EE200100059A - Leeliseline tsink-nikkel galvaanimisvann - Google Patents

Leeliseline tsink-nikkel galvaanimisvann

Info

Publication number: EE200100059A
Authority: EE; Estonia
Prior art keywords: plating bath; nickel plating; alkaline zinc; alkaline; zinc
Prior art date: 1998-07-30

Application number

EEP200100059A

Other languages

English (en)

Estonian (et)

Inventor

Hillebrand Ernst-Walter

Original Assignee

Walter Hillebrand Gmbh & Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-07-30

Filing date

1999-07-29

Publication date

2002-10-15

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7875843&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EE200100059(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1999-07-29 Application filed by Walter Hillebrand Gmbh & Co filed Critical Walter Hillebrand Gmbh & Co

2002-10-15 Publication of EE200100059A publication Critical patent/EE200100059A/xx

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/02—Tanks; Installations therefor
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/565—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of zinc
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Automation & Control Theory (AREA)
Electroplating And Plating Baths Therefor (AREA)
Electrolytic Production Of Metals (AREA)
Battery Electrode And Active Subsutance (AREA)
Electrodes For Compound Or Non-Metal Manufacture (AREA)

EEP200100059A 1998-07-30 1999-07-29 Leeliseline tsink-nikkel galvaanimisvann EE200100059A (et)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE19834353A DE19834353C2 (de)	1998-07-30	1998-07-30	Alkalisches Zink-Nickelbad
PCT/EP1999/005443 WO2000006807A2 (de)	1998-07-30	1999-07-29	Alkalisches zink-nickelbad

Publications (1)

Publication Number	Publication Date
EE200100059A true EE200100059A (et)	2002-10-15

Family

ID=7875843

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EEP200100059A EE200100059A (et)	1998-07-30	1999-07-29	Leeliseline tsink-nikkel galvaanimisvann

Country Status (22)

Country	Link
US (4)	US6602394B1 (pt)
EP (2)	EP1102875B1 (pt)
JP (2)	JP4716568B2 (pt)
KR (1)	KR20010071074A (pt)
CN (1)	CN1311830A (pt)
AT (2)	ATE346180T1 (pt)
AU (1)	AU5415299A (pt)
BG (1)	BG105184A (pt)
BR (1)	BR9912589A (pt)
CA (1)	CA2339144A1 (pt)
CZ (1)	CZ298904B6 (pt)
DE (3)	DE19834353C2 (pt)
EE (1)	EE200100059A (pt)
ES (2)	ES2277624T3 (pt)
HR (1)	HRP20010044B1 (pt)
HU (1)	HUP0103951A3 (pt)
IL (1)	IL141086A0 (pt)
MX (1)	MXPA01000932A (pt)
PL (1)	PL198149B1 (pt)
SK (1)	SK285453B6 (pt)
TR (1)	TR200100232T2 (pt)
WO (1)	WO2000006807A2 (pt)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
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DE10026956A1 (de) *	2000-05-30	2001-12-13	Walter Hillebrand Galvanotechn	Zink-Legierungsbad
ATE306572T1 (de)	2000-06-15	2005-10-15	Taskem Inc	Zink-nickel-elektroplattierung
US6755960B1 (en)	2000-06-15	2004-06-29	Taskem Inc.	Zinc-nickel electroplating
US7628898B2 (en) *	2001-03-12	2009-12-08	Semitool, Inc.	Method and system for idle state operation
DE10223622B4 (de) *	2002-05-28	2005-12-08	Walter Hillebrand Gmbh & Co. Kg Galvanotechnik	Alkalisches Zink-Nickelbad sowie entsprechende Galvanisierungsverfahren mit erhöhter Stromausbeute
US8377283B2 (en)	2002-11-25	2013-02-19	Coventya, Inc.	Zinc and zinc-alloy electroplating
DE10261493A1 (de) *	2002-12-23	2004-07-08	METAKEM Gesellschaft für Schichtchemie der Metalle mbH	Anode zur Galvanisierung
ES2609080T3 (es) *	2003-06-03	2017-04-18	Coventya, Inc.	Revestimiento electrolítico de cinc y aleaciones de cinc
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US20050133376A1 (en) *	2003-12-19	2005-06-23	Opaskar Vincent C.	Alkaline zinc-nickel alloy plating compositions, processes and articles therefrom
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DE502005007138D1 (de) *	2005-04-26	2009-06-04	Atotech Deutschland Gmbh	Alkalisches Galvanikbad mit einer Filtrationsmembran
EP1717351A1 (de) *	2005-04-27	2006-11-02	Enthone Inc.	Galvanikbad
JP4738910B2 (ja) *	2005-06-21	2011-08-03	日本表面化学株式会社	亜鉛−ニッケル合金めっき方法
US20070043474A1 (en) *	2005-08-17	2007-02-22	Semitool, Inc.	Systems and methods for predicting process characteristics of an electrochemical treatment process
DE102005051632B4 (de) *	2005-10-28	2009-02-19	Enthone Inc., West Haven	Verfahren zum Beizen von nicht leitenden Substratoberflächen und zur Metallisierung von Kunststoffoberflächen
JP4819612B2 (ja) *	2006-08-07	2011-11-24	ルネサスエレクトロニクス株式会社	めっき処理装置および半導体装置の製造方法
DE102007040005A1 (de)	2007-08-23	2009-02-26	Ewh Industrieanlagen Gmbh & Co. Kg	Verfahren zum Abscheiden funktioneller Schichten aus einem Galvanikbad
DE102007060200A1 (de)	2007-12-14	2009-06-18	Coventya Gmbh	Galvanisches Bad, Verfahren zur galvanischen Abscheidung und Verwendung einer bipolaren Membran zur Separation in einem galvanischen Bad
TWI384094B (zh) *	2008-02-01	2013-02-01	Zhen Ding Technology Co Ltd	電鍍用陽極裝置及包括該陽極裝置之電鍍裝置
EP2096193B1 (en)	2008-02-21	2013-04-03	Atotech Deutschland GmbH	Process for the preparation of corrosion resistant zinc and zinc-nickel plated linear or complex shaped parts
DE102008058086B4 (de)	2008-11-18	2013-05-23	Atotech Deutschland Gmbh	Verfahren und Vorrichtung zur Reinigung von galvanischen Bädern zur Abscheidung von Metallen
KR100977068B1 (ko) *	2010-01-25	2010-08-19	한용순	비정질 3가크롬합금도금층을 형성하기 위한 도금장치 및 그 3가크롬합금도금액
EP2384800B1 (de)	2010-05-07	2013-02-13	Dr.Ing. Max Schlötter GmbH & Co. KG	Regeneration alkalischer Zinknickelelektrolyte durch Entfernen von Cyanidionen
DE102010044551A1 (de)	2010-09-07	2012-03-08	Coventya Gmbh	Anode sowie deren Verwendung in einem alkalischen Galvanikbad
EP2565297A3 (en)	2011-08-30	2013-04-24	Rohm and Haas Electronic Materials LLC	Adhesion promotion of cyanide-free white bronze
CN103849915B (zh) *	2012-12-06	2016-08-31	北大方正集团有限公司	电镀装置和pcb板导通孔镀铜的方法
CN103911650B (zh) *	2014-04-02	2016-07-06	广东达志环保科技股份有限公司	一种应用于碱性锌镍合金电镀的阳极
DE202015002289U1 (de)	2015-03-25	2015-05-06	Hartmut Trenkner	Zweikammer - Elektrodialysezelle mit Anionen- und Kationenaustauschermembran zur Verwendung als Anode in alkalischen Zink- und Zinklegierungselektrolyten zum Zweck der Metallabscheidung in galvanischen Anlagen
EP3042984B1 (en)	2015-07-22	2019-04-03	Dipsol Chemicals Co., Ltd.	Zinc alloy plating method
US10156020B2 (en)	2015-07-22	2018-12-18	Dipsol Chemicals Co., Ltd.	Zinc alloy plating method
WO2017171113A1 (ko) *	2016-03-29	2017-10-05	(주) 테크윈	전해조 및 전해 방법
CN106987879A (zh) *	2016-11-23	2017-07-28	瑞尔太阳能投资有限公司	电沉积装置及其电沉积方法
EP3358045A1 (de)	2017-02-07	2018-08-08	Dr.Ing. Max Schlötter GmbH & Co. KG	Verfahren zur galvanischen abscheidung von zink- und zinklegierungsüberzügen aus einem alkalischen beschichtungsbad mit reduziertem abbau von organischen badzusätzen
EP3415665B1 (de)	2017-06-14	2023-12-27	Dr.Ing. Max Schlötter GmbH & Co. KG	Verfahren zur galvanischen abscheidung von zink-nickel-legierungsüberzügen aus einem alkalischen zink-nickel-legierungsbad mit reduziertem abbau von additiven
MX2021008925A (es)	2019-01-24	2021-08-24	Atotech Deutschland Gmbh	Sistema de anodo de membrana para deposito electrolitico de aleacion de cinc-niquel.
WO2020166062A1 (ja)	2019-02-15	2020-08-20	ディップソール株式会社	亜鉛又は亜鉛合金電気めっき方法及びシステム
JP6750186B1 (ja)	2019-11-28	2020-09-02	ユケン工業株式会社	めっき液の亜鉛濃度の上昇を抑制する方法および亜鉛系めっき部材の製造方法
US11946152B2 (en)	2019-12-20	2024-04-02	Atotech Deutschland GmbH & Co. KG	Method and system for depositing a zinc-nickel alloy on a substrate
EP4273303A1 (en)	2022-05-05	2023-11-08	Atotech Deutschland GmbH & Co. KG	Method for depositing a zinc-nickel alloy on a substrate, an aqueous zinc-nickel deposition bath, a brightening agent and use thereof
CN115821346A (zh) *	2022-11-16	2023-03-21	广州超邦化工有限公司	一种中碳钢机加件镀碱性锌镍合金的方法

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1998
- 1998-07-30 DE DE19834353A patent/DE19834353C2/de not_active Expired - Lifetime
1999
- 1999-07-24 US US09/744,706 patent/US6602394B1/en not_active Expired - Lifetime
- 1999-07-29 EE EEP200100059A patent/EE200100059A/xx unknown
- 1999-07-29 AT AT03003890T patent/ATE346180T1/de active
- 1999-07-29 ES ES03003890T patent/ES2277624T3/es not_active Expired - Lifetime
- 1999-07-29 IL IL14108699A patent/IL141086A0/xx unknown
- 1999-07-29 DE DE59914011T patent/DE59914011D1/de not_active Expired - Lifetime
- 1999-07-29 SK SK89-2001A patent/SK285453B6/sk not_active IP Right Cessation
- 1999-07-29 KR KR1020017001285A patent/KR20010071074A/ko not_active Withdrawn
- 1999-07-29 CZ CZ20010189A patent/CZ298904B6/cs not_active IP Right Cessation
- 1999-07-29 PL PL345970A patent/PL198149B1/pl unknown
- 1999-07-29 AU AU54152/99A patent/AU5415299A/en not_active Abandoned
- 1999-07-29 CA CA002339144A patent/CA2339144A1/en not_active Abandoned
- 1999-07-29 CN CN99809138A patent/CN1311830A/zh active Pending
- 1999-07-29 EP EP99940077A patent/EP1102875B1/de not_active Revoked
- 1999-07-29 BR BR9912589-7A patent/BR9912589A/pt not_active Application Discontinuation
- 1999-07-29 EP EP03003890A patent/EP1344850B1/de not_active Expired - Lifetime
- 1999-07-29 JP JP2000562585A patent/JP4716568B2/ja not_active Expired - Lifetime
- 1999-07-29 MX MXPA01000932A patent/MXPA01000932A/es unknown
- 1999-07-29 ES ES99940077T patent/ES2201759T3/es not_active Expired - Lifetime
- 1999-07-29 HR HR20010044A patent/HRP20010044B1/xx not_active IP Right Cessation
- 1999-07-29 DE DE59905937T patent/DE59905937D1/de not_active Expired - Lifetime
- 1999-07-29 HU HU0103951A patent/HUP0103951A3/hu unknown
- 1999-07-29 TR TR2001/00232T patent/TR200100232T2/xx unknown
- 1999-07-29 AT AT99940077T patent/ATE242821T1/de active
- 1999-07-29 WO PCT/EP1999/005443 patent/WO2000006807A2/de not_active Ceased
2001
- 2001-01-25 BG BG105184A patent/BG105184A/xx unknown
2003
- 2003-07-11 US US10/618,352 patent/US20040104123A1/en not_active Abandoned
2008
- 2008-02-13 US US12/030,750 patent/US7807035B2/en not_active Expired - Lifetime
- 2008-03-18 JP JP2008069722A patent/JP2008150713A/ja active Pending
2010
- 2010-10-01 US US12/896,673 patent/US8486235B2/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
IL141086A0 (en)	2002-02-10
WO2000006807A3 (de)	2000-05-04
JP2002521572A (ja)	2002-07-16
DE19834353A1 (de)	2000-02-03
US20080164150A1 (en)	2008-07-10
EP1102875A2 (de)	2001-05-30
AU5415299A (en)	2000-02-21
HRP20010044B1 (en)	2005-06-30
WO2000006807A2 (de)	2000-02-10
DE59905937D1 (de)	2003-07-17
BG105184A (en)	2001-10-31
PL345970A1 (en)	2002-01-14
US20110031127A1 (en)	2011-02-10
ES2201759T3 (es)	2004-03-16
SK285453B6 (sk)	2007-01-04
PL198149B1 (pl)	2008-05-30
US20040104123A1 (en)	2004-06-03
EP1344850A1 (de)	2003-09-17
CZ298904B6 (cs)	2008-03-05
US7807035B2 (en)	2010-10-05
JP2008150713A (ja)	2008-07-03
SK892001A3 (en)	2001-10-08
KR20010071074A (ko)	2001-07-28
TR200100232T2 (tr)	2001-06-21
MXPA01000932A (es)	2002-06-04
HUP0103951A2 (hu)	2002-02-28
CA2339144A1 (en)	2000-02-10
ES2277624T3 (es)	2007-07-16
HUP0103951A3 (en)	2003-05-28
US6602394B1 (en)	2003-08-05
CZ2001189A3 (cs)	2001-08-15
US8486235B2 (en)	2013-07-16
ATE346180T1 (de)	2006-12-15
HRP20010044A2 (en)	2001-12-31
JP4716568B2 (ja)	2011-07-06
DE19834353C2 (de)	2000-08-17
CN1311830A (zh)	2001-09-05
EP1102875B1 (de)	2003-06-11
BR9912589A (pt)	2001-05-02
DE59914011D1 (de)	2007-01-04
EP1344850B1 (de)	2006-11-22
ATE242821T1 (de)	2003-06-15

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