GB2390370B - Polishing composition - Google Patents

Polishing composition

Info

Publication number: GB2390370B
Authority: GB; United Kingdom
Prior art keywords: polishing composition; polishing; composition
Prior art date: 2002-05-30
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

GB0312182A

Other versions

GB2390370A (en

GB0312182D0 (en

Inventor

Tomoaki Ishibashi

Hiroyasu Sugiyama

Toshiki Owaki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujimi Inc

Original Assignee

Fujimi Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-05-30

Filing date

2003-05-30

Publication date

2006-10-11

2003-05-30 Application filed by Fujimi Inc filed Critical Fujimi Inc

2003-05-30 Priority to GB0522145A priority Critical patent/GB2418205B/en

2003-07-02 Publication of GB0312182D0 publication Critical patent/GB0312182D0/en

2004-01-07 Publication of GB2390370A publication Critical patent/GB2390370A/en

2006-10-11 Application granted granted Critical

2006-10-11 Publication of GB2390370B publication Critical patent/GB2390370B/en

2023-05-30 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Manufacturing Of Magnetic Record Carriers (AREA)

GB0312182A 2002-05-30 2003-05-30 Polishing composition Expired - Fee Related GB2390370B (en)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
GB0522145A GB2418205B (en)	2002-05-30	2003-05-30	Polishing composition

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2002157964A JP4095833B2 (en)	2002-05-30	2002-05-30	Polishing composition

Publications (3)

Publication Number	Publication Date
GB0312182D0 GB0312182D0 (en)	2003-07-02
GB2390370A GB2390370A (en)	2004-01-07
GB2390370B true GB2390370B (en)	2006-10-11

Family

ID=19194884

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB0312182A Expired - Fee Related GB2390370B (en)	2002-05-30	2003-05-30	Polishing composition

Country Status (5)

Country	Link
JP (1)	JP4095833B2 (en)
CN (2)	CN101012313B (en)
GB (1)	GB2390370B (en)
MY (1)	MY137251A (en)
TW (1)	TWI307359B (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4068499B2 (en) *	2003-05-09	2008-03-26	株式会社フジミインコーポレーテッド	Polishing composition
US20050139119A1 (en) *	2003-12-24	2005-06-30	Rader W. S.	Polishing composition
JP2006099949A (en) *	2004-08-30	2006-04-13	Showa Denko Kk	Glass substrate for magnetic recording medium and magnetic recording medium
CN100578625C (en) *	2004-08-30	2010-01-06	昭和电工株式会社	Glass substrate for magnetic recording medium and magnetic recording medium
US20080193801A1 (en) *	2004-08-30	2008-08-14	Showa Denko K.K.	Glass Substrate for Magnetic Recording Medium and Magnetic Recording Medium
JP4667848B2 (en) *	2004-12-13	2011-04-13	花王株式会社	Polishing liquid composition for glass substrate
JP4637003B2 (en) *	2005-11-11	2011-02-23	花王株式会社	Manufacturing method of hard disk substrate
TW200712187A (en) *	2005-08-31	2007-04-01	Fujimi Inc	Polishing composition and polishing method
JP2007063440A (en) *	2005-08-31	2007-03-15	Fujimi Inc	Polishing composition and polishing method
GB2433516B (en) *	2005-12-22	2010-11-03	Kao Corp	Polishing composition for glass substrate
TWI402335B (en) *	2006-09-08	2013-07-21	Kao Corp	Polishing composition
JP5957292B2 (en) *	2012-05-18	2016-07-27	株式会社フジミインコーポレーテッド	Polishing composition, polishing method using the same, and substrate manufacturing method
KR101353315B1 (en) *	2013-08-07	2014-01-21	소문식	Composition for cutting wheel and cutting wheel comprising the same
CN112384591A (en) *	2018-07-04	2021-02-19	住友精化株式会社	Polishing composition
JP7742751B2 (en) *	2021-09-30	2025-09-22	株式会社フジミインコーポレーテッド	Polishing composition and method for producing magnetic disk substrate

Citations (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH09279127A (en) *	1996-04-17	1997-10-28	Kao Corp	Abrasive composition and polishing method using the same
JP2001064689A (en) *	1999-06-23	2001-03-13	Jsr Corp	Cleaning liquid for semiconductor parts
GB2354525A (en) *	1999-09-27	2001-03-28	Fujimi America Inc	Polishing compositions for magnetic disks
EP1357161A2 (en) *	2002-04-22	2003-10-29	JSR Corporation	Aqueous dispersion for chemical mechanical polishing

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2590790B2 (en) *	1988-04-15	1997-03-12	日本合成ゴム株式会社	Method for producing conjugated diene sulfonated polymer
SG78405A1 (en) *	1998-11-17	2001-02-20	Fujimi Inc	Polishing composition and rinsing composition
MY128169A (en) *	1999-06-28	2007-01-31	Showa Denko Kk	Abrasive composition for substrate for magnetic recording disks and process for producing substrate for magnetic recording disk.
JP4273475B2 (en) *	1999-09-21	2009-06-03	株式会社フジミインコーポレーテッド	Polishing composition
JP4238951B2 (en) *	1999-09-28	2009-03-18	株式会社フジミインコーポレーテッド	Polishing composition and method for producing memory hard disk using the same
US6454820B2 (en) *	2000-02-03	2002-09-24	Kao Corporation	Polishing composition

2002
- 2002-05-30 JP JP2002157964A patent/JP4095833B2/en not_active Expired - Lifetime
2003
- 2003-05-29 MY MYPI20031978A patent/MY137251A/en unknown
- 2003-05-30 TW TW092114853A patent/TWI307359B/en not_active IP Right Cessation
- 2003-05-30 GB GB0312182A patent/GB2390370B/en not_active Expired - Fee Related
- 2003-05-30 CN CN200610103020.7A patent/CN101012313B/en not_active Expired - Fee Related
- 2003-05-30 CN CNB031407102A patent/CN100347227C/en not_active Expired - Fee Related

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH09279127A (en) *	1996-04-17	1997-10-28	Kao Corp	Abrasive composition and polishing method using the same
JP2001064689A (en) *	1999-06-23	2001-03-13	Jsr Corp	Cleaning liquid for semiconductor parts
GB2354525A (en) *	1999-09-27	2001-03-28	Fujimi America Inc	Polishing compositions for magnetic disks
EP1357161A2 (en) *	2002-04-22	2003-10-29	JSR Corporation	Aqueous dispersion for chemical mechanical polishing

Also Published As

Publication number	Publication date
JP4095833B2 (en)	2008-06-04
GB2390370A (en)	2004-01-07
GB0312182D0 (en)	2003-07-02
TW200400250A (en)	2004-01-01
CN101012313A (en)	2007-08-08
CN101012313B (en)	2010-12-08
CN100347227C (en)	2007-11-07
CN1461766A (en)	2003-12-17
JP2003342556A (en)	2003-12-03
TWI307359B (en)	2009-03-11
MY137251A (en)	2009-01-30

Publication	Publication Date	Title
AU2003215261A8 (en)	2003-09-09	Polishing composition
SG116506A1 (en)	2005-11-28	Polishing composition.
TWI317757B (en)	2009-12-01	Polishing composition
GB0400248D0 (en)	2004-02-11	Polishing composition
GB2403725B (en)	2007-10-24	Polishing composition
GB2397580B (en)	2006-11-08	Polishing composition
GB0203421D0 (en)	2002-04-03	Composition
GB2393447B (en)	2006-04-19	Polishing composition
GB2401370B (en)	2007-12-05	Polishing composition
GB2403954B (en)	2008-01-02	Polishing composition
GB2390370B (en)	2006-10-11	Polishing composition
GB2397579B (en)	2006-06-28	Polishing composition
GB2401610B (en)	2007-12-27	Polishing composition
GB2401109B (en)	2007-10-10	Polishing composition
GB2393186B (en)	2006-02-22	Polishing composition
GB0203280D0 (en)	2002-03-27	Anti-glycolytic composition
GB2395486B (en)	2006-08-16	Polishing composition
EP1495751A4 (en)	2005-09-14	Hairdye composition
GB2385057B (en)	2005-02-09	Polishing composition
GB2418205B (en)	2006-12-13	Polishing composition
GB0205776D0 (en)	2002-04-24	Polish composition
GB0203616D0 (en)	2002-04-03	Composition
GB0200437D0 (en)	2002-02-27	Composition
GB0208301D0 (en)	2002-05-22	Composition
GB0205293D0 (en)	2002-04-17	Composition

Legal Events

Date	Code	Title	Description
2011-01-26	PCNP	Patent ceased through non-payment of renewal fee	Effective date: 20100530