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FR2889841B1 - Structures d'emetteurs a effet de champ en nonobaguettes a portes et procedes de fabrication correspondants - Google Patents

Structures d'emetteurs a effet de champ en nonobaguettes a portes et procedes de fabrication correspondants

Info

Publication number
FR2889841B1
FR2889841B1 FR0606563A FR0606563A FR2889841B1 FR 2889841 B1 FR2889841 B1 FR 2889841B1 FR 0606563 A FR0606563 A FR 0606563A FR 0606563 A FR0606563 A FR 0606563A FR 2889841 B1 FR2889841 B1 FR 2889841B1
Authority
FR
France
Prior art keywords
nonobaguette
doors
methods
field effect
making same
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0606563A
Other languages
English (en)
Other versions
FR2889841A1 (fr
Inventor
Heather Diane Hudspeth
Reed Roeder Corderman
Renee Bushey Rohling
Lauraine Denault
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
General Electric Co
Original Assignee
General Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by General Electric Co filed Critical General Electric Co
Publication of FR2889841A1 publication Critical patent/FR2889841A1/fr
Application granted granted Critical
Publication of FR2889841B1 publication Critical patent/FR2889841B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/304—Field-emissive cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
    • H01J1/02—Main electrodes
    • H01J1/30—Cold cathodes, e.g. field-emissive cathode
    • H01J1/304—Field-emissive cathodes
    • H01J1/3042—Field-emissive cathodes microengineered, e.g. Spindt-type
    • H01J1/3044—Point emitters
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Cold Cathode And The Manufacture (AREA)
FR0606563A 2005-07-19 2006-07-19 Structures d'emetteurs a effet de champ en nonobaguettes a portes et procedes de fabrication correspondants Expired - Fee Related FR2889841B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/185,007 US7279085B2 (en) 2005-07-19 2005-07-19 Gated nanorod field emitter structures and associated methods of fabrication

Publications (2)

Publication Number Publication Date
FR2889841A1 FR2889841A1 (fr) 2007-02-23
FR2889841B1 true FR2889841B1 (fr) 2011-03-18

Family

ID=36955559

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0606563A Expired - Fee Related FR2889841B1 (fr) 2005-07-19 2006-07-19 Structures d'emetteurs a effet de champ en nonobaguettes a portes et procedes de fabrication correspondants

Country Status (3)

Country Link
US (2) US7279085B2 (fr)
FR (1) FR2889841B1 (fr)
GB (1) GB2428873B (fr)

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US20080182099A1 (en) * 2006-11-17 2008-07-31 Jennifer Hoyt Lalli Robust electrodes for shape memory films
US20090087348A1 (en) * 2007-02-16 2009-04-02 Richard Otto Claus Sensor applications
US20080213570A1 (en) * 2007-02-16 2008-09-04 Jennifer Hoyt Lalli Self-assembled conductive deformable films
US20080261044A1 (en) * 2003-02-10 2008-10-23 Jennifer Hoyt Lalli Rapidly self-assembled thin films and functional decals
US7871933B2 (en) * 2005-12-01 2011-01-18 International Business Machines Corporation Combined stepper and deposition tool
FR2900052B1 (fr) * 2006-04-19 2011-02-18 Galderma Sa Composition comprenant au moins une phase aqueuse et au moins une phase grasse comprenant de l'ivermectine
KR100791790B1 (ko) * 2006-05-30 2008-01-03 고려대학교 산학협력단 육각형의 나노 판상 다이아몬드 형성방법
US7667260B2 (en) * 2006-08-09 2010-02-23 Micron Technology, Inc. Nanoscale floating gate and methods of formation
SG140485A1 (en) * 2006-08-24 2008-03-28 Sony Corp An electron emitter and a display apparatus utilising the same
US20080206550A1 (en) * 2007-02-26 2008-08-28 Michael Jeremiah Borlner Hydrophobic surface
US20090035513A1 (en) * 2007-03-28 2009-02-05 Michael Jeremiah Bortner Tethered nanorods
US20080245413A1 (en) * 2007-04-04 2008-10-09 Hang Ruan Self assembled photovoltaic devices
US20080296616A1 (en) * 2007-06-04 2008-12-04 Sharp Laboratories Of America, Inc. Gallium nitride-on-silicon nanoscale patterned interface
DE102007034222A1 (de) * 2007-07-23 2009-01-29 Siemens Ag Röntgenröhre mit einer Feldemissionskathode
US8027145B2 (en) * 2007-07-30 2011-09-27 Taiyo Yuden Co., Ltd Capacitor element and method of manufacturing capacitor element
US8445383B2 (en) * 2007-09-05 2013-05-21 The United States Of America, As Represented By The Secretary Of The Navy Transparent nanocrystalline diamond contacts to wide bandgap semiconductor devices
WO2009039298A2 (fr) * 2007-09-18 2009-03-26 University Of Florida Research Foundation, Inc. Détecteurs utilisant des transistors à mobilité électronique élevée à base d'algan/gan
JP4493686B2 (ja) 2007-09-27 2010-06-30 太陽誘電株式会社 コンデンサ及びその製造方法
US20090104434A1 (en) * 2007-10-17 2009-04-23 Jennifer Hoyt Lalli Conformal multifunctional coatings
US20090104438A1 (en) * 2007-10-17 2009-04-23 Jennifer Hoyt Lalli Abrasion resistant coatings
KR101301080B1 (ko) * 2008-03-17 2013-09-03 삼성전자주식회사 삼극 전계방출소자의 제조방법
TWI397722B (zh) * 2008-12-31 2013-06-01 Yeukuang Hwu 光學元件的製造方法
US8278191B2 (en) * 2009-03-31 2012-10-02 Georgia Tech Research Corporation Methods and systems for metal-assisted chemical etching of substrates
US8536564B1 (en) * 2011-09-28 2013-09-17 Sandia Corporation Integrated field emission array for ion desorption
US9058954B2 (en) 2012-02-20 2015-06-16 Georgia Tech Research Corporation Carbon nanotube field emission devices and methods of making same
CN103854935B (zh) * 2012-12-06 2016-09-07 清华大学 场发射阴极装置及场发射器件
US8866068B2 (en) 2012-12-27 2014-10-21 Schlumberger Technology Corporation Ion source with cathode having an array of nano-sized projections
US9695515B2 (en) * 2013-08-30 2017-07-04 Hewlett-Packard Development Company, L.P. Substrate etch
US11145431B2 (en) * 2016-08-16 2021-10-12 Massachusetts Institute Of Technology System and method for nanoscale X-ray imaging of biological specimen
US11152130B2 (en) * 2016-08-16 2021-10-19 Massachusetts Institute Of Technology Nanoscale X-ray tomosynthesis for rapid analysis of integrated circuit (IC) dies
US10739299B2 (en) * 2017-03-14 2020-08-11 Roche Sequencing Solutions, Inc. Nanopore well structures and methods
EP3435400A1 (fr) * 2017-07-28 2019-01-30 Evince Technology Ltd Dispositif pour commander le écoulement d'électrons et procédé de fabrication dudit dispositif
US11437218B2 (en) 2019-11-14 2022-09-06 Massachusetts Institute Of Technology Apparatus and method for nanoscale X-ray imaging

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US3755704A (en) 1970-02-06 1973-08-28 Stanford Research Inst Field emission cathode structures and devices utilizing such structures
US3812559A (en) 1970-07-13 1974-05-28 Stanford Research Inst Methods of producing field ionizer and field emission cathode structures
US3665241A (en) 1970-07-13 1972-05-23 Stanford Research Inst Field ionizer and field emission cathode structures and methods of production
US5266530A (en) 1991-11-08 1993-11-30 Bell Communications Research, Inc. Self-aligned gated electron field emitter
US5229331A (en) 1992-02-14 1993-07-20 Micron Technology, Inc. Method to form self-aligned gate structures around cold cathode emitter tips using chemical mechanical polishing technology
JP3740295B2 (ja) * 1997-10-30 2006-02-01 キヤノン株式会社 カーボンナノチューブデバイス、その製造方法及び電子放出素子
US6710539B2 (en) 1998-09-02 2004-03-23 Micron Technology, Inc. Field emission devices having structure for reduced emitter tip to gate spacing
US6391670B1 (en) 1999-04-29 2002-05-21 Micron Technology, Inc. Method of forming a self-aligned field extraction grid
JP3600126B2 (ja) 1999-07-29 2004-12-08 シャープ株式会社 電子源アレイ及び電子源アレイの駆動方法
JP2001101977A (ja) * 1999-09-30 2001-04-13 Toshiba Corp 真空マイクロ素子
US6290564B1 (en) 1999-09-30 2001-09-18 Motorola, Inc. Method for fabricating an electron-emissive film
KR100480773B1 (ko) 2000-01-07 2005-04-06 삼성에스디아이 주식회사 카본 나노 튜브를 이용한 3극 전계방출소자의 제작방법
JP3502082B2 (ja) 2000-02-25 2004-03-02 シャープ株式会社 電子源およびその製造方法、並びに、表示装置
US7554255B2 (en) 2002-07-30 2009-06-30 Postech Foundation Electric field emission device having a triode structure fabricated by using an anodic oxidation process and method for fabricating same
KR100576733B1 (ko) 2003-01-15 2006-05-03 학교법인 포항공과대학교 일체형 3극구조 전계방출디스플레이 및 그 제조 방법
US7239076B2 (en) 2003-09-25 2007-07-03 General Electric Company Self-aligned gated rod field emission device and associated method of fabrication
US20050112048A1 (en) 2003-11-25 2005-05-26 Loucas Tsakalakos Elongated nano-structures and related devices
US7459839B2 (en) 2003-12-05 2008-12-02 Zhidan Li Tolt Low voltage electron source with self aligned gate apertures, and luminous display using the electron source
US7326328B2 (en) * 2005-07-19 2008-02-05 General Electric Company Gated nanorod field emitter structures and associated methods of fabrication

Also Published As

Publication number Publication date
US7279085B2 (en) 2007-10-09
US20070085459A1 (en) 2007-04-19
GB0613898D0 (en) 2006-08-23
US7411341B2 (en) 2008-08-12
FR2889841A1 (fr) 2007-02-23
GB2428873B (en) 2011-04-27
US20070273263A1 (en) 2007-11-29
GB2428873A (en) 2007-02-07

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