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GB2005855A - Lithographic imaging composition having improved image visibility - Google Patents

Lithographic imaging composition having improved image visibility

Info

Publication number
GB2005855A
GB2005855A GB7838286A GB7838286A GB2005855A GB 2005855 A GB2005855 A GB 2005855A GB 7838286 A GB7838286 A GB 7838286A GB 7838286 A GB7838286 A GB 7838286A GB 2005855 A GB2005855 A GB 2005855A
Authority
GB
United Kingdom
Prior art keywords
improved image
composition
diazo
lithographic
imaging composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB7838286A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polychrome Corp
Original Assignee
Polychrome Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polychrome Corp filed Critical Polychrome Corp
Publication of GB2005855A publication Critical patent/GB2005855A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

The invention relates to lithographic printing plates having improved image stability and visibility. The improvements arise from the use of a photosensitive composition which upon exposure to light forms a bleached, less intense coloring than its original color. The composition comprises a positive acting, lithographic diazo type composition such as the diazo oxides, including aromatic or heterocyclic esters or amides of napthoquinone diazide sulfonic or carboxylic acids, in admixture with a negative acting diazo type monomer, and a compatible colorant. The monomer releases an acid in exposed areas to effect bleaching.
GB7838286A 1977-10-03 1978-09-27 Lithographic imaging composition having improved image visibility Withdrawn GB2005855A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US83877477A 1977-10-03 1977-10-03

Publications (1)

Publication Number Publication Date
GB2005855A true GB2005855A (en) 1979-04-25

Family

ID=25278012

Family Applications (1)

Application Number Title Priority Date Filing Date
GB7838286A Withdrawn GB2005855A (en) 1977-10-03 1978-09-27 Lithographic imaging composition having improved image visibility

Country Status (7)

Country Link
JP (1) JPS5472103A (en)
AU (1) AU4029478A (en)
DE (1) DE2843069A1 (en)
FR (1) FR2404870A1 (en)
GB (1) GB2005855A (en)
NL (1) NL7809997A (en)
SE (1) SE7810323L (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2503399A1 (en) * 1981-04-01 1982-10-08 Fuji Photo Film Co Ltd PHOTOSENSITIVE COMPOSITION FOR VISIBLE IMAGING BY EXPOSURE
FR2510771A1 (en) * 1981-06-15 1983-02-04 Polychrome Corp COMPOSITION SENSITIVE TO RADIATION EXPOSURE FOR LITHOGRAPHIC PLATES
EP0100920A1 (en) * 1982-08-11 1984-02-22 Hitachi, Ltd. Photosensitive composition and pattern forming process using same
US4458000A (en) * 1981-11-09 1984-07-03 Hoechst Aktiengesellschaft Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light
FR2558274A1 (en) * 1984-01-17 1985-07-19 Chemistry Technology Sa Process for the production of positive images on a substrate from a positive transparent plate employing a diazo sensitive surface
EP0125102A3 (en) * 1983-05-06 1985-11-06 Sericol Group Limited Photosensitive systems showing visible indication of exposure
EP0161660A3 (en) * 1984-05-14 1987-05-20 Kabushiki Kaisha Toshiba Pattern forming method and composition for pattern formation to be used therefor
CN115679700A (en) * 2021-07-27 2023-02-03 财团法人工业技术研究院 Immersion liquid and activated carbon cloth and forming method thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1347759A (en) * 1971-06-17 1974-02-27 Howson Algraphy Ltd Light sensitive materials
JPS5626012B2 (en) * 1973-12-07 1981-06-16
DE2331377C2 (en) * 1973-06-20 1982-10-14 Hoechst Ag, 6000 Frankfurt Photosensitive copying material
DE2641100C2 (en) * 1976-09-13 1987-02-26 Hoechst Ag, 6230 Frankfurt Light-sensitive mixture

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2503399A1 (en) * 1981-04-01 1982-10-08 Fuji Photo Film Co Ltd PHOTOSENSITIVE COMPOSITION FOR VISIBLE IMAGING BY EXPOSURE
FR2510771A1 (en) * 1981-06-15 1983-02-04 Polychrome Corp COMPOSITION SENSITIVE TO RADIATION EXPOSURE FOR LITHOGRAPHIC PLATES
US4458000A (en) * 1981-11-09 1984-07-03 Hoechst Aktiengesellschaft Light-sensitive mixture and light-sensitive copying material prepared therefrom wherein image produced therein is visible under yellow safety light
EP0100920A1 (en) * 1982-08-11 1984-02-22 Hitachi, Ltd. Photosensitive composition and pattern forming process using same
EP0125102A3 (en) * 1983-05-06 1985-11-06 Sericol Group Limited Photosensitive systems showing visible indication of exposure
FR2558274A1 (en) * 1984-01-17 1985-07-19 Chemistry Technology Sa Process for the production of positive images on a substrate from a positive transparent plate employing a diazo sensitive surface
EP0161660A3 (en) * 1984-05-14 1987-05-20 Kabushiki Kaisha Toshiba Pattern forming method and composition for pattern formation to be used therefor
CN115679700A (en) * 2021-07-27 2023-02-03 财团法人工业技术研究院 Immersion liquid and activated carbon cloth and forming method thereof

Also Published As

Publication number Publication date
DE2843069A1 (en) 1979-04-12
FR2404870A1 (en) 1979-04-27
AU4029478A (en) 1980-04-03
SE7810323L (en) 1979-05-17
JPS5472103A (en) 1979-06-09
NL7809997A (en) 1979-04-05

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)