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IT1271921B - Impianto di rivestimento sotto alto vuoto - Google Patents

Impianto di rivestimento sotto alto vuoto

Info

Publication number
IT1271921B
IT1271921B ITMI930025A ITMI930025A IT1271921B IT 1271921 B IT1271921 B IT 1271921B IT MI930025 A ITMI930025 A IT MI930025A IT MI930025 A ITMI930025 A IT MI930025A IT 1271921 B IT1271921 B IT 1271921B
Authority
IT
Italy
Prior art keywords
high vacuum
coating
chamber
coating chamber
coating system
Prior art date
Application number
ITMI930025A
Other languages
English (en)
Inventor
Karl-Heinrich Wenk
Original Assignee
Leybold Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=6453646&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=IT1271921(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Leybold Ag filed Critical Leybold Ag
Publication of ITMI930025A0 publication Critical patent/ITMI930025A0/it
Publication of ITMI930025A1 publication Critical patent/ITMI930025A1/it
Application granted granted Critical
Publication of IT1271921B publication Critical patent/IT1271921B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating Apparatus (AREA)

Abstract

Un recipiente e depressione (1), nel quale una foglia (20) viene rivestita sotto alto vuoto, è suddiviso mediante una parete divisoria (26) in una camera di avvolgimento (27) con un rullo alimentatore (21) e un rullo avvolgitore (22) e in una camera di rivestimento (28). La camera di rivestimento (28) contiene un banco di vaporizzazione (24). Entro di esso sporge un cilindro di rivestimento (27). Pompe di diffusione (14, 15) sono collegate esclusivamente alla camera di rivestimento (28) per cui l'alto vuoto necessario per Il rivestimento deve essere generato soltanto in questa camera di rivestimento (28) e non nell'intero recipiente a depressione (1).
ITMI930025A 1992-03-10 1993-01-13 Impianto di rivestimento sotto alto vuoto IT1271921B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4207525A DE4207525C2 (de) 1992-03-10 1992-03-10 Hochvakuum-Beschichtungsanlage

Publications (3)

Publication Number Publication Date
ITMI930025A0 ITMI930025A0 (it) 1993-01-13
ITMI930025A1 ITMI930025A1 (it) 1994-07-13
IT1271921B true IT1271921B (it) 1997-06-10

Family

ID=6453646

Family Applications (1)

Application Number Title Priority Date Filing Date
ITMI930025A IT1271921B (it) 1992-03-10 1993-01-13 Impianto di rivestimento sotto alto vuoto

Country Status (4)

Country Link
US (1) US5254169A (it)
DE (1) DE4207525C2 (it)
GB (1) GB2264955B (it)
IT (1) IT1271921B (it)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4222013A1 (de) * 1992-07-04 1994-01-05 Leybold Ag Vorrichtung zur Vakuumbeschichtung von Folien
DE4310085A1 (de) * 1993-03-27 1994-09-29 Leybold Ag Verfahren und Vorrichtung zur Erzeugung von Mustern auf Substraten
US5522955A (en) * 1994-07-07 1996-06-04 Brodd; Ralph J. Process and apparatus for producing thin lithium coatings on electrically conductive foil for use in solid state rechargeable electrochemical cells
US6186090B1 (en) * 1999-03-04 2001-02-13 Energy Conversion Devices, Inc. Apparatus for the simultaneous deposition by physical vapor deposition and chemical vapor deposition and method therefor
DE19960751A1 (de) * 1999-12-16 2001-07-05 Fzm Ges Fuer Produktentwicklun Schleuse und Verfahren zur Anwendung derselben
DE10205805C1 (de) * 2002-02-13 2003-08-14 Ardenne Anlagentech Gmbh Einrichtung zur Beschichtung von bandförmigen Substraten im Vakuum
DE10348639B4 (de) * 2003-10-15 2009-08-27 Von Ardenne Anlagentechnik Gmbh Schleusensystem für eine Vakuumanlage
DE102004006131B4 (de) * 2004-02-07 2005-12-15 Applied Films Gmbh & Co. Kg Bandbeschichtungsanlage mit einer Vakuumkammer und einer Beschichtungswalze
PL1582607T3 (pl) * 2004-03-31 2009-04-30 Applied Mat Gmbh & Co Kg Układ śluzy dla urządzenia do obróbki próżniowej i sposób jego eksploatacji
US20060260938A1 (en) * 2005-05-20 2006-11-23 Petrach Philip M Module for Coating System and Associated Technology
US20070256934A1 (en) * 2006-05-08 2007-11-08 Perata Michael R Apparatus and Method for Coating Substrates With Approximate Process Isolation
EP2299473A1 (en) * 2009-09-22 2011-03-23 Applied Materials, Inc. Modular substrate processing system and method
EP2374914B1 (en) * 2010-04-07 2015-07-22 Applied Materials, Inc. A device for sealing a chamber inlet or a chamber outlet for a flexible substrate; substrate processing apparatus, and method for assembling such a device
GB2521645B (en) * 2013-12-24 2016-01-06 Bobst Manchester Ltd Vacuum metallizers and methods of operating vacuum metallizers
US20180363130A1 (en) * 2015-12-21 2018-12-20 Applied Materials, Inc. Film forming apparatus
GB2579360A (en) * 2018-11-28 2020-06-24 Edwards Ltd Multiple chamber vacuum exhaust system
KR20230068788A (ko) * 2021-11-11 2023-05-18 세메스 주식회사 기판 처리 장치
CN115609909A (zh) * 2022-10-14 2023-01-17 浙江大坤电器科技有限公司 一种针对蒸烤机门板进行玻璃预粘的加工装置

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2971862A (en) * 1957-04-26 1961-02-14 Nat Res Corp Vapor deposition method and apparatus
DE2141723B2 (de) * 1971-08-20 1976-03-04 Robert Bosch Gmbh, 7000 Stuttgart Vakuum-bedampfungsanlage zur kontinuierlichen bedampfung von baendern
SU515833A1 (ru) * 1974-02-11 1976-05-30 Украинский Научно-Исследовательский Институт Специальных Сталей,Сплавов И Ферросплавов Устройство дл нанесени покрытий в вакууме на рулонные материалы
SU968097A1 (ru) * 1980-04-30 1982-10-23 Институт механики металлополимерных систем АН БССР Установка дл вакуумной металлизации полимерной пленки
JPS5754269A (en) * 1980-09-17 1982-03-31 Matsushita Electric Ind Co Ltd Apparatus for forming film in vacuum
US4450186A (en) * 1981-08-20 1984-05-22 Matsushita Electric Industrial Co., Ltd. Method and device for manufacturing magnetic recording medium
JPS58111127A (ja) * 1981-12-24 1983-07-02 Ulvac Corp 耐摩耗性磁気記録体の製造法
US4469335A (en) * 1982-07-22 1984-09-04 American Sterilizer Company Sealing apparatus with sealing device operable under pressure differential established thereacross
JPS59124038A (ja) * 1982-12-29 1984-07-18 Matsushita Electric Ind Co Ltd 磁気記録媒体の製造方法
EP0122092A3 (en) * 1983-04-06 1985-07-10 General Engineering Radcliffe Limited Vacuum coating apparatus
JPS6017074A (ja) * 1983-07-09 1985-01-28 Konishiroku Photo Ind Co Ltd 薄膜形成装置、及びこれを構成する処理室ユニツト
JPS60141869A (ja) * 1983-12-29 1985-07-26 Nissin Electric Co Ltd 膜形成方法および膜形成装置
JPH0685211B2 (ja) * 1985-05-13 1994-10-26 富士写真フイルム株式会社 磁気記録媒体の製造方法
JPS61278030A (ja) * 1985-05-31 1986-12-08 Hitachi Maxell Ltd 磁気記録媒体の製造方法およびその装置
DE3726113A1 (de) * 1987-08-06 1989-02-16 Leybold Ag Vorrichtung zum beschichten von baendern
DE3872339T2 (de) * 1987-10-07 1993-01-14 Emi Plc Thorn Anlage und verfahren zur herstellung einer schicht auf einem band.
DE3738722C2 (de) * 1987-11-14 1995-12-14 Leybold Ag Vorrichtung zum beidseitigen Beschichten von Bändern
JPH01230775A (ja) * 1988-03-10 1989-09-14 Matsushita Electric Ind Co Ltd 繊維・フィルム連続蒸着装置
DE3922187A1 (de) * 1989-07-06 1991-01-17 Leybold Ag Vorrichtung zum herstellen von metallfreien streifen bei im vakuum beschichteten folienbahnen, insbesondere fuer kondensatoren

Also Published As

Publication number Publication date
ITMI930025A0 (it) 1993-01-13
ITMI930025A1 (it) 1994-07-13
DE4207525C2 (de) 1999-12-16
GB9225407D0 (en) 1993-01-27
US5254169A (en) 1993-10-19
GB2264955B (en) 1995-07-05
GB2264955A (en) 1993-09-15
DE4207525A1 (de) 1993-09-16

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19981231