GB2112388A - Carboxylic acid amides containing amino groups, and mixtures containing these amides and epoxy resins - Google Patents
Carboxylic acid amides containing amino groups, and mixtures containing these amides and epoxy resins Download PDFInfo
- Publication number
- GB2112388A GB2112388A GB08235554A GB8235554A GB2112388A GB 2112388 A GB2112388 A GB 2112388A GB 08235554 A GB08235554 A GB 08235554A GB 8235554 A GB8235554 A GB 8235554A GB 2112388 A GB2112388 A GB 2112388A
- Authority
- GB
- United Kingdom
- Prior art keywords
- formula
- compound
- group
- bis
- epoxy resins
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920000647 polyepoxide Polymers 0.000 title description 17
- 239000003822 epoxy resin Substances 0.000 title description 16
- 239000000203 mixture Substances 0.000 title description 14
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 title description 11
- 150000001408 amides Chemical class 0.000 title description 7
- 125000003277 amino group Chemical group 0.000 title description 4
- 150000001732 carboxylic acid derivatives Chemical class 0.000 title description 3
- 239000000047 product Substances 0.000 description 16
- 150000001412 amines Chemical class 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 13
- 239000003795 chemical substances by application Substances 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 11
- 238000000034 method Methods 0.000 description 8
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 8
- -1 aliphatic radical Chemical class 0.000 description 7
- PLIKAWJENQZMHA-UHFFFAOYSA-N 4-aminophenol Chemical compound NC1=CC=C(O)C=C1 PLIKAWJENQZMHA-UHFFFAOYSA-N 0.000 description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 4
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- SSJXIUAHEKJCMH-UHFFFAOYSA-N cyclohexane-1,2-diamine Chemical compound NC1CCCCC1N SSJXIUAHEKJCMH-UHFFFAOYSA-N 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- XKJCHHZQLQNZHY-UHFFFAOYSA-N phthalimide Chemical compound C1=CC=C2C(=O)NC(=O)C2=C1 XKJCHHZQLQNZHY-UHFFFAOYSA-N 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 3
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 3
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000003949 imides Chemical group 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000000655 nuclear magnetic resonance spectrum Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000004606 Fillers/Extenders Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000008064 anhydrides Chemical group 0.000 description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 2
- 150000001470 diamides Chemical class 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 238000002329 infrared spectrum Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 239000012744 reinforcing agent Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- GOJUJUVQIVIZAV-UHFFFAOYSA-N 2-amino-4,6-dichloropyrimidine-5-carbaldehyde Chemical group NC1=NC(Cl)=C(C=O)C(Cl)=N1 GOJUJUVQIVIZAV-UHFFFAOYSA-N 0.000 description 1
- CDAWCLOXVUBKRW-UHFFFAOYSA-N 2-aminophenol Chemical class NC1=CC=CC=C1O CDAWCLOXVUBKRW-UHFFFAOYSA-N 0.000 description 1
- YLAXZGYLWOGCBF-UHFFFAOYSA-N 2-dodecylbutanedioic acid Chemical compound CCCCCCCCCCCCC(C(O)=O)CC(O)=O YLAXZGYLWOGCBF-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- IGSBHTZEJMPDSZ-UHFFFAOYSA-N 4-[(4-amino-3-methylcyclohexyl)methyl]-2-methylcyclohexan-1-amine Chemical compound C1CC(N)C(C)CC1CC1CC(C)C(N)CC1 IGSBHTZEJMPDSZ-UHFFFAOYSA-N 0.000 description 1
- NEZWERLJFJUCAV-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine;benzene-1,2-dicarboxamide Chemical compound NC(=O)C1=CC=CC=C1C(N)=O.C1CC(N)CCC1CC1CCC(N)CC1 NEZWERLJFJUCAV-UHFFFAOYSA-N 0.000 description 1
- BDBZTOMUANOKRT-UHFFFAOYSA-N 4-[2-(4-aminocyclohexyl)propan-2-yl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1C(C)(C)C1CCC(N)CC1 BDBZTOMUANOKRT-UHFFFAOYSA-N 0.000 description 1
- 229910002012 Aerosil® Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 description 1
- 238000004566 IR spectroscopy Methods 0.000 description 1
- 229920000271 Kevlar® Polymers 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- 229920000459 Nitrile rubber Polymers 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 239000004965 Silica aerogel Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 125000000732 arylene group Chemical group 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 239000010426 asphalt Substances 0.000 description 1
- 238000011074 autoclave method Methods 0.000 description 1
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 1
- 229910052601 baryte Inorganic materials 0.000 description 1
- 239000010428 baryte Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920006217 cellulose acetate butyrate Polymers 0.000 description 1
- 238000003776 cleavage reaction Methods 0.000 description 1
- 239000011280 coal tar Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000002993 cycloalkylene group Chemical group 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- BXTSYZSNEJNNCX-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid;2-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O.OC(=O)C1(C)C=CCCC1C(O)=O BXTSYZSNEJNNCX-UHFFFAOYSA-N 0.000 description 1
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- GUJOJGAPFQRJSV-UHFFFAOYSA-N dialuminum;dioxosilane;oxygen(2-);hydrate Chemical class O.[O-2].[O-2].[O-2].[Al+3].[Al+3].O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O GUJOJGAPFQRJSV-UHFFFAOYSA-N 0.000 description 1
- 125000004420 diamide group Chemical group 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- QGBSISYHAICWAH-UHFFFAOYSA-N dicyandiamide Chemical compound NC(N)=NC#N QGBSISYHAICWAH-UHFFFAOYSA-N 0.000 description 1
- 238000000113 differential scanning calorimetry Methods 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- JDVIRCVIXCMTPU-UHFFFAOYSA-N ethanamine;trifluoroborane Chemical class CCN.FB(F)F JDVIRCVIXCMTPU-UHFFFAOYSA-N 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000009730 filament winding Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000008570 general process Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000010440 gypsum Substances 0.000 description 1
- 229910052602 gypsum Inorganic materials 0.000 description 1
- 150000001469 hydantoins Chemical class 0.000 description 1
- 150000004678 hydrides Chemical class 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 1
- 239000004761 kevlar Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 239000004922 lacquer Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000010445 mica Substances 0.000 description 1
- 229910052618 mica group Inorganic materials 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000005060 rubber Substances 0.000 description 1
- 230000007017 scission Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- JVBXVOWTABLYPX-UHFFFAOYSA-L sodium dithionite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])=O JVBXVOWTABLYPX-UHFFFAOYSA-L 0.000 description 1
- RYYKJJJTJZKILX-UHFFFAOYSA-M sodium octadecanoate Chemical class [Na+].CCCCCCCCCCCCCCCCCC([O-])=O RYYKJJJTJZKILX-UHFFFAOYSA-M 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 238000002076 thermal analysis method Methods 0.000 description 1
- 238000004809 thin layer chromatography Methods 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
- C08G59/54—Amino amides>
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Epoxy Resins (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
The compounds of the formula I <IMAGE> wherein Y is an aromatic, cycloaliphatic or aliphatic radical, to which the two carbonyl groups shown in the formula are bound in adjacent positions with respect to each other, and R is an arylene, aralkylene, cycloalkylene or cycloalkylalkylene group, can be produced by reaction of a compound of the formula IIa or IIb <IMAGE> with an amine of the formula III <IMAGE> They are used as latent curing agents for epoxy resins. Mixtures thereof with epoxy resins have excellent stability on storage.
Description
SPECIFICATION
Carboxylic acid amides containing amino groups, and mixtures containing these amides and epoxy resins
The invention relates to special carboxylic acid amides containing amino groups, which amides are latent curing agents for epoxy resins, and to mixtures containing the said amides and epoxy resins.
Amines, amine derivatives and substituted amines as latent curing agents for epoxy resins are already known, for example from the U.S.
Patent Specification No. 3,759,914. Latent curing agents prepared from acid anhydrides and linear aliphatic polyamines are described for example in the U.S. Patent Specification Nos. 3,261,882, 3,488,742 and 3,636,657. Reference is made in particular to the reaction product of phthalic anhydride and diethylenetriamiiie mentioned in these Patent Specifications.
The novel compounds according to the invention form a new class of latent curing agents having improved performance characteristics. In admixture with epoxy resins, they are stable for several months at room temperature and at slightly higher temperature; but they cure in a relatively short time at elevated temperatures, for example in 10 to 60 minutes at 100 to 150 C, the epoxy resin to form a product having very good properties, regardless of whether a freshly prepared mixture is used or a mixture which has been stored for several months. This result is surprising since the amides according to the invention contain free amino groups, of which it could have been expected that they would react at room temperature with epoxy groups.The improved performance characteristics are based in particular on better resistance to high temperatures and to vvater, as well as on the higher glass transition lemperature of the cured epoxy compounds. The mixtures of the amides according to the invention with epoxy resins can therefore be used for a wide range of purposes, for example in the preparation of prepreg materials for the production and repair of composite structures.
The compounds according to the invention correspond to the formula I
wherein Y is an aromatic, cycloaliphatic or aliphatic radical, to which the two carbonyl groups shown in the formula are bound in adjacent positions with respect to each other, and
R is an arylene, aralkylene, cycloalkylene or cycloalkylalkyene group.
Preferably, Y in the formula I is the radical of phthalic acid, tetrahydrophthalic acid, methyltetrahydrophthalic acid hexahydrophthalic acid, succinic acid, dodecylsuccinic acid or maleic acid, each unsubstituted or substituted by one or more lower alkyl groups having 1 to 4 C atoms, especially by one or more methyl groups; in particular Y is the radical of phthalic acid.
In the formula I, R is preferably the phenylene group, which can be substituted by alkyl groups having 1 to 4 C atoms, or it is the xylene group or the cyclohexyiene group. Particularly suitable are the following compounds reduced by the 2 amino groups: m-xylylenediamine, m-phenylenediamine, p,p'-methylenedianiline, bis-(p-amino phenyl)-sulfone, 1 ,2-diaminocyclohexane, 1 ,4- diaminocyclohexane, bis-(p-aminocyclohexyl) methane, 1 ,3-bis-(aminomethyl)-cyclohexane, bis-(4-amino-3-methyl-cyclohexyl)-methane, 2,2- bis-(4-aminocyclohexyl)-propane, 3,5,5-tri- methyl-3-aminomethylcyclohexylamine (isophoronediamine) and 6-amino-1 -(4-amino- phenyl )- ,3,3-trimethyl-indane.Especially preferred are the radicals of m-xylylenediamine, 1 ,2-diaminocyclohexane, bis-(p-aminocyclohexyl)-methane and 1 ,3-bis-(aminomethyl)-cyclo- hexane.
The products of the formula I can be produced according to the invention by reaction of a compound of the formula Ila or llb
with an amine of the formula Ill H2N-R-NH2 (III) A condensation reaction occurs with cleavage
of the anhydride ring and imide ring, respectively,
and formation of water and ammonia, respectively.
There is advantageously used an excess of amine,
namely, from a little over the stoichiometrically
calculated amount up to a very considerable
excess, that is, up to a 100 molar-percentage excess. The reaction product is easily obtained by distilling off the excess amine under reduced pressure.
The reaction is advantageously performed according to the general process described by
Spring and Woods in the Journal of the Chemical Society, 1945, pp. 625-628. This is an aqueous
process at temperatures of 20-500C, which is
best carried out by mixing the components at
300C and performing the reaction at below 50 CC.
The reaction is usually performed at normal
pressure; however, it can also be carried out
under reduced pressure.
It is also possible to carry out the reaction by
the method described in the U.S. Patent
Specification No. 3,639,657, even though some
of the thus produced curing agents are inclined to
react much too fast with epoxy resins. In order to
avoid this disadvantage, the process is modified by performing the reaction in a dioxane solution, and afterwards thoroughly purifying the product.
The resulting products are in general vitreous solid substances having a low melting point.
The reaction of the acid anhydrides with the diamines does not always yield pure diamides; there are formed usually also monoamides. These can either be separated or be left in admixture with the diamides.
The reaction products can be mixed by known mixing methods (stirring, kneading, rolling, and so forth) with an epoxy resin. The epoxy resins used are those which contain in the average molecule more than one epoxy group. Examples are: polyglycidyl ethers of polyhydric phenols, such as bisphenol A. F and S, cresol novolaks and phenol novolaks, glycidylated hydantoins, aromatic amines and aminophenols, polyglycidyl esters, and certain cycloaliphatic epoxy resins. Tetraglycidylated methylenedianiline is preferred.
Resins based on diglycidyl ethers of bisphenol A are likewise preferred for use in the fields of adhesives, coatings and filament windings.
With regard to the epoxy resin the compounds according to the invention can be used in amounts which are 50 to 1 50%, preferably 100%, of the stoichiometric amount.
When reacted with polyepoxides, for example diepoxides, at eievated temperatures, the compounds yield highly crosslinked products which are infusible and insoluble. With simultaneous shaping, by casting or moulding, shaped cast products, moulded articles or laminates can be produced. Furthermore, the resin/curing agent mixtures can be applied to substrates, and then cured in the form of a coating, a lacquer coating or adhesive bond.
Such system are frequently employed in the aerospace industry. They can be used to preimpregnate fibres of various types, for example graphite, glass or Kevlar fibres, which can then be utilised as honeycomb skins. These systems are also suitable for producing laminates. The laminates can be prepared by known techniques, such as by moulding or by the autoclave method, and their layer thicknesses can vary within a wide range.
There can be added to the mixtures of compounds of the formula I with epoxy resins further customary modifiers, such as extenders, fillers, reinforcing agents, pigments, dyes, organic solvents, fire-retarding substances, thixotropic agents, flow control agents and similar substances. Extenders, reinforcing agents and pigments which may be mentioned are: coal tar, bitumen, glass fibres, boron fibres, carbon fibres, cellulose, polyethylene powder, polypropylene powder, mica, asbestos, quartz powder, gypsum, antimony trioxide, montmorillonite derivatives (such as "Bentone", silica aerogel (Aerosil"(D), lithopone, barite, titanium dioxide, carbon black, graphite, iron oxide, and metal powders, such as aluminium or iron powder.Flow control agents are for example: silicones, cellulose acetate butyrate, polyvinyl butyral, waxes, stearates, and similar products which are in part also used as mould release agents.
To adhesives containing an epoxy resin and a compound of the formula I, there can be added rubber substances, such as acrylonitrile-butadiene rubber containing carbonyl terminal groups, or modifying resins, such as triglycidilated p-aminophenol, accelerators, such as boron trifluoride monoethylamine complexes or imidazole complexes, or further curing agents, such as dicyandiamide.
The term 'parts' in the following Examples denotes parts by weight, and % is per cent by weight.
Example 1
To a solution (boiling at 1 10-1200C under nitrogen in reflux condenser) of m-xylylenediamine in dioxane is added dropwise a 20% solution of phthalic anhydride in dioxane, the amount added being such that to 1 mol of the anhydride there are 4 mols of the amine The addition is completed after 80 minutes, and the mixture is held at 1 10-1200Cfor2 hours.
Formed water and dioxane are removed in vacuo until the solution has become viscous. There are successively added hot heptane, toluene, hexane and ethyl ether until a solid substance in a yield of about 70% is obtained. The analysis (thin-layer chromatography, infra-red and NMR spectroscopy, amine titration, elementary analysis and electrical conductivity) shows that the product obtained is the amide of the formula IV (m.p.
124--1270C):
The resulting product contains no salt-like compounds, such as amine carboxylate.
A mixture of 100 parts of (IV) with 54 parts of tetraglycidyiated methylenedianiline and 54 parts
of triglycidylated p-aminophenol remains
sufficiently storage-stable for 4 months at room
temperature.
Example 2
By the process described in J. Chem. Soc.,
1945, pp. 625-628, bis-(p-aminocyclohexyl)
methane is reacted in an aqueous medium with
phthalimide to give bis-(p-aminocyclohexyl)
methane phthalamide, the procedure being such
that there is added to an aqueous emulsion of the
amine, produced by vigorous stirring, within 10 minutes at room temperature, finely ground
phthalimide in an amount of 1 mol to 2.4 mols of amine; the mixture is then stirred for a further 40 minutes, subsequently poured into a separating funnel, and extracted with chloroform. The extract is dried over magnesium sulfate, filtered and freed from chloroform. The product is afterwards washed with hexane and then with an hydros ethyl ether; the washing agent residues are distilled off in a vacuum oven.
A glassy product is obtained in a yield of 28% with a melting range of 75 to 900C. The analysis (NMR spectrum) shows a reaction product consisting of 2 mols of amine with one mol of imide.
Example 3
In the same manner as that described in
Example 2, phthalimide is reacted with 1,3-bis (aminomethyl)-cyclohexane to obtain a glassy product having a melting range of 54-660C.
According to IR and NMR spectra, the product is the diamide consisting of 1 molecule of phthalic acid and 2 molecules of the amine.
Example 1
In the manner described in Example 2, phthalimide is reacted with 1 ,2-diaminocyclo- hexane. A slightly brownish coloured product having a melting range of 69-750C is obtained.
the IR and NMR spectra show that the product is a diamide consisting of 1 molecule of phthalic acid and 2 molecules of the amine.
Example 5
The same product as in Example 4 is obtained also by reaction of phthalic anhydride with 1,2diaminocyclohexane, whereby 2 mols of the amine are reacted with 1 mol of the an hydride for 45 minutes at 1250C, without the use of a solvent.
In the same manner as described in the
Examples, it is possible to react also the other aforementioned amines with the corresponding imides or acid anhydrides to obtain compounds according to the invention.
Application examples
A homogeneous paste consisting of 100 parts of the compound according to Example 1 as curing agent, 54 parts of tetraglycidylated methyienedianiline (ArralditB MY 720) and 54 parts of triglycidylated p-aminophenol (Araldit(B) 0510) is subjected to a differential thermoanalysis (DSC: differential scanning calorimetry).
It is found that at 11 40C a heat of reaction of 293.16 kJ per mol is developed. This value shows that the reaction is virtually complete at temperatures below 1 500C. The mixture is stored at room temperature, and is examined at regular intervals of time to determine its stability in storage. It is shown that the heat of reaction during 11 weeks decreases only slightly (from 293 kJ to 279 kJ/mol, which is 96.5% of the initial value). It is still 84% of its initial value after
16 weeks. Colour and flow properties are practically unchanged after five months, and all tests show a shelf life at room temperature of four months.
The mixture is moulded in a moulding press for 30 minutes at 1 500C under a pressure of 412
MPa to obtain round discs of 2.5 cm diameter.
After a postcuring at 1 500C, the glass transition temperature is determined as being 1 20 to 1 300C (DCS method). The water adsorption at 71 0C with 95% relative humidity is 5.5%.
Similar values are obtained with the use of compounds according to Examples 2 to 5 and epoxy resin mixtures according to this Example, or epoxy resins based on bisphenol-A or cycloaliphatic epoxy resins.
Claims (11)
1. A compound of the formula I
wherein Y is an aromatic, cycloaliphatic or
aliphatic radical, to which the two carbonyl
groups shown in the formula are bound in
adjacent positions with respect to each other, and
R is an aryiene, aralkylene, cycloalkylene or cycloalkylalkylene group.
2. A compound according to Claim 1, wherein
Y in the formula I is the radical of phthalic acid,
tetra- or hexahydrophthalic acid, succinic acid, dodecylsuccinic acid or maleic acid.
3. A compound according to Claim 1, wherein
R in the formula I is the m-xylylene group, 1,2- or
1,4-cyclohexylene group, bis-(cyclohexylene)
methane group, 1 ,3- or 1 ,4-bis-methylene-cyclo
hexane group, bis-(3-methyl-cyclohex-l ,4-ylene- methane group or 3,5,5-trimethyl-3-methylene
cyclohexyl group.
4. A compound according to Claim 1, wherein
R is the m- or p-phenylene group, the p,p'diphenylmethane group, the bis(p-phenyl)-sulfone group or the 1 -(p-phenylene-1 ,3,3-trimethyl- indan-6-yl group.
5. A compound according to Claims 2 and 3 or 2 and 4.
6. A compound of formula I substantially as described with reference to any of Examples 1 to 5.
7. A process for producing a compound of the formula I according to any one of claims 1 to 6, which process comprises reacting a compound of the formula Ila or llb
with a compound of formula Ill H2N-R-NH2 (Ill), wherein Y and R have the meanings defined in
Claims 1 to 5.
8. A process of producing a compound of formula I substantially as described with reference to any of Examples 1 to 5.
9. A compound of formula I when produced by a process claimed in claim 7 or 8.
10. A curable mixture which contains a compound according to any one of Claims 1 to 6 and a polyepoxy compound.
11. A curable mixture according to claim 10 substantially as described with reference to any of the Application Examples.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US33185681A | 1981-12-17 | 1981-12-17 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB2112388A true GB2112388A (en) | 1983-07-20 |
| GB2112388B GB2112388B (en) | 1985-10-30 |
Family
ID=23295660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB08235554A Expired GB2112388B (en) | 1981-12-17 | 1982-12-14 | Carboxylic acid amides containing amino groups and mixtures containing these amides and epoxy resins |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPS58110552A (en) |
| CH (1) | CH650767A5 (en) |
| DE (1) | DE3246267A1 (en) |
| FR (1) | FR2518541B1 (en) |
| GB (1) | GB2112388B (en) |
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0161736A1 (en) * | 1984-02-08 | 1985-11-21 | E.I. Du Pont De Nemours And Company | Chlorosulfonated polyethylene coating composition |
| EP0174725A1 (en) * | 1984-08-09 | 1986-03-19 | E.I. Du Pont De Nemours And Company | Chlorosulfonated ethylene vinyl acetate polymer coating composition |
| EP0329266A3 (en) * | 1988-02-19 | 1989-10-11 | Texaco Development Corporation | Amidoamine and oxamidoamine co-curatives in epoxy thermoset adhesive |
| WO1991009835A1 (en) * | 1989-12-28 | 1991-07-11 | Hoechst Aktiengesellschaft | Biscationic acid amide and acid imide derivatives and process for preparing them |
| US5117058A (en) * | 1990-11-09 | 1992-05-26 | Baker Hughes Incorporated | Cationic amide/ester compositions as demulsifiers |
| EP0654465A1 (en) * | 1993-11-15 | 1995-05-24 | Ciba-Geigy Ag | Polyaminopolyamides |
| EP1219656A1 (en) * | 2000-12-26 | 2002-07-03 | Mitsubishi Gas Chemical Company, Inc. | Composition for coating having a gas barrier property, coating and coated film having a gas barrier property used the same |
| US7336106B2 (en) | 2004-03-31 | 2008-02-26 | Micron Technology, Inc. | Phase detector and method having hysteresis characteristics |
| RU2331633C1 (en) * | 2007-04-16 | 2008-08-20 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт химии и технологии полимеров имени академика В.А. Каргина с опытным заводом" (ФГУП "НИИ полимеров") | 4-hexyl-3-(octen-2-yl)-5-cyclohexene-1,2-di[n,n-di(2-alkyl/cycloalkylimino)ethyl]-diheptaneamide |
| RU2333197C1 (en) * | 2007-04-16 | 2008-09-10 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт химии и технологии полимеров имени академика В.А. Каргина с опытным заводом" (ФГУП "НИИ полимеров") | 4-hexyl-3-(octene-2-yl)-5-cyclohexene-1,2-di[n,n-di(2-aminoethyl)]-diheptanamide |
| US7425598B2 (en) * | 2001-09-05 | 2008-09-16 | Mitsubishi Gas Chemical Company, Inc. | Adhesive of epoxy resin and curing agent with xylylene diamine structure |
| CN117025117A (en) * | 2023-08-11 | 2023-11-10 | 青岛德聚胶接技术有限公司 | High-temperature-resistant and deformation-resistant chip epoxy adhesive film and preparation method thereof |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4024466C2 (en) * | 1990-07-30 | 1995-04-20 | Dainippon Ink & Chemicals | Thermally curable mixtures of polyfunctional formamides and aromatic mono-, di- or polyglycidyl ethers and their use |
| US6111030A (en) * | 1994-01-21 | 2000-08-29 | Rheox, Inc. | Epoxy, polysulfide and cyanoacrylate composites utilizing activatable amino-polyamide curatives |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2041772A1 (en) * | 1970-08-22 | 1972-02-24 | Bayer Ag | Amide group-containing aliphatic diamines and a process for their preparation |
-
1982
- 1982-12-10 CH CH720982A patent/CH650767A5/en not_active IP Right Cessation
- 1982-12-14 GB GB08235554A patent/GB2112388B/en not_active Expired
- 1982-12-14 DE DE19823246267 patent/DE3246267A1/en not_active Withdrawn
- 1982-12-16 FR FR8221101A patent/FR2518541B1/en not_active Expired
- 1982-12-17 JP JP22172282A patent/JPS58110552A/en active Pending
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0161736A1 (en) * | 1984-02-08 | 1985-11-21 | E.I. Du Pont De Nemours And Company | Chlorosulfonated polyethylene coating composition |
| EP0174725A1 (en) * | 1984-08-09 | 1986-03-19 | E.I. Du Pont De Nemours And Company | Chlorosulfonated ethylene vinyl acetate polymer coating composition |
| EP0329266A3 (en) * | 1988-02-19 | 1989-10-11 | Texaco Development Corporation | Amidoamine and oxamidoamine co-curatives in epoxy thermoset adhesive |
| WO1991009835A1 (en) * | 1989-12-28 | 1991-07-11 | Hoechst Aktiengesellschaft | Biscationic acid amide and acid imide derivatives and process for preparing them |
| US5329046A (en) * | 1989-12-28 | 1994-07-12 | Hoechst Aktiengesellschaft | Biscationic acid amide and imide derivatives and processes for their preparation |
| US5117058A (en) * | 1990-11-09 | 1992-05-26 | Baker Hughes Incorporated | Cationic amide/ester compositions as demulsifiers |
| EP0654465A1 (en) * | 1993-11-15 | 1995-05-24 | Ciba-Geigy Ag | Polyaminopolyamides |
| AU782542B2 (en) * | 2000-12-26 | 2005-08-11 | Mitsubishi Gas Chemical Company, Inc. | Composition for coating having a gas barrier property, coating and coated film having a gas barrier property used the same |
| EP1219656A1 (en) * | 2000-12-26 | 2002-07-03 | Mitsubishi Gas Chemical Company, Inc. | Composition for coating having a gas barrier property, coating and coated film having a gas barrier property used the same |
| US7267877B2 (en) | 2000-12-26 | 2007-09-11 | Mitsubishi Gas Chemical Company, Inc. | Composition for coating having a gas barrier property, coating and coated film having a gas barrier property used the same |
| US7271224B2 (en) | 2000-12-26 | 2007-09-18 | Mitsubishi Gas Chemical Company, Inc. | Composition for coating having a gas barrier property, coating and coated film having a gas barrier property used the same |
| US7425598B2 (en) * | 2001-09-05 | 2008-09-16 | Mitsubishi Gas Chemical Company, Inc. | Adhesive of epoxy resin and curing agent with xylylene diamine structure |
| US7336106B2 (en) | 2004-03-31 | 2008-02-26 | Micron Technology, Inc. | Phase detector and method having hysteresis characteristics |
| RU2331633C1 (en) * | 2007-04-16 | 2008-08-20 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт химии и технологии полимеров имени академика В.А. Каргина с опытным заводом" (ФГУП "НИИ полимеров") | 4-hexyl-3-(octen-2-yl)-5-cyclohexene-1,2-di[n,n-di(2-alkyl/cycloalkylimino)ethyl]-diheptaneamide |
| RU2333197C1 (en) * | 2007-04-16 | 2008-09-10 | Федеральное государственное унитарное предприятие "Научно-исследовательский институт химии и технологии полимеров имени академика В.А. Каргина с опытным заводом" (ФГУП "НИИ полимеров") | 4-hexyl-3-(octene-2-yl)-5-cyclohexene-1,2-di[n,n-di(2-aminoethyl)]-diheptanamide |
| CN117025117A (en) * | 2023-08-11 | 2023-11-10 | 青岛德聚胶接技术有限公司 | High-temperature-resistant and deformation-resistant chip epoxy adhesive film and preparation method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| CH650767A5 (en) | 1985-08-15 |
| GB2112388B (en) | 1985-10-30 |
| FR2518541B1 (en) | 1986-09-12 |
| FR2518541A1 (en) | 1983-06-24 |
| JPS58110552A (en) | 1983-07-01 |
| DE3246267A1 (en) | 1983-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| GB2112388A (en) | Carboxylic acid amides containing amino groups, and mixtures containing these amides and epoxy resins | |
| JPH0262152B2 (en) | ||
| US4002599A (en) | Epoxy resin compositions from glycidyl derivatives of aminophenols cured with tetracarboxylic dianhydrides | |
| EP0099268B1 (en) | Process for producing polymaleimide | |
| JPH02296820A (en) | Curable composition made of alicyclic epoxy resin as base material | |
| JPS6094418A (en) | Curable composition containing epoxy resin and salicyloylhydrocarbylamine and cured composition | |
| CH632765A5 (en) | METHOD FOR PRODUCING SILICON-MODIFIED PHTHALIC ACID DERIVATIVES. | |
| JPH044325B2 (en) | ||
| JPS6120553B2 (en) | ||
| US4560739A (en) | Triglycidyl compounds of aminophenols | |
| EP0157740B1 (en) | Glycidyloxydiketones | |
| US3644431A (en) | Diglycidyl esters of aliphatic dicarboxylic acids | |
| AU610667B2 (en) | Epoxy resins comprising an aromatic diamine curing agent | |
| JPS6138732B2 (en) | ||
| US5591811A (en) | 1-imidazolylmethyl-2-naphthols as catalysts for curing epoxy resins | |
| JPH0519567B2 (en) | ||
| US3620983A (en) | {11 -methylglycidyl-isocyanurates | |
| JPH04356523A (en) | Latent curing agent for epoxy resin | |
| US4366302A (en) | Imide-anhydrides and epoxy resin systems containing such compounds | |
| US3692705A (en) | Epoxy phthalimide resins | |
| EP0188337A2 (en) | Thermosettable heat-resistant epoxy resin composition | |
| EP0539331B1 (en) | Adducts of diaminodiphenyl sulfone compounds as hardeners for epoxy resins | |
| JPS5943048B2 (en) | Heat-resistant curable resin composition | |
| EP0241133A2 (en) | Polymaleimide compound and a composition containing the same | |
| US3725342A (en) | Curable composition comprising a di-primary diamine containing hydantoin rings and a polyepoxide compound |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |