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NL95407C - - Google Patents

Info

Publication number
NL95407C
NL95407C NL95407DA NL95407C NL 95407 C NL95407 C NL 95407C NL 95407D A NL95407D A NL 95407DA NL 95407 C NL95407 C NL 95407C
Authority
NL
Netherlands
Application number
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication of NL95407C publication Critical patent/NL95407C/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
NL95407D 1954-08-20 NL95407C (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451271A US2772972A (en) 1954-08-20 1954-08-20 Positive diazotype printing plates

Publications (1)

Publication Number Publication Date
NL95407C true NL95407C (en)

Family

ID=23791529

Family Applications (2)

Application Number Title Priority Date Filing Date
NL95407D NL95407C (en) 1954-08-20
NL199728D NL199728A (en) 1954-08-20

Family Applications After (1)

Application Number Title Priority Date Filing Date
NL199728D NL199728A (en) 1954-08-20

Country Status (7)

Country Link
US (1) US2772972A (en)
BE (1) BE540225A (en)
CH (1) CH347712A (en)
DE (1) DE1108079B (en)
FR (1) FR1134857A (en)
GB (1) GB784001A (en)
NL (2) NL199728A (en)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE507657A (en) * 1950-12-06
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
DE1095665B (en) * 1959-01-12 1960-12-22 Hans Hoerner Process for the photomechanical production of letterpress forms from several plastic layers
US3095301A (en) * 1959-04-06 1963-06-25 Gen Aniline & Film Corp Electrophotographic element
US3173788A (en) * 1960-02-10 1965-03-16 Gen Aniline & Film Corp Developing positive working photolitho-graphic printing plates containing diazo oxides
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
BE612386A (en) * 1961-01-09
BE620660A (en) * 1961-07-28
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3486450A (en) * 1964-02-27 1969-12-30 Eastman Kodak Co Color proofing system
DE1472771A1 (en) * 1965-07-30 1969-01-02 Adox Du Pont Fotowerke Process for the production of dimensionally stable photographic films
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
GB1188527A (en) * 1966-05-31 1970-04-15 Algraphy Ltd Development of Light-Sensitive Layers
NL136645C (en) * 1966-12-12
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
JPS521663B2 (en) * 1973-02-10 1977-01-17
JPS5421089B2 (en) * 1973-05-29 1979-07-27
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
WO1979000593A1 (en) * 1978-02-06 1979-08-23 Napp Systems Inc Desensitizing solution and process for treating a diazo photosensitive printing plate
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
JPH01501176A (en) * 1986-10-20 1989-04-20 マクダーミッド，インコーポレーテッド Image reversible systems and processes
EP0280197A3 (en) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Process for forming photoresist pattern
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
US5308744A (en) * 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
JPH0876380A (en) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd Positive printing plate composition
JP3522923B2 (en) 1995-10-23 2004-04-26 富士写真フイルム株式会社 Silver halide photosensitive material
CN1078132C (en) 1996-04-23 2002-01-23 霍西尔绘图工业有限公司 Heat-sensitive composition and method of making lithographic printing from it
TW502135B (en) 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
DE69706396T2 (en) 1997-01-03 2002-04-18 Sumitomo Bakelite Co. Ltd., Tokio/Tokyo Process for imaging a photosensitive resin composition
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
EP0996869A1 (en) 1997-07-05 2000-05-03 Kodak Polychrome Graphics LLC Pattern-forming methods and radiation sensitive materials
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
KR100766648B1 (en) * 2000-10-31 2007-10-15 인텔 코포레이션 Positive photosensitive resin composition, manufacturing method of positive photosensitive resin composition and semiconductor device
WO2005068535A1 (en) * 2004-01-20 2005-07-28 Asahi Kasei Emd Corporation Resin and resin composition
JP5034269B2 (en) 2005-03-31 2012-09-26 大日本印刷株式会社 Pattern forming material and polyimide precursor resin composition
CN101495919B (en) 2006-08-15 2015-05-06 旭化成电子材料株式会社 Positive photosensitive resin composition, method for preparing cured relief pattern, and semiconductor device
US10831101B2 (en) 2016-03-31 2020-11-10 Asahi Kasei Kabushiki Kaisha Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus
CN112142613B (en) * 2020-09-22 2021-06-25 江南大学 A kind of rosin-based small molecule organic gelling agent and its formed cyclohexane gel

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE525534C (en) * 1930-07-09 1931-05-26 Klimsch & Co Process for developing chromate shellac copies
BE416158A (en) * 1935-01-12
DE699462C (en) * 1936-02-15 1940-11-29 Kodak Akt Ges Photographic film with a subbing layer for the photosensitive emulsion
DE754015C (en) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Photosensitive layer for the production of printing forms
DE862956C (en) * 1941-10-30 1953-01-15 Basf Ag Process for the production of copolymers
BE476486A (en) * 1947-05-09
NL70798C (en) * 1948-10-15
BE497135A (en) * 1949-07-23
DE960335C (en) * 1951-06-07 1957-03-21 Kalle & Co Ag Photosensitive material
DE904733C (en) * 1951-09-29 1954-02-22 Johannes Herzog & Co Photochem Photosensitive material for the production of source reliefs for printing purposes and methods of printing with the reliefs
BE523231A (en) * 1953-05-22

Also Published As

Publication number Publication date
NL199728A (en)
US2772972A (en) 1956-12-04
BE540225A (en)
FR1134857A (en) 1957-04-18
CH347712A (en) 1960-07-15
DE1108079B (en) 1961-05-31
GB784001A (en) 1957-10-02

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