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HK1221071B - 曝光设备、曝光方法及其装置制造方法 - Google Patents

曝光设备、曝光方法及其装置制造方法 Download PDF

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Publication number
HK1221071B
HK1221071B HK16109044.9A HK16109044A HK1221071B HK 1221071 B HK1221071 B HK 1221071B HK 16109044 A HK16109044 A HK 16109044A HK 1221071 B HK1221071 B HK 1221071B
Authority
HK
Hong Kong
Prior art keywords
stage
wafer
projection optical
substrate
optical system
Prior art date
Application number
HK16109044.9A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1221071A1 (zh
Inventor
Yuichi Shibazaki
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1221071A1 publication Critical patent/HK1221071A1/zh
Publication of HK1221071B publication Critical patent/HK1221071B/zh

Links

HK16109044.9A 2004-02-02 2011-06-07 曝光设备、曝光方法及其装置制造方法 HK1221071B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2004025837 2004-02-02
JP2004025837 2004-02-02
JP2004300566 2004-10-14
JP2004300566 2004-10-14

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
HK11105685.6A Addition HK1151631B (zh) 2004-02-02 2011-06-07 曝光设备、曝光方法及器件制造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
HK11105685.6A Division HK1151631B (zh) 2004-02-02 2011-06-07 曝光设备、曝光方法及器件制造方法

Publications (2)

Publication Number Publication Date
HK1221071A1 HK1221071A1 (zh) 2017-05-19
HK1221071B true HK1221071B (zh) 2018-05-04

Family

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