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ES339145A1 - A METHOD OF MAKING AN ELECTRICAL RESISTANCE. - Google Patents

A METHOD OF MAKING AN ELECTRICAL RESISTANCE.

Info

Publication number
ES339145A1
ES339145A1 ES339145A ES339145A ES339145A1 ES 339145 A1 ES339145 A1 ES 339145A1 ES 339145 A ES339145 A ES 339145A ES 339145 A ES339145 A ES 339145A ES 339145 A1 ES339145 A1 ES 339145A1
Authority
ES
Spain
Prior art keywords
type
region
layer
type layer
diffused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
ES339145A
Other languages
Spanish (es)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Radio Corporation of America
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp, Radio Corporation of America filed Critical RCA Corp
Publication of ES339145A1 publication Critical patent/ES339145A1/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/40Resistors
    • H10D1/43Resistors having PN junctions

Landscapes

  • Semiconductor Integrated Circuits (AREA)

Abstract

A resistor comprises a single crystal of semiconductor material, e.g. silicon, the surface layer of which is of one type conductivity, a first region 121 of opposite type conductivity and spaced contacts 18, and a second region 16 of said one type conductivity partially within the first region but extending only partially through the thickness of the first region. For use in integrated circuits, a crystal of silicon 2 is provided with N + and N type layers 4 and 6. P type impurity is diffused into the floating portion 8 of layer 6 to a depth of approximately 2.4 microns. Following this, another N+ type layer 16 is diffused into this P + type layer such that a narrow band 121 of the P+ type layer forms the effective resistance element between evaporated metal terminals 18. Examples described use boron from decomposition of boron tri-bromide for the P+ type layer and phosphorus from the decomposition of phosphorus oxy-chloride for the N + type layer. Transistors may be made simultaneously.
ES339145A 1966-04-13 1967-04-11 A METHOD OF MAKING AN ELECTRICAL RESISTANCE. Expired ES339145A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US54231166A 1966-04-13 1966-04-13

Publications (1)

Publication Number Publication Date
ES339145A1 true ES339145A1 (en) 1968-07-01

Family

ID=24163258

Family Applications (1)

Application Number Title Priority Date Filing Date
ES339145A Expired ES339145A1 (en) 1966-04-13 1967-04-11 A METHOD OF MAKING AN ELECTRICAL RESISTANCE.

Country Status (7)

Country Link
BR (1) BR6788425D0 (en)
DE (1) DE1665476B2 (en)
ES (1) ES339145A1 (en)
FR (1) FR1534711A (en)
GB (1) GB1179876A (en)
MY (1) MY7300270A (en)
NL (1) NL6705231A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55112864U (en) 1979-02-02 1980-08-08
JPH03190281A (en) * 1989-12-18 1991-08-20 Honeywell Inc Semiconductor device and piezoresistance type transducer and forming method thereof

Also Published As

Publication number Publication date
DE1665476B2 (en) 1974-05-22
BR6788425D0 (en) 1973-05-17
NL6705231A (en) 1967-10-16
FR1534711A (en) 1968-08-02
GB1179876A (en) 1970-02-04
DE1665476A1 (en) 1971-09-23
MY7300270A (en) 1973-12-31

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