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AU6893600A - Inverted pressure vessel with horizontal through loading - Google Patents

Inverted pressure vessel with horizontal through loading

Info

Publication number
AU6893600A
AU6893600A AU68936/00A AU6893600A AU6893600A AU 6893600 A AU6893600 A AU 6893600A AU 68936/00 A AU68936/00 A AU 68936/00A AU 6893600 A AU6893600 A AU 6893600A AU 6893600 A AU6893600 A AU 6893600A
Authority
AU
Australia
Prior art keywords
loading
horizontal
pressure vessel
inverted pressure
inverted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU68936/00A
Inventor
Mohan Chandra
Robert Farmer
Ijaz Jafri
Heiko Moritz
Jonathan Talbot
James Tseronis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SC Fluids Inc
Original Assignee
SC Fluids Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SC Fluids Inc filed Critical SC Fluids Inc
Publication of AU6893600A publication Critical patent/AU6893600A/en
Abandoned legal-status Critical Current

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00Details of vessels or of the filling or discharging of vessels
    • F17C13/02Special adaptations of indicating, measuring, or monitoring equipment
    • H10P72/0441
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/008Processes carried out under supercritical conditions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/06Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
    • H10P72/3308

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)
  • Pressure Vessels And Lids Thereof (AREA)
  • Closures For Containers (AREA)
AU68936/00A 1999-08-05 2000-08-04 Inverted pressure vessel with horizontal through loading Abandoned AU6893600A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US14725199P 1999-08-05 1999-08-05
US60147251 1999-08-05
US15545499P 1999-09-20 1999-09-20
US60155454 1999-09-20
PCT/US2000/021338 WO2001010733A1 (en) 1999-08-05 2000-08-04 Inverted pressure vessel with horizontal through loading

Publications (1)

Publication Number Publication Date
AU6893600A true AU6893600A (en) 2001-03-05

Family

ID=26844748

Family Applications (1)

Application Number Title Priority Date Filing Date
AU68936/00A Abandoned AU6893600A (en) 1999-08-05 2000-08-04 Inverted pressure vessel with horizontal through loading

Country Status (7)

Country Link
EP (1) EP1208047A4 (en)
JP (1) JP2003506646A (en)
KR (1) KR20020061589A (en)
CN (1) CN1204024C (en)
AU (1) AU6893600A (en)
IL (1) IL147986A0 (en)
WO (1) WO2001010733A1 (en)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW539918B (en) 1997-05-27 2003-07-01 Tokyo Electron Ltd Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
WO2001046999A2 (en) 1999-11-02 2001-06-28 Tokyo Electron Limited Method and apparatus for supercritical processing of a workpiece
KR100693691B1 (en) 2000-04-25 2007-03-09 동경 엘렉트론 주식회사 Metal deposition complex processing apparatus including metal film deposition method and supercritical drying / cleaning module
WO2002009147A2 (en) * 2000-07-26 2002-01-31 Tokyo Electron Limited High pressure processing chamber for semiconductor substrate
IL154095A0 (en) * 2000-08-04 2003-07-31 S C Fluids Inc Inverted pressure vessel with shielded closure mechanism
US7001468B1 (en) 2002-02-15 2006-02-21 Tokyo Electron Limited Pressure energized pressure vessel opening and closing device and method of providing therefor
US7387868B2 (en) 2002-03-04 2008-06-17 Tokyo Electron Limited Treatment of a dielectric layer using supercritical CO2
US6722642B1 (en) * 2002-11-06 2004-04-20 Tokyo Electron Limited High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism
US7021635B2 (en) 2003-02-06 2006-04-04 Tokyo Electron Limited Vacuum chuck utilizing sintered material and method of providing thereof
US7077917B2 (en) 2003-02-10 2006-07-18 Tokyo Electric Limited High-pressure processing chamber for a semiconductor wafer
US7225820B2 (en) 2003-02-10 2007-06-05 Tokyo Electron Limited High-pressure processing chamber for a semiconductor wafer
US7270137B2 (en) 2003-04-28 2007-09-18 Tokyo Electron Limited Apparatus and method of securing a workpiece during high-pressure processing
US7163380B2 (en) 2003-07-29 2007-01-16 Tokyo Electron Limited Control of fluid flow in the processing of an object with a fluid
US7186093B2 (en) 2004-10-05 2007-03-06 Tokyo Electron Limited Method and apparatus for cooling motor bearings of a high pressure pump
US7250374B2 (en) 2004-06-30 2007-07-31 Tokyo Electron Limited System and method for processing a substrate using supercritical carbon dioxide processing
US7307019B2 (en) 2004-09-29 2007-12-11 Tokyo Electron Limited Method for supercritical carbon dioxide processing of fluoro-carbon films
US7491036B2 (en) 2004-11-12 2009-02-17 Tokyo Electron Limited Method and system for cooling a pump
US7140393B2 (en) 2004-12-22 2006-11-28 Tokyo Electron Limited Non-contact shuttle valve for flow diversion in high pressure systems
US7434590B2 (en) 2004-12-22 2008-10-14 Tokyo Electron Limited Method and apparatus for clamping a substrate in a high pressure processing system
US7435447B2 (en) 2005-02-15 2008-10-14 Tokyo Electron Limited Method and system for determining flow conditions in a high pressure processing system
US7291565B2 (en) 2005-02-15 2007-11-06 Tokyo Electron Limited Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid
US7380984B2 (en) 2005-03-28 2008-06-03 Tokyo Electron Limited Process flow thermocouple
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7494107B2 (en) 2005-03-30 2009-02-24 Supercritical Systems, Inc. Gate valve for plus-atmospheric pressure semiconductor process vessels
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US7524383B2 (en) 2005-05-25 2009-04-28 Tokyo Electron Limited Method and system for passivating a processing chamber
CN110410498B (en) * 2018-04-28 2025-03-25 重庆海扶医疗科技股份有限公司 Clamp assemblies and pressure vessels
CN112601620B (en) * 2018-07-25 2024-11-08 格拉弗技术国际控股有限公司 Extrusion press and method of use

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3744660A (en) * 1970-12-30 1973-07-10 Combustion Eng Shield for nuclear reactor vessel
US4789077A (en) * 1988-02-24 1988-12-06 Public Service Electric & Gas Company Closure apparatus for a high pressure vessel
US4823976A (en) * 1988-05-04 1989-04-25 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Quick actuating closure
US5236669A (en) * 1990-09-12 1993-08-17 E. I. Du Pont De Nemours And Company Pressure vessel
US5221019A (en) * 1991-11-07 1993-06-22 Hahn & Clay Remotely operable vessel cover positioner
JP2548062B2 (en) * 1992-11-13 1996-10-30 日本エー・エス・エム株式会社 Load lock chamber for vertical heat treatment equipment
US5556497A (en) * 1995-01-09 1996-09-17 Essef Corporation Fitting installation process
JP2969087B2 (en) * 1996-11-06 1999-11-02 日本エー・エス・エム株式会社 Semiconductor substrate processing method

Also Published As

Publication number Publication date
EP1208047A4 (en) 2004-03-31
WO2001010733A1 (en) 2001-02-15
KR20020061589A (en) 2002-07-24
EP1208047A1 (en) 2002-05-29
IL147986A0 (en) 2002-09-12
CN1368928A (en) 2002-09-11
JP2003506646A (en) 2003-02-18
CN1204024C (en) 2005-06-01

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase