DE69308634D1 - Positiv arbeitende Photolackzusammensetzung - Google Patents

Positiv arbeitende Photolackzusammensetzung

Info

Publication number: DE69308634D1
Authority: DE; Germany
Prior art keywords: photoresist composition; positive working; working photoresist; positive; composition
Prior art date: 1992-05-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE69308634T

Other languages

English (en)

Other versions

DE69308634T2 (de

Inventor

Kyoko Nagase

Haruyoshi Osaki

Hiroshi Moriuma

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Sumitomo Chemical Co Ltd

Original Assignee

Sumitomo Chemical Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1992-05-27

Filing date

1993-05-26

Publication date

1997-04-17

1993-05-26 Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd

1997-04-17 Application granted granted Critical

1997-04-17 Publication of DE69308634D1 publication Critical patent/DE69308634D1/de

1997-07-10 Publication of DE69308634T2 publication Critical patent/DE69308634T2/de

2013-05-27 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Materials For Photolithography (AREA)
Compositions Of Macromolecular Compounds (AREA)
Formation Of Insulating Films (AREA)
Photoreceptors In Electrophotography (AREA)
Optical Filters (AREA)

DE69308634T 1992-05-27 1993-05-26 Positiv arbeitende Photolackzusammensetzung Expired - Fee Related DE69308634T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP4134863A JPH05323605A (ja)	1992-05-27	1992-05-27	ポジ型レジスト組成物

Publications (2)

Publication Number	Publication Date
DE69308634D1 true DE69308634D1 (de)	1997-04-17
DE69308634T2 DE69308634T2 (de)	1997-07-10

Family

ID=15138238

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE69308634T Expired - Fee Related DE69308634T2 (de)	1992-05-27	1993-05-26	Positiv arbeitende Photolackzusammensetzung

Country Status (8)

Country	Link
US (1)	US5451484A (de)
EP (1)	EP0571989B1 (de)
JP (1)	JPH05323605A (de)
KR (1)	KR100255879B1 (de)
CA (1)	CA2096317A1 (de)
DE (1)	DE69308634T2 (de)
MX (1)	MX9303080A (de)
TW (1)	TW275670B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP3424341B2 (ja) *	1994-04-11	2003-07-07	住友化学工業株式会社	感光性樹脂組成物
EP0706090B1 (de) *	1994-10-05	2001-01-03	JSR Corporation	Strahlungsempfindliche Harzzusammensetzung
EP0831370A4 (de) *	1995-01-17	1999-08-18	Nippon Zeon Co	Positiv arbeitende photolackzusammensetzung
JP3427562B2 (ja) *	1995-05-09	2003-07-22	住友化学工業株式会社	ポジ型レジスト組成物
US6191197B1 (en) *	1996-09-23	2001-02-20	Bridgestone Corporation	Extended polymer compostion derived from blends of elastomers and syndiotactic polystyrene
JP3666839B2 (ja) *	1998-01-23	2005-06-29	東京応化工業株式会社	ポジ型ホトレジスト組成物およびその製造方法
JP5535869B2 (ja) *	2010-10-21	2014-07-02	明和化成株式会社	ノボラック型フェノール樹脂およびこれを含むフォトレジスト組成物
JP2013195497A (ja) *	2012-03-16	2013-09-30	Sumitomo Bakelite Co Ltd	フォトレジスト用樹脂組成物
US8822123B2 (en)	2012-07-13	2014-09-02	Momentive Specialty Chemicals Inc.	Polymeric materials and methods for making the polymeric materials
JP7176844B2 (ja) *	2015-10-19	2022-11-22	日産化学株式会社	長鎖アルキル基含有ノボラックを含むレジスト下層膜形成組成物
KR102867290B1 (ko)	2023-09-15	2025-09-30	한상언	탁월한 결착력과 방범기능이 우수한 파이프용 지지구

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5238774A (en) *	1985-08-07	1993-08-24	Japan Synthetic Rubber Co., Ltd.	Radiation-sensitive composition containing 1,2-quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent
JPH0654384B2 (ja) *	1985-08-09	1994-07-20	東京応化工業株式会社	ポジ型ホトレジスト組成物
JP2577908B2 (ja) *	1987-04-20	1997-02-05	日本ゼオン株式会社	ポジ型フオトレジスト組成物
NO891063L (no) *	1988-03-31	1989-10-02	Thiokol Morton Inc	Novolakharpikser av blandede aldehyder og positive fotoresistmaterialer fremstilt fra slike harpikser.
DE68928823T2 (de) *	1988-07-07	1999-02-25	Sumitomo Chemical Co., Ltd., Osaka	Strahlungsempfindliche, positiv arbeitende Resistzusammensetzung
JP2814721B2 (ja) *	1989-09-05	1998-10-27	住友化学工業株式会社	ポジ型感放射線性レジスト組成物
CA2024312A1 (en) *	1989-09-05	1991-03-06	Haruyoshi Osaki	Radiation-sensitive positive resist composition
US5215856A (en) *	1989-09-19	1993-06-01	Ocg Microelectronic Materials, Inc.	Tris-(hydroxyphenyl) lower alkane compounds as sensitivity enhancers for o-quinonediazide containing radiation-sensitive compositions and elements
JP2567282B2 (ja) *	1989-10-02	1996-12-25	日本ゼオン株式会社	ポジ型レジスト組成物
JPH061377B2 (ja) *	1989-12-28	1994-01-05	日本ゼオン株式会社	ポジ型レジスト組成物

1992
- 1992-05-27 JP JP4134863A patent/JPH05323605A/ja active Pending
1993
- 1993-05-14 CA CA002096317A patent/CA2096317A1/en not_active Abandoned
- 1993-05-18 TW TW082103879A patent/TW275670B/zh active
- 1993-05-22 KR KR1019930008879A patent/KR100255879B1/ko not_active Expired - Fee Related
- 1993-05-26 DE DE69308634T patent/DE69308634T2/de not_active Expired - Fee Related
- 1993-05-26 EP EP93108525A patent/EP0571989B1/de not_active Expired - Lifetime
- 1993-05-26 MX MX9303080A patent/MX9303080A/es not_active IP Right Cessation
- 1993-05-27 US US08/067,933 patent/US5451484A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
EP0571989A2 (de)	1993-12-01
EP0571989B1 (de)	1997-03-12
KR100255879B1 (ko)	2000-06-01
TW275670B (de)	1996-05-11
CA2096317A1 (en)	1993-11-28
DE69308634T2 (de)	1997-07-10
EP0571989A3 (de)	1994-11-02
JPH05323605A (ja)	1993-12-07
US5451484A (en)	1995-09-19
MX9303080A (es)	1994-02-28
KR930023767A (ko)	1993-12-21

Publication	Publication Date	Title
DE69329408D1 (de)	2000-10-19	Positiv arbeitende Photolackzusammensetzung
DE69126834D1 (de)	1997-08-21	Positiv arbeitende Photoresistzusammensetzung
DE69423800D1 (de)	2000-05-11	Positiv arbeitende fotoempfindliche Zusammensetzung
DE69327678D1 (de)	2000-03-02	Positiv arbeitende Resistzusammensetzung
DE69130125D1 (de)	1998-10-15	Positiv arbeitende Photolackzusammensetzung
DE69027099D1 (de)	1996-06-27	Positiv arbeitende Photolackzusammensetzung
DE69500160D1 (de)	1997-04-03	Positiv arbeitende Fotoresistzusammensetzung
DE69421982D1 (de)	2000-01-13	Positiv arbeitende Photoresistzusammensetzung
DE69608167D1 (de)	2000-06-15	Positiv arbeitende Photoresistzusammensetzung
DE69033212D1 (de)	1999-08-26	Positiv arbeitende Photolack-Zusammensetzung
DE69322946D1 (de)	1999-02-18	Photolackzusammensetzung
DE69301999D1 (de)	1996-05-02	Photoresist Zusammensetzung
DE69232042D1 (de)	2001-10-11	Positiv-arbeitende lichtempfindliche Zusammensetzung
DE69302650D1 (de)	1996-06-20	Lichtempfindliche Zusammensetzung
DE69703310D1 (de)	2000-11-23	Positiv arbeitende photoempfindliche Zusammensetzung
DE69510519D1 (de)	1999-08-05	Positiv-arbeitende fotoempfindliche Zusammensetzung
DE69425786D1 (de)	2000-10-12	Photoresistzusammensetzung
DE69510888D1 (de)	1999-08-26	Positiv arbeitende Fotoresist-Zusammensetzung
DE69424884D1 (de)	2000-07-20	Positiv arbeitende Photoresistzusammensetzung
DE69229332D1 (de)	1999-07-08	Positiv-arbeitende Resistzusammensetzung
DE69301273D1 (de)	1996-02-22	Positiv arbeitende Photolackzusammensetzung
DE69220612D1 (de)	1997-08-07	Positivarbeitende Photoresistzusammensetzung
DE69121001D1 (de)	1996-08-29	Positiv arbeitende Fotolackzusammensetzung
DE69226456D1 (de)	1998-09-10	Negativarbeitende Photoresistzusammensetzung
DE69028476D1 (de)	1996-10-17	Positive arbeitende Fotolackzusammensetzungen

Legal Events

Date	Code	Title	Description
1998-04-09	8364	No opposition during term of opposition
2002-07-18	8339	Ceased/non-payment of the annual fee