GB2104285B - Manufacture of integrated circuits - Google Patents
Manufacture of integrated circuitsInfo
- Publication number
- GB2104285B GB2104285B GB08220289A GB8220289A GB2104285B GB 2104285 B GB2104285 B GB 2104285B GB 08220289 A GB08220289 A GB 08220289A GB 8220289 A GB8220289 A GB 8220289A GB 2104285 B GB2104285 B GB 2104285B
- Authority
- GB
- United Kingdom
- Prior art keywords
- manufacture
- integrated circuits
- circuits
- integrated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10D64/01344—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B20/00—Read-only memory [ROM] devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/0223—Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/021—Manufacture or treatment of FETs having insulated gates [IGFET]
- H10D30/0413—Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having charge-trapping gate insulators, e.g. MNOS transistors
-
- H10D64/0113—
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
- H10D64/23—Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
- H10D64/251—Source or drain electrodes for field-effect devices
- H10D64/258—Source or drain electrodes for field-effect devices characterised by the relative positions of the source or drain electrodes with respect to the gate electrode
- H10D64/259—Source or drain electrodes being self-aligned with the gate electrode and having bottom surfaces higher than the interface between the channel and the gate dielectric
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
- H10D64/68—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
- H10D64/681—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator having a compositional variation, e.g. multilayered
- H10D64/685—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator having a compositional variation, e.g. multilayered being perpendicular to the channel plane
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/60—Electrodes characterised by their materials
- H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
- H10D64/68—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
- H10D64/693—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator the insulator comprising nitrogen, e.g. nitrides, oxynitrides or nitrogen-doped materials
-
- H10P14/61—
-
- H10P14/6308—
-
- H10P32/141—
-
- H10P32/171—
-
- H10P76/40—
-
- H10W10/012—
-
- H10W10/13—
-
- H10W20/01—
-
- H10W20/20—
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/909,886 US4277881A (en) | 1978-05-26 | 1978-05-26 | Process for fabrication of high density VLSI circuits, having self-aligned gates and contacts for FET devices and conducting lines |
| US05/913,182 US4221044A (en) | 1978-06-06 | 1978-06-06 | Self-alignment of gate contacts at local or remote sites |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| GB2104285A GB2104285A (en) | 1983-03-02 |
| GB2104285B true GB2104285B (en) | 1983-07-06 |
Family
ID=27129539
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB7918079A Expired GB2024505B (en) | 1978-05-26 | 1979-05-24 | Manufacture of integrated circuits |
| GB08220289A Expired GB2104285B (en) | 1978-05-26 | 1982-07-13 | Manufacture of integrated circuits |
| GB08220264A Expired GB2106315B (en) | 1978-05-26 | 1982-07-13 | Manufacture of integrated circuits |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB7918079A Expired GB2024505B (en) | 1978-05-26 | 1979-05-24 | Manufacture of integrated circuits |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB08220264A Expired GB2106315B (en) | 1978-05-26 | 1982-07-13 | Manufacture of integrated circuits |
Country Status (1)
| Country | Link |
|---|---|
| GB (3) | GB2024505B (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4503601A (en) * | 1983-04-18 | 1985-03-12 | Ncr Corporation | Oxide trench structure for polysilicon gates and interconnects |
| CA1258320A (en) * | 1985-04-01 | 1989-08-08 | Madhukar B. Vora | Small contactless ram cell |
| US6284584B1 (en) | 1993-12-17 | 2001-09-04 | Stmicroelectronics, Inc. | Method of masking for periphery salicidation of active regions |
| US6107194A (en) * | 1993-12-17 | 2000-08-22 | Stmicroelectronics, Inc. | Method of fabricating an integrated circuit |
| US5439846A (en) * | 1993-12-17 | 1995-08-08 | Sgs-Thomson Microelectronics, Inc. | Self-aligned method for forming contact with zero offset to gate |
| DE69424388T2 (en) * | 1993-12-23 | 2000-08-31 | Stmicroelectronics, Inc. | Process and dielectric structure to facilitate metal overetching without damaging the intermediate dielectric |
-
1979
- 1979-05-24 GB GB7918079A patent/GB2024505B/en not_active Expired
-
1982
- 1982-07-13 GB GB08220289A patent/GB2104285B/en not_active Expired
- 1982-07-13 GB GB08220264A patent/GB2106315B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB2024505B (en) | 1983-03-23 |
| GB2106315B (en) | 1983-08-03 |
| GB2024505A (en) | 1980-01-09 |
| GB2106315A (en) | 1983-04-07 |
| GB2104285A (en) | 1983-03-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PCNP | Patent ceased through non-payment of renewal fee |