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DE602007000315D1 - Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium - Google Patents

Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium

Info

Publication number
DE602007000315D1
DE602007000315D1 DE602007000315T DE602007000315T DE602007000315D1 DE 602007000315 D1 DE602007000315 D1 DE 602007000315D1 DE 602007000315 T DE602007000315 T DE 602007000315T DE 602007000315 T DE602007000315 T DE 602007000315T DE 602007000315 D1 DE602007000315 D1 DE 602007000315D1
Authority
DE
Germany
Prior art keywords
cleaning
substrate
cleaning liquid
storage medium
program storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602007000315T
Other languages
English (en)
Inventor
Tsukasa Watanabe
Naoki Shindo
Koukichi Hiroshiro
Yuji Kamikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of DE602007000315D1 publication Critical patent/DE602007000315D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H10P50/00—
    • H10P72/0416—
    • H10P52/00—
    • H10P72/0414—

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Liquid Crystal (AREA)
DE602007000315T 2006-05-19 2007-05-16 Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium Active DE602007000315D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006140377A JP4705517B2 (ja) 2006-05-19 2006-05-19 基板洗浄方法、基板洗浄装置、プログラム、および記録媒体

Publications (1)

Publication Number Publication Date
DE602007000315D1 true DE602007000315D1 (de) 2009-01-15

Family

ID=38472834

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602007000315T Active DE602007000315D1 (de) 2006-05-19 2007-05-16 Verfahren und System zur Reinigung eines Substrats und Programmspeichermedium

Country Status (7)

Country Link
US (1) US8152928B2 (de)
EP (1) EP1858059B1 (de)
JP (1) JP4705517B2 (de)
KR (1) KR101049842B1 (de)
AT (1) ATE416477T1 (de)
DE (1) DE602007000315D1 (de)
TW (1) TW200818282A (de)

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JP2009231579A (ja) * 2008-03-24 2009-10-08 Dainippon Screen Mfg Co Ltd 基板処理装置及び基板処理方法
JP5666086B2 (ja) 2008-12-25 2015-02-12 ジルトロニック アクチエンゲゼルシャフトＳｉｌｔｒｏｎｉｃ ＡＧ シリコンウェハ洗浄装置
US8863763B1 (en) 2009-05-27 2014-10-21 WD Media, LLC Sonication cleaning with a particle counter
US8404056B1 (en) 2009-05-27 2013-03-26 WD Media, LLC Process control for a sonication cleaning tank
CN102029273B (zh) * 2009-10-05 2015-09-16 东京毅力科创株式会社 超声波清洗装置、超声波清洗方法
TWI490931B (zh) * 2009-10-05 2015-07-01 Tokyo Electron Ltd 超音波清洗裝置、超音波清洗方法、及記錄有用來執行此超音波清洗方法之電腦程式的記錄媒體
TW201330084A (zh) * 2012-01-13 2013-07-16 Smartron Co Ltd 晶片清洗裝置及其工序方法
JP5872382B2 (ja) * 2012-05-24 2016-03-01 ジルトロニック アクチエンゲゼルシャフトＳｉｌｔｒｏｎｉｃ ＡＧ 超音波洗浄方法
JP5894858B2 (ja) * 2012-05-24 2016-03-30 ジルトロニック アクチエンゲゼルシャフトＳｉｌｔｒｏｎｉｃ ＡＧ 超音波洗浄方法
US9174249B2 (en) * 2012-12-12 2015-11-03 Lam Research Corporation Ultrasonic cleaning method and apparatus therefore
US9070631B2 (en) * 2013-03-14 2015-06-30 Mei Llc Metal liftoff tools and methods
JP6329342B2 (ja) * 2013-06-07 2018-05-23 株式会社ダルトン 洗浄方法及び洗浄装置
US9562291B2 (en) * 2014-01-14 2017-02-07 Mei, Llc Metal etch system
JP6090184B2 (ja) * 2014-01-27 2017-03-08 信越半導体株式会社 半導体ウェーハの洗浄槽及び貼り合わせウェーハの製造方法
US10522369B2 (en) * 2015-02-26 2019-12-31 Taiwan Semiconductor Manufacturing Co., Ltd. Method and system for cleaning wafer and scrubber
WO2018049671A1 (en) * 2016-09-19 2018-03-22 Acm Research (Shanghai) Inc. Methods and apparatus for cleaning substrates
KR102658739B1 (ko) * 2017-05-03 2024-04-17 램 리써치 코포레이션 컨디셔닝 챔버 컴포넌트
JP6977845B1 (ja) * 2020-09-30 2021-12-08 栗田工業株式会社 電子部品・部材の洗浄水供給装置及び電子部品・部材の洗浄水の供給方法
JP7111386B2 (ja) * 2020-12-25 2022-08-02 アスカコーポレーション株式会社 無電解めっき装置
JP7583651B2 (ja) * 2021-03-11 2024-11-14 キオクシア株式会社 基板洗浄装置および基板洗浄方法
KR102736551B1 (ko) * 2021-09-22 2024-11-29 가부시키가이샤 스크린 홀딩스 기판 처리 방법 및 기판 처리 장치

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US5427622A (en) * 1993-02-12 1995-06-27 International Business Machines Corporation Method for uniform cleaning of wafers using megasonic energy
JPH0831783A (ja) * 1994-07-14 1996-02-02 Fujitsu Ltd 基板のダイシング方法とその装置
KR0170214B1 (ko) 1995-12-29 1999-03-30 김광호 교반기가 장착된 웨이퍼 세정 장치
KR100202191B1 (ko) 1996-07-18 1999-06-15 문정환 반도체 웨이퍼 습식 처리장치
JPH10109072A (ja) 1996-10-04 1998-04-28 Puretetsuku:Kk 高周波洗浄装置
JPH10223585A (ja) 1997-02-04 1998-08-21 Canon Inc ウェハ処理装置及びその方法並びにｓｏｉウェハの製造方法
US6391067B2 (en) 1997-02-04 2002-05-21 Canon Kabushiki Kaisha Wafer processing apparatus and method, wafer convey robot, semiconductor substrate fabrication method, and semiconductor fabrication apparatus
US5800626A (en) * 1997-02-18 1998-09-01 International Business Machines Corporation Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
US5849091A (en) * 1997-06-02 1998-12-15 Micron Technology, Inc. Megasonic cleaning methods and apparatus
JP3839553B2 (ja) * 1997-06-05 2006-11-01 大日本スクリーン製造株式会社 基板処理槽および基板処理装置
US6039055A (en) * 1998-01-08 2000-03-21 International Business Machines Corporation Wafer cleaning with dissolved gas concentration control
US6235641B1 (en) * 1998-10-30 2001-05-22 Fsi International Inc. Method and system to control the concentration of dissolved gas in a liquid
KR200261175Y1 (ko) * 1998-12-30 2002-05-13 김광교 반도체웨이퍼세정용약액공급장치
JP3851486B2 (ja) * 2000-03-27 2006-11-29 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP2001284306A (ja) * 2000-03-28 2001-10-12 Toshiba Corp 基板洗浄装置および基板洗浄方法
JP2002093765A (ja) 2000-09-20 2002-03-29 Kaijo Corp 基板洗浄方法および基板洗浄装置
US6532974B2 (en) * 2001-04-06 2003-03-18 Akrion Llc Process tank with pressurized mist generation
US20020166569A1 (en) 2001-05-10 2002-11-14 Speedfam-Ipec Corporation Method and apparatus for semiconductor wafer cleaning
JP4319445B2 (ja) * 2002-06-20 2009-08-26 大日本スクリーン製造株式会社 基板処理装置
US7111632B2 (en) * 2003-09-22 2006-09-26 Seagate Technology Llc Ultrasonic cleaning device for removing undesirable particles from an object
JP4403177B2 (ja) * 2004-04-15 2010-01-20 東京エレクトロン株式会社 液処理装置および液処理方法
JP2006066793A (ja) * 2004-08-30 2006-03-09 Naoetsu Electronics Co Ltd ウエハ洗浄方法及びその装置
JP4490780B2 (ja) * 2004-10-07 2010-06-30 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP2006108512A (ja) * 2004-10-07 2006-04-20 Ses Co Ltd 基板処理装置
TWI262827B (en) * 2005-12-13 2006-10-01 Ind Tech Res Inst Cleaning device and method of bubble reaction

Also Published As

Publication number Publication date
JP2007311631A (ja) 2007-11-29
KR20070111973A (ko) 2007-11-22
US20070267040A1 (en) 2007-11-22
EP1858059B1 (de) 2008-12-03
TW200818282A (en) 2008-04-16
JP4705517B2 (ja) 2011-06-22
KR101049842B1 (ko) 2011-07-15
TWI342040B (de) 2011-05-11
US8152928B2 (en) 2012-04-10
ATE416477T1 (de) 2008-12-15
EP1858059A1 (de) 2007-11-21

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