IL147986A0 - Inverted pressure vessel with horizontal throug loading - Google Patents

Inverted pressure vessel with horizontal throug loading

Info

Publication number: IL147986A0
Authority: IL; Israel
Prior art keywords: throug; loading; horizontal; pressure vessel; inverted pressure
Prior art date: 1999-08-05

Application number

IL14798600A

Other languages

English (en)

Original Assignee

S C Fluids Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1999-08-05

Filing date

2000-08-04

Publication date

2002-09-12

2000-08-04 Application filed by S C Fluids Inc filed Critical S C Fluids Inc

2002-09-12 Publication of IL147986A0 publication Critical patent/IL147986A0/xx

Classifications

- H10P72/0441—
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/008—Processes carried out under supercritical conditions
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
- H10P72/3308—

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
General Engineering & Computer Science (AREA)
Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Filling Or Discharging Of Gas Storage Vessels (AREA)
Pressure Vessels And Lids Thereof (AREA)
Closures For Containers (AREA)

IL14798600A 1999-08-05 2000-08-04 Inverted pressure vessel with horizontal throug loading IL147986A0 (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US14725199P	1999-08-05	1999-08-05
US15545499P	1999-09-20	1999-09-20
PCT/US2000/021338 WO2001010733A1 (en)	1999-08-05	2000-08-04	Inverted pressure vessel with horizontal through loading

Publications (1)

Publication Number	Publication Date
IL147986A0 true IL147986A0 (en)	2002-09-12

Family

ID=26844748

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IL14798600A IL147986A0 (en)	1999-08-05	2000-08-04	Inverted pressure vessel with horizontal throug loading

Country Status (7)

Country	Link
EP (1)	EP1208047A4 (zh)
JP (1)	JP2003506646A (zh)
KR (1)	KR20020061589A (zh)
CN (1)	CN1204024C (zh)
AU (1)	AU6893600A (zh)
IL (1)	IL147986A0 (zh)
WO (1)	WO2001010733A1 (zh)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
TW539918B (en)	1997-05-27	2003-07-01	Tokyo Electron Ltd	Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US6748960B1 (en)	1999-11-02	2004-06-15	Tokyo Electron Limited	Apparatus for supercritical processing of multiple workpieces
WO2001046999A2 (en)	1999-11-02	2001-06-28	Tokyo Electron Limited	Method and apparatus for supercritical processing of a workpiece
KR100693691B1 (ko)	2000-04-25	2007-03-09	동경 엘렉트론 주식회사	금속 필름의 침착방법 및 초임계 건조/세척 모듈을포함하는 금속침착 복합공정장치
WO2002009147A2 (en) *	2000-07-26	2002-01-31	Tokyo Electron Limited	High pressure processing chamber for semiconductor substrate
IL154095A0 (en) *	2000-08-04	2003-07-31	S C Fluids Inc	Inverted pressure vessel with shielded closure mechanism
US7001468B1 (en)	2002-02-15	2006-02-21	Tokyo Electron Limited	Pressure energized pressure vessel opening and closing device and method of providing therefor
US7387868B2 (en)	2002-03-04	2008-06-17	Tokyo Electron Limited	Treatment of a dielectric layer using supercritical CO2
US6722642B1 (en) *	2002-11-06	2004-04-20	Tokyo Electron Limited	High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US7021635B2 (en)	2003-02-06	2006-04-04	Tokyo Electron Limited	Vacuum chuck utilizing sintered material and method of providing thereof
US7077917B2 (en)	2003-02-10	2006-07-18	Tokyo Electric Limited	High-pressure processing chamber for a semiconductor wafer
US7225820B2 (en)	2003-02-10	2007-06-05	Tokyo Electron Limited	High-pressure processing chamber for a semiconductor wafer
US7270137B2 (en)	2003-04-28	2007-09-18	Tokyo Electron Limited	Apparatus and method of securing a workpiece during high-pressure processing
US7163380B2 (en)	2003-07-29	2007-01-16	Tokyo Electron Limited	Control of fluid flow in the processing of an object with a fluid
US7186093B2 (en)	2004-10-05	2007-03-06	Tokyo Electron Limited	Method and apparatus for cooling motor bearings of a high pressure pump
US7250374B2 (en)	2004-06-30	2007-07-31	Tokyo Electron Limited	System and method for processing a substrate using supercritical carbon dioxide processing
US7307019B2 (en)	2004-09-29	2007-12-11	Tokyo Electron Limited	Method for supercritical carbon dioxide processing of fluoro-carbon films
US7491036B2 (en)	2004-11-12	2009-02-17	Tokyo Electron Limited	Method and system for cooling a pump
US7140393B2 (en)	2004-12-22	2006-11-28	Tokyo Electron Limited	Non-contact shuttle valve for flow diversion in high pressure systems
US7434590B2 (en)	2004-12-22	2008-10-14	Tokyo Electron Limited	Method and apparatus for clamping a substrate in a high pressure processing system
US7435447B2 (en)	2005-02-15	2008-10-14	Tokyo Electron Limited	Method and system for determining flow conditions in a high pressure processing system
US7291565B2 (en)	2005-02-15	2007-11-06	Tokyo Electron Limited	Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US7380984B2 (en)	2005-03-28	2008-06-03	Tokyo Electron Limited	Process flow thermocouple
US7767145B2 (en)	2005-03-28	2010-08-03	Toyko Electron Limited	High pressure fourier transform infrared cell
US7494107B2 (en)	2005-03-30	2009-02-24	Supercritical Systems, Inc.	Gate valve for plus-atmospheric pressure semiconductor process vessels
US7789971B2 (en)	2005-05-13	2010-09-07	Tokyo Electron Limited	Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US7524383B2 (en)	2005-05-25	2009-04-28	Tokyo Electron Limited	Method and system for passivating a processing chamber
CN110410498B (zh) *	2018-04-28	2025-03-25	重庆海扶医疗科技股份有限公司	卡箍组件和压力容器
CN112601620B (zh) *	2018-07-25	2024-11-08	格拉弗技术国际控股有限公司	挤压压力机及使用方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3744660A (en) *	1970-12-30	1973-07-10	Combustion Eng	Shield for nuclear reactor vessel
US4789077A (en) *	1988-02-24	1988-12-06	Public Service Electric & Gas Company	Closure apparatus for a high pressure vessel
US4823976A (en) *	1988-05-04	1989-04-25	The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration	Quick actuating closure
US5236669A (en) *	1990-09-12	1993-08-17	E. I. Du Pont De Nemours And Company	Pressure vessel
US5221019A (en) *	1991-11-07	1993-06-22	Hahn & Clay	Remotely operable vessel cover positioner
JP2548062B2 (ja) *	1992-11-13	1996-10-30	日本エー・エス・エム株式会社	縦型熱処理装置用ロードロックチャンバー
US5556497A (en) *	1995-01-09	1996-09-17	Essef Corporation	Fitting installation process
JP2969087B2 (ja) *	1996-11-06	1999-11-02	日本エー・エス・エム株式会社	半導体基板の処理方法

2000
- 2000-08-04 EP EP00957297A patent/EP1208047A4/en not_active Withdrawn
- 2000-08-04 KR KR1020027001586A patent/KR20020061589A/ko not_active Ceased
- 2000-08-04 JP JP2001515214A patent/JP2003506646A/ja active Pending
- 2000-08-04 AU AU68936/00A patent/AU6893600A/en not_active Abandoned
- 2000-08-04 CN CNB008113327A patent/CN1204024C/zh not_active Expired - Fee Related
- 2000-08-04 IL IL14798600A patent/IL147986A0/xx unknown
- 2000-08-04 WO PCT/US2000/021338 patent/WO2001010733A1/en not_active Ceased

Also Published As

Publication number	Publication date
EP1208047A4 (en)	2004-03-31
WO2001010733A1 (en)	2001-02-15
KR20020061589A (ko)	2002-07-24
AU6893600A (en)	2001-03-05
EP1208047A1 (en)	2002-05-29
CN1368928A (zh)	2002-09-11
JP2003506646A (ja)	2003-02-18
CN1204024C (zh)	2005-06-01

Publication	Publication Date	Title
IL147986A0 (en)	2002-09-12	Inverted pressure vessel with horizontal throug loading
GB2349349B (en)	2002-07-31	Adjustable-volume vessel
AP2002002527A0 (en)	2002-06-30	Subsea well interventio vessel
AU140424S (en)	2000-04-17	Container
AU139593S (en)	2000-01-18	Container
AU141754S (en)	2000-09-11	Container
AU141190S (en)	2000-07-19	Container
AU139724S (en)	2000-02-07	Container
AU139723S (en)	2000-02-07	Container
AU141086S (en)	2000-07-07	Container
AU139807S (en)	2000-02-18	Container
GB0026049D0 (en)	2000-12-13	Dual chamber flexible container
AU139891S (en)	2000-02-22	Container
GB0002855D0 (en)	2000-03-29	Flexible container
AU141702S (en)	2000-09-06	Container
AU140836S (en)	2000-06-13	Container
AU139719S (en)	2000-02-07	Container
GB9904470D0 (en)	1999-04-21	Container arrangement
CA88012S (en)	1999-10-29	Eucharist vessel
AU139532S (en)	2000-01-06	Container
GB9905126D0 (en)	1999-04-28	Storage vessel
TW404396U (en)	2000-09-01	Barrel vessel structure
GB9907974D0 (en)	1999-06-02	Mobile pressure vessel
PL332335A1 (en)	2000-10-09	Contiguous vessels
TW392597U (en)	2000-06-01	Vessel connector