GB1502015A - Dry-film photoresist elements - Google Patents
Dry-film photoresist elementsInfo
- Publication number
- GB1502015A GB1502015A GB491275A GB491275A GB1502015A GB 1502015 A GB1502015 A GB 1502015A GB 491275 A GB491275 A GB 491275A GB 491275 A GB491275 A GB 491275A GB 1502015 A GB1502015 A GB 1502015A
- Authority
- GB
- United Kingdom
- Prior art keywords
- cover film
- photopolymerizable layer
- dialkyl
- substrate
- dry
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920002120 photoresistant polymer Polymers 0.000 title 1
- 239000013039 cover film Substances 0.000 abstract 6
- 150000002148 esters Chemical class 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 4
- 229920000098 polyolefin Polymers 0.000 abstract 2
- 239000004709 Chlorinated polyethylene Substances 0.000 abstract 1
- 239000004641 Diallyl-phthalate Substances 0.000 abstract 1
- 239000004743 Polypropylene Substances 0.000 abstract 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 abstract 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 abstract 1
- 125000001931 aliphatic group Chemical group 0.000 abstract 1
- 125000005250 alkyl acrylate group Chemical group 0.000 abstract 1
- 125000000217 alkyl group Chemical group 0.000 abstract 1
- QUDWYFHPNIMBFC-UHFFFAOYSA-N bis(prop-2-enyl) benzene-1,2-dicarboxylate Chemical compound C=CCOC(=O)C1=CC=CC=C1C(=O)OCC=C QUDWYFHPNIMBFC-UHFFFAOYSA-N 0.000 abstract 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N itaconic acid Chemical class OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 abstract 1
- 150000002688 maleic acid derivatives Chemical class 0.000 abstract 1
- 125000005395 methacrylic acid group Chemical group 0.000 abstract 1
- 239000000203 mixture Substances 0.000 abstract 1
- 239000000178 monomer Substances 0.000 abstract 1
- 150000002895 organic esters Chemical class 0.000 abstract 1
- 239000003504 photosensitizing agent Substances 0.000 abstract 1
- 125000005498 phthalate group Chemical class 0.000 abstract 1
- 229920005862 polyol Polymers 0.000 abstract 1
- -1 polypropylene Polymers 0.000 abstract 1
- 229920001155 polypropylene Polymers 0.000 abstract 1
- 230000001681 protective effect Effects 0.000 abstract 1
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical class OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 abstract 1
- 150000003900 succinic acid esters Chemical class 0.000 abstract 1
- 150000005846 sugar alcohols Polymers 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/085—Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Polymerisation Methods In General (AREA)
Abstract
1502015 Dry-processing photo-resist elements MacDERMID Inc 5 Feb 1975 [8 March 1974] 4912/75 Heading G2C A dry-processing photo-resist element comprises (1) a transparent cover film, (2) a photopolymerizable layer containing (a) at least one polyfunctional polyethylenically unsaturated ester monomer or prepolymer, (b) at least one halogenated polyolefin completely miscible with ester (a), (c) at least one completely miscible organic ester promoter of selective adhesion of polymerized and unpolymerized portions of the layer selected from alkyl acrylates, dialkyl itaconates, dialkyl maleates, dialkyl sebacates, dialkyl succinates and dialkyl phthalates, wherein the alkyl groups have up to about 20 carbons, diallyl phthalate and polyol diacrylates, and their mixtures, and (d) at least one photo-sensitizer, and (3) a substrate adhered to the surface of the photopolymerizable layer opposite to the surface in contact with the cover film, the cover film and the substrate each having a different degree of adhesion to the photopolymerizable layer. Polyethylenically unsaturated esters include acrylic, methacrylic and itaconic esters of aliphatic polyhydric alcohols, especially pentaerythritol triacrylate, halogenated polyolefins include chlorinated polyethylene and chlorinated polypropylene. In use the element comprises the photopolymerizable layer sandwiched between the cover film and a protective backing sheet. The backing sheet is stripped away, the photopolymerizable layer is applied to a substrate and imagewise exposed through the cover film. After the exposure the cover film is removed taking with it all of the unexposed (or uncured) portion of the photopolymerizable layer and leaving the exposed portion adhering to the substrate. No additional processing is necessary.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US44951874A | 1974-03-08 | 1974-03-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1502015A true GB1502015A (en) | 1978-02-22 |
Family
ID=23784454
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB491275A Expired GB1502015A (en) | 1974-03-08 | 1975-02-05 | Dry-film photoresist elements |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS50120825A (en) |
| DE (1) | DE2509824A1 (en) |
| GB (1) | GB1502015A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5633111A (en) * | 1991-11-01 | 1997-05-27 | Fuji Photo Film Co., Ltd. | Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound |
| US20150241772A1 (en) * | 2012-08-27 | 2015-08-27 | Zhuhai Dynamic Technology Optical Industry Co., Ltd. | Double coated negative-working dry-film photoresist |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5651735A (en) * | 1979-10-03 | 1981-05-09 | Asahi Chem Ind Co Ltd | Photoreactive composition |
| JPS57183030A (en) * | 1981-05-07 | 1982-11-11 | Toshiba Corp | Manufacture of semiconductor device |
| JP3638086B2 (en) * | 1998-08-21 | 2005-04-13 | 東京応化工業株式会社 | Positive resist composition and resist pattern forming method using the same |
-
1975
- 1975-01-23 JP JP1011275A patent/JPS50120825A/ja active Pending
- 1975-02-05 GB GB491275A patent/GB1502015A/en not_active Expired
- 1975-03-06 DE DE19752509824 patent/DE2509824A1/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5633111A (en) * | 1991-11-01 | 1997-05-27 | Fuji Photo Film Co., Ltd. | Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound |
| US20150241772A1 (en) * | 2012-08-27 | 2015-08-27 | Zhuhai Dynamic Technology Optical Industry Co., Ltd. | Double coated negative-working dry-film photoresist |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS50120825A (en) | 1975-09-22 |
| DE2509824A1 (en) | 1975-09-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed |