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DE60200719D1 - Filmbildende Zusammensetzung, poröser Film und deren Herstellung - Google Patents

Filmbildende Zusammensetzung, poröser Film und deren Herstellung

Info

Publication number
DE60200719D1
DE60200719D1 DE60200719T DE60200719T DE60200719D1 DE 60200719 D1 DE60200719 D1 DE 60200719D1 DE 60200719 T DE60200719 T DE 60200719T DE 60200719 T DE60200719 T DE 60200719T DE 60200719 D1 DE60200719 D1 DE 60200719D1
Authority
DE
Germany
Prior art keywords
film
production
forming composition
porous
porous film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE60200719T
Other languages
English (en)
Other versions
DE60200719T2 (de
Inventor
Fujio Yagihashi
Motoaki Iwabuchi
Akira Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Application granted granted Critical
Publication of DE60200719D1 publication Critical patent/DE60200719D1/de
Publication of DE60200719T2 publication Critical patent/DE60200719T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L43/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing boron, silicon, phosphorus, selenium, tellurium or a metal; Compositions of derivatives of such polymers
    • C08L43/04—Homopolymers or copolymers of monomers containing silicon
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/249921—Web or sheet containing structurally defined element or component
    • Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Formation Of Insulating Films (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Graft Or Block Polymers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Polymerisation Methods In General (AREA)
DE60200719T 2001-01-15 2002-01-15 Filmbildende Zusammensetzung, poröser Film und deren Herstellung Expired - Fee Related DE60200719T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001006614 2001-01-15
JP2001006614A JP3654343B2 (ja) 2001-01-15 2001-01-15 膜形成用組成物及びその製造方法、並びに多孔質膜の形成方法及び多孔質膜

Publications (2)

Publication Number Publication Date
DE60200719D1 true DE60200719D1 (de) 2004-08-19
DE60200719T2 DE60200719T2 (de) 2005-08-04

Family

ID=18874473

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60200719T Expired - Fee Related DE60200719T2 (de) 2001-01-15 2002-01-15 Filmbildende Zusammensetzung, poröser Film und deren Herstellung

Country Status (6)

Country Link
US (1) US6680107B2 (de)
EP (1) EP1223192B1 (de)
JP (1) JP3654343B2 (de)
KR (1) KR100570246B1 (de)
DE (1) DE60200719T2 (de)
TW (1) TW574319B (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002212502A (ja) * 2001-01-15 2002-07-31 Shin Etsu Chem Co Ltd 膜形成用組成物、多孔質膜の形成方法及び多孔質膜
JP2003031566A (ja) 2001-07-16 2003-01-31 Fujitsu Ltd 低誘電率絶縁膜形成用組成物、これを用いる絶縁膜形成方法、及びそれにより得られた絶縁膜を有する電子部品
GB0120134D0 (en) * 2001-08-17 2001-10-10 Nokia Corp Improvements in or relating to communication networks and methods of distributing information around the network
JP2003296922A (ja) * 2002-04-02 2003-10-17 Fuji Photo Film Co Ltd 磁気記録媒体
JP2004161876A (ja) 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP2004161875A (ja) 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁間膜及び半導体装置
JP3884699B2 (ja) 2002-11-13 2007-02-21 信越化学工業株式会社 多孔質膜形成用組成物、多孔質膜とその製造方法、層間絶縁膜及び半導体装置
JP4493278B2 (ja) * 2003-02-20 2010-06-30 富士通株式会社 多孔性樹脂絶縁膜、電子装置及びそれらの製造方法
JP2004269693A (ja) 2003-03-10 2004-09-30 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物及びその製造方法、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP4139710B2 (ja) 2003-03-10 2008-08-27 信越化学工業株式会社 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004292641A (ja) 2003-03-27 2004-10-21 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜、及び半導体装置
JP2004307694A (ja) 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置。
JP2004307692A (ja) 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd 多孔質膜形成用組成物、多孔質膜の製造方法、多孔質膜、層間絶縁膜及び半導体装置
US8043219B2 (en) * 2004-09-17 2011-10-25 Siemens Medical Solutions Usa, Inc. Automated power level for contrast agent imaging
JP4591032B2 (ja) * 2004-10-15 2010-12-01 Ｊｓｒ株式会社 表面疎水化用組成物、表面疎水化方法および半導体装置の製造方法
JP4781780B2 (ja) 2005-10-27 2011-09-28 信越化学工業株式会社 光関連デバイス封止用樹脂組成物およびその硬化物ならびに半導体素子の封止方法
EP2067800A4 (de) * 2006-09-29 2010-02-24 Asahi Kasei Emd Corp Polyorganosiloxan-zusammensetzung
US7700871B2 (en) * 2007-01-19 2010-04-20 Novinium, Inc. Acid-catalyzed dielectric enhancement fluid and cable restoration method employing same
CN101945905B (zh) * 2008-02-15 2013-06-26 旭化成电子材料株式会社 树脂组合物
EP2412747B1 (de) * 2009-03-27 2016-11-02 Asahi Glass Company, Limited Hartbeschichtungszusammensetzung und harzsubstrat mit hartbeschichtung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3414251B2 (ja) * 1998-03-13 2003-06-09 信越化学工業株式会社 シリコーン樹脂含有エマルジョン組成物及びその製造方法並びに該組成物の硬化被膜を有する物品
JP2000038509A (ja) * 1998-05-18 2000-02-08 Jsr Corp 多孔質膜形成用組成物、該組成物の製造方法、膜の形成方法および多孔質膜
WO2000018847A1 (en) * 1998-09-25 2000-04-06 Catalysts & Chemicals Industries Co., Ltd. Coating fluid for forming low-permittivity silica-based coating film and substrate with low-permittivity coating film
US6399666B1 (en) * 1999-01-27 2002-06-04 International Business Machines Corporation Insulative matrix material
JP2003529202A (ja) 1999-04-14 2003-09-30 アライドシグナル インコーポレイテッド 重合体分解から得られる低誘電性ナノ多孔性材料
US6271273B1 (en) * 2000-07-14 2001-08-07 Shipley Company, L.L.C. Porous materials

Also Published As

Publication number Publication date
TW574319B (en) 2004-02-01
EP1223192A1 (de) 2002-07-17
US6680107B2 (en) 2004-01-20
KR100570246B1 (ko) 2006-04-12
KR20020061517A (ko) 2002-07-24
JP3654343B2 (ja) 2005-06-02
DE60200719T2 (de) 2005-08-04
EP1223192B1 (de) 2004-07-14
JP2002212503A (ja) 2002-07-31
US20020132908A1 (en) 2002-09-19

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee