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HK1214405B - 曝光装置、曝光方法以及器件制造方法 - Google Patents

曝光装置、曝光方法以及器件制造方法 Download PDF

Info

Publication number
HK1214405B
HK1214405B HK16102125.6A HK16102125A HK1214405B HK 1214405 B HK1214405 B HK 1214405B HK 16102125 A HK16102125 A HK 16102125A HK 1214405 B HK1214405 B HK 1214405B
Authority
HK
Hong Kong
Prior art keywords
liquid
substrate
recovery
supply
exposure apparatus
Prior art date
Application number
HK16102125.6A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1214405A1 (zh
Inventor
Hiroyuki Nagasaka
Yasufumi Nishii
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1214405A1 publication Critical patent/HK1214405A1/zh
Publication of HK1214405B publication Critical patent/HK1214405B/zh

Links

HK16102125.6A 2003-02-26 2016-02-25 曝光装置、曝光方法以及器件制造方法 HK1214405B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2003049365 2003-02-26
JP2003049365 2003-02-26
JP2003110748 2003-04-15
JP2003110748 2003-04-15
JP2003320100 2003-09-11
JP2003320100 2003-09-11

Publications (2)

Publication Number Publication Date
HK1214405A1 HK1214405A1 (zh) 2016-07-22
HK1214405B true HK1214405B (zh) 2018-04-13

Family

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