JP2000053921A - Anti-reflective coating forming composition - Google Patents
Anti-reflective coating forming compositionInfo
- Publication number
- JP2000053921A JP2000053921A JP10227990A JP22799098A JP2000053921A JP 2000053921 A JP2000053921 A JP 2000053921A JP 10227990 A JP10227990 A JP 10227990A JP 22799098 A JP22799098 A JP 22799098A JP 2000053921 A JP2000053921 A JP 2000053921A
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- Prior art keywords
- refractive index
- coating
- compound capable
- forming
- cured film
- Prior art date
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Abstract
(57)【要約】
【課題】 １回の塗布、硬化操作によって多層（２層）
の反射防止被膜を形成し得る反射防止被膜形成組成物を
提供する。
【解決手段】 低屈折率硬化被膜を与え得る化合物と、
高屈折率硬化被膜を与え得る化合物とを含有する反射防
止被膜形成組成物であって、低屈折率硬化被膜を与え得
る化合物が硬化されてなる被膜の表面自由エネルギーが
高屈折率硬化被膜を与え得る化合物が硬化されてなる被
膜の表面自由エネルギーよりも小さいことを特徴とする
反射防止被膜形成組成物。(57) [Summary] [Problem] Multi-layer (two layers) by one application and curing operation
An anti-reflective coating forming composition capable of forming an anti-reflective coating of the present invention. A compound capable of providing a low refractive index cured film,
An anti-reflective coating forming composition containing a compound capable of providing a high refractive index cured coating, wherein the surface free energy of the coating obtained by curing the compound capable of providing a low refractive index cured coating provides a high refractive index cured coating. An anti-reflective coating forming composition, characterized in that the obtained compound has a surface free energy smaller than that of a cured coating.
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、反射防止被膜形成
組成物に関する。[0001] The present invention relates to a composition for forming an antireflection film.
【０００２】[0002]
【従来の技術】基材表面の可視光の反射を低減するため
の反射防止被膜は、ディスプレイ表面、レンズなどのガ
ラス製光学製品、合成樹脂製光学製品などの表面に形成
されて、広く使用されている。かかる反射防止被膜とし
ては、通常、屈折率が基材の屈折率よりも小さい低屈折
率の物質からなる被膜が使用されている。かかる反射防
止被膜としては、例えば低屈折率物質層を蒸着、スパッ
ター、イオンプレーティングなどの物理気相堆積(Physi
cal Vapor Deposition、ＰＶＤ）法により基材の表面に
形成する方法が知られているが、真空中で形成する必要
があるため、操作が煩雑であるという問題があった。2. Description of the Related Art An antireflection coating for reducing the reflection of visible light on the surface of a base material is formed on the surface of a glass optical product such as a display surface, a lens, or a synthetic resin optical product, and is widely used. ing. As such an anti-reflection coating, a coating made of a substance having a low refractive index whose refractive index is smaller than that of the substrate is usually used. As such an anti-reflection coating, for example, a low-refractive-index material layer is deposited, sputtered, or subjected to physical vapor deposition such as ion plating.
A method of forming the substrate on the surface of the substrate by a calvapor deposition (PVD) method is known, but there is a problem that the operation is complicated because the formation is required in a vacuum.
【０００３】かかる問題を解決するものとして、低屈折
率の硬化被膜を与え得る化合物が硬化されてなる被膜が
知られている。これは低屈折率の硬化被膜を与え得る化
合物を含有する反射防止被膜形成組成物を基材の表面に
塗布後、硬化することにより形成されるものであるた
め、反射防止被膜を形成するための操作が簡便であるこ
とから、広く用いられている。As a solution to such a problem, a film obtained by curing a compound capable of providing a cured film having a low refractive index is known. Since this is formed by applying an anti-reflective coating forming composition containing a compound capable of providing a cured film having a low refractive index to the surface of a substrate and then curing the composition, it is necessary to form the anti-reflective coating. It is widely used because of its simple operation.
【０００４】一方、反射防止被膜として、より広い波長
範囲の可視光の反射率を低減するために、高屈折率の物
質からなる層と低屈折率の物質からなる層との多層の反
射防止被膜、いわゆるマルチコーティングが知られてい
る。On the other hand, as an antireflection coating, a multilayer antireflection coating of a layer made of a material having a high refractive index and a layer made of a material having a low refractive index is used in order to reduce the reflectance of visible light in a wider wavelength range. A so-called multi-coating is known.
【０００５】しかし、かかる多層の反射防止被膜を形成
するには、基材の表面に、高屈折率の硬化被膜を与え得
る化合物を含有する反射防止被膜形成組成物を塗布後、
硬化させた後、更に低屈折率の硬化被膜を与え得る化合
物を含有する反射防止被膜形成組成物を塗布後、硬化さ
せる必要があり、２回の塗布、硬化を必要とするもので
あった。However, in order to form such a multilayer antireflection coating, an antireflection coating forming composition containing a compound capable of giving a cured film having a high refractive index is applied to the surface of the substrate.
After curing, it was necessary to apply and further cure an antireflection coating forming composition containing a compound capable of providing a cured coating having a low refractive index, which required two applications and curing.
【０００６】[0006]
【発明が解決しようとする課題】そこで、本発明者は、
１回の塗布、硬化操作によって多層の反射防止被膜を形
成し得る反射防止被膜形成組成物を開発するべく、鋭意
検討した結果、低屈折率硬化被膜を与え得る化合物と、
高屈折率硬化被膜を与え得る化合物とを含有する組成物
を用いることにより、目的とする多層の反射防止被膜が
容易に得られることを見出し、本発明に至った。Therefore, the present inventor has proposed:
In order to develop a composition for forming an anti-reflective coating capable of forming a multilayer anti-reflective coating by one application and curing operation, as a result of intensive studies, a compound capable of providing a low refractive index cured coating;
By using a composition containing a compound capable of giving a high refractive index cured film, it was found that a desired multilayer antireflection film could be easily obtained, and the present invention was reached.
【０００７】[0007]
【課題を解決するための手段】すなわち、本発明は、低
屈折率硬化被膜を与え得る化合物と、高屈折率硬化被膜
を与え得る化合物とを含有する反射防止被膜形成組成物
であって、低屈折率硬化被膜を与え得る化合物が硬化さ
れてなる被膜の表面自由エネルギーが高屈折率硬化被膜
を与え得る化合物が硬化されてなる被膜の表面自由エネ
ルギーよりも小さいことを特徴とする反射防止被膜形成
組成物を提供するものである。That is, the present invention relates to a composition for forming an antireflection film, comprising a compound capable of providing a cured film having a low refractive index and a compound capable of providing a cured film having a high refractive index. Forming an antireflection film, wherein the surface free energy of the film formed by curing the compound capable of providing the high refractive index cured film is smaller than the surface free energy of the film obtained by curing the compound capable of forming the high refractive index cured film It provides a composition.
【０００８】[0008]
【発明の実施の形態】本発明の反射防止被膜形成組成物
を構成する一成分である低屈折率硬化被膜を与え得る化
合物とは、基材の表面に塗布後、硬化されることによっ
て、低屈折率の反射防止被膜を形成することができる化
合物であって、通常の単層の反射防止被膜の形成に使用
されると同様のものが使用し得る。かかる化合物の硬化
方法は特に限定されるものではなく、紫外線照射により
硬化する化合物、電子線照射により硬化する化合物、放
射線照射により硬化する化合物、加熱により硬化する化
合物などを用いることができる。DETAILED DESCRIPTION OF THE INVENTION The compound which can provide a low refractive index cured film, which is one component of the composition for forming an antireflective film of the present invention, is applied to the surface of a substrate and cured to form a low refractive index film. Compounds capable of forming an antireflection coating having a refractive index, which are the same as those used for forming an ordinary single-layer antireflection coating, can be used. The method of curing such a compound is not particularly limited, and a compound that cures by ultraviolet irradiation, a compound that cures by electron beam irradiation, a compound that cures by radiation irradiation, a compound that cures by heating, and the like can be used.
【０００９】他の一成分である高屈折率硬化被膜を与え
得る化合物とは、基材の表面に塗布後、硬化されること
によって、高屈折率の反射防止被膜を形成することがで
きる化合物であって、上記した低屈折率硬化被膜を与え
得る化合物と組合わせて、通常の多層の反射防止被膜の
形成に使用されると同様のものが使用し得る。かかる化
合物の硬化方法は特に限定されるものではなく、紫外線
照射により硬化する化合物、電子線照射により硬化する
化合物、放射線照射により硬化する化合物、加熱により
硬化する化合物などを用いることができるが、低屈折率
硬化被膜を与え得る化合物の硬化方法と同様の方法で硬
化し得るものを選択して使用することが、塗布後の硬化
を容易にし得る点で好ましい。The compound that can provide a high-refractive-index cured film as another component is a compound that can form a high-refractive-index antireflection film by being applied to the surface of a substrate and then cured. Then, in combination with the above-mentioned compound capable of providing a cured film having a low refractive index, those similar to those used for forming a usual multilayer antireflection film can be used. The method of curing such a compound is not particularly limited, and a compound that cures by ultraviolet irradiation, a compound that cures by electron beam irradiation, a compound that cures by irradiation, a compound that cures by heating, and the like can be used. It is preferable to select and use a compound that can be cured by a method similar to the method of curing a compound that can provide a refractive index cured film, since curing after application can be facilitated.
【００１０】かかる低屈折率硬化被膜を与え得る化合物
と、高屈折率硬化被膜を与え得る化合物とは、低屈折率
硬化被膜を与え得る化合物が硬化されてなる被膜の表面
自由エネルギーが高屈折率硬化被膜を与え得る化合物が
硬化されてなる被膜の表面自由エネルギーよりも小さい
ことが必要であるが、本発明の反射防止被膜形成組成物
においては、かかる表面自由エネルギーの関係を満足す
るように、低屈折率硬化被膜を与え得る化合物と高屈折
率硬化被膜を与え得る化合物とを適宜選択して組合わせ
て使用される。The compound capable of providing a cured film having a low refractive index and the compound capable of forming a cured film having a high refractive index are described below. It is necessary that the compound capable of providing the cured film has a surface free energy smaller than the surface free energy of the film formed by curing.In the antireflection film forming composition of the present invention, to satisfy the relationship of the surface free energy, A compound capable of providing a low refractive index cured film and a compound capable of providing a high refractive index cured film are appropriately selected and used in combination.
【００１１】本発明の反射防止被膜成形組成物において
は、低屈折率硬化被膜を与え得る化合物が硬化された被
膜の表面自由エネルギーが、低屈折率硬化被膜を与え得
る化合物が硬化された被膜の表面自由エネルギーよりも
小さいので、塗布後硬化される際に、低屈折率硬化被膜
を与え得る化合物が高屈折率硬化被膜を与え得る化合物
よりも表面側（外側）に偏析し易い傾向にあり、その結
果、得られる被膜は、低屈折率硬化被膜が高屈折率硬化
被膜よりも表面側（外側）となって、多層（２層）の反
射防止層を構成するものと考えられる。かかる関係を満
足するためには、例えば低反射率硬化被膜を与え得る化
合物としてフッ素原子を含有する化合物を使用し、高屈
折率硬化被膜を与え得る化合物としてフッ素原子を含有
しない化合物を使用すればよい。In the antireflection coating molding composition of the present invention, the surface free energy of the cured film of the compound capable of forming the low refractive index cured film is reduced by the surface free energy of the cured film of the compound capable of forming the low refractive index cured film. Since it is smaller than the surface free energy, when cured after application, the compound capable of providing a low refractive index cured film tends to segregate on the surface side (outside) more easily than the compound capable of providing a high refractive index cured film, As a result, it is considered that the resulting coating has a low-refractive-index cured coating on the surface side (outside) of the high-refractive-index cured coating and constitutes a multilayer (two-layer) antireflection layer. In order to satisfy such a relationship, for example, a compound containing a fluorine atom is used as a compound capable of providing a low reflectance cured film, and a compound containing no fluorine atom is used as a compound capable of providing a high refractive index cured film. Good.
【００１２】低屈折率硬化被膜を与え得る化合物が硬化
されてなる硬化被膜の屈折率（ｎ1）と高屈折率硬化被
膜を与え得る化合物が硬化されてなる硬化被膜の屈折率
（ｎ 2）とは、その差が０．１以上であることが好まし
く、広い波長範囲における反射防止効果に優れる多層の
反射防止被膜を得ることができる。なお、低屈折率硬化
被膜を与え得る化合物が硬化されてなる硬化被膜の屈折
率（ｎ1）は通常、１．５以下、好ましくは１．４５以
下であり、通常は、１．１以上である。また、高屈折率
硬化被膜を与え得る化合物が硬化されてなる硬化被膜の
屈折率（ｎ2）は、通常１．５以上、好ましくは１．５
５以上であり、通常は１．７以下である。本発明の反射
防止被膜形成組成物における低屈折率硬化被膜を与え得
る化合物と、高屈折率硬化被膜を与え得る化合物との含
有量の比は、得られる反射防止被膜における低屈折率硬
化被膜の屈折率（ｎ1）および厚み、ならびに高屈折率
硬化被膜の屈折率（ｎ2）および厚みを勘案して、適宜
選択される。これらの値によって、得られる反射防止被
膜の可視光の反射防止性能、即ち反射を防止し得る波長
範囲、反射率が変化するからである。The compound capable of giving a low refractive index cured film is cured
The refractive index (n1) And high refractive index cured coating
Refractive index of cured film obtained by curing a compound capable of forming a film
(N Two) Means that the difference is 0.1 or more
Layer with excellent antireflection effect over a wide wavelength range
An anti-reflection coating can be obtained. In addition, low refractive index curing
Refraction of a cured film obtained by curing a compound capable of giving a film
Rate (n1) Is usually 1.5 or less, preferably 1.45 or less
Below, usually 1.1 or more. Also has a high refractive index
A cured film obtained by curing a compound capable of providing a cured film
Refractive index (nTwo) Is usually 1.5 or more, preferably 1.5
5 or more, and usually 1.7 or less. The reflection of the present invention
Can provide low refractive index cured film in anti-film forming composition
And a compound capable of providing a high refractive index cured film.
The weight ratio is determined by the low refractive index hardness of the resulting anti-reflection coating.
Refractive index (n1) And thickness, and high refractive index
Refractive index of cured film (nTwo) And thickness
Selected. These values determine the resulting anti-reflective coating.
Visible light antireflection performance of the film, i.e., wavelength that can prevent reflection
This is because the range and the reflectance change.
【００１３】また、本発明の反射防止被膜形成組成物
は。他の成分、例えば溶剤、添加剤を含有していてもよ
い。溶剤としては、通常の反射防止被膜形成組成物に使
用されると同様のものが使用され、用いる低屈折率硬化
被膜を与え得る化合物および高屈折率硬化被膜を与え得
る化合物や、目的とする基材の材質などに応じて適宜選
択される。添加剤としては、得られる反射防止被膜の硬
度を高めるための無機微粒子からなるフィラー、架橋
剤、帯電防止性を付与するための導電性高分子、導電性
無機微粒子、耐擦傷性を付与するための滑剤などが挙げ
られる。[0013] The composition for forming an antireflection coating of the present invention is also provided. It may contain other components, for example, a solvent and an additive. As the solvent, the same solvents as those used in ordinary antireflection coating-forming compositions are used. Compounds capable of providing a low-refractive-index cured coating and compounds capable of providing a high-refractive-index cured coating, and a target group It is appropriately selected according to the material of the material. As an additive, a filler composed of inorganic fine particles for increasing the hardness of the obtained antireflection coating, a crosslinking agent, a conductive polymer for providing antistatic properties, conductive inorganic fine particles, and for imparting scratch resistance And the like.
【００１４】本発明の反射防止効果被膜形成組成物から
反射防止被膜を得るには、例えば反射防止効果被膜形成
組成物を基材の表面に塗布後、硬化させればよい。In order to obtain an antireflection coating from the composition for forming an antireflection effect film of the present invention, for example, the composition for forming an antireflection effect film may be applied to the surface of a substrate and then cured.
【００１５】基材としては特に限定されるものではな
く、例えば無機ガラスであってもよいし、アクリル系樹
脂、ポリカーボネート系樹脂、ポリスチレン、スチレン
−アクリル共重合体、アクリロニトリル−スチレン共重
合体、ポリエチレン、ポリプロピレンなどのポリオレフ
ィン、シクロペンタジエンなどの合成樹脂であってもよ
い。また、その形状は特に限定されるものではなく、レ
ンズなどのように凸状または凹状であってもよいし、板
状またはフィルム状の平面状であってもよい。塗布方法
は特に限定されるものではなく、バーコーターによる方
法、ロールコーターによる方法、ディップコーターによ
る方法などの通常の方法で塗布することができる。溶剤
を使用した場合には、塗布後、溶剤を風乾などの方法に
より蒸発させる。The substrate is not particularly limited, and may be, for example, inorganic glass, acrylic resin, polycarbonate resin, polystyrene, styrene-acryl copolymer, acrylonitrile-styrene copolymer, polyethylene. And synthetic resins such as polyolefins such as polypropylene and cyclopentadiene. The shape is not particularly limited, and may be convex or concave like a lens, or may be plate-like or film-like planar. The coating method is not particularly limited, and the coating can be performed by a usual method such as a method using a bar coater, a method using a roll coater, a method using a dip coater, or the like. When a solvent is used, after the application, the solvent is evaporated by a method such as air drying.
【００１６】硬化方法は、用いた低屈折率硬化被膜を与
え得る化合物および高屈折率硬化被膜を与え得る化合物
に応じて適宜選択すればよく、紫外線照射、電子線照
射、放射線照射、加熱になどの方法により硬化すること
ができる。The curing method may be appropriately selected according to the compound capable of providing a low-refractive-index cured film and the compound capable of providing a high-refractive-index cured film, such as ultraviolet irradiation, electron beam irradiation, radiation irradiation, and heating. It can be cured by the method described above.
【００１７】かくして多層の反射防止被膜が得られる
が、かかる反射防止被膜の上にさらに本発明の反射防止
被膜形成組成物を塗布し、硬化させることによって、４
層の反射防止被膜を得ることもできる。また、塗布後、
硬化する操作を繰り返すことによって、６層またはそれ
以上の多層の反射防止被膜を得ることもできる。Thus, a multilayer antireflection coating can be obtained. The composition for forming an antireflection coating of the present invention is further applied on the antireflection coating and cured to obtain a coating.
An antireflective coating of the layer can also be obtained. After application,
By repeating the curing operation, a multilayer antireflection coating of six or more layers can be obtained.
【００１８】かくして得られる低反射基材は、例えば反
射率の小さいレンズ、液晶表示装置、陰極線管（ＣＲ
Ｔ）、プラズマディスプレイ、プロジェクションディス
プレイなどの各種ディスプレイや、それらの前面板など
の用途に使用し得る。The low-reflection substrate thus obtained is, for example, a lens having a low reflectance, a liquid crystal display, a cathode ray tube (CR)
T), various displays such as a plasma display and a projection display, and a front panel thereof.
【００１９】[0019]
【発明の効果】本発明の反射防止被膜形成組成物は、１
回の塗布、硬化操作であっても、多層（２層）の反射防
止被膜を形成し得るので、多層の反射防止被膜を容易に
製造し得る。The composition for forming an anti-reflective coating of the present invention comprises:
Even with a single application and curing operation, a multilayer (two-layer) antireflection coating can be formed, so that a multilayer antireflection coating can be easily manufactured.
【００２０】[0020]
【実施例】以下、実施例により本発明をより詳細に説明
するが、本発明はかかる実施例により限定されるもので
はない。The present invention will be described in more detail with reference to the following examples, but the present invention is not limited to these examples.
【００２１】参考例１ 低屈折率硬化被膜を与え得る化合物を含有する溶液〔ジ
ェイエスアール(株)製、「ＪＭ５０２２」、固形分の含
有量は３％、溶剤はメチルイソブチルケトン〕をアクリ
ル系樹脂板〔住友化学工業(株)製、「スミペックスＥ０
００」、厚み２ｍｍ〕の表面にバーコーター（５＃）を
用いて塗布後、紫外線を照射すれば、屈折率（ｎ1）
１．４３７の被膜を有する基材を得る。Reference Example 1 An acrylic resin containing a solution containing a compound capable of giving a cured film having a low refractive index [manufactured by JSR Co., Ltd., "JM5022", solid content: 3%, solvent: methyl isobutyl ketone] Plate [Sumitomo Chemical Industries, Ltd., “Sumipex E0
00 ", 2 mm thick], using a bar coater (5 #) and then irradiating with ultraviolet light to obtain a refractive index (n 1 ).
A substrate having a coating of 1.437 is obtained.
【００２２】参考例２ ビス（４−メタクロイルチオフェニル）スルフィド（３
重量部）をメチルイソブチルケトン（９７重量部）に溶
解して得た溶液をアクリル系樹脂板〔スミペックスＥ０
００、厚み２ｍｍ〕の表面にバーコーター（５＃）を用
いて塗布後、風乾し、紫外線を照射すれば、屈折率（ｎ
2）１．６８９の被膜を有する基材を得る。Reference Example 2 Bis (4-methacryloylthiophenyl) sulfide (3
Parts by weight) in methyl isobutyl ketone (97 parts by weight), and the resulting solution is coated on an acrylic resin plate [SUMIPEX E0
00, 2 mm thick] using a bar coater (5 #), air-dried, and irradiated with ultraviolet light to obtain a refractive index (n).
2 ) Obtain a substrate having a 1.689 coating.
【００２３】実施例１ 低屈折率硬化被膜を与え得る化合物を含有する溶液〔ジ
ェイエスアール(株)製、「ＪＭ５０２２」、固形分の含
有量は３％、溶剤はメチルイソブチルケトン〕１００重
量部と、高屈折率硬化被膜を与え得る化合物〔ビス（４
−メタクロイルチオフェニル）スルフィド〕３重量部と
をマグネチックスターラーで１０分間攪拌して反射防止
被膜形成組成物を得た。なお、ビス（４−メタクロイル
チオフェニル）スルフィドをアクリル系樹脂板〔スミペ
ックスＥ０００〕塗布後硬化して得る被膜の表面自由エ
ネルギーは、低屈折率硬化被膜を与え得る化合物を含有
する溶液〔ＪＭ５０２２〕を塗布後硬化して得られる被
膜の表面自由エネルギーよりも小さい。この反射防止被
膜形成組成物をアクリル系樹脂板〔住友化学工業(株)
製、「スミペックスＥ０００」、厚み２ｍｍ〕の一方の
面にバーコーター（５＃）を用いて塗布後、風乾し、紫
外線を照射して、多層（２層）の反射防止層を有する低
反射基材を得た。Example 1 100 parts by weight of a solution containing a compound capable of giving a cured film having a low refractive index [manufactured by JSR Co., Ltd., "JM5022", solid content: 3%, solvent: methyl isobutyl ketone] A compound capable of providing a high refractive index cured film [bis (4
-Methacryloylthiophenyl) sulfide] was stirred with a magnetic stirrer for 10 minutes to obtain a composition for forming an anti-reflection coating. The surface free energy of the film obtained by applying and curing bis (4-methacryloylthiophenyl) sulfide on an acrylic resin plate [Sumipex E000] is determined by a solution containing a compound capable of giving a low refractive index cured film [JM5022]. Is smaller than the surface free energy of the coating obtained by curing after application. This anti-reflective coating forming composition was coated on an acrylic resin plate [Sumitomo Chemical Industries, Ltd.
Coated on one surface of a “SUMIPEX E000”, 2 mm thick] using a bar coater (5 #), air-dried, and irradiated with ultraviolet rays to form a low-reflection substrate having a multilayer (two-layer) antireflection layer. Wood was obtained.
【００２４】この低反射基材の他方の面に黒色のビニー
ルテープ〔ニチバン(株)製、「ビニールテープＶＴ−５
０」〕を貼り、分光光度計〔島津製作所製、「ＭＣＰ−
３１００」〕を用いて、反射防止被膜が形成された側の
面から入射角５°（鉛直方向を０°とした値）における
絶対鏡面反射測定を行ったところ、Ｙ値〔ＪＩＳ Ｚ８
７２２〕は０．８９であった。各波長における反射率
（アルミニウム板の反射率を１００％とする絶対鏡面反
射率）をプロットした図１に示す。On the other side of the low-reflection base material, a black vinyl tape [Vinyl Tape VT-5 manufactured by Nichiban Co., Ltd.]
0 ”] and a spectrophotometer [MCP-Made by Shimadzu Corporation]
3100 ”], an absolute specular reflection measurement was performed from the surface on which the antireflection coating was formed at an incident angle of 5 ° (value when the vertical direction was set to 0 °). The Y value [JIS Z8]
722] was 0.89. FIG. 1 is a plot of the reflectance at each wavelength (absolute specular reflectance when the reflectance of the aluminum plate is 100%).
【図１】実施例１で得た低反射基材の各波長における反
射率をプロットした図である。FIG. 1 is a diagram in which the reflectance at each wavelength of a low reflection substrate obtained in Example 1 is plotted.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 康乗 幸雄 大阪府高槻市塚原二丁目10番１号 住友化 学工業株式会社内 Ｆターム(参考） 2K009 AA05 BB02 BB13 BB14 BB24 CC21 DD02 DD05 4F100 AK25 AK57 AL05A AT00B BA01 BA02 EH46A EJ08A EJ54 GB41 JA20A JB12A JL02 JM02A JN06A JN18A YY00A 4J038 EA001 NA19 PB08 PC03 PC08 ────────────────────────────────────────────────── ─── Continuing from the front page (72) Inventor Yukio Yasushi 2-10-1 Tsukahara, Takatsuki-shi, Osaka Sumitomo Chemical Co., Ltd. F-term (reference) 2K009 AA05 BB02 BB13 BB14 BB24 CC21 DD02 DD05 4F100 AK25 AK57 AL05A AT00B BA01 BA02 EH46A EJ08A EJ54 GB41 JA20A JB12A JL02 JM02A JN06A JN18A YY00A 4J038 EA001 NA19 PB08 PC03 PC08
Claims (4)
屈折率硬化被膜を与え得る化合物とを含有する反射防止
被膜形成組成物であって、低屈折率硬化被膜を与え得る
化合物が硬化されてなる被膜の表面自由エネルギーが高
屈折率硬化被膜を与え得る化合物が硬化されてなる被膜
の表面自由エネルギーよりも小さいことを特徴とする反
射防止被膜形成組成物。An anti-reflective coating forming composition comprising a compound capable of forming a low refractive index cured film and a compound capable of forming a high refractive index cured film, wherein the compound capable of forming a low refractive index cured film is cured. An anti-reflection coating forming composition, characterized in that the surface free energy of the resulting coating is smaller than the surface free energy of the coating obtained by curing a compound capable of providing a high refractive index cured coating.
されてなる被膜の屈折率と、高屈折率硬化被膜を与え得
る化合物が硬化されてなる被膜の屈折率との差が０．１
以上である請求項１に記載の反射防止被膜形成組成物。2. The difference between the refractive index of a film obtained by curing a compound capable of forming a cured film having a low refractive index and the refractive index of a film obtained by curing a compound capable of forming a cured film having a high refractive index is 0.1.
The composition for forming an anti-reflective coating according to claim 1, which is as described above.
が塗布後、硬化されてなる反射防止被膜。3. An anti-reflection coating formed by applying the composition for forming an anti-reflection coating according to claim 1 and then curing the composition.
面に形成されてなる低反射基材。4. A low-reflection substrate comprising the anti-reflection coating according to claim 3 formed on a surface of the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10227990A JP2000053921A (en) | 1998-08-12 | 1998-08-12 | Anti-reflective coating forming composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10227990A JP2000053921A (en) | 1998-08-12 | 1998-08-12 | Anti-reflective coating forming composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000053921A true JP2000053921A (en) | 2000-02-22 |
Family
ID=16869450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10227990A Pending JP2000053921A (en) | 1998-08-12 | 1998-08-12 | Anti-reflective coating forming composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000053921A (en) |
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|---|---|---|---|---|
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| KR101044113B1 (en) | 2007-11-13 | 2011-06-28 | 주식회사 엘지화학 | Anti-reflective coating composition and anti-reflection film prepared using the same |
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-
1998
- 1998-08-12 JP JP10227990A patent/JP2000053921A/en active Pending
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|---|---|---|---|---|
| JP2010515100A (en) * | 2006-12-29 | 2010-05-06 | エルジー・ケム・リミテッド | Antireflection coating composition and antireflection film produced using the same |
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| KR101044113B1 (en) | 2007-11-13 | 2011-06-28 | 주식회사 엘지화학 | Anti-reflective coating composition and anti-reflection film prepared using the same |
| US8313890B2 (en) | 2008-12-12 | 2012-11-20 | Shin-Etsu Chemical Co., Ltd. | Antireflective coating composition, antireflective coating, and patterning process |
| JP2012168416A (en) * | 2011-02-15 | 2012-09-06 | Fujifilm Corp | Method for manufacturing antireflection film, antireflection film, and coating composition |
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| US9069247B2 (en) | 2012-02-14 | 2015-06-30 | Shin-Etsu Chemical Co., Ltd. | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process |
| US9075309B2 (en) | 2012-02-14 | 2015-07-07 | Shin-Etsu Chemical Co., Ltd. | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process |
| US9377690B2 (en) | 2013-01-08 | 2016-06-28 | Shin-Etsu Chemical Co., Ltd. | Compositon for forming metal oxide-containing film and patterning process |
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