[go: up one dir, main page]

TW200701361A - Plasma processing apparatus - Google Patents

Plasma processing apparatus

Info

Publication number
TW200701361A
TW200701361A TW095111269A TW95111269A TW200701361A TW 200701361 A TW200701361 A TW 200701361A TW 095111269 A TW095111269 A TW 095111269A TW 95111269 A TW95111269 A TW 95111269A TW 200701361 A TW200701361 A TW 200701361A
Authority
TW
Taiwan
Prior art keywords
electric power
frequency electric
high frequency
processing apparatus
plasma processing
Prior art date
Application number
TW095111269A
Other languages
Chinese (zh)
Other versions
TWI409872B (en
Inventor
Ryo Sato
Masato Minami
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200701361A publication Critical patent/TW200701361A/en
Application granted granted Critical
Publication of TWI409872B publication Critical patent/TWI409872B/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60H—ARRANGEMENTS OF HEATING, COOLING, VENTILATING OR OTHER AIR-TREATING DEVICES SPECIALLY ADAPTED FOR PASSENGER OR GOODS SPACES OF VEHICLES
    • B60H1/00—Heating, cooling or ventilating [HVAC] devices
    • B60H1/00642—Control systems or circuits; Control members or indication devices for heating, cooling or ventilating devices
    • B60H1/00985—Control systems or circuits characterised by display or indicating devices, e.g. voice simulators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60R—VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
    • B60R11/00—Arrangements for holding or mounting articles, not otherwise provided for
    • B60R11/02—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof
    • B60R11/0229—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof for displays, e.g. cathodic tubes
    • B60R11/0235—Arrangements for holding or mounting articles, not otherwise provided for for radio sets, television sets, telephones, or the like; Arrangement of controls thereof for displays, e.g. cathodic tubes of flat type, e.g. LCD
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B60—VEHICLES IN GENERAL
    • B60R—VEHICLES, VEHICLE FITTINGS, OR VEHICLE PARTS, NOT OTHERWISE PROVIDED FOR
    • B60R16/00—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for
    • B60R16/02—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for electric constitutive elements
    • B60R16/023—Electric or fluid circuits specially adapted for vehicles and not otherwise provided for; Arrangement of elements of electric or fluid circuits specially adapted for vehicles and not otherwise provided for electric constitutive elements for transmission of signals between vehicle parts or subsystems
    • B60R16/0231—Circuits relating to the driving or the functioning of the vehicle
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H25/00—Switches with compound movement of handle or other operating part
    • H01H25/04—Operating part movable angularly in more than one plane, e.g. joystick
    • H01H25/041—Operating part movable angularly in more than one plane, e.g. joystick having a generally flat operating member depressible at different locations to operate different controls

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Automation & Control Theory (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

To provide a plasma processing apparatus for suppressing arc discharge by preventing the plasma entrance into the gas hole of a showerhead even in case of applying a first high frequency electric power, by generating a sheath firstly with a second high frequency electric power, by adding the second high frequency electric power of 300 W to 1,000 W lower than the first frequency electric power, then adding the first frequency electric power to an upper electrode, with a time delay for 1 to 3 seconds. The plasma processing apparatus 10 is provided with an upper electrode 13 and a lower electrode 14 facing oppositely in a processing chamber 12. The second high frequency electric power is applied first to the upper electrode 13, and then with a time delay for 1 to 3 seconds after that, the first high frequency electric power is superimposed and applied.
TW095111269A 2005-03-31 2006-03-30 A plasma processing apparatus, a plasma processing method, and a computer memory medium TWI409872B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005102705A JP4515950B2 (en) 2005-03-31 2005-03-31 Plasma processing apparatus, plasma processing method, and computer storage medium

Publications (2)

Publication Number Publication Date
TW200701361A true TW200701361A (en) 2007-01-01
TWI409872B TWI409872B (en) 2013-09-21

Family

ID=37029927

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095111269A TWI409872B (en) 2005-03-31 2006-03-30 A plasma processing apparatus, a plasma processing method, and a computer memory medium

Country Status (4)

Country Link
JP (1) JP4515950B2 (en)
KR (1) KR100801769B1 (en)
CN (1) CN1840740B (en)
TW (1) TWI409872B (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7708859B2 (en) 2004-04-30 2010-05-04 Lam Research Corporation Gas distribution system having fast gas switching capabilities
US20070066038A1 (en) 2004-04-30 2007-03-22 Lam Research Corporation Fast gas switching plasma processing apparatus
JP4827081B2 (en) * 2005-12-28 2011-11-30 東京エレクトロン株式会社 Plasma etching method and computer-readable storage medium
JP2008186939A (en) * 2007-01-29 2008-08-14 Tokyo Electron Ltd Plasma treatment equipment and plasma treatment method, and storage medium
KR101553422B1 (en) * 2007-12-19 2015-09-15 램 리써치 코포레이션 A composite showerhead electrode assembly for a plasma processing apparatus
JP5371238B2 (en) * 2007-12-20 2013-12-18 東京エレクトロン株式会社 Plasma processing apparatus and plasma processing method
US20090286397A1 (en) * 2008-05-15 2009-11-19 Lam Research Corporation Selective inductive double patterning
KR101957348B1 (en) 2011-09-26 2019-03-12 도쿄엘렉트론가부시키가이샤 Plasma processing apparatus and plasma processing method
JP6424024B2 (en) * 2014-06-24 2018-11-14 株式会社日立ハイテクノロジーズ Plasma processing apparatus and plasma processing method
CN108471666B (en) * 2017-02-23 2021-06-08 北京北方华创微电子装备有限公司 Plasma generating method and device and semiconductor processing equipment
JP7175239B2 (en) * 2018-06-22 2022-11-18 東京エレクトロン株式会社 CONTROL METHOD, PLASMA PROCESSING APPARATUS, PROGRAM AND STORAGE MEDIUM

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3437926B2 (en) * 1998-04-28 2003-08-18 シャープ株式会社 Plasma CVD apparatus, film forming method, and cleaning method
US6849154B2 (en) * 1998-11-27 2005-02-01 Tokyo Electron Limited Plasma etching apparatus
JP4831853B2 (en) * 1999-05-11 2011-12-07 東京エレクトロン株式会社 Capacitively coupled parallel plate plasma etching apparatus and plasma etching method using the same
JP4578651B2 (en) * 1999-09-13 2010-11-10 東京エレクトロン株式会社 Plasma processing method, plasma processing apparatus, and plasma etching method
JP4115337B2 (en) * 2003-05-30 2008-07-09 俊夫 後藤 Plasma processing equipment
JP3905870B2 (en) * 2003-08-01 2007-04-18 東京エレクトロン株式会社 Plasma processing equipment

Also Published As

Publication number Publication date
TWI409872B (en) 2013-09-21
JP4515950B2 (en) 2010-08-04
JP2006286791A (en) 2006-10-19
CN1840740A (en) 2006-10-04
KR20060105667A (en) 2006-10-11
KR100801769B1 (en) 2008-02-11
CN1840740B (en) 2011-10-12

Similar Documents

Publication Publication Date Title
TW200644117A (en) Plasma processing apparatus and plasma processing method
TW200708209A (en) Plasma processing apparatus and plasma processing method
WO2007142166A3 (en) Atmospheric pressure plasma generating method, plasma processing method and component mounting method using same, and device using these methods
IL165179A0 (en) Electrode for electric discharge surface treatment, method of electric discharge surface treatment, and apparatus for electric discharge surface treatment
TW200614368A (en) Plasma processing device amd method
TW200629389A (en) Method for treating a substrate
TW200701361A (en) Plasma processing apparatus
WO2011011532A3 (en) Hollow cathode showerhead
WO2004107394A3 (en) Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method
SG151287A1 (en) Method for reducing roughness of a thick insulating layer
ATE518409T1 (en) APPARATUS AND PROCESS FOR GENERATING, ACCELERATING AND SPREADING BEAMS OF ELECTRONS AND PLASMA
WO2007115309A3 (en) Apparatus and method for treating a workpiece with ionizing gas plasma
WO2011006018A3 (en) Apparatus and method for plasma processing
WO2006077582A3 (en) System and method for treating biological tissue with a plasma gas discharge
EP1548808A4 (en) High frequency plasma generator and high frequency plasma generating method
WO2003007326A3 (en) Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing
TW200741858A (en) Plasma etching method and computer-readable storage medium
AU2003205873A1 (en) Plasma channel drilling process
SE0501603L (en) Plasma generating device, plasma surgical device and use of a plasma surgical device
NL1033983A1 (en) Device for generating extreme ultraviolet radiation by means of electrical discharge on regenerable electrodes.
TW200618103A (en) Plasma processing apparatus
TW200723338A (en) Method of operating ion source and ion implanting apparatus
EP4120803A4 (en) Dielectric barrier-type plasma generation device and plasma discharge initiation method for dielectric barrier-type plasma generation device
AU2003286888A1 (en) Method and apparatus for stabilizing of the glow plasma discharges
TW200715412A (en) Method and apparatus for forming metal film

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees