GB976573A - Improvements in and relating to metal plating - Google Patents
Improvements in and relating to metal platingInfo
- Publication number
- GB976573A GB976573A GB4336860A GB4336860A GB976573A GB 976573 A GB976573 A GB 976573A GB 4336860 A GB4336860 A GB 4336860A GB 4336860 A GB4336860 A GB 4336860A GB 976573 A GB976573 A GB 976573A
- Authority
- GB
- United Kingdom
- Prior art keywords
- compound
- benzene ring
- oxygen
- ring
- arene
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052751 metal Inorganic materials 0.000 title abstract 2
- 239000002184 metal Substances 0.000 title abstract 2
- 238000007747 plating Methods 0.000 title abstract 2
- 150000001875 compounds Chemical class 0.000 abstract 5
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 abstract 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 abstract 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 229910052760 oxygen Inorganic materials 0.000 abstract 2
- 239000001301 oxygen Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052799 carbon Inorganic materials 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 229910052804 chromium Inorganic materials 0.000 abstract 1
- 239000010949 copper Substances 0.000 abstract 1
- 229910052802 copper Inorganic materials 0.000 abstract 1
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 239000011521 glass Substances 0.000 abstract 1
- 229910002804 graphite Inorganic materials 0.000 abstract 1
- 239000010439 graphite Substances 0.000 abstract 1
- 229910052750 molybdenum Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 239000004033 plastic Substances 0.000 abstract 1
- 229920003023 plastic Polymers 0.000 abstract 1
- 239000004332 silver Substances 0.000 abstract 1
- 229910052709 silver Inorganic materials 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 239000010935 stainless steel Substances 0.000 abstract 1
- 229910001220 stainless steel Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052721 tungsten Inorganic materials 0.000 abstract 1
- 229910052720 vanadium Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
A process for plating solid substrates (e.g. glass, ceramics, plastics, copper, aluminium, stainless steel, silver or graphite) with V, Nb, Ta, Cr, Mo or W, comprises contacting a bis(arene) compound of the metal in an inert oxygen-free gas (e.g. A, N2, He or H2) with the substrate at a temperature above the decomposition temperature of said compound, while excluding oxygen and reative oxygen-containing compounds. The bis(arene) compound may be produced by the method of Specification 829,574 and is of the form Ar2M wherein Ar is an aromatic hydrocarbon containing an isolated benzene ring (e.g. a benzene ring per se or a fused ring compound in which any double bond in a ring fused to a benzene ring is at least two carbon atoms away from the benzene ring carbon nearest to it).
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US862808A US3305386A (en) | 1955-10-05 | 1959-12-30 | Metal plating process utilizing bis (arene) metal compounds |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB976573A true GB976573A (en) | 1964-11-25 |
Family
ID=25339416
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB4336860A Expired GB976573A (en) | 1959-12-30 | 1960-12-16 | Improvements in and relating to metal plating |
Country Status (2)
| Country | Link |
|---|---|
| CH (1) | CH405872A (en) |
| GB (1) | GB976573A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6015917A (en) * | 1998-01-23 | 2000-01-18 | Advanced Technology Materials, Inc. | Tantalum amide precursors for deposition of tantalum nitride on a substrate |
| US7371880B2 (en) | 2004-06-16 | 2008-05-13 | Advanced Technology Materials, Inc. | Copper (I) compounds useful as deposition precursors of copper thin films |
| US7547796B2 (en) | 2005-09-29 | 2009-06-16 | Praxair Technology, Inc. | Organometallic compounds, processes for the preparation thereof and methods of use thereof |
| US7750173B2 (en) | 2007-01-18 | 2010-07-06 | Advanced Technology Materials, Inc. | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films |
| US7959986B2 (en) | 2006-08-09 | 2011-06-14 | Praxair Technology, Inc. | Organometallic compounds, processes for the preparation thereof and methods of use thereof |
-
1960
- 1960-12-16 GB GB4336860A patent/GB976573A/en not_active Expired
- 1960-12-30 CH CH1460060A patent/CH405872A/en unknown
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6015917A (en) * | 1998-01-23 | 2000-01-18 | Advanced Technology Materials, Inc. | Tantalum amide precursors for deposition of tantalum nitride on a substrate |
| US6379748B1 (en) | 1998-01-23 | 2002-04-30 | Advanced Technology Materials, Inc. | Tantalum amide precursors for deposition of tantalum nitride on a substrate |
| US7371880B2 (en) | 2004-06-16 | 2008-05-13 | Advanced Technology Materials, Inc. | Copper (I) compounds useful as deposition precursors of copper thin films |
| US7531031B2 (en) | 2004-06-16 | 2009-05-12 | Advanced Technology Materials, Inc. | Copper (I) compounds useful as deposition precursors of copper thin films |
| US7547796B2 (en) | 2005-09-29 | 2009-06-16 | Praxair Technology, Inc. | Organometallic compounds, processes for the preparation thereof and methods of use thereof |
| US7959986B2 (en) | 2006-08-09 | 2011-06-14 | Praxair Technology, Inc. | Organometallic compounds, processes for the preparation thereof and methods of use thereof |
| US7750173B2 (en) | 2007-01-18 | 2010-07-06 | Advanced Technology Materials, Inc. | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films |
| US7858816B2 (en) | 2007-01-18 | 2010-12-28 | Advanced Technology Materials, Inc. | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films |
Also Published As
| Publication number | Publication date |
|---|---|
| CH405872A (en) | 1966-01-15 |
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