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ITMI940442A0 - Impianto di rivestimento sotto vuoto - Google Patents

Impianto di rivestimento sotto vuoto

Info

Publication number
ITMI940442A0
ITMI940442A0 ITMI940442A ITMI940442A ITMI940442A0 IT MI940442 A0 ITMI940442 A0 IT MI940442A0 IT MI940442 A ITMI940442 A IT MI940442A IT MI940442 A ITMI940442 A IT MI940442A IT MI940442 A0 ITMI940442 A0 IT MI940442A0
Authority
IT
Italy
Prior art keywords
vacuum coating
coating plant
plant
vacuum
coating
Prior art date
Application number
ITMI940442A
Other languages
English (en)
Inventor
Gunter Brauer
Ulrich Patz
Michael Scherer
Joachim Szczyrbowski
Original Assignee
Leybold Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Ag filed Critical Leybold Ag
Publication of ITMI940442A0 publication Critical patent/ITMI940442A0/it
Publication of ITMI940442A1 publication Critical patent/ITMI940442A1/it
Application granted granted Critical
Publication of IT1269524B publication Critical patent/IT1269524B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Transition And Organic Metals Composition Catalysts For Addition Polymerization (AREA)
ITMI940442A 1993-04-23 1994-03-10 Impianto di rivestimento sotto vuoto IT1269524B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4313353A DE4313353C2 (de) 1993-04-23 1993-04-23 Vakuum-Beschichtungsanlage

Publications (3)

Publication Number Publication Date
ITMI940442A0 true ITMI940442A0 (it) 1994-03-10
ITMI940442A1 ITMI940442A1 (it) 1995-09-10
IT1269524B IT1269524B (it) 1997-04-08

Family

ID=6486228

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI940442A IT1269524B (it) 1993-04-23 1994-03-10 Impianto di rivestimento sotto vuoto

Country Status (5)

Country Link
US (1) US5372693A (it)
JP (1) JPH06346235A (it)
DE (1) DE4313353C2 (it)
FR (1) FR2704240B1 (it)
IT (1) IT1269524B (it)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4341635C2 (de) * 1993-12-07 2002-07-18 Unaxis Deutschland Holding Vakuumbeschichtungsanlage
US5908565A (en) * 1995-02-03 1999-06-01 Sharp Kabushiki Kaisha Line plasma vapor phase deposition apparatus and method
US5812405A (en) * 1995-05-23 1998-09-22 Viratec Thin Films, Inc. Three variable optimization system for thin film coating design
US6325901B1 (en) * 1996-04-18 2001-12-04 Kabushiki Kaisha Toshiba Method of producing a cathode-ray tube and apparatus therefor
US6103069A (en) * 1997-03-31 2000-08-15 Applied Materials, Inc. Chamber design with isolation valve to preserve vacuum during maintenance
IT1298891B1 (it) * 1998-02-06 2000-02-07 Ca Te V Centro Tecnologie Del Impianto da vuoto portatile provvisto di precamera per la deposizione di film sottili su superfici anche inamovibili.
DE10247888A1 (de) * 2002-10-14 2004-04-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Einrichtung zur Erzeugung von Plasmen durch Hochfrequenzentladungen
US20060260938A1 (en) * 2005-05-20 2006-11-23 Petrach Philip M Module for Coating System and Associated Technology
US9644260B1 (en) * 2012-03-16 2017-05-09 Oliver James Groves Portable sputtering apparatus and method
DE102014004323B4 (de) 2014-03-25 2021-11-11 Gottfried Wilhelm Leibniz Universität Hannover Beschichtungseinrichtung zum zumindest teilweisen Beschichten einer Oberfläche

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
LU43878A1 (it) * 1963-06-10 1964-12-10
JPS57134559A (en) * 1981-02-12 1982-08-19 Toyota Central Res & Dev Lab Inc Physical vapor deposition device
US4416759A (en) * 1981-11-27 1983-11-22 Varian Associates, Inc. Sputter system incorporating an improved blocking shield for contouring the thickness of sputter coated layers
US4450062A (en) * 1981-12-22 1984-05-22 Raytheon Company Sputtering apparatus and methods
JPS63270457A (ja) * 1987-04-24 1988-11-08 Matsushita Electric Ind Co Ltd 薄膜形成装置
JPH0791645B2 (ja) * 1989-04-28 1995-10-04 株式会社日立製作所 薄膜形成装置
US5254236A (en) * 1991-01-25 1993-10-19 Shibaura Engineering Works Co., Ltd. Sputtering apparatus

Also Published As

Publication number Publication date
US5372693A (en) 1994-12-13
JPH06346235A (ja) 1994-12-20
ITMI940442A1 (it) 1995-09-10
DE4313353A1 (de) 1994-10-27
FR2704240B1 (fr) 1998-02-20
FR2704240A1 (fr) 1994-10-28
IT1269524B (it) 1997-04-08
DE4313353C2 (de) 1997-08-28

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19990226