[go: up one dir, main page]

JP2000058369A - Film capacitor - Google Patents

Film capacitor

Info

Publication number
JP2000058369A
JP2000058369A JP10222485A JP22248598A JP2000058369A JP 2000058369 A JP2000058369 A JP 2000058369A JP 10222485 A JP10222485 A JP 10222485A JP 22248598 A JP22248598 A JP 22248598A JP 2000058369 A JP2000058369 A JP 2000058369A
Authority
JP
Japan
Prior art keywords
plate
external
terminal
capacitor
metallikon
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10222485A
Other languages
Japanese (ja)
Other versions
JP2000058369A5 (en
Inventor
Kazuo Muroga
和夫 室賀
Kiichiro Nakamura
喜一郎 中村
Takao Yoshihara
孝雄 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lincstech Circuit Co Ltd
Original Assignee
Hitachi AIC Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi AIC Inc filed Critical Hitachi AIC Inc
Priority to JP10222485A priority Critical patent/JP2000058369A/en
Publication of JP2000058369A publication Critical patent/JP2000058369A/en
Publication of JP2000058369A5 publication Critical patent/JP2000058369A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain an film capacitor without encapsulation which can prevent crackings of external electrodes of the capacitor due to external stress or mechanical stress, after being fixedly mounted on a substrate to provide superior electrical connection reliability. SOLUTION: A capacitor element 6A includes a metallized plastic film element 3, first metallikon layers 8 and 9 which form first external electrodes 12 as provided on both end faces 7 of the element 3 and which contain 70% or more of aluminum alloy and 4% or more of Is, second metallikon layers 10 and 11 of Sn alloy formed on the first layers, and plate-like terminals 13A which are fittingly and integrally bonded onto the capacitor element 6A to form second external plate-like terminal electrodes 13. Through this, a high electrical connection reliability is obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は外装レスのフィルム
コンデンサに係り、特にコンデンサ素子上に一体化接合
する外部板状端子電極の構造に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an exterior-less film capacitor, and more particularly to a structure of an external plate-like terminal electrode integrally joined on a capacitor element.

【0002】[0002]

【従来の技術】近年、各種電子機器においては、高度な
パッケージング技術が急速に開発進展中につき、フィル
ムコンデンサに対しも、小形で柔軟性に優れかつ電気的
な接続信頼性の高いものが要求されている。以下、従来
技術の製造工程について、図11及び図12に基づき説
明する。
2. Description of the Related Art In recent years, with the rapid development and development of advanced packaging technologies in various electronic devices, small, flexible and highly reliable electrical connections are required for film capacitors. Have been. Hereinafter, a conventional manufacturing process will be described with reference to FIGS.

【0003】まず、図11に示すように、従来の技術の
フィルムコンデンサ40は、プラスチックフィルム24
にアルミニウム蒸着38して金属薄膜を形成し、この金
属薄膜を内部電極36とした金属化プラスチックフィル
ム37を用いて、重ね巻回し、この巻回したプラスチッ
ク素子24Aの上に外装プラスチックフィルム25を巻
回して両端面27にZn合金メタリコンからなる第1層
28を形成し、この第1層28上にハンダ合金メタリコ
ンからなる第2層29を形成して、この第2層29上に
Niメッキを施し第3層30を形成し、この第3層30
上にハンダメッキを施し、第4層31を形成してフィル
ムコンデンサの外部端子電極39とした構造のコンデン
サ素子26を形成し得、従来の技術に係るフィルムコン
デンサ40が得られている。
[0003] First, as shown in FIG.
A metal thin film is formed by vapor-depositing aluminum on the metal element, and the metal thin film is used as an internal electrode 36 to form a metal thin film. By turning, a first layer 28 made of a Zn alloy metallikon is formed on both end faces 27, a second layer 29 made of a solder alloy metallikon is formed on the first layer 28, and Ni plating is formed on the second layer 29. To form a third layer 30.
A capacitor element 26 having a structure in which a fourth layer 31 is formed by applying solder plating thereon to form an external terminal electrode 39 of the film capacitor can be formed, and a film capacitor 40 according to the prior art is obtained.

【0004】また、図12に示すように、プリント基板
34にもっているランド33にフィルムコンデンサ40
を実装固定し、このコンデンサ40の外部端子電極39
とランド33とをハンダ32付け形成後、基板分割や取
り付け時の基板たわみ等の機械的な応力に起因して前記
外部端子電極39の第1層28〜第4層31範囲の界面
において電極剥離(クラック)35が生じ、主に第2層
29と第3層30の界面において発生する恐れがあると
いう欠点のある従来の技術に係わるフィルムコンデンサ
40である。
As shown in FIG. 12, a film capacitor 40 is attached to a land 33 on a printed circuit board 34.
Is mounted and fixed, and the external terminal electrode 39 of the capacitor 40 is fixed.
And the lands 33 are formed by soldering, and the electrode is peeled off at the interface between the first layer 28 and the fourth layer 31 of the external terminal electrode 39 due to mechanical stress such as substrate deflection during substrate division or attachment. This is a film capacitor 40 according to the related art, which has a disadvantage that (cracks) 35 are generated and may be generated mainly at the interface between the second layer 29 and the third layer 30.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、上述の
従来の技術に係るフィルムコンデンサ40においては、
前記外部端子電極39に外部より機械的な応力(たわ
み)が加わりクラック35が前記第1層28から第4層
31の範囲にて生じるが主に第2層のハンダ合金メタリ
コン29と第3層のニッケルメッキ30の界面にて発生
して、静電容量減少(図13参照)や誘電正接(tan
δ)増大(図14参照)という電気的な接続劣化、また
クラックも増大(図15参照)し、tanδ値増大となり
高周波印加時に発熱し、さらには熱暴走を引き起し最終
的には短絡不良となる重欠点不具合を有していた(従来
品の耐基板曲げ性試験;JIS・C・5102・8・1
1.1:図13,図14,図15に示すので参照のこ
と。)。
However, in the above-described film capacitor 40 according to the prior art,
A mechanical stress (deflection) is applied to the external terminal electrode 39 from the outside, and cracks 35 are generated in the range from the first layer 28 to the fourth layer 31. However, mainly the solder alloy metallikon 29 of the second layer and the third layer Occurs at the interface between the nickel plating 30 and the capacitance decrease (see FIG. 13) and the dielectric loss tangent (tan).
δ) Increase (see FIG. 14), electrical connection deterioration, cracks also increase (see FIG. 15), tan δ value increases, heat is generated when high frequency is applied, and thermal runaway is caused, eventually resulting in short circuit failure (The board bending resistance test of the conventional product; JIS C 51028.1.)
1.1: See FIGS. 13, 14 and 15 for reference. ).

【0006】本発明の目的は、外部の機械的応力に対応
し、前記第2外部板状端子電極13を構成する板状端子
13Aが変形できることにより、第2外部板状端子電極
13のクラック及び電気的な特性劣化を防止し、接続信
頼性のより一層優れたフィルムコンデンサ23を提供す
ることにある。
An object of the present invention is to deform the plate-like terminal 13A constituting the second external plate-like terminal electrode 13 in response to external mechanical stress, thereby enabling cracks in the second external plate-like terminal electrode 13 and cracking. An object of the present invention is to provide a film capacitor 23 which prevents electrical characteristics from deteriorating and has more excellent connection reliability.

【0007】[0007]

【課題を解決するための手段】本発明は、上述の目的を
達成するために、プラスチックフィルム1にアルミニウ
ム4より得られた金属薄膜を内部電極2にして積層した
金属化プラスチックフィルム3を重ね巻回してこれに外
装プラスチックフィルム5を重ね巻回により金属化プラ
スチックフィルム素子6を形成し、この金属化プラスチ
ックフィルム素子6の両端面7に第1メタリコン層8及
び9上に第2メタリコン層10及び11を構成してなる
第1外部電極12を設け得てなるコンデンサ素子6Aに
て、このコンデンサ素子6A上に第2外部板状端子電極
13を構成してなるフィルムコンデンサであって、前記
第1メタリコン層8及び9は、アルミニウム合金を70
%以上、Siを4%以上含むメタリコン層を設け得、前
記第2メタリコン層10及び11は、Sn合金を80%
以上残Zn,Cu含むメタリコン層を設けることによっ
て前記第1外部電極12を構成してなるコンデンサ素子
6Aにて、このコンデンサ素子6A上に嵌着して一体化
接合される板状端子13Aからなる前記第2外部板状端
子電極13を構成し、前記板状端子13Aの開口部14
Aと開口部14Bの中間部の範囲に外部応力に対応し変
形でき得る溶接部17周囲の板状端子15及び16を備
えたことを特徴とするフィルムコンデンサ23を提供す
るものである。
According to the present invention, in order to achieve the above-mentioned object, a metallized plastic film 3 in which a metal thin film obtained from aluminum 4 is laminated on a plastic film 1 as an internal electrode 2 is laminated. The metallized plastic film element 6 is formed by wrapping the outer plastic film 5 thereover to form a metallized plastic film element 6. On both end faces 7 of the metallized plastic film element 6, a first metallikon layer 8 and a second metallikon layer 10 are formed. 11 is a film capacitor comprising a second external plate-like terminal electrode 13 on the capacitor element 6A which can be provided with the first external electrode 12 comprising the first external electrode 12. Metallicon layers 8 and 9 are made of 70% aluminum alloy.
% Or more, and a metallikon layer containing 4% or more of Si may be provided.
The capacitor element 6A, which constitutes the first external electrode 12 by providing a metallikon layer containing the remaining Zn and Cu, comprises a plate-like terminal 13A which is fitted onto the capacitor element 6A and integrally joined. The second external plate-shaped terminal electrode 13 is formed, and the opening 14 of the plate-shaped terminal 13A is formed.
A film capacitor 23 provided with plate-like terminals 15 and 16 around a welded portion 17 that can be deformed in response to external stress in a range between A and an opening 14B.

【0008】[0008]

【発明の実施の形態】本発明は、金属化プラスチックフ
ィルム3を用い、重ね巻回して、これに外装プラスチッ
クフィルム5を重ね巻回し、この両端面7に第1外部電
極12を設け得たコンデンサ素子6A上に板状端子13
Aを用いて、嵌着して一体化接合した構造である第2外
部板状端子電極13を設け得たフィルムコンデンサ23
にあって、前記金属化プラスチックフィルム3は、PP
S(ポリフェニレンスルフィド),PET(ポリエチレ
ンテレフタレート)及びPEN(ポリエチレンナフタレ
ート)等にアルミニウムによって金属薄膜を形成する。
また外装プラスチックフィルム5はPPSを用いる。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a capacitor in which a metallized plastic film 3 is wrapped and wound, an outer plastic film 5 is wrapped and wound thereon, and a first external electrode 12 is provided on both end surfaces 7. A plate-like terminal 13 is provided on the element 6A.
A, a film capacitor 23 provided with a second external plate-shaped terminal electrode 13 having a structure in which the second external plate-shaped terminal electrode 13 is fitted and integrally joined.
Wherein the metallized plastic film 3 is made of PP
A metal thin film is formed on S (polyphenylene sulfide), PET (polyethylene terephthalate), PEN (polyethylene naphthalate), or the like using aluminum.
The exterior plastic film 5 uses PPS.

【0009】次いで、前記第1外部電極12は、第1メ
タリコン層8及び9上に第2メタリコン層10及び11
を形成し、この第1メタリコン層8及び9はアルミニウ
ム合金を70%以上でSiを4%以上含む合金で形成さ
れていて、前記内部電極2を形成しているアルミニウム
の金属薄膜との電気的接続が最適である。
Next, the first external electrode 12 is formed on the first metallikon layers 8 and 9 by the second metallikon layers 10 and 11.
The first metallikon layers 8 and 9 are formed of an alloy containing 70% or more of an aluminum alloy and 4% or more of Si, and electrically connect with the metal thin film of aluminum forming the internal electrode 2. Connection is optimal.

【0010】なお、アルミニウム合金が70%未満でS
iが4%未満になると、各部材物質の不足に起因して付
着強度が低下する恐れが生じるために適さない。
When the content of aluminum alloy is less than 70%, S
If i is less than 4%, it is not suitable because the adhesion strength may be reduced due to the shortage of each member material.

【0011】また、前記第2メタリコン層10及び11
は、Sn80%以上、残Cu,Znを含むのからなるS
n合金で形成されていて、前記第1メタリコン層8及び
9上に電気メタリコンによってメタリコン層10及び1
1を形成される。
The second metallikon layers 10 and 11
Is composed of 80% or more of Sn and the remaining Cu and Zn.
Metallicon layers 10 and 1 on the first metallikon layers 8 and 9 by electric metallikon.
1 is formed.

【0012】なおSn80%未満であるとSnメタリコ
ン層10及び11が劣化して、板状端子13Aとの付着
強度の低下の起因となるため不適である。
If the content of Sn is less than 80%, the Sn metallikon layers 10 and 11 are deteriorated, and the adhesion strength to the plate-like terminal 13A is reduced.

【0013】次に、前記第2外部板状端子電極13は、
材質がSPCC(Fe薄板)硬度HV120で板厚0.
09〜0.13mm範囲また表面処理を下地Cuで厚さ2
μ,Sn9:Pd1で厚さ3μ以下等の電気めっきから
なる板状端子13Aを前記コンデンサ素子6A上に嵌着
して溶接電極20A及び20B間隙間を1.2mm、また
溶接加圧力1.5kgf(片側0.75kg)に設定して、
スポット溶接17を行い構成するものである。
Next, the second external plate-like terminal electrode 13
The material is SPCC (Fe thin plate) hardness HV120 and plate thickness is 0.
In the range of 09 to 0.13 mm
μ, Sn9: A plate-like terminal 13A made of electroplated Pd1 and having a thickness of 3 μm or less is fitted on the capacitor element 6A to form a gap between the welding electrodes 20A and 20B of 1.2 mm and a welding pressure of 1.5 kgf. (0.75 kg per side)
The spot welding 17 is performed.

【0014】なお外部応力や機械的ストレスが生じた場
合に変形して対応できるように、開口部14Aと開口部
14Bの中間部の範囲に存在する溶接部17周囲の板状
端子15及び16と前記コンデンサ素子6Aの長手方向
の中央部に向い折り曲がり、上下方向の外部応力に対し
抑制するために変形でき得る第2外部板状端子折り曲り
部18及び19と前記コンデンサ素子6Aの長手方向に
伸張または収縮に対し抑制するために変形でき得る前記
基板22のハンダ付部21とスポット溶接部17間の板
状端子15A・15B・16A・16B等を備えること
により従来の技術に係るフィルムコンデンサ40におい
て課題となっていた電気的接続信頼性の劣化(図13,
図14,図15とを参照のこと。)を防止して、より一
層高いフィルムコンデンサ23を発明しようとするもの
である。
In order to deform and cope with external stress or mechanical stress, the plate-like terminals 15 and 16 around the welded portion 17 existing in the area between the openings 14A and 14B are formed. The second external plate-like terminal bent portions 18 and 19 which are bent toward the central portion in the longitudinal direction of the capacitor element 6A and can be deformed to suppress external stress in the vertical direction, and in the longitudinal direction of the capacitor element 6A. The film capacitor 40 according to the prior art is provided with plate-like terminals 15A, 15B, 16A, 16B and the like between the soldered portion 21 and the spot welded portion 17 of the substrate 22 which can be deformed to suppress expansion or contraction. Degradation of electrical connection reliability, which has been a problem in
See FIG. 14 and FIG. ) Is prevented, and a higher film capacitor 23 is invented.

【0015】[0015]

【実施例】次に、本発明の実施例を図1,図2,図3,
図4,図5,図6,図7(a)〜(b),図8(a)〜
(b),図9,図10,図16,図17,図18等に基
づいて具体的に説明する。
Next, an embodiment of the present invention will be described with reference to FIGS.
FIGS. 4, 5, 6, 7 (a) and 7 (b), and 8 (a) to
(B), FIG. 9, FIG. 10, FIG. 16, FIG. 17, FIG.

【0016】(実施例1)図2に示すように、プラスチ
ックフィルム1にアルミニウム4との金属を蒸着して金
属薄膜を形成し、この金属薄膜を内部電極2とした金属
化プラスチックフィルム3を用い、この金属化プラスチ
ックフィルム3を重ね巻回して、これに外装プラスチッ
クフィルム5を重ね巻回し金属化プラスチックフィルム
素子6を形成後に、この金属化プラスチックフィルム素
子6の両端面7に電気メタリコンを使用し、第1メタリ
コン層8及び9を形成しこの上に第2メタリコン層10
及び11を形成してなる第1外部電極12を構成してコ
ンデンサ素子6Aを得る。
(Example 1) As shown in FIG. 2, a metal thin film is formed by evaporating a metal with aluminum 4 on a plastic film 1 and a metallized plastic film 3 having the metal thin film as an internal electrode 2 is used. After the metallized plastic film 3 is wrapped and wound, and the outer plastic film 5 is wrapped and wound thereon to form a metallized plastic film element 6, an electric metallikon is used for both end faces 7 of the metallized plastic film element 6. , First metallikon layers 8 and 9 are formed, and second metallikon layers 10 and 9 are formed thereon.
And 11 are formed to form the first external electrode 12 to obtain the capacitor element 6A.

【0017】なお、前記のプラスチックフィルム1とし
ては、例えば、ポリフェニレンスルフィド(PPS),
ポリエチレンテレフタレート(PET),ポリエチレン
ナフタレート(PEN)等を用いてもよいが本実施例で
はポリフェニレンスルフィド(PPS)が適している。
The plastic film 1 is, for example, polyphenylene sulfide (PPS),
Polyethylene terephthalate (PET), polyethylene naphthalate (PEN) or the like may be used, but in this embodiment, polyphenylene sulfide (PPS) is suitable.

【0018】また、前記第1メタリコン層8及び9に
は、アルミニウム合金70%以上、Siを4%以上含む
金属からなり、前記第2メタリコン層10及び11とし
ては、Sn合金でSn80%以上残Zn・Cuとを含む
金属からなる。
The first metallikon layers 8 and 9 are made of a metal containing 70% or more of an aluminum alloy and 4% or more of Si, and the second metallikon layers 10 and 11 are made of a Sn alloy with 80% or more of Sn remaining. It is made of a metal containing Zn and Cu.

【0019】次いで、前記第1メタリコン層8及び9の
形成にて、線材径1.2mmφを用いて、電気アーク溶射
方法によって、前記金属化プラスチックフィルム素子6
の両端面7に厚さ110〜130μmの範囲に形成する
のが好ましいが最適としては、厚さ120μmに形成す
るのがよい。
Next, in forming the first metallikon layers 8 and 9, the metallized plastic film element 6 was formed by an electric arc spraying method using a wire rod diameter of 1.2 mmφ.
It is preferable that the thickness be in the range of 110 to 130 [mu] m on both end faces 7 of the substrate, but it is most preferable that the thickness be 120 [mu] m.

【0020】前記電気アーク溶射条件としては、例えば
印加電圧が19〜21V.D.Cの範囲、吹付圧空圧力
を4.5〜5.5kg/平方センチメートルの範囲、流量
を1.55〜1.65立方メートル/分の範囲、線材の
送りを45〜55ミリメートル/秒の範囲、電気溶射距
離を190〜210mmの範囲、溶射速度を45〜55mm
/秒の範囲にする。
The electric arc spraying conditions include, for example, an applied voltage of 19 to 21V. D. C range, spray pressure air pressure range 4.5-5.5 kg / square centimeter, flow rate range 1.55-1.65 cubic meters / min, wire feed range 45-55 mm / sec, electrospray Distance in the range of 190-210mm, spraying speed 45-55mm
/ S range.

【0021】また、前記第1メタリコン層8及び9の上
にSn合金からなるSn80%以上残Zn,Cu,Sb
等を含む線材径1.6mmφを用い、厚さ300〜400
μmの範囲に第2メタリコン層10及び11を構成す
る。
On the first metallikon layers 8 and 9, at least 80% of Sn, made of a Sn alloy, is Zn, Cu, Sb.
Use a wire rod diameter of 1.6mmφ including
The second metallikon layers 10 and 11 are formed in a range of μm.

【0022】前記第2メタリコン層10及び11を構成
する電気アーク溶射条件としては、例えば、前記第1メ
タリコン層8及び9を構成する場合と線材径と送りが異
なり、第1電気アーク工程では、線材1.6mmφで送り
を35mm/秒で、第2電気アーク工程では、線材1.6
mmφで送りを55mm/秒である。
The electric arc spraying conditions for forming the second metallikon layers 10 and 11 are, for example, different from the case of forming the first metallikon layers 8 and 9 in wire diameter and feed. At a wire speed of 1.6 mmφ and a feed rate of 35 mm / sec, in the second electric arc process, the wire speed was 1.6 mm.
The feed is 55 mm / sec in mmφ.

【0023】次いで、第2のメタリコン層10及び11
を形成後、余剰のメタリコンを取り除いた後にコンデン
サ素子6Aに80V,DC/フィルム3の厚さ1μmを
1秒間印加して処理する。この電圧処理後コンデンサ素
子6Aにエポキシ浸漬して真空加圧含浸し、余剰なエポ
キシ樹脂を除去後に、温度約120℃で3Hr程に加熱
して仮硬化し、さらに本硬化する。しかる後に、前記第
2メタリコン層10及び11の表面を平坦に切削研摩す
る。
Next, the second metallikon layers 10 and 11
Is formed, after removing excess metallikon, 80V, 1 μm thickness of DC / film 3 is applied to capacitor element 6A for processing for 1 second. After the voltage treatment, the capacitor element 6A is immersed in epoxy and immersed in vacuum for impregnation, and after removing excess epoxy resin, is temporarily cured by heating at a temperature of about 120 ° C. for about 3 hours and then fully cured. Thereafter, the surfaces of the second metallikon layers 10 and 11 are cut and polished flat.

【0024】次いで図3に示すように、前記コンデンサ
素子6Aの第1外部電極12の表面上に開口部14A及
び14Bを有する板状端子13Aを用い、嵌着して、溶
接電極20A及び20B間の隙間を例えば、約1.2m
m、溶接加圧力1.5kgf(片側0.75kg)にて、スポ
ット溶接17を行い、第2外部板状端子電極13を構成
し、外部応力や機械的なストレスを抑制するために、前
記開口部14Aと開口部14Bの中間部の範囲に存在す
るスポット溶接部17周囲の板状端子15及び16と第
2外部板状端子折り曲り部18及び19と基板22のハ
ンダ付部とスポット溶接部間の板状端子15A・15B
・16A・16B等を構成している本発明のフィルムコ
ンデンサ23である。
Then, as shown in FIG. 3, a plate-like terminal 13A having openings 14A and 14B is fitted on the surface of the first external electrode 12 of the capacitor element 6A, and is fitted between the welding electrodes 20A and 20B. About 1.2m
m, with a welding pressure of 1.5 kgf (0.75 kg on one side), spot welding 17 is performed to form the second external plate-like terminal electrode 13, and the opening is formed to suppress external stress and mechanical stress. Plate terminals 15 and 16 around the spot weld 17 existing in the area between the portion 14A and the opening 14B, the second outer plate terminal bent portions 18 and 19, the soldered portion of the substrate 22, and the spot weld. Plate terminals 15A and 15B between
The film capacitor 23 of the present invention constituting 16A, 16B and the like.

【0025】次いで、図4に示すように、前記コンデン
サ素子6Aの両第1外部電極12の表面上に前記板状端
子13Aを嵌着して一体化接合し、外部応力や機械的な
ストレスに応対でき、電気的な接続信頼性に優れ、かつ
溶接部17周囲の板状端子15及び16と基板のハンダ
21付部とスポット溶接部7間の板状端子15A及び1
5B・16A・16Bと第2外部板状折り曲り部18及
び19等を備えたフィルムコンデンサ23である。
Next, as shown in FIG. 4, the plate-like terminals 13A are fitted on the surfaces of both first external electrodes 12 of the capacitor element 6A and integrally joined, thereby reducing external stress and mechanical stress. The plate-like terminals 15A and 1 between the plate-like terminals 15 and 16 around the welded portion 17 and the soldered portion 21 of the substrate and the spot welded portion 7 can be used, and have excellent electrical connection reliability.
This is a film capacitor 23 including 5B, 16A, 16B and second plate-shaped bent portions 18 and 19.

【0026】次いで、図5に示すように、前記第1外部
電極12を有するコンデンサ素子6Aに、前記板状端子
13Aを嵌着して、溶接電極20A及び20Bの間の隙
間を約1.2mmに設定後に、加圧力1.5kgf(片側
0.75kg)でスポット溶接した溶接部17である。
Next, as shown in FIG. 5, the plate-like terminal 13A is fitted to the capacitor element 6A having the first external electrode 12, so that the gap between the welding electrodes 20A and 20B is about 1.2 mm. After the setting, the welded portion 17 is spot-welded with a pressing force of 1.5 kgf (0.75 kg on one side).

【0027】次いで、図6に示すように、本実施例の板
状端子13Aの正面図であり例えば、材質:SPCC
(Fe薄板),板厚:約0.11mm,表面処理:下地,
銅,厚さ約2μ以下、Sn9:Pd1,厚さ約3μ以下
等の電気めっきを施し構成している。
Next, as shown in FIG. 6, it is a front view of the plate-like terminal 13A of this embodiment.
(Fe thin plate), plate thickness: about 0.11 mm, surface treatment: base,
It is formed by electroplating copper, a thickness of about 2 μ or less, Sn9: Pd1, a thickness of about 3 μ or less, or the like.

【0028】また、板状端子13Aの各寸法を例えば、
a:8.4mm,b:6.0mm,c:4.3mm,d:2.
5mm,e:4.0mm,f:4.0mm,g:0.8mm,
h:0.8mm,i:1.2mm,j:1.2mm,h:0.
4mm,I:0.9mm,m:0.9mm等に作製し、また外
部応力や機械的なたわみ(ストレス)とを抑制するため
に開口部14A及び14Bの中間部の範囲に存在する溶
接部17の周囲の板状端子15及び16と第2外部板状
端子折り曲り部18及び19と基板22のハンダ21付
部とスポット溶接部間の板状端子15A・15B・16
A・16B等を備えているものである。
The dimensions of the plate terminal 13A are, for example, as follows:
a: 8.4 mm, b: 6.0 mm, c: 4.3 mm, d: 2.
5 mm, e: 4.0 mm, f: 4.0 mm, g: 0.8 mm,
h: 0.8 mm, i: 1.2 mm, j: 1.2 mm, h: 0.
4 mm, I: 0.9 mm, m: 0.9 mm, etc., and a weld existing in the range between the openings 14A and 14B in order to suppress external stress and mechanical deflection (stress). 17 and the plate terminals 15A, 15B, 16 between the second external plate terminal bent portions 18 and 19, the soldered portion of the substrate 22 and the spot welded portion.
A.16B and the like.

【0029】次いで、図7(a)は、第2外部板状端子
電極13を構成したものであり前記コンデンサ素子6A
の第1外部電極12の表面上に板状端子13Aを嵌着し
て、スポット溶接を用い一体化接合溶接部17を形成し
た構造であり、また図7(b)は、図7(a)の模式断
面を示す図である。
Next, FIG. 7A shows the structure of the second external plate-like terminal electrode 13 and the capacitor element 6A.
7B is a structure in which a plate-like terminal 13A is fitted on the surface of the first external electrode 12 to form an integrated joint welded portion 17 by spot welding. It is a figure which shows the schematic cross section of.

【0030】次いで、図8(a)は、矢印方向に外部応
力等が加わった場合に開口部14A及び14Bの中間部
の範囲に存在するスポット溶接部17周囲の板状端子1
5及び16が外部応力を抑制するものであり、また、基
板22のハンダ21付部とスポット溶接部間の板状端子
15A・15B・16A・16B部も外部応力(ストレ
ス)を抑制するものであり、さらに前記コンデンサ素子
6Aの長手方向の中央部に向い折り曲がり、上下方向の
外部応力に対し抑制するため変形でき得る第2外部板状
端子折り曲り部18及び19等を有することを特徴とす
るフィルムコンデンサ23である。
Next, FIG. 8 (a) shows the plate-like terminal 1 around the spot weld 17 existing in the range between the openings 14A and 14B when external stress or the like is applied in the direction of the arrow.
5 and 16 suppress external stress, and the plate-like terminals 15A, 15B, 16A, and 16B between the soldered portion of the substrate 22 and the spot welded portions also suppress external stress (stress). And the second external plate-shaped terminal bent portions 18 and 19 which bend toward the central portion in the longitudinal direction of the capacitor element 6A and can be deformed to suppress external stress in the vertical direction. This is the film capacitor 23 to be used.

【0031】次いで、図9に示すように、本実施例のフ
ィルムコンデンサ23を基板22に搭載してハンダフィ
レット21した状態を示す模式断面図であり、基板22
たわみ、外部応力や機械的なストレス等に耐え得るフィ
ルムコンデンサ23である。
Next, as shown in FIG. 9, a schematic sectional view showing a state where the film capacitor 23 of this embodiment is mounted on the substrate 22 and the solder fillet 21 is formed.
The film capacitor 23 can withstand deflection, external stress, mechanical stress, and the like.

【0032】次いで、図10に示すように、本実施例の
フィルムコンデンサ23を基板22に搭載した後に矢印
方向に外部応力や基板分割や基板22をセット時におき
るたわみ等を抑制、応力緩和するために、溶接部17周
囲の板状端子15及び16と第2外部板状端子折り曲り
部18及び19と基板22のハンダ21付け部とスポッ
ト溶接部17間の板状端子15A・15B・16A・1
6B等を有するフィルムコンデンサ23である。
Next, as shown in FIG. 10, after the film capacitor 23 of the present embodiment is mounted on the substrate 22, external stress in the direction of the arrow, and the bending of the substrate 22 when the substrate 22 is set and the like are suppressed and stress is relaxed. The plate-like terminals 15A, 15B, 16A, 16A, between the plate-like terminals 15 and 16 around the welded portion 17, the second external plate-like terminal bent portions 18 and 19, the soldered portion 21 of the substrate 22 and the spot welded portion 17 are provided. 1
6B and the like.

【0033】次いで、本実施例のフィルムコンデンサ2
3(MMX−F,2A−105K(7D13),N=2
0,L=10.2mm)をJIS.C.5102.8.1
1.1に準拠して耐基板曲げ性試験を実施した。この試
験方法としては、供試フィルムコンデンサ23をプリン
ト基板に取り付け、JIS.C.5102の方法で基板
22を1mm/秒の速さで曲げ、規定のたわみ量に達した
後、10秒以上保ち、静電容量及び誘電正接(tanδ)
を測定し、さらに外観(クラック)を観察した。この試
験の結果を図16に容量変化率(%)(たわみ量:0.
0〜0.9mm),図17にtanδ(%)(たわみ量0.
0〜9.0mm),図18に外観不良数(クラック)(た
わみ量:0.0〜9.0mm)等を示す。
Next, the film capacitor 2 of the present embodiment
3 (MMX-F, 2A-105K (7D13), N = 2
0, L = 10.2 mm) according to JIS. C. 51028.1
A substrate bending resistance test was performed according to 1.1. As a test method, a test film capacitor 23 was attached to a printed circuit board, and JIS. C. The substrate 22 is bent at a speed of 1 mm / sec by the method of 5102, and after reaching a prescribed amount of deflection, is maintained for 10 seconds or more, and has a capacitance and a dielectric loss tangent (tan δ).
Was measured, and the appearance (cracks) was further observed. The results of this test are shown in FIG.
0 to 0.9 mm), and FIG.
FIG. 18 shows the number of appearance defects (cracks) (bending amount: 0.0 to 9.0 mm) and the like.

【0034】なお、図16に静電容量率(%)を示して
いるように基板たわみ量(mm)が9.0mmまで達しても
静電容量の減少はなく、また図17に誘電正接(tan
δ)を示すが基板たわみ量(mm)が9.0mmまで達して
も誘電正接(tanδ)の増大はなく一定であり、さら
に、図18に外観不良数(クラック)を示すが基板たわ
み量(mm)が9.0mmまで達してもクラックは発生しな
く、従来例のフィルムコンデンサ40よりもより高い電
気的な特性が得られ、かつ接続信頼性の優れたフィルム
コンデンサ23を実現することが可能になったものであ
る。
As shown in the capacitance ratio (%) in FIG. 16, even when the substrate deflection (mm) reaches 9.0 mm, the capacitance does not decrease, and FIG. 17 shows the dielectric loss tangent (%). tan
δ), but the dielectric loss tangent (tan δ) does not increase even when the substrate deflection amount (mm) reaches 9.0 mm, and is constant. Further, FIG. 18 shows the number of appearance defects (cracks). (mm) reaches 9.0 mm, no cracks occur, higher electrical characteristics are obtained than the conventional film capacitor 40, and a film capacitor 23 with excellent connection reliability can be realized. It has become.

【0035】[0035]

【発明の効果】(1)本発明によれば、第1外部電極1
2にアルミニウム70(%)以上の第1メタリコン層8
及び9を形成するため内部電極2との機械的な接合かつ
電気的な特性が優れ得、また第2外部板状端子電極13
の構成に板状端子13Aを用いることにより外部応力や
機械的ストレスを抑制でき電気的な接続信頼性の高いフ
ィルムコンデンサ23が得られ、産業上寄与する効果は
極めて大きい。
(1) According to the present invention, the first external electrode 1
2. a first metallikon layer 8 of aluminum (70% or more)
And 9 can be excellent in mechanical bonding with the internal electrode 2 and electrical characteristics, and the second external plate-like terminal electrode 13
By using the plate-like terminals 13A in the above structure, external stress and mechanical stress can be suppressed, and a film capacitor 23 with high electrical connection reliability can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例を示す模式説明図。FIG. 1 is a schematic explanatory view showing an embodiment of the present invention.

【図2】本発明の実施例を示す断面図。FIG. 2 is a sectional view showing an embodiment of the present invention.

【図3】本発明の実施例を示す斜視図。FIG. 3 is a perspective view showing an embodiment of the present invention.

【図4】本発明の実施例を示す模式断面図。FIG. 4 is a schematic sectional view showing an embodiment of the present invention.

【図5】本発明の実施例の外部板状端子電極を示す模式
断面図。
FIG. 5 is a schematic sectional view showing an external plate-shaped terminal electrode according to the embodiment of the present invention.

【図6】本発明の実施例に用いる外部板状端子を示す正
面図。
FIG. 6 is a front view showing an external plate terminal used in the embodiment of the present invention.

【図7】(a)〜(b)本発明の実施例を示す模式説明
図。
FIGS. 7A and 7B are schematic explanatory views showing an embodiment of the present invention.

【図8】(a)〜(b)本発明の実施例でやじるし方向
に外部ストレスが生じた場合に板状端子がストレス抑制
の働きを示す模式断面図。
8 (a) and 8 (b) are schematic cross-sectional views showing plate-like terminals exhibiting a function of suppressing stress when an external stress occurs in a binding direction in an embodiment of the present invention.

【図9】本発明の実施例で基板にフィルムコンデンサが
搭載された状態を示す模式断面図。
FIG. 9 is a schematic cross-sectional view showing a state in which a film capacitor is mounted on a substrate in an embodiment of the present invention.

【図10】本発明の実施例フィルムコンデンサが搭載後
に基板たわみが生じた場合に板状端子がこのたわみの抑
制を示す模式断面図。
FIG. 10 is a schematic cross-sectional view illustrating a case where a board-like terminal suppresses this bending when a substrate warp occurs after the film capacitor according to the embodiment of the present invention is mounted.

【図11】従来の技術に係る従来例を示す断面図。FIG. 11 is a sectional view showing a conventional example according to the conventional technique.

【図12】従来の技術に係る従来例の電極剥離の故障を
示す模式断面図。
FIG. 12 is a schematic cross-sectional view showing a failure of electrode peeling in a conventional example according to a conventional technique.

【図13】従来の技術に係る従来例の基板たわみ量によ
る容量変化率(%)を示す図。
FIG. 13 is a diagram showing a capacitance change rate (%) depending on a substrate deflection amount in a conventional example according to the conventional technology.

【図14】従来の技術に係る従来例の基板たわみ量によ
る誘電正接(tanδ)を示す図。
FIG. 14 is a diagram showing a dielectric loss tangent (tan δ) according to a conventional substrate deflection amount according to a conventional technique.

【図15】従来の技術に係る従来例の基板たわみ量によ
る外観不良(クラック)数を示す図。
FIG. 15 is a diagram showing the number of appearance defects (cracks) based on the amount of substrate deflection in a conventional example according to the conventional technique.

【図16】本発明の実施例の基板たわみ量による容量変
化率(%)を示す図。
FIG. 16 is a diagram showing a capacitance change rate (%) depending on the amount of substrate deflection in an example of the present invention.

【図17】本発明の実施例の基板たわみ量による誘電正
接(tanδ)を示す図。
FIG. 17 is a diagram showing a dielectric loss tangent (tan δ) depending on the amount of substrate deflection according to the example of the present invention.

【図18】本発明の実施例の基板たわみ量による外観不
良(クラック)数を示す図。
FIG. 18 is a diagram showing the number of appearance defects (cracks) according to the amount of substrate deflection in the example of the present invention.

【符号の説明】[Explanation of symbols]

1…プラスチックフィルム 2…内部電極 3…金属化プ
ラスチックフィルム 4…アルミニウム 5…外装プラスチックフィルム 6…金属化プラスチックフィルム素子 6A…コンデン
サ素子 7…端面 8,9…第1メタリコン層 10,11…第2メタリコ
ン層 12…第1外部電極 13…第2外部板状端子電極 13
A…板状端子 14A,14B…開口部 15,16…溶接部周囲の板
状端子 15A,15B,16A,16B…ハンダ付部とスポッ
ト溶接部間の板状端子 17…スポット溶接部 18,19…第2外部板状端子
折り曲り部 20A,20B…溶接電極 21…ハンダフィレット 22…基板(ランド含む) 23…本発明のフィルムコ
ンデンサ 24…プラスチックフィルム 24A…プラスチック素
子 25…外装プラスチックフィルム 26…コンデンサ素
子 27…端面 28…第1層の亜鉛合金メタリコン層 29…第2層のハンダ合金メタリコン層 30…第3層
のニッケルメッキ 31…第4層のハンダメッキ 32…ハンダフィレット
33…ランド 34…基板 35…電極剥離(クラック) 36…内部電
極 37…金属化プラスチックフィルム 38…アルミニウ
ム 39…外部電極 40…従来の技術に係るフィルムコンデンサ 整理番号p2463
DESCRIPTION OF SYMBOLS 1 ... Plastic film 2 ... Internal electrode 3 ... Metalized plastic film 4 ... Aluminum 5 ... Outer plastic film 6 ... Metalized plastic film element 6A ... Capacitor element 7 ... End face 8,9 ... First metallikon layer 10,11 ... Second Metallicon layer 12 First external electrode 13 Second external plate-like terminal electrode 13
A: Plate-shaped terminals 14A, 14B: Openings 15, 16 ... Plate-shaped terminals around welded parts 15A, 15B, 16A, 16B: Plate-shaped terminals between soldered parts and spot-welded parts 17: Spot-welded parts 18, 19 ... Bending portions of second outer plate-shaped terminals 20A, 20B ... Welding electrodes 21 ... Solder fillets 22 ... Substrates (including lands) 23 ... Film capacitors of the present invention 24 ... Plastic films 24A ... Plastic elements 25 ... Exterior plastic films 26 ... Capacitors Element 27 ... End face 28 ... First layer zinc alloy metallikon layer 29 ... Second layer solder alloy metallikon layer 30 ... Third layer nickel plating 31 ... Fourth layer solder plating 32 ... Solder fillet
Reference Signs List 33 land 34 substrate 35 exfoliation (crack) 36 internal electrode 37 metallized plastic film 38 aluminum 39 external electrode 40 film capacitor according to prior art Reference number p2463

フロントページの続き (72)発明者 吉原 孝雄 長野県上水内郡信州新町155番地の2 日 立エーアイシー株式会社新町コンデンサ工 場内 Fターム(参考) 5E082 AA01 AB05 BC33 EE07 EE24 EE37 FF05 FG06 FG34 FG48 GG08 GG10 GG11 GG22 GG27 JJ07 JJ22 JJ25 PP03 Continuing from the front page (72) Inventor Takao Yoshiwara F-term (reference) 5E082 AA01 AB05 BC33 EE07 EE24 EE37 FF05 FG06 FG34 FG48 GG08 GG10 GG11 GG22 GG27 JJ07 JJ22 JJ25 PP03

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】プラスチックフィルム(1)にアルミニウ
ム(4)より得られた金属薄膜を内部電極(2)にして
積層した金属化プラスチックフィルム(3)を重ね巻回
してこれに外装プラスチックフィルム(5)を重ね巻回
によって金属化プラスチックフィルム素子(6)を形成
し、この金属化プラスチックフィルム素子(6)の両端
面7とに第1メタリコン層(8)及び(9)上に第2メ
タリコン層(10)及び(11)を構成してなる第1外
部電極(12)を設け得てなるコンデンサ素子(6A)
において、このコンデンサ素子(6A)上に第2外部板
状端子電極(13)を構成してなるフィルムコンデンサ
にあって、前記第1メタリコン層(8)及び(9)は、
アルミニウム合金を70%以上、Siを4%以上含むメ
タリコン層を設け得、前記第2メタリコン層(10)及
び(11)は、Sn合金を80%以上残Zn,Cuを含
むメタリコン層を設けることによって前記第1外部電極
(12)を構成してなるコンデンサ素子(6A)にて、
このコンデンサ素子(6A)上に嵌着して一体化接合さ
れる板状端子(13A)からなる前記第2外部板状端子
電極(13)を構成し、前記板状端子(13A)の開口
部(14A)と開口部(14B)の中間部の範囲に外部
応力に対応し変形でき得る溶接部(17)周囲の板状端
子(15)及び(16)を備えたことを特徴とするフィ
ルムコンデンサ(23)。
1. A metallized plastic film (3) obtained by laminating a metal thin film obtained from aluminum (4) on a plastic film (1) as an internal electrode (2) is wound around the plastic film (1). ) To form a metallized plastic film element (6) by lap winding, and a metallized plastic film element (6), on both end faces 7 of the metallized plastic film element (6), and on the first metallikon layers (8) and (9) Capacitor element (6A) provided with first external electrode (12) comprising (10) and (11)
Wherein the first metallikon layers (8) and (9) comprise a second external plate-shaped terminal electrode (13) on the capacitor element (6A).
A metallikon layer containing 70% or more of an aluminum alloy and 4% or more of Si may be provided, and the second metallikon layers (10) and (11) may be provided with a metallikon layer containing 80% or more of a Sn alloy and remaining Zn and Cu. With the capacitor element (6A) that constitutes the first external electrode (12),
The second external plate-shaped terminal electrode (13) is formed of a plate-shaped terminal (13A) fitted and integrally joined on the capacitor element (6A), and an opening of the plate-shaped terminal (13A) is formed. A film capacitor provided with plate-like terminals (15) and (16) around a welded portion (17) capable of deforming in response to external stress in a range between (14A) and the opening (14B). (23).
【請求項2】 請求項1において、前記抵抗溶接による
ハンダ付上部でハンダ付に対し、平行な位置で両開口部
(14A)及び(14B)の中間部の範囲に存在する溶
接部(17)周囲の板状端子(15)及び(16)が外
部応力に対応して変形し得る板状端子(13A)形状を
備えていることを特徴とするフィルムコンデンサ(2
3)。
2. The welded part (17) according to claim 1, wherein the soldered part (17) is located between the openings (14A) and (14B) at a position parallel to the soldered part by the resistance welding. A film capacitor (2) characterized in that the surrounding plate-like terminals (15) and (16) have a shape of a plate-like terminal (13A) that can be deformed in response to external stress.
3).
【請求項3】 請求項1において、前記第2外部板状端
子電極(13)となる板状端子(13A)の両端部が前
記コンデンサ素子(6A)の長手方向の中央部に向かい
折り曲がることにより、第2外部板状端子折り曲がり部
(18)及び(19)を形成して上、下方向の外部応力
に対応して変形し得る板状端子(13A)の形状を備え
ていることを特徴とするフィルムコンデンサ(23)。
3. The terminal according to claim 1, wherein both ends of the plate-like terminal (13A) serving as the second external plate-like terminal electrode (13) are bent toward the center in the longitudinal direction of the capacitor element (6A). Thus, the second external plate-shaped terminal bent portions (18) and (19) are formed to have a shape of the plate-shaped terminal (13A) that can be deformed in response to external stress in the upward and downward directions. Characteristic film capacitor (23).
【請求項4】 請求項1において、前記基板(22)の
ハンダ付部(21)とスポット溶接部(17)間の板状
端子(15A)・(15B)・(16A)・(16B)
は前記コンデンサ素子(6A)の長手方向に伸張または
収縮に対応して変形でき得る板状端子(13A)の形状
を備えていることを特徴とするフィルムコン(23)。
4. A plate-like terminal (15A), (15B), (16A), (16B) between a soldered portion (21) of the substrate (22) and a spot welded portion (17).
A film capacitor (23) having a shape of a plate-like terminal (13A) that can be deformed in response to expansion or contraction in the longitudinal direction of the capacitor element (6A).
JP10222485A 1998-08-06 1998-08-06 Film capacitor Pending JP2000058369A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10222485A JP2000058369A (en) 1998-08-06 1998-08-06 Film capacitor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10222485A JP2000058369A (en) 1998-08-06 1998-08-06 Film capacitor

Publications (2)

Publication Number Publication Date
JP2000058369A true JP2000058369A (en) 2000-02-25
JP2000058369A5 JP2000058369A5 (en) 2005-10-13

Family

ID=16783179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10222485A Pending JP2000058369A (en) 1998-08-06 1998-08-06 Film capacitor

Country Status (1)

Country Link
JP (1) JP2000058369A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004119913A (en) * 2002-09-30 2004-04-15 Nichicon Corp Film capacitor and its manufacturing method
JP2007158072A (en) * 2005-12-06 2007-06-21 Hitachi Aic Inc Metallized film capacitor
JP2008198924A (en) * 2007-02-15 2008-08-28 Matsushita Electric Ind Co Ltd Metallized film capacitors
US20140226259A1 (en) * 2013-02-13 2014-08-14 Sbe, Inc. Mitigating the Effects of Cracks in Metallized Polymer Film Capacitor Arc-Sprayed End Connections
JP2018160613A (en) * 2017-03-23 2018-10-11 Tdk株式会社 Ceramic electronic components

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004119913A (en) * 2002-09-30 2004-04-15 Nichicon Corp Film capacitor and its manufacturing method
JP2007158072A (en) * 2005-12-06 2007-06-21 Hitachi Aic Inc Metallized film capacitor
JP2008198924A (en) * 2007-02-15 2008-08-28 Matsushita Electric Ind Co Ltd Metallized film capacitors
US20140226259A1 (en) * 2013-02-13 2014-08-14 Sbe, Inc. Mitigating the Effects of Cracks in Metallized Polymer Film Capacitor Arc-Sprayed End Connections
JP2018160613A (en) * 2017-03-23 2018-10-11 Tdk株式会社 Ceramic electronic components

Similar Documents

Publication Publication Date Title
US11610713B2 (en) Coil device
KR102523712B1 (en) Multilayer ceramic electronic component
US6388864B1 (en) Ceramic electronic component
US10580577B2 (en) Multilayer ceramic electronic component and mounting structure thereof
US11532436B2 (en) Multilayer ceramic electronic component including outer electrodes connected to metal terminals
CA1077582A (en) Termination means for an electrical device
US10573459B2 (en) Multilayer ceramic electronic component and mounting structure thereof
JP7331622B2 (en) multilayer ceramic electronic components
CN87104005A (en) passive electrical components
JPH08107039A (en) Ceramic electronic component
US11887787B2 (en) Multilayer ceramic electronic component including metal terminals with recess portions and mounting structure of the multilayer ceramic electronic component
JP2000058369A (en) Film capacitor
CN112927887B (en) Core for winding, coil component, and method for manufacturing coil component
US12057275B2 (en) Packaging of roll-type solid electrolytic capacitor elements
US20230352244A1 (en) Multi-layer ceramic electronic component
TWI436389B (en) Electronic Parts
JP3760642B2 (en) Electronic components
TWI861607B (en) Packaging structure and mass production method thereof for roll-type solid electrolytic capacitor
US20220272839A1 (en) Flexible printed wiring board, battery wiring module, and method of manufacturing flexible printed wiring board
US12437931B2 (en) Multilayer ceramic electronic component
CN221226030U (en) Package structure of coiled solid electrolytic capacitor and intermediate assembly for mass production thereof
JPH10189306A (en) Chip resistor
US20250391593A1 (en) Electronic component and method for manufacturing same
JPH0770426B2 (en) Capacitor
WO2025047306A1 (en) Electronic component and method for manufacturing electronic component

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050602

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20050606

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20071228

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080117

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080312

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080821