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FI20105904A0 - Suutinpää - Google Patents

Suutinpää

Info

Publication number
FI20105904A0
FI20105904A0 FI20105904A FI20105904A FI20105904A0 FI 20105904 A0 FI20105904 A0 FI 20105904A0 FI 20105904 A FI20105904 A FI 20105904A FI 20105904 A FI20105904 A FI 20105904A FI 20105904 A0 FI20105904 A0 FI 20105904A0
Authority
FI
Finland
Prior art keywords
spray head
spray
head
Prior art date
Application number
FI20105904A
Other languages
English (en)
Finnish (fi)
Swedish (sv)
Inventor
Pekka Soininen
Olli Pekonen
Original Assignee
Beneq Oy
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beneq Oy filed Critical Beneq Oy
Priority to FI20105904A priority Critical patent/FI20105904A0/fi
Publication of FI20105904A0 publication Critical patent/FI20105904A0/fi
Priority to PCT/FI2011/050742 priority patent/WO2012028775A1/fr
Priority to CN201180041766.9A priority patent/CN103080375B/zh
Priority to TW100130648A priority patent/TW201210701A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45523—Pulsed gas flow or change of composition over time
    • C23C16/45525—Atomic layer deposition [ALD]
    • C23C16/45544—Atomic layer deposition [ALD] characterized by the apparatus
    • C23C16/45548—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction
    • C23C16/45551—Atomic layer deposition [ALD] characterized by the apparatus having arrangements for gas injection at different locations of the reactor for each ALD half-reaction for relative movement of the substrate and the gas injectors or half-reaction reactor compartments
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45574—Nozzles for more than one gas

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
FI20105904A 2010-08-30 2010-08-30 Suutinpää FI20105904A0 (fi)

Priority Applications (4)

Application Number Priority Date Filing Date Title
FI20105904A FI20105904A0 (fi) 2010-08-30 2010-08-30 Suutinpää
PCT/FI2011/050742 WO2012028775A1 (fr) 2010-08-30 2011-08-25 Tête de tuyère
CN201180041766.9A CN103080375B (zh) 2010-08-30 2011-08-25 喷嘴头
TW100130648A TW201210701A (en) 2010-08-30 2011-08-26 Nozzle head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FI20105904A FI20105904A0 (fi) 2010-08-30 2010-08-30 Suutinpää

Publications (1)

Publication Number Publication Date
FI20105904A0 true FI20105904A0 (fi) 2010-08-30

Family

ID=42669408

Family Applications (1)

Application Number Title Priority Date Filing Date
FI20105904A FI20105904A0 (fi) 2010-08-30 2010-08-30 Suutinpää

Country Status (4)

Country Link
CN (1) CN103080375B (fr)
FI (1) FI20105904A0 (fr)
TW (1) TW201210701A (fr)
WO (1) WO2012028775A1 (fr)

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02114530A (ja) * 1988-10-25 1990-04-26 Mitsubishi Electric Corp 薄膜形成装置
US6972055B2 (en) * 2003-03-28 2005-12-06 Finens Corporation Continuous flow deposition system
US7601223B2 (en) * 2003-04-29 2009-10-13 Asm International N.V. Showerhead assembly and ALD methods
US7537662B2 (en) * 2003-04-29 2009-05-26 Asm International N.V. Method and apparatus for depositing thin films on a surface
US8207063B2 (en) * 2007-01-26 2012-06-26 Eastman Kodak Company Process for atomic layer deposition
US8211231B2 (en) * 2007-09-26 2012-07-03 Eastman Kodak Company Delivery device for deposition
US8182608B2 (en) * 2007-09-26 2012-05-22 Eastman Kodak Company Deposition system for thin film formation
KR101431197B1 (ko) * 2008-01-24 2014-09-17 삼성전자주식회사 원자층 증착설비 및 그의 원자층 증착방법

Also Published As

Publication number Publication date
CN103080375A (zh) 2013-05-01
WO2012028775A1 (fr) 2012-03-08
TW201210701A (en) 2012-03-16
CN103080375B (zh) 2016-04-13

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Legal Events

Date Code Title Description
FD Application lapsed