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HK1185667B - Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine - Google Patents

Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine Download PDF

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Publication number
HK1185667B
HK1185667B HK13113046.2A HK13113046A HK1185667B HK 1185667 B HK1185667 B HK 1185667B HK 13113046 A HK13113046 A HK 13113046A HK 1185667 B HK1185667 B HK 1185667B
Authority
HK
Hong Kong
Prior art keywords
projection lens
during wafer
lens during
lithography machine
gap under
Prior art date
Application number
HK13113046.2A
Other languages
Chinese (zh)
Other versions
HK1185667A1 (en
Inventor
Michael Binnard
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of HK1185667A1 publication Critical patent/HK1185667A1/en
Publication of HK1185667B publication Critical patent/HK1185667B/en

Links

HK13113046.2A 2003-04-11 2013-11-22 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine HK1185667B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46249903P 2003-04-11 2003-04-11
US462499P 2003-04-11

Publications (2)

Publication Number Publication Date
HK1185667A1 HK1185667A1 (en) 2014-02-21
HK1185667B true HK1185667B (en) 2016-05-27

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