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JP1584241S - - Google Patents

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Publication number
JP1584241S
JP1584241S JPD2017-1752F JP2017001752F JP1584241S JP 1584241 S JP1584241 S JP 1584241S JP 2017001752 F JP2017001752 F JP 2017001752F JP 1584241 S JP1584241 S JP 1584241S
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JP
Japan
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JPD2017-1752F
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Japanese (ja)
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Priority to JPD2017-1752F priority Critical patent/JP1584241S/ja
Priority to TW106301374F priority patent/TWD186394S/en
Priority to US29/610,995 priority patent/USD827592S1/en
Application granted granted Critical
Publication of JP1584241S publication Critical patent/JP1584241S/ja
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JPD2017-1752F 2017-01-31 2017-01-31 Active JP1584241S (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2017-1752F JP1584241S (en) 2017-01-31 2017-01-31
TW106301374F TWD186394S (en) 2017-01-31 2017-03-17 Protective rings for plasma processing equipment
US29/610,995 USD827592S1 (en) 2017-01-31 2017-07-18 Electrode cover for a plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2017-1752F JP1584241S (en) 2017-01-31 2017-01-31

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JP1584241S true JP1584241S (en) 2017-08-21

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Country Status (3)

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US (1) USD827592S1 (en)
JP (1) JP1584241S (en)
TW (1) TWD186394S (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1108380S1 (en) 2023-09-29 2026-01-06 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus
USD1108379S1 (en) 2023-09-29 2026-01-06 Hitachi High-Tech Corporation Electrode cover for a plasma processing apparatus

Families Citing this family (350)

* Cited by examiner, † Cited by third party
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