[go: up one dir, main page]

EP2311061B1 - Elektronenzyklotronresonanzionengenerator - Google Patents

Elektronenzyklotronresonanzionengenerator Download PDF

Info

Publication number
EP2311061B1
EP2311061B1 EP09772718.4A EP09772718A EP2311061B1 EP 2311061 B1 EP2311061 B1 EP 2311061B1 EP 09772718 A EP09772718 A EP 09772718A EP 2311061 B1 EP2311061 B1 EP 2311061B1
Authority
EP
European Patent Office
Prior art keywords
zone
magnetic field
stage
ionisation
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Not-in-force
Application number
EP09772718.4A
Other languages
English (en)
French (fr)
Other versions
EP2311061A2 (de
Inventor
Jean-Yves Pacquet
Gabriel Gaubert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Centre National de la Recherche Scientifique CNRS
Commissariat a lEnergie Atomique CEA
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Centre National de la Recherche Scientifique CNRS, Commissariat a lEnergie Atomique CEA, Commissariat a lEnergie Atomique et aux Energies Alternatives CEA filed Critical Centre National de la Recherche Scientifique CNRS
Publication of EP2311061A2 publication Critical patent/EP2311061A2/de
Application granted granted Critical
Publication of EP2311061B1 publication Critical patent/EP2311061B1/de
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
    • H05H3/02—Molecular or atomic-beam generation, e.g. resonant beam generation

Definitions

  • the present invention relates to an electron cyclotron resonance ion generating device.
  • ECR sources electron cyclotron resonance sources, referred to as ECR sources, are commonly used to produce single-charged or multicharged ions (that is to say atoms to which one or more electrons have been torn off).
  • ECR sources The principle of these ECR sources is to couple, inside a vacuum chamber fed with atoms (these atoms can come from a gas or a metal), a high-frequency wave with a magnetic field B, in order to obtain the conditions under which a cyclotron resonance is likely to appear and to ionize the atoms present, thus generating a plasma.
  • the residual pressure prevailing in the vacuum chamber is of the order of 10 -6 to 10 -1 Pa.
  • the chamber containing the plasma has a symmetry of revolution with respect to a longitudinal axis.
  • the magnetic field is produced by means external to the vacuum chamber. These means may consist of a set of coils with an electric current or a set of permanent magnets. The coils used, if they consist of superconducting materials, must be cooled to a specified temperature by a suitable cryogenic system.
  • the cyclotron resonance is obtained thanks to the combined action of the high frequency wave injected into the enclosure, and a magnetic field having a so-called "minimum B" structure.
  • An ion extraction system located on the side of the chamber opposite to that of the injection of the high frequency, or disposed laterally with respect to the axis of the source facing the plasma is also provided.
  • the quantity of ions that can be produced results from the competition between two processes: on the one hand the formation of ions by electronic impact on neutral atoms constituting the gaseous medium to be ionized, and on the other hand, the losses of these same ions by recombination with the neutral or charged particles present in the plasma volume or by diffusion of the neutral atoms to the walls of the chamber.
  • the superposition of the radial magnetic field and the axial magnetic field leads to the formation of closed magnetic field equimodule surfaces having no contact with the walls of the enclosure.
  • the total magnetic field is adjusted so that there is at least one completely closed magnetic surface on which the electronic cyclotron resonance condition (1) is satisfied.
  • the patent application FR 2668642 A discloses a highly charged ion source with polarizable probe and electron cyclotron resonance, said source having improved compactness.
  • the patent EP946961 filed by the applicant describes an ECR source using a magnetic field symmetry of revolution.
  • This source comprises magnetic means whose vector sum of the fields created by these magnetic means makes it possible to define at least one closed line of minima of the module B of the vector sum, within one or more internal volume (s) ( s) to the cavity and delimited by surfaces of equimodule Bf of the magnetic field closed in space.
  • the closed module surface B f encompasses an interior volume where the magnetic field may, in particular, have a very low minimum B, unlike what occurred in previously known ECR sources.
  • the electron density of the ECR source plasmas is between 10 9 and 10 12 electrons per cm 3 .
  • the neutral particles are injected into the volume of the vacuum chamber containing the plasma. If they are not ionized during their first journey within the plasma, they stick on the walls of the room. Their bonding time depends on the chemical species to which they belong. This time can be very important for particles whose physico-chemical properties allow a reaction with the walls. Their probability of ionization therefore depends directly on the ionization capacity of the plasma.
  • the condensable elements Pb, Ge for example
  • Mendeleev's periodic table it is not the same for the condensable elements (Pb, Ge for example) of Mendeleev's periodic table.
  • the latter if they are not ionized at the first passage in the plasma, are stuck to the walls as soon as they reach them and can only come off if the temperature of the wall is sufficient for the element in question.
  • conventional ECR ion sources with cold walls lead to low total ionization efficiencies as atoms that are not ionized at their first pass through the plasma condense on the walls of the chamber and are lost for beam production.
  • the ionization efficiencies for the condensable elements are from a few to a thousand, for a wave frequency of 2.45 GHz up to 20% for a wave frequency of 15 Ghz.
  • the ionization efficiency is obviously higher than for the condensable elements; however, in parallel, the total transformation time of the neutral particles increases, this time being related to both the different rebounds and the take-off time of the particles.
  • the object of the present invention is to provide an electronic cyclotron resonance ion generating device which makes it possible to increase the direct ionization capacity before any bounce on the walls of the vacuum chamber.
  • Magnetic field having a symmetry of revolution with respect to the longitudinal axis is understood to mean a magnetic field whose radial and axial components are symmetrical irrespective of the points situated on a circle about said axis.
  • the device according to the invention has a magnetic field with symmetry of revolution defining the volume of a plasma contained in a chamber comprising two distinct zones or stages.
  • the ions are essentially created in the first zone while the second zone ensures the confinement of the ions according to the principle of the electron cyclotron resonance source.
  • the directions of the vectors of the magnetic field are parallel to the axis common to the two stages, namely the longitudinal axis of the chamber: there is thus between these two zones a purely axial magnetic field (no radial component magnetic field).
  • the two zones have no magnetic break and define a volume containing a single plasma, that is to say a single set composed of ions, electrons, atoms and molecules, globally electrically neutral (ie with as many positive charges as negative charges).
  • a single plasma that is to say a single set composed of ions, electrons, atoms and molecules, globally electrically neutral (ie with as many positive charges as negative charges).
  • coaxial magnetic field vectors between the two stages implies implicitly that the magnetic field is symmetrical of revolution and requires the migration of ions from the first zone to the second zone.
  • the ionization efficiency of a particle depends on the means used to achieve this ionization.
  • the ionized particles migrate to the second ECR stage in which they are confined or even multicharged; it should be noted in this respect that the second stage can maintain or increase the state of charge of the ions coming from the first stage.
  • the ions confined by the second stage can then be used in the form of a single or multicharged particle beam.
  • the beam thus produced will have the characteristics given by a RCE type source with symmetry of revolution as described in the patent. EP946961 of the plaintiff.
  • the device according to the invention makes it possible to increase the probability of ionizing them before they have changed state by reducing the time required for the transformation process.
  • the parallelism between said magnetic field and the longitudinal axis is determined by the Larmor radius of the ion of interest (radius of gyration of the ion around the field lines).
  • the radius of gyration increases with the mass of the ions of interest. Since, according to the invention, the ionized particles in the ionization zone must migrate towards the confinement zone, the requirement of parallelism of the magnetic field with the axis will depend on the Larmor radius of this ion.
  • the figure 1 is a simplified schematic representation of a device 1 according to a first embodiment of the invention. It will be noted that certain mechanical elements represented on the figure 2 are not represented on the schematic diagram of the figure 1 for a better understanding of this figure.
  • the figure 2 is a three-dimensional view of the mechanical configuration of the device of the figure 1 (for a better understanding of the device 1, the figure 2 represents a section along a vertical plane passing through the longitudinal axis of the device 1).
  • the permanent magnets 3, 4 and 5 may be monoblock magnets or magnets composed of several sectors mounted with a magnetization in the same direction.
  • the figure 1 also includes a map of the intensity of the modules, equimodules and vectors of the electromagnetic field prevailing in the device 1 according to the invention.
  • the intensity of the modulus of the magnetic field is represented by dashed lines: the modulus prevailing in the chamber 2 is all the more intense as the dotted lines are dense.
  • the ionization zone 10 is here an ECR zone (it should be noted that the injection systems of the ions and of the high frequency wave are not represented on the figure 1 ).
  • This ECR zone 10 is here typically a high density zone with a resonance zone operating at 15 GHz (value given purely for guidance for a waveguide for conveying a frequency wave between 8 GHz and 18 GHz). It will be noted that this zone only ensures the ionization of the injected neutral particles and not the confinement of these same ionized particles.
  • This resonance frequency at 15 GHz implies the presence of a magnetic field with a modulus of about 5,300 G to ensure the resonance phenomenon that will allow effective ionization of the neutral particles (obtaining single-charged and multicharged ions).
  • the configuration of the magnetic field of the first stage is ensured by the magnets 3 and 4 as well as by the soft iron conical element 6.
  • the soft iron conical element makes it possible to locally increase the value of the magnetic field module so to obtain the resonance magnetic field at the ionization zone 10.
  • the high frequency wave at 15 GHz is transmitted via a waveguide 13 so that the high frequency wave at 15 GHz is injected at the resonance zone 10.
  • the device 1 also comprises a tube 14 in which a micro-furnace (not shown) is inserted: this micro-furnace makes it possible, by heating a compound to be ionized, to a vapor pressure sufficient to produce condensable elements of the periodic table of Mendeleyev. (Pb for example).
  • the micro-oven is also substantially placed along the longitudinal axis AA 'and must be very close to the resonance zone 10 without however entering this zone.
  • the micro-oven can be placed 2 mm recessed (see location illustrated by the reference 15) of the end of the waveguide 13: this oven is for example charged with 208 Pb.
  • the ionization of a condensable element is a fundamental criterion for qualifying the device according to the invention since the non-ionized condensable elements at first pass through the known devices are glued to the walls as soon as they reach them and can only come off if the temperature of the wall is sufficient for the element under consideration.
  • the ions produced by the first stage 7 at the level of the ionization zone 10 are taken up by the magnetic field substantially parallel to the longitudinal axis AA '(ie the radial component of the magnetic field is substantially zero) both in the ionization zone 10 and then between the ionization zone 10 and the inlet of the second confinement stage so that the ions generated in said ionization zone migrate spontaneously by winding around the field lines to said second stage of containment 8 (note that all ions, mono and multicharged, is supported and migrates to the second stage 8). It will also be noted that the fact of imposing a substantially collinear magnetic field on the axis AA 'implies in fact having a magnetic field with symmetry of revolution.
  • the parallelism between the magnetic field and the longitudinal axis AA ' is determined by the Larmor radius of the ion of interest.
  • the radius of Larmor increases with the mass of the ions of interest (the radius of gyration of the Ar is thus lower than the radius of gyration of the Pb, heavier than the Ar). Since, according to the invention, the ionized particles in the ionization zone 10 must migrate towards the second confinement stage 8, the requirement of parallelism of the magnetic field with the axis will depend on the Larmor radius of this ion .
  • the two permanent magnets 4 and 5 serve to generate the magnetic field with symmetry of revolution.
  • the second stage 8 therefore forms a magnetic confinement zone RCE: the magnets 4 and 5 are chosen so that the vector sum of the magnetic fields created at each point of the second stage 8 leads to obtaining a closed line profile of minimal
  • the reference 16 on the figure 1 designates a surface of equimodule
  • the maximum operating frequency of the second stage 8 is defined by the closed area 16 of maximum field module
  • the confinement stage RCE typically operates with a corresponding frequency wave of 2.45 GHz at the closed line 11 shown on the figure 1 (corresponding to a magnetic field module approximately equal to 870 G).
  • the high frequency wave at 2.45 GHz is injected via a not shown waveguide inserted in the tubing 18.
  • the ions coming from the ionization zone 10 belonging to the first stage 7 remain confined in the confinement zone 8 and are then extracted. in the so-called extraction zone 9.
  • the confinement zone RCE 8 not only makes it possible to ensure the confinement function of the charged ions during their passage in the ionization zone 10 but also, according to the desired objectives, maintain or increase the state of charge of the ions from the first stage.
  • the second stage can also allow the creation of monocharged ions (in particular in the case of the recombination of certain atoms within the confinement zone 8).
  • the ion extraction zone 9 is located at the end opposite to that in which the first ionization stage 7 is located, the magnetic field being substantially parallel to the longitudinal axis AA 'in this extraction zone 9: as soon as an electron leaves the confinement zone 8 (it preferentially leaves this zone in the extraction zone 9 in which the magnetic field is coaxial with the longitudinal axis of symmetry AA '), there is an ion which will follow the electron and leave the containment zone so as to respect the neutrality of the plasma.
  • first and second stages 7 and 8 comprise one and the same continuous plasma.
  • This carrier gas is preferably a gas whose atoms are of lower mass than those for obtaining the ions of interest. So, in the case of the ionization of 208 Pb, it is possible to use a carrier gas, for example He.
  • the waveguide system 13 and the injection system of the neutral elements 14 are connected perfectly tightly to the chamber 2 by means of appropriate joints not shown.
  • the injection of the neutral elements into the ionization zone has been more particularly described in the case of the use of a micro-furnace for condensable elements; obviously, the invention is also applicable to other known sources of production of neutral elements (gas bottle for example).
  • the figure 3 clearly shows a gain in the ionization efficiency according to whether or not the first stage is in operation.
  • a gain ratio of ion currents between the spectrum with operation of the first stage and the non-functioning spectrum of the first stage
  • a gain is observed equal to 3.1 for the 208 Pb 3+ ion and 2.7 for the 208 Pb ion. 2+ .
  • the figure 4 shows the evolution of intensities of 208 Pb with the variation of the power of the micro-furnace.
  • a direct gain in total intensity of 208 Pb (in particles) ranging from a gain of 1.4 (for a micro-oven power of 3.36 W) to 2.2 (for a micro-oven power of 5.37W) .
  • FIG. 5 illustrates a simplified schematic representation of a device 100 according to a second embodiment of the invention including a module intensities map, equimodules and vectors of the electromagnetic field prevailing in the device according to the invention
  • the figure 5 also includes a map of the intensity of the modules, equimodules and vectors of the electromagnetic field prevailing in the device 100 according to the invention.
  • the intensity of the modulus of the magnetic field is represented by dotted lines: the modulus prevailing in the chamber 102 is all the more intense as the dotted lines are dense.
  • the ionization zone 110 here is an ECR zone with a higher frequency than the ECR zone of the figure 1
  • This RCE zone 110 is here typically a high density zone with a resonance zone operating at 29 GHz. As for the figure 1 this zone only ensures the ionization of the injected neutral particles and not the confinement of these same ionized particles.
  • This resonant frequency at 29 GHz implies the presence of a very high magnetic field to ensure the resonance phenomenon that will allow effective ionization of neutral particles (obtaining single-charged and multicharged ions).
  • the soft iron cone element 106 makes it possible to locally increase the value of the magnetic field module so as to obtain the resonance magnetic field at the ionization zone 110.
  • the device 100 of the figure 5 is identical to device 1 of the figure 1 and works in a similar way.
  • Figures 6 and 7 illustrate a simplified schematic representation of device 200 and 300 respectively according to a third and a fourth embodiment of the invention including a module intensities map, equimodules and vectors of the electromagnetic field prevailing in the device according to the invention .
  • the devices 200 and 300 are identical to the device 1 of the figure with the difference that the first ionization stage is not an RCE stage. We have kept the same references for the common elements with the device 1 of the figure 1 .
  • the device 200 of the figure 6 differs from device 1 of the figure 1 only in that the ionization source 201 is a surface ionization source, the ionization stage 207 of the device 200 therefore not being an ECR device.
  • the end of the source 201 is in the zone 10 forming the ionization zone of the device 200 in which the magnetic field is coaxial with the longitudinal axis AA 'of the chamber 2 of the device 200. It can be seen that the the permanent magnet 3 and the soft iron cone 6 have been preserved so as to obtain a concentration of the field module Magnetic at the ionization zone 10: this field concentration makes it possible to have ions with weaker Larmor rays and is particularly useful for heavy particles.
  • the device 300 of the figure 7 differs from device 1 of the figure 1 only in that the ionization source 301 is a source of laser excitation and ionization (one of the principles of which is that of a focused laser light beam which heats a target on a local scale; thermal expansion locally creates a shock wave which expels a "feather" plasma very hot and dense, another principle is a laser resonant ionization source for removing a peripheral electron), the ionization stage 307 of the device 300 is not a device RCE.
  • the end of the source 301 is in the zone 10 forming the ionization zone of the device 300 in which the magnetic field is coaxial with the longitudinal axis AA 'of the chamber 2 of the device 300. Again, it can be seen that that the permanent magnet 3 and the soft iron cone 6 have been preserved so as to obtain a concentration of the magnetic field module at the level of the ionization zone 10.

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)

Claims (13)

  1. Ionengeneratorvorrichtung (1, 100, 200, 300) mit zyklotronischer, elektronischer Resonanz, umfassend:
    - eine abgedichtete Kammer (2, 102) unter Vakuum, die dazu bestimmt ist, ein Plasma zu enthalten, wobei die genannte Kammer (2, 102) eine axiale Symmetrie gemäß einer Längsachse (AA') aufweist;
    - Mittel (3, 4, 5, 6, 101, 104, 105, 106) zum Erzeugen eines Magnetfeldes in der genannten Kammer (2, 102), wobei das genannte Magnetfeld eine Revolutionssymmetrie im Verhältnis zu der genannten Längsachse (AA') besitzt);
    - Verbreitungsmittel einer Hochfrequenzwelle im Innern der genannten Kammer (2, 102)
    wobei die genannte Vorrichtung (1, 100, 200, 300) dadurch gekennzeichnet ist, dass die genannte Kammer (2, 102) umfasst:
    - eine erste Ionisationsstufe (7, 107, 207, 307), die sich an einem Ende der genannten Kammer (2, 102) befindet, wobei die genannte erste Stufe einen Ionisationsbereich (10, 110) umfasst, in dem Ionen generiert sind, wobei das genannte Magnetfeld deutlich parallel zu der genannten Längsachse (AA') in dem genannten Ionisationsbereich (10, 110) ist,
    - eine zweite magnetische Einschlussstufe (8, 108) der genannten, in dem genannten Ionisationsbereich (10, 110) generierten Ionen, wobei die genannte zweite Stufe (8, 108) eine erste Hochfrequenzwelle verwendet, die sich in der genannten Kammer (2, 102) verbreitet, die aus den genannten Verbreitungsmitteln einer Hochfrequenzwelle entstammt,
    wobei das genannte Magnetfeld deutlich parallel zu der genannten Längsachse (AA') zwischen dem genannten Ionisationsbereich (10, 110) und der genannten zweiten Einschlussstufe (8, 108) derart ist, dass die in dem genannten Ionisationsbereich (10, 110) generierten Ionen zu der zweiten Einschlussstufe (8, 108) migrieren und dass die genannte erste und zweite Stufe (7, 107, 207, 307, 8, 108) ein und dasselbe kontinuierliche Plasma umfassen.
  2. Vorrichtung (1, 100) gemäß Anspruch 1, dadurch gekennzeichnet, dass die genannte erste Ionisationsstufe (7, 107) eine Ionenquelle mit zyklotronischer, elektronischer Resonanz ist.
  3. Vorrichtung (1) gemäß Anspruch 2, dadurch gekennzeichnet, dass sie eine Wellenführung (13) zum Einschießen einer zweiten Hochfrequenzwelle in dem genannten Ionisationsbereich (10) umfasst.
  4. Vorrichtung (1) gemäß einem der Ansprüche 2 oder 3, dadurch gekennzeichnet, dass sie ein Einschusssystem der zu ionisierenden Elemente umfasst, das in der Nähe des Resonanzbereichs angeordnet ist, welcher den genannten Ionisationsbereich (10) der genannten Ionenquelle mit zyklotronischer Resonanz bildet, wobei das genannte System außerhalb des genannten Resonanzbereichs bleibt.
  5. Vorrichtung (1) gemäß Anspruch 4, dadurch gekennzeichnet, dass das Einschusssystem ein Ofen ist, der den Dampf aus kondensierbaren, zu ionisierenden Elementen in den genannten Resonanzbereich einschießt.
  6. Vorrichtung (1) gemäß Anspruch 5, dadurch gekennzeichnet, dass der genannte Ofen derart angeordnet ist, dass er deutlich parallel zu der genannten Längsachse ist.
  7. Vorrichtung (200, 300) gemäß Anspruch 1, dadurch gekennzeichnet, dass die genannte erste Ionisationsstufe aus den folgenden Quellen ausgewählt ist:
    - Quelle mit Entladung,
    - Quelle mit Oberflächenionisation (207),
    - Quelle mit Thermo-Ionisation,
    - Laserquelle (307),
    - Feldionisationsquelle,
    - Ladungsaustauschquelle.
  8. Vorrichtung (1, 100, 200, 300) gemäß einem der voranstehenden Ansprüche, dadurch gekennzeichnet, dass sie Mittel (6, 106) zur lokalen Erhöhung des Moduls des Magnetfeldes in dem genannten Ionisationsbereich umfasst.
  9. Vorrichtung (1, 100, 200, 300) gemäß dem voranstehenden Anspruch, dadurch gekennzeichnet, dass die genannten Mittel (6, 106) zur lokalen Erhöhung des Moduls des Magnetfeldes durch einen Ring aus Weicheisen geformt sind.
  10. Vorrichtung (1) gemäß einem der voranstehenden Ansprüche, dadurch gekennzeichnet, dass die genannten Mittel zum Generieren eines Magnetfeldes in der genannten Kammer Dauermagnete (3, 4, 5) umfassen, deren Revolutionsachse deutlich mit der genannten Längsachse (AA') zusammenfällt.
  11. Vorrichtung (100) gemäß einem der voranstehenden Ansprüche, dadurch gekennzeichnet, dass die genannten Mittel zum Generieren eines Magnetfeldes in der genannten Kammer wenigstens eine Spule (101) umfassen, die durch einen Strom einer bestimmten Intensität durchquert wird.
  12. Vorrichtung (1, 100, 200, 300) gemäß einem der voranstehenden Ansprüche, dadurch gekennzeichnet, dass sie einen Extraktionsbereich (9, 109) der genannten Ionen umfasst, der an dem Ende lokalisiert ist, der dem entgegengesetzt ist, in dem sich die erste Ionisationsstufe befindet, wobei das genannte Magnetfeld deutlich parallel zu der genannten Längsachse (AA') in dem genannten Extraktionsbereich (9, 109) ist.
  13. Vorrichtung gemäß einem der voranstehenden Ansprüche, dadurch gekennzeichnet, dass die genannten Mittel zum Erzeugen eines Magnetfeldes in der genannten Kammer die Definition wenigstens einer geschlossenen Minimalinie des genannten Magnetfeldes im Innern eines oder mehrerer Volumen(s) im Innern der genannten Kammer, das / die durch im Raum geschlossene Äquimodulflächen des Magnetfeldes begrenzt ist / sind, in der genannten zweiten magnetischen Einschlussstufe zulassen.
EP09772718.4A 2008-07-02 2009-06-11 Elektronenzyklotronresonanzionengenerator Not-in-force EP2311061B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0854502A FR2933532B1 (fr) 2008-07-02 2008-07-02 Dispositif generateur d'ions a resonance cyclotronique electronique
PCT/FR2009/051104 WO2010001036A2 (fr) 2008-07-02 2009-06-11 Dispositif générateur d'ions à résonance cyclotronique électronique

Publications (2)

Publication Number Publication Date
EP2311061A2 EP2311061A2 (de) 2011-04-20
EP2311061B1 true EP2311061B1 (de) 2016-11-16

Family

ID=40342671

Family Applications (1)

Application Number Title Priority Date Filing Date
EP09772718.4A Not-in-force EP2311061B1 (de) 2008-07-02 2009-06-11 Elektronenzyklotronresonanzionengenerator

Country Status (5)

Country Link
US (1) US8760055B2 (de)
EP (1) EP2311061B1 (de)
JP (1) JP5715562B2 (de)
FR (1) FR2933532B1 (de)
WO (1) WO2010001036A2 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2969372B1 (fr) * 2010-12-21 2015-04-17 Commissariat Energie Atomique Dispositif d’ionisation a la resonance cyclotron electronique
FR2985292B1 (fr) * 2011-12-29 2014-01-24 Onera (Off Nat Aerospatiale) Propulseur plasmique et procede de generation d'une poussee propulsive plasmique

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2668642A1 (fr) * 1990-10-25 1992-04-30 Commissariat Energie Atomique Source d'ions fortement charges a sonde polarisable et a resonance cyclotronique electronique.

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59194407A (ja) * 1983-04-19 1984-11-05 Ulvac Corp 電子サイクロトロン共鳴形イオン源用磁石装置
FR2595868B1 (fr) * 1986-03-13 1988-05-13 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique a injection coaxiale d'ondes electromagnetiques
DE3905303C2 (de) * 1988-02-24 1996-07-04 Hitachi Ltd Vorrichtung zur Erzeugung eines Plasmas durch Mikrowellen
US4883968A (en) * 1988-06-03 1989-11-28 Eaton Corporation Electron cyclotron resonance ion source
JP3010059B2 (ja) * 1990-09-20 2000-02-14 日本真空技術株式会社 イオン源
JPH04262349A (ja) * 1991-02-15 1992-09-17 Kobe Steel Ltd 多価重イオン源および１価重イオン源
FR2676593B1 (fr) * 1991-05-14 1997-01-03 Commissariat Energie Atomique Source d'ions a resonance cyclotronique electronique.
JPH069041U (ja) * 1992-07-07 1994-02-04 日新電機株式会社 イオン源
JP2644958B2 (ja) * 1993-04-02 1997-08-25 株式会社日立製作所 イオン源装置およびそのイオン源装置を備えたイオン打ち込み装置
FR2718568B1 (fr) * 1994-04-06 1996-07-05 France Telecom Procédé d'implantation haute énergie à partir d'un implanteur de type faible ou moyen courant et dispositifs correspondants.
FR2757310B1 (fr) 1996-12-18 2006-06-02 Commissariat Energie Atomique Systeme magnetique, en particulier pour les sources ecr, permettant la creation de surfaces fermees d'equimodule b de forme et de dimensions quelconques
JP4249826B2 (ja) * 1998-12-02 2009-04-08 株式会社 Ｓｅｎ−Ｓｈｉ・アクセリス カンパニー Ｅｃｒ用多極永久磁石装置
FR2815954B1 (fr) * 2000-10-27 2003-02-21 Commissariat Energie Atomique Procede et dispositif de depot par plasma a la resonance cyclotron electronique de nanotubes de carbone monoparois et nanotubes ainsi obtenus

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2668642A1 (fr) * 1990-10-25 1992-04-30 Commissariat Energie Atomique Source d'ions fortement charges a sonde polarisable et a resonance cyclotronique electronique.

Also Published As

Publication number Publication date
JP2011526724A (ja) 2011-10-13
WO2010001036A3 (fr) 2010-02-25
FR2933532B1 (fr) 2010-09-03
FR2933532A1 (fr) 2010-01-08
JP5715562B2 (ja) 2015-05-07
EP2311061A2 (de) 2011-04-20
US8760055B2 (en) 2014-06-24
US20110210668A1 (en) 2011-09-01
WO2010001036A2 (fr) 2010-01-07

Similar Documents

Publication Publication Date Title
EP1488443B1 (de) Vorrichtung zur begrenzung eines plasmas in einem volumen
EP3344873B1 (de) Gitter-ionenantrieb mit integriertem festtreibstoff
EP0238397B1 (de) Elektronenzyklotronresonanz-Ionenquelle mit koaxialer Injektion elektromagnetischer Wellen
FR2985292A1 (fr) Propulseur plasmique et procede de generation d'une poussee propulsive plasmique
EP0711100B1 (de) Plasmaerzeugungsvorrichtung, ermöglichend eine Trennung zwischen Mikrowellenübertragung und -absorptionszonen
EP0145586B1 (de) Quelle von mehrfachgeladenen Ionen mit mehreren Elektronzyclotronresonanz-Zonen
EP2873306B1 (de) Koaxialer mikrowellenapplikator zur plasmaerzeugung
EP0184475B1 (de) Verfahren und Vorrichtung zum Starten einer Mikrowellenionenquelle
EP0199625B1 (de) Elektronzyklotronresonanzquelle negativer Ionen
EP2311061B1 (de) Elektronenzyklotronresonanzionengenerator
EP2652766B1 (de) Elektron-zyklotron-resonanzionenquelle
EP0946961B1 (de) Magnetische vorrichtung, insbesondere fuer elektronzyklotronresonanzionenquellen, die die erzeugung geschlossener oberflaechen mit konstanter magnetfeldstaerke b und beliebiger groesse ermoeglichen
EP0483004B1 (de) Quelle starkgeladener Ionen mit polarisierbarer Probe und mit Elektronzyklotronresonanz
WO2012084968A1 (fr) Dispositif d'ionisation à la résonance cyclotron électronique
EP0232651B1 (de) Elektronen-Zyklotron-Resonanz-Ionenquelle
EP0813223B1 (de) Magnetfelderzeugungsvorrichtung und ECR Ionenquelle dafür
WO2014095888A1 (fr) Dispositif d'optique electronique
FR3157655A1 (fr) Source d’ions
FR3114476A1 (fr) Dispositif d’excitation pour transformer un gaz en plasma dans un tube capillaire diélectrique et accélérateur laser-plasma.
WO2025132161A1 (fr) Source d'ions
FR2883410A1 (fr) Source de photons comprenant une source de plasma d'ions multicharges a la resonance cyclotron electronique.
WO1999062307A1 (fr) Dispositif destine a creer un champ magnetique a l'interieur d'une enceinte

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20110125

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

AX Request for extension of the european patent

Extension state: AL BA RS

DAX Request for extension of the european patent (deleted)
17Q First examination report despatched

Effective date: 20111228

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

INTG Intention to grant announced

Effective date: 20160610

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HR HU IE IS IT LI LT LU LV MC MK MT NL NO PL PT RO SE SI SK TR

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

REG Reference to a national code

Ref country code: IE

Ref legal event code: FG4D

Free format text: LANGUAGE OF EP DOCUMENT: FRENCH

REG Reference to a national code

Ref country code: AT

Ref legal event code: REF

Ref document number: 846621

Country of ref document: AT

Kind code of ref document: T

Effective date: 20161215

REG Reference to a national code

Ref country code: DE

Ref legal event code: R096

Ref document number: 602009042477

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LV

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

REG Reference to a national code

Ref country code: NL

Ref legal event code: MP

Effective date: 20161116

REG Reference to a national code

Ref country code: LT

Ref legal event code: MG4D

REG Reference to a national code

Ref country code: AT

Ref legal event code: MK05

Ref document number: 846621

Country of ref document: AT

Kind code of ref document: T

Effective date: 20161116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170216

Ref country code: SE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: GR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170217

Ref country code: LT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: NL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 9

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: ES

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: PT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170316

Ref country code: AT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: FI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: HR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: PL

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CZ

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: RO

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: EE

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: SK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

REG Reference to a national code

Ref country code: DE

Ref legal event code: R097

Ref document number: 602009042477

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

Ref country code: BG

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170216

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20170817

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SI

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MC

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20170611

REG Reference to a national code

Ref country code: IE

Ref legal event code: MM4A

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LU

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170611

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170611

Ref country code: IE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170611

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170630

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170630

REG Reference to a national code

Ref country code: BE

Ref legal event code: MM

Effective date: 20170630

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 10

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: BE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170630

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: HU

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT; INVALID AB INITIO

Effective date: 20090611

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CY

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20161116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: MK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: TR

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20161116

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IS

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20170316

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20230626

Year of fee payment: 15

Ref country code: DE

Payment date: 20230620

Year of fee payment: 15

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 602009042477

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20250101

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20240630