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GB1055243A - Improvements in or relating to electroplating - Google Patents

Improvements in or relating to electroplating

Info

Publication number
GB1055243A
GB1055243A GB30313/63A GB3031363A GB1055243A GB 1055243 A GB1055243 A GB 1055243A GB 30313/63 A GB30313/63 A GB 30313/63A GB 3031363 A GB3031363 A GB 3031363A GB 1055243 A GB1055243 A GB 1055243A
Authority
GB
United Kingdom
Prior art keywords
paste
additives
mixture
added
diethylenetriamine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB30313/63A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DEHYDAG GmbH
Dehydag Deutsche Hydrierwerke GmbH
Original Assignee
DEHYDAG GmbH
Dehydag Deutsche Hydrierwerke GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DEHYDAG GmbH, Dehydag Deutsche Hydrierwerke GmbH filed Critical DEHYDAG GmbH
Publication of GB1055243A publication Critical patent/GB1055243A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D295/00Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/16Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms
    • C07D295/20Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms acylated on ring nitrogen atoms by radicals derived from carbonic acid, or sulfur or nitrogen analogues thereof
    • C07D295/21Radicals derived from sulfur analogues of carbonic acid
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D233/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/04Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
    • C07D233/28Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/30Oxygen or sulfur atoms
    • C07D233/42Sulfur atoms
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • C25D21/14Controlled addition of electrolyte components
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Filtering Materials (AREA)
  • Chemically Coating (AREA)

Abstract

In electroplating using acid baths, organic bath additives which do not readily dissolve are provided by dissolution from carriers coated with a pasty mass of a mixture of the additive and a solvent therefor, swelling and/or thickening agents. The carriers may be perforated plastic discs, Raschig rings, balls or filter discs and may be placed in a column in the bath or an electrolyte circulating pump system or in a dissolving cage in such a circulating system after the dirt-catching filter. The additives may be compounds including N- and S-containing groups as in the parent Specification and may be made into a paste with carboxymethylcellulose for use in Cu and Zn baths containing an addition product formed from ethylene oxide and coconut fatty alcohols, or may be blood albumen made into a slurry with carboxymethyl cellulose and ammonia for a simple acid copper bath. In other examples the additive is made into a paste with polyvinyl acetate and ethanol, while additives formed by reacting diethylenetriamine or dipropylenetriamine with epichlorhydrin, carbon disulphide, propane sultone and benzoyl chloride for Cu and Sn baths are also disclosed, such additives being applied to the carriers either by making them brushable with acetone or by forming a paste with carboxymethyl cellulose.ALSO:An aqueous solution of diethylenetriamine and epichlorhydrin are slowly mixed at 100 DEG C. and then heated under reflux with agitation for four hours whereupon after cooling, sodium hydroxide is added and carbon disulphide is added during gentle heating at 45 DEG C. The mixture is then heated at 65 DEG C. with agitation, cooled, unreacted carbon disulphide vacuum distilled off, ethanol added warmed at 65 DEG C., and a mixture of propane sultone and benzoyl chloride added, followed by boiling under reflux. The mixture separates into two layers and the lower layer remaining after pouring off the upper layer is washed with acidified water and acetone leaving a yellow viscous mass. A similar process using dipropylenetriamine instead of diethylenetriamine yields a bright yellow powder condensation product. The copper salt of this product may be mixed with aqueous carboxymethyl cellulose solution to form a paste.
GB30313/63A 1961-08-10 1963-07-31 Improvements in or relating to electroplating Expired GB1055243A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DED36777A DE1224111B (en) 1961-08-10 1961-08-10 Acid galvanic copper and nickel baths and process for depositing the coatings
DED0039520 1962-08-01

Publications (1)

Publication Number Publication Date
GB1055243A true GB1055243A (en) 1967-01-18

Family

ID=25971309

Family Applications (2)

Application Number Title Priority Date Filing Date
GB26837/62A Expired GB941823A (en) 1961-08-10 1962-07-12 Improvements in or relating to electroplating
GB30313/63A Expired GB1055243A (en) 1961-08-10 1963-07-31 Improvements in or relating to electroplating

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GB26837/62A Expired GB941823A (en) 1961-08-10 1962-07-12 Improvements in or relating to electroplating

Country Status (6)

Country Link
US (2) US3257294A (en)
BE (1) BE621297A (en)
CH (1) CH429356A (en)
DE (2) DE1224111B (en)
GB (2) GB941823A (en)
NL (1) NL281922A (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH494824A (en) * 1969-07-10 1970-08-15 Fluehmann Werner Process for the electrodeposition of copper with high ductility
US3669853A (en) * 1969-07-15 1972-06-13 Chemetron Corp Coumarin-carrier addition agent for nickel baths
US3518171A (en) * 1969-07-24 1970-06-30 Metalux Corp The Purification of nickel electroplating solutions
US4014761A (en) * 1975-01-06 1977-03-29 M & T Chemicals Inc. Bright acid zinc plating
CA1128458A (en) * 1977-06-06 1982-07-27 Tokuyama Soda Kabushiki Kaisha Electrolysis with cathode of iron or nickel with electroplate from s/n nickel bath
DE2921241A1 (en) * 1979-04-19 1980-10-23 Alusuisse ACID TIN-II CONTAINING ELECTROLYT
US4376685A (en) * 1981-06-24 1983-03-15 M&T Chemicals Inc. Acid copper electroplating baths containing brightening and leveling additives
US4614568A (en) * 1983-06-14 1986-09-30 Nihon Kogyo Kabushiki Kaisha High-speed silver plating and baths therefor
GB8522046D0 (en) * 1985-09-05 1985-10-09 Interox Chemicals Ltd Stabilisation
EP2128903B1 (en) * 2008-05-30 2017-02-22 ATOTECH Deutschland GmbH Electroplating additive for the deposition of a metal, a binary, ternary, quaternary or pentanary alloy of elements of group 11 (IB)-group 13 (IIIA)-group 16 (VIA)

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1071438B (en) * 1959-12-17 Deutsche Gold- und Silber-Scheideanstalt vormals Roessler, Frankfurt/M Anode for electroplating baths and process for their manufacture
US1003092A (en) * 1907-04-11 1911-09-12 Ontario Nickel Company Ltd Method of electrolyzing nickel-sulfate solutions.
US1371414A (en) * 1919-06-17 1921-03-15 Thomas A Edison Nickel-plating
US2248092A (en) * 1934-10-26 1941-07-08 Sherka Chemical Co Inc Method for treating electroplating baths
US2449422A (en) * 1944-04-15 1948-09-14 Harshaw Chem Corp Electrodeposition of nickel
BE517665A (en) * 1949-11-23
AT172066B (en) * 1950-03-27 1952-08-11 H C Dr Wilhelm Dipl Pfanhauser Process for producing hard, shiny copper deposits by electrolytic deposition
NL110737C (en) * 1953-09-19
US2799634A (en) * 1954-02-26 1957-07-16 Westinghouse Electric Corp Combined addition agents for acid copper plating
DE1037801B (en) 1954-03-22 1958-08-28 Dehydag Gmbh Bath for the galvanic production of metal coatings
BE550706A (en) * 1956-01-27
US2879211A (en) * 1956-11-16 1959-03-24 Hanson Van Winkle Munning Co Electroplating duplex nickel coatings
US2885399A (en) * 1957-03-04 1959-05-05 Univ Ohio State Res Found Hydrazinium hexafluorophosphate salts
DE1152863B (en) * 1957-03-16 1963-08-14 Riedel & Co Acid baths for the production of leveling copper coatings

Also Published As

Publication number Publication date
DE1421977B2 (en) 1970-02-19
BE621297A (en)
US3257294A (en) 1966-06-21
GB941823A (en) 1963-11-13
DE1224111B (en) 1966-09-01
CH429356A (en) 1967-01-31
US3245886A (en) 1966-04-12
DE1421977A1 (en) 1968-11-07
NL281922A (en)

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