JP2000277038A - Method and device for forming film on glass panel for cathode ray tube - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a method and a device for forming a film on a glass panel for a cathode ray tube capable of providing a film of uniform thickness by a thermal CVD method. SOLUTION: A glass panel 1 for a cathode ray tube having a face part 2 on which an image is projected is heated up to a prescribed temperature, and when forming a film 9 by a thermal CVD method spraying film forming gas 5 on the surface 2a of the face part 2 of the glass panel 1 for the cathode ray tube in a film forming chamber 10, the film forming gas 5a after being sprayed is evacuated sideward or downward form the periphery 2b of the face part 2 of the glass panel 1 for the cathode ray tube.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat CV on a surface of a face portion on which an image of a glass panel for a cathode ray tube is projected.
The present invention relates to a film forming method and a film forming apparatus for forming a film by a method D.

[0002]

2. Description of the Related Art In general, a cathode ray tube used for a display device such as a monitor is provided with an antireflection film or an antistatic film so that static electricity is not accumulated on a front surface of a panel which is a display surface. Conventionally, as shown in FIG. 3, heat C is applied to the surface 2a of the face portion 2 on which an image of the glass panel 1 for a cathode ray tube is projected.
In the case where the antistatic film 4 is formed by the VD method, the glass panel 1 for a cathode ray tube is heated to a predetermined temperature while being transported through the heating furnace 12 by being placed on the transport means 11, and then introduced into the deposition chamber 10. A film forming apparatus is used in which a film forming gas 5 is sprayed from an outlet 7a of a film forming gas nozzle 7 in a chamber 10 to form an antistatic film 4 having a thickness of about 20 to 30 nm on the surface 2a of the glass panel 1 for a cathode ray tube. Have been.

In the case of the above-mentioned conventional film forming apparatus, the film forming gas 5a blown from the film forming gas nozzle 7 and used for forming the antistatic film 4 is exhausted at a position adjacent to the film forming gas nozzle 7. The air is exhausted from the suction port 8 a of the duct 8 to a position directly above the surface 2 a of the face portion 2.

[0004]

Recently, it has been required that a cathode ray tube not only has anti-reflection and anti-static properties but also shields an electromagnetic wave which adversely affects the human body. An electromagnetic wave shielding film is formed on the surface 2a of the glass panel 1 for a cathode ray tube. 9 has become necessary. Since such an electromagnetic wave shielding film 9 is required to have higher conductivity than the antistatic film 4, it is necessary to have a film thickness about 4 to 5 times that of the antistatic film 4. However, when the electromagnetic wave shielding film 9 is formed on the surface 2a of the glass panel 1 for a cathode ray tube by the thermal CVD method using the above film forming apparatus, the following problem occurs.

In the above-described film forming apparatus, the film forming gas 5a sprayed onto the surface 2a of the glass panel 1 for a cathode ray tube and used for forming the electromagnetic wave shielding film 9 is exhausted directly above the surface 2a of the face portion 2. In the case where the high film-forming body such as the glass panel 1 for a cathode ray tube is intermittently conveyed below the outlet 7a of the film forming gas nozzle 7 at a predetermined interval by the conveying means 11, In addition, a large turbulence occurs in the gas flow of the film forming gas 5 sprayed on the surface 2a at the space between the cathode ray tube glass panels 1.
Such a turbulence of the gas flow of the film forming gas 5 is not immediately stabilized on the surface 2a of the glass panel 1 for a cathode ray tube, the concentration of the film forming gas 5 becomes unstable, and a portion of the face portion 2 is generated by a thermal CVD reaction. Differences in the amount of membrane constituents
Since the film thickness changes, the electromagnetic wave shielding film 9 having a uniform thickness on the surface 2a cannot be formed. In the case of a cathode ray tube using the glass panel 1 for a cathode ray tube on which the electromagnetic wave shielding film 9 having such a difference in film thickness is formed, the surface 2a of the face portion 2 on which an image is projected is caused by an interference effect of light.
For example, there is a problem that if the thickness is partially increased by 10%, a bluish-violet color pattern is generated, and if the thickness is reduced by 10%, a reddish color pattern is generated, so that a desired image quality cannot be obtained and the commercial value is lost.

Further, the film forming gas 5a after being sprayed
In the film forming apparatus described above, the electromagnetic wave shielding film is formed around the suction port 8a of the exhaust duct 8 as the operation time of the film forming apparatus elapses. Since a film having the same composition as that of No. 9 is deposited and falls on the surface 2a of the glass panel 1 for a cathode ray tube after a long time, there is a problem that the inside of the film forming chamber 10 needs to be frequently cleaned.

An object of the present invention is to provide a film forming method and a film forming apparatus for a glass panel for a cathode ray tube, which solve the above conventional problems.

[0008]

According to the method of forming a film of a glass panel for a cathode ray tube according to the present invention, a glass panel for a cathode ray tube having a face on which an image is projected is heated to a predetermined temperature to form the glass panel for a cathode ray tube. Introduced into the membrane chamber,
In the film forming method for a glass panel for a cathode ray tube, wherein a film forming gas is blown onto the surface of the face portion of the glass panel for a cathode ray tube to form a film by a thermal CVD method, the film forming gas after being sprayed is applied to the glass panel for a cathode ray tube. It is characterized in that air is exhausted laterally or downward from the peripheral edge of the face portion.

Further, the film forming apparatus for a glass panel for a cathode ray tube according to the present invention comprises a conveying means for conveying the glass panel for a cathode ray tube having a face on which an image is projected, and a glass panel for a cathode ray tube provided so as to cover the conveying means. A heating furnace for heating the glass panel to a predetermined temperature, a film-forming gas nozzle connected to a film-forming gas preparation device for spraying a film-forming gas onto the surface of the face of the glass panel for a cathode-ray tube, and loading at least the glass panel for the cathode-ray tube of the film-forming gas nozzle A film forming chamber having an inert gas nozzle disposed on the side and blowing out an inert gas, and a film forming apparatus for a CRT glass panel for forming a film on a face portion surface of a CRT glass panel by a thermal CVD method. The film forming chamber has a suction port in the space beside or below the peripheral part of the face of the glass panel for a cathode ray tube. Characterized in that it comprises an exhaust duct for exhausting the film forming gas that has blown.

[0010]

According to the method and apparatus for forming a film on a glass panel for a cathode ray tube of the present invention, the sprayed film forming gas is exhausted laterally or downwardly from the periphery of the face of the glass panel for a cathode ray tube. Even when the glass panel for a cathode ray tube is intermittently conveyed at intervals when the film is formed, the gas flow of the film forming gas is always stable without being disturbed, and the concentration is constant over the entire surface of the face portion. A stable film forming gas can be sprayed evenly.

[0011]

FIG. 1 is an explanatory view of a film forming apparatus for a glass panel for a cathode ray tube according to the present invention, wherein 1 is a glass panel for a cathode ray tube, 2 is a substantially rectangular face portion on which an image is projected. 3, a skirt portion extending from the entire circumference of the face portion 2 to form a side wall, 5 a film forming gas, 6 a preparation device for preparing the film forming gas 5, and 7 a film forming gas 5 blowing. A film forming gas nozzle for forming the electromagnetic wave shielding film 9 is attached, 8 is an exhaust duct, 10 is a film forming chamber, 11 is a conveying means for introducing the glass panel 1 for a cathode ray tube into the film forming chamber 10, and 12 is a film forming film. A heating furnace for heating the glass panel 1 for a cathode ray tube introduced into the chamber 10 to a predetermined temperature, 13 is an inert gas, 14 and 15 are inert gas nozzles for blowing out the inert gas 13, and 16 is an electromagnetic wave shielding film 9. Formed high temperature glass panel for cathode ray tube 1 shows respectively annealing furnace for annealing the respectively show the same reference numerals in FIG. 3 the same parts as supra.

In the present invention, a glass panel 1 for a cathode ray tube on which an electromagnetic wave shielding film 9 is formed has a face portion 2 having a substantially rectangular surface 2a on which an image is projected, and a face portion 2 having a substantially rectangular surface 2a.
And a skirt portion 3 extending from a peripheral edge 2b of the skirt portion 3 and constituting a side wall.

In the apparatus for forming a film of a glass panel for a cathode ray tube according to the present invention, the glass panel for a cathode ray tube 1 is transported by a transporting unit 11 of a heat-resistant specification. The glass panel 1 for a cathode ray tube is heated to a predetermined temperature while being conveyed in a heating furnace 12 provided so as to cover the glass panel 1 for a cathode ray tube, and the glass panel 1 for a cathode ray tube at a predetermined temperature is introduced into the film forming chamber 10. I have. The film forming chamber 10 is provided so as to cover the transporting means 11, is connected to the film forming gas 5 preparing device 6, and blows the film forming gas 5 from the outlet 7 a to the glass panel 1 for a cathode ray tube; Inert gas nozzles 14, 15 provided on the carry-in side and carry-out side of the cathode ray tube glass panel 1 for blowing out the inert gas 13 when viewed from the position of the film forming gas nozzle 7, and the periphery 2b of the face portion 2 of the cathode ray tube glass panel 1. Suction port 8 in the space beside or below
and an exhaust duct 8 for exhausting the film-forming gas 5a which has been sprayed with a. In the film forming chamber 10, a film forming gas 5 is sprayed on the face portion 2 of the glass panel 1 for a cathode ray tube at a predetermined temperature to form an electromagnetic wave shielding film 9 on the surface 2a by a thermal CVD method. .
Glass panel 1 for cathode ray tube on which electromagnetic wave shielding film 9 is formed
Is cooled slowly in a slow cooling furnace 16 provided so as to cover the transport means 11 so that unnecessary distortion does not remain, and then is carried out to the next step.

As the transfer means 11, a heat-resistant steel conveyor or the like which can repeatedly withstand temperatures exceeding 500 ° C. at maximum and does not generate dust can be used.

The heating furnace 12 is made of a heat-resistant material which does not generate dust and can be heated to a temperature exceeding about 500 ° C. before the glass panel 1 for a cathode ray tube is introduced into the film forming chamber 10. It is possible.

The interior of the preparation device 6 is set to an appropriate temperature in the range of 200 to 300 ° C. by an electric heater or the like. When a predetermined flow rate of a dimethyldichlorotin solution 17 is supplied via a pump 18, It is going to evaporate.
Further, a pipe for supplying clean air as a carrier gas 19 is connected to the preparation device 6, and dimethyldichlorotin vaporized in the preparation device 6 is mixed with the carrier gas 19 to form a film having a predetermined concentration. The gas 5 is prepared, and is pressure-fed to the film-forming gas nozzle 7 through a heated pipe.

The film forming gas nozzle 7 is made of a heat-resistant material that does not generate dust, and the outlet 7a is positioned at an appropriate position within a range of about 10 to 100 mm from the highest surface of the face portion 2 of the glass panel 1 for a cathode ray tube. Are located in

As shown in FIG. 2A, as the exhaust duct 8, a suction port 8a is arranged in a space below the peripheral edge 2b of the face portion 2 of the glass panel 1 for a cathode ray tube conveyed by the conveying means 11. In addition, it is preferable that the film forming gas 5a after being blown is sucked downward from the peripheral edge 2b and exhausted. In the case where a plurality of cathode ray tube glass panels 1 are carried in parallel into the film forming chamber 10 to form a film, the film is formed as shown in FIG. An exhaust duct 8 for exhausting the film-forming gas 5a used for the formation from the peripheral edge 2b of the face portion 2 of the glass panel 1 for a cathode ray tube to the side.

The inert gas nozzles 14 and 15 are made of a heat-resistant material that does not generate dust.
The inert gas nozzle 14 arranged on the loading side of the glass panel 1 for a cathode ray tube becomes a predetermined high temperature in the heating furnace 12 to form the glass panel 1 for a cathode ray tube having high reactivity with the film forming gas 5. The film forming gas 5 sprayed from the film gas nozzle 7 is isolated so as not to contact the film forming gas 5 for a predetermined time or more, and is indispensable for controlling the film thickness. Further, by providing the inert gas nozzle 15 also on the discharge side of the glass panel 1 for a cathode ray tube, the contact time between the film forming gas 5 and the glass panel 1 for a cathode ray tube can be controlled more accurately, and the film thickness can be controlled. It will be easier.

The annealing furnace 16 is made of a heat-resistant material that does not generate dust. The annealing furnace 16 is provided on the unloading side of the film forming chamber 10 so as to cover the transfer means 11. The cooling is performed so that unnecessary distortion does not remain in the formed glass panel 1 for a cathode ray tube.

Next, the electromagnetic wave shielding film 9 made of SnO ₂ having a thickness of 100 nm is formed on the surface 2a of the face portion 2 of the glass panel 1 for a cathode ray tube by the film forming method of the present invention using the above film forming apparatus. Will be described.

In the film forming method of the present invention, first, as shown in FIG. 1, the glass panel 1 for a cathode ray tube is supplied to the supply section of the conveying means 11 with the skirt portion 3 facing downward.
The glass panel 1 for a cathode ray tube is heated to a predetermined temperature of about 500 ° C. at which a practical reaction rate with the film forming gas 5 can be obtained while being transported through a heating furnace 12 provided so as to cover the cathode ray tube 1.

Next, the glass panel 1 for a cathode ray tube at a predetermined temperature is introduced into the film forming chamber 10 and the inert gas nozzle 1
The film is conveyed through an air curtain of an inert gas 13 made of clean air blown out of the film forming chamber 10 under a blowout port 7 a of a film forming gas nozzle 7 attached to the upper center of the film forming chamber 10.

On the other hand, in the preparation device 6 maintained at 200 to 300 ° C., a dimethyldichlorotin solution 17 and a carrier gas 19 consisting of clean air are supplied at a predetermined flow rate, and the dimethyldichlorotin solution 17 is supplied. Vaporized from the carrier gas 19
Is adjusted to a predetermined concentration, and the adjusted film forming gas 5 is constantly flowing toward the film forming gas nozzle 7.

Under the film forming gas nozzle 7, the film forming gas 5 adjusted from the blowout port 7a is blown onto the surface 2a of the face portion 2 of the glass panel 1 for a cathode ray tube which is being conveyed at a constant speed to perform thermal CVD. generating a SnO ₂ by reaction to form an electromagnetic shielding film 9 having a film thickness of 100nm is deposited.

At the time of forming the film, the blown film forming gas 5a is directed sideward or downward from the peripheral edge 2b of the face portion 2 of the glass panel 1 for a cathode ray tube through the suction port 8a of the exhaust duct 8. Suction and exhaust. By evacuating in this way, the tall glass panel 1 for a cathode ray tube can be obtained.
Irrespective of the presence or absence of the gas, the film-forming gas 5a steadily flows laterally or downward from the position of the peripheral edge 2b, so that the turbulence of the gas flow in the film-forming gas 5 sprayed on the surface 2a of the face portion 2 The electromagnetic wave shielding film 9 having a uniform thickness is maintained on the glass panel 1 for a cathode ray tube, which is always transported at a constant speed, without causing a concentration.
Can be formed.

Next, the glass panel 1 for a cathode ray tube on which the electromagnetic wave shielding film 9 is formed is gradually cooled by transferring it through an annealing furnace 16 provided so as to cover the transfer means 11 so that unnecessary distortion does not remain. Out to the process.

The glass panel 1 for a cathode ray tube having the electromagnetic wave shielding film 9 formed by the film forming method of the present invention is as follows.
For example, the film thickness of the electromagnetic wave shielding film 9 is uniform at 100 nm ± 5 nm over the entire surface 2 a of the face portion 2, and realizes a sheet resistance value of 1000 Ω / □ or less. The electric field strength of the electromagnetic wave in the range of 2 kHz to 400 kHz at a position 30 cm away is also 1
V / m or less could be realized. The screen of the cathode ray tube manufactured using the glass panel 1 for a cathode ray tube includes:
No color pattern due to light interference was observed, and the desired image quality was obtained.

[0029]

According to the method and apparatus for forming a film of a glass panel for a cathode ray tube of the present invention, about 1% is obtained by a thermal CVD method.
A film having a thickness of 00 nm can be uniformly formed on the surface of the face portion on which an image is projected, and when a cathode ray tube is manufactured using a glass panel for a cathode ray tube on which the film is formed, a desired image quality is obtained. The resulting practically excellent effects are obtained.

[Brief description of the drawings]

FIG. 1 is an explanatory view of the present invention and is an overall view of a film forming apparatus for a glass panel for a cathode ray tube.

FIG. 2 is an enlarged explanatory view of a main part of the present invention, in which (A) is a film forming apparatus for exhausting the sprayed film forming gas downward from the periphery of the face of the glass panel for a cathode ray tube; B) is a film forming apparatus for exhausting the blown film forming gas laterally from the periphery of the face of the glass panel for a cathode ray tube.

FIG. 3 is an explanatory view of a conventional film forming apparatus for a glass panel for a cathode ray tube.

DESCRIPTION OF SYMBOLS 1 Glass panel for cathode ray tube 2 Face part 2a Surface 2b Perimeter 3 Skirt part 5, 5a Film forming gas 6 Preparer 7 Film forming gas nozzle 8 Exhaust duct 9 Electromagnetic wave shielding film 10 Film forming chamber 11 Transport means 12 Heating furnace 13 Inert gas 14, 15 Inert gas nozzle 16 Annealing furnace

Claims (2)

[Claims] 1. A cathode ray tube glass panel having a face on which an image is projected is heated to a predetermined temperature, the cathode ray tube glass panel is introduced into a film forming chamber, and a film is formed on the face of the cathode ray tube glass panel. In the method of forming a film for a cathode ray tube glass panel, wherein a film is formed by blowing a gas by a thermal CVD method, the sprayed film forming gas is exhausted laterally or downwardly from the periphery of the face portion of the cathode ray tube glass panel. A method for forming a film on a glass panel for a cathode ray tube, comprising: 2. A transport means for transporting a glass panel for a cathode ray tube having a face on which an image is projected, a heating furnace provided over the transport means for heating the glass panel for a cathode ray tube to a predetermined temperature, and a film forming gas. A film forming gas nozzle connected to the preparing device and spraying a film forming gas on the face portion surface of the glass panel for a cathode ray tube, and an inert gas nozzle which is disposed at least on the loading side of the glass panel for a cathode ray tube and blows out an inert gas. A film forming apparatus for a cathode ray tube glass panel, comprising: a film forming chamber having a film forming chamber, wherein a film is formed on a face portion surface of the cathode ray tube glass panel by a thermal CVD method. An exhaust duct for exhausting the film-forming gas after being sprayed with a suction port in the space below or below A film forming apparatus for a glass panel for a cathode ray tube.