DE60317124D1 - Waschflüssigkeitzusammensetzung für ein Halbleitersubstrat - Google Patents

Waschflüssigkeitzusammensetzung für ein Halbleitersubstrat

Info

Publication number: DE60317124D1
Authority: DE; Germany
Prior art keywords: semiconductor substrate; liquid composition; washing liquid; washing; composition
Prior art date: 2002-02-19
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE60317124T

Other languages

English (en)

Other versions

DE60317124T2 (de

Inventor

Yumiko Abe

Norio Ishikawa

Hidemitsu Aoki

Hiroaki Tomimori

Yoshiko Kasama

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Kanto Chemical Co Inc

Renesas Electronics Corp

Original Assignee

Kanto Chemical Co Inc

NEC Electronics Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2002-02-19

Filing date

2003-02-18

Publication date

2007-12-13

2003-02-18 Application filed by Kanto Chemical Co Inc, NEC Electronics Corp filed Critical Kanto Chemical Co Inc

2007-12-13 Application granted granted Critical

2007-12-13 Publication of DE60317124D1 publication Critical patent/DE60317124D1/de

2008-08-14 Publication of DE60317124T2 publication Critical patent/DE60317124T2/de

2023-02-19 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/37—Polymers
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2082—Polycarboxylic acids-salts thereof
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/20—Organic compounds containing oxygen
- C11D3/2075—Carboxylic acids-salts thereof
- C11D3/2086—Hydroxy carboxylic acids-salts thereof
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/004—Surface-active compounds containing F
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
- C11D1/22—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aromatic compounds
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/12—Sulfonic acids or sulfuric acid esters; Salts thereof
- C11D1/22—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aromatic compounds
- C11D1/24—Sulfonic acids or sulfuric acid esters; Salts thereof derived from aromatic compounds containing ester or ether groups directly attached to the nucleus
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/02—Anionic compounds
- C11D1/34—Derivatives of acids of phosphorus
- C11D1/345—Phosphates or phosphites
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D1/00—Detergent compositions based essentially on surface-active compounds; Use of these compounds as a detergent
- C11D1/66—Non-ionic compounds
- C11D1/72—Ethers of polyoxyalkylene glycols
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
- C11D2111/10—Objects to be cleaned
- C11D2111/14—Hard surfaces
- C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

Chemical & Material Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Oil, Petroleum & Natural Gas (AREA)
Wood Science & Technology (AREA)
Organic Chemistry (AREA)
Health & Medical Sciences (AREA)
Emergency Medicine (AREA)
Cleaning Or Drying Semiconductors (AREA)
Detergent Compositions (AREA)

DE60317124T 2002-02-19 2003-02-18 Waschflüssigkeitzusammensetzung für ein Halbleitersubstrat Expired - Lifetime DE60317124T2 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2002041393		2002-02-19
JP2002041393		2002-02-19

Publications (2)

Publication Number	Publication Date
DE60317124D1 true DE60317124D1 (de)	2007-12-13
DE60317124T2 DE60317124T2 (de)	2008-08-14

Family

ID=27621494

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE60317124T Expired - Lifetime DE60317124T2 (de)	2002-02-19	2003-02-18	Waschflüssigkeitzusammensetzung für ein Halbleitersubstrat

Country Status (7)

Country	Link
US (1)	US7138362B2 (de)
EP (1)	EP1336650B1 (de)
JP (1)	JP4931953B2 (de)
KR (1)	KR100959162B1 (de)
CN (1)	CN1297642C (de)
DE (1)	DE60317124T2 (de)
TW (1)	TWI339680B (de)

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JP4375991B2 (ja) *	2003-04-09	2009-12-02	関東化学株式会社	半導体基板洗浄液組成物
KR101166002B1 (ko) *	2004-02-09	2012-07-18	미쓰비시 가가꾸 가부시키가이샤	반도체 디바이스용 기판 세정액 및 세정방법
US7939131B2 (en)	2004-08-16	2011-05-10	Molecular Imprints, Inc.	Method to provide a layer with uniform etch characteristics
US20060062922A1 (en)	2004-09-23	2006-03-23	Molecular Imprints, Inc.	Polymerization technique to attenuate oxygen inhibition of solidification of liquids and composition therefor
US20060081557A1 (en)	2004-10-18	2006-04-20	Molecular Imprints, Inc.	Low-k dielectric functional imprinting materials
US7208325B2 (en) *	2005-01-18	2007-04-24	Applied Materials, Inc.	Refreshing wafers having low-k dielectric materials
US8557351B2 (en)	2005-07-22	2013-10-15	Molecular Imprints, Inc.	Method for adhering materials together
US8808808B2 (en)	2005-07-22	2014-08-19	Molecular Imprints, Inc.	Method for imprint lithography utilizing an adhesion primer layer
US7759407B2 (en)	2005-07-22	2010-07-20	Molecular Imprints, Inc.	Composition for adhering materials together
US8480810B2 (en) *	2005-12-30	2013-07-09	Lam Research Corporation	Method and apparatus for particle removal
JP4777197B2 (ja) *	2006-09-11	2011-09-21	富士フイルム株式会社	洗浄液及びそれを用いた洗浄方法
WO2009067241A1 (en) *	2007-11-21	2009-05-28	Molecular Imprints, Inc.	Porous template and imprinting stack for nano-imprint lithography
WO2010019722A2 (en) *	2008-08-13	2010-02-18	Intermolecular, Inc.	Combinatorial approach to the development of cleaning formulations for glue removal in semiconductor applications
US20100072671A1 (en) *	2008-09-25	2010-03-25	Molecular Imprints, Inc.	Nano-imprint lithography template fabrication and treatment
US8470188B2 (en) *	2008-10-02	2013-06-25	Molecular Imprints, Inc.	Nano-imprint lithography templates
US20100104852A1 (en) *	2008-10-23	2010-04-29	Molecular Imprints, Inc.	Fabrication of High-Throughput Nano-Imprint Lithography Templates
JP2010226089A (ja) *	2009-01-14	2010-10-07	Rohm & Haas Electronic Materials Llc	半導体ウェハをクリーニングする方法
US8765653B2 (en) *	2009-07-07	2014-07-01	Air Products And Chemicals, Inc.	Formulations and method for post-CMP cleaning
JP5206622B2 (ja) *	2009-08-07	2013-06-12	三菱瓦斯化学株式会社	金属微細構造体のパターン倒壊抑制用処理液及びこれを用いた金属微細構造体の製造方法
US20120214722A1 (en) *	2009-10-22	2012-08-23	Mitsubishi Gas Chemical Company Inc.	Treatment solution for preventing pattern collapse in metal fine structure body, and process for production of metal fine structure body using same
CN102086431B (zh) *	2009-12-07	2012-09-26	奇美实业股份有限公司	用于太阳能电池基板的洗净液组成物
US8616873B2 (en) *	2010-01-26	2013-12-31	Molecular Imprints, Inc.	Micro-conformal templates for nanoimprint lithography
US20110189329A1 (en) *	2010-01-29	2011-08-04	Molecular Imprints, Inc.	Ultra-Compliant Nanoimprint Lithography Template
JP2013133458A (ja) *	2011-12-27	2013-07-08	Idemitsu Kosan Co Ltd	水性洗浄剤
US20160122696A1 (en) *	2013-05-17	2016-05-05	Advanced Technology Materials, Inc.	Compositions and methods for removing ceria particles from a surface
CN106350296B (zh) *	2016-08-25	2018-10-23	大连奥首科技有限公司	一种高效环保led芯片清洗剂及使用方法
CN109716487B (zh)	2016-09-21	2023-12-01	福吉米株式会社	表面处理组合物
CN107243783B (zh) *	2017-08-09	2018-08-28	睿力集成电路有限公司	化学机械研磨方法、设备及清洗液
JP7150433B2 (ja) *	2017-12-28	2022-10-11	東京応化工業株式会社	リワーク方法、及び酸性洗浄液
CN115232001B (zh) *	2021-04-25	2024-08-30	中国石油化工股份有限公司	氢化均苯四甲酸合成方法
JP7011098B1 (ja)	2021-06-14	2022-01-26	富士フイルムエレクトロニクスマテリアルズ株式会社	洗浄組成物、半導体基板の洗浄方法、および、半導体素子の製造方法
JP7145351B1 (ja)	2022-03-25	2022-09-30	富士フイルム株式会社	組成物、半導体素子の製造方法

Family Cites Families (18)

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Publication number	Priority date	Publication date	Assignee	Title
JP3169024B2 (ja) *	1991-07-12	2001-05-21	三菱瓦斯化学株式会社	シリコンウエハーおよび半導体素子洗浄液
JP3435698B2 (ja) *	1992-03-11	2003-08-11	三菱瓦斯化学株式会社	半導体基板の洗浄液
US6103627A (en) *	1996-02-21	2000-08-15	Micron Technology, Inc.	Treatment of a surface having an exposed silicon/silica interface
US6410494B2 (en) *	1996-06-05	2002-06-25	Wako Pure Chemical Industries, Ltd.	Cleaning agent
JP3219020B2 (ja)	1996-06-05	2001-10-15	和光純薬工業株式会社	洗浄処理剤
TW416987B (en) *	1996-06-05	2001-01-01	Wako Pure Chem Ind Ltd	A composition for cleaning the semiconductor substrate surface
TW387936B (en) *	1997-08-12	2000-04-21	Kanto Kagaku	Washing solution
JP3165801B2 (ja)	1997-08-12	2001-05-14	関東化学株式会社	洗浄液
US6165956A (en) *	1997-10-21	2000-12-26	Lam Research Corporation	Methods and apparatus for cleaning semiconductor substrates after polishing of copper film
CN1126152C (zh) *	1998-08-31	2003-10-29	长兴化学工业股份有限公司	半导体制程用的化学机械研磨组合物
JP3003684B1 (ja) *	1998-09-07	2000-01-31	日本電気株式会社	基板洗浄方法および基板洗浄液
JP4516176B2 (ja) *	1999-04-20	2010-08-04	関東化学株式会社	電子材料用基板洗浄液
US6147002A (en) *	1999-05-26	2000-11-14	Ashland Inc.	Process for removing contaminant from a surface and composition useful therefor
US6395693B1 (en) *	1999-09-27	2002-05-28	Cabot Microelectronics Corporation	Cleaning solution for semiconductor surfaces following chemical-mechanical polishing
JP2002017215A (ja) *	2000-06-30	2002-01-22	Daiwa Seiko Inc	魚釣用電動リール
JP2002020787A (ja) *	2000-07-05	2002-01-23	Wako Pure Chem Ind Ltd	銅配線半導体基板洗浄剤
US6498131B1 (en) *	2000-08-07	2002-12-24	Ekc Technology, Inc.	Composition for cleaning chemical mechanical planarization apparatus
EP1187225B1 (de) *	2000-09-08	2006-11-15	Kanto Kagaku Kabushiki Kaisha	Ätzflüssigkeitszusammensetzung

2003
- 2003-02-17 TW TW092103248A patent/TWI339680B/zh not_active IP Right Cessation
- 2003-02-18 EP EP03003155A patent/EP1336650B1/de not_active Expired - Lifetime
- 2003-02-18 DE DE60317124T patent/DE60317124T2/de not_active Expired - Lifetime
- 2003-02-19 US US10/369,877 patent/US7138362B2/en not_active Expired - Fee Related
- 2003-02-19 KR KR1020030010476A patent/KR100959162B1/ko not_active Expired - Fee Related
- 2003-02-19 CN CNB031037887A patent/CN1297642C/zh not_active Expired - Fee Related
2009
- 2009-03-30 JP JP2009080912A patent/JP4931953B2/ja not_active Expired - Fee Related

Also Published As

Publication number	Publication date
JP4931953B2 (ja)	2012-05-16
DE60317124T2 (de)	2008-08-14
KR20030069119A (ko)	2003-08-25
US7138362B2 (en)	2006-11-21
EP1336650A1 (de)	2003-08-20
JP2009147389A (ja)	2009-07-02
CN1439701A (zh)	2003-09-03
KR100959162B1 (ko)	2010-05-24
CN1297642C (zh)	2007-01-31
EP1336650B1 (de)	2007-10-31
US20030171233A1 (en)	2003-09-11
TW200304945A (en)	2003-10-16
TWI339680B (en)	2011-04-01

Publication	Publication Date	Title
DE60317124D1 (de)	2007-12-13	Waschflüssigkeitzusammensetzung für ein Halbleitersubstrat
DE60327015D1 (de)	2009-05-20	Substrat für transparente Elektroden
DE602004004832D1 (de)	2007-04-05	Beschichtung für siliziumhaltiges Substrat
DE60316340D1 (de)	2007-10-25	Flüssige waschmittelzusammensetzung
FR2838735B1 (fr)	2005-04-15	Substrat a revetement auto-nettoyant
DE60238682D1 (de)	2011-02-03	Chemikalienspender für ein hartbodenreinigungsgerät
DE602004008145D1 (de)	2007-09-27	Bindungsschicht für Substrate die auf Silizium basiert sind
DE60332016D1 (de)	2010-05-20	Waschmitteleinspritzung für waschmaschine
FR2869897B1 (fr)	2006-10-27	Substrat a revetement photocatalytique
DE10393094D2 (de)	2005-05-12	Schaltungsanordnung für eine Photovoltaikanlage -
DE10297198T8 (de)	2005-07-28	Kohlenstoff enthaltende Zwischenschicht für einen Phasenübergangsspeicher
DE60134954D1 (de)	2008-09-04	Produktionanordnung für Halbleiter
DE602004012674D1 (de)	2008-05-08	Zusammensetzung zum Polieren von Halbleiterschichten
DE60003312D1 (de)	2003-07-17	Parallelprüfer für halbleiterschaltungen
DE60306252D1 (de)	2006-08-03	Übertragungswerkzeug für Beschichtungsfilm
DE50309652D1 (de)	2008-05-29	Ringfilterelement für ein flüssigkeitsfilter
DE60336429D1 (de)	2011-04-28	HERSTELLUNGSVERFAHREN FÜR Ta-SPUTTERTARGET
DE60205204D1 (de)	2005-09-01	Barriereschicht für siliziumhaltiges Substrat
EP1427051A4 (de)	2004-11-24	Substrat für hochfrequenzmodul
DE60220736D1 (de)	2007-08-02	Herstellungsverfahren für gebondetes Substrat
EP1679997A4 (de)	2008-10-01	Substratbehälter
DE60314355D1 (de)	2007-07-26	Einschnappbarer Kühlkörper für Halbleiterbauelemente
DE60302361D1 (de)	2005-12-22	Schieberegister für sequentiellen fuse-latch-betrieb
DE50300470D1 (de)	2005-06-02	Montageeinrichtung für ein Riegelelement
DE60131114D1 (de)	2007-12-13	Anschlussklemmenanordnung für ein flexibles Substrat

Legal Events

Date	Code	Title	Description
2008-11-20	8364	No opposition during term of opposition
2012-08-28	R082	Change of representative	Ref document number: 1336650 Country of ref document: EP Representative=s name: DR. VOLKER VOSSIUS, CORINNA VOSSIUS, TILMAN VO, DE
2012-10-18	R081	Change of applicant/patentee	Ref document number: 1336650 Country of ref document: EP Owner name: KANTO KAGAKU K.K., JP Free format text: FORMER OWNER: NEC ELECTRONICS CORP., KANTO KAGAKU K.K., , JP Effective date: 20120828 Ref document number: 1336650 Country of ref document: EP Owner name: RENESAS ELECTRONICS CORPORATION, JP Free format text: FORMER OWNER: NEC ELECTRONICS CORP., KANTO KAGAKU K.K., , JP Effective date: 20120828
2012-10-18	R082	Change of representative	Ref document number: 1336650 Country of ref document: EP Representative=s name: DR. VOLKER VOSSIUS, CORINNA VOSSIUS, TILMAN VO, DE Effective date: 20120828