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EE200100451A - Teemantkihiga kõvasulamlõikeriist ja meetod sellevalmistamiseks - Google Patents

Teemantkihiga kõvasulamlõikeriist ja meetod sellevalmistamiseks

Info

Publication number
EE200100451A
EE200100451A EEP200100451A EEP200100451A EE200100451A EE 200100451 A EE200100451 A EE 200100451A EE P200100451 A EEP200100451 A EE P200100451A EE P200100451 A EEP200100451 A EE P200100451A EE 200100451 A EE200100451 A EE 200100451A
Authority
EE
Estonia
Prior art keywords
making
hard tool
diamond hard
diamond
tool
Prior art date
Application number
EEP200100451A
Other languages
English (en)
Inventor
M. Musche Stefan
Rudolf Hufschmied Ralph
Original Assignee
Plasmotec Gmbh & Co. Kg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasmotec Gmbh & Co. Kg filed Critical Plasmotec Gmbh & Co. Kg
Publication of EE200100451A publication Critical patent/EE200100451A/et

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)
  • Physical Vapour Deposition (AREA)
EEP200100451A 2000-08-26 2001-08-24 Teemantkihiga kõvasulamlõikeriist ja meetod sellevalmistamiseks EE200100451A (et)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10042099 2000-08-26

Publications (1)

Publication Number Publication Date
EE200100451A true EE200100451A (et) 2002-04-15

Family

ID=7653973

Family Applications (1)

Application Number Title Priority Date Filing Date
EEP200100451A EE200100451A (et) 2000-08-26 2001-08-24 Teemantkihiga kõvasulamlõikeriist ja meetod sellevalmistamiseks

Country Status (7)

Country Link
EP (1) EP1182274A1 (et)
CZ (1) CZ20013086A3 (et)
EE (1) EE200100451A (et)
HU (1) HUP0103446A2 (et)
NO (1) NO20014124L (et)
PL (1) PL199488B1 (et)
SK (1) SK12212001A3 (et)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT504006B1 (de) * 2006-08-14 2008-05-15 Rho Best Coating Hartstoffbesc Werkzeuge mit kohlenstoffhaltigen beschichtungen und verfahren zu deren herstellung
CN102421936B (zh) 2009-05-18 2014-10-22 斯沃奇集团研究及开发有限公司 涂覆用于机械系统的具有高摩擦性能的微机械部件的方法
EP2453038A1 (en) 2010-11-16 2012-05-16 The Swatch Group Research and Development Ltd. Method for coating micromechanical parts with dual diamond coating
DE102012012764B4 (de) * 2012-06-27 2018-04-26 Audi Ag Verfahren zur Schichthaftungsprüfung einer Bauteilbeschichtung, insbesondere für beschichtete Zylinderlaufbahnen
WO2015131210A1 (de) * 2014-03-06 2015-09-11 Braun Maschinenfabrik Gesellschaft M.B.H. Materialabtragendes bearbeitungswerkzeug
AT515691B1 (de) 2014-03-06 2015-11-15 Reger Wilfried Sägeblatt
DE102016122834A1 (de) 2015-11-27 2017-06-01 Cemecon Ag Beschichtung eines Körpers mit Diamantschicht und Hartstoffschicht
DE102019200682A1 (de) * 2019-01-21 2020-07-23 Technische Universität Dresden Schneidwerkzeug mit räumlich strukturierter Beschichtung
WO2021019084A1 (en) * 2019-07-31 2021-02-04 Oerlikon Surface Solutions Ag, Pfäffikon Graded hydrogen-free carbon-based hard material layer coated onto a substrate
CN116837345B (zh) * 2022-03-23 2025-09-05 中国石油化工股份有限公司 一种cvd金刚石膜及其制备方法和应用
CN117604451A (zh) * 2023-12-07 2024-02-27 深圳市金洲精工科技股份有限公司 一种用于刀具表面的碳基涂层、其制备方法及刀具

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2679067B2 (ja) * 1987-12-15 1997-11-19 株式会社日本自動車部品総合研究所 ダイヤモンド膜付基板の製造方法
CA2044543C (en) * 1990-08-10 1999-12-14 Louis Kimball Bigelow Multi-layer superhard film structure
US6066399A (en) * 1997-03-19 2000-05-23 Sanyo Electric Co., Ltd. Hard carbon thin film and method of forming the same
DE19850346C2 (de) * 1998-11-02 2003-06-26 Fraunhofer Ges Forschung Polykristalline Diamantschicht mit optimierten Oberflächeneigenschaften

Also Published As

Publication number Publication date
NO20014124L (no) 2002-02-27
CZ20013086A3 (cs) 2002-08-14
PL349311A1 (en) 2002-03-11
SK12212001A3 (sk) 2002-06-04
HU0103446D0 (en) 2001-10-28
EP1182274A1 (de) 2002-02-27
PL199488B1 (pl) 2008-09-30
NO20014124D0 (no) 2001-08-24
HUP0103446A2 (en) 2002-06-29

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