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DK711788A - Fotopolymeriserbar blanding og paa basis deraf fremstillet optegnelsesmateriale - Google Patents

Fotopolymeriserbar blanding og paa basis deraf fremstillet optegnelsesmateriale

Info

Publication number
DK711788A
DK711788A DK711788A DK711788A DK711788A DK 711788 A DK711788 A DK 711788A DK 711788 A DK711788 A DK 711788A DK 711788 A DK711788 A DK 711788A DK 711788 A DK711788 A DK 711788A
Authority
DK
Denmark
Prior art keywords
basis
recording materials
materials made
photopolymerizable mixture
photopolymerizable
Prior art date
Application number
DK711788A
Other languages
Danish (da)
English (en)
Other versions
DK711788D0 (da
Inventor
Klaus Rode
Joachim Gersdorf
Dieter Mohr
Werner Frass
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of DK711788D0 publication Critical patent/DK711788D0/da
Publication of DK711788A publication Critical patent/DK711788A/da

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
DK711788A 1987-12-22 1988-12-21 Fotopolymeriserbar blanding og paa basis deraf fremstillet optegnelsesmateriale DK711788A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19873743455 DE3743455A1 (de) 1987-12-22 1987-12-22 Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial

Publications (2)

Publication Number Publication Date
DK711788D0 DK711788D0 (da) 1988-12-21
DK711788A true DK711788A (da) 1989-06-23

Family

ID=6343212

Family Applications (1)

Application Number Title Priority Date Filing Date
DK711788A DK711788A (da) 1987-12-22 1988-12-21 Fotopolymeriserbar blanding og paa basis deraf fremstillet optegnelsesmateriale

Country Status (8)

Country Link
US (1) US4985341A (fi)
EP (1) EP0321827B1 (fi)
JP (1) JP2736087B2 (fi)
AU (1) AU610961B2 (fi)
BR (1) BR8806780A (fi)
DE (2) DE3743455A1 (fi)
DK (1) DK711788A (fi)
FI (1) FI885876A7 (fi)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0425440B1 (de) * 1989-10-27 1994-11-17 Ciba-Geigy Ag Verfahren zur Abstimmung der Strahlungsempfindlichkeit von photopolymerisierbaren Zusammensetzungen
DE4007428A1 (de) * 1990-03-09 1991-09-12 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
US5100928A (en) * 1990-04-18 1992-03-31 Olin Corporation Compositions containing organic-soluble xanthene dye photoinitiators
US6010824A (en) * 1992-11-10 2000-01-04 Tokyo Ohka Kogyo Co., Ltd. Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same
US6611531B1 (en) 1998-09-30 2003-08-26 Cisco Technology, Inc. Method and apparatus for routing integrated data, voice, and video traffic
US7339924B1 (en) * 1998-09-30 2008-03-04 Cisco Technology, Inc. Method and apparatus for providing ringing timeout disconnect supervision in remote telephone extensions using voice over packet-data-network systems (VOPS)
JP2005077593A (ja) * 2003-08-29 2005-03-24 Konica Minolta Medical & Graphic Inc 平版印刷版材料及び平版印刷版の製版方法
JP5189448B2 (ja) * 2008-09-26 2013-04-24 富士フイルム株式会社 平版印刷版原版及び平版印刷版の製版方法
US10308833B2 (en) 2013-11-27 2019-06-04 Dow Global Technologies Llc Curable polyurethane coating composition and method of preparing the same

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2850445A (en) * 1955-01-19 1958-09-02 Oster Gerald Photopolymerization
US2875047A (en) * 1955-01-19 1959-02-24 Oster Gerald Photopolymerization with the formation of coherent plastic masses
US3479185A (en) * 1965-06-03 1969-11-18 Du Pont Photopolymerizable compositions and layers containing 2,4,5-triphenylimidazoyl dimers
US3488269A (en) * 1965-09-15 1970-01-06 Technical Operations Inc Labile hydrogen initiators for visible light photopolymerization
GB1165570A (en) * 1966-12-08 1969-10-01 Agfa Gevaert Nv Photopolymerization of Ethylenically Unsaturated Compounds
US3579339A (en) * 1967-05-23 1971-05-18 Du Pont Photopolymerizable dispersions and elements containing nonmigratory photoreducible dyes
US3759807A (en) * 1969-01-28 1973-09-18 Union Carbide Corp Photopolymerization process using combination of organic carbonyls and amines
US3637375A (en) * 1970-05-25 1972-01-25 Steven Levinos Photopolymerization utilizing diazosulfonates and photoreducible dyes
GB1408265A (en) * 1971-10-18 1975-10-01 Ici Ltd Photopolymerisable composition
DE2361041C3 (de) * 1973-12-07 1980-08-14 Hoechst Ag, 6000 Frankfurt Photopolymerisierbares Gemisch
DE2602419A1 (de) * 1976-01-23 1977-07-28 Basf Ag Photopolymerisierbare masse
DE2658935A1 (de) * 1976-12-24 1978-07-06 Basf Ag Photopolymerisierbare masse und deren verwendung
JPS5495687A (en) * 1978-01-11 1979-07-28 Fuji Photo Film Co Ltd Photopolymerizable composition
DE2822190A1 (de) * 1978-05-20 1979-11-22 Hoechst Ag Photopolymerisierbares gemisch
JPS5577742A (en) * 1978-12-08 1980-06-11 Fuji Photo Film Co Ltd Photosensitive composition
NO150963C (no) * 1979-01-11 1985-01-16 Scott Bader Co Polyesterharpiksmateriale som er herdbart ved hjelp av synlig lys, og fremgangsmaate til herding av dette
JPS58102230A (ja) * 1981-12-15 1983-06-17 Hitachi Chem Co Ltd 感光性樹脂組成物
ATE26458T1 (de) * 1982-06-10 1987-04-15 Warwick Int Ltd Photohaertbare harze und ihre verwendung.
DE3223104A1 (de) * 1982-06-21 1983-12-22 Hoechst Ag, 6230 Frankfurt Photopolymerisierbares gemisch und damit hergestelltes photopolymerisierbares kopiermaterial
DE3333450A1 (de) * 1983-09-16 1985-04-11 Hoechst Ag, 6230 Frankfurt Trihalogenmethylgruppen enthaltende carbonylmethylenheterocyclen, verfahren zu ihrer herstellung und lichtempfindliches gemisch, das diese verbindungen enthaelt
JPS61172139A (ja) * 1985-01-25 1986-08-02 Fuji Photo Film Co Ltd 光重合性組成物
JPS61228002A (ja) * 1985-04-02 1986-10-11 Nippon Paint Co Ltd 高感度光硬化性樹脂組成物
US4772538A (en) * 1985-08-02 1988-09-20 American Hoechst Corporation Water developable lithographic composition
GB8525027D0 (en) * 1985-10-10 1985-11-13 Autotype Int Ltd Water soluble photoinitiators
DE3710282A1 (de) * 1987-03-28 1988-10-13 Hoechst Ag Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial
DE3735088A1 (de) * 1987-10-16 1989-04-27 Hoechst Ag Photopolymerisierbares gemisch
US4874685A (en) * 1987-11-27 1989-10-17 The Mead Corporation Photocurable composition containing a photoreducible dye a thiol and an N,N'-dialkylaniline

Also Published As

Publication number Publication date
EP0321827A2 (de) 1989-06-28
US4985341A (en) 1991-01-15
FI885876A0 (fi) 1988-12-20
FI885876L (fi) 1989-06-23
DK711788D0 (da) 1988-12-21
BR8806780A (pt) 1989-08-29
AU610961B2 (en) 1991-05-30
DE3743455A1 (de) 1989-07-06
JP2736087B2 (ja) 1998-04-02
DE3885588D1 (de) 1993-12-16
JPH01203414A (ja) 1989-08-16
EP0321827A3 (en) 1989-09-06
FI885876A7 (fi) 1989-06-23
EP0321827B1 (de) 1993-11-10
AU2739388A (en) 1989-06-22

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment