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GB2605211B - A method of forming a graphene layer structure and a graphene substrate - Google Patents

A method of forming a graphene layer structure and a graphene substrate Download PDF

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Publication number
GB2605211B
GB2605211B GB2110027.6A GB202110027A GB2605211B GB 2605211 B GB2605211 B GB 2605211B GB 202110027 A GB202110027 A GB 202110027A GB 2605211 B GB2605211 B GB 2605211B
Authority
GB
United Kingdom
Prior art keywords
graphene
forming
layer structure
substrate
graphene layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB2110027.6A
Other versions
GB202110027D0 (en
GB2605211A (en
Inventor
Dixon Sebastian
Guiney Ivor
Thomas Simon
Matthew Griffin Ross
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Paragraf Ltd
Original Assignee
Paragraf Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB2104140.5A external-priority patent/GB2605167B/en
Priority claimed from GB2106149.4A external-priority patent/GB2606203B/en
Application filed by Paragraf Ltd filed Critical Paragraf Ltd
Publication of GB202110027D0 publication Critical patent/GB202110027D0/en
Priority to GB2203995.2A priority Critical patent/GB2607410B/en
Priority to GB2218951.8A priority patent/GB2615867B/en
Priority to DE112022001740.6T priority patent/DE112022001740T5/en
Priority to PCT/EP2022/057497 priority patent/WO2022200351A1/en
Priority to TW111111013A priority patent/TWI836383B/en
Priority to TW113105883A priority patent/TWI881715B/en
Publication of GB2605211A publication Critical patent/GB2605211A/en
Priority to US18/283,770 priority patent/US20240166521A1/en
Publication of GB2605211B publication Critical patent/GB2605211B/en
Application granted granted Critical
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00—Carbon; Compounds thereof
    • C01B32/15—Nano-sized carbon materials
    • C01B32/182—Graphene
    • C01B32/184—Preparation
    • C01B32/186—Preparation by chemical vapour deposition [CVD]
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45572—Cooled nozzles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Nanotechnology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Carbon And Carbon Compounds (AREA)
GB2110027.6A 2021-03-24 2021-07-12 A method of forming a graphene layer structure and a graphene substrate Active GB2605211B (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
PCT/EP2022/057497 WO2022200351A1 (en) 2021-03-24 2022-03-22 A method of forming a graphene layer structure and a graphene substrate
DE112022001740.6T DE112022001740T5 (en) 2021-03-24 2022-03-22 Method for forming a graphene layer structure and a graphene substrate
GB2203995.2A GB2607410B (en) 2021-03-24 2022-03-22 A method of forming a graphene layer structure and a graphene substrate
GB2218951.8A GB2615867B (en) 2021-03-24 2022-03-22 A method of forming a graphene layer structure and a graphene substrate
TW111111013A TWI836383B (en) 2021-03-24 2022-03-24 A method of forming a graphene layer structure and a graphene substrate
TW113105883A TWI881715B (en) 2021-03-24 2022-03-24 A method of forming a graphene layer structure and a graphene substrate
US18/283,770 US20240166521A1 (en) 2021-03-24 2023-03-22 A method of forming a graphene layer structure and a graphene substrate

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB2104140.5A GB2605167B (en) 2021-03-24 2021-03-24 A wafer for the CVD growth of uniform graphene and method of manufacture therof
GB2106149.4A GB2606203B (en) 2021-04-29 2021-04-29 An electro-optic modulator and methods of forming the same
GB2107209.5A GB2607281B (en) 2021-04-29 2021-05-20 A photodetector and method of forming the same

Publications (3)

Publication Number Publication Date
GB202110027D0 GB202110027D0 (en) 2021-08-25
GB2605211A GB2605211A (en) 2022-09-28
GB2605211B true GB2605211B (en) 2024-04-03

Family

ID=77353811

Family Applications (2)

Application Number Title Priority Date Filing Date
GB2110027.6A Active GB2605211B (en) 2021-03-24 2021-07-12 A method of forming a graphene layer structure and a graphene substrate
GB2203995.2A Active GB2607410B (en) 2021-03-24 2022-03-22 A method of forming a graphene layer structure and a graphene substrate

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB2203995.2A Active GB2607410B (en) 2021-03-24 2022-03-22 A method of forming a graphene layer structure and a graphene substrate

Country Status (1)

Country Link
GB (2) GB2605211B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2024104626A1 (en) 2022-11-15 2024-05-23 Paragraf Limited A method of forming a graphene layer structure and a graphene substrate

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120181505A1 (en) * 2011-01-13 2012-07-19 International Business Machines Corporation Radiation Hardened Transistors Based on Graphene and Carbon Nanotubes
CN105355702A (en) * 2015-11-17 2016-02-24 国家纳米科学中心 Graphene plasmon device used for enhancing infrared spectrum detection and preparation method thereof
WO2017029470A1 (en) * 2015-08-14 2017-02-23 Simon Charles Stewart Thomas A method of producing a two-dimensional material
US20180323406A1 (en) * 2017-05-04 2018-11-08 Atom Nanoelectronics, Inc. Carbon Enabled Vertical Organic Light Emitting Transistors
CN212162092U (en) * 2020-07-09 2020-12-15 中国计量大学 A tunable terahertz absorber
GB2585842A (en) * 2019-07-16 2021-01-27 Paragraf Ltd A method of making graphene structures and devices

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20120181505A1 (en) * 2011-01-13 2012-07-19 International Business Machines Corporation Radiation Hardened Transistors Based on Graphene and Carbon Nanotubes
WO2017029470A1 (en) * 2015-08-14 2017-02-23 Simon Charles Stewart Thomas A method of producing a two-dimensional material
CN105355702A (en) * 2015-11-17 2016-02-24 国家纳米科学中心 Graphene plasmon device used for enhancing infrared spectrum detection and preparation method thereof
US20180323406A1 (en) * 2017-05-04 2018-11-08 Atom Nanoelectronics, Inc. Carbon Enabled Vertical Organic Light Emitting Transistors
GB2585842A (en) * 2019-07-16 2021-01-27 Paragraf Ltd A method of making graphene structures and devices
CN212162092U (en) * 2020-07-09 2020-12-15 中国计量大学 A tunable terahertz absorber

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
Journal of Membrane Science, Vol. 595, 2020 (117479), Chi et al., "Pristine graphene membranes supported on ceramic hollow fibre prepared via a sacrificial layer assisted CVD approach", pp. 1 - 8. *
Materials Chemistry and Physics, 2017, Vol. 200, Karamat et al., "Growth of nano-graphene on SrTiO3 (110) substrates by chemical vapour deposition", pp. 187 - 195. *

Also Published As

Publication number Publication date
GB202110027D0 (en) 2021-08-25
GB2607410B (en) 2024-04-10
GB2607410A (en) 2022-12-07
GB2605211A (en) 2022-09-28
GB202203995D0 (en) 2022-05-04

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