AU6893600A - Inverted pressure vessel with horizontal through loading - Google Patents
Inverted pressure vessel with horizontal through loadingInfo
- Publication number
- AU6893600A AU6893600A AU68936/00A AU6893600A AU6893600A AU 6893600 A AU6893600 A AU 6893600A AU 68936/00 A AU68936/00 A AU 68936/00A AU 6893600 A AU6893600 A AU 6893600A AU 6893600 A AU6893600 A AU 6893600A
- Authority
- AU
- Australia
- Prior art keywords
- loading
- horizontal
- pressure vessel
- inverted pressure
- inverted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
-
- H10P72/0441—
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/008—Processes carried out under supercritical conditions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
-
- H10P72/3308—
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Pressure Vessels And Lids Thereof (AREA)
- Closures For Containers (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14725199P | 1999-08-05 | 1999-08-05 | |
| US60147251 | 1999-08-05 | ||
| US15545499P | 1999-09-20 | 1999-09-20 | |
| US60155454 | 1999-09-20 | ||
| PCT/US2000/021338 WO2001010733A1 (en) | 1999-08-05 | 2000-08-04 | Inverted pressure vessel with horizontal through loading |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU6893600A true AU6893600A (en) | 2001-03-05 |
Family
ID=26844748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU68936/00A Abandoned AU6893600A (en) | 1999-08-05 | 2000-08-04 | Inverted pressure vessel with horizontal through loading |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1208047A4 (en) |
| JP (1) | JP2003506646A (en) |
| KR (1) | KR20020061589A (en) |
| CN (1) | CN1204024C (en) |
| AU (1) | AU6893600A (en) |
| IL (1) | IL147986A0 (en) |
| WO (1) | WO2001010733A1 (en) |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW539918B (en) | 1997-05-27 | 2003-07-01 | Tokyo Electron Ltd | Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process |
| US6748960B1 (en) | 1999-11-02 | 2004-06-15 | Tokyo Electron Limited | Apparatus for supercritical processing of multiple workpieces |
| WO2001046999A2 (en) | 1999-11-02 | 2001-06-28 | Tokyo Electron Limited | Method and apparatus for supercritical processing of a workpiece |
| KR100693691B1 (en) | 2000-04-25 | 2007-03-09 | 동경 엘렉트론 주식회사 | Metal deposition complex processing apparatus including metal film deposition method and supercritical drying / cleaning module |
| WO2002009147A2 (en) * | 2000-07-26 | 2002-01-31 | Tokyo Electron Limited | High pressure processing chamber for semiconductor substrate |
| IL154095A0 (en) * | 2000-08-04 | 2003-07-31 | S C Fluids Inc | Inverted pressure vessel with shielded closure mechanism |
| US7001468B1 (en) | 2002-02-15 | 2006-02-21 | Tokyo Electron Limited | Pressure energized pressure vessel opening and closing device and method of providing therefor |
| US7387868B2 (en) | 2002-03-04 | 2008-06-17 | Tokyo Electron Limited | Treatment of a dielectric layer using supercritical CO2 |
| US6722642B1 (en) * | 2002-11-06 | 2004-04-20 | Tokyo Electron Limited | High pressure compatible vacuum chuck for semiconductor wafer including lift mechanism |
| US7021635B2 (en) | 2003-02-06 | 2006-04-04 | Tokyo Electron Limited | Vacuum chuck utilizing sintered material and method of providing thereof |
| US7077917B2 (en) | 2003-02-10 | 2006-07-18 | Tokyo Electric Limited | High-pressure processing chamber for a semiconductor wafer |
| US7225820B2 (en) | 2003-02-10 | 2007-06-05 | Tokyo Electron Limited | High-pressure processing chamber for a semiconductor wafer |
| US7270137B2 (en) | 2003-04-28 | 2007-09-18 | Tokyo Electron Limited | Apparatus and method of securing a workpiece during high-pressure processing |
| US7163380B2 (en) | 2003-07-29 | 2007-01-16 | Tokyo Electron Limited | Control of fluid flow in the processing of an object with a fluid |
| US7186093B2 (en) | 2004-10-05 | 2007-03-06 | Tokyo Electron Limited | Method and apparatus for cooling motor bearings of a high pressure pump |
| US7250374B2 (en) | 2004-06-30 | 2007-07-31 | Tokyo Electron Limited | System and method for processing a substrate using supercritical carbon dioxide processing |
| US7307019B2 (en) | 2004-09-29 | 2007-12-11 | Tokyo Electron Limited | Method for supercritical carbon dioxide processing of fluoro-carbon films |
| US7491036B2 (en) | 2004-11-12 | 2009-02-17 | Tokyo Electron Limited | Method and system for cooling a pump |
| US7140393B2 (en) | 2004-12-22 | 2006-11-28 | Tokyo Electron Limited | Non-contact shuttle valve for flow diversion in high pressure systems |
| US7434590B2 (en) | 2004-12-22 | 2008-10-14 | Tokyo Electron Limited | Method and apparatus for clamping a substrate in a high pressure processing system |
| US7435447B2 (en) | 2005-02-15 | 2008-10-14 | Tokyo Electron Limited | Method and system for determining flow conditions in a high pressure processing system |
| US7291565B2 (en) | 2005-02-15 | 2007-11-06 | Tokyo Electron Limited | Method and system for treating a substrate with a high pressure fluid using fluorosilicic acid |
| US7380984B2 (en) | 2005-03-28 | 2008-06-03 | Tokyo Electron Limited | Process flow thermocouple |
| US7767145B2 (en) | 2005-03-28 | 2010-08-03 | Toyko Electron Limited | High pressure fourier transform infrared cell |
| US7494107B2 (en) | 2005-03-30 | 2009-02-24 | Supercritical Systems, Inc. | Gate valve for plus-atmospheric pressure semiconductor process vessels |
| US7789971B2 (en) | 2005-05-13 | 2010-09-07 | Tokyo Electron Limited | Treatment of substrate using functionalizing agent in supercritical carbon dioxide |
| US7524383B2 (en) | 2005-05-25 | 2009-04-28 | Tokyo Electron Limited | Method and system for passivating a processing chamber |
| CN110410498B (en) * | 2018-04-28 | 2025-03-25 | 重庆海扶医疗科技股份有限公司 | Clamp assemblies and pressure vessels |
| CN112601620B (en) * | 2018-07-25 | 2024-11-08 | 格拉弗技术国际控股有限公司 | Extrusion press and method of use |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3744660A (en) * | 1970-12-30 | 1973-07-10 | Combustion Eng | Shield for nuclear reactor vessel |
| US4789077A (en) * | 1988-02-24 | 1988-12-06 | Public Service Electric & Gas Company | Closure apparatus for a high pressure vessel |
| US4823976A (en) * | 1988-05-04 | 1989-04-25 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Quick actuating closure |
| US5236669A (en) * | 1990-09-12 | 1993-08-17 | E. I. Du Pont De Nemours And Company | Pressure vessel |
| US5221019A (en) * | 1991-11-07 | 1993-06-22 | Hahn & Clay | Remotely operable vessel cover positioner |
| JP2548062B2 (en) * | 1992-11-13 | 1996-10-30 | 日本エー・エス・エム株式会社 | Load lock chamber for vertical heat treatment equipment |
| US5556497A (en) * | 1995-01-09 | 1996-09-17 | Essef Corporation | Fitting installation process |
| JP2969087B2 (en) * | 1996-11-06 | 1999-11-02 | 日本エー・エス・エム株式会社 | Semiconductor substrate processing method |
-
2000
- 2000-08-04 EP EP00957297A patent/EP1208047A4/en not_active Withdrawn
- 2000-08-04 KR KR1020027001586A patent/KR20020061589A/en not_active Ceased
- 2000-08-04 JP JP2001515214A patent/JP2003506646A/en active Pending
- 2000-08-04 AU AU68936/00A patent/AU6893600A/en not_active Abandoned
- 2000-08-04 CN CNB008113327A patent/CN1204024C/en not_active Expired - Fee Related
- 2000-08-04 IL IL14798600A patent/IL147986A0/en unknown
- 2000-08-04 WO PCT/US2000/021338 patent/WO2001010733A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| EP1208047A4 (en) | 2004-03-31 |
| WO2001010733A1 (en) | 2001-02-15 |
| KR20020061589A (en) | 2002-07-24 |
| EP1208047A1 (en) | 2002-05-29 |
| IL147986A0 (en) | 2002-09-12 |
| CN1368928A (en) | 2002-09-11 |
| JP2003506646A (en) | 2003-02-18 |
| CN1204024C (en) | 2005-06-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |