GB1299976A - Improvements relating to the deposition of gold layers - Google Patents
Improvements relating to the deposition of gold layersInfo
- Publication number
- GB1299976A GB1299976A GB3411470A GB3411470A GB1299976A GB 1299976 A GB1299976 A GB 1299976A GB 3411470 A GB3411470 A GB 3411470A GB 3411470 A GB3411470 A GB 3411470A GB 1299976 A GB1299976 A GB 1299976A
- Authority
- GB
- United Kingdom
- Prior art keywords
- gold
- deposition
- july
- glass
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title abstract 5
- 239000010931 gold Substances 0.000 title abstract 5
- 229910052737 gold Inorganic materials 0.000 title abstract 5
- 230000008021 deposition Effects 0.000 title 1
- 239000011521 glass Substances 0.000 abstract 2
- 238000004544 sputter deposition Methods 0.000 abstract 2
- 230000001464 adherent effect Effects 0.000 abstract 1
- 239000000956 alloy Substances 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 229910052797 bismuth Inorganic materials 0.000 abstract 1
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 abstract 1
- 229910000416 bismuth oxide Inorganic materials 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 abstract 1
- 239000010453 quartz Substances 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- 229910000859 α-Fe Inorganic materials 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
1299976 Coating with gold PHILIPS ELECTRONIC & ASSOCIATED INDUSTRIES Ltd 14 July 1970 [17 July 1969] 34114/70 Heading C7F An adherent layer of gold is deposited by cathode sputtering, the target being of a goldbismuth alloy. The target may contain 90 to 98% of gold and 10 to 2% of bismuth, and a sputtering gas containing N 2 and O 2 , e.g. air, is used, whereby a first intermediate layer of bismuth oxide is formed on the substrate which may be of glass, ceramic, quartz, or a ferrite, and this layer is then covered with pure gold. Layers up to 100Š may be provided on glass to give window panes transparent to visible radiation but opaque to infrared.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR6924341A FR2054496B1 (en) | 1969-07-17 | 1969-07-17 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| GB1299976A true GB1299976A (en) | 1972-12-13 |
Family
ID=9037589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| GB3411470A Expired GB1299976A (en) | 1969-07-17 | 1970-07-14 | Improvements relating to the deposition of gold layers |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS491134B1 (en) |
| BE (1) | BE753520A (en) |
| DE (1) | DE2032639C3 (en) |
| FR (1) | FR2054496B1 (en) |
| GB (1) | GB1299976A (en) |
| NL (1) | NL7010303A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2299729A1 (en) * | 1975-01-30 | 1976-08-27 | Radiotechnique Compelec | Light-emitting diode - having metal oxide insulating layer and gold conductive layer |
| JPS53162691U (en) * | 1977-05-25 | 1978-12-20 | ||
| JPS55170036U (en) * | 1979-05-26 | 1980-12-06 | ||
| DE3142541C2 (en) * | 1981-10-27 | 1986-07-31 | Demetron Gesellschaft für Elektronik-Werkstoffe mbH, 6540 Hanau | Multi-component alloy for targets in cathode sputtering systems |
-
1969
- 1969-07-17 FR FR6924341A patent/FR2054496B1/fr not_active Expired
-
1970
- 1970-07-01 DE DE19702032639 patent/DE2032639C3/en not_active Expired
- 1970-07-11 NL NL7010303A patent/NL7010303A/xx unknown
- 1970-07-14 GB GB3411470A patent/GB1299976A/en not_active Expired
- 1970-07-15 BE BE753520D patent/BE753520A/en unknown
- 1970-07-15 JP JP6146470A patent/JPS491134B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE2032639B2 (en) | 1979-04-12 |
| JPS491134B1 (en) | 1974-01-11 |
| DE2032639A1 (en) | 1971-02-11 |
| NL7010303A (en) | 1971-01-19 |
| FR2054496A1 (en) | 1971-04-23 |
| FR2054496B1 (en) | 1973-06-08 |
| BE753520A (en) | 1971-01-15 |
| DE2032639C3 (en) | 1979-12-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PS | Patent sealed | ||
| PCNP | Patent ceased through non-payment of renewal fee |