GB784001A - Positive diazotype printing plates - Google Patents
Positive diazotype printing platesInfo
- Publication number
- GB784001A GB784001A GB15451/55A GB1545155A GB784001A GB 784001 A GB784001 A GB 784001A GB 15451/55 A GB15451/55 A GB 15451/55A GB 1545155 A GB1545155 A GB 1545155A GB 784001 A GB784001 A GB 784001A
- Authority
- GB
- United Kingdom
- Prior art keywords
- diazo
- cellulose
- copolymer
- exposed
- offset
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007639 printing Methods 0.000 title abstract 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 abstract 4
- 239000011347 resin Substances 0.000 abstract 4
- 229920005989 resin Polymers 0.000 abstract 4
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 abstract 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 abstract 3
- 229920002678 cellulose Polymers 0.000 abstract 3
- 229920001577 copolymer Polymers 0.000 abstract 3
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 abstract 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 abstract 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 abstract 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 abstract 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 abstract 2
- 239000002585 base Substances 0.000 abstract 2
- 239000001913 cellulose Substances 0.000 abstract 2
- -1 dried Substances 0.000 abstract 2
- 235000011187 glycerol Nutrition 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 abstract 1
- JVNKYYGQNQJOEN-UHFFFAOYSA-N 2-diazo-1h-naphthalen-1-ol Chemical compound C1=CC=C2C(O)C(=[N+]=[N-])C=CC2=C1 JVNKYYGQNQJOEN-UHFFFAOYSA-N 0.000 abstract 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 abstract 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 abstract 1
- 229920000084 Gum arabic Polymers 0.000 abstract 1
- 241000978776 Senegalia senegal Species 0.000 abstract 1
- SMEGJBVQLJJKKX-HOTMZDKISA-N [(2R,3S,4S,5R,6R)-5-acetyloxy-3,4,6-trihydroxyoxan-2-yl]methyl acetate Chemical compound CC(=O)OC[C@@H]1[C@H]([C@@H]([C@H]([C@@H](O1)O)OC(=O)C)O)O SMEGJBVQLJJKKX-HOTMZDKISA-N 0.000 abstract 1
- 239000000205 acacia gum Substances 0.000 abstract 1
- 235000010489 acacia gum Nutrition 0.000 abstract 1
- 229940081735 acetylcellulose Drugs 0.000 abstract 1
- 239000003929 acidic solution Substances 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 239000003513 alkali Substances 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- 239000004411 aluminium Substances 0.000 abstract 1
- 239000011324 bead Substances 0.000 abstract 1
- 239000001768 carboxy methyl cellulose Substances 0.000 abstract 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 abstract 1
- 239000005018 casein Substances 0.000 abstract 1
- 229920002301 cellulose acetate Polymers 0.000 abstract 1
- 229920003086 cellulose ether Polymers 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 abstract 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 abstract 1
- 230000002209 hydrophobic effect Effects 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 abstract 1
- 238000007645 offset printing Methods 0.000 abstract 1
- 229920002689 polyvinyl acetate Polymers 0.000 abstract 1
- 239000011118 polyvinyl acetate Substances 0.000 abstract 1
- 239000000243 solution Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
784,001. Photolithographic process and material. FENERAL ALILINE & FILM CORPORATION. May 27, 1955 [Aug. 20, 1954], No. 15451/55. Drawings to Specification. Class 98(2) A base is provided with a hydrophobic layer of a copolymer of vinyl methyl ether and maleic anhydride, which may contain a compatible water-insoluble resin or cellulose ester or ether, and then a layer of a similar insoluble resin or cellulose derivative containing a water-insoluble diazo oxide. On exposure under a positive and washing with an aliphatic polyhydroxy compound the outer layer is removed in the exposed areas and then on treating with an alkylolamine the underlying copolymer is given a hydrophilic character, so that the result may be used as offset printing plate, desirably with a desensitizing treatment before inking. In Example 1 a wet-strength clay-casein surfaced paper is lacquered with a solution of the copolymer together with high acetyl cellulose acetate in a mixture of methylene chloride, ethylene glycol monomethyl ether and acetone, dried, bead-coated with 2 - diazo- 1 - naphthol - 5 - sulphonic acid ethyl ester together with a phenol modified coumarone-indene resin in methyl isobutyl ketone exposed, attached to the cylinder of an offset duplicator, swabbed with a mixture of ethylene glycol and glycerin and then with diethanolamine in glycerin to produce the printing plate, which is treated with an acidic solution of gum arabic or cellulose gum containing alkali dichromate if desired, to facilitate ink pickup. In Example IV a similarly lacquered paper base is sensitized with N - dehydrobietyl [6 - diazo - 5 (6) - oxo - 1 napthalenesulphonamide with polyvinyl acetate in methyl isobutyl ketone, exposed and treated similarly. Fourteen further examples and various lists describe numerous other resins, cellulose derivatives, diazo oxide sensitizers, solvents and other liquids for use with the coplymer described above. A seventeeth example is directed to the production of a positive working diazo sensitized aluminium offset plate for comparison with the coplymer plate of Example IV. Specifications 699,412 and 721,660 [Group IV(a)] are referred to.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US451271A US2772972A (en) | 1954-08-20 | 1954-08-20 | Positive diazotype printing plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB784001A true GB784001A (en) | 1957-10-02 |
Family
ID=23791529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB15451/55A Expired GB784001A (en) | 1954-08-20 | 1955-05-27 | Positive diazotype printing plates |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US2772972A (en) |
| BE (1) | BE540225A (en) |
| CH (1) | CH347712A (en) |
| DE (1) | DE1108079B (en) |
| FR (1) | FR1134857A (en) |
| GB (1) | GB784001A (en) |
| NL (2) | NL199728A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3634086A (en) * | 1966-05-31 | 1972-01-11 | Howson Algraphy Ltd | Solvent development of light-sensitive diazo layers |
Families Citing this family (49)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE507657A (en) * | 1950-12-06 | |||
| GB907718A (en) * | 1957-11-01 | 1962-10-10 | Lithoplate Inc | Hydrophilic base plates for diazo presensitized lithographic printing plates |
| US2993788A (en) * | 1958-06-17 | 1961-07-25 | Gen Aniline & Film Corp | Multicolor reproduction using light sensitive diazo oxides |
| US3130051A (en) * | 1958-12-10 | 1964-04-21 | Gen Aniline & Film Corp | Process for producing negative working offset diazo printing plates |
| DE1095665B (en) * | 1959-01-12 | 1960-12-22 | Hans Hoerner | Process for the photomechanical production of letterpress forms from several plastic layers |
| US3095301A (en) * | 1959-04-06 | 1963-06-25 | Gen Aniline & Film Corp | Electrophotographic element |
| US3173788A (en) * | 1960-02-10 | 1965-03-16 | Gen Aniline & Film Corp | Developing positive working photolitho-graphic printing plates containing diazo oxides |
| US3164468A (en) * | 1960-06-06 | 1965-01-05 | Gen Aniline & Film Corp | Photomechanical reversal process and foil and dyes for use therein |
| US3086861A (en) * | 1960-07-01 | 1963-04-23 | Gen Aniline & Film Corp | Printing plates comprising ink receptive azo dye surfaces |
| US3149972A (en) * | 1960-08-16 | 1964-09-22 | Gen Aniline & Film Corp | Diazo and resinous coupler printing plates for photomechanical reproduction |
| BE612386A (en) * | 1961-01-09 | |||
| NL138044C (en) * | 1961-07-28 | |||
| CA774047A (en) * | 1963-12-09 | 1967-12-19 | Shipley Company | Light-sensitive material and process for the development thereof |
| US3486450A (en) * | 1964-02-27 | 1969-12-30 | Eastman Kodak Co | Color proofing system |
| DE1472771A1 (en) * | 1965-07-30 | 1969-01-02 | Adox Du Pont Fotowerke | Process for the production of dimensionally stable photographic films |
| US3549373A (en) * | 1966-03-19 | 1970-12-22 | Ricoh Kk | Negative-to-positive reversible copy sheet |
| US3474719A (en) * | 1966-04-15 | 1969-10-28 | Gaf Corp | Offset printing plates |
| NL136645C (en) * | 1966-12-12 | |||
| US3637384A (en) * | 1969-02-17 | 1972-01-25 | Gaf Corp | Positive-working diazo-oxide terpolymer photoresists |
| US3920455A (en) * | 1971-05-28 | 1975-11-18 | Polychrome Corp | Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters |
| JPS521663B2 (en) * | 1973-02-10 | 1977-01-17 | ||
| JPS5421089B2 (en) * | 1973-05-29 | 1979-07-27 | ||
| GB1482921A (en) * | 1973-07-31 | 1977-08-17 | Glaxo Lab Ltd | Polymers |
| DE2934897C1 (en) * | 1978-02-06 | 1984-09-20 | Napp Systems (USA), Inc., San Marcos, Calif. | Desensitization solution for photosensitive diazo printing plates |
| CA1180931A (en) * | 1980-09-15 | 1985-01-15 | Robert W. Hallman | Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer |
| JPH01501176A (en) * | 1986-10-20 | 1989-04-20 | マクダーミッド，インコーポレーテッド | Image reversible systems and processes |
| EP0280197A3 (en) * | 1987-02-23 | 1990-05-23 | Oki Electric Industry Company, Limited | Process for forming photoresist pattern |
| EP0410606B1 (en) | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
| US5314782A (en) * | 1993-03-05 | 1994-05-24 | Morton International, Inc. | Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative |
| US5308744A (en) * | 1993-03-05 | 1994-05-03 | Morton International, Inc. | Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives |
| JPH0876380A (en) | 1994-09-06 | 1996-03-22 | Fuji Photo Film Co Ltd | Positive printing plate composition |
| WO1997039894A1 (en) | 1996-04-23 | 1997-10-30 | Horsell Graphic Industries Limited | Heat-sensitive composition and method of making a lithographic printing form with it |
| JP3522923B2 (en) | 1995-10-23 | 2004-04-26 | 富士写真フイルム株式会社 | Silver halide photosensitive material |
| TW502135B (en) * | 1996-05-13 | 2002-09-11 | Sumitomo Bakelite Co | Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same |
| US6117610A (en) * | 1997-08-08 | 2000-09-12 | Kodak Polychrome Graphics Llc | Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use |
| GB9622657D0 (en) | 1996-10-31 | 1997-01-08 | Horsell Graphic Ind Ltd | Direct positive lithographic plate |
| DE69706396T2 (en) | 1997-01-03 | 2002-04-18 | Sumitomo Bakelite Co. Ltd., Tokio/Tokyo | Process for imaging a photosensitive resin composition |
| US6063544A (en) * | 1997-03-21 | 2000-05-16 | Kodak Polychrome Graphics Llc | Positive-working printing plate and method of providing a positive image therefrom using laser imaging |
| US6090532A (en) * | 1997-03-21 | 2000-07-18 | Kodak Polychrome Graphics Llc | Positive-working infrared radiation sensitive composition and printing plate and imaging method |
| WO1999001795A2 (en) | 1997-07-05 | 1999-01-14 | Kodak Polychrome Graphics Company Ltd. | Pattern-forming methods and radiation sensitive materials |
| US6060217A (en) * | 1997-09-02 | 2000-05-09 | Kodak Polychrome Graphics Llc | Thermal lithographic printing plates |
| US6045963A (en) * | 1998-03-17 | 2000-04-04 | Kodak Polychrome Graphics Llc | Negative-working dry planographic printing plate |
| US6296982B1 (en) | 1999-11-19 | 2001-10-02 | Kodak Polychrome Graphics Llc | Imaging articles |
| WO2002037184A1 (en) * | 2000-10-31 | 2002-05-10 | Sumitomo Bakelite Company Limited | Positive photosensitive resin composition, process for its preparation, and semiconductor devices |
| EP1707588A4 (en) * | 2004-01-20 | 2009-07-01 | Asahi Kasei Emd Corp | Resin and resin composition |
| JP5034269B2 (en) | 2005-03-31 | 2012-09-26 | 大日本印刷株式会社 | Pattern forming material and polyimide precursor resin composition |
| US7687208B2 (en) | 2006-08-15 | 2010-03-30 | Asahi Kasei Emd Corporation | Positive photosensitive resin composition |
| CN107850844B (en) | 2016-03-31 | 2021-09-07 | 旭化成株式会社 | Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device |
| CN112142613B (en) * | 2020-09-22 | 2021-06-25 | 江南大学 | A kind of rosin-based small molecule organic gelling agent and its formed cyclohexane gel |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE525534C (en) * | 1930-07-09 | 1931-05-26 | Klimsch & Co | Process for developing chromate shellac copies |
| BE416158A (en) * | 1935-01-12 | |||
| DE699462C (en) * | 1936-02-15 | 1940-11-29 | Kodak Akt Ges | Photographic film with a subbing layer for the photosensitive emulsion |
| DE754015C (en) * | 1940-02-24 | 1953-05-11 | Johannes Dr Albrecht | Photosensitive layer for the production of printing forms |
| DE862956C (en) * | 1941-10-30 | 1953-01-15 | Basf Ag | Process for the production of copolymers |
| BE476486A (en) * | 1947-05-09 | |||
| NL70798C (en) * | 1948-10-15 | |||
| DE879203C (en) * | 1949-07-23 | 1953-04-23 | Kalle & Co Ag | Process for the production of copies, especially printing forms, with the aid of diazo compounds |
| DE960335C (en) * | 1951-06-07 | 1957-03-21 | Kalle & Co Ag | Photosensitive material |
| DE904733C (en) * | 1951-09-29 | 1954-02-22 | Johannes Herzog & Co Photochem | Photosensitive material for the production of source reliefs for printing purposes and methods of printing with the reliefs |
| BE523231A (en) * | 1953-05-22 |
-
0
- NL NL95407D patent/NL95407C/xx active
- BE BE540225D patent/BE540225A/xx unknown
- NL NL199728D patent/NL199728A/xx unknown
-
1954
- 1954-08-20 US US451271A patent/US2772972A/en not_active Expired - Lifetime
-
1955
- 1955-05-27 GB GB15451/55A patent/GB784001A/en not_active Expired
- 1955-07-20 FR FR1134857D patent/FR1134857A/en not_active Expired
- 1955-08-04 DE DEG17721A patent/DE1108079B/en active Pending
- 1955-08-17 CH CH347712D patent/CH347712A/en unknown
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3634086A (en) * | 1966-05-31 | 1972-01-11 | Howson Algraphy Ltd | Solvent development of light-sensitive diazo layers |
Also Published As
| Publication number | Publication date |
|---|---|
| BE540225A (en) | |
| NL199728A (en) | |
| FR1134857A (en) | 1957-04-18 |
| NL95407C (en) | |
| CH347712A (en) | 1960-07-15 |
| DE1108079B (en) | 1961-05-31 |
| US2772972A (en) | 1956-12-04 |
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