設けられた開口部とを備えたリ
ードフレームであって、前記連結部の延長線上の前記リ
ードフレームの外枠に設けられた熱応力緩和用のスリッ
トを有し、前記開口部は前記複数のチップ搭載領域の外
周部から前記モールドラインよりも外に大きく開口する
ことを特徴とするリードフレーム。
7. A plurality of chip mounting areas having a die pad and a signal connection terminal for mounting a semiconductor chip, a connecting portion provided between the plurality of chip mounting areas, and the plurality of chip mounting areas. And an opening provided from the outer peripheral portion of the lead frame to the vicinity of a predetermined mold line, comprising a slit for reducing thermal stress provided in an outer frame of the lead frame on an extension of the connecting portion. The lead frame is characterized in that the opening is larger than the mold line from the outer periphery of the plurality of chip mounting areas.
JP19756199A 1999-07-12 1999-07-12 Manufacturing method of resin-encapsulated semiconductor device and intermediate of semiconductor device Expired - Lifetime JP4205260B2 (en)

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CN100388485C (en) * 2003-03-05 2008-05-14 三洋电机株式会社 Resin-sealed semiconductor device and manufacturing method thereof
JP2009170679A (en) * 2008-01-17 2009-07-30 Fujitsu Microelectronics Ltd Substrate holding carrier, substrate attaching / detaching method, and substrate attaching / detaching apparatus
JP2010080971A (en) * 2009-11-25 2010-04-08 Dainippon Printing Co Ltd Resin sealed semiconductor device and production method thereof
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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6800508B2 (en) * 2000-04-25 2004-10-05 Torex Semiconductor Ltd Semiconductor device, its manufacturing method and electrodeposition frame
WO2002075809A1 (en) * 2001-03-21 2002-09-26 Tomoegawa Paper Co., Ltd. Mask sheet for assembling semiconductor device and method for assembling semiconductor device
CN100388485C (en) * 2003-03-05 2008-05-14 三洋电机株式会社 Resin-sealed semiconductor device and manufacturing method thereof
JP2004319824A (en) * 2003-04-17 2004-11-11 Dainippon Printing Co Ltd Resin-sealed semiconductor device and method of manufacturing the same
JP2009170679A (en) * 2008-01-17 2009-07-30 Fujitsu Microelectronics Ltd Substrate holding carrier, substrate attaching / detaching method, and substrate attaching / detaching apparatus
JP2010080971A (en) * 2009-11-25 2010-04-08 Dainippon Printing Co Ltd Resin sealed semiconductor device and production method thereof
JP2010212715A (en) * 2010-04-28 2010-09-24 Nitto Denko Corp Lead frame laminate and manufacturing method for semiconductor device
CN110034024A (en) * 2018-01-10 2019-07-19 株式会社迪思科 The manufacturing method of package substrate
JP2019121722A (en) * 2018-01-10 2019-07-22 株式会社ディスコ Manufacturing method of package substrate
CN113410292A (en) * 2020-03-16 2021-09-17 株式会社东芝 Semiconductor device with a plurality of semiconductor chips

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