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DE69923244D1 - Magnetoresistiven Speicheranordnungen - Google Patents

Magnetoresistiven Speicheranordnungen

Info

Publication number
DE69923244D1
DE69923244D1 DE69923244T DE69923244T DE69923244D1 DE 69923244 D1 DE69923244 D1 DE 69923244D1 DE 69923244 T DE69923244 T DE 69923244T DE 69923244 T DE69923244 T DE 69923244T DE 69923244 D1 DE69923244 D1 DE 69923244D1
Authority
DE
Germany
Prior art keywords
magnetoresistive memory
memory arrangements
arrangements
magnetoresistive
memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69923244T
Other languages
English (en)
Other versions
DE69923244T2 (de
Inventor
David William Abraham
Philip Edward Batson
John Slonczewski
Philip Louis Trouilloud
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of DE69923244D1 publication Critical patent/DE69923244D1/de
Application granted granted Critical
Publication of DE69923244T2 publication Critical patent/DE69923244T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/06Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • G11C5/08Arrangements for interconnecting storage elements electrically, e.g. by wiring for interconnecting magnetic elements, e.g. toroidal cores
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B61/00Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
    • H10B61/10Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices comprising components having two electrodes, e.g. diodes or MIM elements
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/093Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/161Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect details concerning the memory cell structure, e.g. the layers of the ferromagnetic memory cell
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165Auxiliary circuits
    • G11C11/1675Writing or programming circuits or methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3254Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F10/00Thin magnetic films, e.g. of one-domain structure
    • H01F10/32Spin-exchange-coupled multilayers, e.g. nanostructured superlattices
    • H01F10/324Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer
    • H01F10/3268Exchange coupling of magnetic film pairs via a very thin non-magnetic spacer, e.g. by exchange with conduction electrons of the spacer the exchange coupling being asymmetric, e.g. by use of additional pinning, by using antiferromagnetic or ferromagnetic coupling interface, i.e. so-called spin-valve [SV] structure, e.g. NiFe/Cu/NiFe/FeMn
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B2005/3996Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects large or giant magnetoresistive effects [GMR], e.g. as generated in spin-valve [SV] devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/32Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film
    • H01F41/325Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying conductive, insulating or magnetic material on a magnetic film, specially adapted for a thin magnetic film applying a noble metal capping on a spin-exchange-coupled multilayer, e.g. spin filter deposition

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Semiconductor Memories (AREA)
DE69923244T 1998-02-10 1999-02-04 Magnetoresistiven Speicheranordnungen Expired - Lifetime DE69923244T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/021,352 US6590750B2 (en) 1996-03-18 1998-02-10 Limiting magnetoresistive electrical interaction to a preferred portion of a magnetic region in magnetic devices
US21352 1998-02-10

Publications (2)

Publication Number Publication Date
DE69923244D1 true DE69923244D1 (de) 2005-02-24
DE69923244T2 DE69923244T2 (de) 2006-01-12

Family

ID=21803722

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69923244T Expired - Lifetime DE69923244T2 (de) 1998-02-10 1999-02-04 Magnetoresistiven Speicheranordnungen

Country Status (5)

Country Link
US (2) US6590750B2 (de)
EP (1) EP0936624B1 (de)
JP (1) JP3368224B2 (de)
KR (1) KR100333208B1 (de)
DE (1) DE69923244T2 (de)

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US6611405B1 (en) * 1999-09-16 2003-08-26 Kabushiki Kaisha Toshiba Magnetoresistive element and magnetic memory device
US6609174B1 (en) * 1999-10-19 2003-08-19 Motorola, Inc. Embedded MRAMs including dual read ports
US20020036876A1 (en) * 2000-09-06 2002-03-28 Yasuhiro Kawawake Magnetoresistive element, method for manufacturing the same, and magnetic device using the same
JP3647736B2 (ja) * 2000-09-29 2005-05-18 株式会社東芝 磁気抵抗効果素子、磁気ヘッド及び磁気再生装置
DE10048420A1 (de) * 2000-09-29 2002-04-18 Infineon Technologies Ag Verfahren zum Herstellen von integrierten Schaltungsanordnungen sowie zugehörige Schaltungsanordnungen, insbesondere Tunnelkontaktelemente
DE10050076C2 (de) 2000-10-10 2003-09-18 Infineon Technologies Ag Verfahren zur Herstellung einer ferromagnetischen Struktur und ferromagnetisches Bauelement
US6878979B2 (en) * 2001-01-19 2005-04-12 Matsushita Electric Industrial Co., Ltd. Spin switch and magnetic storage element using it
US6798599B2 (en) * 2001-01-29 2004-09-28 Seagate Technology Llc Disc storage system employing non-volatile magnetoresistive random access memory
US6780652B2 (en) * 2001-03-15 2004-08-24 Micron Technology, Inc. Self-aligned MRAM contact and method of fabrication
JP2002299584A (ja) 2001-04-03 2002-10-11 Mitsubishi Electric Corp 磁気ランダムアクセスメモリ装置および半導体装置
JP5013494B2 (ja) * 2001-04-06 2012-08-29 ルネサスエレクトロニクス株式会社 磁性メモリの製造方法
JP4405103B2 (ja) 2001-04-20 2010-01-27 株式会社東芝 半導体記憶装置
US6633497B2 (en) * 2001-06-22 2003-10-14 Hewlett-Packard Development Company, L.P. Resistive cross point array of short-tolerant memory cells
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US6979526B2 (en) * 2002-06-03 2005-12-27 Infineon Technologies Ag Lithography alignment and overlay measurement marks formed by resist mask blocking for MRAMs
US7095646B2 (en) 2002-07-17 2006-08-22 Freescale Semiconductor, Inc. Multi-state magnetoresistance random access cell with improved memory storage density
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US6858441B2 (en) * 2002-09-04 2005-02-22 Infineon Technologies Ag MRAM MTJ stack to conductive line alignment method
JP4399211B2 (ja) * 2002-12-21 2010-01-13 株式会社ハイニックスセミコンダクター バイオセンサー
US7199055B2 (en) * 2003-03-03 2007-04-03 Cypress Semiconductor Corp. Magnetic memory cell junction and method for forming a magnetic memory cell junction
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Also Published As

Publication number Publication date
EP0936624A3 (de) 2000-09-20
US6590750B2 (en) 2003-07-08
JP3368224B2 (ja) 2003-01-20
KR100333208B1 (ko) 2002-04-18
JPH11288585A (ja) 1999-10-19
US6452764B1 (en) 2002-09-17
KR19990072260A (ko) 1999-09-27
DE69923244T2 (de) 2006-01-12
EP0936624A2 (de) 1999-08-18
US20010040778A1 (en) 2001-11-15
EP0936624B1 (de) 2005-01-19

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8328 Change in the person/name/address of the agent

Representative=s name: DUSCHER, R., DIPL.-PHYS. DR.RER.NAT., PAT.-ANW., 7