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GB0019966D0 - A method of manufacturing an integrated circuit and an integrated circuit - Google Patents

A method of manufacturing an integrated circuit and an integrated circuit

Info

Publication number
GB0019966D0
GB0019966D0 GBGB0019966.1A GB0019966A GB0019966D0 GB 0019966 D0 GB0019966 D0 GB 0019966D0 GB 0019966 A GB0019966 A GB 0019966A GB 0019966 D0 GB0019966 D0 GB 0019966D0
Authority
GB
United Kingdom
Prior art keywords
integrated circuit
manufacturing
integrated
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GBGB0019966.1A
Other versions
GB2358285A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nokia of America Corp
Original Assignee
Lucent Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lucent Technologies Inc filed Critical Lucent Technologies Inc
Publication of GB0019966D0 publication Critical patent/GB0019966D0/en
Publication of GB2358285A publication Critical patent/GB2358285A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H10W20/071—
    • H10P14/40—
    • H10W20/074—
GB0019966A 1999-08-30 2000-08-14 Interlevel dielectrics Withdrawn GB2358285A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US38528599A 1999-08-30 1999-08-30

Publications (2)

Publication Number Publication Date
GB0019966D0 true GB0019966D0 (en) 2000-09-27
GB2358285A GB2358285A (en) 2001-07-18

Family

ID=23520781

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0019966A Withdrawn GB2358285A (en) 1999-08-30 2000-08-14 Interlevel dielectrics

Country Status (3)

Country Link
JP (1) JP2001102454A (en)
KR (1) KR20010021456A (en)
GB (1) GB2358285A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100703971B1 (en) * 2005-06-08 2007-04-06 삼성전자주식회사 Semiconductor integrated circuit device and manufacturing method thereof
JP6589277B2 (en) 2015-01-14 2019-10-16 富士電機株式会社 HIGH VOLTAGE PASSIVE DEVICE AND METHOD FOR MANUFACTURING HIGH VOLTAGE PASSIVE DEVICE

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3688726B2 (en) * 1992-07-17 2005-08-31 株式会社東芝 Manufacturing method of semiconductor device
US6114186A (en) * 1996-07-30 2000-09-05 Texas Instruments Incorporated Hydrogen silsesquioxane thin films for low capacitance structures in integrated circuits
KR19980064176A (en) * 1996-12-17 1998-10-07 윌리엄비.켐플러 Integrated circuit dielectric
JP3226816B2 (en) * 1996-12-25 2001-11-05 キヤノン販売株式会社 Method of forming interlayer insulating film, semiconductor device and method of manufacturing the same

Also Published As

Publication number Publication date
KR20010021456A (en) 2001-03-15
GB2358285A (en) 2001-07-18
JP2001102454A (en) 2001-04-13

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)