[go: up one dir, main page]

FI813800L - FOERFARANDE FOER FRAMSTAELLNING AV RELIEFKOPIOR - Google Patents

FOERFARANDE FOER FRAMSTAELLNING AV RELIEFKOPIOR

Info

Publication number
FI813800L
FI813800L FI813800A FI813800A FI813800L FI 813800 L FI813800 L FI 813800L FI 813800 A FI813800 A FI 813800A FI 813800 A FI813800 A FI 813800A FI 813800 L FI813800 L FI 813800L
Authority
FI
Finland
Prior art keywords
layer
reliefkopior
exposure
foerfarande foer
foer framstaellning
Prior art date
Application number
FI813800A
Other languages
Finnish (fi)
Other versions
FI813800A7 (en
Inventor
Klaus Horn
Hartmut Steppan
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of FI813800A7 publication Critical patent/FI813800A7/en
Publication of FI813800L publication Critical patent/FI813800L/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/38—Treatment before imagewise removal, e.g. prebaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Holo Graphy (AREA)
  • Steroid Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Bakery Products And Manufacturing Methods Therefor (AREA)
  • Medicines Containing Plant Substances (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Materials For Photolithography (AREA)
  • Secondary Cells (AREA)
  • Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
  • Polysaccharides And Polysaccharide Derivatives (AREA)
  • Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
  • Amplifiers (AREA)

Abstract

1. A process for the production of relief copies, in which the photopolymerizable layer of a copying material, which layer contains a polymerizable compound with at least two terminal ethylenically unsaturated double bonds, a polymeric binder and a photoinitiator which on exposure can generate free radicals, is exposed imagewise and thereafter the unexposed areas of the layer are washed out be means of a developer, characterized in that the layer is warmed for a period of 5 seconds to 10 minutes to temperature within the range from 50 to 180 degrees C after exposure, and is then developed.
FI813800A 1980-11-29 1981-11-26 FOERFARANDE FOER FRAMSTAELLNING AV RELIEFKOPIOR FI813800L (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19803045149 DE3045149A1 (en) 1980-11-29 1980-11-29 METHOD FOR PRODUCING RELIEF COPIES

Publications (2)

Publication Number Publication Date
FI813800A7 FI813800A7 (en) 1982-05-30
FI813800L true FI813800L (en) 1982-05-30

Family

ID=6117970

Family Applications (1)

Application Number Title Priority Date Filing Date
FI813800A FI813800L (en) 1980-11-29 1981-11-26 FOERFARANDE FOER FRAMSTAELLNING AV RELIEFKOPIOR

Country Status (12)

Country Link
EP (1) EP0053708B1 (en)
JP (1) JPS57119343A (en)
AT (1) ATE15951T1 (en)
AU (1) AU7768081A (en)
BR (1) BR8107750A (en)
DE (2) DE3045149A1 (en)
DK (1) DK526781A (en)
ES (1) ES8301036A1 (en)
FI (1) FI813800L (en)
IL (1) IL64395A0 (en)
NO (1) NO814046L (en)
ZA (1) ZA818106B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3279843D1 (en) * 1982-08-25 1989-08-31 Fujitsu Ltd Method for forming patterned resist layer on semiconductor body
DE3534414A1 (en) * 1985-09-27 1987-04-02 Standard Elektrik Lorenz Ag METHOD AND DEVICE FOR PRODUCING A BLACK MATRIX LAYER
JPS6291938A (en) * 1985-10-18 1987-04-27 Fuji Photo Film Co Ltd Photoengraving method
EP0226741B1 (en) * 1985-10-25 1989-08-02 Hoechst Celanese Corporation Process for producing a positive photoresist
JP2551425B2 (en) * 1987-02-17 1996-11-06 三洋電機株式会社 Method for manufacturing transmissive liquid crystal display device
JP2886254B2 (en) * 1990-04-25 1999-04-26 旭化成工業株式会社 Method for producing photosensitive resin plate and plate making apparatus used therefor
DE4033294A1 (en) * 1990-10-19 1992-04-23 Siemens Ag METHOD FOR THE PHOTOLITHOGRAPHIC PRODUCTION OF STRUCTURES ON A CARRIER
EP0885410B1 (en) * 1996-03-07 2000-09-13 Clariant Finance (BVI) Limited Thermal treatment process of positive photoresist composition
JPH1026834A (en) * 1996-07-09 1998-01-27 Tokyo Ohka Kogyo Co Ltd Image forming method

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447913C3 (en) * 1964-10-15 1979-08-09 Hoechst Ag, 6000 Frankfurt Process for the production of printing forms
DE1522503C3 (en) * 1967-01-24 1978-11-09 Hoechst Ag, 6000 Frankfurt Process for the production of printing forms
US3623869A (en) * 1969-10-27 1971-11-30 Plastic Coating Corp Method for imaging diazosulfonate photoreproduction materials
DD103740A1 (en) * 1973-04-24 1974-02-05

Also Published As

Publication number Publication date
ES507538A0 (en) 1982-11-01
JPS57119343A (en) 1982-07-24
DE3172541D1 (en) 1985-11-07
EP0053708B1 (en) 1985-10-02
ES8301036A1 (en) 1982-11-01
ZA818106B (en) 1982-10-27
FI813800A7 (en) 1982-05-30
EP0053708A2 (en) 1982-06-16
DK526781A (en) 1982-05-30
IL64395A0 (en) 1982-02-28
NO814046L (en) 1982-06-01
AU7768081A (en) 1982-06-10
ATE15951T1 (en) 1985-10-15
BR8107750A (en) 1982-08-31
EP0053708A3 (en) 1982-08-04
DE3045149A1 (en) 1982-07-01

Similar Documents

Publication Publication Date Title
ATE38568T1 (en) PROCESS FOR MAKING NEGATIVE COPIES USING A MATERIAL BASED ON 1,2QUINONEDIAZIDES.
EP0356952A3 (en) Process for making flexographic plates with increased flexibility
DE2965296D1 (en) Method for setting the exposure in the production of photographic copies
FI813800L (en) FOERFARANDE FOER FRAMSTAELLNING AV RELIEFKOPIOR
KR910018851A (en) A method of manufacturing a typesetting or photoresist by irradiation of a photopolymerizable recording material.
ATE37240T1 (en) MANUFACTURE OF DIFFRACTION GRATES.
GB1263122A (en) Image reproduction process
GB1167591A (en) Improvements in or relating to the Production of Transparencies
KR830010405A (en) How to make relief copies
SE7714551L (en) PROCEDURE FOR PREPARING RELIEF RECORDS
EP0152114A3 (en) Method for making a dry planographic printing plate
ATE47631T1 (en) PROCESS FOR MAKING PHOTORESIST STRUCTURES.
JPS5226171A (en) Mask creation method
GB1387350A (en) Method of preparing a photoresist pattern upon a metal surface
JPS5636648A (en) Photosensitive material and pattern forming method using it
JPS5625734A (en) Photosensitive resin fixing method
JPS57102015A (en) Pattern formation
GB1370695A (en) Reflective elements
JPS644738A (en) Formation of metallic thin film pattern
JPS56101148A (en) Photoresist developing method
JPS5360626A (en) Method for eliminating illumination irregularity
JPS5257819A (en) Image formation
GB747618A (en) Improvements in and relating to articles incorporating diffraction gratings
JPS56137634A (en) Pattern forming
JPS5656630A (en) Manufacture of semiconductor element

Legal Events

Date Code Title Description
FD Application lapsed

Owner name: HOECHST AKTIENGESELLSCHAFT