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HK1170065B - 曝光设备、曝光方法和制造装置的方法 - Google Patents

曝光设备、曝光方法和制造装置的方法 Download PDF

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Publication number
HK1170065B
HK1170065B HK12110801.4A HK12110801A HK1170065B HK 1170065 B HK1170065 B HK 1170065B HK 12110801 A HK12110801 A HK 12110801A HK 1170065 B HK1170065 B HK 1170065B
Authority
HK
Hong Kong
Prior art keywords
liquid
substrate
recovery
supply
exposure apparatus
Prior art date
Application number
HK12110801.4A
Other languages
German (de)
English (en)
French (fr)
Other versions
HK1170065A1 (zh
Inventor
Hiroyuki Nagasaka
Soichi Owa
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1170065A1 publication Critical patent/HK1170065A1/zh
Publication of HK1170065B publication Critical patent/HK1170065B/zh

Links

HK12110801.4A 2003-02-26 2012-10-29 曝光设备、曝光方法和制造装置的方法 HK1170065B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2003049365 2003-02-26
JP2003049365 2003-02-26
JP2003110748 2003-04-15
JP2003110748 2003-04-15
JP2003320100 2003-09-11

Publications (2)

Publication Number Publication Date
HK1170065A1 HK1170065A1 (zh) 2013-02-15
HK1170065B true HK1170065B (zh) 2015-12-18

Family

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