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EA200701008A1 - Плазменная система - Google Patents

Плазменная система

Info

Publication number
EA200701008A1
EA200701008A1 EA200701008A EA200701008A EA200701008A1 EA 200701008 A1 EA200701008 A1 EA 200701008A1 EA 200701008 A EA200701008 A EA 200701008A EA 200701008 A EA200701008 A EA 200701008A EA 200701008 A1 EA200701008 A1 EA 200701008A1
Authority
EA
Eurasian Patent Office
Prior art keywords
electrode
outlet
plasma
housing
atmospheric pressure
Prior art date
Application number
EA200701008A
Other languages
English (en)
Other versions
EA010940B1 (ru
Inventor
Лиам О`Нилл
Питер Доббин
Фрэнк Суоллоу
Стюарт Лидли
Original Assignee
Дау Корнинг Айэлэнд Лимитед
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from GB0424532A external-priority patent/GB0424532D0/en
Priority claimed from GB0502986A external-priority patent/GB0502986D0/en
Application filed by Дау Корнинг Айэлэнд Лимитед filed Critical Дау Корнинг Айэлэнд Лимитед
Publication of EA200701008A1 publication Critical patent/EA200701008A1/ru
Publication of EA010940B1 publication Critical patent/EA010940B1/ru

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/4645—Radiofrequency discharges
    • H05H1/466—Radiofrequency discharges using capacitive coupling means, e.g. electrodes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/10—Testing at atmospheric pressure
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2240/00—Testing
    • H05H2240/20—Non-thermal plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatment Of Fiber Materials (AREA)
  • Cleaning In General (AREA)
  • Surface Treatment Of Glass (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Неравновесную плазму атмосферного давления, включающую распыленный агент обработки поверхности, генерируют посредством приложения высокого напряжения высокой частоты по меньшей мере к одному электроду, расположенному в диэлектрическом корпусе, при одновременном пропускании потока технологического газа из выхода мимо электрода к выходу. Приложенное напряжение является достаточно высоким для генерирования неравновесной плазмы атмосферного давления, проходящей от электрода, по меньшей мере, до выхода корпуса. Электрод можно комбинировать с распылителем для агента обработки поверхности внутри корпуса. Электрод может содержать радиоактивный материал. Подлежащая обработке поверхность может быть расположена вблизи выхода плазмы, так что поверхность находится в контакте с плазмой, и ее можно перемещать относительно выхода плазмы.
EA200701008A 2004-11-05 2005-11-03 Плазменная система EA010940B1 (ru)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0424532A GB0424532D0 (en) 2004-11-05 2004-11-05 Plasma system
GB0502986A GB0502986D0 (en) 2005-02-14 2005-02-14 Plasma system
PCT/GB2005/004245 WO2006048649A1 (en) 2004-11-05 2005-11-03 Plasma system

Publications (2)

Publication Number Publication Date
EA200701008A1 true EA200701008A1 (ru) 2007-10-26
EA010940B1 EA010940B1 (ru) 2008-12-30

Family

ID=35517610

Family Applications (2)

Application Number Title Priority Date Filing Date
EA200701008A EA010940B1 (ru) 2004-11-05 2005-11-03 Плазменная система
EA200701007A EA010367B1 (ru) 2004-11-05 2005-11-03 Плазменная система

Family Applications After (1)

Application Number Title Priority Date Filing Date
EA200701007A EA010367B1 (ru) 2004-11-05 2005-11-03 Плазменная система

Country Status (7)

Country Link
US (2) US20090065485A1 (ru)
EP (3) EP2154937A2 (ru)
JP (3) JP5180585B2 (ru)
KR (3) KR101157410B1 (ru)
CN (1) CN102355789B (ru)
EA (2) EA010940B1 (ru)
WO (2) WO2006048649A1 (ru)

Cited By (1)

* Cited by examiner, † Cited by third party
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