[go: up one dir, main page]

EP0184475B1 - Verfahren und Vorrichtung zum Starten einer Mikrowellenionenquelle - Google Patents

Verfahren und Vorrichtung zum Starten einer Mikrowellenionenquelle Download PDF

Info

Publication number
EP0184475B1
EP0184475B1 EP85402076A EP85402076A EP0184475B1 EP 0184475 B1 EP0184475 B1 EP 0184475B1 EP 85402076 A EP85402076 A EP 85402076A EP 85402076 A EP85402076 A EP 85402076A EP 0184475 B1 EP0184475 B1 EP 0184475B1
Authority
EP
European Patent Office
Prior art keywords
cavity
plasma
high frequency
ultra
ionized
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP85402076A
Other languages
English (en)
French (fr)
Other versions
EP0184475A1 (de
Inventor
René Gualandris
Paul Ludwig
Jean-Claude Rocco
François Zadworny
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Publication of EP0184475A1 publication Critical patent/EP0184475A1/de
Application granted granted Critical
Publication of EP0184475B1 publication Critical patent/EP0184475B1/de
Expired legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation

Definitions

  • the present invention applies to the field of microwave ion sources, which can also be used as an electron source or as a plasma generator.
  • Such ion sources are described in particular by R. Geller, C. Jacquot and P. Sermet in the "Proceedings of the Symposium on ions sources and formation of ion beams", Berckeley (Oct. 1974) and by F. Bourg, R. Geller, B. Jacquot, T. Lamy, M. Pontonnier and JC Rocco in "Nuclear Instruments and Methods" North-Holland Publishing Company, 196 (1982) pp. 325-329. They are based on the establishment of a plasma confinement using a magnetic mirror configuration with maximum values of the magnetic field B greater than the value which ensures the cyclotronic resonance of the electrons.
  • the maximum and minimum values of the magnetic induction are 0.42 and 0.32 Tesla respectively and the cyclotron resonance of the electrons is carried out at 0.36 Tesla, the frequency of the injected high frequency wave being fixed at around 10 GHz.
  • the ions created in the plasma are extracted by an extraction system, made up of electrodes brought to continuous potentials and which are downstream of the maximum of the magnetic field. Under these conditions, the ion current emitted by the source decreases in proportion to the value of the field at the place of extraction and, to obtain an intense ion current, it is necessary to extract the ions in a magnetic field at least of the same order. larger than the field of cyclotron resonance.
  • the magnetic field must therefore be kept constant throughout the sliding space of the ion beam up to the point of its application or of the transformation of the ions in neutral particles.
  • the field to be kept constant corresponds to an induction of approximately 0.36 Tesla, and the electric power consumed by the coils creating this magnetic field is of the order of 1 Megawatt.
  • the extraction system When using low energy ions (less than 1 keV) the extraction system does not allow high densities to be extracted. To increase the latter, the ion beam can be compressed downstream of the ion source.
  • the magnetic field must be increased proportionally.
  • the ion source described in this patent application is still a source implementing the phenomenon of cyclotron resonance of the electrons to create the plasma in the cavity, and it therefore always requires in this cavity the presence of a magnetic field. greater than or at least equal to that which creates the cyclotronic resonance of the electrons.
  • Ion sources have also been proposed operating with a microwave cavity without constant magnetic field, that is to say without recourse to the phenomenon of electronic cyclotron resonance.
  • a microwave cavity without constant magnetic field
  • Such a source is described for example under the characteristic title of a microwave plasma disc ion source p. 396 and following of the journal Applied Physics Letters No. 44 February 1984.
  • the cavity has an adjustable piston which allows to achieve agreement on a particular mode of resonance for the overvoltage necessary for its operation.
  • Such a cavity therefore must be considered as a tunable cavity operating in a single mode.
  • the present invention specifically relates to a method of igniting a microwave ion source which operates without resorting to the phenomenon of cyclotron resonance of the electrons and, consequently, without the presence of a constant magnetic field prevailing for this purpose in the HF cavity.
  • This method of igniting a microwave ion source using in a known manner a resonant cavity supplied by a gas or a vapor of a material intended to form a plasma, a system for injecting into the cavity of a microwave power and a system for extracting plasma ions from the cavity, is characterized in that the cavity being of the multimode type, electronic germs are created within the medium to be ionized and the plasma is maintained after its ignition using only microwave power.
  • the ignition of the ion source by creation of electronic germs within the medium to be ionized can take place either uniquely during initial ignition, or repeatedly.
  • a single ignition allows the source to operate in pulsed mode, for a recurrence time of the order of 100 milliseconds.
  • an axial magnetic and / or multipolar configuration may nevertheless be necessary and used to confine and homogenize the plasma, but in this case, the values of the magnetic fields are much lower than those which were formerly necessary for the creation of the conditions of cyclotron resonance of electrons.
  • the creation of electronic germs within the medium to be ionized is obtained by direct seeding of electrons.
  • the creation of these same electronic seeds is obtained by temporary and local application of a magnetic field of sufficient intensity to create, in a small volume of the cavity, the conditions for establishing an electronic cyclotron resonance. which in turn causes the creation of plasma.
  • the creation of the same electronic germs within the medium to be ionized is obtained by temporary application of an overpressure in the cavity.
  • the present invention also relates to a device for igniting a microwave source implementing the above method in a particularly simple manner and using means per se known and easy to use.
  • this device for igniting a microwave ion source using in known manner a multimode resonant cavity supplied by a gas or a vapor of a material intended to form a plasma , a system for injecting microwave power into the cavity and a system for extracting plasma ions from the cavity is characterized in that it consists of an electromagnet encircling the external wall of the cavity, a few centimeters downstream of the injection system and the magnetic carcass of which is applied to this cavity.
  • the ignition process is implemented which consists in creating in a small volume of the cavity, temporarily and locally, the conditions for establishing an electronic cyclotron resonance. which in turn causes the creation of plasma.
  • each of the three dimensions of the resonant cavity, length, width and height must be greater than the small side or the diameter of the waveguide of the system for injecting the high frequency power of the cavity. This con dition has actually proved necessary in order to be able to obtain the ignition and the self-maintenance of a plasma in a multimode resonant cavity having this particular shape but in fact very frequently used.
  • microwave ion sources implementing the ignition process can be of any known nature and in particular include, like the other sources, the variants or improvements in detail recalled below. below.
  • such a source may have a magnetic configuration located downstream of the system for extracting ions from the plasma or electrons in order to carry out, under good conditions, the transport of the extracted beam and even to obtain its radial compression.
  • the ion or electron extraction system can be constituted by a single electrode brought to a determined potential.
  • the device for igniting the microwave ion source is located at a distance of the order of a few centimeters downstream of the junction zone. Between the microwave injector and the ion source cavity. This location has actually proven advantageous for obtaining a good ignition under conditions of maximum efficiency.
  • FIG. 1 shows schematically and in a simplified manner an exemplary embodiment of a source of ions, electrons or plasma, at microwave, in cross section comprising the central axis Z of the source .
  • one end carries an injector 8 of microwave power through a window 13 and the other end is connected to the place of use ions, electrons or plasma.
  • the waveguide 15, which is of revolution has a diameter smaller than that of the cavity 9.
  • the cavity 9 can have any shape depending on the nature of the use.
  • the microwave power injection system 8 can be constituted by several microwave injectors in parallel.
  • the relative dimensions of a source such as that of FIGS. 1 and 2, with respect to the HF injector system are not arbitrary when the cavity 9 is parallelepiped.
  • the dimensions of the three sides of the cavity 9 must be greater than the diameter or the short side of the waveguide which injects the HF power at 13, if one wants to be able to ignite and above all keep the plasma 10 in activity without resorting to cyclotron resonance of the electrons in this plasma.
  • a gas or a vapor intended to form a plasma is introduced at 17 at a low pressure of a few 0.133 to 1.33 Pa upstream of the system 14 for extracting the ions and in its vicinity.
  • the plasma can be created at another location and then injected into the cavity 9.
  • the ignition system 7 is constituted in this example by a circular electromagnet surrounding the wall 9 and comprising an annular coil 11 and a soft iron carcass 12 applied against the wall 9.
  • This electromagnet is capable of igniting the discharge by a pulse field by locally and temporarily creating in the cavity a magnetic field fulfilling the cyclotronic resonance conditions of the electrons, and the plasma ignites at 10.
  • the system for extracting ions or electrons is represented here in the form of a single electrode 14.
  • the ion current increases. We can then extract larger ion currents or reduce the dimensions of the cavities, which allows the use of "mini-cavities" with low consumption of microwave power.
  • the beam extracted from the source can be compressed, downstream of the extraction electrodes by the application of an additional magnetic field, this is the case for example of the coil 15 in the example of FIG. 2.
  • an ion source according to the invention is seen, provided with a spark gap 18 of any shape, preferably pointed, isolated with respect to the ion source 9 by an isolator 19 and polarized by means of a food 20 compared to this same ion source 9.
  • This supply 20 can be alternative (simple transformer) or continuous in this case the tip 18 is brought to a negative potential with respect to the source 9.
  • the source 9 comprises, as the element creating the seed for plasma inoculation, a filament 21 of refractory metal (W, Mo, Ta) emitting electrons.
  • This filament 21 passes through the wall 9 of the source in an insulator 22; the filament heating supply 23 is continuous or alternative.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
  • Particle Accelerators (AREA)

Claims (9)

1. Verfahren zum Starten einer Höchstfrequenzionenquelle, enthaltend einen Hohlraumresonator (9), der mit einem Gas oder einem Dampf eines Materials versorgt wird, das zur Ausbildung eines Plasmas bestimmt ist, ein System (8) zum Einkoppeln einer Höchstfrequenzenergie in den Hohlraum und ein System (14) zum Extrahieren der Plasmaionen aus dem Hohlraum, dadurch gekennzeichnet, daß der Hohlraum vom Mehrmode-Typ ist, man mitten in dem zu ionisierenden Milieu elektronische Keime bildet und man das Plasma nach seiner Zündung mit Hilfe der einzigen Höchstfrequenzenergie unterhält.
2. Startverfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Erzeugung der elektronischen Keime mitten im zu ionisierenden Milieu einzig beim anfänglichen Starten stattfindet.
3. Startverfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Erzeugung der elektronischen Keime mitten im zu ionisierenden Milieu wiederholt stattfindet.
4. Startverfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß die Erzeugung der elektronischen Keime mitten im zu ionisierenden Milieu durch direkte Einimpfung von Elektronen erhalten wird.
5. Startverfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß die Erzeugung elektronischer Keime mitten im zu ionisierenden Milieu durch vorübergehende und örtliche Anwendung eines Magnetfeldes erhalten wird, das eine Intensität hat, die ausreichend ist, um in einem kleinen Volumen des Hohlraums die Bedingungen zu erzeugen, die eine elektronische zyklotronische Resonanz einrichten, die ihrerseits die Bildung des Plasmas hervorruft.
6. Startverfahren nach einem der Ansprüche 1 bis 3, dadurch gekennzeichnet, daß die Erzeugung elektronischer Keime mitten im zu ionisierenden Milieu durch vorübergehende Anwendung eines Überdrucks im Hohlraum erhalten wird.
7. Höchstfrequenzionenquelle, enthaltend einen Mehrmode-Hohlraumresonator (9), der mit einem Gas oder einem Dampf aus einem Material versorgt wird, das dazu bestimmt ist, ein Plasma zu bilden, ein System (8) zum Einkoppeln einer Höchstfrequenzenergie in den Hohlraum und ein System (14) zum Ausleiten von Plasmaionen aus dem Hohlraum, dadurch gekennzeichnet, daß sie eine Startvorrichtung enthält, die von einem Elektromagneten (11, 12) gebildet ist, der die Außenwand des Hohlraums einige Zentimeter stromabwärts des Einkoppelsystems (8) umgibt und dessen Magnetjoch (12) an der Wand (9) dieses Hohlraums befestigt ist.
8. Höchstfrequenzionenquelle, die in bekannter Art einen Mehrmode-Hohlraumresonator (9) verwendet, der mit einem Gas oder einem Dampf aus einem Material versorgt wird, das zur Ausbildung eines Plasmas bestimmt ist, mit einem System (8) zum Einkoppeln einer Höchstfrequenzenergie in den Hohlraum und einem System (14) zum Ausleiten der Plasmaionen aus dem Hohlraum, dadurch gekennzeichnet, daß sie eine Startvorrichtung enthält, die aus der Gruppe ausgewählt ist, die Heizdrähte, Feldemissionsspitzen, Funkenquellen, lonisationslehren umfaßt, wobei die gewählte Vorrichtung im Hohlraum oder durch seine Wand hindurch angewendet ist.
9. Höchstfrequenzionenquelle nach einem der Ansprüche 7 und 8, dadurch gekennzeichnet, daß die drei Dimensionen des Mehrmode-Hohlraumresonators Länge, Breite und Höhe jeweils größer als die kleine Seite oder als der Durchmesser des Wellenleiters des Einkoppelsystems für die Höchstfrequenzenergie in den Hohlraum sind.
EP85402076A 1984-11-06 1985-10-25 Verfahren und Vorrichtung zum Starten einer Mikrowellenionenquelle Expired EP0184475B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8416884 1984-11-06
FR8416884A FR2572847B1 (fr) 1984-11-06 1984-11-06 Procede et dispositif d'allumage d'une source d'ions hyperfrequence

Publications (2)

Publication Number Publication Date
EP0184475A1 EP0184475A1 (de) 1986-06-11
EP0184475B1 true EP0184475B1 (de) 1989-05-24

Family

ID=9309308

Family Applications (1)

Application Number Title Priority Date Filing Date
EP85402076A Expired EP0184475B1 (de) 1984-11-06 1985-10-25 Verfahren und Vorrichtung zum Starten einer Mikrowellenionenquelle

Country Status (6)

Country Link
US (1) US4859909A (de)
EP (1) EP0184475B1 (de)
JP (1) JPS61118938A (de)
CA (1) CA1248643A (de)
DE (1) DE3570551D1 (de)
FR (1) FR2572847B1 (de)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9767992B1 (en) 2017-02-09 2017-09-19 Lyten, Inc. Microwave chemical processing reactor
US9812295B1 (en) 2016-11-15 2017-11-07 Lyten, Inc. Microwave chemical processing
US9997334B1 (en) 2017-02-09 2018-06-12 Lyten, Inc. Seedless particles with carbon allotropes
US10428197B2 (en) 2017-03-16 2019-10-01 Lyten, Inc. Carbon and elastomer integration
US10502705B2 (en) 2018-01-04 2019-12-10 Lyten, Inc. Resonant gas sensor
US10644368B2 (en) 2018-01-16 2020-05-05 Lyten, Inc. Pressure barrier comprising a transparent microwave window providing a pressure difference on opposite sides of the window
US10756334B2 (en) 2017-12-22 2020-08-25 Lyten, Inc. Structured composite materials
US10920035B2 (en) 2017-03-16 2021-02-16 Lyten, Inc. Tuning deformation hysteresis in tires using graphene

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2631199B1 (fr) * 1988-05-09 1991-03-15 Centre Nat Rech Scient Reacteur a plasma
US5107170A (en) * 1988-10-18 1992-04-21 Nissin Electric Co., Ltd. Ion source having auxillary ion chamber
US5753921A (en) * 1996-07-16 1998-05-19 Eastman Kodak Company X-ray imaging detector with limited substrate and converter
US5650626A (en) * 1996-07-16 1997-07-22 Eastman Kodak Company X-ray imaging detector with thickness and composition limited substrate
FR2895169B1 (fr) * 2005-12-15 2008-08-01 Renault Sas Optimisation de la frequence d'excitation d'un resonateur
US9376747B2 (en) * 2007-11-01 2016-06-28 Oerlikon Surface Solutions Ag, Pfaffikon Method for manufacturing a treated surface and vacuum plasma sources
ES2696227B2 (es) * 2018-07-10 2019-06-12 Centro De Investig Energeticas Medioambientales Y Tecnologicas Ciemat Fuente de iones interna para ciclotrones de baja erosion

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0127523A1 (de) * 1983-05-20 1984-12-05 Commissariat A L'energie Atomique Elektronzyklotronresonanz-Ionenquelle

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2147497A5 (de) * 1971-07-29 1973-03-09 Commissariat Energie Atomique
FR2174678B1 (de) * 1972-03-06 1975-08-29 Commissariat Energie Atomique
JPS6043620B2 (ja) * 1982-11-25 1985-09-28 日新ハイボルテージ株式会社 マイクロ波イオン源
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0127523A1 (de) * 1983-05-20 1984-12-05 Commissariat A L'energie Atomique Elektronzyklotronresonanz-Ionenquelle

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9812295B1 (en) 2016-11-15 2017-11-07 Lyten, Inc. Microwave chemical processing
US10332726B2 (en) 2016-11-15 2019-06-25 Lyten, Inc. Microwave chemical processing
US9767992B1 (en) 2017-02-09 2017-09-19 Lyten, Inc. Microwave chemical processing reactor
US9997334B1 (en) 2017-02-09 2018-06-12 Lyten, Inc. Seedless particles with carbon allotropes
US10373808B2 (en) 2017-02-09 2019-08-06 Lyten, Inc. Seedless particles with carbon allotropes
US11380521B2 (en) 2017-02-09 2022-07-05 Lyten, Inc. Spherical carbon allotropes for lubricants
US10937632B2 (en) 2017-02-09 2021-03-02 Lyten, Inc. Microwave chemical processing reactor
US10920035B2 (en) 2017-03-16 2021-02-16 Lyten, Inc. Tuning deformation hysteresis in tires using graphene
US11008436B2 (en) 2017-03-16 2021-05-18 Lyten, Inc. Carbon and elastomer integration
US10428197B2 (en) 2017-03-16 2019-10-01 Lyten, Inc. Carbon and elastomer integration
US10756334B2 (en) 2017-12-22 2020-08-25 Lyten, Inc. Structured composite materials
US10502705B2 (en) 2018-01-04 2019-12-10 Lyten, Inc. Resonant gas sensor
US10644368B2 (en) 2018-01-16 2020-05-05 Lyten, Inc. Pressure barrier comprising a transparent microwave window providing a pressure difference on opposite sides of the window

Also Published As

Publication number Publication date
EP0184475A1 (de) 1986-06-11
FR2572847A1 (fr) 1986-05-09
US4859909A (en) 1989-08-22
DE3570551D1 (en) 1989-06-29
JPS61118938A (ja) 1986-06-06
CA1248643A (en) 1989-01-10
FR2572847B1 (fr) 1986-12-26

Similar Documents

Publication Publication Date Title
EP0184475B1 (de) Verfahren und Vorrichtung zum Starten einer Mikrowellenionenquelle
EP0127523B1 (de) Elektronzyklotronresonanz-Ionenquelle
EP2798209B1 (de) Plasmatriebwerk und verfahren zur erzeugung eines plasmaantriebsschubs
FR2671931A1 (fr) Dispositif de repartition d'une energie micro-onde pour l'excitation d'un plasma.
EP0238397B1 (de) Elektronenzyklotronresonanz-Ionenquelle mit koaxialer Injektion elektromagnetischer Wellen
EP0711100B1 (de) Plasmaerzeugungsvorrichtung, ermöglichend eine Trennung zwischen Mikrowellenübertragung und -absorptionszonen
EP2353347B1 (de) Einrichtung und verfahren zum erzeugen und/oder eingrenzen eines plasmas
EP2044816B1 (de) Vorrichtung und verfahren zum produzieren und/oder eingrenzen eines plasmas
EP0199625B1 (de) Elektronzyklotronresonanzquelle negativer Ionen
EP0532411B1 (de) Elektronzyklotronresonanz-Ionenquelle mit koaxialer Zuführung elektromagnetischer Wellen
EP2873090B1 (de) Gasentladungslampe
EP0483004B1 (de) Quelle starkgeladener Ionen mit polarisierbarer Probe und mit Elektronzyklotronresonanz
FR2969372A1 (fr) Dispositif d’ionisation a la resonance cyclotron electronique
EP2311061B1 (de) Elektronenzyklotronresonanzionengenerator
EP0514255B1 (de) Elektronzyklotronresonanz-Ionenquelle
EP0374011B1 (de) Verfahren und Vorrichtung unter Benutzung einer ECR-Quelle für die Herstellung von hochgeladenen, schweren Ionen
FR3157655A1 (fr) Source d’ions
FR2936648A1 (fr) Tube micro-ondes compact de forte puissance
Gupta et al. Propagation of high power short pulse laser in a tunnel ionizing inhomogeneous gas
FR2526582A1 (fr) Procede et appareil pour produire des micro-ondes
WO2025132161A1 (fr) Source d'ions
EP0813223A1 (de) Magnetfelderzeugungsvorrichtung und ECR Ionenquelle dafür
FR2658025A1 (fr) Procede et dispositif de traitement par plasma de pieces de formes diverses.
WO2017115023A1 (fr) Système de génération de faisceau plasma à dérive d'électrons fermée et propulseur comprenant un tel système

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): BE CH DE GB LI NL SE

17P Request for examination filed

Effective date: 19861106

RAP1 Party data changed (applicant data changed or rights of an application transferred)

Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE

17Q First examination report despatched

Effective date: 19880311

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): BE CH DE GB LI NL SE

REF Corresponds to:

Ref document number: 3570551

Country of ref document: DE

Date of ref document: 19890629

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed
PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SE

Payment date: 19920921

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: BE

Payment date: 19921001

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 19921002

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 19921019

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 19921020

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 19921031

Year of fee payment: 8

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Effective date: 19931025

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Effective date: 19931026

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Effective date: 19931031

Ref country code: CH

Effective date: 19931031

Ref country code: BE

Effective date: 19931031

BERE Be: lapsed

Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE

Effective date: 19931031

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Effective date: 19940501

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee
GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 19931025

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Effective date: 19940701

EUG Se: european patent has lapsed

Ref document number: 85402076.5

Effective date: 19940510