GB2385057B - Polishing composition - Google Patents

Polishing composition

Info

Publication number: GB2385057B
Authority: GB; United Kingdom
Prior art keywords: polishing composition; polishing; composition
Prior art date: 2001-12-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

GB0229161A

Other versions

GB0229161D0 (en

GB2385057A (en

Inventor

Tomohide Kamiya

Junichi Hirano

Noboru Yasufuku

Noritaka Yokomichi

Toshiki Owaki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Fujimi Inc

Original Assignee

Fujimi Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-12-20

Filing date

2002-12-13

Publication date

2005-02-09

2002-12-13 Application filed by Fujimi Inc filed Critical Fujimi Inc

2003-01-22 Publication of GB0229161D0 publication Critical patent/GB0229161D0/en

2003-08-13 Publication of GB2385057A publication Critical patent/GB2385057A/en

2005-02-09 Application granted granted Critical

2005-02-09 Publication of GB2385057B publication Critical patent/GB2385057B/en

2022-12-13 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/06—Other polishing compositions
- C09G1/14—Other polishing compositions based on non-waxy substances
- C09G1/18—Other polishing compositions based on non-waxy substances on other substances
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
- C09K3/1463—Aqueous liquid suspensions
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Landscapes

Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Manufacturing & Machinery (AREA)
Mechanical Engineering (AREA)
Manufacturing Of Magnetic Record Carriers (AREA)
Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

GB0229161A 2001-12-20 2002-12-13 Polishing composition Expired - Lifetime GB2385057B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP2001387175A JP4095798B2 (en)	2001-12-20	2001-12-20	Polishing composition

Publications (3)

Publication Number	Publication Date
GB0229161D0 GB0229161D0 (en)	2003-01-22
GB2385057A GB2385057A (en)	2003-08-13
GB2385057B true GB2385057B (en)	2005-02-09

Family

ID=19188039

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
GB0229161A Expired - Lifetime GB2385057B (en)	2001-12-20	2002-12-13	Polishing composition

Country Status (4)

Country	Link
JP (1)	JP4095798B2 (en)
CN (2)	CN1285686C (en)
GB (1)	GB2385057B (en)
MY (1)	MY131820A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP4291665B2 (en) *	2003-10-15	2009-07-08	日本化学工業株式会社	Abrasive composition for siliceous material and polishing method using the same
JP2006077127A (en) *	2004-09-09	2006-03-23	Fujimi Inc	Polishing composition and polishing method using the composition
JPWO2023140049A1 (en) *	2022-01-24	2023-07-27

Citations (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0401147A2 (en) *	1989-03-07	1990-12-05	International Business Machines Corporation	A method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
WO2001012740A1 (en) *	1999-08-13	2001-02-22	Cabot Microelectronics Corporation	Polishing system and method of its use
GB2354526A (en) *	1999-09-27	2001-03-28	Fujimi America Inc	Polishing compositions for magnetic disks
GB2354524A (en) *	1999-09-21	2001-03-28	Fujimi Inc	Polishing Compositions for Magnetic Disks
US6280489B1 (en) *	1999-10-29	2001-08-28	Nihon Micro Coating Co., Ltd.	Polishing compositions
WO2001098201A2 (en) *	2000-06-16	2001-12-27	Cabot Microelectronics Corporation	Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system
WO2002031072A1 (en) *	2000-10-12	2002-04-18	Anam Semiconductor Inc.	Cmp slurry composition and a method for planarizing semiconductor device using the same

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS61291674A (en) *	1985-06-17	1986-12-22	Kobe Steel Ltd	Polishing agent
JPS62236669A (en) *	1986-04-07	1987-10-16	Kobe Steel Ltd	Abrasive
JP3653133B2 (en) *	1996-01-30	2005-05-25	昭和電工株式会社	Polishing composition, magnetic disk substrate polishing method, and manufacturing method
JP3825827B2 (en) *	1996-01-30	2006-09-27	昭和電工株式会社	Polishing composition, magnetic disk substrate polishing method, and manufacturing method
JPH10172935A (en) *	1996-12-05	1998-06-26	Fujimi Inkooporeetetsudo:Kk	Composition for polishing
JPH10172936A (en) *	1996-12-05	1998-06-26	Fujimi Inkooporeetetsudo:Kk	Composition for polishing
JPH10172937A (en) *	1996-12-05	1998-06-26	Fujimi Inkooporeetetsudo:Kk	Composition for polishing
JPH10172934A (en) *	1996-12-05	1998-06-26	Fujimi Inkooporeetetsudo:Kk	Composition for polishing
JPH1180708A (en) *	1997-09-09	1999-03-26	Fujimi Inkooporeetetsudo:Kk	Composition for polishing
JP4090589B2 (en) *	1998-09-01	2008-05-28	株式会社フジミインコーポレーテッド	Polishing composition
US6258140B1 (en) *	1999-09-27	2001-07-10	Fujimi America Inc.	Polishing composition
JP4213858B2 (en) *	2000-02-03	2009-01-21	花王株式会社	Polishing liquid composition
TW528645B (en) *	2000-04-17	2003-04-21	Showa Denko Kk	Composition for polishing magnetic disk substrate
JP2001294848A (en) *	2000-04-17	2001-10-23	Sanyo Chem Ind Ltd	Abrasive grain dispersant for polishing, and slurry for polishing
JP4251516B2 (en) *	2000-05-12	2009-04-08	花王株式会社	Polishing liquid composition
JP4231632B2 (en) *	2001-04-27	2009-03-04	花王株式会社	Polishing liquid composition

2001
- 2001-12-20 JP JP2001387175A patent/JP4095798B2/en not_active Expired - Lifetime
2002
- 2002-12-13 GB GB0229161A patent/GB2385057B/en not_active Expired - Lifetime
- 2002-12-17 CN CNB021574022A patent/CN1285686C/en not_active Expired - Fee Related
- 2002-12-17 CN CNA2006100847456A patent/CN1854224A/en active Pending
- 2002-12-18 MY MYPI20024756A patent/MY131820A/en unknown

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0401147A2 (en) *	1989-03-07	1990-12-05	International Business Machines Corporation	A method of chemical-mechanical polishing an electronic component substrate and polishing slurry therefor
WO2001012740A1 (en) *	1999-08-13	2001-02-22	Cabot Microelectronics Corporation	Polishing system and method of its use
GB2354524A (en) *	1999-09-21	2001-03-28	Fujimi Inc	Polishing Compositions for Magnetic Disks
GB2354526A (en) *	1999-09-27	2001-03-28	Fujimi America Inc	Polishing compositions for magnetic disks
US6280489B1 (en) *	1999-10-29	2001-08-28	Nihon Micro Coating Co., Ltd.	Polishing compositions
WO2001098201A2 (en) *	2000-06-16	2001-12-27	Cabot Microelectronics Corporation	Method for polishing a memory or rigid disk with a phosphate ion-containing polishing system
WO2002031072A1 (en) *	2000-10-12	2002-04-18	Anam Semiconductor Inc.	Cmp slurry composition and a method for planarizing semiconductor device using the same

Also Published As

Publication number	Publication date
GB0229161D0 (en)	2003-01-22
JP4095798B2 (en)	2008-06-04
CN1854224A (en)	2006-11-01
GB2385057A (en)	2003-08-13
CN1427055A (en)	2003-07-02
MY131820A (en)	2007-09-28
CN1285686C (en)	2006-11-22
JP2003183630A (en)	2003-07-03

Publication	Publication Date	Title
SG87198A1 (en)	2002-03-19	Polishing composition
AU2003215261A8 (en)	2003-09-09	Polishing composition
TWI317757B (en)	2009-12-01	Polishing composition
GB2397580B (en)	2006-11-08	Polishing composition
GB2393447B (en)	2006-04-19	Polishing composition
GB0114069D0 (en)	2001-08-01	Composition
GB2390370B (en)	2006-10-11	Polishing composition
GB2422614B (en)	2006-09-20	Polishing composition
AU2002334406A1 (en)	2003-03-18	Polishing composition
GB2393186B (en)	2006-02-22	Polishing composition
GB0107651D0 (en)	2001-05-16	Composition
GB0122113D0 (en)	2001-10-31	Composition
GB2395486B (en)	2006-08-16	Polishing composition
GB0115679D0 (en)	2001-08-22	Composition
GB0117305D0 (en)	2001-09-05	Composition
GB2385057B (en)	2005-02-09	Polishing composition
GB0121454D0 (en)	2001-10-24	Composition
GB2418205B (en)	2006-12-13	Polishing composition
GB0100746D0 (en)	2001-02-21	Composition
GB0106007D0 (en)	2001-05-02	Composition
GB0112500D0 (en)	2001-07-11	Composition
GB0112651D0 (en)	2001-07-18	Composition
GB0112688D0 (en)	2001-07-18	Composition
GB0113366D0 (en)	2001-07-25	Composition
GB0113606D0 (en)	2001-07-25	Composition