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GB2104285B - Manufacture of integrated circuits - Google Patents

Manufacture of integrated circuits

Info

Publication number
GB2104285B
GB2104285B GB08220289A GB8220289A GB2104285B GB 2104285 B GB2104285 B GB 2104285B GB 08220289 A GB08220289 A GB 08220289A GB 8220289 A GB8220289 A GB 8220289A GB 2104285 B GB2104285 B GB 2104285B
Authority
GB
United Kingdom
Prior art keywords
manufacture
integrated circuits
circuits
integrated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB08220289A
Other versions
GB2104285A (en
Inventor
Gordon Charles Godejahn
Gary Lee Heimbigner
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Boeing North American Inc
Original Assignee
Rockwell International Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US05/909,886 external-priority patent/US4277881A/en
Priority claimed from US05/913,182 external-priority patent/US4221044A/en
Application filed by Rockwell International Corp filed Critical Rockwell International Corp
Publication of GB2104285A publication Critical patent/GB2104285A/en
Application granted granted Critical
Publication of GB2104285B publication Critical patent/GB2104285B/en
Expired legal-status Critical Current

Links

Classifications

    • H10D64/01344
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B20/00Read-only memory [ROM] devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0223Manufacture or treatment of FETs having insulated gates [IGFET] having source and drain regions or source and drain extensions self-aligned to sides of the gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/01Manufacture or treatment
    • H10D30/021Manufacture or treatment of FETs having insulated gates [IGFET]
    • H10D30/0413Manufacture or treatment of FETs having insulated gates [IGFET] of FETs having charge-trapping gate insulators, e.g. MNOS transistors
    • H10D64/0113
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/23Electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. sources, drains, anodes or cathodes
    • H10D64/251Source or drain electrodes for field-effect devices
    • H10D64/258Source or drain electrodes for field-effect devices characterised by the relative positions of the source or drain electrodes with respect to the gate electrode
    • H10D64/259Source or drain electrodes being self-aligned with the gate electrode and having bottom surfaces higher than the interface between the channel and the gate dielectric
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/66Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/68Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
    • H10D64/681Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator having a compositional variation, e.g. multilayered
    • H10D64/685Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator having a compositional variation, e.g. multilayered being perpendicular to the channel plane
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/66Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/68Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator
    • H10D64/693Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes characterised by the insulator, e.g. by the gate insulator the insulator comprising nitrogen, e.g. nitrides, oxynitrides or nitrogen-doped materials
    • H10P14/61
    • H10P14/6308
    • H10P32/141
    • H10P32/171
    • H10P76/40
    • H10W10/012
    • H10W10/13
    • H10W20/01
    • H10W20/20
GB08220289A 1978-05-26 1982-07-13 Manufacture of integrated circuits Expired GB2104285B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US05/909,886 US4277881A (en) 1978-05-26 1978-05-26 Process for fabrication of high density VLSI circuits, having self-aligned gates and contacts for FET devices and conducting lines
US05/913,182 US4221044A (en) 1978-06-06 1978-06-06 Self-alignment of gate contacts at local or remote sites

Publications (2)

Publication Number Publication Date
GB2104285A GB2104285A (en) 1983-03-02
GB2104285B true GB2104285B (en) 1983-07-06

Family

ID=27129539

Family Applications (3)

Application Number Title Priority Date Filing Date
GB7918079A Expired GB2024505B (en) 1978-05-26 1979-05-24 Manufacture of integrated circuits
GB08220289A Expired GB2104285B (en) 1978-05-26 1982-07-13 Manufacture of integrated circuits
GB08220264A Expired GB2106315B (en) 1978-05-26 1982-07-13 Manufacture of integrated circuits

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB7918079A Expired GB2024505B (en) 1978-05-26 1979-05-24 Manufacture of integrated circuits

Family Applications After (1)

Application Number Title Priority Date Filing Date
GB08220264A Expired GB2106315B (en) 1978-05-26 1982-07-13 Manufacture of integrated circuits

Country Status (1)

Country Link
GB (3) GB2024505B (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4503601A (en) * 1983-04-18 1985-03-12 Ncr Corporation Oxide trench structure for polysilicon gates and interconnects
CA1258320A (en) * 1985-04-01 1989-08-08 Madhukar B. Vora Small contactless ram cell
US6284584B1 (en) 1993-12-17 2001-09-04 Stmicroelectronics, Inc. Method of masking for periphery salicidation of active regions
US6107194A (en) * 1993-12-17 2000-08-22 Stmicroelectronics, Inc. Method of fabricating an integrated circuit
US5439846A (en) * 1993-12-17 1995-08-08 Sgs-Thomson Microelectronics, Inc. Self-aligned method for forming contact with zero offset to gate
DE69424388T2 (en) * 1993-12-23 2000-08-31 Stmicroelectronics, Inc. Process and dielectric structure to facilitate metal overetching without damaging the intermediate dielectric

Also Published As

Publication number Publication date
GB2024505B (en) 1983-03-23
GB2106315B (en) 1983-08-03
GB2024505A (en) 1980-01-09
GB2106315A (en) 1983-04-07
GB2104285A (en) 1983-03-02

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Legal Events

Date Code Title Description
PCNP Patent ceased through non-payment of renewal fee